CN112882144B - Ultraviolet filtering structure based on nanoring patterned interface and design method thereof - Google Patents
Ultraviolet filtering structure based on nanoring patterned interface and design method thereof Download PDFInfo
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- 239000002063 nanoring Substances 0.000 title claims abstract description 79
- 238000001914 filtration Methods 0.000 title claims abstract description 50
- 238000013461 design Methods 0.000 title claims abstract description 16
- 238000000034 method Methods 0.000 title claims abstract description 16
- 230000005540 biological transmission Effects 0.000 claims abstract description 51
- 229910052751 metal Inorganic materials 0.000 claims abstract description 38
- 239000002184 metal Substances 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 239000011521 glass Substances 0.000 claims abstract description 36
- 238000002834 transmittance Methods 0.000 claims abstract description 19
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 claims description 8
- 238000004088 simulation Methods 0.000 claims description 7
- 230000000737 periodic effect Effects 0.000 claims description 5
- 238000004364 calculation method Methods 0.000 claims description 4
- 239000011148 porous material Substances 0.000 claims description 4
- 239000010408 film Substances 0.000 description 30
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 13
- 229910052710 silicon Inorganic materials 0.000 description 13
- 239000010703 silicon Substances 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 238000000825 ultraviolet detection Methods 0.000 description 3
- 238000003491 array Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000002086 nanomaterial Substances 0.000 description 2
- 238000000411 transmission spectrum Methods 0.000 description 2
- 235000004522 Pentaglottis sempervirens Nutrition 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005094 computer simulation Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000012938 design process Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/008—Surface plasmon devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/204—Filters in which spectral selection is performed by means of a conductive grid or array, e.g. frequency selective surfaces
Abstract
The invention relates to an ultraviolet filtering structure based on a nanoring patterned interface and a design method thereof, wherein the structure comprises a metal nanopore array arranged on a glass substrate, and the metal nanopore array comprises a plurality of basic units; the basic unit comprises a metal air column hole and a group of metal nano rings; the metal air column hole penetrates through the metal film, and the metal nano-ring group is positioned above the interface of the glass substrate and consists of a plurality of concentric metal nano-rings; the metal air column hole and the metal nano-ring group are coaxial. The invention effectively solves the problem that the nano round hole array prepared on the glass substrate corresponds to two transmission peaks in one array period of the ultraviolet band, and has high flexibility; and the nano round hole array can obtain the peak transmittance of more than 50% in the 200-400nm wave band, thereby solving the problem of low transmittance of the nano round hole array in the ultraviolet wave band.
Description
Technical Field
The invention belongs to the field of optical micro-nano structure design and integration of an optical micro-nano structure and a photoelectric detector, and particularly relates to an ultraviolet filtering structure based on a nanoring patterned interface and a design method thereof.
Background
The traditional ultraviolet filtering structure is a multilayer film formed by alternately stacking high-refractive index and low-refractive index media on a substrate, and the principle of selective transmission is that light with specific wavelength generates interference phase growth when propagating in a multilayer dielectric film with specific thickness, and light with the rest wavelengths is absorbed by the multilayer film to be cut off. The multilayer film ultraviolet filtering structure designed and manufactured based on the principle has two characteristics:
1. the ultraviolet filter structure is very sensitive to the thickness of a film layer, different film layer thicknesses correspond to different transmission center wavelengths, although the transmission center wavelength of the ultraviolet filter structure can be adjusted by changing the thickness of the film layer, once the thickness of the film layer is determined, the transmission center wavelength of a multilayer film is also determined, and a plurality of transmission center wavelengths cannot be obtained under the condition of one film layer thickness;
2. the cut-off bandwidth is narrow, and the cut-off band only covers the visible light band, namely 400-800 nm. The narrow cut-off bandwidth enables the multilayer film ultraviolet filtering structure to be additionally overlapped with a near infrared cut-off filter in silicon-based ultraviolet detection application needing to cut off visible-near infrared bands, and therefore transmitted light energy is reduced. Therefore, the two characteristics of the multilayer film ultraviolet filtering structure severely limit the application of the multilayer film ultraviolet filtering structure in a silicon ultraviolet detector and are not beneficial to manufacturing a miniaturized ultraviolet detection system.
When the metal film with optical thickness is etched with the periodically arranged nano-hole array penetrating through the film, the surface of the film can be excited to have a surface plasma resonance mode, so that a selective transmission phenomenon is generated. The excited surface plasmon resonance mode of the nanopore array of metal is related to the characteristics of the metal material. The nano-pore array of Al can be excited in a surface plasmon resonance mode in the ultraviolet band of 200-400nm, and therefore can be used as an ultraviolet filtering structure. Compared with the traditional multilayer film ultraviolet filtering structure, the Al nano-hole array ultraviolet filtering structure changes the transmission center wavelength by adjusting the array period, so that nano-hole arrays with different periods can be etched on an Al thin film with the same optical thickness to obtain a plurality of transmission center wavelengths. Meanwhile, based on the intrinsic characteristics of metals, the Al nanopore array ultraviolet filter structure has high reflectivity in the visible-near infrared band of 400-1000nm in longer wavelength, wide cut-off bandwidth is very easy to realize, and the Al nanopore array ultraviolet filter structure can be directly applied to a silicon ultraviolet detector without combining with a near infrared cut-off filter. The Al nanopore array ultraviolet filtering structure designed based on the surface plasmon resonance principle has the characteristics of small volume and easy integration, and can expose a head corner in a silicon-based ultraviolet detection system developing towards miniaturization.
Although the Al nanopore array can be used as an ultraviolet filtering structure, one array period usually corresponds to two transmission peaks due to different refractive indexes of media on two sides when the Al nanopore array is prepared on a common glass substrate: a major transmission peak associated with the Al-air interface and a minor transmission peak associated with the Al-glass substrate interface. The existence of the transmission sub-peak can reduce the cut-off bandwidth to a certain extent and influence the application of a narrow ultraviolet band such as a 240-plus 280nm solar blind ultraviolet band, so that the elimination of the transmission sub-peak and the acquisition of a single transmission peak have important application value.
Currently, when Al nanopore arrays are used as visible-near infrared band filtering structures, the refractive index is typically matched by depositing a dielectric layer thereon having the same or similar refractive index as the glass substrate to obtain a single transmission peak. However, most media have absorption in the ultraviolet band, resulting in a lower single transmission peak to peak transmission of only around 20% obtained by index matching methods. Researchers design a waveguide array ultraviolet filtering structure of the Al nanopore, and obtain a single transmission peak of an ultraviolet band by using a metal waveguide cutoff principle, wherein the transmissivity at 290nm is 27%, and the cutoff band is 375-1000 nm; still another researcher prepares the Al nanopore array on a polysilicon substrate, and obtains a single transmission peak in the ultraviolet band by using the high refractive index of silicon, with a transmittance of 21% at 276nm and a cutoff band of 370-1000 nm. These studies indicate that the method of obtaining a single transmission peak and high transmittance in the ultraviolet band by using the Al nanopore array is a hot point of research, but the progress achieved to date is relatively limited.
Disclosure of Invention
Aiming at the problems of transmission sub-peak and low transmissivity when the conventional nanopore array is used as an ultraviolet filtering structure, the invention provides an ultraviolet filtering structure based on a nanoring patterned interface and a design method thereof.
The structure is characterized in that an Al nano circular ring is introduced into each circular hole in an Al nano circular hole array on a flat Al-glass substrate interface of the Al nano circular hole array prepared on a glass substrate to form an ultraviolet filtering structure with the Al-glass substrate interface patterned by the Al nano circular ring. The structure can realize single-peak transmission of 200-400nm ultraviolet band with the transmittance exceeding 50 percent, and the broadband cutoff of 400-1000nm visible-near infrared band, thereby not only solving the problem of obtaining single transmission peak of the Al nanopore array ultraviolet filtering structure on the glass substrate, but also providing high transmittance and meeting the requirement of a silicon ultraviolet detector on high transmittance of the ultraviolet filtering element.
The purpose of the invention is realized by the following technical scheme:
an ultraviolet filtering structure based on a nano-patterned interface comprises a metal nano-pore array arranged on a glass substrate, wherein the metal nano-pore array comprises a plurality of basic units;
the basic unit comprises a metal air column hole and a group of nanorings; the metal air column hole penetrates through a metal film on the glass substrate, and the nano-ring group is positioned above the interface of the glass substrate and consists of a plurality of concentric nano-rings; the metal air column hole and the nano-ring group are coaxial.
Furthermore, a plurality of basic units are periodically arranged in a triangular close-packed mode to form a nanopore array, and the array period is T.
Further, the nanoring set comprises a first nanoring and a second nanoring; the first nanoring is arranged on the outer side of the air cylindrical hole, and the second nanoring is arranged on the outer side of the first nanoring and has a certain distance with the first nanoring.
Further, the metal nanoring is an Al nanoring or other metal nanoring except for Al, and the shape of the ring is circular or other shapes except for circular.
Further, the structure has unimodal transmission at the ultraviolet band of 200-400nm, and the transmissivity exceeds 50%, so that the broadband of 400-1000nm visible-near infrared band is cut off.
The invention also relates to a design method of the ultraviolet filtering structure, which comprises the following steps:
step (1) calculating a target wavelength lambda of a main transmission peak by utilizing a metal periodic nanopore array surface plasmon resonance formula0Array period T required when corresponding metal-air interface upper surface plasma resonance mode is excited；
Step (2) calculating excited approximate target wavelength lambda on the nanoring group by utilizing a nanoring plasma resonance formula0Of the resonant wavelength λrThe desired effective perimeter L of the nanoring seteff；
Step (3) according to the ring width CrDetermining the ring width C in relation to the array period TrA maximum value;
step (4) according to the effective perimeter L of the nanoring groupeffRing width CrCalculating the characteristic geometric length of the innermost ring of the nanoring group according to the number N of rings;
determining the characteristic geometric length of the air column according to the characteristic geometric length of the innermost ring of the nanoring set;
step (6), calculating the depth of the air column hole;
calculating the air column hole depth to ensure the acquisition of high transmittance;
and (7) establishing the light filtering structure simulation model by taking the parameters given in the steps (1) to (6) as initial values, and finely adjusting the parameters to determine the parameter values of all sizes of the structure.
Further, in the step (1), the target wavelength λ0The value range of (1) is 200-400nm, and the value range of the period T is 180-380 nm; in step (2), the approximate target wavelength λ is determined to ensure acquisition of a single transmission peak0Of the resonant wavelength λrIs referred to as λrThe value range of (A) is required to satisfy lambda0-λr|≤15nm。
Further, in the step (3), the ring width CrThe relationship with the array period T needs to satisfy 0<Cr≤T/20。
Further, in the step (4), the nanoring group is an Al nanoring group, and the effective circumference calculation formula is Leff＝πdeff＝π[d+(2N-1)Cr]。
Further, in the step (5), the nanoring group is an Al nanoring group, the Al air column hole is an Al air column hole, the characteristic geometric dimension of the Al nanoring group is the inner diameter D of the innermost ring, and the relationship with the diameter D of the Al air column hole is required to satisfy that D is less than or equal to D;
in step (6), CrAnd CdThe relationship of (A) to (B) must satisfy Cr＝Cd，CrAnd ChThe relationship (C) is required to satisfy 1. ltoreq. Ch/CrLess than or equal to 3; the relation between h and D is required to satisfy 0.5-1 h/D.
Compared with the prior art, the invention has the following beneficial effects:
(1) the ultraviolet filtering structure utilizes the Al nano circular ring to pattern a flat Al-glass substrate interface, eliminates the transmission secondary peak, and effectively solves the problem that an Al nano circular hole array prepared on the glass substrate corresponds to two transmission peaks in one array period of an ultraviolet band.
(2) The size parameter of the ultraviolet filtering structure can be designed by using the design method according to the target transmission center wavelength, so that the flexibility is high; and the Al nano round hole array can obtain the peak transmittance of more than 50% in the 200-400nm wave band, thereby solving the problem of low transmittance of the Al nano round hole array in the ultraviolet wave band.
(3) The ultraviolet filtering structure provides high reflectivity of more than 80% of 500-1000nm visible-near infrared, and can reflect visible light emitted backwards by a conversion film into forward emission when being integrated in a silicon-based ultraviolet detector based on the technical route of the ultraviolet filtering structure, the ultraviolet-visible light conversion film and a silicon photoelectric detector; compared with the absorption of a multilayer film structure to visible light, the high-reflectivity characteristic of the ultraviolet filtering structure in the visible light band can greatly improve the visible light energy utilization rate of the conversion film.
(4) The applicable waveband range of the relationship between the size parameters in the design method can be expanded from the ultraviolet 200-400nm waveband to the visible-near infrared 400-1000nm waveband; therefore, the ultraviolet filtering structure and the design method thereof can be applied to design filtering structures with single transmission peak and high transmittance in other wave bands in an expanded way.
Drawings
FIG. 1 is a bird's eye view and related parameters of an Al nano circular hole array ultraviolet filtering structure on a glass substrate with an Al-glass substrate interface patterned by Al nano circular rings designed in example 1
FIG. 2 is a schematic three-dimensional cross-sectional view of the basic cell structure of the array and related parameters in example 1, wherein the dimensions of the rings and holes are not scaled up to scale for ease of illustration.
Fig. 3 is a comparison graph of simulated transmission spectra of the Al nano circular hole array ultraviolet filtering structure with the Al nano circular ring patterned Al-glass substrate interface designed in example 1 and the Al nano circular hole array with the Al-glass substrate interface not patterned under the same array parameters.
Fig. 4 is a comparison graph of simulated reflection spectra of the Al nano circular hole array ultraviolet filtering structure with the Al nano circular ring patterned Al-glass substrate interface designed in example 1 and the Al nano circular hole array with the Al-glass substrate interface not patterned under the same array parameters.
Fig. 5 is a schematic diagram and a main light energy path of the ultraviolet filter structure designed in embodiment 1 integrated in a silicon-based ultraviolet detector based on the technical route of "ultraviolet filter structure + ultraviolet-visible light conversion film + silicon photodetector".
Fig. 6 is a flowchart of a method for designing an ultraviolet filtering structure according to the present invention.
Detailed Description
The technical solutions in the embodiments will be described clearly and completely with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the examples without making any creative effort, shall fall within the protection scope of the present invention.
Unless otherwise defined, technical or scientific terms used in the embodiments of the present application should have the ordinary meaning as understood by those having ordinary skill in the art. The use of "first," "second," and similar terms in the present embodiments does not denote any order, quantity, or importance, but rather the terms are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. "mounted," "connected," and "coupled" are to be construed broadly and may, for example, be fixedly coupled, detachably coupled, or integrally coupled; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. "Upper," "lower," "left," "right," "lateral," "vertical," and the like are used solely in relation to the orientation of the components in the figures, and these directional terms are relative terms that are used for descriptive and clarity purposes and that can vary accordingly depending on the orientation in which the components in the figures are placed.
Example 1
The ultraviolet filtering structure based on the nanoring patterned interface in this embodiment is designed with the Al nanoring to pattern the Al-glass substrate interface with respect to the Al nanoring array structure on the glass substrate, so as to obtain the Al nanoring array ultraviolet filtering structure with a single transmission peak and high transmittance in the 200-plus 400nm band, and the design structure is shown in fig. 1 and 2.
The basic unit structure comprises an Al air cylinder hole and a group of Al nano circular rings. The Al air cylinder hole is positioned in the Al film and penetrates through the Al film, the depth of the Al air cylinder hole is h (namely the thickness of the Al film), and the diameter of the Al air cylinder hole is D. The Al nano ring group is positioned on an Al-glass substrate interface and consists of N concentric Al nano rings; width C of Al nano ringrThe difference between the outer radius and the inner radius of the ring, and the ring depth is ChThe distance between the concentric Al nano circular rings is Cd(ii) a The inner diameter of the innermost ring of the Al nano circular ring group is d. The Al air cylindrical hole and the Al nano ring group are coaxial.
The principle of the ultraviolet filtering structure for obtaining the single transmission peak and the high transmittance is that a surface plasma resonance mode which causes a transmission secondary peak and is excited on a flat Al-glass substrate interface is replaced by a plasma resonance mode which is excited on an Al nano ring resonator, the resonance wavelength of the Al nano ring resonator is made to be close to the resonance wavelength of the surface plasma resonance mode which causes a transmission main peak and is excited on the Al-air interface, so that the single transmission peak in a 200-400nm wave band is obtained, and meanwhile, the depth of the nano round hole is reduced, so that the high transmittance of which the peak transmittance of the single transmission peak exceeds 50% is obtained.
In this embodiment:
(1) calculating target wavelength lambda of main transmission peak by using metal periodic nanopore array surface plasmon resonance formula0The array period T required when the corresponding surface plasma resonance mode on the Al-air interface is excited;
the target wavelength λ0The value range of (1) is 200-400nm, and the value range of the period T is 180-380 nm. The period T calculated by the formula is usually 10-30nm larger than the actually required period.
(2) Calculating excited approximate target wavelength lambda on Al nano circular ring group by using metal nano circular ring plasma resonance formula0Of the resonant wavelength λrEffective perimeter L of the desired Al nanoring seteff；
To ensure that a single transmission peak is obtained, the approach target wavelength λ0Of the resonant wavelength λrIs referred to as λrThe value range of (A) is required to satisfy lambda0-λr|≤15nm。
(3) According to the ring width CrDetermining the ring width C in relation to the array period TrA maximum value;
the ring width C is such that the ring width has nanoring characteristics with respect to the operating bandrThe relationship with the array period T needs to satisfy 0<Cr≤T/20。
(4) Effective perimeter L of Al nano-ring groupeffRing width CrCalculating the inner diameter d of the innermost ring of the Al nano circular ring group according to the number N of rings;
the calculation formula of the effective perimeter of the Al nano circular ring group is Leff＝πdeff＝π[d+(2N-1)Cr]。
(5) Determining the maximum value of the diameter D of the air cylindrical hole according to the relation between the inner diameter D of the innermost ring of the Al nano circular ring group and the diameter D of the air cylindrical hole;
in order to ensure that the Al nano circular ring patterns an Al-glass substrate interface instead of an air-glass substrate interface, the relation between the inner diameter D of the innermost ring of the Al nano circular ring group and the diameter D of the air cylindrical hole needs to satisfy that D is less than or equal to D.
(6) Are respectively according to CrAnd CdRelation of (1), CrAnd ChThe relationship of (a), h and D is Cd，ChH takes a value;
to ensure that a single transmission peak is obtained, CrAnd CdThe relationship of (A) to (B) must satisfy Cr＝Cd，CrAnd ChThe relationship (C) is required to satisfy 1. ltoreq. Ch/CrLess than or equal to 3; in order to ensure high transmittance, the relationship between h and D needs to satisfy h/D is more than or equal to 0.5 and less than or equal to 1;
(7) establishing a simulation model of the filtering structure by taking the parameters given in the steps (1) to (6) as initial values, and finely adjusting the parameters to determine the values of all size parameters of the structure;
according to the experience of artificial parameter adjustment, CrRecommended value is CrT/20, D is D-D, Ch/CrThe recommended value is 1.5, the recommended h/D value is 0.7, and D/T is 0.6.
As shown in fig. 6, taking the 200-400nm band and the single transmission peak wavelength of 250nm as an example, the specific design process of the structural parameters is as follows:
(1) calculating target wavelength lambda of main transmission peak by using metal periodic nanopore array surface plasmon resonance formula0Array period T required when the corresponding surface plasmon resonance mode at the Al-air interface is excited:
here, n isdIs the refractive index of the medium surrounding the metal, where the medium is air, n d1 is ═ 1; target wavelength lambda0Calculated T-227 nm-250 nm. The period T calculated by the formula is usually 10-30nm larger than the actually required period, so the calculated period T is modified to 214 nm.
(2) Calculating excited approximate target wavelength lambda on Al nano circular ring group by using metal nano circular ring plasma resonance formula0Of the resonant wavelength λrEffective perimeter L of the desired Al nanoring seteff：
Here, m is a positive integer and takes a value of 3; n iseffThe effective refractive index is 1.45 of the refractive index of the glass substrate; because of the requirement of lambdarSatisfies | λ0-λrLess than or equal to 15nm to ensure the acquisition of single transmission peak, so as to obtain resonance wavelength lambdarCalculated as L at 240nmeff＝496.55nm。
(3) According to the ring width CrDetermining the ring width C in relation to the array period TrMaximum value:
width of the ring CrThe relation with the array period T satisfies 0<CrT/20 is less than or equal to ensure that the ring width has the characteristics of a nano ring relative to the considered wave band. Period T is 214nm, so maximum ring width Cr＝10.7nm≈10nm。
(4) Effective perimeter L of Al nano-ring groupeffRing width CrAnd calculating the inner diameter d of the innermost ring of the Al nano circular ring group by the ring number N:
the design method provides a calculation formula of the effective perimeter of the Al nano circular ring group, which is as follows:
Leff＝πdeff＝π[d+(2N-1)Cr]
Leff＝496.55nm，Cr10nm and N2, the innermost ring inner diameter d 128nm can be calculated.
(5) Determining the maximum value of the diameter D of the air cylindrical hole according to the relation between the inner diameter D of the innermost ring of the Al nano circular ring group and the diameter D of the air cylindrical hole:
because the relation between the inner diameter D of the innermost ring of the Al nano circular ring group and the diameter D of the air cylinder hole meets the requirement that D is less than or equal to D so as to ensure that the Al nano circular ring patterned Al-glass substrate interface is not the air-glass substrate interface, the maximum value D of the diameter of the air cylinder hole is 128 nm.
(6) Are respectively according to CrAnd CdRelation of (1), CrAnd ChThe relationship of (a), h and D is Cd，ChAnd h takes a value:
Crand CdSatisfy the relationship of (A) to (B)r＝CdThus Cd＝10nm，CrAnd ChRelation 1. ltoreq.Ch/C r3 or less to ensure acquisition of a single transmission peak, hence ChThe relationship of h and D satisfies 0.5 h/D1.5 to ensure high transmittance, 15nm, and thus h 90 nm.
(7) Establishing a simulation model of the filtering structure by taking the parameters given in the steps (1) to (6) as initial values, and finely adjusting the parameters according to a simulation result to determine the parameter values of all sizes of the structure:
according to the parameters determined in the steps (1) to (6), a finite difference time domain method (FDTD) is used for carrying out simulation modeling on the filter structure, the x direction and the y direction of simulation basic units are expanded by a periodic boundary condition to realize array distribution, the period in the x direction is 214nm, and the period in the y direction is 214nm
Realizing infinite propagation of light beams in a perfect matching layer boundary condition in the z direction; the intensity-normalized plane wave propagates along the negative z direction, is perpendicularly incident on the Al nanopore array from the air region, transmits light and is collected in the glass substrate, and reflected light is collected in the air region.
According to the transmittance spectrum obtained by simulation, the adjustment period is 210nm, namely the period in the x direction is 210nm, and the period in the y direction is 210nm
And D is 126nm (in this case, D/T is 0.6), and D is 126nm (in this case, D is D).
After the parameters are adjusted slightly, the designed Al nano circular hole array obtains a single transmission peak with the transmission rate of 50% at 250nm, as shown in FIG. 3. Compared with the Al nano round hole array with the same size parameters directly prepared on the glass substrate, the Al nano round hole array ultraviolet filtering structure eliminates the transmission secondary peak at the position of 330 nm; compared with the Al nano hole array ultraviolet filtering structure reported by the previous people, the Al nano hole array ultraviolet filtering structure provided by the invention has the highest transmittance of 50% under a single transmission peak.
After the parameters are finely adjusted, the designed Al nano round hole array obtains the 400-plus 1000nm visible-near infrared broadband high reflection cutoff effect, as shown in FIG. 4. Compared with the narrow-band absorption cutoff of the traditional ultraviolet filter with the multilayer film structure, the designed ultraviolet filter broadband high-reflection cutoff effect is not only free from a near-infrared cutoff filter, but also can reflect backward visible light emitted by the ultraviolet-visible light conversion film to forward direction when being applied to a silicon-based ultraviolet detector based on the technical route of the ultraviolet filter structure, the ultraviolet-visible light conversion film and the silicon photoelectric detector, so that the detection efficiency of the detector is greatly improved, as shown in fig. 5.
The ultraviolet filtering structure and the design method thereof in the embodiment can be expanded: the circular shapes of the air cylindrical hole and the Al nanometer ring in the ultraviolet filtering structure can be expanded into other shapes, such as square, triangular row, rhombus and the like; the shapes of the air column and the nanoring can be kept consistent or different, for example, the air column hole and the square nanoring form a basic unit; the metal film material Al in the ultraviolet filtering structure can be expanded into other metal materials such as silver (Ag); the metal nano-ring material Al in the ultraviolet filtering structure can be expanded into other materials which can generate plasma resonance phenomenon at 200-400nm, such as Ag, gold (Au), silicon (Si) and the like; the substrate material glass can be extended to other commonly used ultraviolet window materials, such as lithium fluoride (LiF), magnesium fluoride (MgF)2) And the like.
In summary, the above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (9)
1. An ultraviolet filtering structure based on a nano-patterned interface is characterized in that: the metal nano-pore array is arranged on a glass substrate and comprises a plurality of basic units;
the basic unit comprises a metal air column hole and a group of nanorings; the metal air column hole penetrates through a metal film on the glass substrate, and the nano-ring group is positioned above the interface of the glass substrate and consists of a plurality of concentric nano-rings; the metal air column hole and the nano-ring group are coaxial;
the design method of the ultraviolet filtering structure comprises the following steps:
step (1), calculating a target wavelength lambda of a main transmission peak by using a metal periodic nanopore array surface plasmon resonance formula0The array period T required when the corresponding metal-air interface upper surface plasma resonance mode is excited;
step (2), calculating the excited approximate target wavelength lambda on the nanoring group by utilizing the nanoring plasma resonance formula0Of the resonant wavelength λrThe desired effective perimeter L of the nanoring seteff；
Step (3), according to the ring width CrDetermining the ring width C in relation to the array period TrA maximum value;
step (4), according to the effective perimeter L of the nanoring groupeffRing width CrCalculating the characteristic geometric length of the innermost ring of the nanoring group according to the number N of rings;
step (5), determining the characteristic geometric length of the air column according to the characteristic geometric length of the innermost ring of the nanoring group;
step (6), calculating the depth of the air column hole to ensure the acquisition of high transmittance;
and (7) establishing a simulation model of the ultraviolet filtering structure by taking the parameters given in the steps (1) to (6) as initial values, and finely adjusting the parameters to determine the values of all size parameters of the structure.
2. The nanopatterned interface-based ultraviolet filter structure of claim 1, wherein: the plurality of basic units are periodically arranged in a triangular close-packed mode to form a nanopore array, and the array period is T.
3. The nanopatterned interface-based ultraviolet filter structure of claim 1, wherein: the nanoring group comprises a first nanoring and a second nanoring;
the first nanoring is arranged on the outer side of the air cylindrical hole, and the second nanoring is arranged on the outer side of the first nanoring and has a certain distance with the first nanoring.
4. The nanopatterned interface-based ultraviolet filter structure of claim 1, wherein: the metal nano ring is an Al nano ring or other metal nano rings except for Al, and the shape of the ring is circular or other shapes except for circular.
5. The nanopatterned interface-based ultraviolet filter structure of claim 1, wherein: the structure has unimodal transmission at the ultraviolet band of 200-400nm, and the transmissivity exceeds 50%, so that the broadband of the visible-near infrared band of 400-1000nm is cut off.
6. The nanopatterned interface-based ultraviolet filter structure of claim 1, wherein: in the step (1), the target wavelength λ0The value range of the array is 200-400nm, and the value range of the array period T is 180-380 nm; in step (2), the approximate target wavelength λ is determined to ensure acquisition of a single transmission peak0Of the resonant wavelength λrIs referred to as λrThe value range of (A) is required to satisfy lambda0-λr|≤15nm。
7. The nanopatterned interface-based ultraviolet filter structure of claim 1, wherein: in the step (3), the ring width CrThe relation with the array period T needs to satisfy 0 < Cr≤T/20。
8. The nanopatterned interface-based ultraviolet filter structure of claim 1, wherein: in the step (4), the nanoring group is an Al nanoring group, and the effective circumference calculation formula is Leff＝πdeff＝π[d+(2N-1)Cr]。
9. The nanopatterned interface-based ultraviolet filter structure of claim 1, wherein: in the step (5), the nanoring group is an Al nanoring group, the Al air column hole is an Al air column hole, the characteristic geometric dimension of the Al nanoring group is the inner diameter D of the innermost ring, and the relationship with the diameter D of the Al air column hole is required to satisfy that D is less than or equal to D;
in step (6), the ring width CrDistance C between the concentric Al nano-ringsdThe relationship of (A) to (B) must satisfy Cr＝CdRing width CrAnd ring depth ChThe relationship (C) is required to satisfy 1. ltoreq. Ch/CrLess than or equal to 3; the relationship between the depth h and the diameter D of the Al air cylindrical hole needs to satisfy that h/D is more than or equal to 0.5 and less than or equal to 1.
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