CN112833658B

CN112833658B - Cleaning and drying device

Info

Publication number: CN112833658B
Application number: CN202011568238.6A
Authority: CN
Inventors: 王昭; 马宏帅
Original assignee: Beijing Naura Microelectronics Equipment Co Ltd
Current assignee: Beijing Naura Microelectronics Equipment Co Ltd
Priority date: 2020-12-25
Filing date: 2020-12-25
Publication date: 2022-09-16
Anticipated expiration: 2040-12-25
Also published as: CN112833658A

Abstract

The embodiment of the application discloses a cleaning and drying device, and relates to the technical field of cleaning and drying in semiconductor production. A washing and drying device comprising: the drying tank is communicated with the cleaning tank and encloses a working cavity; introducing a drying gas into the drying tank, and introducing a cleaning liquid into the cleaning tank; the cleaning and drying device also comprises a lifting assembly, the lifting assembly comprises a lifting arm and a supporting piece, and the supporting piece is positioned in the working cavity; the lifting arm comprises a driving end and a connecting end, the driving end is located outside the working cavity, the connecting end is located in the working cavity, the connecting end is connected with the supporting piece, and the driving end is used for being connected with a power source so as to drive the supporting piece to move between the drying tank and the cleaning tank; seal assembly includes seal receptacle and sealing member, and the seal receptacle is connected in dry groove, and the seal receptacle is movably worn to locate by the lifing arm, and the sealing member sets up between lifing arm and seal receptacle. The technical problem that IPA steam leaked has effectively been alleviated to a washing drying device that this application embodiment disclosed.

Description

Cleaning and drying device

Technical Field

The application relates to the technical field of cleaning and drying in semiconductor production, in particular to a cleaning and drying device.

Background

The wet cleaning is a wafer cleaning technology widely applied to semiconductor production, and the main flow is that a silicon wafer sequentially passes through a tank body filled with chemical liquid medicine or deionized water to remove pollutants such as organic matters, a natural oxidation layer, metal ions and the like attached to the surface of the wafer, then the silicon wafer is immersed into a drying tank filled with IPA (isopropyl alcohol), the low surface tension and the volatility of IPA are utilized to replace the moisture of the surface tension of the wafer, and then the IPA is dried by hot nitrogen to achieve the effect of thoroughly drying the wafer. However, the IPA liquid is a third-level carcinogen, is volatile, and is mixed with air after volatilization to form an explosive mixture, once the IPA leaks into the air, the IPA liquid causes great harm to human bodies and the surrounding environment, and therefore how to prevent the IPA from diffusing in the cleaning and drying process becomes the most important point in the design of the wet cleaning and drying tank.

Based on the above problems, it is very important to provide a cleaning and drying apparatus capable of effectively relieving IPA leakage.

Disclosure of Invention

An object of the embodiments of the present application is to provide a cleaning and drying apparatus for alleviating the technical problem of IPA leakage.

In order to solve the above technical problem, the embodiment of the present application is implemented as follows:

in one aspect, an embodiment of the present application provides a cleaning and drying device for a semiconductor device, including: the device comprises a drying tank, a cleaning tank and a sealing assembly, wherein the drying tank is communicated with the cleaning tank and encloses a working cavity for cleaning and drying a workpiece to be processed; gas is introduced into the drying tank to dry the workpiece to be processed, and liquid is introduced into the cleaning tank to clean the workpiece to be processed;

the cleaning and drying device further comprises a lifting assembly, the lifting assembly comprises a lifting arm and a supporting piece, and the supporting piece is located in the working cavity and used for bearing the workpiece to be processed; the lifting arm comprises a driving end and a connecting end, the driving end is located outside the working cavity, the connecting end is located in the working cavity, the connecting end is connected with the supporting piece, and the driving end is used for being connected with a power source so as to drive the supporting piece to move between the drying tank and the cleaning tank;

the sealing assembly comprises a sealing seat and a sealing piece, the sealing seat is connected to the drying groove, the lifting arm movably penetrates through the sealing seat, and the sealing piece is arranged between the lifting arm and the sealing seat and used for sealing the working cavity.

Further, the sealing seat comprises a sealing plate and a fixing piece;

the outer wall of the drying groove is provided with a fixing part, the sealing plate is connected to the fixing part, and the fixing part is fixed on the sealing plate;

the fixing piece is provided with a first through hole for the lifting arm to penetrate through, the sealing piece is embedded in the first through hole, and the sealing plate is provided with a second through hole opposite to the first through hole.

Further, the fixing part is provided with a fixing end face perpendicular to the lifting direction of the lifting arm, the sealing plate comprises a first sealing plate and a second sealing plate, and the first sealing plate is fixed on the fixing end face;

the first sealing plate is provided with an accommodating groove, and the second sealing plate is arranged in the accommodating groove;

the first sealing plate is provided with a first notch, the second sealing plate is provided with a second notch, and the first notch and the second notch are jointly enclosed to form the second through hole.

Furthermore, the first sealing plate is made of PVDF (polyvinylidene fluoride);

and/or the second sealing plate is made of PVDF material;

and/or the sealing element is made of PTFE material.

Furthermore, the cleaning and drying device also comprises an air exhaust assembly and an overflow trough;

a flow channel is formed between the drying tank and the cleaning tank and is communicated with the overflow tank;

the air pumping assembly is communicated with the overflow groove.

Further, the air extraction assembly comprises an air extraction pipeline and a first valve body, one end of the air extraction pipeline is communicated with the overflow groove, the other end of the air extraction pipeline is communicated with one end of the first valve body, and the other end of the first valve body is used for being communicated with an air extraction source; the first valve body is used for opening or closing the air pumping pipeline.

Further, the first valve body comprises an air pumping box, a driving piece and a plug, the air pumping box is communicated with the air pumping source and the air pumping pipeline respectively, the driving piece and the plug are arranged in the air pumping box, the driving piece is connected with the plug, and the driving piece is configured to drive the plug to open or close the air pumping pipeline.

Further, a second valve body for adjusting the gas flow is arranged on the gas extraction pipeline;

the second valve body comprises a separation blade and an adjusting knob which are connected, the separation blade is arranged in the air extraction pipeline in a turnable manner, the adjusting knob partially extends out of the air extraction pipeline, and the blocking area of the separation blade on the air extraction pipeline is changed by adjusting the adjusting knob.

Further, the cleaning and drying device also comprises a controller; be equipped with on the aspirating pipeline and be used for detecting the first detecting element of wind pressure or the amount of wind in the aspirating pipeline, first detecting element with controller electrical connection, and/or, be equipped with the second detecting element who is used for detecting gas pressure in the dry slot, second detecting element with controller electrical connection, the controller is through acquireing that the second detecting element detects atmospheric pressure signal in the dry slot controls the driving piece drive the end cap is opened or is sealed the aspirating pipeline.

Further, the air exhaust pipeline comprises an air exhaust pipe and a connecting pipe, the air exhaust pipe is located in the overflow groove, a plurality of air inlets are formed in the air exhaust pipe, the connecting pipe is arranged outside the overflow groove, one end of the connecting pipe is connected with the air exhaust pipe, and the other end of the connecting pipe is connected with the first valve body.

The embodiment of the application provides a pair of wash drying device, set up seal assembly on the drying trough, make the one end of lifing arm pass seal assembly and then get into the inside of working chamber, and be connected with the inside support piece of working chamber, and be equipped with the sealing member between lifing arm and the seal receptacle, so, can be to comprehensively sealed between lifing arm and the seal receptacle through the sealing member, thereby, when lifing arm drives support piece and removes, the gas in the drying trough can't be followed and the lifing arm is revealed around, the complete sealing to the drying trough has been guaranteed. Compared with the mode that a gap is reserved between the wafer supporting cantilever and the drying groove in the related art so that the supporting piece can rise, the embodiment of the application ensures that the lifting arm can drive the supporting piece to move between the drying groove and the cleaning groove, meanwhile, the gap does not exist between the lifting arm and the drying groove, the sealing performance of the working cavity is ensured, and then the problem that gas in the drying groove leaks outwards is relieved.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below, it is obvious that the drawings in the following description are only some embodiments described in the present application, and for those skilled in the art, other drawings can be obtained according to the drawings without any creative effort.

Fig. 1 is a first perspective view of a washing and drying apparatus in the related art;

fig. 2 is a second perspective view of the washing and drying apparatus in the related art;

FIG. 3 is an enlarged view of a portion of FIG. 2 at A;

FIG. 4 is a first perspective view of a washer dryer apparatus according to an embodiment of the present application;

FIG. 5 is a second perspective view of a washer dryer apparatus according to an embodiment of the present application;

FIG. 6 is a partial enlarged view at B in FIG. 5;

FIG. 7 is a disassembled schematic view of a housing and seal assembly of a washer dryer apparatus according to an embodiment of the present application;

FIG. 8 is a partial cross-sectional view of a washer dryer apparatus according to one embodiment of the present application;

FIG. 9 is an enlarged view of a portion of FIG. 8 at C;

fig. 10 is a cross-sectional view of the suction line in a washer dryer apparatus at the second valve body according to an embodiment of the present application.

Description of reference numerals:

1-a groove cover; 2-drying the tank; 3-nitrogen gas spray pipe; 4-an overflow trough; 5-an overflow trough water outlet; 6, cleaning a tank; 7-water injection port; 8-a quick-release valve; 9-a support; 10-a wafer; 11-a lifter; 12-IPA shower; 13-wafer support cantilever;

100-a housing; 110-a drying tank; 111-a fixed end face; 120-a cleaning tank; 130-an overflow trough; 131-a water outlet; 140-a flow channel; 150-a cover; 160-hot nitrogen sparge pipes; 170-water injection port; 180-quick discharge valve; 190-IPA spray pipe;

200-a lifting assembly; 210-a lifting arm; 211-a drive end; 212-a connection end; 220-a support;

300-a seal assembly; 310-a sealing seat; 311-a first sealing plate; 3111-a receiving tank; 3112-a first notch; 312 — a second seal plate; 3121-second gap; 313-a fixture; 3131 — a first through hole; 320-a seal;

410-a first fastener; 420-a second fastener; 430-a third fastener;

500-a pumping assembly; 510-a suction line; 511-an air exhaust pipe; 512-connecting pipe; 5121-main tube; 5122-manifold; 5123-a linker; 520-a first valve body; 521-an air extracting box; 522-a drive member; 523-plug; 524-a sealing gasket; 530-a second valve body; 531-baffle plate; 532-adjusting knob; 533-dial; 540-a first detection element; 550-an air extraction source; 561-inlet connection; 562-an inlet line; 571-an exhaust joint; 572-exhaust line; 580-fixed mount.

Detailed Description

In order to make those skilled in the art better understand the technical solutions in the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.

The specific structure of the cleaning and drying apparatus in the related art is shown in fig. 1, and mainly includes a tank cover 1, a drying tank 2, a nitrogen shower 3, an overflow tank 4, an overflow tank drain outlet 5, a cleaning tank 6, a water injection port 7, a quick drain valve 8, a support 9 for supporting a wafer 10, a lifter 11, an IPA shower 12, and the like, when performing the cleaning and drying process, firstly, deionized water is injected into the cleaning tank 6 from the water injection port 7 below until the cleaning tank 6 is filled, and then, excessive deionized water flows into the overflow tank 4 from a gap between the drying tank 2 and the cleaning tank 6 and is discharged from the overflow tank drain outlet 5.

Then, the tank cover 1 is opened, the lifter 11 rises into the drying tank 2, at this time, the wafer 10 does not exist on the supporting piece 9, then, a process manipulator (not shown in the figure) places the wafer 10 after the process is finished on the supporting piece 9, and the lifter 11 drives the supporting piece 9 to descend into the cleaning tank 6; after the wafer 10 is completely immersed in the deionized water, a large amount of IPA is injected into the IPA spray pipe 12, so that the drying tank 2 is filled with IPA vapor; after that, the lifter 11 starts to ascend slowly, and the nitrogen shower 3 starts to shower hot nitrogen gas when the wafer 10 starts to expose the water surface. Because the surface tension of the IPA is much lower than that of the deionized water, according to the marangoni effect, the fluid (deionized water) with large surface tension can generate a pulling force on the fluid (IPA) with small surface tension around the fluid (deionized water), so that the deionized water flows from the direction with low surface tension (the drying tank 2) to the direction with high tension (the cleaning tank 6), that is, the IPA can "drive" the water on the wafer 10 to flow downwards, and thus no water residue is left on the surface of the wafer 10; the spraying of the hot nitrogen can quickly evaporate residual IPA on the surface of the wafer 10, so that the surface of the wafer 10 is completely dried after the wafer 10 is separated from the cleaning tank 6; and finally, opening the quick discharge valve 8 to quickly discharge the deionized water in the cleaning tank 6.

The key point for realizing the cleaning and drying process is that a large amount of IPA gas needs to be sprayed rapidly when the wafer is immersed in deionized water, so that the whole drying tank 2 is completely filled with IPA steam and does not leak IPA, the wafer can be contacted with the IPA steam immediately after being separated from the water surface, and the purpose of drying the wafer by better utilizing the Marangoni effect is achieved.

However, the above-mentioned washing and drying apparatus has the following disadvantages:

1) as shown in fig. 2 and 3, the support 9 is inside the drying tub 2, and the lifter 11 is outside the drying tub 2, and they are connected by a wafer support cantilever 13, and the wafer support cantilever 13 is connected to the lifter 11 through the drying tub 2. In order to ensure that the wafer supporting cantilever 13 can normally rise from the cleaning tank 6 to the drying tank 2, the drying tank 2 must leave a gap Y for the wafer supporting cantilever 13 to rise, so that the drying tank 2 cannot be completely sealed, and therefore, the index of organic gas around the machine table exceeds the standard due to a large amount of leaked IPA gas, and the IPA gas has flammability, which may cause serious damage to personal and property safety when being gathered in a large amount.

2) As shown in fig. 1, a gap is left between the drying tank 2 and the cleaning tank 6, so that the deionized water in the cleaning tank 6 can enter the overflow tank 4 to overflow. However, during drying, a large amount of IPA is filled in the drying tank 2, so that the air pressure in the drying tank 2 is increased rapidly, and IPA enters the overflow tank 4 along a gap, so that the air pressure in the overflow tank 4 is increased to influence overflow, and IPA is dissolved in a large amount of overflow water, and because the overflow water is discharged to a plant service end at last, the large amount of IPA dissolved in the overflow water may cause pollution of plant deionized water.

Referring to fig. 4 to 10, an embodiment of the present application provides a cleaning and drying apparatus, including a housing 100, a lifting assembly 200, and a sealing assembly 300, where the housing 100 includes a drying tank 110 and a cleaning tank 120 that are communicated with each other, the drying tank 110 and the cleaning tank 120 enclose a working chamber for cleaning and drying a workpiece to be processed, and the working chamber is a sum of an inner cavity of the drying tank 110 and an inner cavity of the cleaning tank 120. Alternatively, the drying tub 110 is located at an upper region of the cabinet 100, and the washing tub 120 is located at a lower region of the cabinet 100. The cleaning tank 120 is used for containing liquid for cleaning a workpiece to be processed, that is, cleaning solution, such as chemical liquid or deionized water, preferably deionized water in this embodiment, and by immersing the workpiece to be processed into deionized water in the cleaning tank 120 for cleaning, pollutants such as organic matters, a natural oxide layer, metal ions and the like attached to the surface of a wafer can be cleaned, and the workpiece to be processed in this embodiment is preferably a wafer; the drying tank 110 is used to accommodate a drying medium. Alternatively, the drying medium is IPA (isopropyl alcohol) vapor, and after the wafer is washed by the deionized water, the wafer is immersed in the drying tank 110 filled with the IPA vapor, so that the IPA has low surface tension and volatile characteristics, so that the IPA can replace moisture with high surface tension on the surface of the wafer; in order to accelerate the drying speed of the surface of the wafer, hot nitrogen can be used for drying IPA on the surface of the wafer, so that the effect of thoroughly drying the wafer is achieved.

In order to immerse the wafer in the deionized water in the cleaning tank 120 and separate the wafer from the cleaning tank 120 and enter the drying tank 110, in the embodiment, a lifting assembly 200 is provided, specifically, the lifting assembly 200 includes a lifting arm 210 and a support member 220, the lifting arm 210 is disposed from top to bottom, and a lower end of the lifting arm 210 penetrates into the working chamber from a sidewall of the drying tank 110, that is, the lifting arm 210 penetrates into the drying tank 110 from the sidewall of the drying tank 110, since the lifting arm 210 can move in an up-down direction, and the drying tank 110 and the cleaning tank 120 are communicated with each other and arranged up and down, the lifting arm 210 can penetrate into the cleaning tank 120 from the drying tank 110. Further, a support member 220 is disposed in the working chamber, and the support member 220 is used for carrying a workpiece to be processed. The lifting arm 210 includes a driving end 211 located outside the working chamber and a connecting end 212 located inside the working chamber, wherein the connecting end 212 is connected to the supporting member 220, and the driving end 211 is connected to an external power source. Thus, under the driving action of the power source, when the lifting arm 210 moves up and down, the supporting member 220 is driven to move up and down synchronously, so that the supporting member 220 moves up and down between the drying tank 110 and the cleaning tank 120.

Considering that the driving end 211 of the lifting arm 210 is located outside the working chamber and the connecting end 212 is located inside the working chamber, a hole for inserting the lifting arm 210 needs to be opened on the sidewall of the housing 100, and no gap exists between the lifting arm 210 and the sidewall of the housing 100, so as to prevent the IPA vapor in the working chamber from leaking out from the gap between the lifting arm 210 and the housing 100. Based on this, in the embodiment of the present application, the seal assembly 300 is additionally provided between the lift arm 210 and the side wall of the housing 100, and the seal assembly 300 can seal between the lift arm 210 and the housing 100, thereby effectively preventing the IPA from leaking out. The method comprises the following specific steps:

the sealing assembly 300 comprises a sealing seat 310 and a sealing member 320, wherein the sealing seat 310 is fixed on the outer wall of the drying tank 110, the lifting arm 210 sequentially passes through the sealing seat 310 and the outer wall of the drying tank 110, and the sealing member 320 is arranged between the sealing seat 310 and the lifting arm 210, because the sealing seat 310 is fixedly connected with the casing 100, a gap between the lifting arm 210 and the casing 100 is almost completely sealed, and a gap between the lifting arm 210 and the sealing seat 310 is sealed by the sealing member 320, therefore, when the lifting arm 210 moves up and down along the up-and-down direction, a contact relation exists between the lifting arm 210 and the sealing member 320, other positions are sealed, and further, IPA steam in the working chamber cannot leak outwards from the space between the lifting arm 210 and the sealing assembly 300. Therefore, by providing the sealing assembly 300 on the outer wall of the drying tub 110, the gap between the housing 100 and the lifting arm 210 is completely sealed, and exposure of IPA vapor in the working chamber is effectively prevented.

Compare and support through the wafer among the correlation technique and be connected through the wafer support cantilever between lift and the support piece, and leave the mode that supplies the ascending clearance of wafer support cantilever between wafer support cantilever and the drying bath 110, need not to set up wafer support cantilever in the embodiment of this application, and need not to leave the clearance that supplies support cantilever to remove on the lateral wall of drying bath 110, accomplished the complete sealing to drying bath 110, therefore, the IPA steam in the work chamber can hardly leak, the problem that the organic gas index exceeds standard around the board has effectively been alleviated, greatly reduced because IPA steam reveals and cause the risk of serious harm to personal and property safety.

In some alternative embodiments, seal holder 310 includes a seal plate and a retainer 313. In order to fix the seal holder 310 to the outer wall of the drying tub 110, a fixing portion may be provided on the outer wall of the drying tub 110, and the fixing portion may have a stepped surface or the like. The sealing plate is mounted at the fixing portion, and the fixing member 313 is fixed to the sealing plate, thereby achieving a fixed connection between the sealing seat 310 and the outer wall of the drying tub 110. In order to mount the lifting arm 210, a first through hole 3131 is formed in the fixing member 313, and the sealing member 320 is disposed in the first through hole 3131 for the lifting arm 210 to pass through. The sealing plate is provided with a second through hole opposite to the first through hole 3131, so that the lifting arm 210 can sequentially pass through the first through hole 3131, the second through hole and the fixing portion, so that the connecting end 212 of the lifting arm 210 penetrates into the working chamber and is connected with the supporting member 220.

Referring to FIG. 7, in one particular embodiment, the seal plates include a first seal plate 311 and a second seal plate 312. Optionally, the fixing portion has a plane perpendicular to the up-down direction, the first sealing plate 311 is disposed on the plane and fixedly connected to the fixing portion, the second sealing plate 312 is fixedly connected to the first sealing plate 311, the two sealing plates together form a structure similar to a base, the fixing member 313 is disposed on the first sealing plate 311 and the second sealing plate 312, one side of the fixing member 313 is connected to the first sealing plate 311, and the other side is connected to the second sealing plate 312, so that the first sealing plate 311, the second sealing plate 312 and the fixing member 313 are spliced together to form the sealing seat 310.

It should be noted here that the first sealing plate 311 is fixed at the fixing portion of the outer wall of the drying tub 110, and there is almost no assembly gap between the two within a reasonable assembly error range; the second sealing plate 312 is fixed on the first sealing plate 311, and there is almost no assembly gap between the two within a reasonable assembly error range; the fixing member 313 is fixed to both the first sealing plate 311 and the second sealing plate 312, and there is almost no assembly gap between the fixing member 313 and the first sealing plate 311 and between the fixing member 313 and the second sealing plate 312 within a reasonable assembly error range. In this way, the IPA vapor in the drying tank 110 cannot leak out from between the first seal plate 311 and the casing 100, between the second seal plate 312 and the first seal plate 311, and between the fixing member 313 and the first seal plate 311 and the second seal plate 312, and the sealing performance between the casing 100 and the seal holder 310 is ensured; meanwhile, the sealing member 320 seals between the fixing base and the lifting arm 210, so that the IPA vapor in the drying container 110 is hardly leaked from the lifting arm 210.

Referring to fig. 7, the fixing portion has a fixing end surface 111 perpendicular to the lifting direction of the lifting arm 210, and specifically, the upper right corner of the drying tub 110 is recessed toward the inside of the drying tub 110, where a step structure is formed, the step structure has a vertical surface and a horizontal surface, wherein the horizontal surface is the fixing end surface 111 of the fixing portion, and the first sealing plate 311 is fixed on the fixing end surface 111. Further, a mounting hole is formed on the fixed end surface 111, and correspondingly, a mounting hole is formed on the first sealing plate 311. When the sealing device is installed, the first sealing plate 311 is placed on the fixed end surface 111, so that the installation hole position on the first sealing plate 311 is aligned with the installation hole position on the fixed end surface 111, the first fastening piece 410 penetrates through the first sealing plate, and the first sealing plate 311 is firmly fixed on the fixed end surface 111 through the matching of the first fastening piece 410 and the installation hole position on the fixed end surface 111.

In order to fix the second sealing plate 312 to the first sealing plate 311, the first sealing plate 311 is provided with a receiving groove 3111. Specifically, the first sealing plate 311 may be a rectangular plate, a receiving groove 3111 is formed in a surface of the rectangular plate, and along a width direction of the rectangular plate, a side wall of the receiving groove 3111 is through, that is, a side wall of the receiving groove 3111 is missing, and when the second sealing plate 312 is installed, the first sealing plate 311 may slide into the receiving groove 3111 along the width direction from one end of the first sealing plate 311, so as to improve convenience in installing the second sealing plate 312. Further, an installation hole site is formed in the bottom end surface of the accommodating groove 3111, and correspondingly, an installation hole site is also formed in the second sealing plate 312, so that when the second sealing plate 312 slides into the accommodating groove 3111, the installation hole site in the second sealing plate 312 is aligned with the installation hole site in the bottom end surface of the accommodating groove 3111, and then the second fastening member 420 is inserted, so that the first sealing plate 311 and the second sealing plate 312 are fixedly connected through the second fastening member 420.

In order to allow the lifting arm 210 to pass through the sealing seat 310, a first notch 3112 is provided in the first sealing plate 311, a second notch 3121 is provided in the second sealing plate 312, and the shapes of the first notch 3112 and the second notch 3121 are adapted to the outer surface of the lifting arm 210. When the second sealing plate 312 is fixedly mounted on the first sealing plate 311, the second notch 3121 is just engaged with the first notch 3112, and both of them together form a second through hole. When the fixing member 313 is mounted on the first sealing plate 311 and the second sealing plate 312, the second through hole 3131 is disposed opposite to the first through hole 3131, and at this time, the lower end of the lifting arm 210 sequentially passes through the first through hole 3131, the second through hole, and the housing 100, and finally penetrates into the working chamber.

It should be noted that the shape of the second through hole defined by the first notch 3112 and the second notch 3121 is adapted to the shape of the lifting arm 210, and the size is equivalent, that is, the second through hole plays a role in guiding and limiting the lifting arm 210 to a certain extent, so as to ensure that the lifting arm 210 can perform precise lifting movement in the up-down direction. In addition, when the fixing member 313 includes a plate member and a protrusion protruding from the surface of the plate member, the lifting arm 210 may be inserted into the protrusion of the fixing member 313, and the first notch 3112 and the second notch 3121 are both enclosed outside the protrusion, and at this time, after the first sealing plate 311 and the second sealing plate 312 are fixedly connected, an additional fixing effect can be performed on the fixing member 313, so as to improve the firmness between the fixing member 313 and the first sealing plate 311 and the second sealing plate 312.

Optionally, the lifting arm 210 is a cylinder, the first notch 3112 and the second notch 3121 are arc-shaped grooves, and the sealing element 320 is a ring, that is, a sealing ring, which is embedded between the lifting arm 210 and the fixing element 313 to perform a sealing function.

In order to fix the fixing member 313 to the first sealing plate 311 and the second sealing plate 312, a mounting hole is formed at a position of the first sealing plate 311 close to the first notch 3112, a mounting hole is formed at a position of the second sealing plate 312 close to the second notch 3121, and correspondingly, mounting holes are formed at both sides of the fixing member 313. Therefore, the fixing member 313 is placed on the first sealing plate 311 and the second sealing plate 312, the mounting hole position on the fixing member 313 is aligned with the mounting hole position on the first sealing plate 311 and the mounting hole position on the second sealing plate 312 respectively, then the third fastening member 430 is correspondingly penetrated, and the fixing member 313 is fixedly connected with the first sealing plate 311 and the second sealing plate 312 through the third fastening member 430.

Alternatively, the first fastener 410, the second fastener 420, and the third fastener 430 may be screws, bolts, or the like, and mainly function to fixedly connect the structures, but may also be other members having a connecting function, and the present invention is not limited thereto.

The specific installation process of the sealing assembly comprises the following steps:

first, the first sealing plate 311 is placed on the fixing end surface 111, and the mounting hole position on the first sealing plate 311 is aligned with the mounting hole position on the fixing end surface 111, and the first fastening member 410 is penetrated, and the first sealing plate 311 is firmly fixed on the side wall of the drying tub 110 by the first fastening member 410; placing the fixing member 313 with the sealing member 320 mounted thereon at the first notch 3112 of the first sealing plate 311; placing the second sealing plate 312 in the receiving groove 3111 of the first sealing plate 311, aligning the mounting hole position on the second sealing plate 312 with the mounting hole position on the first sealing plate 311, penetrating the second fastening member 420, and firmly fixing the second sealing plate 312 to the first sealing plate 311 through the second fastening member 420; the mounting hole locations on the fixing members 313 are aligned with the mounting hole locations on the first sealing plate 311 and the second sealing plate 312, respectively, and the third fastening members 430 are inserted into the mounting hole locations, so that the fixing members 313 are firmly fixed to the first sealing plate 311 and the second sealing plate 312 by the third fastening members 430, thereby completing the mounting of the sealing assembly.

Of course, in other embodiments, the sealing seat 310 may be an integral body, and the integral sealing seat 310 may be provided with a second through hole for passing through the lifting arm 210, and the second through hole may be opposite to the first through hole 3131 of the fixing member 313.

In consideration of the sealing performance of the contact position between the sealing seat 310 and the casing 100 and the sealing performance of the connection position between the parts in the sealing seat 310, in the embodiment of the present application, the first sealing plate 311 is made of PVDF (polyvinylidene fluoride), and the second sealing plate 312 is made of PVDF, which has high toughness, corrosion resistance, aging resistance, fatigue resistance, creep resistance, etc., so that the sealing performance of the connection position is ensured without being easily damaged for a long time.

Considering that the lifting arm 210 needs to move up and down along the up-and-down direction, the sealing element 320 and the lifting arm 210 are in direct contact and have mutual friction and other factors, in the embodiment of the present application, the sealing element 320 is made of PTFE, and the material has an extremely low friction coefficient, good high temperature resistance, good sealing performance, good aging resistance, and the like, and the sealing element 320 made of PTFE is soft, wear-resistant, corrosion-resistant, and not prone to generate particles, so that when moving relative to the lifting arm 210, the sealing element 320 is not easy to damage, and the resistance to the lifting arm 210 is small, thereby not only ensuring good sealing performance with the lifting arm 210, but also reducing the resistance to the lifting arm 210, and facilitating the movement of the lifting arm 210.

Based on the above arrangement, the sealing connection between the sealing seat 310 and the casing 100, the sealing connection of the internal structure of the sealing seat 310, and the sealing between the lifting arm 210 and the sealing seat 310 by the sealing member 320 are performed, so that the region of the casing 100 penetrating into the lifting arm 210 is not easy to leak, and the sealing performance of the drying tank 110 of the casing 100 is ensured.

The specific working process of cleaning and drying the workpiece to be processed in this embodiment is as follows:

introducing deionized water into the cleaning tank 120 from a water inlet 170 below the housing 100 until the cleaning tank 120 is filled, wherein the excess deionized water flows into the overflow tank 130 from a flow passage 140 between the drying tank 110 and the cleaning tank 120 and is discharged from a water outlet 131 at the bottom of the overflow tank 130; opening the cover 150 on the top of the housing 100, starting an external power source, driving the lifting arm 210 to move by the power source, driving the support member 220 to ascend into the drying tank 110 through the lifting arm 210, placing the wafer on the support member 220 by using a process robot (not shown), driving the support member 220 and the wafer thereon to descend into the cleaning tank 120 by the lifting arm 210, so that the wafer is completely immersed into the deionized water, and at this time, introducing a large amount of IPA into the drying tank 110 through the IPA spraying pipe 190, so that the drying tank 110 is filled with IPA vapor; the lifting arm 210 drives the supporting member 220 and the wafer thereon to move upwards, when the wafer begins to expose the liquid level of the deionized water, the hot nitrogen spraying pipe 160 begins to spray hot nitrogen, when the wafer is sprayed, because the surface tension of IPA is far lower than the surface tension of the deionized water, according to the marangoni effect, the fluid (deionized water) with large surface tension can generate a pulling force on the fluid (IPA) with small surface tension around the wafer, so that the deionized water flows from the region with low surface tension (the drying tank 110) to the region with high tension (the cleaning tank 120), i.e., the IPA can "drive" the deionized water on the wafer to flow downwards, thereby causing no water residue on the surface of the wafer; the spraying of the hot nitrogen accelerates the evaporation speed of the residual IPA on the surface of the wafer, so that the surface of the wafer is completely dried after the wafer is separated from the cleaning tank 120; the quick drain valve 180 at the bottom of the housing 100 is opened to drain the deionized water in the cleaning tank 120.

In the above process, since the sealing assembly 300 is disposed on the sidewall of the drying bath 110, and the lifting arm 210 passes through the sealing assembly 300 and then enters the working chamber, the gap between the lifting arm 210 and the housing 100 is completely sealed, so that when the lifting arm 210 drives the supporting member 220 and the wafer thereon to move up and down, the IPA vapor is not leaked from the drying bath 110.

The cleaning and drying apparatus disclosed in this embodiment further includes an air pumping assembly 500 and an overflow tank 130, and a flow channel 140 is formed between the drying tank 110 and the cleaning tank 120. When the amount of the deionized water injected into the cleaning tank 120 is large, the deionized water can flow into the overflow tank 130 through the flow channel 140 and be discharged through the water outlet 131 at the bottom of the overflow tank 130, so that the excessive amount of the deionized water injected into the cleaning tank 120 can be effectively prevented. However, when the working chamber is filled with IPA vapor, the pressure in the working chamber is rapidly increased, and a part of IPA vapor in the working chamber enters the overflow groove 130 along the flow channel 140 under the action of pressure, so that the pressure in the overflow groove 130 is increased, and the IPA vapor is easily dissolved in the overflowing deionized water under the action of pressure, so that the overflowing deionized water is polluted to a certain extent, and certain influence is caused on subsequent collection or discharge.

Above-mentioned IPA steam can cause IPA to outwards reveal along with the deionized water discharge of overflow, outwards reveals in order to alleviate the IPA in the dry tank 110, has add air exhaust subassembly 500 in this application embodiment. Specifically, the pumping end of the pumping assembly 500 is connected to the overflow tank 130, and after the pumping assembly 500 is started, at least a portion of the IPA vapor leaking from the flow channel 140 can be adsorbed, so as to minimize the IPA vapor from being discharged to the outside along with the deionized water through the drain 131 of the overflow tank 130. It should be noted that, since the deionized water flowing into the overflow tank 130 through the flow channel 140 is accumulated in the overflow tank 130, the deionized water has a certain liquid level in the overflow tank 130, and in order to prevent the deionized water from entering the pumping assembly 500, the pumping end of the pumping assembly 500 is connected to the upper position of the overflow tank 130, so that the pumping end is higher than the liquid level in the overflow tank 130. Therefore, the IPA vapor flowing out through the flow channel 140 is first adsorbed by the pumping assembly 500 after entering the overflow tank 130, so that the amount of IPA vapor dissolved into the overflowing deionized water is greatly reduced, and the problem of IPA leakage is effectively alleviated.

Referring to fig. 4, 5, 8 and 9, the pumping assembly 500 includes a pumping line 510, one end of the pumping line 510 is connected to the overflow tank 130, and the other end is connected to a pumping source (not shown), which may be a gas pump, and the pumping source is capable of pumping most of IPA vapor entering the overflow tank 130 into the pumping line 510 and finally collecting the absorbed IPA vapor to prevent the IPA vapor from leaking out. In addition, the pumping assembly 500 further includes a first valve 520, one end of the pumping line 510 is communicated with the overflow tank 130, the other end of the pumping line 510 is communicated with one end of the first valve 520, and the other end of the first valve 520 is communicated with a pumping source, so that the pumping line 510 can be opened or closed by the first valve 520, when the pumping line 510 is opened by the first valve 520, the pumping source can generate an adsorption effect on a part of IPA vapor in the overflow tank 130 through the pumping line 510, so as to alleviate the IPA vapor from being discharged outwards along with the deionized water.

Referring to fig. 8, the pumping line 510 includes a pumping pipe 511 and a connection pipe 512. The air exhaust pipe 511 is partially disposed in the overflow tank 130, and a plurality of air inlets are disposed on the air exhaust pipe 511, and communicate the cavity of the air exhaust pipe 511 with the cavity of the overflow tank 130, so that IPA vapor in the overflow tank 130 can enter the cavity of the air exhaust pipe 511 through the air inlets. The connection pipe 512 is disposed outside the overflow tank 130, one end of the connection pipe 512 is connected to the pumping pipe 511, and the other end of the connection pipe 512 is connected to the first valve body 520, so that the IPA vapor entering the pumping pipe 511 flows to the connection pipe 512 through the pumping pipe 511, flows to the first valve body 520 through the connection pipe 512, and finally reaches the pumping source for collection.

In a specific embodiment, the connection pipe 512 comprises a main pipe 5121, branch pipes 5122 and a joint 5123, optionally, the branch pipes 512 are divided into two groups, two groups of branch pipes 5122 are welded to two groups of extraction pipes 511, the ports of the two groups of branch pipes 5122 are opposite to the flow passage 140, one ends of the two groups of branch pipes 5122, which are away from the overflow trough 130, are respectively provided with a connection flange, and are connected with two ports of the joint 5123 of the tee joint through the connection flange, and sealing gaskets are respectively arranged at the connection positions to ensure connection tightness. The third port of the joint 5123 is connected to one end of the main pipe 5121, and the other end of the main pipe 5121 is connected to the pumping box 521 of the first valve body 520, so that the overflow tank 130 and the pumping box 521 are communicated through the pumping line 510, thereby facilitating the adsorption and collection of IPA vapor in the overflow tank 130.

Referring to fig. 8 and 9, the first valve body 520 includes an air pumping box 521, a driving member 522 and a plug 523, the air pumping box 521 has a cavity, and a fixing frame 580 is disposed in the cavity and fixedly mounted on the fixing frame 580, so that the driving member 522 is disposed in the air pumping box 521. The plug 523 is connected to the moving end of the driving member 522 and is slidably connected to the fixing frame 580, the cavity of the pumping box 521 is respectively communicated with the pumping pipeline 510 and the pumping source, and the plug 523 is arranged opposite to the port of the pumping pipeline 510, so that when the cleaning and drying device works, in order to prevent leakage of IPA vapor, the plug 523 is driven by the driving member 522 to open the port of the pumping pipeline 510 and open the pumping source, and the IPA vapor flowing into the overflow groove 130 from the flow channel 140 is adsorbed by the pumping pipeline 510 and is transported to a specified position for collection under the action of the pumping source, thereby effectively relieving the problem that the IPA vapor is dissolved in the overflow groove 130 until the overflowing deionized water is discharged to the outside; when the cleaning and drying device is not in operation, the driving member 522 drives the plug 523 to remove the blockage of the pumping line 510, so that the pumping line 510 is completely separated from the pumping source 550 at the next stage, and the overflow tank 130, the cleaning tank 120 and the drying tank 110 are completely sealed.

Preferably, the driving member 522 is a cylinder having an inlet connector 561 and an outlet connector 571, which are respectively connected to the inlet pipe 562 and the outlet pipe 572, so that the ventilation direction can be changed according to different actual requirements to achieve the extension or retraction of the cylinder.

In addition, in order to fix the driving member 522, in this embodiment, a fixing frame 580 is disposed in the air extracting box 521, the fixing frame 580 is fastened in the air extracting box 521 by screws, and the driving member 522 is fixedly mounted on the fixing frame 580; the plug 523 is connected to the driving end of the driving member 522, and under the driving action of the driving member 522, the plug 523 can move relative to the fixing frame 580 to close the suction pipeline 510 or open the suction pipeline 510.

In order to provide good sealing performance between the plug 523 and the port of the pumping pipeline 510, in this embodiment, a sealing gasket 524 is further disposed at the port, that is, the sealing gasket 524 is disposed at the port of the pumping box 521 connected to the pumping pipeline 510, preferably, at least one of the plug 523 and the sealing gasket 524 can be elastically deformed, so as to increase a contact area therebetween, and improve the sealing performance between the plug 523 and the pumping pipeline 510, so as to alleviate the problem of gas leakage in a sealed state.

Referring to fig. 8 to 10, a second valve 530 for adjusting the flow rate of the gas is disposed on the pumping line 510, and the flow rate of the gas in the pumping line 510 can be adjusted by the second valve 530. Specifically, the second valve body 530 includes a baffle 531 and an adjusting knob 532 connected together, wherein the baffle 531 is rotatably disposed in the suction pipe 510 via a rotating shaft, and the adjusting knob 532 is connected to the rotating shaft and partially extends out of the suction pipe 510. Thus, when the adjusting knob 532 is screwed, the blocking sheet 531 is driven to turn over in the pumping pipeline 510 to adjust the plugging area of the pumping pipeline 510, so as to adjust the gas flow in the pumping pipeline 510.

In some optional embodiments, a second detection element, preferably a gas pressure sensor, for detecting the gas pressure in the drying tank 110 is disposed in the drying tank 110, the second detection element is electrically connected to the controller, the second detection element can detect the gas pressure in the drying tank 110 in real time, the controller receives a detected gas pressure signal, and the controller controls the driving member 522 to drive the plug 523 to open or close the suction line 510 by acquiring the gas pressure signal in the drying tank 110 detected by the second detection element.

Referring to fig. 10, in a specific embodiment, the first detecting element 540 is disposed on the air exhaust pipe 510, the first detecting element 540 may be a wind pressure sensor or an air volume sensor, the first detecting element 540 is electrically connected to the controller, the first detecting element 540 is used for detecting the air volume or the wind pressure in the air exhaust pipe 510 in real time and feeding the detected air volume or the wind pressure back to the controller, and the controller obtains and displays the detected air volume or the wind pressure detected by the first detecting element 540, thereby facilitating adjustment. When the detected wind pressure or wind volume is too large, the adjusting knob 532 is screwed to a certain direction to adjust the angle between the baffle 531 and the air extraction pipeline 510 to increase, so that the gas flow area in the air extraction pipeline 510 is reduced; when the detected wind pressure or wind volume is too small, the adjusting knob 532 is screwed in the opposite direction to adjust the angle between the baffle 531 and the air suction pipe 510 to decrease, so that the gas flow area in the air suction pipe 510 increases. Based on the above setting, can adjust the wind pressure or the amount of wind in the extraction pipe 510 according to actual conditions to satisfy the technological requirement.

Certainly, in order to adjust the gas flow more accurately, the dial 533 is arranged at the position, corresponding to the adjusting knob 532, of the air suction pipeline 510, and when the adjusting knob 532 is screwed, reading can be performed according to specific scales of the dial 533, so that the adjusting precision is improved.

The specific operation of the pumping assembly 500 in this embodiment is as follows:

when the cleaning and drying device is not used for a process, compressed gas enters the cylinder through the air inlet pipeline 562 and the air inlet pipe joint 561 to push the piston rod of the cylinder to extend out, after the piston rod extends out for a certain distance, the plug 523 is tightly pressed with the sealing gasket 524, the piston rod of the cylinder stops moving, at this time, the air pumping box 521 and the air pumping pipeline 510 are completely separated, so that the air pumping source 550 at the next stage of the air pumping box 521 is completely separated from the air pumping pipeline 510, and the overflow tank 130, the cleaning tank 120 and the drying tank 110 are completely sealed.

When the cleaning and drying apparatus normally performs the process, since the air pressure in the drying tank 110 is rapidly increased, the second detecting element is used to detect the pressure in the drying tank 110 and feed back the detected pressure to the controller, so as to determine whether the air pressure in the drying tank 110 meets the process requirements. When the air pressure is increased to meet the process requirement, IPA vapor still needs to be sprayed continuously, so that the air pressure in the drying tank 110 is too high, at this time, the air pumping assembly 500 needs to be opened, specifically, air supply to the air inlet pipeline 562 is stopped, compressed air is introduced into the air outlet pipeline 572 to enable the air cylinder to retract, the piston rod of the air cylinder synchronously drives the plug 523 to move, the plug 523 is made to be separated from the sealing gasket 524, at this time, the air pumping source 550 at the next stage of the air pumping box 521 is communicated with the air pumping pipeline 510, the air pumping pipeline 510 starts to pump air under the negative pressure effect, and when the air pressure in the drying tank 110 meets the process requirement again, the air pumping assembly 500 is stopped.

Moreover, the first detecting element 540 detects the wind pressure or wind volume in the air extraction pipeline 510, if the wind pressure or wind volume is too large, the adjusting knob 532 is rotated counterclockwise, and at this time, the angle between the blocking piece 531 and the air extraction pipeline 510 is adjusted, so that the angle is increased, the air flow area is reduced, and finally the air extraction pressure is reduced; when the wind pressure or the wind volume is too small, the adjusting knob 532 is rotated clockwise, and at this time, the angle between the baffle 531 and the air extraction pipeline 510 is reduced, so that the gas flow area is increased, and the air extraction pressure is increased.

In summary, the sealing assembly 300 ensures the sealing performance of the drying tank 110, and ensures that IPA in the drying tank 110 does not leak; through setting up air exhaust assembly 500, can take away partial IPA steam when drying trough 110 internal pressure is too big to be unlikely to dissolve too much IPA vacuum in the deionized water of having guaranteed the overflow, thereby further guaranteed that IPA does not leak.

The above description is only an example of the present application and is not intended to limit the present application. Various modifications and changes may occur to those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included in the scope of the claims of the present application.

Claims

1. A cleaning and drying device for a semiconductor apparatus, comprising: the device comprises a drying tank (110), a cleaning tank (120) and a sealing assembly (300), wherein the drying tank (110) is communicated with the cleaning tank (120) and encloses a working cavity for cleaning and drying a workpiece to be processed; gas is introduced into the drying tank (110) for drying the workpiece to be processed, and liquid is introduced into the cleaning tank (120) for cleaning the workpiece to be processed;

the cleaning and drying device further comprises a lifting assembly (200), wherein the lifting assembly (200) comprises a lifting arm (210) and a support (220), and the support (220) is positioned in the working chamber and used for bearing the workpiece to be processed; the lifting arm (210) comprises a driving end and a connecting end, the driving end is located outside the working cavity, the connecting end is located in the working cavity, the connecting end is connected with the supporting piece (220), the driving end is used for being connected with a power source to drive the supporting piece (220) to move between the drying tank (110) and the cleaning tank (120);

the sealing assembly (300) comprises a sealing seat (310) and a sealing element (320), the sealing seat (310) is connected to the drying groove (110), the lifting arm (210) is movably arranged in the sealing seat (310) in a penetrating mode, and the sealing element (320) is arranged between the lifting arm (210) and the sealing seat (310) and used for sealing the working cavity;

the cleaning and drying device also comprises an air exhaust assembly (500) and an overflow groove (130);

a flow passage (140) is formed between the drying tank (110) and the cleaning tank (120), and the flow passage (140) is communicated with the overflow tank (130);

the air exhaust assembly (500) is communicated with the overflow trough (130).

2. The washing and drying device according to claim 1, wherein the sealing seat (310) comprises a sealing plate and a fixing member (313);

the outer wall of the drying groove (110) is provided with a fixing part, the sealing plate is connected to the fixing part, and the fixing part (313) is fixed on the sealing plate;

the fixing piece (313) is provided with a first through hole (3131) for the lifting arm (210) to penetrate through, the sealing piece (320) is embedded in the first through hole (3131), and the sealing plate is provided with a second through hole opposite to the first through hole (3131).

3. The washing and drying device according to claim 2, wherein the fixing portion has a fixing end surface (111) perpendicular to a lifting direction of the lifting arm (210), the sealing plate includes a first sealing plate (311) and a second sealing plate (312), the first sealing plate (311) is fixed to the fixing end surface (111);

the first sealing plate (311) is provided with a containing groove (3111), and the second sealing plate (312) is arranged in the containing groove (3111);

the first sealing plate (311) is provided with a first notch (3112), the second sealing plate (312) is provided with a second notch (3121), and the first notch (3112) and the second notch (3121) jointly enclose the second through hole.

4. The cleaning and drying device according to claim 3, wherein the first sealing plate (311) is made of PVDF;

and/or the second sealing plate (312) is made of PVDF material;

and/or the sealing element (320) is made of PTFE material.

5. The cleaning and drying device according to claim 1, wherein the air exhaust assembly (500) comprises an air exhaust pipeline (510) and a first valve body (520), one end of the air exhaust pipeline (510) is communicated with the overflow tank (130), the other end of the air exhaust pipeline (510) is communicated with one end of the first valve body (520), and the other end of the first valve body (520) is used for being communicated with an air exhaust source; the first valve body (520) is used for opening or closing the air suction pipeline (510).

6. The cleaning and drying device according to claim 5, wherein the first valve body (520) comprises an air suction box (521), a driving member (522) and a plug (523), the air suction box (521) is respectively communicated with the air suction source and the air suction pipeline (510), the driving member (522) and the plug (523) are arranged in the air suction box (521), the driving member (522) is connected with the plug (523), and the driving member (522) is configured to drive the plug (523) to open or close the air suction pipeline (510).

7. The cleaning and drying device according to claim 5, characterized in that the air suction pipeline (510) is provided with a second valve body (530) for adjusting the gas flow;

the second valve body (530) comprises a baffle (531) and an adjusting knob (532) which are connected, the baffle (531) is arranged in the air extraction pipeline (510) in a turnable manner, part of the adjusting knob (532) extends out of the air extraction pipeline (510), and the blocking area of the baffle (531) on the air extraction pipeline (510) is changed by adjusting the adjusting knob (532).

8. The washing and drying device of claim 6, further comprising a controller; be equipped with on bleeder line (510) and be used for detecting first detecting element (540) of wind pressure or amount of wind in bleeder line (510), first detecting element (540) with controller electrical connection, and/or, be equipped with the second detecting element who is used for detecting gas pressure in dry groove (110), the second detecting element with controller electrical connection, the controller is through acquireing the second detecting element detects atmospheric pressure signal in dry groove (110), control driving piece (522) drive end cap (523) are opened or are sealed bleeder line (510).

9. The cleaning and drying apparatus according to claim 5, wherein the air exhaust line (510) comprises an air exhaust pipe (511) and a connecting pipe (512), the air exhaust pipe (511) is located inside the overflow tank (130), a plurality of air inlets are provided on the air exhaust pipe (511), the connecting pipe (512) is disposed outside the overflow tank (130), one end of the connecting pipe (512) is connected to the air exhaust pipe (511), and the other end of the connecting pipe (512) is connected to the first valve body (520).