CN112817072B - Lens matrix manufacturing system and method - Google Patents
Lens matrix manufacturing system and method Download PDFInfo
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- CN112817072B CN112817072B CN202011632070.0A CN202011632070A CN112817072B CN 112817072 B CN112817072 B CN 112817072B CN 202011632070 A CN202011632070 A CN 202011632070A CN 112817072 B CN112817072 B CN 112817072B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
Abstract
The invention relates to the technical field of lens manufacturing, and discloses a system and a method for manufacturing a lens matrix, which are used for quickly preparing a random F/# lens matrix. The system comprises: the Mach-Zehnder-based interference generation device comprises a coupling lens system, a reference mirror arranged on one beam splitting light path, a three-axis displacement table controlled by a controller and used for bearing a lens matrix, and a light beam passing through an optical through hole of a mask plate, wherein the three-axis displacement table is arranged below the mask plate; the controller is used for generating a random F/# data matrix, converting the F/# data matrix into triaxial data of the displacement table, and controlling the displacement state switching of the triaxial displacement table in the exposure process according to the triaxial data to obtain a random F/# lens matrix; in the manufacturing process, the distances between the lens units with different F/# and the mask plate are different and form a specific functional relationship, and the functional relationship is constructed by taking the focal length of the reference mirror as a reference.
Description
Technical Field
The invention relates to the technical field of lens manufacturing, in particular to a lens matrix manufacturing system and a lens matrix manufacturing method.
Background
The lens matrix can be applied to a plurality of technical fields as a light homogenizer and the like. How to rapidly prepare the lens matrix is always a difficult point and a hotspot of research; especially to produce a matrix of random F/# lenses.
Disclosure of Invention
The invention aims to disclose a system and a method for manufacturing a lens matrix, which are used for quickly preparing a random F/# lens matrix.
To achieve the above object, the present invention discloses a system for manufacturing a lens array, comprising:
the Mach-Zehnder-based interference generation device divides a collimated light beam into two light beams of P light and S light by PBS, one light beam is reflected to BS through a first reflector, the other light beam is reflected to the BS through a second reflector, and the BS synthesizes the two light beams into emergent interference light;
a lens is respectively arranged between the BS and the first reflector and between the BS and the second reflector, and the coupled lens system is formed by the lens and another lens arranged on an emergent interference light path between the BS and a mask plate; each lens has equal focal length, and a common focus of the lens between the BS and the mask plate in the coupling lens system and the lens of the beam splitting light path without the reference mirror is formed in the beam splitting surface of the BS;
the reference mirror is arranged on one beam splitting path and is conjugated with a corresponding lens in the coupling lens system; the reference mirror is used for converting the converged parallel light into parallel light through a conjugated lens and then sending the parallel light to the BS;
a triaxial displacement table controlled by a controller and used for bearing a lens matrix is arranged below the mask plate, the position of the mask plate and the size of a light through hole are fixed, and light passing through the light through hole comprises a beam of parallel light which does not pass through the reference mirror and a beam of divergent light which passes through the reference mirror;
the controller is used for generating a data matrix of the F/# and converting the data matrix of the F/# into triaxial data of the displacement table, and controlling the displacement state switching of the triaxial displacement table in the exposure process according to the triaxial data to obtain a lens matrix; the lens matrix comprises at least two lens units with different F/# s, which are arranged on the displacement table, and in the manufacturing process, the distances between the lens units with different F/# s and the mask plate are different and form a specific functional relationship, and the functional relationship is constructed by taking the focal length of the reference mirror as a reference; wherein each of the lens units is provided with an alignment layer and a liquid crystal polymer layer sensitive to phase information in an incident direction of the interference light.
Preferably, 1/4 wave plates are respectively disposed between the PBS and the first and second reflecting mirrors to convert one of the split light into left-handed circularly polarized light and the other split light into right-handed circularly polarized light.
In order to achieve the above object, the present invention further discloses a method for manufacturing a lens array, comprising:
step S1, deploying the optical path; the method comprises the following steps:
the Mach-Zehnder-based interference generation device divides a collimated light beam into two light beams of P light and S light by PBS, one light beam is reflected to BS through a first reflector, the other light beam is reflected to the BS through a second reflector, and the BS synthesizes the two light beams into emergent interference light; a lens is respectively arranged between the BS and the first reflector and between the BS and the second reflector, and the coupled lens system is formed by the lens and another lens arranged on an emergent interference light path between the BS and a mask plate; each lens has equal focal length, and a common focus of the lens between the BS and the mask plate in the coupling lens system and the lens of the beam splitting light path without the reference mirror is formed in the beam splitting surface of the BS; the reference mirror is arranged on one beam splitting path and is conjugated with a corresponding lens in the coupling lens system; the reference mirror is used for converting the converged parallel light into parallel light through a conjugated lens and then sending the parallel light to the BS; a triaxial displacement table controlled by a controller and used for bearing a lens matrix is arranged below the mask plate, the position of the mask plate and the size of a light through hole are fixed, and light passing through the light through hole comprises a beam of parallel light which does not pass through the reference mirror and a beam of divergent light which passes through the reference mirror;
step S2, the controller generates a data matrix of the F/# and converts the data matrix of the F/# into triaxial data of the displacement table, and controls the displacement state switching of the triaxial displacement table in the exposure process according to the triaxial data to obtain a lens matrix; the lens matrix comprises at least two lens units with different F/# s, the lens units with different F/# s are different from the mask plate in the manufacturing process and form a specific functional relation, and the functional relation is constructed by taking the focal length of the reference mirror as a reference.
The invention has the following beneficial effects:
in the manufacturing system and method of the lens matrix disclosed by the embodiment of the invention, in the manufacturing process, the wavefront information of the parallel light penetrating through the mask plate does not change along with the position change of a Z axis (namely the vertical distance between the mask plate and a three-axis displacement table); however, information of divergent wavefront carried in each lens unit orientation layer changes along with the change of the Z axis, so that when the distance between the three-axis displacement table and the mask plate is different, the information amount of the interfered lens is different, and correspondingly, the focal length of each lens unit is different. And the distances between the lens units with different F/# and the mask plate are different and form a specific functional relationship which can be reasonably set by taking the focal length of the reference mirror as a reference.
The present invention will be described in further detail below with reference to the accompanying drawings.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the invention and, together with the description, serve to explain the invention and not to limit the invention. In the drawings:
fig. 1 is a schematic diagram of an optical path structure of a system for manufacturing a lens matrix according to an embodiment of the present invention.
FIG. 2 is a schematic diagram of the inconsistency of the information of the interference rings carried by the orientation layers at different positions according to the embodiment of the present invention.
Fig. 3 is a schematic structural diagram of a lens matrix according to an embodiment of the invention.
Detailed Description
The embodiments of the invention will be described in detail below with reference to the drawings, but the invention can be implemented in many different ways as defined and covered by the claims.
Example 1
The present embodiment discloses a system for manufacturing a lens matrix, which refers to the optical path structure shown in fig. 1; the method comprises the following steps:
the interference generating device based on the Mach-Zehnder utilizes the PBS to divide collimated light beams into two beams of P light and S light, one beam of light is reflected to the BS through the first reflecting mirror, the other beam of light is reflected to the BS through the second reflecting mirror, and the BS synthesizes the two beams of light into emergent interference light.
A lens is respectively arranged between the BS and the first reflector and between the BS and the second reflector, and the coupled lens system is formed by the lens and another lens arranged on an emergent interference light path between the BS and a mask plate; and the lenses have equal focal lengths, and a common focus of the lens between the BS and the mask plate in the coupling lens system and the lens of the beam splitting optical path without the reference mirror is formed in the beam splitting surface of the BS.
The reference mirror is arranged on one beam splitting path and is conjugated with a corresponding lens in the coupling lens system; the reference mirror is used for converting the converged parallel light into parallel light through the conjugated lens and then sending the parallel light to the BS.
And a triaxial displacement table controlled by a controller and used for bearing a lens matrix is arranged below the mask plate, the position of the mask plate and the size of the light through hole are fixed, and the light passing through the light through hole comprises a beam of parallel light which does not pass through the reference mirror and a beam of divergent light which passes through the reference mirror.
The controller is used for generating a data matrix of the F/# and converting the data matrix of the F/# into triaxial data of the displacement table, and controlling the displacement state switching of the triaxial displacement table in the exposure process according to the triaxial data to obtain a lens matrix; the lens matrix comprises at least two lens units with different F/# s, the lens units with different F/# s are different from the mask plate in the manufacturing process and form a specific functional relation, and the functional relation is constructed by taking the focal length of the reference mirror as a reference. As shown in fig. 1, the F/# data matrix corresponding to the objective lens matrix is a 3 x 3 data matrix, and the three-axis data includes XY-axis data in the horizontal direction and Z-axis data in the vertical direction.
In this embodiment, each of the lens units is provided with an alignment layer and a liquid crystal polymer layer sensitive to phase information in the incident direction of the interference light. As shown in fig. 1, 1/4 wave plates are preferably provided between the PBS and the first and second mirrors, respectively, for converting one of the split light into left-handed circularly polarized light and the other split light into right-handed circularly polarized light. Preferably, the system is further provided with an optical assembly for spatial filtering and beam expansion between the light source and the PBS.
Example 2
Corresponding to the above embodiments, the present embodiment discloses a method for manufacturing a lens matrix, including:
and step S1, deploying the optical path. The method comprises the following steps:
the Mach-Zehnder-based interference generation device divides a collimated light beam into two light beams of P light and S light by PBS, one light beam is reflected to BS through a first reflector, the other light beam is reflected to the BS through a second reflector, and the BS synthesizes the two light beams into emergent interference light; a lens is respectively arranged between the BS and the first reflector and between the BS and the second reflector, and the coupled lens system is formed by the lens and another lens arranged on an emergent interference light path between the BS and a mask plate; each lens has equal focal length, and a common focus of the lens between the BS and the mask plate in the coupling lens system and the lens of the beam splitting light path without the reference mirror is formed in the beam splitting surface of the BS; the reference mirror is arranged on one beam splitting path and is conjugated with a corresponding lens in the coupling lens system; the reference mirror is used for converting the converged parallel light into parallel light through a conjugated lens and then sending the parallel light to the BS; and a triaxial displacement table controlled by a controller and used for bearing a lens matrix is arranged below the mask plate, the position of the mask plate and the size of the light through hole are fixed, and the light passing through the light through hole comprises a beam of parallel light which does not pass through the reference mirror and a beam of divergent light which passes through the reference mirror.
Step S2, the controller generates a data matrix of the F/# and converts the data matrix of the F/# into triaxial data of the displacement table, and controls the displacement state switching of the triaxial displacement table in the exposure process according to the triaxial data to obtain a lens matrix; the lens matrix comprises at least two lens units with different F/# s, the lens units with different F/# s are different from the mask plate in the manufacturing process and form a specific functional relation, and the functional relation is constructed by taking the focal length of the reference mirror as a reference.
In other words, one lens element, corresponds to one position of the three-axis stage and to one random F/# data. The F/# data matrix can be generated by a computer, an upper computer or a servo platform and other controllers, and the mode of generating the data matrix can be customized or randomly generated according to the requirements of users. As shown in fig. 2, the dotted line represents the wavefront of parallel light, the solid line represents the wavefront of divergent light, and the rectangular box represents the different positions where the alignment layer (moving with the movement of the translation stage) is located; the information of the wave front of the parallel light in the mask plate does not change along with the position change of the Z axis; the information of the divergent wavefront within the orientation layer changes as the Z-axis changes. Then the amount of lens information (i.e. the physical information of the interference rings carried by different positions in the figure) that interferes with the alignment layer at different positions will be different, which corresponds to different focal lengths of the liquid crystal polymer lenses. Thereby, a lens array with different lens units F/# as shown in FIG. 3 can be generated, which can be applied to specific scenes such as dodging; and achieve some special technical effects that some lens matrices with the same F/# cannot achieve. The relationship between the focal length and the period of each lens unit is sin theta/p, wherein p is the period density, lambda is the wavelength, and theta is the deflection angle. When the same spot size is incident on lenses with different period densities (i.e. the density of light and dark stripes in fig. 2, and the low density represents that p is larger, and at the same time, the angle is small, and the focal length is long), the focal positions of the light convergence are different (f is different), and f/#isf/D, so that different f/# lenses can be obtained.
Similarly, each of the lens units of the present embodiment is provided with an alignment layer and a liquid crystal polymer layer sensitive to phase information of the incident direction of the interference light. Further, 1/4 wave plates are respectively arranged between the PBS and the first and second reflecting mirrors, so that one of the split beams is converted into left-handed circularly polarized light, and the other split beam is converted into right-handed circularly polarized light.
To sum up, in the manufacturing system and method of the lens matrix disclosed in the embodiment of the present invention, in the manufacturing process, the wavefront information of the parallel light passing through the mask plate does not change with the position change of the Z axis (i.e. the vertical distance between the mask plate and the three-axis displacement stage); however, information of divergent wavefront carried in each lens unit orientation layer changes along with the change of the Z axis, so that when the distance between the three-axis displacement table and the mask plate is different, the information amount of the interfered lens is different, and correspondingly, the focal length of each lens unit is different. And the distances between the lens units with different F/# and the mask plate are different and form a specific functional relationship which can be reasonably set by taking the focal length of the reference mirror as a reference.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (4)
1. A system for manufacturing a lens array, comprising:
the Mach-Zehnder-based interference generation device divides a collimated light beam into two light beams of P light and S light by PBS, one light beam is reflected to BS through a first reflector, the other light beam is reflected to the BS through a second reflector, and the BS synthesizes the two light beams into emergent interference light;
a lens is respectively arranged between the BS and the first reflector and between the BS and the second reflector, and the coupled lens system is formed by the lens and another lens arranged on an emergent interference light path between the BS and a mask plate; each lens has equal focal length, and a common focus of the lens between the BS and the mask plate in the coupling lens system and the lens of the beam splitting light path without the reference mirror is formed in the beam splitting surface of the BS;
the reference mirror disposed on one of the split optical paths, the reference mirror being conjugate to a corresponding lens in the coupling lens system; the reference mirror is used for converting the converged parallel light into parallel light through a conjugated lens and then sending the parallel light to the BS;
a triaxial displacement table controlled by a controller and used for bearing a lens matrix is arranged below the mask plate, the position of the mask plate and the size of a light through hole are fixed, and light passing through the light through hole comprises a beam of parallel light which does not pass through the reference mirror and a beam of divergent light which passes through the reference mirror;
the controller is used for generating a data matrix of the F/# and converting the data matrix of the F/# into triaxial data of the displacement table, and controlling the displacement state switching of the triaxial displacement table in the exposure process according to the triaxial data to obtain a lens matrix; the lens matrix comprises at least two lens units with different F/# s, which are arranged on the displacement table, and in the manufacturing process, the distances between the lens units with different F/# s and the mask plate are different and form a specific functional relationship, and the functional relationship is constructed by taking the focal length of the reference mirror as a reference;
each of the lens units is provided with an alignment layer and a liquid crystal polymer layer sensitive to phase information in an incident direction of interference light.
2. The system of claim 1, wherein 1/4 wave plates are disposed between the PBS and the first and second mirrors, respectively, for converting one of the split beams into left-handed circularly polarized light and the other split beam into right-handed circularly polarized light.
3. A method of manufacturing a lens matrix, comprising:
step S1, deploying the optical path; the method comprises the following steps:
the Mach-Zehnder-based interference generation device divides a collimated light beam into two light beams of P light and S light by PBS, one light beam is reflected to BS through a first reflector, the other light beam is reflected to the BS through a second reflector, and the BS synthesizes the two light beams into emergent interference light; a lens is respectively arranged between the BS and the first reflector and between the BS and the second reflector, and the coupled lens system is formed by the lens and another lens arranged on an emergent interference light path between the BS and a mask plate; each lens has equal focal length, and a common focus of the lens between the BS and the mask plate in the coupling lens system and the lens of the beam splitting light path without the reference mirror is formed in the beam splitting surface of the BS; the reference mirror is arranged on one beam splitting path and is conjugated with a corresponding lens in the coupling lens system; the reference mirror is used for converting the converged parallel light into parallel light through a conjugated lens and then sending the parallel light to the BS; a triaxial displacement table controlled by a controller and used for bearing a lens matrix is arranged below the mask plate, the position of the mask plate and the size of a light through hole are fixed, and light passing through the light through hole comprises a beam of parallel light which does not pass through the reference mirror and a beam of divergent light which passes through the reference mirror;
step S2, the controller generates a data matrix of the F/# and converts the data matrix of the F/# into triaxial data of the displacement table, and controls the displacement state switching of the triaxial displacement table in the exposure process according to the triaxial data to obtain a lens matrix; the lens matrix comprises at least two lens units with different F/# s, which are arranged on the displacement table, and in the manufacturing process, the distances between the lens units with different F/# s and the mask plate are different and form a specific functional relationship, and the functional relationship is constructed by taking the focal length of the reference mirror as a reference; wherein each of the lens units is provided with an alignment layer and a liquid crystal polymer layer sensitive to phase information in an incident direction of the interference light.
4. The method of claim 3, wherein converting one of the split beams into left-handed circularly polarized light and converting the other split beam into right-handed circularly polarized light is accomplished by providing 1/4 wave plates between the PBS and the first and second mirrors, respectively.
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0088691A1 (en) * | 1982-03-09 | 1983-09-14 | Matra Gca S.A. | Alignment apparatus for machines making integrated circuits |
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| JPH0756318A (en) * | 1993-08-23 | 1995-03-03 | Hitachi Ltd | Pattern forming method and mask used for the same |
| CA2271815C (en) * | 1996-11-15 | 2010-01-19 | Diffraction Ltd. | In-line holographic mask for micromachining |
| CN100409043C (en) * | 1997-12-16 | 2008-08-06 | “尼奥匹克”俄罗斯联邦全国科技中心 | Polaroid and liquid crystal display element |
| KR100256656B1 (en) * | 1997-12-22 | 2000-05-15 | 전주범 | Improved volume holographic digital storage/reproducing system and reproducing beam angle control method thereof |
| JP3938099B2 (en) * | 2002-06-12 | 2007-06-27 | セイコーエプソン株式会社 | Microlens manufacturing method, microlens, microlens array plate, electro-optical device, and electronic apparatus |
| JP4230187B2 (en) * | 2002-09-25 | 2009-02-25 | シャープ株式会社 | Microlens array manufacturing method and microlens array manufacturing apparatus |
| CN103217850B (en) * | 2013-04-03 | 2016-03-23 | 东南大学 | A kind of liquid crystal lens based on photoconductive material and array |
| CN110376128A (en) * | 2019-07-24 | 2019-10-25 | 中国科学技术大学 | Microlens array preparation and detection device based on Digital Micromirror Device diffraction effect |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0088691A1 (en) * | 1982-03-09 | 1983-09-14 | Matra Gca S.A. | Alignment apparatus for machines making integrated circuits |
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