CN112764322A - Long-roller type pressing plate mechanism of laser direct writing lithography machine - Google Patents
Long-roller type pressing plate mechanism of laser direct writing lithography machine Download PDFInfo
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- CN112764322A CN112764322A CN202011626210.3A CN202011626210A CN112764322A CN 112764322 A CN112764322 A CN 112764322A CN 202011626210 A CN202011626210 A CN 202011626210A CN 112764322 A CN112764322 A CN 112764322A
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- roller
- linear guide
- rotating shaft
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- plate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Abstract
The invention discloses a long-roller type pressing plate mechanism of a laser direct writing photoetching machine, which comprises a pressing plate part, wherein the pressing plate part comprises a support wing plate and a rubber roller assembly arranged below the support wing plate; the rubber roller assembly comprises a rotating shaft and a rubber roller sleeved on the rotating shaft, the two ends of the rotating shaft are connected with a support wing plate in a vertical sliding mode through linear guide shafts, the lower ends of the linear guide shafts are fixedly connected with the rotating shaft, the upper ends of the linear guide shafts are connected with the support wing plate in a sliding mode, compression springs are arranged between the rotating shaft and the support wing plate and sleeved on the linear guide shafts, the long roller type pressing plate mechanism is adopted in the application, power is not needed, the long roller is jacked up by the aid of force of self movement of a sucker, PCB plates are pressed on two sides of an exposure area, the phenomenon that the edge pressing plate mechanism causes middle bulging and the exposure area is uneven is avoided, meanwhile, the long roller is reliable in structure, the cantilever beam deformation risk in the using process of the.
Description
Technical Field
The invention relates to the technical field of photoetching machine pressing plate equipment, in particular to a long-roller type pressing plate mechanism of a laser direct-writing photoetching machine.
Background
Pattern exposure (lithograph), also known as photolithography, transfers a pattern to a photosensitive film overlying a semiconductor by a photochemical reaction. The laser direct writing photoetching is to utilize the data output by software to directly drive a laser direct imaging device to react with photoresist on a PCB so as to form an image, and then to obtain a required image through development. The laser direct-write lithography has the advantages that a mask is not needed, and the laser direct-write lithography is combined with the DMD technology, so that the laser direct-write lithography is rapidly developed in the field of PCB exposure.
In the plate making process of the photoetching machine, due to the limitation of the focal depth of a light path of the photoetching machine, the placement of the sucker and the flatness of the PCB, the PCB is difficult to be completely and flatly placed on the sucker, and great technological challenges are brought to the whole photoetching process.
In the laser direct writing lithography process of the semiconductor product PCB, in order to improve the close fit between the PCB and the platform, the PCB is generally subjected to vacuum adsorption on the platform, and a pressing mechanism is also needed to press the PCB in the exposure process, so that the influence of the warpage of the PCB on the exposure is reduced and prevented. The problems of weak edge adsorption and bulge in the middle can occur in the independent vacuum adsorption. The sucking disc edge clamp plate mode that prior art adopted more, pass through motor or cylinder as power at the both sides of sucking disc or four sides edge, at the direct clamp plate of edge, according to the PCB board size of difference simultaneously, the stroke of suitable adjustment edge clamp plate mechanism.
The existing pressing plate equipment can only press the PCB at the edge of the PCB and can not press the PCB at the key exposure area; the pressing plates on the two sides of the sucking disc lead to the warping of the rest two sides, the edge warping of the pressing plates on the three sides and the four sides can be avoided, the realized structure is complex, the pressing plates on each side can be used for realizing a plurality of continuous actions such as lifting, avoiding, lateral moving, pressing down, stroke displacement and the like, the controllability requirement is high, and the reliability is low. In addition, the PCB is generally placed close to the lower right corner, the pressing plates on the upper side and the right side generally adopt cantilever beam structures, the structure is complex, and the cantilever beam deformation is easy to occur, so that the phenomenon that the plates cannot be pressed is caused.
Disclosure of Invention
The invention aims to provide a long-roller type pressing plate mechanism of a laser direct writing lithography machine, so as to solve the problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme:
a long-roller type pressing plate mechanism of a laser direct writing photoetching machine comprises a pressing plate part, wherein the pressing plate part comprises a support wing plate and a rubber roller assembly arranged below the support wing plate;
the rubber roller assembly comprises a rotating shaft and a rubber roller sleeved on the rotating shaft, the two ends of the rotating shaft are connected with the supporting wing plate in a vertical sliding mode through linear guide shafts, the lower end of each linear guide shaft is fixedly connected with the rotating shaft, the upper end of each linear guide shaft is connected with the supporting wing plate in a sliding mode, a compression spring is arranged between the rotating shaft and the supporting wing plate, and the compression spring is sleeved on the linear guide shafts.
As a further scheme of the invention: the lower end of the support wing plate is connected with a connecting plate, through holes are formed in two ends of the connecting plate, and the linear guide shaft penetrates through the through holes.
As a further scheme of the invention: the linear guide shaft is inserted into the linear bearing, the upper end of the linear guide shaft extends to the upper part of the connecting plate, and the upper end of the linear guide shaft is fixedly connected with a separation blade.
As a further scheme of the invention: the baffle plate is fixedly connected with the linear guide shaft through a fastening screw.
As a further scheme of the invention: a rubber pad and a stainless steel ring are arranged between the separation blade and the connecting plate, the rubber pad and the stainless steel ring are sleeved on the linear guide shaft, and the rubber pad is located at the lower end of the stainless steel ring.
As a further scheme of the invention: the pivot top is equipped with the backup pad, the backup pad both ends extend to the direction that is close to the pivot and form and be used for the joint the lug of pivot, the pivot both ends with both ends lug fixed connection.
As a further scheme of the invention: the utility model discloses a linear guide shaft, including backup pad, linear guide shaft, outer bolt, linear guide shaft, backup pad, linear guide shaft, outer bolt, linear.
As a further scheme of the invention: and a spring seat is arranged at one end of the linear guide shaft close to the support plate, and the compression spring is positioned at the upper end of the spring seat.
As a further scheme of the invention: the rubber roll comprises a roller and a roller glue layer wrapped outside the roller, wherein the roller glue layer is made of rubber or silica gel.
As a further scheme of the invention: the roller is sleeved on the rotating shaft, and two ends of the rotating shaft are fixedly connected with stoppers for limiting the roller.
Compared with the prior art, the invention has the beneficial effects that: this can application adopts long roll-type clamp plate mechanism, need not power, leans on the long roll of power jack-up of sucking disc self motion, pushes down the PCB board in exposing the district both sides, has avoided marginal clamp plate mechanism to lead to middle bulging, the phenomenon of exposing the unevenness of district, and long roll structure is reliable simultaneously, cantilever beam deformation risk in the use of cantilever beam formula clamp plate mechanism of no cantilever beam, whole simple structure realizes easily.
Drawings
FIG. 1 is an exploded view of the platen mechanism of the present embodiment;
FIG. 2 is an assembly view of the platen mechanism of the present embodiment;
FIG. 3 is a sectional view of the platen mechanism of the present embodiment;
FIG. 4 is a schematic view of the structure of the rubber roller of this embodiment;
FIG. 5 is a schematic diagram of a shaft supporting structure of the platen mechanism according to the present embodiment;
FIG. 6 is a schematic view of a stopper of the platen mechanism according to the present embodiment;
FIG. 7 is a schematic structural view of the linear guide shaft according to the present embodiment;
FIG. 8 is a schematic diagram of a supporting wing plate structure of the pressing plate mechanism according to the present embodiment;
FIG. 9 is a schematic diagram of a connecting plate structure between pressing plates;
FIG. 10 is a schematic diagram illustrating a movement state of the platen mechanism according to the embodiment;
FIG. 11 is a schematic diagram illustrating the distribution of the position of the glue roller and the position of the light source during exposure according to the present embodiment.
In the figure: 1-rubber roll, 101-rubber roll layer, 102-roller, 2-rubber roll rotating shaft, 3-supporting plate, 4-bearing, 5-limiter, 6-spring seat, 7-spring, 8-linear guide shaft, 9-through hole, 10-linear bearing, 11-rubber pad, 12-stainless steel ring, 13-stainless steel baffle, 14-fastening screw, 15-supporting wing plate, 16-connecting plate, 17-PCB plate and 18-exposure light source.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-11, in an embodiment of the present invention, a long roller pressing mechanism of a laser direct write lithography machine includes two pressing plates, in the embodiment, the two pressing plates are disposed in parallel, the two pressing plates are disposed on two sides of an exposure light source, when a PCB is exposed, the pressing mechanism always presses on the PCB, and presses the PCB on two sides of the exposure light source to prevent the PCB from warping, thereby reducing exposure failures, and the pressing plates include a support wing plate 15 and a glue roller assembly disposed below the support wing plate 15.
The lower end of the support wing plate 15 is connected with a connecting plate 16, a plurality of threaded connecting holes are arranged at the connecting position of the connecting plate 16 and the support wing plate 15, waist-shaped holes are correspondingly formed in the support wing plate 15, and then when the connecting plate 16 is connected with the support wing plate 15 through bolts, the relative position of the connecting plate and the support wing plate 15 is adjusted through the waist-shaped holes, namely, the horizontal distance between the pressing plate mechanism and the light source is adjusted. The closer the light source and the plate pressing mechanism are, the tighter the PCB is pressed during exposure, the more difficult the PCB is to warp, through holes 9 are formed in two ends of a connecting plate 16, linear bearings 10 are inserted in the through holes 9 at the two ends, linear guide shafts 8 are inserted in the linear bearings 10, further the linear guide shafts 8 penetrate through the connecting plate 16 and slide up and down in the through holes 9, the upper ends of the linear guide shafts 8 extend to the upper portion of the connecting plate 16, blocking pieces 13 are fixedly connected to the upper ends of the linear guide shafts 8, the blocking pieces 13 are fixedly connected with the linear guide shafts 8 through fastening screws 14, rubber pads 11 and stainless steel rings 12 are arranged between the blocking pieces 13 and the connecting plate 16, the rubber pads 11 and the stainless steel rings 12 are sleeved on the linear guide shafts 8, and the rubber pads 11 are located at the lower ends of.
The rubber roller component comprises a rotating shaft 2 and a rubber roller 1 sleeved on the rotating shaft 2, the rubber roller 1 comprises a roller 102 and a roller rubber layer 101 wrapped outside the roller 102, the roller rubber layer 101 is made of rubber or silica gel, the roller 102 is sleeved on the rotating shaft 2, two ends of the rotating shaft 2 are fixedly connected with a limiting stopper 5 for limiting the roller 102, a support plate 3 is arranged above the rotating shaft 2, two ends of the support plate 3 extend towards the direction close to the rotating shaft 2 to form a lifting lug for clamping the rotating shaft 2, two ends of the rotating shaft 2 are fixedly connected with the lifting lugs at the two ends, the upper end of the support plate 3 is provided with a threaded hole, the lower end of a linear guide shaft 8 is provided with an external thread, the linear guide shaft 8 is connected in a threaded hole at the upper end of the support plate 3 through an external bolt, a compression spring 7 is arranged between the rotating shaft 2 and a, a compression spring 7 is located at the upper end of spring seat 6.
In the embodiment, when the device is used, as can be seen from fig. 10, the compression spring 7 is in a compressed state, the rubber roller 1 is used for contacting the PCB 17, the PCB 17 is placed on the platform, before exposure, the lowest point of the rubber roller 1 is slightly lower than the platform, when the PCB 17 moves forwards along with the platform, the platform first contacts the rubber roller 1, the rubber roller 1 is jacked upwards, an upward thrust is further provided for the support plate 3 through the rubber roller 1, under the action of the thrust, the support plate 3 pushes the linear guide shaft 8 to extend upwards along the linear bearing 10, the PCB 17 moves forwards continuously along with the platform, and then the rubber roller 1 presses on the PCB. In this embodiment, the pressing plates are used in pairs, the two pressing plates are distributed on two sides of the exposure light source 18, when the PCB 17 is exposed, the rubber rollers 1 of the two pressing plates always press on the PCB 17, and press the PCB 17 on two sides of the exposure light source 18, so as to prevent the PCB 17 from warping, thereby reducing poor exposure.
In the movement process of the PCB 17, the rubber roller 1 rotates around the rotating shaft, and the rubber roller 1 and the rotating shaft 2 are connected through the bearing 4, so that friction can be reduced, and rigid contact can be prevented. In the exposure process, the compression springs 7 are always in a compressed state, the force of the rubber roller 1 pressing on the PCB 17 is the sum of the elastic forces of the compression springs 7 on the two sides of the rubber roller 1, the elastic force of a single spring is determined by the compression amount of the spring, and in addition, the force of the rubber roller 1 pressing on the PCB 17 can be adjusted by finely adjusting the compression amount of the spring.
The pressing plate mechanism supporting wing plate is installed on the exposure machine marble frame, the pressing plate mechanism supporting wing plate is provided with a large long round hole for reducing weight, and the two middle rib plates are used for strengthening strength so as to prevent the spring from stretching and impacting to cause the pressing plate mechanism supporting wing plate to deform and influence the pressing plate effect.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (10)
1. The long-roller type pressing plate mechanism of the laser direct writing lithography machine is characterized by comprising a pressing plate part, wherein the pressing plate part comprises a support wing plate (15) and a rubber roller assembly arranged below the support wing plate (15);
the rubber roller assembly comprises a rotating shaft (2) and a rubber roller (1) sleeved on the rotating shaft (2), wherein the two ends of the rotating shaft (2) are connected with a support wing plate (15) in a vertical sliding mode through linear guide shafts (8), the lower end of each linear guide shaft (8) is fixedly connected with the rotating shaft (2), the upper end of each linear guide shaft (8) is connected with the support wing plate (15) in a sliding mode, a compression spring (7) is arranged between each rotating shaft (2) and the support wing plate (15), and the compression spring (7) is sleeved on the linear guide shafts (8).
2. The long-roller platen mechanism of the laser direct-write lithography machine according to claim 1, wherein a connecting plate (16) is connected to the lower end of the support wing plate (15), a through hole (9) is formed at each end of the connecting plate (16), and the linear guide shaft (8) penetrates through the through hole (9).
3. The long-roller platen mechanism of the laser direct writing lithography machine according to claim 2, wherein a linear bearing (10) is disposed in the through hole (9), the linear guide shaft (8) is inserted into the linear bearing (10), the upper end of the linear guide shaft (8) extends above the connecting plate (16), and a blocking piece (13) is fixedly connected to the upper end of the linear guide shaft (8).
4. The long-roller platen mechanism of a laser direct write lithography machine according to claim 3, wherein the blocking plate (13) is fixedly connected with the linear guide shaft (8) by a fastening screw (14).
5. The long-roller platen mechanism of the laser direct writing lithography machine according to claim 3, wherein a rubber pad (11) and a stainless steel ring (12) are disposed between the blocking plate (13) and the connecting plate (16), the rubber pad (11) and the stainless steel ring (12) are sleeved on the linear guide shaft (8), and the rubber pad (11) is located at the lower end of the stainless steel ring (12).
6. The long-roller pressing plate mechanism of the laser direct writing lithography machine according to claim 1, wherein a supporting plate (3) is disposed above the rotating shaft (2), two ends of the supporting plate (3) extend in a direction close to the rotating shaft (2) to form lifting lugs for clamping the rotating shaft (2), and two ends of the rotating shaft (2) are fixedly connected with the lifting lugs at the two ends.
7. The long-roller platen mechanism of the laser direct write lithography machine according to claim 6, wherein the upper end of the support plate (3) is provided with a threaded hole, the lower end of the linear guide shaft (8) is provided with an external thread, and the linear guide shaft (8) is connected to the threaded hole at the upper end of the support plate (3) through an external bolt.
8. The long-roller platen mechanism of the laser direct write lithography machine according to claim 7, wherein a spring seat (6) is provided at an end of the linear guide shaft (8) near the support plate (3), and the compression spring (7) is located at an upper end of the spring seat (6).
9. The long-roller pressing plate mechanism of the laser direct writing lithography machine according to claim 1, wherein the rubber roller (1) comprises a roller (102) and a roller glue layer (101) wrapped outside the roller (102), and the roller glue layer (101) is made of rubber or silica gel.
10. The long-roller platen mechanism of the laser direct writing lithography machine according to claim 9, wherein the roller (102) is sleeved on the rotating shaft (2), and stoppers (5) for limiting the roller (102) are fixedly connected to both ends of the rotating shaft (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011626210.3A CN112764322B (en) | 2020-12-30 | 2020-12-30 | Long-roller type pressing plate mechanism of laser direct writing lithography machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011626210.3A CN112764322B (en) | 2020-12-30 | 2020-12-30 | Long-roller type pressing plate mechanism of laser direct writing lithography machine |
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| Publication Number | Publication Date |
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| CN112764322A true CN112764322A (en) | 2021-05-07 |
| CN112764322B CN112764322B (en) | 2022-12-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202011626210.3A Active CN112764322B (en) | 2020-12-30 | 2020-12-30 | Long-roller type pressing plate mechanism of laser direct writing lithography machine |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113777892A (en) * | 2021-08-19 | 2021-12-10 | 杭州新诺微电子有限公司 | Pressing plate mechanism, exposure machine with same and pressing plate method of exposure machine |
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| CN210678920U (en) * | 2019-10-28 | 2020-06-05 | 青岛澳派智能包装有限公司 | Auxiliary paper pressing device for preventing paper board from warping |
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| JP2001157997A (en) * | 1999-12-02 | 2001-06-12 | Nakamura Tome Precision Ind Co Ltd | Continuously breaking device for rigid and brittle substrate |
| JP2004342772A (en) * | 2003-05-14 | 2004-12-02 | Micro Craft Kk | Printer of printed wiring board |
| JP2005209837A (en) * | 2004-01-22 | 2005-08-04 | Fuji Photo Film Co Ltd | Stage circulator and image forming device |
| JP2011157199A (en) * | 2010-02-02 | 2011-08-18 | Dainippon Screen Mfg Co Ltd | Substrate conveying device, substrate conveying method, and image pickup device |
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| CN107708309A (en) * | 2017-09-21 | 2018-02-16 | 乐凯特科技铜陵有限公司 | A kind of apparatus for leveling for being used to make printed circuit board (PCB) |
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| CN209693185U (en) * | 2019-02-28 | 2019-11-26 | 重庆凯歌电子股份有限公司 | Pcb board distortion correction trigger squeeze |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113777892A (en) * | 2021-08-19 | 2021-12-10 | 杭州新诺微电子有限公司 | Pressing plate mechanism, exposure machine with same and pressing plate method of exposure machine |
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| Publication number | Publication date |
|---|---|
| CN112764322B (en) | 2022-12-16 |
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