CN112735995B - 基于超声震动式处理的半导体晶圆的清洗装置和方法 - Google Patents
基于超声震动式处理的半导体晶圆的清洗装置和方法 Download PDFInfo
- Publication number
- CN112735995B CN112735995B CN202110365913.3A CN202110365913A CN112735995B CN 112735995 B CN112735995 B CN 112735995B CN 202110365913 A CN202110365913 A CN 202110365913A CN 112735995 B CN112735995 B CN 112735995B
- Authority
- CN
- China
- Prior art keywords
- cleaning
- groove
- wafer
- fixing
- connecting body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 124
- 239000004065 semiconductor Substances 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 title claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 31
- 235000012431 wafers Nutrition 0.000 claims description 69
- 230000000149 penetrating effect Effects 0.000 claims description 28
- 229910000831 Steel Inorganic materials 0.000 claims description 13
- 239000010959 steel Substances 0.000 claims description 13
- 238000009434 installation Methods 0.000 abstract description 8
- 239000000428 dust Substances 0.000 abstract description 3
- 239000012535 impurity Substances 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 230000006872 improvement Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000005406 washing Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110365913.3A CN112735995B (zh) | 2021-04-06 | 2021-04-06 | 基于超声震动式处理的半导体晶圆的清洗装置和方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110365913.3A CN112735995B (zh) | 2021-04-06 | 2021-04-06 | 基于超声震动式处理的半导体晶圆的清洗装置和方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN112735995A CN112735995A (zh) | 2021-04-30 |
CN112735995B true CN112735995B (zh) | 2021-06-04 |
Family
ID=75596487
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202110365913.3A Active CN112735995B (zh) | 2021-04-06 | 2021-04-06 | 基于超声震动式处理的半导体晶圆的清洗装置和方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112735995B (zh) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN210325721U (zh) * | 2019-10-08 | 2020-04-14 | 安徽宏实自动化装备有限公司 | 一种用于晶圆清洗的槽体整体结构 |
CN210386790U (zh) * | 2019-05-29 | 2020-04-24 | 张超 | 一种便于拆卸组装的超声波清洗器 |
CN112207085A (zh) * | 2020-09-23 | 2021-01-12 | 复汉海志(江苏)科技有限公司 | 一种芯片晶圆生产用清洗装置 |
CN112387698A (zh) * | 2020-10-31 | 2021-02-23 | 芜湖恒坤汽车部件有限公司 | 基于超声波清洗技术对新能源电池铜排裁切后的清洗设备 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20040041763A (ko) * | 2002-11-11 | 2004-05-20 | 삼성전자주식회사 | 반도체 웨이퍼 세정시스템 및 그 방법 |
-
2021
- 2021-04-06 CN CN202110365913.3A patent/CN112735995B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN210386790U (zh) * | 2019-05-29 | 2020-04-24 | 张超 | 一种便于拆卸组装的超声波清洗器 |
CN210325721U (zh) * | 2019-10-08 | 2020-04-14 | 安徽宏实自动化装备有限公司 | 一种用于晶圆清洗的槽体整体结构 |
CN112207085A (zh) * | 2020-09-23 | 2021-01-12 | 复汉海志(江苏)科技有限公司 | 一种芯片晶圆生产用清洗装置 |
CN112387698A (zh) * | 2020-10-31 | 2021-02-23 | 芜湖恒坤汽车部件有限公司 | 基于超声波清洗技术对新能源电池铜排裁切后的清洗设备 |
Also Published As
Publication number | Publication date |
---|---|
CN112735995A (zh) | 2021-04-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100931856B1 (ko) | 기판 세정 장치 및 기판 세정 방법 | |
US6314974B1 (en) | Potted transducer array with matching network in a multiple pass configuration | |
US20100294305A1 (en) | Ultrasonic cleaning apparatus and ultrasonic cleaning method | |
US8327861B2 (en) | Megasonic precision cleaning of semiconductor process equipment components and parts | |
TWI479548B (zh) | 具有控制邊界層厚度之兆頻超音波清洗及相關系統及方法 | |
US20080017219A1 (en) | Transducer assembly incorporating a transmitter having through holes, and method and system for cleaning a substrate utilizing the same | |
US20120097195A1 (en) | Methods and Apparatus for Cleaning Semiconductor Wafers | |
JP5974009B2 (ja) | 改良超音波洗浄方法および装置 | |
WO2010066081A1 (en) | Methods and apparatus for cleaning semiconductor wafers | |
CN112735995B (zh) | 基于超声震动式处理的半导体晶圆的清洗装置和方法 | |
CN1219604C (zh) | 超声波清洗方法 | |
CN206854241U (zh) | 用于光电零部件的多频交替振荡超声波清洗仪 | |
CN201862594U (zh) | 清洁晶片装置 | |
JP2004221343A (ja) | 超音波洗浄装置 | |
CN102327883B (zh) | 兆声波清洗头及具有该清洗头的兆声波清洗系统 | |
CN211879335U (zh) | 一种晶圆片表面清洗装置 | |
KR100576823B1 (ko) | 기판세정장치 | |
Kim et al. | A quartz-bar megasonic system for nano-pattern cleaning | |
CN218614812U (zh) | 一种清洗装置 | |
CN220821494U (zh) | 一种升降式半导体集成电路芯片晶圆超声波清洗设备 | |
KR100870525B1 (ko) | 기판 세정 장치 | |
CN102468117A (zh) | 一种清洁晶片装置 | |
KR100870120B1 (ko) | 웨이퍼 세정 장치 및 그의 세정 방법 | |
Kim et al. | Quartz Megasonic System for Cleaning Flat Panel Display | |
KR20050030348A (ko) | 메가소닉을 이용한 웨이퍼 세정장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20220804 Address after: 225500 No. 151, Keji Avenue, Sanshui street, Jiangyan District, Taizhou City, Jiangsu Province Patentee after: Jiangsu Yadian Technology Co.,Ltd. Address before: 210000 room 605-7, Tongxi building, 1347 Shuanglong Avenue, Jiangning District, Nanjing City, Jiangsu Province (Jiangning Development Zone) Patentee before: Yadian Technology Nanjing Co.,Ltd. Patentee before: Jiangsu Yadian Technology Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
CP03 | Change of name, title or address |
Address after: 225500 No. 151, Keji Avenue, Sanshui street, Jiangyan District, Taizhou City, Jiangsu Province Patentee after: Jiangsu Yadian Technology Co.,Ltd. Address before: 225500 No. 151, Keji Avenue, Sanshui street, Jiangyan District, Taizhou City, Jiangsu Province Patentee before: Jiangsu Yadian Technology Co.,Ltd. |
|
CP03 | Change of name, title or address |