CN112725730A

CN112725730A - Method for manufacturing metal mask for OLED evaporation

Info

Publication number: CN112725730A
Application number: CN202011603067.6A
Authority: CN
Inventors: 钱超; 杨柯; 牛恩众; 余强根
Original assignee: Changzhou Gaoguang Semiconductor Materials Co ltd
Current assignee: Changzhou Gaoguang Semiconductor Materials Co ltd
Priority date: 2020-12-30
Filing date: 2020-12-30
Publication date: 2021-04-30

Abstract

The invention discloses a method for manufacturing a metal mask for OLED evaporation, which comprises the following steps: s1, providing a substrate: fixing by adopting three layers of sheet layers, wherein a first sheet layer is made of a nickel-iron alloy, and a second sheet layer and a third sheet layer are made of a binding agent and a magnetic sheet; s2, vacuum heating: maintaining the vacuum environment at a preset temperature of 370 ℃, performing low-temperature heating for multiple times, wherein the first heating temperature and the second heating temperature are not more than 200 ℃, and then heating the substrate in S1 to the preset temperature of 370 ℃; s3, distance adjustment: processing the substrate in S2 by using a plurality of rows of ultrasonic waves to form rectangular ultrasonic waves; s4, sealing: and covering a sealing film on the step in the S3 in a vacuum environment. The invention improves the quality precision of the metal mask plate after multi-level and multi-batch processing, thereby ensuring better manufacturing quality when in use and effectively improving the manufacturing rate of finished products.

Description

Method for manufacturing metal mask for OLED evaporation

Technical Field

The invention relates to the technical field of masks, in particular to a method for manufacturing a metal mask for OLED evaporation.

Background

Reticles are a tool often used in photolithography processes. The traditional mask plate takes quartz glass as a substrate, and a metal part and a hollow part are arranged on the substrate, and the hollow part forms a pattern. During exposure, light irradiates the photoresist through the hollow part, and the purpose of etching the pattern on the photoresist is achieved. And finally forming a required pattern on the substrate by the exposed photoresist through actions such as developing, fixing, evaporation, etching and the like.

The Organic Light Emitting Device (OLED) has more advantages, has infinite prospect in the display field, has the greatest advantage of realizing flexible display, is the basis for realizing the application of an organic light emitting display device, is pure in display color and high in light emitting efficiency, and the accuracy of a metal mask directly influences the performance of the formed organic light emitting device.

Based on the above, the invention designs a method for manufacturing a metal mask for OLED evaporation, so as to solve the above problems.

Disclosure of Invention

The invention aims to provide a method for manufacturing a metal mask for OLED evaporation, which aims to solve the problems in the background technology.

In order to achieve the purpose, the invention provides the following technical scheme:

a manufacturing method of a metal mask for OLED evaporation comprises the following steps:

s1, providing a substrate: fixing by adopting three layers of sheet layers, wherein a first sheet layer is made of a nickel-iron alloy, and a second sheet layer and a third sheet layer are made of a binding agent and a magnetic sheet;

s2, vacuum heating: maintaining the vacuum environment at a preset temperature of 370 ℃, performing low-temperature heating for multiple times, wherein the first heating temperature and the second heating temperature are not more than 200 ℃, and then heating the substrate in S1 to the preset temperature of 370 ℃;

s3, distance adjustment: processing the substrate in S2 by using a plurality of rows of ultrasonic waves to form rectangular ultrasonic waves;

s4, sealing: and covering a sealing film on the step in the S3 in a vacuum environment.

Preferably, in the nickel-iron alloy of the substrate in S1, the nickel element accounts for 20% to 31%.

Preferably, in S1, the substrate has a thickness of 15 to 45 μm.

Preferably, in S2, the interval time between the first heating temperature and the second heating temperature is controlled to be 1-5min, and the heat preservation temperature during temperature control is not lower than 100 ℃.

Preferably, in S3, the substrate in S2 is subjected to multiple batches of ultrasonic tests, and the action time of the rectangular ultrasonic wave is not less than 3 min.

Preferably, the sealing film covers the entire substrate cathode array.

Compared with the prior art, the invention has the beneficial effects that:

by adopting the novel method for manufacturing the real-time mask based on the OLED/OLEC luminous principle, the accuracy of the substrate after the manufacturing is finished is effectively improved, so that errors obtained during relevant operation are more similar, and in addition, the stability of a manufactured device is further improved by adopting a multi-step composite process, so that the quality of subsequent use is indirectly ensured.

Drawings

FIG. 1 is a manufacturing flow chart of a method for manufacturing a metal mask for OLED evaporation according to the present invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Example 1

A method for manufacturing a metal mask for OLED vapor deposition,

the method comprises the following steps:

s1, providing a substrate: the thickness of the plate is 15-45 μm, three layers of sheet layers are adopted for fixing, the first sheet layer is made of nickel-iron alloy, the second sheet layer and the third sheet layer are made of an adhesive and a magnetic sheet, and the nickel element accounts for 20% of the nickel-iron alloy of the substrate in the S1;

s2, vacuum heating: keeping the temperature at 370 ℃, keeping the vacuum environment, and carrying out multiple times of low-temperature heating, wherein the first heating temperature and the second heating temperature are not more than 200 ℃, the interval time of the first heating temperature and the second heating temperature is controlled to be 1min, the heat preservation temperature between temperature control is not less than 100 ℃, and then heating the substrate in S1 to the preset temperature of 370 ℃;

s3, distance adjustment: processing the substrate in S2 by using a plurality of rows of ultrasonic waves to form rectangular ultrasonic waves, wherein in S3, the substrate in S2 is subjected to a plurality of batches of ultrasonic tests, and the action time of the rectangular ultrasonic waves is not less than 3 min;

s4, sealing: under vacuum, a sealing film is overlaid over the entire substrate cathode array.

Example 2

A method for manufacturing a metal mask for OLED vapor deposition,

the method comprises the following steps:

s1, providing a substrate: the thickness of the plate is 15-45 μm, three layers of sheet layers are adopted for fixing, the first sheet layer is made of nickel-iron alloy, the second sheet layer and the third sheet layer are made of an adhesive and a magnetic sheet, and the nickel element accounts for 27% of the nickel-iron alloy of the substrate in the S1;

s2, vacuum heating: keeping the temperature at 370 ℃, keeping the vacuum environment, and carrying out multiple times of low-temperature heating, wherein the first heating temperature and the second heating temperature are not more than 200 ℃, the interval time of the first heating temperature and the second heating temperature is controlled to be 3min, the heat preservation temperature between temperature control is not less than 100 ℃, and then heating the substrate in S1 to the preset temperature of 370 ℃;

Example 3

A method for manufacturing a metal mask for OLED vapor deposition,

the method comprises the following steps:

s1, providing a substrate: the thickness of the plate is 15-45 μm, three layers of sheet layers are adopted for fixing, the first sheet layer is made of nickel-iron alloy, the second sheet layer and the third sheet layer are made of an adhesive and a magnetic sheet, and the nickel element accounts for 31% of the nickel-iron alloy of the substrate in the S1;

s2, vacuum heating: keeping the temperature at 370 ℃, keeping the vacuum environment, and carrying out multiple times of low-temperature heating, wherein the first heating temperature and the second heating temperature are not more than 200 ℃, the interval time between the first heating temperature and the second heating temperature is controlled to be 5min, the heat preservation temperature between temperature control is not less than 100 ℃, and then heating the substrate in S1 to the preset temperature of 370 ℃;

Table one: statistics of unsealing yield

Examples	Time of heating	Nickel element ratio	Time of ultrasonic wave	Rate of good products after unpacking
					1	1min	20％	3min	99.39％
2	3min	27％	3min	100.00％
					3	5min	31％	3min	99.87％

As can be seen from the above table, under the calculation that the calculation base number of the good product rate is 10000 pieces/batch, the operation effect of the nickel element accounts for 27%, the ultrasonic time is 3min, and the heating time is 3min is best suitable for the application of industrial production.

In the description herein, references to the description of "one embodiment," "an example," "a specific example" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

The preferred embodiments of the invention disclosed above are intended to be illustrative only. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise embodiments disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and the practical application, to thereby enable others skilled in the art to best utilize the invention. The invention is limited only by the claims and their full scope and equivalents.

Claims

1. A manufacturing method of a metal mask for OLED evaporation is characterized by comprising the following steps:

2. The method of claim 1, wherein the ni-fe alloy of the substrate in S1 accounts for 20% -31% of the ni content.

3. The method of claim 2, wherein in S1, the substrate has a thickness of 15 μm to 45 μm.

4. The method of claim 1, wherein in S2, the interval between the first and second heating temperatures is controlled to be 1-5min, and the temperature of the temperature controlled interval is not lower than 100 ℃.

5. The method for manufacturing the metal mask for OLED evaporation according to claim 4, wherein the metal mask comprises: and in the step S3, the substrate in the step S2 is subjected to a plurality of batches of ultrasonic tests, and the action time of the rectangular ultrasonic waves is not less than 3 min.

6. The method for manufacturing the metal mask for OLED evaporation according to claim 1, wherein the method comprises the following steps: the sealing film covers the entire substrate cathode array.