CN112713202B - 一种用于太阳能电池的等离子体光学增益膜 - Google Patents
一种用于太阳能电池的等离子体光学增益膜 Download PDFInfo
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Abstract
本发明属于太阳能电池技术领域,具体涉及一种用于太阳能电池的等离子体光学增益膜,该膜由LB法组装、电感耦合等离子体刻蚀、镀膜步骤制成;所述镀膜厚度为4‑10nm;本发明的增益膜避免了对透过光的过多吸收,同时也避免了PS小球溶解过程中金属膜塌陷、撕扯导致的裂纹影响使用性能,其制备方法实现了对纳米颗粒的大小、间距、间隙进行精确调节,来达到仿真设计的要求。
Description
技术领域
本发明属于太阳能电池技术领域,具体涉及一种用于太阳能电池的等离子体光学增益膜。
背景技术
金属等离子体阵列结构薄膜可以通过人为结构设计达到吸收或增强特定波段电磁波的效果。该薄膜运用于太阳能电池表面,增强太阳能电池吸收波段的光强度,并吸收紫外辐射将有利于提高空间中太阳电池的使用寿命和转换效率。目前制备金属表面等离子材料的工艺主要分为两大类,一是“自上而下”,一种是“自下而上”的方法。“自上而下”的方法一般是物理方法,它包含电子束刻蚀(EBL)、聚焦离子束(FIB)技术、光学平板刻法、真空沉积技术等。“自上而下”的方法一般能够很好地控制微结构的形貌和尺寸,但是制备样品的有效面积只能达到平方微米量级,需要昂贵的设备,制备成本高,效率低,这极大限制了金属表面等离子材料的应用。
为了实现纳米级金属表面等离子材料的大规模应用,“自下而上”的方法具有成本廉价、简单易行、生产效率高,且可实现大面积制备的特点,一般是化学方法,它包括溶胶凝胶法、电化学沉积法、直接化学合成、光沉积法等方法,但相较于“自上而下”的方法,其难于很好地控制微结构的形貌和尺寸,具体是:溶胶凝胶法、电化学沉积法等化学方法制备的主要原理是纳米颗粒自组装,自组装形成的纳米阵列结构与纳米颗粒本身材料属性有关,难以人为调控纳米颗粒的大小以及间隙距离,且受环境条件制约很严重,而纳米颗粒的大小和间隙是调节光透过波段的重要因素。
如专利申请号CN201510892435.6公开了一种基于纳米球刻蚀技术联合离子束溅射技术制备有序硅纳米团簇的方法,采用小于100nm直径的聚苯乙烯(PS)纳米球一定的参数配制的PS-甲醇-去离子水的纳米球悬浮液;采用较为成熟的LB法在Si衬底上制备得到单层有序的PS纳米球薄膜。利用KOH对硅衬底的各项异性刻蚀特点,制备尺寸可控的六角密堆纳米坑Si基图形衬底。采用离子束溅射技术,在Si基图形衬底上制备有序的硅纳米团簇,该方法具有低成本、工艺简单、生产效率高等特点,为制备硅纳米团簇太阳能电池提供了更好的途径。但在溶解腐蚀PS小球过程中易造成金属膜孔洞粗糙,难以与仿真的结果相吻合,不便于人为设计。
如专利申请号CN201210477364.X公开了一种间距与形貌可调控的金属纳米颗粒有序阵列的制备方法,该方法利用自组装紧密排布的纳米球层为模版,采用刻蚀法对纳米球自组装层进行刻蚀,改变纳米微球的间隙、尺寸大小和形貌;然后采用热蒸镀法在刻蚀后的纳米球层模板上沉积金属材料;去掉纳米球层后便可得到金属纳米颗粒有序阵列,该方案制备的金属纳米颗粒有序阵列排列整齐有序,呈现周期性重复,纳米颗粒大小基本一致,该方法技术可靠,工艺简单,成本低廉,可工业化生产高质量的间距与形貌可调控的有序排列的纳米颗粒。
若不进行PS小球的溶解形成孔洞,较厚的金属膜会吸收大多数波段的可见光,这又不利于太阳能电池的光电转换。所以,要全面以上缺陷是目前太阳能电池研究的热点。
发明内容
本发明针对现有技术的不足,提出了一种用于太阳能电池的等离子体光学增益膜。
具体是通过以下技术方案来实现的:
一种用于太阳能电池的等离子体光学增益膜,该膜由LB法组装、电感耦合等离子体刻蚀、镀膜步骤制成;所述镀膜厚度为4-10nm。
所述电感耦合等离子体刻蚀,刻蚀气体为O2,刻蚀气体的流速为15sccm,刻蚀时间为8-12min,下电极功率为1W,上电极功率为60W。
具体地,用于太阳能电池的等离子体光学增益膜,其制备方法包括如下步骤:
(1)取直径200nm的PS小球与甲醇,配制成PS小球悬浊液;
(2)PS小球悬浊液经超声处理后,利用LB法组装PS小球层;
(3)对PS小球层进行电感耦合等离子体刻蚀,制得直径为165-175nm的PS小球;
(4)采用真空镀膜设备蒸镀厚度4-10nm的金属膜。
所述PS小球悬浊液,其质量分数为0.5%。
所述超声处理,其工作条件下为:室温,时间30s。
所述LB法组装,其方法具体为:
①将基底材料放置于去离子水液面下,用注射器将PS小球悬浊液缓慢滴加至玻璃盖片表面,使PS小球悬浊液沿玻璃盖片自由滑落至液面,使得PS小球在去离子水面上均匀铺展;
②在培养皿底部使用抽水机进行匀速抽水;
③最后将覆盖水面的基底材料转入无风容器中静置,至表面水层完全蒸发,使PS小球沉积在基底材料表面,制得PS小球层。
所述玻璃盖片与去离子水面呈30°。
所述匀速抽水,其速度为150mL/min。
有益效果:
相比于其他能运用于大规模生产的自组装法(由化学反应生成纳米颗粒再纳米颗粒自动无间隙密排),本发明方法实现了对纳米颗粒的大小、间距、间隙进行精确调节,来达到仿真设计的要求。本发明刻蚀前PS小球改变金属膜间距,对小球改变金属膜直径。而在《一种高度有序纳米颗粒超晶格材料的制备方法》(董安钢等人于2014年发表)和《磁性金属合金纳米粒子的合成与自组装》(钱文等人于2005年发表)的文献中表明传统的化学自组装金属颗粒都是紧密排布,难以人为调控。
本发明采用的电感耦合等离子体刻蚀为物理方法刻蚀,相比于化学方法受到温度、浓度、pH等等各种因素的影响,该方法更加精确,刻蚀精度能得到保障。
本发明限制金属膜厚度为5nm,避免了对透过光的过多吸收,因此减少了对PS小球腐蚀溶解的步骤,同时也避免了PS小球溶解过程中金属膜塌陷、撕扯导致的裂纹影响使用性能。并且过厚和过薄都没有增透的效果,一般理论上金属膜都会增强太阳光的吸收,但是当金属膜尺寸降至纳米级并且有周期性排列的结构以后,会对特定波长的光线出现反常增透的作用,金属膜的厚度以及周期性结构的参数只能是特定值,稍微有偏差就会从增透变成吸收。
实验发现Al包裹PS小球阵列结构,特定波长光波透过后强度增加了6倍。使用掺杂的硅材料作为光源,该光源发射光为445nm,对实施例1的PS小球阵列结构,进行光致发光测试,激发光为250nm的紫外光,对比445nm波段处的发光强度可得,经过该种薄膜增益的光源发光强度增强了6倍,且仿真结果显示发光强度增益效果在445nm以后的波段增益效果更好,对太阳光有更好的增益效果。
附图说明
图1:LB法制备的样品图;
图2:按照实施例1方法制备的样品图;
图3:按照实施例1方法制备的样品发光强度对比图;其中,Uncover为原始未经处理的样品发光强度,Covered为覆盖镀PS小球样品发光强度,Simulation为模拟的发光增益倍数。
具体实施方式
下面对本发明的具体实施方式作进一步详细的说明,但本发明并不局限于这些实施方式,任何在本实施例基本精神上的改进或代替,仍属于本发明权利要求所要求保护的范围。
实施例1
一种用于太阳能电池的等离子体光学增益膜,其制备方法包括如下步骤:
(1)取直径200nm的PS小球与甲醇,配制成质量分数为0.5%的PS小球悬浊液;
(2)PS小球悬浊液于室温下经超声处理30s后,利用LB法组装PS小球层;
(3)对PS小球层进行电感耦合等离子体刻蚀,制得直径为170nm的PS小球;所述电感耦合等离子体刻蚀,刻蚀气体为O2,刻蚀气体的流速为15sccm,刻蚀时间为10min,下电极功率为1W,上电极功率为60W;
(4)采用真空镀膜设备蒸镀厚度5nm的金属膜;
所述LB法组装,其方法具体为:
①将基底材料放置于去离子水液面下,用注射器将PS小球悬浊液缓慢滴加至玻璃盖片表面,保持玻璃盖片与去离子水面呈30°,使PS小球悬浊液沿玻璃盖片自由滑落至液面,使得PS小球在去离子水面上均匀铺展;
②在培养皿底部使用抽水机进行匀速抽水,匀速抽水的速度为150mL/min;
③最后将覆盖水面的基底材料转入无风容器中静置,至表面水层完全蒸发,使PS小球沉积在基底材料表面,制得PS小球层。
实施例2
一种用于太阳能电池的等离子体光学增益膜,其制备方法包括如下步骤:
(1)取直径200nm的PS小球与甲醇,配制成质量分数为0.5%的PS小球悬浊液;
(2)PS小球悬浊液于室温下经超声处理30s后,利用LB法组装PS小球层;
(3)对PS小球层进行电感耦合等离子体刻蚀,制得直径为175nm的PS小球;所述电感耦合等离子体刻蚀,刻蚀气体为O2,刻蚀气体的流速为15sccm,刻蚀时间为12min,下电极功率为1W,上电极功率为60W;
(4)采用真空镀膜设备蒸镀厚度10nm的金属膜;
所述LB法组装,其方法具体为:
①将基底材料放置于去离子水液面下,用注射器将PS小球悬浊液缓慢滴加至玻璃盖片表面,保持玻璃盖片与去离子水面呈30°,使PS小球悬浊液沿玻璃盖片自由滑落至液面,使得PS小球在去离子水面上均匀铺展;
②在培养皿底部使用抽水机进行匀速抽水,匀速抽水的速度为150mL/min;
③最后将覆盖水面的基底材料转入无风容器中静置,至表面水层完全蒸发,使PS小球沉积在基底材料表面,制得PS小球层。
实施例3
一种用于太阳能电池的等离子体光学增益膜,其制备方法包括如下步骤:
(1)取直径200nm的PS小球与甲醇,配制成质量分数为0.5%的PS小球悬浊液;
(2)PS小球悬浊液于室温下经超声处理30s后,利用LB法组装PS小球层;
(3)对PS小球层进行电感耦合等离子体刻蚀,制得直径为165nm的PS小球;所述电感耦合等离子体刻蚀,刻蚀气体为O2,刻蚀气体的流速为15sccm,刻蚀时间为8min,下电极功率为1W,上电极功率为60W;
(4)采用真空镀膜设备蒸镀厚度4nm的金属膜;
所述LB法组装,其方法具体为:
①将基底材料放置于去离子水液面下,用注射器将PS小球悬浊液缓慢滴加至玻璃盖片表面,保持玻璃盖片与去离子水面呈30°,使PS小球悬浊液沿玻璃盖片自由滑落至液面,使得PS小球在去离子水面上均匀铺展;
②在培养皿底部使用抽水机进行匀速抽水,匀速抽水的速度为150mL/min;
③最后将覆盖水面的基底材料转入无风容器中静置,至表面水层完全蒸发,使PS小球沉积在基底材料表面,制得PS小球层。
实施例4
一种用于太阳能电池的等离子体光学增益膜,其制备方法包括如下步骤:
(1)取直径200nm的PS小球与甲醇,配制成质量分数为0.5%的PS小球悬浊液;
(2)PS小球悬浊液于室温下经超声处理30s后,利用LB法组装PS小球层;
(3)对PS小球层进行电感耦合等离子体刻蚀,制得直径为172nm的PS小球;所述电感耦合等离子体刻蚀,刻蚀气体为O2,刻蚀气体的流速为15sccm,刻蚀时间为8min,下电极功率为1W,上电极功率为60W;
(4)采用真空镀膜设备蒸镀厚度8nm的金属膜;
所述LB法组装,其方法具体为:
①将基底材料放置于去离子水液面下,用注射器将PS小球悬浊液缓慢滴加至玻璃盖片表面,保持玻璃盖片与去离子水面呈30°,使PS小球悬浊液沿玻璃盖片自由滑落至液面,使得PS小球在去离子水面上均匀铺展;
②在培养皿底部使用抽水机进行匀速抽水,匀速抽水的速度为150mL/min;
③最后将覆盖水面的基底材料转入无风容器中静置,至表面水层完全蒸发,使PS小球沉积在基底材料表面,制得PS小球层。
Claims (7)
1.一种用于太阳能电池的等离子体光学增益膜,其特征在于,该膜由LB法组装、电感耦合等离子体刻蚀、镀膜步骤制成;所述镀膜厚度为4-10nm;
所述LB法组装,其方法具体为:
①将基底材料放置于去离子水液面下,用注射器将PS小球悬浊液缓慢滴加至玻璃盖片表面,使PS小球悬浊液沿玻璃盖片自由滑落至液面,使得PS小球在去离子水面上均匀铺展;
②在培养皿底部使用抽水机进行匀速抽水;
③最后将覆盖水面的基底材料转入无风容器中静置,至表面水层完全蒸发,使PS小球沉积在基底材料表面,制得PS小球层。
2.如权利要求1所述一种用于太阳能电池的等离子体光学增益膜,其特征在于,所述电感耦合等离子体刻蚀,刻蚀气体为O2,刻蚀气体的流速为15sccm,刻蚀时间为8-12min,下电极功率为1W,上电极功率为60W。
3.如权利要求1所述一种用于太阳能电池的等离子体光学增益膜,其特征在于,其制备方法包括如下步骤:
(1)取直径200nm的PS小球与甲醇,配制成PS小球悬浊液;
(2)PS小球悬浊液经超声处理后,利用LB法组装PS小球层;
(3)对PS小球层进行电感耦合等离子体刻蚀,制得直径为165-175nm的PS小球;
(4)采用真空镀膜设备蒸镀厚度4-10nm的金属膜。
4.如权利要求3所述一种用于太阳能电池的等离子体光学增益膜,其特征在于,所述PS小球悬浊液,其质量分数为0.5%。
5.如权利要求3所述一种用于太阳能电池的等离子体光学增益膜,其特征在于,所述超声处理,其工作条件下为:室温,时间30s。
6.如权利要求1所述一种用于太阳能电池的等离子体光学增益膜,其特征在于,所述玻璃盖片与去离子水面呈30°。
7.如权利要求1所述一种用于太阳能电池的等离子体光学增益膜,其特征在于,所述匀速抽水,其速度为150mL/min。
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