CN112599638A - Laser scribing positioning system and method - Google Patents
Laser scribing positioning system and method Download PDFInfo
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- CN112599638A CN112599638A CN202011474616.4A CN202011474616A CN112599638A CN 112599638 A CN112599638 A CN 112599638A CN 202011474616 A CN202011474616 A CN 202011474616A CN 112599638 A CN112599638 A CN 112599638A
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- line
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- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000005530 etching Methods 0.000 claims abstract description 51
- 238000010147 laser engraving Methods 0.000 claims abstract 4
- 238000002834 transmittance Methods 0.000 claims description 5
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 229910052791 calcium Inorganic materials 0.000 claims 1
- 239000011575 calcium Substances 0.000 claims 1
- 238000010330 laser marking Methods 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 238000010329 laser etching Methods 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/137—Batch treatment of the devices
- H10F71/1375—Apparatus for automatic interconnection of photovoltaic cells in a module
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
- H10F19/90—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers
- H10F19/902—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers for series or parallel connection of photovoltaic cells
- H10F19/904—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers for series or parallel connection of photovoltaic cells characterised by the shapes of the structures
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Photovoltaic Devices (AREA)
Abstract
本发明公开了一种激光刻线定位系统及方法，通过光源发出的光线穿过电池片后进入感光识别装置中得到P1刻蚀线在感光识别装置上的位置，然后计算P1刻蚀线在感光识别装置上的位置与零点之间的相对位置关系，实现对激光刻线的定位，本发明可以代替人工经验，在激光刻蚀P2、P3线时根据P1线识别刻线位置，本发明能够有效的减少线间距，减少死区，并且能够判断刻蚀效果，及时进行刻蚀参数调整，避免过刻和欠刻的问题发生，提高了良品率。
The invention discloses a laser engraving line positioning system and method. The light emitted by a light source passes through a cell and enters a photosensitive identification device to obtain the position of the P1 etching line on the photosensitive identification device, and then calculates the position of the P1 etching line on the photosensitive identification device. The relative positional relationship between the position on the device and the zero point is recognized to realize the positioning of the laser engraved line. The present invention can replace manual experience and identify the engraved line position according to the P1 line when laser etching the P2 and P3 lines. The present invention can effectively It can reduce the line spacing, reduce the dead zone, and can judge the etching effect, adjust the etching parameters in time, avoid the problems of over-etching and under-etching, and improve the yield.
Description
Technical Field
The invention belongs to the technical field of laser reticle positioning, and particularly relates to a laser reticle positioning system and method.
Background
Perovskite solar cells are developing very rapidly as a new type of solar cell. The photoelectric conversion efficiency of perovskite solar cells has been improved from 3.8% to more than 24% nowadays since the discovery in 2009, and the photoelectric conversion efficiency of perovskite solar cells has approached or surpassed the traditional crystalline silicon, copper indium gallium selenide and cadmium telluride cells on the market. Compared with the traditional crystal silicon cell, the perovskite solar cell has the advantages of simple process and greatly reduced cost. In the preparation process of the large-area perovskite cell, series-parallel connection design is required, in the preparation of the perovskite cell with a series structure, laser etching of lines P1, P2 and P3 is an indispensable process, wherein the lines P2 and P3 need to be etched according to the position of the line P1, and in order to reduce dead zones brought by scribing lines as far as possible and further reduce overall performance loss, the distances between the etched lines P1, P2 and P3 are reduced as far as possible on the premise of no overlapping. The general small laser has no positioning function, can only be positioned by rough naked eyes by means of indicating light, has low efficiency, needs certain experience of operators, and avoids the problem of over-etching or under-etching which can increase the resistance between the series sub-batteries and reduce the efficiency of the battery while ensuring the distance and simultaneously avoiding the influence caused by the change of the formula of the perovskite precursor, namely the over-etching or the under-etching.
Disclosure of Invention
In order to solve the problems, the invention provides a laser scribing positioning system and method, which replace manual experience, and identify scribing positions according to a P1 line when laser etches P2 and P3 lines.
In order to achieve the purpose, the invention adopts the following specific technical scheme: a laser scribing positioning method is characterized in that light emitted by a light source penetrates through a battery piece and then enters a photosensitive recognition device to obtain the position of a P1 etching line on the photosensitive recognition device, and then the relative position relation between the position of the P1 etching line on the photosensitive recognition device and a zero point is calculated to realize the positioning of a laser scribing.
Further, the method specifically comprises the following steps that a light source emits vertical parallel light, after the vertical parallel light is vertically incident on the perovskite battery piece, the light penetrates through the perovskite battery and irradiates into the photosensitive recognition device, and the position of a P1 etching line on the photosensitive recognition device is obtained; and positioning points which have a determined relative position relation with the zero point are arranged on the photosensitive recognition device, the relative position relation between the position of the P1 etching line on the photosensitive recognition device and the positioning points is obtained, the relative position relation between the position of the P1 etching line on the photosensitive recognition device and the zero point is obtained through calculation, and the positioning of the laser scribed line is realized.
Further, due to the fact that the transmittance of the P1 etching line position and the transmittance of other positions to light emitted by the light source are different, the photosensitive recognition device is used for determining the position of the P1 etching line on the photosensitive recognition device according to the received patterns of light rays with different wave bands and intensities.
Further, after the relative position relation between the position of the P1 etching line on the photosensitive recognition device and the zero point is obtained, the torsion deviation caused by the placement of the cell is calculated, and the positioning of the laser scribing line is realized.
The invention also provides a laser scribing positioning system, which comprises a light source arranged above the battery piece and a photosensitive recognition device arranged below the battery piece relative to the light source, wherein light rays emitted by the light source pass through the battery piece and then enter the photosensitive recognition device, and the photosensitive recognition device is provided with a positioning point which has a determined relative position relation with a zero point.
Further, the battery piece is a perovskite battery piece.
Furthermore, the battery piece is fixed on the machine.
Further, the light source is used for generating vertical parallel light.
Compared with the prior art, the invention has at least the following beneficial effects that through reasonable system structure design, the accurate positioning of the laser reticle can be carried out without carrying out related marks on the battery piece, in addition, the position judgment is not required to be carried out by depending on the working experience of technicians in the operation process of the invention, the positioning accuracy is ensured, the positioning efficiency is improved to a certain extent, in addition, after the laser reticle is positioned, the P2 line and the P3 line are quickly, accurately and efficiently etched by controlling the movement of a machine table and the emission of laser, and the time and the labor cost are saved.
Furthermore, when the positioning is accurate, the photosensitive recognition device judges whether the over-etching problem or the under-etching problem exists through the light intensity and the spectrum information of the etching lines penetrating through P1, P2 and P3, the position of the laser focus during the line etching is adjusted in an auxiliary mode, the over-etching problem and the under-etching problem are avoided, and the overall performance of the cell is improved. And the subsequent etching process parameters and conditions can be timely adjusted, the yield is ensured, the cost can be effectively saved, the productivity is improved, and the processing quality is ensured.
Drawings
FIG. 1 is a schematic diagram of an exemplary laser scribe line positioning system according to the present invention.
In the attached drawing, 1 is a light source, 2 is a battery piece, 3 is a photosensitive identification device, 4 is a positioning point, and 5 is a machine table.
Detailed Description
The invention is further described with reference to the following figures and detailed description.
As shown in fig. 1, the laser scribing positioning system of the present invention includes a light source 1 disposed above a battery piece 2 for generating vertical parallel light, and a photosensitive recognition device 3 disposed below the battery piece 2 opposite to the light source 1, wherein the battery piece 2 is fixed on a machine table 5 during operation, light emitted from the light source 1 passes through the battery piece 2 and then enters the photosensitive recognition device 3, and a positioning point 4 having a relative position relationship with a zero point is disposed on the photosensitive recognition device 3.
With reference to the positioning system shown in fig. 1, in the positioning method of the present invention, after passing through the cell 2, light emitted by the light source 1 enters the photosensitive recognition device 3 to obtain the position of the P1 etching line on the photosensitive recognition device 3, and then the relative position relationship between the position of the P1 etching line on the photosensitive recognition device 3 and the zero point is calculated to realize the positioning of the laser scribe line, which specifically includes the following steps: the light source 1 emits vertical parallel light, after the vertical parallel light is vertically incident on the perovskite battery piece 2, the light penetrates through the perovskite battery piece 2 and irradiates into the photosensitive recognition device 3, and the position of a P1 etching line on the photosensitive recognition device 3 is obtained; the photosensitive recognition device 3 is provided with a positioning point 4 which has a determined relative position relation with a zero point, the relative position relation between the position of the P1 etching line on the photosensitive recognition device 3 and the positioning point 4 is obtained, the relative position relation between the position of the P1 etching line on the photosensitive recognition device 3 and the zero point is obtained through calculation, and the positioning of the laser reticle is realized.
In the embodiment of the invention, the P1 etching line is positioned based on the difference of the transmittance of the P1 etching line position and the transmittance of the light emitted by the light source 1 at other positions, the light is transmitted differently at the etching position and the non-etching position, and the light received by the position of the P1 scribing line is relatively stronger; and the cell film layer or the charge transport layer absorbs light differently, and some light in certain wave bands is absorbed, so that the position of the P1 etching line on the photosensitive recognition device 3 is determined by the photosensitive recognition device 3 according to the received light patterns in different wave bands and intensities.
In a preferred embodiment of the present invention, after obtaining the relative position relationship between the position of the P1 etching line on the photosensitive recognition device 3 and the zero point, the twisting deviation caused by the placement of the cell 2 is calculated, so as to realize the positioning of the laser scribe line, further control the movement of the machine table 5 and the emission of the etching laser, rapidly, accurately and efficiently etch the P2 line and the P3 line, and save time and labor cost.
In addition, when the positioning is accurate, the photosensitive recognition device judges whether the over-etching problem or the under-etching problem exists through the light intensity and the spectrum information of etching lines penetrating through P1, P2 and P3, the position of a laser focus during scribing is adjusted in an auxiliary mode, the over-etching problem and the under-etching problem are avoided, and the overall performance of the cell is improved. And the subsequent etching process parameters and conditions can be timely adjusted, the yield is ensured, the cost can be effectively saved, the productivity is improved, and the processing quality is ensured.
Claims (8)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011474616.4A CN112599638A (en) | 2020-12-15 | 2020-12-15 | Laser scribing positioning system and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011474616.4A CN112599638A (en) | 2020-12-15 | 2020-12-15 | Laser scribing positioning system and method |
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| Publication Number | Publication Date |
|---|---|
| CN112599638A true CN112599638A (en) | 2021-04-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011474616.4A Pending CN112599638A (en) | 2020-12-15 | 2020-12-15 | Laser scribing positioning system and method |
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| Country | Link |
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| CN (1) | CN112599638A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116202890A (en) * | 2023-05-05 | 2023-06-02 | 山东路达试验仪器有限公司 | Intelligent measuring system and method for elongation of steel bar based on machine vision |
Citations (5)
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|---|---|---|---|---|
| CN204144296U (en) * | 2014-09-29 | 2015-02-04 | 四川汉能光伏有限公司 | A kind of thin film solar cell laser scoring operation on-line monitoring device |
| CN106735869A (en) * | 2016-12-21 | 2017-05-31 | 兰州空间技术物理研究所 | For the contactless localization method of laser vision of numerically controlled processing equipment |
| CN107442946A (en) * | 2017-09-14 | 2017-12-08 | 旭科新能源股份有限公司 | The laser scoring system and method for a kind of flexible thin-film solar cell |
| CN108568599A (en) * | 2017-03-10 | 2018-09-25 | 香港中文大学 | Systems and methods for laser scribing solar panels and solar panels |
| CN212109898U (en) * | 2019-08-24 | 2020-12-08 | 上海翊威半导体有限公司 | A measuring and positioning device based on image recognition |
-
2020
- 2020-12-15 CN CN202011474616.4A patent/CN112599638A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204144296U (en) * | 2014-09-29 | 2015-02-04 | 四川汉能光伏有限公司 | A kind of thin film solar cell laser scoring operation on-line monitoring device |
| CN106735869A (en) * | 2016-12-21 | 2017-05-31 | 兰州空间技术物理研究所 | For the contactless localization method of laser vision of numerically controlled processing equipment |
| CN108568599A (en) * | 2017-03-10 | 2018-09-25 | 香港中文大学 | Systems and methods for laser scribing solar panels and solar panels |
| CN107442946A (en) * | 2017-09-14 | 2017-12-08 | 旭科新能源股份有限公司 | The laser scoring system and method for a kind of flexible thin-film solar cell |
| CN212109898U (en) * | 2019-08-24 | 2020-12-08 | 上海翊威半导体有限公司 | A measuring and positioning device based on image recognition |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116202890A (en) * | 2023-05-05 | 2023-06-02 | 山东路达试验仪器有限公司 | Intelligent measuring system and method for elongation of steel bar based on machine vision |
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Application publication date: 20210402 |
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