CN112551532B - Process for removing impurities in quartz powder by continuous melting high-temperature thermal state method - Google Patents
Process for removing impurities in quartz powder by continuous melting high-temperature thermal state method Download PDFInfo
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- CN112551532B CN112551532B CN202011407807.9A CN202011407807A CN112551532B CN 112551532 B CN112551532 B CN 112551532B CN 202011407807 A CN202011407807 A CN 202011407807A CN 112551532 B CN112551532 B CN 112551532B
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
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Abstract
The invention discloses a process for removing impurities in quartz powder by a continuous melting high-temperature thermal state method, which innovatively utilizes a secondary continuous melting device, directly adds the quartz powder into a continuous melting furnace for production, and effectively discharges various metal impurities, non-metal impurities and gas impurities contained in the quartz powder by adding hydrogen through secondary high-temperature heating, thereby replacing the serious defects of more processes, less impurities and more processes in the prior art, reducing the production links, achieving the best effect of processing the impurities at one time and one-time molding production, and achieving the total impurity content of less than or equal to 10ppm which is superior to the prior art for processing the impurities by using an acid washing process and achieving the domestic advanced level.
Description
Technical Field
The invention relates to a process for removing impurities in quartz powder by a continuous melting high-temperature thermal state method.
Background
At present, in the quartz glass industry, the production of high-purity quartz powder raw materials of 80-120 meshes needs to be carried out by a plurality of complex processes of 72-hour acid washing of quartz powder, high-temperature drying, medium-high magnetic iron removal, 80-120 meshes screening, purity detection and the like, the defects of more production flows, high processing cost, low production efficiency and the like are overcome, and the treatment of the quartz powder generally comprises the following steps:
1. mechanically crushing the quartz stone, and soaking the crushed quartz stone in hydrofluoric acid and hydrochloric acid for 96 hours to remove impurities on the surface of the quartz stone;
2. drying, mechanically crushing and screening to 80-120 meshes;
3. soaking 80-120 meshes of quartz powder in hydrofluoric acid and hydrochloric acid for 72 hours;
4. drying, removing iron by medium and high magnetism, and removing metal impurities of quartz powder in a multi-stage manner;
5. secondary drying, wherein the water content is 1%;
6. detecting impurities in the quartz powder, wherein the total impurity content is less than or equal to 30 ppm;
this mode of operation has the following disadvantages:
1. the quartz powder is treated by acid washing and hydrochloric acid soaking for 72 hours;
2. drying the quartz powder, removing iron by medium and high magnetism, and removing metal impurities of the quartz powder in a multi-stage manner;
3. the quartz powder needs to be dried for the second time, and the water content is removed by 1 percent;
4. the quartz powder needs to be subjected to impurity detection, and the total impurity content is less than or equal to 30 ppm;
disclosure of Invention
The invention aims to solve the technical problem that in the prior art, quartz powder contains a lot of metal and nonmetal impurities, cannot be completely removed in a multiple acid washing process, and still has the defect that part of residual impurities are formed among quartz crystal lattices and cannot be replaced by a physical process, and provides a process for removing the impurities in the quartz powder by a continuous melting high-temperature thermal state method.
In order to solve the technical problems, the invention provides the following technical scheme:
a process for removing impurities in quartz powder by a continuous melting high-temperature thermal state method comprises the following steps:
s1, adding quartz powder into the first layer of continuous melting furnace tungsten-molybdenum crucible, controlling the temperature to be in a non-melting state, continuously introducing hydrogen to enable the hydrogen to permeate between quartz powder crystal lattices, forming partial metal and nonmetal impurities in a high-temperature thermal state to escape in an atomized state, and discharging through the hydrogen;
s2, adding the quartz powder in the non-molten state in the S1 into a tungsten-molybdenum crucible of a second layer continuous melting furnace, carrying out high-temperature melting, forming a hot melt liquid after the high-temperature melting, forming a thermal vortex in the furnace, and enabling metal impurities such as iron, potassium, sodium, lithium, calcium, magnesium and aluminum and non-metal impurities such as feldspar and mica which are lower than the melting point of quartz to escape from gaseous impurities after the hot melting;
s3, forming a self-circulation outlet system by adding hydrogen, and discharging gaseous impurities generated after high-temperature melting and gasification;
and S4, drawing and forming through a forming port to form products such as quartz tubes, rods, plates and the like.
Preferably, the grain size of the quartz powder fed in the S1 is 80-120 meshes, and the heating temperature in the tungsten-molybdenum crucible of the first layer continuous melting furnace of S1 is 1500-1700 ℃.
Further, the temperature of the high-temperature melting in S2 was 2100-2500 ℃.
Furthermore, the quartz product prepared by drawing and forming in S4 contains metal and nonmetal with total impurity content less than or equal to 10 ppm.
Further, in S2, the quartz powder in the first layer of molybdenum crucible is in a non-molten state, and continuously flows into the second layer of continuous melting furnace tungsten-molybdenum crucible under the state of automatically controlling the flow rate. The tungsten-molybdenum crucible of the second layer continuous melting furnace is not connected with the first layer continuous melting furnace.
The invention has the following beneficial effects: the invention innovatively utilizes a secondary continuous melting device, directly adds quartz powder into a continuous melting furnace for production, and effectively discharges various metal impurities, non-metal impurities and gas impurities contained in the quartz powder through adding hydrogen through secondary high-temperature heating, thereby replacing the serious defects of more flows, less impurities and more processes in the prior art, reducing the production links, achieving the best effect of processing the impurities at one time and forming the production at one time, and achieving the total impurity content of less than or equal to 10ppm, which is superior to the prior art of processing the impurities by using an acid washing process and achieving the domestic advanced level.
Detailed Description
The following description of the preferred embodiments of the present invention is provided for the purpose of illustration and description, and is in no way intended to limit the invention.
Examples
A process for removing impurities in quartz powder by a continuous melting high-temperature thermal state method comprises the following steps:
s1, adding 80-120 meshes of quartz powder into a tungsten-molybdenum crucible of a continuous melting furnace through a self-feeding device, controlling the temperature to be 1500-1700 ℃ in a non-melting state, continuously introducing hydrogen to enable the hydrogen to permeate between quartz powder crystal lattices, forming atomized metal and nonmetal impurities to escape in a high-temperature thermal state, and discharging the atomized metal and nonmetal impurities through the hydrogen;
s2, adding the quartz powder in the non-molten state in the S1 into a tungsten-molybdenum crucible of a second layer continuous melting furnace, carrying out high-temperature melting at 2100-2500 ℃, forming a hot melt liquid body after the high-temperature melting, and forming a hot vortex in the furnace;
s3, forming a self-circulation outlet system by adding hydrogen, and discharging gaseous impurities generated after high-temperature melting and gasification;
and S4, drawing and forming through a forming opening.
The embodiment adopts the technical process of the two-stage continuous melting method to replace the prior processes of acid washing, medium-high magnetic iron removal and the like which are carried out at the earlier stage of quartz powder, greatly reduces the pollution to the environment, improves the labor efficiency, reduces the production links, achieves the best effects of one-time impurity treatment and one-time forming production, has the total impurity content less than or equal to 10ppm, is superior to the prior art for treating impurities by using the acid washing process, and achieves the domestic advanced level.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. A process for removing impurities in quartz powder by a continuous melting high-temperature thermal state method is characterized by comprising the following steps:
s1, adding quartz powder into the first layer of continuous melting furnace tungsten-molybdenum crucible, controlling the temperature to be in a non-melting state, continuously introducing hydrogen to enable the hydrogen to permeate between quartz powder crystal lattices, forming partial metal and nonmetal impurities in a high-temperature thermal state to escape in an atomized state, and discharging through the hydrogen;
s2, adding the quartz powder in the non-molten state in the S1 into a tungsten-molybdenum crucible of a second layer continuous melting furnace, carrying out high-temperature melting, forming a hot melt liquid after the high-temperature melting, and forming a hot vortex in the furnace;
s3, forming a self-circulation outlet system by adding hydrogen, and discharging gaseous impurities generated after high-temperature melting and gasification;
and S4, drawing and forming through a forming opening.
2. The process for removing impurities from quartz powder by the continuous melting high-temperature thermal state method according to claim 1, wherein the particle size of the quartz powder fed in S1 is 80-120 meshes.
3. The process for removing impurities from quartz powder by the continuous melting high-temperature thermal state method as claimed in claim 1, wherein the heating temperature in the tungsten-molybdenum crucible of the first layer of continuous melting furnace of S1 is 1500-1700 ℃.
4. The process for removing impurities from quartz powder by the continuous melting high temperature thermal state method as claimed in claim 1, wherein the temperature of the high temperature melting in S2 is 2100-2500 ℃.
5. The process for removing impurities from quartz powder by continuous melting high-temperature thermal state method according to claim 1, wherein the total content of impurities of metals and nonmetals in the quartz product obtained by drawing and forming in S4 is less than or equal to 10 ppm.
6. The process for removing impurities from quartz powder by continuous melting high-temperature thermal state method according to claim 1, wherein the quartz powder in the first layer of tungsten-molybdenum crucible in S2 is in non-molten state, and continuously flows into the second layer of continuous melting furnace tungsten-molybdenum crucible under the state of automatically controlling the flow rate.
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| CN202011407807.9A CN112551532B (en) | 2020-12-03 | 2020-12-03 | Process for removing impurities in quartz powder by continuous melting high-temperature thermal state method |
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| CN202011407807.9A CN112551532B (en) | 2020-12-03 | 2020-12-03 | Process for removing impurities in quartz powder by continuous melting high-temperature thermal state method |
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| CN112551532B true CN112551532B (en) | 2022-03-08 |
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Citations (6)
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|---|---|---|---|---|
| CN101058473A (en) * | 2007-04-05 | 2007-10-24 | 单军成 | Process for producing quartz glass bar by continuous melting method |
| CN101643310A (en) * | 2009-09-03 | 2010-02-10 | 成士林 | Continuous smelting one-step method for producing overlarge-caliber high-temperature deformation resistant quartz glass tube |
| CN102674377A (en) * | 2012-05-04 | 2012-09-19 | 武汉理工大学 | Quartz crystal type conversion metal element gasification integration purification method |
| CN103496705A (en) * | 2013-09-25 | 2014-01-08 | 田辉明 | Method and device for continuously producing high-purity fused quartz material at low cost |
| CN105399313A (en) * | 2015-11-26 | 2016-03-16 | 东海县华亚照明器材有限公司 | Preparation method of quartz glass lens tube |
| CN109796124A (en) * | 2019-03-13 | 2019-05-24 | 新沂市凯达恒业光电科技有限公司 | Quartz continuous melting furnace removes hydroxyl, impurity devices and methods therefor |
-
2020
- 2020-12-03 CN CN202011407807.9A patent/CN112551532B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101058473A (en) * | 2007-04-05 | 2007-10-24 | 单军成 | Process for producing quartz glass bar by continuous melting method |
| CN101643310A (en) * | 2009-09-03 | 2010-02-10 | 成士林 | Continuous smelting one-step method for producing overlarge-caliber high-temperature deformation resistant quartz glass tube |
| CN102674377A (en) * | 2012-05-04 | 2012-09-19 | 武汉理工大学 | Quartz crystal type conversion metal element gasification integration purification method |
| CN103496705A (en) * | 2013-09-25 | 2014-01-08 | 田辉明 | Method and device for continuously producing high-purity fused quartz material at low cost |
| CN105399313A (en) * | 2015-11-26 | 2016-03-16 | 东海县华亚照明器材有限公司 | Preparation method of quartz glass lens tube |
| CN109796124A (en) * | 2019-03-13 | 2019-05-24 | 新沂市凯达恒业光电科技有限公司 | Quartz continuous melting furnace removes hydroxyl, impurity devices and methods therefor |
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