CN112539847A - Large-caliber ultrashort pulse sampling device - Google Patents
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- 238000005070 sampling Methods 0.000 title claims abstract description 109
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- 238000005259 measurement Methods 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 16
- 238000002834 transmittance Methods 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 13
- 239000011248 coating agent Substances 0.000 claims description 6
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- 238000003754 machining Methods 0.000 claims description 5
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- 238000007493 shaping process Methods 0.000 abstract description 3
- 239000005350 fused silica glass Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
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- 238000009532 heart rate measurement Methods 0.000 description 1
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- 230000004048 modification Effects 0.000 description 1
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- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
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Abstract
A large-caliber ultrashort pulse sampling device comprises a sampling mirror and a beam space shaper. The device sets up the trompil on the sampling mirror base member, can realize superstrong ultrashort pulse fidelity sample, adopts beam space shaping device, can guarantee the effective transmission of sample light beam. The device fully considers the time domain and frequency domain characteristics of the ultrashort pulse, and the pulse width is not influenced by the pulse broadening quantity added by the sampling mirror obviously.
Description
Technical Field
The invention relates to ultrashort laser, in particular to a large-caliber ultrashort pulse sampling device which can realize measurement and sampling of the ultrashort pulse time characteristic of a plurality of watts or hundreds of watts with the pulse width smaller than hundred femtoseconds.
Background
In the technical field of ultrashort ultrastrong laser, laser pulse width and pulse signal-to-noise ratio are very important parameters for evaluating the output performance of the ultrashort ultrastrong laser. With the development of ultra-strong and ultra-short pulse technology, the single beam line can realize the output of nearly ten-watt at present, and the laser device of the hundred-watt is also proposed. For such high laser pulse power, due to the nonlinear effect and the spectral characteristics of ultrashort pulses, it is very difficult to accurately measure the time domain characteristics, and the main difficulty lies in the sampling technique of large-aperture light beams.
Because the ultrashort pulse has the characteristics of wide spectrum, short pulse width, high peak power and the like, the compressed pulse is generally measured by adopting transmission sampling to perform real-time online measurement on laser parameters. The measurement content includes pulse energy, pulse width, signal-to-noise ratio, wavefront, signal-to-noise ratio, near field profile, etc. For large-caliber ultrashort pulses, the caliber can generally reach more than 300mm in diameter, the diameter of a corresponding sampling mirror is generally larger than 500mm (the sampling mirror is obliquely arranged at 45 degrees), and the thickness is generally larger than one tenth of the diameter of the sampling mirror in order to ensure the shape of a reflecting surface; considering the dispersion of the sampling mirror material and the B integral under the condition of high power density, after the sampling beam passes through the thicker sampling mirror, the pulse broadening and the B integral of the sampling beam become so considerable that the measurement of the laser pulse, particularly the real-time online measurement of the pulse width, is seriously influenced.
Therefore, it is urgently needed to develop a sampling unit technology oriented to large-caliber ultrashort pulse measurement, so as to realize fidelity sampling of pulse width and further realize real-time online measurement of ultrashort pulse width.
Disclosure of Invention
The invention aims to provide a large-caliber ultrashort pulse sampling device, which adopts the technical scheme of back drilling of a large-caliber optical element and can realize fidelity sampling of pulse width measurement of ultrashort laser pulses.
To achieve the above object, the technical solution of the present invention is as follows:
a large-caliber ultrashort pulse sampling device is characterized in that the device comprises a sampling mirror and a beam space shaper,
the sampling mirror comprises a substrate, a front surface and a rear surface in a sampling mirror hole, the caliber of the substrate is larger than the area of the front surface of the sampling mirror acted by a light beam, and the material transmittance and uniformity meet the light beam sampling requirement; setting a corresponding number of rear surface processing transmission channels according to the number of sampling points, wherein each group of processing transmission channels comprises a processing channel and an optical transmission channel, and the bottoms of the processing channels and the optical transmission channels are overlapped with the rear surface in the sampling lens hole; the processing channel ensures that an apparatus for processing the inner rear surface of the sampling lens hole can reach, and the coating material of the inner rear surface of the sampling lens hole can reach; the optical transmission channel is a sampling beam full-aperture transmission channel, and the channel wall is not irradiated by the sampling beam;
the front surface is formed by processing and coating one surface of the substrate, the surface shape of the front surface meets the requirement of main light path light beam transmission, the film transmittance T is designed according to a working point, and the B integral of a transmission sampling light beam is required to be not more than 1;
the inner rear surface of the sampling lens hole is positioned at the bottom of the processing transmission channel of the substrate, and the maximum distance d from the front surface meets two conditions: firstly, the integral of a sampling light beam B is not more than 1, and secondly, the introduced pulse width broadening quantity meets the requirement of the measurement precision of the pulse width to be measured;
the beam space shaper is tightly attached to the rear surface in the sampling lens hole.
The beam space shaper is a sawtooth diaphragm, a gradient transmittance soft edge diaphragm or a binary soft edge diaphragm, and ensures that the transmittance is slowly reduced from 1 to 0 along the radial direction so as to eliminate the hard edge diffraction in the transmission process of the sampling beam.
The large-caliber ultrashort pulse sampling device has the advantages that:
(1) this device is through the technique of punching, with the local attenuation of sampling mirror, and then time broadening and distortion when effective control superstrong ultrashort laser pulse width measurement sample.
(2) Shaping the sampling light beam by adopting a soft-edge diaphragm, and preventing a measurement error from being introduced by a hard-edge diffraction effect in a laser transmission process;
drawings
FIG. 1 is a schematic diagram of a large-caliber ultrashort-pulse sampling device
In the figure: 10-a sampling mirror; 11-a substrate; 12-a front surface; 13-sampling the rear surface inside the lens hole; 111-machining a transmission channel on the rear surface; 1111-a processing channel; 1112-optical transmission channel; 20-beam space shaper.
FIG. 2 is a schematic diagram of the transmission of the sampling beam of the large-caliber ultrashort-pulse sampling device of the present invention
In the figure: 12-a front surface; 13-sampling the rear surface inside the lens hole; 31-incident main laser light; 32-refracting the sample beam; 33-emitting a sampling beam; 41-plane of the incident main laser wavefront; 42-the central wavelength wavefront plane of the outgoing sample beam.
Detailed Description
The present invention will be described in detail with reference to the following examples and drawings. The following examples will assist those skilled in the art in further understanding the invention, but are not intended to limit the invention in any way. It should be noted that it would be apparent to those skilled in the art that several modifications and improvements can be made without departing from the inventive concept. All falling within the scope of the present invention.
Fig. 1 is a schematic structural diagram of an embodiment of a large-caliber ultrashort pulse sampling device of the present invention. As can be seen from the figure, the large-caliber ultrashort pulse sampling device of the present invention comprises a sampling mirror 10 and a beam space shaper 20,
the sampling mirror 10 comprises a substrate 11, a front surface 12 and a rear surface 13 in a sampling mirror hole, wherein the caliber of the substrate 11 is larger than the area of the front surface of the sampling mirror 10 acted by a light beam, and the material transmittance and uniformity meet the light beam sampling requirement; setting a corresponding number of rear surface processing transmission channels 111 according to the number of sampling points, wherein each set of processing transmission channels 111 comprises a processing channel 1111 and an optical transmission channel 1112, and the bottoms of the processing channels 1111 and the optical transmission channel 1112 are overlapped with the rear surface 13 in the sampling mirror hole; the processing channel 1111 is used for ensuring that an apparatus for processing the inner rear surface 3) of the sampling lens hole can reach, and a coating material on the inner rear surface 13 of the sampling lens hole can reach; the optical transmission channel 1112 is a full aperture transmission channel of the sampling beam, and the channel wall is not irradiated by the sampling beam;
the front surface 12 is formed by processing and coating one surface of the substrate 11, the surface shape of the front surface 12 meets the requirement of main light path light beam transmission, the film transmittance T is designed according to a working point, and the B integral of a transmission sampling light beam is required to be not more than 1;
the inner back surface 13 of the sampling lens hole is positioned at the bottom of the processing and conveying channel 111 of the substrate 11, and the maximum distance d from the front surface 12 meets two conditions: firstly, the integral of a sampling light beam B is not more than 1, and secondly, the introduced pulse width broadening quantity meets the requirement of the measurement precision of the pulse width to be measured;
the beam space shaper 20 is tightly attached to the rear surface 13 of the sampling lens hole.
The beam space shaper 20 is a sawtooth diaphragm, a graded-transmittance soft-edge diaphragm, or a binary soft-edge diaphragm, and ensures that the transmittance is slowly reduced from approximately 1 to 0 along the radial direction, so as to eliminate the hard-edge diffraction during the transmission of the sampling beam.
Examples
The main beam is incident on the front surface 12 of the sampling mirror 10, the front surface 12 having a transmittance T1Most of the energy is reflected and a small part of the energy is transmitted into the substrate 11. The transmitted beam passes through the back surface 13 of the sample aperture, which is coated with an anti-reflective coating.
The pulse width of the designed light beam is t 15Fs (FWHM), the pulse energy E is 400J, and the central wavelength omega0The design and estimation were carried out by selecting fused silica glass as the material of the sampling mirror, 800nm, 200nm (base width) as the spectral width D ω, and 500mm as the beam diameter D.
The diameter of a sampling beam is designed to be 10mm, the energy of the beam for measuring the pulse width under the caliber generally needs to reach the hundred micro-focus level, certain redundancy is considered, and the value of the sampling energy is designed to be 1 mJ. Main beam energy flux density F0Comprises the following steps:
wherein E is the main laser pulse energy, and D is the aperture of the main laser beam. Then the beam energy E is sampledsComprises the following steps:
wherein, T1For the sample mirror transmittance, A is the sample beam diameter, F0Is the main beam energy flux density. In this example, after determining the relevant parameters, the transmittance T can be obtained1It is designed to be about 3 per mill, and the power density is:
where t is the pulse width. In this example IsAbout 85Gw/cm2. Under the condition of the power density, calculating the B integral Sigma B of the sampling optical path through the sampling mirror,
wherein n is the refractive index of the sampling mirror material, n2For second order nonlinear coefficients, the fused silica is: n is2＝3.2×10- 16cm2W, the carry-over correlation value:
changing I to 85Gw/cm2The raw materials are brought into the device,
ΣB＝0.24d
wherein d is the distance from the inner rear surface of the sampling lens hole to the front surface of the sampling lens, and the unit is mm; the integral of the beam B is controlled to be within 1, and thus the maximum value of d is 4 mm.
The time broadening introduced by the group velocity dispersion of the fused silica glass is then examined. As shown in fig. 2, after the main laser beam enters the sampling mirror, the transmitted beam enters the substrate of the sampling mirror, the beam is refracted, and after the beam is transmitted for a certain distance, the beam emitted from the rear surface in the sampling mirror hole is the sampling beam. The incident angle of the main laser is alpha, and the refraction angle of the main laser entering the sampling mirror is beta:
wherein n is the refractive index of the sampling mirror material.
Calculating the optical path and time of the sampling beam from the incident main laser wavefront plane to the central wavelength wavefront plane of the emergent sampling beam, and calculating the optical path P of the central wavelength from the central wavelength to the plane0Comprises the following steps:
n0refractive index of central wavelength, beta0Angle of refraction at the center wavelength.
The optical path length P from other wavelength beams to the plane is as follows:
from this the phase equation of the beam can be written,
the theoretical equation of the pulse width broadening of the light beam is as follows:
wherein, tau is the width of the pulse width to be measured, phi(2)The second derivative of the phase function with respect to the angular frequency ω, in this example,
wherein c is the speed of light in vacuum, n is the refractive index of the sampling beam in the sampling mirror material, alpha is 45 degrees, the processing difficulty and d are comprehensively considered<4mm restriction, d 2 mm. Adopts fused quartz material n-1.4671, GVD-36.163 fs2/mm，dn/dλ＝-0.017284μm-1Substituting the formula to obtain:
φ(2)＝33.2fs2
by this inference, for a pulse of 15fs, the amount of pulse broadening introduced is 0.6fs, or 4%. Considering an uncertainty of about 20% for the measurement of ultrashort pulses, the effect of material dispersion on the pulse width measurement is negligible. If further improvement in measurement accuracy is required, the thickness d of the sampling mirror needs to be reduced, which can have a positive effect on both the control of the B-integration and the pulse width measurement accuracy.
When the sampling light beam is transmitted, in order to avoid the light field modulation caused by the hard edge diffraction, a soft edge diaphragm is arranged on the rear surface in the hole to shape the sampling light beam. The existing sawtooth diaphragms, gradient transmittance soft edge diaphragms, and binary soft edge diaphragms are all used for realizing the soft edge diaphragms.
Experiments show that the device provided by the invention is provided with the opening on the sampling mirror substrate, can realize ultra-strong ultra-short pulse fidelity sampling, and can ensure effective transmission of sampling beams by adopting a beam space shaping device. The device fully considers the time domain and frequency domain characteristics of the ultrashort pulse, and the pulse broadening quantity added by the sampling mirror does not affect the pulse width.
Claims (2)
1. A large-caliber ultrashort pulse sampling device with ultrashort pulse and ultrashort pulse is characterized by comprising a sampling mirror (10) and a beam space shaper (20);
the sampling mirror (10) comprises a substrate (11), a front surface (12) and a rear surface (13) in a sampling mirror hole, the caliber of the substrate (11) is larger than the area of the front surface of the sampling mirror (10) acted by a light beam, and the material transmittance and uniformity meet the light beam sampling requirement; setting a corresponding number of rear surface machining transmission channels (111) according to the number of sampling points, wherein each set of machining transmission channels (111) comprises a machining channel (1111) and an optical transmission channel (1112), and the bottoms of the machining channels (1111) and the optical transmission channels (1112) are overlapped with the rear surface (13) in the sampling lens hole; the processing channel (1111) ensures that an apparatus for processing the inner rear surface (13) of the sampling lens hole can reach, and the coating material of the inner rear surface (13) of the sampling lens hole can reach; the optical transmission channel (1112) is a sampling beam full aperture transmission channel, and the channel wall is not irradiated by the sampling beam;
the front surface (12) is formed by processing and coating one surface of the substrate (11), the surface type of the front surface (12) meets the requirement of main light path light beam transmission, the film transmittance T is designed according to a working point, and the B integral of a transmitted sampling light beam is required to be not more than 1;
the inner rear surface (13) of the sampling lens hole is positioned at the bottom of the processing transmission channel (111) of the substrate (11), and the maximum distance d from the front surface (12) meets two conditions: firstly, the integral of a sampling light beam B is not more than 1, and secondly, the introduced pulse width broadening quantity meets the requirement of the measurement precision of the pulse width to be measured;
the beam space shaper (20) is tightly attached to the rear surface (13) in the sampling lens hole.
2. The ultrashort pulse sampling device of claim 1, wherein the beam space shaper (20) is a sawtooth diaphragm, a gradient transmittance soft edge diaphragm or a binary soft edge diaphragm, ensuring that the transmittance slowly decreases from close to 1 to 0 along the radial direction to eliminate the hard edge diffraction during the transmission of the sampled beam.
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