CN112527025B - Air pressure control device and air pressure adjusting method - Google Patents
Air pressure control device and air pressure adjusting method Download PDFInfo
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- CN112527025B CN112527025B CN201910884282.9A CN201910884282A CN112527025B CN 112527025 B CN112527025 B CN 112527025B CN 201910884282 A CN201910884282 A CN 201910884282A CN 112527025 B CN112527025 B CN 112527025B
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
- G05D16/2026—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means
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- Control Of Fluid Pressure (AREA)
Abstract
A pneumatic control device comprises a reaction chamber, a barometer, a vacuum pump, a first valve and a control unit; the first valve is arranged between the vacuum pump and the reaction chamber; the barometer detects the air pressure in the reaction chamber and sends a first signal to the control unit, the control unit sends a second signal to the first valve according to the first signal, and the opening and closing of the first valve are controlled to maintain the air pressure in the reaction chamber within a preset range; when the opening amount of the first valve is larger than or equal to a preset value, the first valve feeds back a third signal to the control unit, and the control unit sends a fourth signal to the vacuum pump according to the third signal to adjust the gas pumping speed of the vacuum pump. The invention also provides an air pressure adjusting method applied to the air pressure control device, and the air pressure of the reaction chamber is stabilized by adjusting the double regulation and control modes of the opening and closing of the valve and the air pumping speed of the vacuum pump.
Description
Technical Field
The invention relates to the field of semiconductor equipment, in particular to an air pressure control device and an air pressure adjusting method.
Background
In semiconductor manufacturing, control of the pressure of the reaction chamber is one of the important conditions for manufacturing semiconductor devices. For example, in the process of depositing a thin film, it is usually necessary to pump the pressure in the reaction chamber to a state close to vacuum, inject the gas to be reacted, and perform the thin film deposition after adjusting the pressure to a predetermined deposition condition. However, as the number of processes increases, the pumping speed of the reaction chamber and the connecting pipes decreases due to the accumulation of the product powder, so that the throttle valve for controlling the pumping speed needs to maintain the pumping speed by increasing the flow of the gas. The gas flow field of the reaction chamber is not easy to be stable by simply adjusting the air pumping speed by the throttle valve, and the product quality is influenced by the increased fluctuation of the gas flow.
Disclosure of Invention
In view of the above circumstances, it is necessary to provide a gas pressure control device capable of stabilizing the gas pressure of the reaction chamber, reducing fluctuation in gas flow, and a gas pressure adjusting method which should be provided in the gas pressure control device.
A pneumatic control device comprises a reaction chamber, a barometer, a vacuum pump communicated with the reaction chamber, a first valve and a control unit, wherein the control unit is in signal connection with the barometer, the vacuum pump and the first valve respectively; the first valve is arranged between the vacuum pump and the reaction chamber; the barometer detects the air pressure in the reaction chamber and sends a first signal to the control unit, the control unit sends a second signal to the first valve according to the first signal and controls the opening and closing of the first valve to maintain the air pressure in the reaction chamber within a preset range; when the opening amount of the first valve is larger than or equal to a preset value, the first valve feeds back a third signal to the control unit, and the control unit sends a fourth signal to the vacuum pump according to the third signal to adjust the gas pumping speed of the vacuum pump.
Preferably, the vacuum pump adjusts the operating current to vary the rate at which gas is extracted in response to the fourth signal.
Preferably, the first valve includes a driver in signal connection with the control unit for adjusting the opening and closing of the first valve according to the second signal, the vacuum pump is connected to the reaction chamber through a vacuum tube, and the first valve is disposed in the vacuum tube.
Preferably, the first valve comprises a rotary blocking piece, the rotary blocking piece is in transmission connection with the driver, and the driver drives the rotary blocking piece to rotate by a preset angle according to the second signal.
Preferably, the first valve further includes a sensor for detecting a rotation angle of the rotation blocking piece, and if the rotation angle of the rotation blocking piece is greater than or equal to a preset value, the sensor sends the third signal to the control unit, and the control unit increases the operating current of the vacuum pump.
Preferably, when the working current of the vacuum pump changes, the control unit controls the rotary baffle to return to an initial position.
Preferably, the air pressure control device further comprises a second valve disposed between the vacuum pump and the first valve, the second valve being used to open or close an air flow passage of the vacuum pump.
Preferably, the vacuum pump further comprises a current monitor for monitoring the working current of the vacuum pump in real time, and if the working current of the vacuum pump is higher than a safety value, the current monitor sends an alarm signal.
Preferably, the reaction chamber is further communicated with a gas inlet pipeline, the reaction gas flows into the reaction chamber through the gas inlet pipeline, and a third valve is arranged on the gas inlet pipeline and used for controlling the flow rate of the reaction gas.
An air pressure adjusting method applied to the air pressure control device of any one of the above, the air pressure adjusting method comprising:
detecting the air pressure of the reaction chamber, and if the air pressure of the reaction chamber is not in a preset range, sending a first signal to a control unit by an air pressure meter;
the control unit sends a second signal to the first valve according to the first signal so as to adjust the opening and closing of the first valve;
if the opening amount of the first valve is larger than or equal to a preset value, the first valve feeds a third signal back to the control unit;
and the control unit sends a fourth signal to the vacuum pump according to the third signal so as to adjust the working current of the vacuum pump and adjust the pumping speed of the vacuum pump.
Preferably, the controlling unit sends a second signal to the first valve according to the first signal to adjust the opening and closing of the first valve, and the controlling unit includes: and the rotating baffle of the first valve rotates by a preset angle according to the second signal.
Preferably, the air pressure adjusting method further includes:
when the working current of the vacuum pump is adjusted, the control unit controls the rotary baffle to return to the initial position;
the control unit controls the rotation of the rotation blocking piece according to the air pressure in the reaction chamber.
Preferably, the air pressure adjusting method further includes: and if the working current of the vacuum pump is higher than a safety value, the vacuum pump sends out an alarm signal.
The air pressure control device and the air pressure adjusting method stabilize the air pressure of the reaction chamber by adjusting the dual regulation and control modes of opening and closing of the valve and the air pumping speed of the vacuum pump, reduce the fluctuation of air flow and further ensure the quality of the deposited film.
Drawings
Fig. 1 is a schematic structural diagram of an air pressure control device in an embodiment.
Fig. 2 is a schematic structural diagram of a first valve of the pneumatic control device shown in fig. 1.
Fig. 3 is a schematic view of an intake duct structure of the air pressure control apparatus shown in fig. 1.
Fig. 4 is a schematic structural diagram of an air pressure control device in another embodiment.
FIG. 5 is a flow chart of an air pressure adjustment method in one embodiment.
Fig. 6 is a flow chart of an air pressure adjusting method in another embodiment.
Description of the main element symbols:
| air |
100，200 |
| |
1 |
| |
2 |
| Control unit | 3 |
| |
4 |
| |
41 |
| |
42 |
| Connecting |
43 |
| |
44 |
| |
45 |
| Sensor with a |
46 |
| |
5 |
| |
51 |
| |
52 |
| Second valve | 6 |
| |
7 |
| Toxic |
71 |
| Non-toxic |
72 |
The specific implementation mode is as follows:
the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
Example one
Referring to fig. 1, the air pressure control apparatus 100 includes a reaction chamber 1, an air pressure gauge 2, a control unit 3, a first valve 4 and a vacuum pump 5. The vacuum pump 5 is communicated with the reaction chamber 1 and is used for pumping gas in the reaction chamber 1. The control unit 3 is in signal connection with the barometer 2, the vacuum pump 5 and the first valve 4 respectively. The first valve 4 is arranged on the vacuum pipe between the vacuum pump 5 and the reaction chamber 1. The barometer 2 is connected with the reaction chamber 1 and used for detecting the air pressure in the reaction chamber 1, and the barometer 2 sends a first signal to the control unit 3 according to the detected air pressure. The control unit 3 sends a second signal to the first valve 4 according to the first signal, and controls the opening and closing of the first valve 4 to maintain the air pressure in the reaction chamber 1 within a predetermined range. The first valve 4 feeds back a third signal to the control unit 3 according to the opening of the valve, and when the opening of the first valve 4 is greater than or equal to a preset value, the first valve feeds back the third signal to the control unit 3. And the control unit 3 sends a fourth signal to the vacuum pump 5 according to the third signal to adjust the working current of the vacuum pump 5, so as to adjust the gas pumping speed of the vacuum pump 5, and maintain the gas pressure in the reaction chamber 1 within a preset range.
Referring to fig. 1, 2 and 3, the reaction chamber 1 is further communicated with a gas inlet pipe through which the reaction gas flows into the reaction chamber 1, and the gas inlet pipe is further provided with a third valve 7 for controlling the flow rate of the reaction gas. In another embodiment, the gas inlet pipeline may further include a toxic gas pipeline and a non-toxic gas pipeline for conveying toxic reaction gas and non-toxic reaction gas, respectively, and a toxic substance reminding mark is disposed on the toxic gas pipeline. And a toxic gas pipeline valve 71 and a non-toxic gas pipeline valve 72 are respectively arranged on the toxic gas pipeline and the non-toxic gas pipeline and used for respectively regulating and controlling the flow of the toxic gas and the flow of the non-toxic gas. The pipelines of different gases are separately arranged, so that the maintenance of equipment by an engineer is facilitated, and the personal safety of the engineer is guaranteed.
The first valve 4 comprises a driver 41, and the driver 41 is in signal connection with the control unit 3 and controls the opening of the first valve 4 according to the signal of the control unit 3. The first valve 4 is preferably a throttle valve and the actuator 41 is preferably a stepper motor. A stepping motor is an open-loop control motor that can convert an electrical pulse signal into an angular or linear displacement. In the non-overload condition, the rotation speed and stop position of the motor only depend on the frequency and pulse number of the pulse signal, and are not influenced by the load change, when the stepping driver receives a pulse signal, the stepping driver drives the stepping motor to rotate by a fixed angle in a set direction, namely a step angle, and the rotation of the stepping motor is operated by one step at any fixed angle (for example, 2 degrees). The stepping motor can control the angular displacement by controlling the number of pulses, thereby achieving the purpose of accurate positioning; meanwhile, the rotating speed and the rotating acceleration of the motor can be controlled by controlling the pulse frequency, so that the aim of speed regulation is fulfilled.
The first valve 4 includes a rotary flap 45 and a rotary shaft 44. The rotary baffle 45 is arranged in the vacuum tube, and the inner diameter of the vacuum tube is matched with the rotary baffle 45 in size. The rotating shaft 44 is disposed approximately in the middle of the rotating flap 45, and the driver 41 drives the rotating shaft 44 to rotate, so as to drive the rotating flap 45 to rotate to open or close the first valve 4. The rotation angle of the rotation blocking piece 45 corresponds to the opening amount of the first valve 4. The driver 41 drives the rotating shaft 44 to rotate through a transmission assembly 42, and the rotating shaft 44 is connected with the transmission assembly 42 through a connecting piece 43.
When the pneumatic control device 100 is started, the rotating flap 45 is located at an initial position, that is, the position of the rotating flap 45 when the first valve 4 is closed. When the barometer 2 detects that the air pressure in the reaction chamber 1 is higher than a preset range, the barometer 2 sends a first signal to the control unit 3, and the control unit 3 sends a second signal to the driver 41 according to the first signal, so that the driver 41 drives the rotating blocking piece 45 to rotate by a preset angle. If the rotation angle of the rotation blocking piece 45 is smaller than a preset value, it indicates that the rotation amplitude of the rotation blocking piece 45 is within an acceptable range, and the airflow fluctuation in the reaction chamber 1 cannot be caused, and the barometer 2 continues to detect the air pressure in the reaction chamber 1. It will be appreciated that the predetermined angle should be less than the predetermined value. If the air pressure in the reaction chamber 1 is maintained within a predetermined range, the rotation of the rotation blocking piece 45 is stopped and maintained at the current position. If the air pressure in the reaction chamber 1 is still higher than the air pressure value within the preset range, the control unit 3 continues to adjust the opening amount of the first valve 4, that is, controls the rotating barrier 45 to continue to rotate by a predetermined angle, so as to increase the air flow in the vacuum tube, thereby reducing the air pressure in the reaction chamber 1.
When the rotation angle of the rotation blocking piece 45 is greater than or equal to the preset value, it indicates that the rotation amplitude of the rotation blocking piece 45 is too large, which may cause the fluctuation of the air flow in the reaction chamber 1, and the driver 41 sends a third signal to the control unit 3. Since the driver 41 is preferably a stepping motor, the rotation angle of the rotation flap 45 can be converted into a pulse signal or other electrical signal of an encoder in the stepping motor, and in a preferred embodiment, when the increment of the number of pulse signals is greater than or equal to a threshold value, for example, greater than or equal to 10% of a set value, it can be determined that the rotation angle of the rotation flap 45 is greater than or equal to the preset value. In other embodiments, the first valve 4 may further include a sensor 46 disposed on the rotation flap 45 for detecting a rotation angle of the rotation flap 45. If the rotation angle of the rotation blocking sheet 45 is greater than or equal to the preset value, the sensor 46 sends the third signal to the control unit 3.
The control unit 3 sends a fourth signal to the vacuum pump 5 according to the third signal, so as to increase the working current of the vacuum pump 5, thereby increasing the pumping speed of the vacuum pump 5 to control the air pressure of the reaction chamber 1 within the preset range. If the gas pressure of the reaction chamber 1 is still higher than the preset range, the control unit 3 continuously increases the working current of the vacuum pump 5 to control the gas pressure of the reaction chamber 1 within the preset range.
It can be understood that when the gas pressure in the reaction chamber 1 is smaller than the preset range, the control unit 3 may also decrease the rotation angle of the rotation blocking piece 45 or return the rotation blocking piece 45 to the initial position, and simultaneously decrease the operating current of the vacuum pump 5.
In another embodiment, when the operating current of the vacuum pump is changed, in order to reduce the fluctuation of the gas flow in the reaction chamber 1, the control unit 3 may first control the rotation flap 45 to return to the initial position, and then readjust the rotation angle of the rotation flap 45 according to the gas pressure detected by the gas pressure gauge 2.
The pneumatic control device 100 further comprises a second valve 6, wherein the second valve 6 is disposed between the vacuum pump 5 and the first valve 4. The second valve 6 is used for opening or closing the airflow channel of the vacuum pump 5, and is suitable for equipment maintenance or installation.
In another embodiment, the vacuum pump 5 may further comprise a current monitor 52 for monitoring the operating current of the vacuum pump 5 in real time. When the operating current of the vacuum pump 5 is higher than a safety value, the current monitor 52 sends an alarm signal, and an engineer or the control unit 3 can stop the vacuum pump 5 according to the alarm signal, so as to prevent the vacuum pump 5 from being damaged.
Example two
Referring to fig. 4, the air pressure control apparatus 200 of the second embodiment is substantially the same as the air pressure control apparatus 100 of the first embodiment, except that the air pressure control apparatus 200 includes at least one backup vacuum pump 51. The backup vacuum pump 51 and the vacuum pump 5 are connected in parallel to the second valve 6, and the second valve 6 can selectively communicate with the vacuum pump 5 and/or the backup vacuum pump 51.
When the working current of the vacuum pump 5 is higher than a safety value, the control unit 3 controls the second valve 6 to connect the back-up vacuum pump 51 and disconnect the vacuum pump 5, and the control unit 3 adjusts the working current of the back-up vacuum pump 51 according to the air pressure of the reaction chamber 1 and the rotation angle of the rotating baffle 45.
In other embodiments, the vacuum pump 5 and the back-up vacuum pump 51 may be simultaneously connected to the second valve 6, the operating current of the vacuum pump 5 is maintained at a safe value, and the control unit 3 adjusts the operating current of the back-up vacuum pump 51 according to the air pressure of the reaction chamber 1 and the rotation angle of the rotation barrier 45. Or, the working current of the backup vacuum pump 51 is a fixed value, and the control unit 3 adjusts the working current of the vacuum pump 5 according to the air pressure of the reaction chamber 1 and the rotation angle of the rotation baffle 45.
Referring to fig. 5, the present invention provides an air pressure adjusting method applied to the air pressure control device according to the first embodiment or the second embodiment, wherein the air pressure adjusting method includes the following steps:
s1, detecting the air pressure of the reaction chamber 1, and judging whether the air pressure of the reaction chamber 1 reaches a preset range. Step S1 may be performed by a barometer 2. If the pressure in the reaction chamber reaches a predetermined range, it indicates that the pressure in the reaction chamber 1 is stable, and the process, such as deposition of a thin film, can be started. If the air pressure of the reaction chamber 1 is not within the predetermined range, the barometer 2 sends a first signal to the control unit 3.
In other embodiments, the step of determining whether the gas pressure of the reaction chamber 1 reaches the predetermined range may be performed by the control unit 3, and the barometer 2 transmits the detected gas pressure value to the control unit 3 by generating the first signal.
And S2, adjusting the first valve 4, and judging whether the opening of the first valve 4 reaches a preset value. The control unit 3 sends a second signal to the driver 41 of the first valve 4 according to the first signal to control the opening and closing of the first valve 4.
Specifically, the driver 41 drives the rotation blocking piece 45 of the first valve 4 to rotate by a predetermined angle from the initial position according to the second signal, and determines whether the rotation angle of the rotation blocking piece 45 reaches a preset value, that is, determines whether the opening amount of the first valve 4 reaches the preset value.
And if the opening amount of the first valve 4 is smaller than the preset value, repeating the step S1. If the opening of the first valve 4 reaches the preset value, the first valve 4 feeds back a third signal to the control unit 3, and the step S3 is performed.
And S3, adjusting the working current of the vacuum pump 5, and judging whether the working current of the vacuum pump 5 is higher than a safety value. The control unit 3 increases the working current of the vacuum pump 5 according to the third signal to increase the pumping speed of the vacuum pump 5. And if the working current of the vacuum pump 5 is less than or equal to the safety value, repeating the step S1. If the working current of the vacuum pump 5 is higher than the safety value, the vacuum pump 5 sends an alarm signal, and the control unit 3 or an engineer can stop the vacuum pump 5 in time according to the alarm signal to avoid the damage of the vacuum pump 5.
In a preferred embodiment, when adjusting the operating current of the vacuum pump 5, in order to reduce the fluctuation of the gas flow in the reaction chamber 1, the control unit 3 may first control the rotating flap 45 to return to the initial position, and then readjust the rotating angle of the rotating flap 45 according to the gas pressure detected by the gas pressure meter 2.
Referring to fig. 6, in another embodiment, the air pressure adjusting method further includes a step S4, when the working current of the vacuum pump 5 is higher than a safe value, the standby vacuum pump 51 is connected to the air pressure control device, and then the step S1 is repeated.
Specifically, when the working current of the vacuum pump 5 is higher than a safe value, the control unit 3 controls the second valve 6 to connect the back-up vacuum pump 51 and disconnect the vacuum pump 5, and the control unit 3 adjusts the working current of the back-up vacuum pump 51 according to the air pressure of the reaction chamber 1 and the rotation angle of the rotation barrier 45.
In other embodiments, the vacuum pump 5 and the back-up vacuum pump 51 can also be simultaneously connected to the second valve 6, the operating current of the vacuum pump 5 is maintained at a safe value, and the control unit 3 adjusts the operating current of the back-up vacuum pump 51 according to the air pressure of the reaction chamber 1 and the rotation angle of the rotating barrier 45. Or, the working current of the backup vacuum pump 51 is a fixed value, and the control unit 3 adjusts the working current of the vacuum pump 5 according to the air pressure of the reaction chamber 1 and the rotation angle of the rotation barrier 45.
The air pressure control device and the air pressure adjusting method stabilize the air pressure of the reaction chamber by adjusting the dual regulation and control modes of opening and closing the valve and the air pumping speed of the vacuum pump, control the opening amount of the valve within a small range, reduce the air flow fluctuation and further ensure the quality of a deposited film.
Although the present invention has been described in detail with reference to the preferred embodiments, it will be understood by those skilled in the art that various changes may be made and equivalents may be substituted without departing from the spirit and scope of the invention.
Claims (7)
1. An air pressure control device comprising:
a reaction chamber;
the barometer is connected with the reaction chamber;
a vacuum pump in communication with the reaction chamber;
a first valve; and
the control unit is in signal connection with the barometer, the vacuum pump and the first valve respectively;
wherein the first valve is disposed between the vacuum pump and the reaction chamber;
the barometer detects the air pressure in the reaction chamber and sends a first signal to the control unit, the control unit sends a second signal to the first valve according to the first signal and controls the opening and closing of the first valve to maintain the air pressure in the reaction chamber within a preset range;
when the opening amount of the first valve is larger than or equal to a preset value, the first valve feeds back a third signal to the control unit, and the control unit sends a fourth signal to the vacuum pump according to the third signal to adjust the speed of the vacuum pump for pumping gas;
the vacuum pump is connected with the reaction chamber through a vacuum tube, and the first valve is arranged in the vacuum tube; the first valve comprises a driver, a rotating separation blade and a sensor, the driver is in signal connection with the control unit, the rotating separation blade is in transmission connection with the driver, the driver drives the rotating separation blade to rotate by a preset angle according to the second signal, the sensor is used for detecting the rotating angle of the rotating separation blade, if the rotating angle of the rotating separation blade is larger than or equal to a preset value, the sensor sends a third signal to the control unit, and the control unit improves the working current of the vacuum pump; when the working current of the vacuum pump is changed, the control unit controls the rotating blocking piece to return to an initial position.
2. The gas pressure control apparatus as claimed in claim 1, wherein the vacuum pump adjusts an operating current according to the fourth signal to change a rate of pumping the gas.
3. The air pressure control device as claimed in claim 1, further comprising a second valve provided between the vacuum pump and the first valve, the second valve being used to open or close an air flow passage of the vacuum pump.
4. The apparatus as claimed in claim 2, wherein the vacuum pump further comprises a current monitor for monitoring an operating current of the vacuum pump in real time, the current monitor generating an alarm signal if the operating current of the vacuum pump is higher than a safety value.
5. An air pressure adjusting method applied to the air pressure control device according to any one of claims 1 to 4, wherein the air pressure adjusting method comprises:
detecting the air pressure of the reaction chamber, and if the air pressure of the reaction chamber is not in a preset range, sending a first signal to a control unit by an air pressure meter;
the control unit sends a second signal to the first valve according to the first signal so as to adjust the opening and closing of the first valve;
if the opening amount of the first valve is larger than or equal to a preset value, the first valve feeds a third signal back to the control unit;
and the control unit adjusts the working current of the vacuum pump according to the third signal so as to adjust the air suction speed of the vacuum pump.
6. The method as claimed in claim 5, wherein the controlling unit sending a second signal to the first valve according to the first signal to adjust the opening and closing of the first valve comprises:
and the rotating blocking piece of the first valve rotates by a preset angle according to the second signal.
7. The air pressure adjusting method according to claim 6, further comprising:
when the working current of the vacuum pump is adjusted, the control unit controls the rotary baffle to return to the initial position;
the control unit controls the rotation of the rotation blocking piece according to the air pressure in the reaction chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910884282.9A CN112527025B (en) | 2019-09-19 | 2019-09-19 | Air pressure control device and air pressure adjusting method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910884282.9A CN112527025B (en) | 2019-09-19 | 2019-09-19 | Air pressure control device and air pressure adjusting method |
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| CN112527025A CN112527025A (en) | 2021-03-19 |
| CN112527025B true CN112527025B (en) | 2023-03-17 |
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|---|---|---|---|---|
| CN1420526A (en) * | 2001-11-19 | 2003-05-28 | 旺宏电子股份有限公司 | Device and method for regulating pressure at expulsion in vacuum system of semiconductor reaction chamber |
| JP2003282554A (en) * | 2002-03-20 | 2003-10-03 | Fujitsu Ltd | Method and apparatus for manufacturing semiconductor device |
| CN1851856A (en) * | 2005-12-08 | 2006-10-25 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Reaction chamber for semiconductor treatment |
| JP2011003599A (en) * | 2009-06-16 | 2011-01-06 | Elpida Memory Inc | Apparatus and method of producing semiconductor |
| CN204680655U (en) * | 2015-06-12 | 2015-09-30 | 中芯国际集成电路制造(北京)有限公司 | Air-pressure balancing device, reative cell extract system and semiconductor board |
| CN104989692A (en) * | 2015-07-20 | 2015-10-21 | 圣邦集团有限公司 | Compound control-type variable pump and control method thereof |
| CN106681385A (en) * | 2016-12-23 | 2017-05-17 | 北京航空航天大学 | Low-pressure automatic control device of PLC vacuum container |
-
2019
- 2019-09-19 CN CN201910884282.9A patent/CN112527025B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1420526A (en) * | 2001-11-19 | 2003-05-28 | 旺宏电子股份有限公司 | Device and method for regulating pressure at expulsion in vacuum system of semiconductor reaction chamber |
| JP2003282554A (en) * | 2002-03-20 | 2003-10-03 | Fujitsu Ltd | Method and apparatus for manufacturing semiconductor device |
| CN1851856A (en) * | 2005-12-08 | 2006-10-25 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Reaction chamber for semiconductor treatment |
| JP2011003599A (en) * | 2009-06-16 | 2011-01-06 | Elpida Memory Inc | Apparatus and method of producing semiconductor |
| CN204680655U (en) * | 2015-06-12 | 2015-09-30 | 中芯国际集成电路制造(北京)有限公司 | Air-pressure balancing device, reative cell extract system and semiconductor board |
| CN104989692A (en) * | 2015-07-20 | 2015-10-21 | 圣邦集团有限公司 | Compound control-type variable pump and control method thereof |
| CN106681385A (en) * | 2016-12-23 | 2017-05-17 | 北京航空航天大学 | Low-pressure automatic control device of PLC vacuum container |
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| Publication number | Publication date |
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| CN112527025A (en) | 2021-03-19 |
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