CN112485854A - Transmission reflector and application thereof in reducing damage risk of back scattering light to laser driver - Google Patents
Transmission reflector and application thereof in reducing damage risk of back scattering light to laser driver Download PDFInfo
- Publication number
- CN112485854A CN112485854A CN202011547389.3A CN202011547389A CN112485854A CN 112485854 A CN112485854 A CN 112485854A CN 202011547389 A CN202011547389 A CN 202011547389A CN 112485854 A CN112485854 A CN 112485854A
- Authority
- CN
- China
- Prior art keywords
- transmission
- transmission reflector
- reflector
- laser
- curing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The invention discloses a transmission reflector and application thereof in reducing the damage risk of back scattering light to a laser driver, belonging to the technical field of optical elements, wherein the preparation steps of the transmission reflector comprise: irradiating a K9 optical material by using high-energy rays, annealing and curing a material color center, optically processing the surface of a transmission reflector, irradiating and curing the color center by using ultraviolet laser, and plating a high-threshold reflecting film on the reflecting surface of the transmission reflector; two transmission reflectors are adopted in a transmission light path to respectively perform primary reflection and secondary reflection, so that the risk of damage of back scattering light to a laser driver is reduced.
Description
Technical Field
The invention relates to the technical field of optical elements, in particular to a transmission reflector and application thereof in reducing the damage risk of back scattering light to a laser driver.
Background
The laser incident target generates and couples with plasma, which is the first link of various high energy density physical processes driven by laser. When laser and plasma interact, electrons in the plasma oscillate along the polarization direction of an electric field in a laser electromagnetic field, and ideally, the oscillating electrons can exchange energy to ions through collision, change the state of electrons in an ion shell and emit X-rays through subsequent processes of recombination, transition and the like. Then, if there is a disturbance in the plasma density at the initial moment, a large number of oscillating electrons combine with the density disturbance to form an oscillating current in the transverse direction, and the oscillating current can excite another electromagnetic wave and couple with the incident electromagnetic wave in the form of a mass dynamic force. Due to the matching of the frequency and wave vectors, the ponderomotive force in turn further enhances the disturbance of the Plasma density, which leads to the continuous amplification of the initial disturbance and the formation of an unstable positive feedback mechanism, which is a typical parametric process in the interaction of Laser and Plasma, and is generally called Laser Plasma Instability (LPI).
LPI is very easily excited due to the inevitable presence of initial density perturbations in the plasma (e.g., thermal noise, etc.), typical LPI including Stimulated Brillouin Scattering (SBS) and Stimulated Raman Scattering (SRS). The spectrum of the backscattered light generated by Stimulated Brillouin Scattering (SBS) is 351nm, and according to the latest research at present, the maximum average flux of the SBS backscattered light can reach 2J/cm2Above, this greatly increases the risk of damage to the fundamental frequency band of the laser driver.
One of the problems that plague the design and development of high power solid state laser drivers is how to control the SBS backscattered light and reduce the risk of damage to the fundamental frequency band optical elements and structural components.
The schematic diagram of the final optical path of a high-power solid laser driver currently used in a high-energy-density physical experiment is shown in fig. 1, and 1053nm main laser a is injected into a target field transmission optical path from a preceding stage, and is finally guided into a terminal optical component 3 by two transmission reflectors, namely a first transmission reflector 1 and a second transmission reflector 2, and is frequency-doubled to 351nm and focused to a target 4. SBS backscattered light B formed by stimulated Brillouin scattering returns to the terminal optical component 3 from the target point 4, reaches the second transmission reflector 2 and the first transmission reflector 1 after penetrating through the terminal optical component 3, and is transmitted to the fundamental frequency section after being reflected by the two transmission reflectors.
According to the current public report, the energy density of SBS back scattering light exceeds 2J/cm2There are two types of conditions that can cause impairments in the fundamental frequency band:
1. transmission mirror back structure:
the transmission reflecting mirror is generally arranged in a marshalling station mirror box, the back surface of the transmission reflecting mirror is generally an aluminum alloy or stainless steel supporting structure, the inner wall of the aluminum alloy mirror box pipeline is provided with a 351nm damage threshold value of the metal surface of the transmission reflecting mirror, and the damage threshold value of the metal surface is generally 100mJ/cm2The following. The transmission reflector is usually made of K9 material, K9 material has high 351nm transmittance (K9 material with the thickness of 10mm and the internal absorptivity of 351nm is only 0.8%), and if the energy density of 351nm laser transmitted to a structural member at the back of the transmission reflector is reduced, a 351nm high-reflection film is required to be plated on the front surface. Taking the thickness of the transmission reflector as 100mm as an example, if the energy density of 351nm laser reaching the rear surface is reduced to 100mJ/cm2The 351nm reflectivity of the front surface film layer needs to be about 95 percent;
2. starting from the transmission mirror, various fundamental optical elements along the optical path:
the high-power solid laser driver base frequency band optical element film layer generally adopts a dielectric film (hafnium oxide-silicon dioxide film system), and the 351nm damage threshold can realize 2J/cm except for individual special manufacturing process (with high cost)2On the left and right sides, no matter whether the plating is a antireflection film or a high-reflection film, the 351nm laser damage threshold value of the other elements is difficult to exceed 1J/cm2Is generally at 0.5J/cm2The following. If transmission mirror film coatingThe 351nm high-reflection film requires that the 351nm laser damage threshold of the fundamental frequency band element is increased to 2J/cm2On the other hand, the current dielectric film technology level cannot be supported.
Disclosure of Invention
It is an object of the present invention to provide a transmission mirror to solve the above problems.
In order to achieve the purpose, the technical scheme adopted by the invention is as follows: a transmission reflector is prepared by the following method:
(1) irradiating a K9 optical transmission reflector by high-energy rays;
(2) carrying out high-temperature annealing and curing on the color center of the transmission reflector in the step (1);
(3) optically processing the surface of the transmission reflector processed in the step (2);
(4) ultraviolet laser irradiation curing the color center of the transmission reflector processed in the step (3);
(5) and (4) plating a high-threshold reflecting film on the reflecting surface of the transmission reflecting mirror processed in the step (4).
Wherein, the above steps (1) and (2) are aimed at irradiating the K9 optical transmission reflector material with high-energy rays such as gamma rays to generate a color center, curing the color center at high temperature to cure 351nm absorption coefficient, so that the K9 optical transmission reflector after generating the color center does not generate degradation in the necessary temperature rise process of the coating process, and the requirement of 351nm energy density metal damage threshold after primary reflector absorption is met (generally the requirement is less than 50 mJ/cm)2) (ii) a The two-step material manufacturing process is detailed in Chinese invention patent application: CN111018329A A method for preparing and curing an optical component/optical material color center;
as a preferred technical scheme: in the step (4), the method for curing the color center of the transmission reflector by ultraviolet laser irradiation comprises the following steps: the pulse width is 8ns-10ns, and the energy density is 1.5J/cm2-2J/cm2The spectrum range of the ultraviolet pulse laser is 350nm-360nm, and the irradiation times are more than 450 times.
Step (4) 355nm laser irradiation curing is carried out on the color center after high-temperature curing, so that the change of transmissivity caused by the degradation of the material color center due to ultraviolet laser irradiation in the subsequent use process is prevented, an experimental curing curve is shown in fig. 2, 355nm pulse laser is adopted for continuous irradiation for about 500 times, so that the color center of the transmission reflector material is completely cured, and the absorption characteristic of the transmission reflector material is not changed after SBS laser is absorbed subsequently; the darkened material is finally manufactured into a transmission reflector capable of absorbing back scattering light, namely 351nm pulse laser, through cold processing and coating, if the darkened K9 optical transmission reflector material which is not cured at high temperature is adopted, the color center of the material will be changed if a high-temperature coating mode is adopted in the coating process, and the material characteristics cannot be guaranteed to be stable. Therefore, the process of high-temperature or low-temperature coating is adopted, and whether the process of high-temperature curing color center needs to be added in the former stage is directly determined. The reason why 355nm laser is adopted for irradiating and curing the color center is that if the 355nm laser is not adopted for curing the color center, the material is in the process of being continuously modified by 351nm back reflection, which is not beneficial to the stability of the material characteristics; moreover, since the inventor needs to sample and measure the remaining 351nm laser light transmitted through the transmission mirror in the experiment, if the transmittance of the laser light is continuously changed, the sampling measurement is inaccurate, and the material cannot be used directly.
Step (5) is to carry on the coating to the transmission reflector, except meeting the high anti-requirement of 1053nm fundamental frequency band, subtract and reflect to 351nm position, require the reflectance to meet the energy density after the primary reflection and meet the damage threshold requirement of the secondary reflector, and propose the damage threshold requirement of 351nm to the surface membranous layer of the component (wherein the damage threshold requirement of the primary reflector is unanimous with SBS scattered light energy density, the damage threshold requirement of the secondary reflector is correlated with reflectance of the primary reflector), the concrete membranous layer implementation method is referred to the patent application of the invention: CN111235527A method for manufacturing optical film, film system structure, film coating method, and laser mirror.
Another object of the present invention is to provide an application of the transmission mirror in reducing the risk of damage to a laser driver caused by backscattered light, specifically: and two transmission reflectors are adopted in a transmission light path to respectively perform primary reflection and secondary reflection.
Compared with the prior art, the invention has the advantages that: the invention adopts a special method to prepare the transmission reflector with stable color center and a coating layer, can protect the elements of the front-stage fundamental frequency band from being damaged by the ultraviolet laser with high energy density by the reflection reduction of the surface high-threshold film layer to the 351nm laser, and simultaneously transfers the pressure of absorbing the ultraviolet laser with high energy density to the transmission reflector for the first reflection and the second reflection. In the traditional method, high-threshold absorption glass is additionally arranged behind a transmission reflector and used for protecting a supporting structural member, but the method cannot avoid the formation of three optical surfaces, namely the rear surface of the transmission reflector and the front and rear surfaces of the absorption glass, and the residual reflection of the optical surfaces can influence the control effect of the high-energy-density ultraviolet laser. According to the invention, the original K9 glass material which does not absorb 351nm laser has the characteristic of stable absorption through three processes of gamma ray irradiation, high-temperature curing of color centers and ultraviolet irradiation curing of color centers, and the three processes are mutually cooperated, and experimental tests show that the damage threshold of the 351nm laser of the material exceeds 2J/cm2Can bear laser energy density up to 2J/cm2SBS backscattered light formed by stimulated Brillouin scattering is stably absorbed by the material, so that the energy density of laser incident to the surface of a structural component for supporting a reflector is greatly reduced, and the structural component is not damaged by SBS backscattered light with high energy density; meanwhile, the absorption glass with the optical surface can be prevented from being additionally introduced, and the damage risk of high-energy-density ultraviolet laser to the structural member is reduced.
Drawings
FIG. 1 is a schematic diagram of a final optical path of a typical high power solid state laser driver;
FIG. 2 is a graph of cure;
FIG. 3 is a diagram of a spectral design of a high threshold reflective coating in an embodiment of the invention.
In the figure: 1. a first transfer mirror; 2. a second transmitting mirror; 3. a terminal optical assembly; 4. a target point; A. a main laser; B. SBS backscatters light.
Detailed Description
The invention will be further explained with reference to the drawings.
Example (b):
a transmission reflector is prepared by the following method:
taking a K9 optical material (transmission reflector) with the size of 10mm multiplied by 2mm, cleaning the optical material by acetone, drying the optical material, and irradiating the optical material by adopting gamma rays with the dose rate of 80Gy/min in the irradiation atmosphere of air and the total absorbed dose of glass of 20 kGy; then placing the sample after the irradiation is finished in a constant temperature annealing furnace at 300 ℃ for annealing for 12h, and obtaining the optical material with stable color center curing through testing the optical performance of the material, wherein the transmissivity of the optical material is stabilized to be about 77.5%;
then, carrying out conventional optical processing on the surface of the transmission reflector;
irradiating the transmission reflector after the optical processing by using 500-shot ultraviolet pulse laser with the pulse width of 10ns and the energy density of 2J/cm2；
The method for plating the high-threshold reflecting film on the reflecting surface after the ultraviolet laser irradiation curing is carried out, and the specific method comprises the following steps: plating SiO by adopting an electronic evaporation mode2-HfO2Dielectric film with spectral design as shown in FIG. 3;
the transmission reflector prepared by the method reduces the damage risk of the back scattering light to the high-power solid laser driver, and the light path of the transmission reflector is still as shown in figure 1, which is different from the improvement of the performance of the transmission reflector;
in this embodiment, the SBS back reflected light initial energy density is 2J/cm2After being reflected by the first transmission reflector, the highest energy density is less than 1J/cm2The transmitted energy density satisfies the metal damage threshold, about 0.3J/cm2(ii) a After being reflected by a second transmission reflector, the highest energy density is less than 0.5J/cm2The transmitted energy density satisfies the metal damage threshold, about 0.1/cm2。
Fig. 2 and 3 are fitted according to the experimental results, and the trend of the actual color center change is stable after a certain ultraviolet irradiation dose is accumulated; the energy density set at present mainly prevents the material from being damaged by ultraviolet pulse laser, and the material is damaged by excessively high energy density.
Comparative example 1
Compared with the preparation method of the transmission reflector in the embodiment 1, the preparation method of the transmission reflector in the comparative example directly carries out coating operation after finishing optical processing, namely, ultraviolet laser irradiation curing is not carried out, the rest is the same as the embodiment 1, then the transmission reflector is used for carrying out test by adopting the same optical path, and the result is that:
the initial energy density of SBS back reflected light is 2J/cm2After being reflected by the first transmission reflector, the highest energy density is less than 0.7J/cm2The transmitted energy density meets the metal damage threshold value, less than 0.1J/cm2(ii) a After being reflected by a second transmission reflector, the highest energy density is less than 0.25J/cm2The transmitted energy density satisfies the metal damage threshold of about 0.03J/cm2；
The purpose of the uv irradiation is mainly to stabilize the color center, and if the step of uv irradiation curing is not added, in fact, the absorption coefficient of uncured darkening K9 will decrease, so that the requirement of the absorption coefficient cannot be met; the cured darkened K9 absorption coefficient will increase, which will result in too high an absorption coefficient due to the substantially uniform initial absorption coefficient requirements, which will result in a lower uv damage threshold and ultimately result in vulnerability. Of course, even though the partially transmitting mirror also requires the addition of a sampling measurement on the back side, the change in absorption coefficient will render the measurement completely inaccurate. The final threshold requirement is consistent, and the final absorption coefficient is adjusted by the dose of gamma irradiation and the temperature of high temperature curing.
Comparative example 2
Compared with the preparation method of the transmission reflector in the embodiment 1, the preparation method of the transmission reflector in the comparative example has the advantages that after the gamma ray is irradiated, the high-temperature curing color center is not carried out, the coating operation is directly carried out after the optical processing, the rest is the same as the embodiment 1, then the transmission reflector is used for carrying out the test by adopting the same optical path, and the result is that:
the initial energy density of SBS back reflected light is 2J/cm2After being reflected by the first transmission reflector, the highest energy density is less than 0.6J/cm2Of transmission typeThe energy density meets the metal damage threshold and is less than 0.1J/cm2(ii) a (at this time, the absorption coefficient of the material is too high, and damage can be caused in the ultraviolet laser irradiation process.) after the reflection of the second transmission reflecting mirror, the highest energy density is less than 0.5J/cm2The transmitted energy density satisfies the metal damage threshold and is less than 0.03/cm2. With the increase of the use time, the absorption coefficient of the ultraviolet laser continuously becomes lower due to the continuous irradiation of the ultraviolet laser, and the final absorption coefficient depends on the energy density and the times of the ultraviolet laser irradiation.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.
Claims (3)
1. A transmission reflector is characterized by being prepared by the following method:
(1) irradiating a K9 optical transmission reflector by high-energy rays;
(2) carrying out high-temperature annealing and curing on the color center of the transmission reflector in the step (1);
(3) optically processing the surface of the transmission reflector processed in the step (2);
(4) ultraviolet laser irradiation curing the color center of the transmission reflector processed in the step (3);
(5) and (4) plating a high-threshold reflecting film on the reflecting surface of the transmission reflecting mirror processed in the step (4).
2. The transfer mirror of claim 1, wherein: in the step (4), the method for curing the color center of the transmission reflector by ultraviolet laser irradiation comprises the following steps: the pulse width is 8ns-10ns, and the energy density is 1.5J/cm2-2J/cm2The spectrum range of the ultraviolet pulse laser is 350nm-360nm, and the irradiation times are more than 450 times.
3. Use of a transfer mirror as claimed in claim 1 for reducing the risk of damage to a laser driver from backscattered light, wherein: and two transmission reflectors are adopted in a transmission light path to respectively perform primary reflection and secondary reflection.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011547389.3A CN112485854B (en) | 2020-12-24 | 2020-12-24 | Transmission reflector and application thereof in reducing damage risk of back scattering light to laser driver |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011547389.3A CN112485854B (en) | 2020-12-24 | 2020-12-24 | Transmission reflector and application thereof in reducing damage risk of back scattering light to laser driver |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112485854A true CN112485854A (en) | 2021-03-12 |
| CN112485854B CN112485854B (en) | 2022-04-22 |
Family
ID=74915502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011547389.3A Active CN112485854B (en) | 2020-12-24 | 2020-12-24 | Transmission reflector and application thereof in reducing damage risk of back scattering light to laser driver |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112485854B (en) |
Citations (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003028716A (en) * | 2001-07-11 | 2003-01-29 | Canon Inc | Spectrometric instrument and method for spectrometric measurement |
| CN1609639A (en) * | 2004-10-27 | 2005-04-27 | 上海大学 | Ultraviolet optical fiber with high-transmission ability and producing method thereof, and deposition apparatus containing high-hydroxyl optical fibre prefabricated bar |
| CN1908707A (en) * | 2006-08-04 | 2007-02-07 | 天津爱天光电子科技有限公司 | Preparation of distributed optical fiber sensor reflector |
| CN102101945A (en) * | 2009-12-16 | 2011-06-22 | 比亚迪股份有限公司 | Ultraviolet curing paint and preparation method thereof |
| US20150118483A1 (en) * | 2013-10-24 | 2015-04-30 | Shin-Etsu Chemical Co., Ltd. | Photocurable coating composition, laminate, and automotive headlamp covering sheet |
| EP2959774A1 (en) * | 2003-03-28 | 2015-12-30 | Inguran, LLC | Method of cryopreserving sperm cells |
| CN107063641A (en) * | 2017-01-16 | 2017-08-18 | 中国工程物理研究院激光聚变研究中心 | A kind of method of Nondestructive Evaluation optic element damage performance |
| CN107377533A (en) * | 2017-09-12 | 2017-11-24 | 深圳市华星光电半导体显示技术有限公司 | A kind of ultraviolet irradiation device |
| CN108512023A (en) * | 2018-05-29 | 2018-09-07 | 中国人民解放军国防科技大学 | System for realizing high-brightness narrow-linewidth ytterbium-doped optical fiber laser amplification |
| US20180345709A1 (en) * | 2015-11-30 | 2018-12-06 | Agfa-Gevaert | Laser markable compositions and methods to manufacture a packaging therewith |
| CN109273980A (en) * | 2018-10-31 | 2019-01-25 | 安徽工程大学 | The device and method of laser near-field uniformity is improved based on stimulated Brillouin scattering |
| CN109541801A (en) * | 2018-12-06 | 2019-03-29 | 中国工程物理研究院激光聚变研究中心 | A kind of stray light managing and control system and method for high power-terminal optical system |
| CN110651209A (en) * | 2017-04-21 | 2020-01-03 | 努布鲁有限公司 | Multi-clad optical fiber |
| CN110944952A (en) * | 2017-03-31 | 2020-03-31 | 康宁股份有限公司 | High transmission glass |
| CN111018329A (en) * | 2019-12-23 | 2020-04-17 | 中国工程物理研究院核物理与化学研究所 | Preparation and curing method of optical component/optical material color center |
| CN111235527A (en) * | 2020-03-10 | 2020-06-05 | 中国工程物理研究院激光聚变研究中心 | Method for manufacturing optical thin film, film system structure, film coating method and laser reflector |
| CN111863345A (en) * | 2020-07-02 | 2020-10-30 | 嘉兴市爵拓科技有限公司 | Composite flexible conductive film with multilayer structure and preparation method thereof |
-
2020
- 2020-12-24 CN CN202011547389.3A patent/CN112485854B/en active Active
Patent Citations (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003028716A (en) * | 2001-07-11 | 2003-01-29 | Canon Inc | Spectrometric instrument and method for spectrometric measurement |
| EP2959774A1 (en) * | 2003-03-28 | 2015-12-30 | Inguran, LLC | Method of cryopreserving sperm cells |
| CN1609639A (en) * | 2004-10-27 | 2005-04-27 | 上海大学 | Ultraviolet optical fiber with high-transmission ability and producing method thereof, and deposition apparatus containing high-hydroxyl optical fibre prefabricated bar |
| CN1908707A (en) * | 2006-08-04 | 2007-02-07 | 天津爱天光电子科技有限公司 | Preparation of distributed optical fiber sensor reflector |
| CN102101945A (en) * | 2009-12-16 | 2011-06-22 | 比亚迪股份有限公司 | Ultraviolet curing paint and preparation method thereof |
| US20150118483A1 (en) * | 2013-10-24 | 2015-04-30 | Shin-Etsu Chemical Co., Ltd. | Photocurable coating composition, laminate, and automotive headlamp covering sheet |
| US20180345709A1 (en) * | 2015-11-30 | 2018-12-06 | Agfa-Gevaert | Laser markable compositions and methods to manufacture a packaging therewith |
| CN107063641A (en) * | 2017-01-16 | 2017-08-18 | 中国工程物理研究院激光聚变研究中心 | A kind of method of Nondestructive Evaluation optic element damage performance |
| CN110944952A (en) * | 2017-03-31 | 2020-03-31 | 康宁股份有限公司 | High transmission glass |
| CN110651209A (en) * | 2017-04-21 | 2020-01-03 | 努布鲁有限公司 | Multi-clad optical fiber |
| CN107377533A (en) * | 2017-09-12 | 2017-11-24 | 深圳市华星光电半导体显示技术有限公司 | A kind of ultraviolet irradiation device |
| CN108512023A (en) * | 2018-05-29 | 2018-09-07 | 中国人民解放军国防科技大学 | System for realizing high-brightness narrow-linewidth ytterbium-doped optical fiber laser amplification |
| CN109273980A (en) * | 2018-10-31 | 2019-01-25 | 安徽工程大学 | The device and method of laser near-field uniformity is improved based on stimulated Brillouin scattering |
| CN109541801A (en) * | 2018-12-06 | 2019-03-29 | 中国工程物理研究院激光聚变研究中心 | A kind of stray light managing and control system and method for high power-terminal optical system |
| CN111018329A (en) * | 2019-12-23 | 2020-04-17 | 中国工程物理研究院核物理与化学研究所 | Preparation and curing method of optical component/optical material color center |
| CN111235527A (en) * | 2020-03-10 | 2020-06-05 | 中国工程物理研究院激光聚变研究中心 | Method for manufacturing optical thin film, film system structure, film coating method and laser reflector |
| CN111863345A (en) * | 2020-07-02 | 2020-10-30 | 嘉兴市爵拓科技有限公司 | Composite flexible conductive film with multilayer structure and preparation method thereof |
Non-Patent Citations (3)
| Title |
|---|
| YANG YU-JIE等: "Anti-reflective mesoporous SiO<sub>2</sub> films with high laser-induced damage threshold", 《HIGH POWER LASER AND PARTICLE BEAMS》 * |
| 钟勉 等: "高功率脉冲电子束辐照SiO2的光学和激光损伤性能", 《物理学报》 * |
| 黄进 等: "利用紫外激光处理提高熔石英损伤阈值的研究", 《激光技术》 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN112485854B (en) | 2022-04-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Jiao et al. | Fabrication of kW-level chirped and tilted fiber Bragg gratings and filtering of stimulated Raman scattering in high-power CW oscillators | |
| EP3457430A1 (en) | Laser driven sealed beam lamp with dual focus regions | |
| US5394411A (en) | Method for producing high intensity optical through x-ray waveguide and applications | |
| US20120070115A1 (en) | All glass fiber laser cladding mode stripper | |
| EP3104201B1 (en) | Structure for eliminating excess light, and fiber laser | |
| Chenais et al. | Multiwatt, tunable, diode-pumped CW Yb: GdCOB laser | |
| Baumhacker et al. | Layout and performance of the Asterix IV iodine laser at MPQ, Garching | |
| CN112485854B (en) | Transmission reflector and application thereof in reducing damage risk of back scattering light to laser driver | |
| Yoshida et al. | Temporal compression by stimulated Brillouin scattering of Q-switched pulse with fused-quartz and fused-silica glass from 1064 nm to 266 nm wavelength | |
| Chen et al. | High-damage-threshold chirped mirrors for next-generation ultrafast, high-power laser systems | |
| Zhu et al. | Pulse fluctuations caused by the thermal lens effect in a passively Q-switched laser system | |
| Babin et al. | Ionization spectrum broadening and frequency blue-shift of high-intensity femtosecond laser pulses in gas-filled capillary tubes | |
| US20030063630A1 (en) | Passively Q-switched laser | |
| JP2956759B2 (en) | Laser beam damper | |
| Kim et al. | High-power repetitively pulsed ytterbium lasers with supershort pulse width and direct diode pumping for technological and biomedical applications | |
| JP4998786B2 (en) | Laser introduction and X-ray extraction mechanism for X-ray generator | |
| WO2018237048A1 (en) | High power integrated delivery cable | |
| Fischer et al. | High Harmonic Generation Inside Thin-Disk Laser Oscillators–An Efficient and Single-Stage XUV Source | |
| Fischer et al. | Coated grazing incidence plate for XUV out-coupling of intracavity high harmonics from a thin-disk laser oscillator | |
| JPH08111551A (en) | Aperture for laser and laser oscillator using it | |
| CN115693367A (en) | Optical pumping metastable inert gas laser adopting laser-induced pre-ionization | |
| Daido et al. | Collisional excitation soft X-ray laser at 23.6 nm in a laser-produced cylindrical target | |
| CN112968346B (en) | High-damage-threshold film saturable absorber device, preparation method and application | |
| CN106532420A (en) | Mixed chamber mode locking laser oscillator and laser outputting method thereof | |
| Šulc et al. | Influence of V: YAG saturable absorber orientation on linearly polarized laser Q-switching |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |