CN112462528A - Partitioned uniform illumination optical system, projection system including the same, and electronic apparatus - Google Patents
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- 238000005286 illumination Methods 0.000 title claims abstract description 40
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- 238000003491 array Methods 0.000 claims abstract description 39
- 238000005192 partition Methods 0.000 claims abstract description 24
- 238000003384 imaging method Methods 0.000 claims abstract description 5
- 241000226585 Antennaria plantaginifolia Species 0.000 claims description 14
- 238000012937 correction Methods 0.000 claims description 9
- 238000010586 diagram Methods 0.000 description 10
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0961—Lens arrays
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0916—Adapting the beam shape of a semiconductor light source such as a laser diode or an LED, e.g. for efficiently coupling into optical fibers
- G02B27/0922—Adapting the beam shape of a semiconductor light source such as a laser diode or an LED, e.g. for efficiently coupling into optical fibers the semiconductor light source comprising an array of light emitters
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
- H01S5/0085—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping for modulating the output, i.e. the laser beam is modulated outside the laser cavity
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/42—Arrays of surface emitting lasers
- H01S5/423—Arrays of surface emitting lasers having a vertical cavity
Abstract
The invention provides a partitioned uniform illumination optical system for a VCSEL partitioned light source, which comprises: the micro lens array can receive the light beams emitted by the VCSEL partition light source and homogenize the light beams; and the lens is arranged on the downstream of the optical path of the micro lens array and is used for imaging the light field homogenized by the micro lens array onto a target plane, wherein the VCSEL subarea light source comprises a plurality of light source arrays spaced along a first direction, the micro lens array is configured to project a point light source into at least one linear light field extending along a second direction perpendicular to the first direction, and the light field areas formed on the target plane after the adjacent light source arrays in the VCSEL subarea light source pass through the subarea homogenizing and illuminating optical system are mutually adjacent or overlapped in the first direction.
Description
Technical Field
The present invention generally relates to the field of optical technologies, and in particular, to a partitioned uniform illumination optical system, a partitioned uniform illumination projection system including the same, and an electronic device.
Background
Currently, the existing TOF (Time-Of-Flight) scheme in the mobile phone industry is an Indirect Time-Of-Flight (Indirect Time-Of-Flight) method, and the distance Of a target object is calculated by using an Indirect scheme, such as phase change Of a transmitting light field and a receiving light field. Compared with the time-of-flight ranging of a direct timestamp, the error of indirect measurement is large, for example, when multiple targets are tested, the error can be converted into an average value, a distance is calculated, and the influence of indirect measurement environmental noise is large. These problems can be solved by using time-of-flight ranging directly with time stamps. Aiming at the market demand, a sensor for a Direct Time-Of-Flight (DTOF) method is designed, and in order to match the sensor to work, the partitioned uniform light illumination Of a light field needs to be realized. In addition, in many specific applications, it is desirable to provide a range of uniformly distributed light fields.
Vertical cavity surface emitting lasers VCSELs are widely used lasers. The dodging sheet of some diffractive optical elements performs dodging on the light field emitted by the whole VCSEL chip, but when the VCSEL chip has partitions and gaps exist between the partitions, phase distribution calculation of the diffractive optical element is performed on the whole emitted light field, which may cause non-uniformity of the light field of a portion corresponding to the gaps between the partitions in the target light field region and other regions, thereby affecting reconstruction of 3D information.
The statements in the background section are merely prior art as they are known to the inventors and do not, of course, represent prior art in the field.
Disclosure of Invention
In view of at least one of the drawbacks of the prior art, the present invention provides a solution for using a microlens array as a light uniformizing device. The invention provides a partitioned uniform illumination optical system for a VCSEL partitioned light source, which is characterized by comprising the following components:
the micro lens array can receive the light beams emitted by the VCSEL partition light source and homogenize the light beams;
the lens is arranged on the downstream of the optical path of the micro lens array and is used for imaging the light field homogenized by the micro lens array onto a target plane,
the VCSEL partition light source comprises a plurality of light source arrays spaced along a first direction, the micro lens array is configured to project a point light source into at least one linear light field extending along a second direction perpendicular to the first direction, and the light field areas formed on the target plane after adjacent light source arrays in the VCSEL partition light source pass through the partition even light illumination optical system are mutually adjacent or overlapped in the first direction.
According to an aspect of the invention, the microlens array is configured to project the point light sources into two sets of light fields spaced apart from each other, each set of light fields including at least one linear light field extending along the second direction, and the two sets of light fields projected by the point light sources adjacent in the first direction in the light source array, respectively, are sequentially spliced to form a continuous light field.
According to an aspect of the invention, the field angle range of the linear light field matches the field angle range of the target light field region corresponding to each of the light source arrays in the second direction.
According to an aspect of the invention, wherein the plurality of light source arrays have intervals along the second direction, the field angle ranges of the linear light field are set such that light field areas formed on the target surface by adjacent light source arrays abut or overlap each other in the second direction.
According to one aspect of the invention, wherein the lens is a fresnel lens.
According to an aspect of the invention, wherein the fresnel lens is a fresnel lens with pincushion distortion correction.
According to an aspect of the present invention, wherein the microlens array includes a plurality of microlens array sub-units corresponding to the plurality of light source arrays spaced apart in the first direction, and pincushion distortion correction is performed respectively for curved surface types of the microlenses in the plurality of microlens array sub-units.
The present invention also provides a partitioned dodging projection system, comprising:
a VCSEL-partitioned light source comprising a plurality of light source arrays having a spacing along a first direction;
the partitioned uniform illumination optical system is arranged on the downstream of the optical path of the VCSEL partitioned light source, receives the light beams emitted by the light source arrays and projects partitioned uniform illumination light fields on a target plane.
According to an aspect of the invention, wherein the plurality of light source arrays have a spacing along a second direction, the second direction being perpendicular to the first direction.
The invention also provides an electronic device comprising the zoned dodging illumination projection system as described above.
In the embodiment of the invention, the light source array can adopt a row of partitions or two rows of partitions, and different solutions can be provided respectively. Gaps exist between adjacent partitions, the light source partitions are lighted in turn, when each light source partition is lighted, only the area corresponding to the partition in the target light field is uniformly lighted, and when all the partitions are lighted together, the whole target light field is uniformly lighted, and dark areas caused by the gaps between the partitions do not exist, so that the partition uniform lighting of the target light field is realized.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:
FIG. 1A shows a schematic view of a zoned uniform illumination optical system and a projection system including the same according to one embodiment of the present invention;
FIG. 1B shows a schematic view of a zoned uniform illumination optical system and a projection system including the same according to one embodiment of the present invention;
FIG. 2 schematically illustrates a front schematic view of a VCSEL-partitioned light source;
FIG. 3A illustrates a schematic diagram of a target light field used in designing a surface profile structure for microlenses in a microlens array according to one embodiment of the present invention;
FIG. 3B shows a schematic diagram of an actual projected light field of a microlens array designed according to the target light field shown in FIG. 3A;
FIG. 3C is a schematic diagram of a plurality of the actual projected light fields of FIG. 3B spliced to achieve a dodging illumination field;
FIG. 4 is a schematic diagram illustrating 6 VCSEL single point light sources adjacent to each other in a first direction in a light source array and a light field projected by the 6 VCSEL single point light sources after passing through a microlens array according to an embodiment of the invention;
FIG. 5 is a schematic diagram of a projected light field simulated by a zoned dodging projection system in accordance with an embodiment of the present invention;
FIG. 6 shows a light field schematic of a Neell lens producing pincushion distortion with a large field of view;
FIG. 7A shows a design process for adding barrel distortion when designing a microlens surface profile;
fig. 7B shows a schematic diagram of a curved line segment with barrel distortion as the target light field instead of a straight line segment.
Detailed Description
In the following, only certain exemplary embodiments are briefly described. As those skilled in the art will recognize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention. Accordingly, the drawings and description are to be regarded as illustrative in nature, and not as restrictive.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the description of the present invention, it should be noted that unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection, either mechanically, electrically, or in communication with each other; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly above and obliquely above the second feature, or simply meaning that the first feature is at a lesser level than the second feature.
The following disclosure provides many different embodiments or examples for implementing different features of the invention. To simplify the disclosure of the present invention, the components and arrangements of specific examples are described below. Of course, they are merely examples and are not intended to limit the present invention. Furthermore, the present invention may repeat reference numerals and/or letters in the various examples, such repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, the present invention provides examples of various specific processes and materials, but one of ordinary skill in the art may recognize applications of other processes and/or uses of other materials.
The embodiments of the present invention will be described in conjunction with the accompanying drawings, and it should be understood that the embodiments described herein are only for the purpose of illustrating and explaining the present invention, and are not intended to limit the present invention.
FIG. 1A shows a schematic view of a zoned dodging illumination projection system 100 according to one embodiment of the present invention. The zoned uniform illumination projection system 100 includes a zoned uniform illumination optical system 101 and a VCSEL zoned light source 20, where the zoned uniform illumination optical system 101 includes a microlens array (MLA)10 and a lens 30, and the VCSEL zoned light source 20 includes a plurality of light source arrays (refer to fig. 2) having a spacing in a first direction, which will be described in detail below. The micro lens array 10 is arranged at the downstream of the optical path of the VCSEL partition light source 20, the micro lens array 10 can receive the light beam emitted by the VCSEL partition light source 20 and homogenize the received light beam, and the lens 30 is arranged at the downstream of the optical path of the micro lens array 10 and is used for imaging the light field homogenized by the micro lens array 10 onto a target plane 40 to form a partition homogenized light illumination field. S is the distance between the VCSEL zonal light source 20 and the microlens array 10, g is the distance between the microlens array 10 and the lens 30, L is the distance (i.e. the working distance) between the zonal uniform illumination optical system 101 and the target plane 40, the working distance is a system parameter, and g is determined by the focal length of L and the lens 30 and the imaging relationship.
The microlens array 10 is used to homogenize light and provide a portion of the optical power required for the zoned homogenization illumination projection system 100, and the lens 30 is used to provide another portion of the optical power. When the light beam emitted by the VCSEL zonal light source 20 irradiates the front surface of the microlens array 10, the light field of the light source is distributed by spherical waves, which is equivalent to forming a virtual image of a target light field at the light source surface of the VCSEL zonal light source 20, and after the virtual images of the transverse VCSEL point light sources passing through the microlens array 10 are superposed on the light source surface of the VCSEL zonal light source 20, the signal lines are dispersed by matching with the size effect of the single-point light source of the VCSEL to form a light field with homogenized intensity distribution. The lens 30 is used to image the virtual image at the source face of the VCSEL zoned source 20 in the far field to form the target light field.
FIG. 1B shows a schematic view of a zoned dodging illumination projection system 100' according to another embodiment of the present invention. The zoned uniform illumination projection system 100 ' is substantially the same in construction as the system 100 shown in fig. 1A described above, with the main difference being that the zoned uniform illumination optical system 101 ' includes a fresnel lens 30 '. Compared with the traditional lens, the Fresnel lens can be made to be lighter and thinner, and the size of the system can be reduced.
Fig. 2 shows a schematic diagram of the front side of a VCSEL-partitioned light source 20. As shown in fig. 2, the partitioned light source array 20 includes a plurality of light source arrays 20-1, 20-2, …, 20-n, in which adjacent light source arrays have a spacing therebetween, for example, due to process limitations, and as shown in fig. 2, the light source arrays have a spacing DS therebetween in a first direction (horizontal direction in the drawing).
As shown in fig. 2, each white dot inside each light source array represents a VCSEL light emitting point, the spacing between adjacent VCSEL light emitting points is small, and the spacing DS between adjacent light source arrays is generally large, larger than the distance between VCSEL light emitting points within the same light source array. In order to cooperate with the DTOF sensor, it is necessary to implement the partitioned dodging of the target light field, that is, each light source array of the VCSEL partitioned light source can be illuminated separately, each light source array illuminates only a portion of the target light field corresponding to that light source array uniformly when illuminated, and it is necessary to ensure the dodging of the entire target light field when all light source arrays are illuminated. Therefore, if the microlenses in the microlens array 10 are not designed to have a special surface-to-surface structure, dark regions extending in the first direction due to a large spacing DS between adjacent light source arrays will appear in the light field projected on the object plane 40. The second direction (vertical direction in fig. 2) is a direction perpendicular to the first direction.
The microlens array 10 includes a plurality of microlens array subunits corresponding to a plurality of partitioned light source arrays spaced apart in a first direction for homogenizing received light beams from the corresponding light source arrays. The surface profile of the microlenses in the microlens array 10 is designed to project a point light source into at least one linear light field extending along the second direction. For example, when the surface area structure of the microlenses in the microlens array 10 is designed by computer-aided software, the light source is defined as a point light source, and the target map is designed as two symmetrically distributed straight line segments extending along the second direction, i.e., a linear light field (as shown in fig. 3A). Since the actual VCSEL light-emitting point has a certain physical size, for example, a diameter of several micrometers to several tens of micrometers, and can be regarded as a small area light source, and the VCSEL light-emitting point also has a certain divergence angle, for example, a full-angle divergence angle is about 20 degrees, an actual light field projected by a light beam emitted by an actual VCSEL light-emitting point through the microlens array 10 is formed as a stripe light field extending along the second direction and having a certain width in the first direction by spreading a linear light field (as shown in fig. 3B). The strip-shaped light fields projected by the VCSEL emitting points of the edge regions of two adjacent light source arrays are spliced or overlapped with each other, so that the dark regions can be eliminated (as shown in fig. 3C).
To better eliminate the dark regions, according to an embodiment of the present invention, when designing the surface-type structure of the microlenses in the microlens array 10 by using computer-aided software, point light sources may be projected as two sets of light fields spaced apart from each other, each set of light fields including at least one linear light field extending along the second direction. For example, fig. 4 shows 6 VCSEL light-emitting points 401-406 adjacent to each other in a first direction in a light source array, and light beams emitted by each VCSEL light-emitting point are homogenized by a microlens array 10 (not shown) to project two groups of light fields, for example, the VCSEL light-emitting point 401 projects a first group of light fields 401-1 and a second group of light fields 401-2, and so on. It should be noted that the dashed lines in fig. 4 are only used to indicate the correspondence between the VCSEL light-emitting points and the corresponding two sets of light fields, and are not actual light paths. In this embodiment, each group of light fields includes two linear light fields, and as described above, the linear light fields are spread and dispersed into a stripe light field so as to be spliced with each other. And the first group of light fields 401-1-406-1 of the VCSEL light emitting points 401-406 are spliced in sequence, and then are spliced with the second group of light fields 401-2-406-2 of the VCSEL light emitting points 401-406 to form a continuous light field, so that dark areas are eliminated. In the present embodiment, each group of light fields includes two linear light fields, but the present invention is not limited thereto, and those skilled in the art can easily think that each group of light fields can be designed to include one, three or four linear light fields according to the size of the VCSEL light emitting points, the divergence angle, the distance between the VCSEL light emitting points and the interval between the light source arrays.
In addition, the field angle range of the linear light field in the second direction needs to match the field angle range of the target light field region corresponding to each light source array in the second direction. For example, in the case of the above one-dimensional light source array, the field angle range of the target light field in the second direction corresponding to each light source array is the same as the field angle range of the entire target light field in the second direction. Setting the field angle range of the target light field in the second direction to be α degrees, for example, the range of α is 50 to 80 degrees, because linear light fields formed by VCSEL light emitting points arranged along the second direction in the light source array are overlapped with each other at different positions in the second direction, in order to make the light field brightness in the α -degree field angle range uniform, the linear light field formed by edge VCSEL light emitting points in the second direction in the light source array also needs to cover the α -degree field angle range of the target light field, so the field angle range of the linear light field needs to be larger than α degrees, and the field angle size of the linear light field is determined by parameters such as the α -degree field angle range of the target light field and the beam divergence angle of the VCSEL light emitting points. Since the field angle range of the linear light field is greater than α degrees, the actual projected light field of the partitioned dodging illumination projection system according to the present embodiment is dispersed in the second direction and thus may be greater than the α -degree field angle range of the target light field, and dispersed (Blur) regions with light field intensity smaller than that of the target light field are formed on both sides of the α -degree field angle range, which does not affect the operation of the DTOF system.
Fig. 5 shows a projected light field obtained by simulation of the partitioned dodging projection system according to an embodiment of the present invention, where the simulation result is that all light source arrays are lit, and it can be seen that the projected light fields formed by adjacent light source arrays are spliced together in a first direction to form a continuous dodging light field without dark areas, and in a second direction, a central light field area is a uniform dodging light field with spread diffuse areas on both sides.
According to another embodiment of the present invention, the plurality of light source arrays are also spaced along the second direction, for example, two rows of light source arrays are arranged in the second direction, and the field angle ranges of the linear light fields projected by the VCSEL light emitting points are set such that the light field areas formed on the target surface by the adjacent light source arrays are adjacent to or overlap each other in the second direction.
Since a general fresnel lens generates pincushion distortion under the condition of a large field of view, the target light field generates pincushion distortion (as shown in fig. 6), and the working quality of the DTOF system is affected. According to an embodiment of the invention, pincushion distortion correction is performed on the fresnel lens in the area-uniform illumination optical system, for example, barrel distortion is introduced when the fresnel lens is designed, so as to compensate the pincushion distortion under the condition of a large field of view, thereby ensuring that the target light field is approximately rectangular.
According to an embodiment of the present invention, each light source array in the VCSEL-partitioned light source corresponds to at least one microlens array subunit of the microlens array, for example, the microlens array has the same number of microlens array subunits as the light source arrays, i.e., the light source arrays correspond to the microlens array subunits one by one. Because the lenses or the Fresnel lenses can generate pincushion distortion under the condition of a large field of view, pincushion distortion correction can be respectively carried out on the micro-lens array subunits corresponding to the light source arrays according to the field of view area of the light field projected by each light source array on the whole target light field. For example, when designing the curved surface shape of the microlenses in the microlens array subunit, barrel distortion is introduced into the linear segment target diagram of the linear light field to compensate for pincushion distortion, and the linear segment target diagram is replaced by the curved segment target diagram with barrel distortion, so as to achieve the purpose of pincushion distortion correction. As shown in fig. 7A, 7B, fig. 7A shows a computer design of the curved surface profile of the microlens according to the light source parameters and the target light field, and fig. 7B shows a curved line segment having barrel distortion as the target map instead of a straight line segment. However, the present invention is not limited to this, and each light source array may also correspond to a plurality of microlens array subunits, that is, the microlens array subunits in the above-described embodiment may also be further divided, and pincushion distortion correction is performed on each of the plurality of further divided microlenses, so as to achieve a distortion correction result that is more finely optimized, thereby ensuring that the target light field is closer to a rectangular shape.
In the above embodiments, each microlens in the microlens array, or each microlens subjected to the same distortion correction in the sub-unit of the microlens array, has the same curved surface type. All the microlenses in the microlens array may be regularly arranged in a two-dimensional array, and preferably, in order to eliminate the target light field ripple (interference phenomenon) which may be caused by the regular arrangement, the microlenses in the microlens array may be randomly arranged.
The zoned uniform illumination optical system and the zoned uniform illumination projection system according to the embodiment of the present invention are described above. The partitioned dodging illumination projection system can be arbitrarily combined into electronic equipment needing dodging projection, and the electronic equipment comprises but is not limited to a mobile phone, a PAD, an electronic lock and the like.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A zoned uniform illumination optical system for a VCSEL zoned light source, comprising:
the micro lens array can receive the light beams emitted by the VCSEL partition light source and homogenize the light beams;
the lens is arranged on the downstream of the optical path of the micro lens array and is used for imaging the light field homogenized by the micro lens array onto a target plane,
the VCSEL partition light source comprises a plurality of light source arrays spaced along a first direction, the micro lens array is configured to project a point light source into at least one linear light field extending along a second direction perpendicular to the first direction, and the light field areas formed on the target plane after adjacent light source arrays in the VCSEL partition light source pass through the partition even light illumination optical system are mutually adjacent or overlapped in the first direction.
2. The zoned uniform illumination optical system according to claim 1, wherein the microlens array is configured to project the point light sources into two sets of light fields spaced apart from each other, each set of light fields including at least one linear light field extending along the second direction, the two sets of light fields projected respectively by a plurality of point light sources adjacent in the first direction in the light source array being sequentially spliced to form a continuous light field.
3. The zoned uniform illumination optical system of claim 1, wherein a field angle range of the linear light field matches a field angle range of the target light field area corresponding to each of the light source arrays in the second direction.
4. The zoned uniform illumination optical system of claim 1, wherein the plurality of light source arrays have a spacing along the second direction, and a field angle range of the linear light field is set such that light field areas formed on the target surface by adjacent light source arrays abut or overlap each other in the second direction.
5. The zoned uniform illumination optical system of any one of claims 1 to 4, wherein the lens is a Fresnel lens.
6. The zoned uniform illumination optical system of claim 5, wherein the Fresnel lens is a pincushion corrected Fresnel lens.
7. The zoned uniform illumination optical system according to any one of claims 1 to 4, wherein the microlens array includes a plurality of microlens array sub-units corresponding to the plurality of light source arrays spaced apart in the first direction, and pincushion distortion correction is performed respectively for the curved surface types of the microlenses in the plurality of microlens array sub-units.
8. A zoned dodging projection system, comprising:
a VCSEL-partitioned light source comprising a plurality of light source arrays having a spacing along a first direction;
the zoned uniform illumination optical system of any one of claims 1-7, disposed in an optical path downstream of the VCSEL zoned light sources, to receive the light beams emitted by the plurality of light source arrays and to project a zoned uniform illumination field on a target plane.
9. The zoned dodging projection system of claim 8, wherein the plurality of light source arrays are spaced along a second direction, the second direction being perpendicular to the first direction.
10. An electronic device comprising the zoned dodging illumination projection system of claim 8 or 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011035732.6A CN112462528A (en) | 2020-09-27 | 2020-09-27 | Partitioned uniform illumination optical system, projection system including the same, and electronic apparatus |
Applications Claiming Priority (1)
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