CN112458409B - Preparation method of underwater pressure-resistant optical window antireflection film - Google Patents
Preparation method of underwater pressure-resistant optical window antireflection film Download PDFInfo
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- CN112458409B CN112458409B CN202011337936.5A CN202011337936A CN112458409B CN 112458409 B CN112458409 B CN 112458409B CN 202011337936 A CN202011337936 A CN 202011337936A CN 112458409 B CN112458409 B CN 112458409B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Abstract
The invention discloses a preparation method of an underwater pressure-resistant optical window antireflection film, which comprises the following steps: (1) toughening a substrate: chemically toughening an optical piece to be coated, and enhancing the bending strength and cold and hot impact resistance of the optical piece through the ion exchange process of the surface layer; (2) preparing before film coating; (3) electron beam evaporation plating a plurality of layers of antireflection films; (4) post-treatment: and maintaining the vacuum temperature to be reduced to 100 ℃, deflating and taking out the part, and then putting the part into a high-temperature clean aerobic annealing furnace for annealing treatment. The optical window prepared by the method not only greatly improves the cold and hot temperature impact resistance and the hydrostatic pressure resistance, but also effectively reduces the microscopic defects of the optical film layer (the film layer with more defects can show white point objects with obvious full surfaces under higher hydrostatic pressure, which are caused by collapse and rupture of the microscopic defects in the film layer under water pressure), and improves the adaptability of the optical window in (sea) underwater environment.
Description
Technical Field
The invention belongs to the technical field of optical films, and particularly relates to a preparation method of an underwater pressure-resistant optical window antireflection film.
Background
The wide application of (sea) underwater (latent) photoelectric detection, imaging and other devices has higher and higher demand on underwater optical windows, and an outer surface film system for changing the physical characteristics of the optical windows and improving the optical performance of the windows becomes one of the key factors for improving the overall performance of the photoelectric devices.
At present, the underwater window substrate is mainly made of K9, sapphire materials and the like, the transmittance of the window is 92% and 86% respectively when the underwater window substrate is not coated with a film, and in order to further improve the transmittance of the optical window in visible light, near infrared and even multispectral wave bands, an antireflection film system needs to be coated on the surface of the window. However, unlike optical windows used in other environments, the use environment of underwater optical windows is more complex: the window film not only needs to pass environmental tests such as high and low temperature, damp and hot, salt fog and the like, but also needs to bear long-time corrosion of seawater and high-strength water pressure of deep sea, and can prevent microorganisms in water from breeding in a period of time so as to be maintained and updated in a specified period.
According to the above practical requirements, the window film must have the following characteristics: good adhesion, friction resistance, high compactness (reducing the corrosion of seawater and water vapor to the inside of a film layer and simultaneously reducing the probability of microorganism adhesion breeding), and few microscopic defects (micron-sized defect points can collapse under high-strength water pressure, and the damage can slowly diffuse). Aiming at the development of an anti-reflection protective film for an underwater optical window, a new film system structure and a preparation method thereof need to be developed to solve the problems and realize engineering application.
Disclosure of Invention
The invention aims to provide a preparation method of an anti-reflection film of an underwater pressure-resistant optical window, and the obtained anti-reflection film has optical performance and can meet the use requirement of an underwater environment; the paint can bear seawater erosion for a long time, bear high-strength water pressure, and have extremely high adhesive force and friction resistance.
In order to achieve the purpose, the technical scheme is as follows:
a preparation method of an underwater pressure-resistant optical window antireflection film comprises the following steps:
(1) Tempering the substrate: chemically toughening an optical piece to be coated, and enhancing the bending strength and cold and hot impact resistance of the optical piece through the ion exchange process of the surface layer;
(2) Preparing before coating: a ten thousand grade clean environment with the room temperature of 25 +/-2 ℃ and the humidity of 40% +/-10%; carrying out sand blasting treatment on the coating tool, and thoroughly drying at 120 ℃ after cleaning for later use; cleaning or replacing cleaning spare parts in the regions of a protective plate, a chamber, a baffle plate, a bracket and an electron gun crucible of the film coating machine, and operating for 10 minutes in a non-part state after cleaning an ion source grid mesh and a neutralizerThe above; siO2 2 And Ta 2 O 5 The film material adopts the purity of 99.99 percent and above, ta 2 O 5 Adopting an acupuncture point crucible, and pre-melting the materials after filling for standby; roughly wiping the toughened optical piece once by using cerium oxide polishing solution, then finely wiping by using an organic solvent, visually checking that no residual pollutant exists, then loading the optical piece into a coating tool, and then moving the optical piece into a coating machine; before the optical piece is placed, the vacuum chamber is pre-vacuumized for standby;
(3) Electron beam evaporation plating of multilayer antireflection film: heating to 250 deg.C, keeping the temperature for at least 80 min, and vacuumizing to 8 × 10 -4 Pa; starting an ion source to bombard a film coating surface, accelerating voltage of 1000V and accelerating current of 1000mA, and cleaning for 3 minutes; setting the physical thickness of each film layer according to the film system structure design, and sequentially plating the film layers with high refractive index and low refractive index;
(4) And (3) post-treatment: after the whole film system is plated, keeping vacuum, and reducing the energy of ion beams to carry out surface treatment on the film system; and maintaining the vacuum temperature to be reduced to 100 ℃, deflating and taking out the part, and then putting the part into a high-temperature clean aerobic annealing furnace for annealing treatment.
According to the scheme, the chemical toughening process in the step (1) is as follows:
heating molten salt and the optical piece to be coated to 440 ℃ in a furnace at the speed of 5 ℃/min respectively, immersing the optical piece into the molten salt, keeping the temperature for 50h, taking out, and cooling to normal temperature at the speed of 3 ℃/min; the formula of the molten salt is as follows: potassium nitrate, potassium silicate and diatomite according to a mass ratio of 100.
According to the scheme, the process parameters of the electron beam evaporation plating high-refractive index film layer in the step (3) are as follows:
the ion source parameters are 1000V of accelerating voltage, 1200mA of accelerating current, 500V of inhibiting voltage and 2000mA of neutralizing current, and the ion beam delays and irradiates for 5 seconds after each layer of plating is finished; ta 2 O 5 The film deposition rate is set to 0.3nm/s, the ion source is oxygenated by 60sccm, argon is filled by 10sccm, and the neutralizer is filled by 10sccm; siO2 2 The film deposition rate is set to 0.6nm/s, the ion source is oxygenated by 40sccm, the argon is filled by 8sccm, and the neutralizer is filled by 10sccm;
according to the scheme, the specific parameters of the surface treatment of the film system in the step (4) are as follows: accelerating voltage 500V, accelerating current 1000mA, inhibiting voltage 500V, neutralizing current 1500mA, oxygenating ion source with 30sccm argon 12sccm, filling neutralization device with 10sccm argon for 5 min;
according to the scheme, the annealing control program in the step (4) is set as follows: heating to 360 ℃ from normal temperature within 120 minutes, keeping the temperature for 120 minutes, and cooling to within 100 ℃ within 240 minutes.
According to the scheme, the method further comprises the following step (5) of test screening:
and (3) testing high/low temperature, constant humidity and heat, salt spray and adhesive force and a severe friction test specified by GJB2485-95, testing the mixture by using a hydrostatic pressure of 6MPa, and judging the mixture to be a qualified product if the optical performance before and after the test can still meet the optical technical index requirements, and eliminating the rest.
The preparation before coating can be defined as a key process for realizing the performance of the window, and the main purpose is to reduce the introduction of dust in the coating process, form impurities in the film layer and finally cause the damage of the film layer under hydrostatic pressure. The preparation before coating comprises cleaning of a coating machine and a tool, replacement of a coating material, pre-vacuumizing of the coating machine, cleaning before coating of an optical part and the like.
The high-quality oxide multilayer film is formed by electron beam evaporation and alternate plating of high-low refractive index oxide film layers, oxygen deficiency of the film layers is reduced by adjusting ion source parameters, stress of each film layer is optimized, and stress minimization and optical performance optimization of the whole film system film layer are achieved.
In the invention, preparation before film coating is taken as a key point, starting from multiple aspects, and factors such as external dust and the like which possibly cause film defects are finely prevented from being introduced; the generation of internal defects is reduced as much as possible by optimizing process parameters in the coating process, and the aim is to coat a high-quality film. And then the surface and internal defects of the film layer are repaired to a certain extent through a post-treatment process. Finally, screening and rejecting unqualified (serious defects) products through testing.
Compared with the prior art, the invention has the beneficial effects that:
through the steps, the prepared optical window not only greatly improves the cold and hot temperature impact resistance and the hydrostatic pressure resistance, but also effectively reduces the microscopic defects of the optical film layer (which can be compared with the film layer with more defects and can present white point objects with obvious full surfaces under higher hydrostatic pressure and is caused by collapse and rupture of the microscopic defects in the film layer under water pressure), improves the adaptability of the optical window in the (sea) underwater environment,
drawings
FIG. 1: k9, reflecting spectrum curve of the underwater pressure-resistant window film with the substrate;
FIG. 2: the sapphire substrate pressure-resistant window film reflects a spectrum curve.
Detailed Description
The following examples further illustrate the technical solutions of the present invention, but should not be construed as limiting the scope of the present invention.
The invention relates to an underwater pressure-resistant optical window antireflection film which is realized on a new Koron MIC-1350 type vacuum coating machine. The device is provided with an NIS-175 type large-caliber radio frequency ion source, a neutralizer, a Polycold cold trap, an XTC/3S crystal type film thickness meter, an upper baking type heating system, an OPM-Z1 optical type film thickness meter and the like.
Example 1
The K9 underwater pressure-resistant optical window visible light antireflection film has the contour dimension of 216mm multiplied by 96mm multiplied by 26mm. The technical requirements are as follows:
T avg ≥98％@425nm-675nm，AOI＝0-15°；
the film-coated sample piece passes through a high/low temperature constant humidity/heat, salt spray and adhesive force test and a severe friction test specified by GJB2485-95 at one time, and the optical performance before and after the environmental test can still meet the optical technical index requirements;
the sample piece can bear the hydrostatic pressure below 6MPa (inclusive), and the film layer is not damaged.
Firstly, the membrane system structure is optimally designed according to the technical requirements, and the result is as follows:
Sub|aH/bL/cH/dL/Air
wherein H and L are high and low refractive index layers, respectively, and H is Ta 2 O 5 L is SiO 2 (ii) a a to d are respectively the thickness of the film system physical layer, and sequentially:
a-13.7nm；b-33.9nm；c-123.2nm；d-85.4nm
the preparation process comprises the following specific implementation processes:
substrate tempering: chemical tempering is carried out on the optical part to be coated by ions (K) of the surface layer + 、Na + ) And the exchange process enhances the elastic modulus of the optical part to strengthen the heat shock resistance.
The key process for preparing the film before coating as the quality of the film layer is mainly as follows:
the environmental requirements are as follows: in a ten thousand grade clean environment or below, the room temperature is 25 +/-2 ℃, and the humidity is 40% +/-10%.
And (4) carrying out sand blasting treatment on the coating tool, and thoroughly drying at 120 ℃ after cleaning for later use.
Cleaning spare parts are cleaned or replaced in a protective plate, a chamber, a baffle plate, a bracket and an electron gun crucible area of the film plating machine, and the ion source grid mesh and the neutralizer run for 10 minutes in a no-part state after being cleaned.
SiO 2 And Ta 2 O 5 The film material adopts the purity of 99.99 percent and above, ta 2 O 5 The acupuncture point crucible is adopted, and the filling materials are all required to be pre-melted for standby.
Before placing the optical element, the vacuum chamber needs to be pre-vacuumized for standby.
And the optical part is roughly wiped once by using cerium oxide polishing solution, then finely wiped by using special anhydrous mixed organic solution, visually checked to have no residual pollutants, then loaded into a coating tool, and then moved into a coating machine.
Electron beam evaporation plating of multilayer antireflection film: heating to 250 deg.C, keeping the temperature for at least 80 min, and vacuumizing to 8 × 10 -4 Pa. Starting an ion source to bombard the film-coated surface, accelerating voltage of 1000V and accelerating current of 1000mA, and cleaning for 3 minutes. Setting the physical thickness of each film layer according to the design result of the film system structure, and plating the high-refractive-index film layer and the low-refractive-index film layer in sequence: the ion source parameters are 1000V of accelerating voltage, 1200mA of accelerating current, 500V of inhibiting voltage and 2000mA of neutralizing current, and the ion beam delays and irradiates for 5 seconds after each layer of plating is finished; ta 2 O 5 The film deposition rate is set to 0.3nm/s, the ion source is oxygenated by 60sccm, argon is filled by 10sccm, and the neutralizer is filled by 10sccm; siO2 2 The film deposition rate was set at 0.6nm/s, the ion source was oxygenated at 40sccm for 8s of argonccm, neutralizer argon 10sccm.
And (3) post-treatment: after the ion beam treatment is carried out on the surface of the film system, after the whole film system is plated, the vacuum is kept, the ion beam energy is reduced, and the surface treatment of the film system is carried out, wherein the specific parameters are as follows: an acceleration voltage of 500V, an acceleration current of 1000mA, a suppression voltage of 500V, a neutralization current of 1500mA, an ion source oxygenated at 30sccm, argon at 12sccm, a neutralizer filled at 10sccm, for a duration of 5 minutes.
Keeping vacuum cooling to 100 ℃, deflating and taking out the parts, then putting the parts into a high-temperature clean aerobic annealing furnace, and setting a heating control program as follows: heating to 360 ℃ from normal temperature within 120 minutes, keeping the temperature for 120 minutes, and cooling to within 100 ℃ within 240 minutes.
And (3) test screening: the product is judged to be a qualified product through high/low temperature, constant humidity and heat, salt spray and adhesive force tests and severe friction tests specified by GJB2485-95 and a 6MPa hydrostatic pressure test, and the optical performance before and after the test can still meet the optical technical index requirements, otherwise, the product is judged to be an unqualified product and is eliminated if the film layer damage problem occurs in any test.
The reflection spectrum curve of the K9 substrate underwater pressure-resistant window film obtained in the embodiment is shown in FIG. 1.
Example 2
The size of the visible light antireflection film of the sapphire underwater pressure-resistant optical window is the same as that of the visible light antireflection film in the embodiment 1. The technical requirements are as follows:
T avg ≥98％@425nm-675nm，AOI＝0-15°；
the film-coated sample piece passes the high/low temperature, constant humidity and heat, salt spray and adhesive force test and the severe friction test specified by GJB2485-95 at one time, and the optical performance before and after the environmental test can still meet the optical technical index requirements;
the sample can bear hydrostatic pressure below 6MPa (including), and the film layer is not damaged.
Firstly, the membrane system structure is optimally designed according to the technical requirements, and the result is as follows:
Sub|aH/bL/cH/dL/Air
h and L are high-refractive index layers and low-refractive index layers respectively, wherein H is Ta2O5, and L is SiO2; a to d are the thicknesses of the film system physical layers respectively, and are as follows in sequence:
b-24.5nm；c-31.8nm；d-169.8nm；e-37.6nm；f-42.5nm；g-52.8nm；h-43.7nm；
i-61.8nm；j-21.7nm；k-310.4；l-20.5nm；m-48.5nm；
the preparation process is carried out in the same manner as in example 1. The reflection spectrum of the sapphire substrate pressure-resistant window film obtained is shown in FIG. 2.
Claims (1)
1. A preparation method of an anti-reflection film of an underwater pressure-resistant optical window is characterized by comprising the following steps:
(1) Tempering the substrate: chemically toughening an optical piece to be coated, and enhancing the bending strength and cold and hot impact resistance of the optical piece through the ion exchange process of the surface layer; the chemical toughening process specifically comprises the following steps: heating the molten salt and the optical piece to be coated to 440 ℃ at the speed of 5 ℃/min in a furnace respectively, immersing the optical piece into the molten salt, keeping the temperature for 50h, taking out, and cooling to normal temperature at the speed of 3 ℃/min; the formula of the molten salt is as follows: potassium nitrate, potassium silicate and diatomite according to a mass ratio of 100;
(2) Preparing before coating: a ten thousand grade clean environment with the room temperature of 25 +/-2 ℃ and the humidity of 40% +/-10%; carrying out sand blasting treatment on the coating tool, and thoroughly drying at 120 ℃ after cleaning for later use; cleaning or replacing cleaning spare parts in a protective plate, a chamber, a baffle plate, a bracket and an electron gun crucible area of the film plating machine, and operating for more than 10 minutes in a no-part state after an ion source grid mesh and a neutralizer are cleaned; siO2 2 And Ta 2 O 5 The film materials are all made of Ta with the purity of more than 99.99 percent 2 O 5 Adopting an acupuncture point crucible, and pre-melting the materials after filling for standby; roughly wiping the toughened optical piece once by using cerium oxide polishing solution, then finely wiping the toughened optical piece by using an organic solvent, visually checking that no residual pollutants exist, then loading the toughened optical piece into a coating tool, and then moving the toughened optical piece into a coating machine; before the optical piece is placed, the vacuum chamber is pre-vacuumized for standby;
(3) Electron beam evaporation plating of multilayer antireflection film: heating to 250 deg.C, keeping the temperature for at least 80 min, and vacuumizing to 8 × 10 -4 Pa; starting an ion source to bombard a film coating surface, accelerating voltage of 1000V and accelerating current of 1000mA, and cleaning for 3 minutes; based on the structural design of the film systemThe physical thickness of each film layer is plated with high and low refractive index film layers alternately; the technological parameters of the electron beam evaporation plating high and low refractive index film layer are as follows: the ion source parameters are 1000V of accelerating voltage, 1200mA of accelerating current, 500V of inhibiting voltage and 2000mA of neutralizing current, and the ion beam delay irradiation is carried out for 5 seconds after each layer of plating is finished; high refractive index Ta 2 O 5 The film deposition rate is set to 0.3nm/s, the ion source is oxygenated by 60sccm, argon is filled by 10sccm, and the neutralizer is filled by 10sccm; low refractive index SiO 2 The film deposition rate is set to 0.6nm/s, the ion source is oxygenated by 40sccm, argon is filled by 8sccm, and the neutralizer is filled by 10sccm;
(4) And (3) post-treatment: after the whole film system is plated, keeping vacuum, and reducing the energy of ion beams to carry out surface treatment on the film system; keeping vacuum, cooling to 100 ℃, discharging gas, taking out the part, and then putting the part into a high-temperature clean aerobic annealing furnace for annealing treatment;
the specific parameters of the film system surface treatment are as follows: accelerating voltage 500V, accelerating current 1000mA, inhibiting voltage 500V, neutralizing current 1500mA, oxygenating ion source with 30sccm, argon 12sccm, filling neutralization device with 10sccm argon for 5 min;
the annealing control program is set as follows: heating to 360 ℃ from normal temperature within 120 minutes, keeping the temperature for 120 minutes, and cooling to within 100 ℃ within 240 minutes;
(5) And (3) testing high/low temperature, constant humidity, heat, salt mist and adhesive force and a severe friction test specified by GJB2485-95, testing the product by 6MPa hydrostatic pressure, judging the product to be qualified if the optical performance before and after the test can still meet the optical technical index requirements, and eliminating the rest of the products.
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Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012073542A (en) * | 2010-09-29 | 2012-04-12 | Fujifilm Corp | Antireflection film and manufacturing method thereof, and optical member and plastic lens having the antireflection film |
| CN103173720A (en) * | 2013-03-22 | 2013-06-26 | 同济大学 | Preparation method for waterproof laser film |
| CN105585241A (en) * | 2014-10-20 | 2016-05-18 | 浙江金徕镀膜有限公司 | Substrate processing method |
| CN105734499A (en) * | 2016-04-21 | 2016-07-06 | 三明福特科光电有限公司 | Preparation method of corrosion resisting and permeability increasing waterproof film |
| CN106835030A (en) * | 2016-12-13 | 2017-06-13 | 西南技术物理研究所 | Infrared high antireflection film structure of wide-angle multiband and preparation method thereof |
| WO2018040687A1 (en) * | 2016-08-31 | 2018-03-08 | 奥普镀膜技术（广州）有限公司 | Method for coating thin film for 40g100g optical filter |
| CN108330449A (en) * | 2018-01-04 | 2018-07-27 | 苏州市唯嘉光学有限公司 | High diffusing reflection aluminium film on frosting and preparation method thereof |
| CN109182972A (en) * | 2018-08-30 | 2019-01-11 | 华中光电技术研究所（中国船舶重工集团有限公司第七七研究所） | Multispectral hard anti-reflection film of large-size sapphire substrate and preparation method thereof |
| CN110484869A (en) * | 2019-07-11 | 2019-11-22 | 湖北久之洋红外系统股份有限公司 | A kind of mildew resistant moistureproof optical thin film and preparation method thereof |
-
2020
- 2020-11-25 CN CN202011337936.5A patent/CN112458409B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012073542A (en) * | 2010-09-29 | 2012-04-12 | Fujifilm Corp | Antireflection film and manufacturing method thereof, and optical member and plastic lens having the antireflection film |
| CN103173720A (en) * | 2013-03-22 | 2013-06-26 | 同济大学 | Preparation method for waterproof laser film |
| CN105585241A (en) * | 2014-10-20 | 2016-05-18 | 浙江金徕镀膜有限公司 | Substrate processing method |
| CN105734499A (en) * | 2016-04-21 | 2016-07-06 | 三明福特科光电有限公司 | Preparation method of corrosion resisting and permeability increasing waterproof film |
| WO2018040687A1 (en) * | 2016-08-31 | 2018-03-08 | 奥普镀膜技术（广州）有限公司 | Method for coating thin film for 40g100g optical filter |
| CN106835030A (en) * | 2016-12-13 | 2017-06-13 | 西南技术物理研究所 | Infrared high antireflection film structure of wide-angle multiband and preparation method thereof |
| CN108330449A (en) * | 2018-01-04 | 2018-07-27 | 苏州市唯嘉光学有限公司 | High diffusing reflection aluminium film on frosting and preparation method thereof |
| CN109182972A (en) * | 2018-08-30 | 2019-01-11 | 华中光电技术研究所（中国船舶重工集团有限公司第七七研究所） | Multispectral hard anti-reflection film of large-size sapphire substrate and preparation method thereof |
| CN110484869A (en) * | 2019-07-11 | 2019-11-22 | 湖北久之洋红外系统股份有限公司 | A kind of mildew resistant moistureproof optical thin film and preparation method thereof |
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