CN112442716A - Chromium plating method - Google Patents
Chromium plating method Download PDFInfo
- Publication number
- CN112442716A CN112442716A CN202011397087.2A CN202011397087A CN112442716A CN 112442716 A CN112442716 A CN 112442716A CN 202011397087 A CN202011397087 A CN 202011397087A CN 112442716 A CN112442716 A CN 112442716A
- Authority
- CN
- China
- Prior art keywords
- chromium plating
- barrel
- chromium
- plating
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 title claims abstract description 115
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 110
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 109
- 239000011651 chromium Substances 0.000 title claims abstract description 109
- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000005498 polishing Methods 0.000 claims abstract description 6
- 238000009713 electroplating Methods 0.000 claims abstract description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 10
- 238000005406 washing Methods 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 7
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 238000007781 pre-processing Methods 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims 1
- 238000012797 qualification Methods 0.000 abstract 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 5
- -1 iron ions Chemical class 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/04—Tubes; Rings; Hollow bodies
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
The invention relates to the technical field of electroplating, and discloses a chromium plating method, which comprises the following steps: pretreating a barrel; clamping the large end of the barrel downwards, vertically placing the barrel into a chromium plating groove, and carrying out primary chromium plating; after the first chromium plating is finished, taking out the barrel, clamping the barrel with the large end facing upwards, and carrying out second chromium plating; polishing the inner bore; and (4) inspecting the barrel. The dimensional tolerance of the two ends obtained by the method provided by the invention can be controlled within 0.02mm, the qualification rate of the plated barrel can reach more than 60 percent, and the method is particularly suitable for high-precision barrel chromium plating.
Description
Technical Field
The invention relates to the technical field of electroplating, in particular to a chromium plating method.
Background
In the existing light weapon manufacturing industry, a chromic anhydride and sulfuric acid system is mainly adopted for barrel chromium plating solution, certain trivalent chromium is needed in the chromium plating solution, chromium deposition is facilitated, and barrel taper is eliminated. The metal impurities are generally dissolved in the chromium plating solution when the matrix metal is reversed, and are usually expressed by iron ions.
The trivalent chromium content in the chromium plating solution is high, and the purpose of reducing the trivalent chromium can be achieved by hanging a large anode lead plate and a small cathode to oxidize the chromium plating solution. And the iron ion content is high, and the iron ion content is reduced by adopting a method of diluting and supplementing the chromium plating solution.
Therefore, in the common barrel chromium plating process, the content of trivalent chromium is generally controlled to be 1-10 g/L, and the content of iron ions is generally controlled to be less than or equal to 5-7 g/L. In general, the influence of the factors such as technical means, low requirement on the service life of a barrel and the like is limited in the past, the content of trivalent chromium and metal impurity iron ions is determined to be high, and the crystallization compactness of a chromium coating is directly influenced.
The anode base material is generally selected from low-carbon steel wires plated with copper and lead (or lead-tin alloy) and the like, and supports the anode tension strength. The temperature of the plating solution is generally higher than that of the common hard chromium plating. Because the low-carbon steel wire is plated with copper, the uniformity of the plating layer, the thickness of the copper layer, the skin tendency of current and other factors influence the coaxiality of the chromium plating tool clamp and the barrel, the uniformity of the thickness of the plating layer at the two ends of the barrel is poor, the precision of the barrel is influenced, and the service life of the barrel is also influenced.
When the barrel is electroplated, the small end is generally downward, and the large end is clamped on the chromium plating frame and vertically placed in the chromium plating groove. The small end of the plated steel tube is small in size, the large end of the plated steel tube is large in size, and the taper of the two ends of the plated steel tube reaches 0.03-0.05 mm.
Disclosure of Invention
In order to overcome the problems and disadvantages of the prior art described above, the present invention is directed to a chromium plating method.
The technical scheme of the invention is as follows:
a method of chromium plating comprising the steps of:
firstly, preprocessing a barrel;
secondly, clamping the large end of the body tube downwards, vertically placing the body tube into a chromium plating groove, and carrying out primary chromium plating;
step three, after the first chromium plating is finished, taking out the barrel, clamping the barrel with the large end facing upwards, and carrying out second chromium plating;
step four, polishing the inner chamber;
and step five, inspecting the quality of the coating.
Preferably, the pretreatment of the step one comprises degreasing, lead removal, acid washing, wiping and washing.
Preferably, the first chrome plating in the second step includes: the body tube is used as a cathode, a chromium plating anode is placed in the body tube, the temperature of a plating solution is controlled to be 58-66 ℃, the current density is controlled to be 36-42A/dm 2 during first chromium plating, and the chromium plating time is 40-90 min.
Preferably, the second chromium plating in the third step comprises: the barrel is used as a cathode, the electroplating electrode is used as an anode, the temperature of the plating solution is controlled to be 58-66 ℃, the current density is controlled to be 36-42A/dm 2 during the second chromium plating, and the chromium plating time is 40-90 min.
Preferably, the plating solution components in the first chromium plating and the second chromium plating comprise: chromic anhydride: 160-220 g/L; cr (chromium) component3+：2～5g/L；Fe3+＜3 g/L；SO42-：1.6～2.4 g/L。
Preferably, the chrome-plated anode is a copper alloy anode base material, and is directly plated with lead after oil removal and acid washing.
Preferably, the diameter of the copper alloy anode base material is phi 3.5mm, and the diameter after lead plating is phi 4 mm-phi 5.1 mm.
Compared with the prior art, the technical scheme of the invention has the following beneficial effects:
according to the method for plating the chromium on the barrel, the tolerance of the sizes of the two ends of the barrel is generally controlled to be 0.04-0.05 mm in the prior technical scheme, the qualified rate of the plated barrel can be controlled to be more than 60%, and the method is particularly suitable for plating the chromium on the high-precision barrel, wherein the tolerance of the sizes of the two ends of the barrel is generally controlled to be within 0.02mm, and the qualified rate of the plated barrel is low (between 30% and 50%).
Detailed Description
The technical solutions for achieving the objects of the present invention are further illustrated by the following specific examples, and it should be noted that the technical solutions claimed in the present invention include, but are not limited to, the following examples.
Example 1
As a specific embodiment of the invention, a chromium plating method is disclosed, comprising the steps of:
firstly, preprocessing a barrel;
secondly, clamping the large end of the body tube downwards, vertically placing the body tube into a chromium plating groove, and carrying out primary chromium plating;
step three, after the first chromium plating is finished, taking out the barrel, clamping the barrel with the large end facing upwards, and carrying out second chromium plating;
step four, polishing the inner chamber;
and step five, inspecting the quality of the coating.
Example 2
As a specific embodiment of the invention, a chromium plating method is disclosed, comprising the steps of:
firstly, pretreating a barrel, wherein the pretreatment comprises oil removal, lead removal, acid pickling, wiping and washing;
secondly, clamping the large end of the body pipe downwards, respectively installing a chromium plating cap, then wearing a chromium plating anode, keeping the state of the tensed chromium plating anode by using a tension device after tensioning, downwards installing the large end of the body pipe with the upper cap, the lower cap and the tensioned chromium plating anode, clamping the large end of the body pipe on a chromium plating frame, taking the chromium plating frame as a cathode, connecting an anode current to the anode from the upper end, performing first-stage chromium plating, controlling the temperature of a plating solution to be 58-66 ℃, controlling the current density to be 36-42A/dm 2, and controlling the chromium plating time to be 40-90 min;
step three, after primary chromium plating is completed, taking out the barrel, respectively installing chromium plating caps when the large end of the barrel is upwards clamped, then putting on chromium plating anodes, after tensioning, keeping the tension state of the chromium plating anodes by using a tensioning device, upwards installing the large end of the barrel with the upper caps, the lower caps and the tensioned chromium plating anodes, clamping the barrel on a chromium plating frame, using the chromium plating frame as a cathode, connecting an anode current on the anode from the upper end, performing secondary chromium plating, controlling the temperature of a plating solution to be 58-66 ℃, controlling the current density to be 36-42A/dm 2, and controlling the chromium plating time to be 40-90 min;
step four, polishing the inner chamber;
and step five, inspecting the quality of the coating.
Example 3
As a specific embodiment of the invention, a chromium plating method is disclosed, comprising the steps of:
the method comprises the following steps of firstly, performing pretreatment, wherein the pretreatment comprises oil removal, lead removal, acid cleaning, wiping and washing;
step two, when the large end of the body pipe is clamped downwards, the body pipe is respectively provided with a chromium plating cap, then a chromium plating anode is worn, after tensioning, the tensioning device is used for keeping the tension state of the chromium plating anode, the large end of the body pipe provided with the upper cap, the lower cap and the tensioned chromium plating anode is downwards, the body pipe is clamped on a chromium plating frame, the chromium plating frame is used as a cathode, the anode current is connected to the anode from the upper end, the first-stage chromium plating is implemented, the temperature of a plating solution is controlled to be 58-66 ℃, the current density is controlled to be 36-42A/dm 2, the chromium plating time is 40-90 min, and: chromic anhydride: 160-220 g/L; cr (chromium) component3+：2～5g/L；Fe3+＜5 g/L；SO42-：1.6～2.8 g/L；
Step three, after the first chromium plating is completed, taking out the barrel, respectively installing chromium plating caps when the large end of the barrel is upwards clamped, then wearing chromium plating anodes, after tensioning, keeping the tension state of the chromium plating anodes by using a tensioning device, installing the large end of the barrel with the upper caps, the lower caps and the tensioned chromium plating anodes upwards, clamping the barrel on a chromium plating frame, using the chromium plating frame as a cathode, connecting an anode current on the anode from the upper end, performing second chromium plating, controlling the temperature of a plating solution to be 58-66 ℃, controlling the current density to be 36-412A/dm 2, and controlling the chromium plating time to be 40-90 min, wherein the plating solution comprises the following components: chromic anhydride: 160-220 g/L; cr (chromium) component3+：2～5g/L；Fe3+＜5 g/L；SO42-：1.6～2.8 g/L；
Step four, polishing the inner chamber;
and step five, inspecting the quality of the coating.
Preferably, the chrome-plated anode is a copper alloy anode base material, and is directly plated with lead after oil removal and acid washing.
Preferably, the diameter of the copper alloy anode base material is phi 3.5mm, and the diameter after lead plating is phi 4 mm-phi 5.1 mm.
According to the method for plating the chromium on the barrel, the tolerance of the sizes of the two ends of the barrel is generally controlled to be 0.04-0.06 mm in the prior technical scheme, the qualified rate of the plated barrel can be controlled to be more than 60%, and the method is particularly suitable for plating the chromium on the high-precision barrel, wherein the tolerance of the sizes of the two ends of the barrel is generally controlled to be within 0.04-0.06 mm, and the qualified rate of the plated barrel is low (between 30% and 50%).
The above-mentioned embodiments are further described in detail for the purpose of illustrating the invention, the technical solutions and the advantages, it should be understood that the above-mentioned embodiments are only exemplary of the invention, and are not intended to limit the invention, and any modifications, equivalent substitutions, improvements and the like made within the spirit and principle of the invention should be included in the protection scope of the invention.
Claims (7)
1. A method of chromium plating comprising the steps of:
firstly, preprocessing a barrel;
secondly, clamping the large end of the body pipe downwards, vertically placing the body pipe into a chromium plating groove, and carrying out primary chromium plating;
step three, after the first chromium plating is finished, taking out the barrel, clamping the barrel with the large end facing upwards, and carrying out second chromium plating;
step four, polishing the inner chamber;
and step five, inspecting the quality of the coating.
2. A chromium plating process according to claim 1, characterized in that: the pretreatment of the step one comprises oil removal, lead removal, acid cleaning, wiping and washing.
3. The process for chromium plating according to claim 1, wherein said first chromium plating in said second step comprises: the body tube is used as a cathode, a chromium plating anode is placed in the body tube, the temperature of a plating solution is controlled to be 58-66 ℃, the current density is controlled to be 36-42A/dm 2 during first chromium plating, and the chromium plating time is 40-90 min.
4. The process for chromium plating according to claim 1, wherein said three second chromium platings of step (a) comprise: the barrel is used as a cathode, the electroplating electrode is used as an anode, the temperature of the plating solution is controlled to be 58-66 ℃, the current density is controlled to be 36-42A/dm 2 during the second chromium plating, and the chromium plating time is 40-90 min.
5. The process for chromium plating according to claim 1, wherein said bath components of said first and second chromium plating comprise: chromic anhydride: 160-220 g/L; cr (chromium) component3+：2～5g/L；Fe3+＜5 g/L；SO42-：1.6～2.8 g/L。
6. A chromium plating process according to claim 1, characterized in that: the chrome-plated anode is a copper alloy anode base material, and is directly plated with lead after oil removal and acid washing.
7. The process for chromium plating according to claim 6, wherein said copper alloy anode substrate has a diameter of 3.5mm and a diameter of 4mm to 5.1mm after lead plating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011397087.2A CN112442716A (en) | 2020-12-04 | 2020-12-04 | Chromium plating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011397087.2A CN112442716A (en) | 2020-12-04 | 2020-12-04 | Chromium plating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112442716A true CN112442716A (en) | 2021-03-05 |
Family
ID=74740198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011397087.2A Pending CN112442716A (en) | 2020-12-04 | 2020-12-04 | Chromium plating method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112442716A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114703516A (en) * | 2021-12-14 | 2022-07-05 | 西安昆仑工业（集团）有限责任公司 | Rapid chromium plating process method for artillery barrel |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106245082A (en) * | 2016-08-30 | 2016-12-21 | 山西北方机械制造有限责任公司 | A kind of chrome-plating method of diameter-variable parts endoporus |
| CN109183084A (en) * | 2018-11-20 | 2019-01-11 | 重庆建设工业(集团)有限责任公司 | A kind of method of pipe fitting inner hole composite chrome plating and chrome-plating device for this method |
| CN111005057A (en) * | 2019-12-12 | 2020-04-14 | 西安昆仑工业（集团）有限责任公司 | 30 mm barrel chrome plating anode self-tightening device |
-
2020
- 2020-12-04 CN CN202011397087.2A patent/CN112442716A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106245082A (en) * | 2016-08-30 | 2016-12-21 | 山西北方机械制造有限责任公司 | A kind of chrome-plating method of diameter-variable parts endoporus |
| CN109183084A (en) * | 2018-11-20 | 2019-01-11 | 重庆建设工业(集团)有限责任公司 | A kind of method of pipe fitting inner hole composite chrome plating and chrome-plating device for this method |
| CN111005057A (en) * | 2019-12-12 | 2020-04-14 | 西安昆仑工业（集团）有限责任公司 | 30 mm barrel chrome plating anode self-tightening device |
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| 王瑞栋 等: ""浅析乳白—耐磨双层镀铬工艺"", 《第三届环渤海表面精饰发展论坛论文集》 * |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114703516A (en) * | 2021-12-14 | 2022-07-05 | 西安昆仑工业（集团）有限责任公司 | Rapid chromium plating process method for artillery barrel |
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Effective date of registration: 20220609 Address after: 400054, No. 1, Jianshe Avenue, Huaxi Industrial Park, Banan District, Chongqing Applicant after: CHONGQING JIANSHE INDUSTRY (GROUP) Co.,Ltd. Address before: 611930 No. 159 Changjiang Road, Pengzhou, Sichuan, Chengdu Applicant before: SICHUAN HUAQING MACHINERY Co.,Ltd. |
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Application publication date: 20210305 |