CN114016100A - Preparation method of super-hard wear-resistant electroplating coating on surface of MEMS probe - Google Patents

Preparation method of super-hard wear-resistant electroplating coating on surface of MEMS probe Download PDF

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Publication number
CN114016100A
CN114016100A CN202111251633.6A CN202111251633A CN114016100A CN 114016100 A CN114016100 A CN 114016100A CN 202111251633 A CN202111251633 A CN 202111251633A CN 114016100 A CN114016100 A CN 114016100A
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China
Prior art keywords
electroplating
cleaning
probe
coating
resistant
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Application number
CN202111251633.6A
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Chinese (zh)
Inventor
殷岚勇
施元军
石磊
克俊
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Suzhou Jingsheng Micro Nano Semiconductor Technology Co ltd
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Suzhou Jingsheng Micro Nano Semiconductor Technology Co ltd
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Priority to CN202111251633.6A priority Critical patent/CN114016100A/en
Publication of CN114016100A publication Critical patent/CN114016100A/en
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

The invention relates to a preparation method of a superhard wear-resistant electroplating coating on the surface of an MEMS probe, which comprises the following steps: (1) surface cleaning: removing foreign matters on the surface of the probe substrate in a mode of organic solvent surface wiping, surfactant cleaning or ultrasonic cleaning; (2) removing an oxidation layer: removing oxide on the surface of the probe substrate; (3) electroplating noble metal; (4) electroplating Rh; (5) cleaning: after Rh electroplating is finished, timely and quickly cleaning with deionized water; (6) and (3) post-treatment: after cleaning, soaking and cleaning in pure water, and then washing with hot water at 30-80 ℃; (7) drying: and after the post-treatment is finished, drying the plated part at 50-90 ℃. According to the invention, the precious metal layer is plated on the surface of the probe firstly, then the thicker rhodium metal layer is plated on the precious metal layer, and through the design of a plurality of composite layers, the cracking of the plating layer is avoided, meanwhile, the mechanical property of the product is improved, the contact resistance and the wear resistance are improved, and further, the test life of the probe is prolonged.

Description

Preparation method of super-hard wear-resistant electroplating coating on surface of MEMS probe
Technical Field
The invention relates to the technical field of MEMS probe coatings, in particular to a preparation method of a superhard wear-resistant electroplating coating on the surface of an MEMS probe.
Background
It is well known that rhodium plating on products has many benefits: for example, rhodium is plated on jewelry or other decorative items because its shiny appearance is attractive; rhodium, for example, is plated onto the wear resistant surfaces of various tools because of its high hardness and surface wear resistance. Rhodium plating on the surface of MEMS probes can improve the wear resistance and service life of the probes, however, rhodium plating has a well-known disadvantage of high stress, and rhodium metal plating is very prone to cracking due to the high stress, so the thickness of rhodium plating is generally thin, generally not more than 2 um.
The known prior art methods of stress improvement typically use specialized shock aging equipment in the plating bath to resonate the treated workpiece and thereby reduce the stress. However, the method can cause the hardness reduction and the wear resistance reduction of the rhodium metal plating, and the service life of the rhodium metal plating is far shorter than that of the rhodium metal plating without using vibration aging equipment.
Disclosure of Invention
The invention aims to provide a preparation method of a superhard wear-resistant electroplating coating on the surface of an MEMS (micro-electromechanical system) probe, which is used for solving the problem that the coating on the surface of the MEMS probe is cracked to influence the performance in the prior art.
The invention provides a preparation method of a superhard wear-resistant electroplating coating on the surface of an MEMS probe, which comprises the following steps:
(1) surface cleaning: removing foreign matters on the surface of the probe substrate in a mode of organic solvent surface wiping, surfactant cleaning or ultrasonic cleaning;
(2) removing an oxidation layer: removing oxide on the surface of the probe substrate;
(3) electroplating noble metal: electroplating a layer of noble metal on the surface of the probe substrate;
(4) electroplating Rh: electroplating a layer of Rh on the precious metal coating on the surface of the probe substrate;
(5) cleaning: after Rh electroplating is finished, timely and quickly cleaning with deionized water;
(6) and (3) post-treatment: after cleaning, soaking and cleaning in pure water, and then washing with hot water at 30-80 ℃;
(7) drying: and after the post-treatment is finished, drying the plated part at 50-90 ℃.
Further, the oxide removal layer in the step (2) is specifically: under the temperature condition of 20-35 ℃, removing CuO and Cu on the surface of the probe by acid cleaning through sulfuric acid solution with the concentration of 10-30Be2O or Fe2O3The oxide has the following specific reaction principle:
CuO+H2SO4→CuSO4+H2O;
Cu2O+3H2SO4→2CuSO4+3H2O+SO2↑;
Fe2O3+3H2SO4→Fe2(SO4)3+3H2O。
further, the noble metal in the step (3) is Au or Pd & Ni.
Further, when the noble metal in the step (3) is Au, Au is supplied as a metal ion required for electroplating+The main salt of (A) is KAu (CN)2The anode is a platinum-niobium mesh, and the pH of the electroplating solution is 4.5-4.9.
Further, when Rh is electroplated in the step (4), metal ions Rh in the electroplating solution3+The concentration of (A) is 2-15g/L, H2SO4The concentration is 20-120ml/L, and the total concentration of complex and halide is 0.0001-0.001 ml/L.
Further, when Rh is electroplated in the step (4),
the cathode reaction comprises:
Rh2(SO4)3+6e-→2Rh+3SO4 2-
2H++2e-→H2
the anode reaction comprises the following steps:
2H20-4e-→02+4H+
Rh3+-e-→Rh4+
Rh4+-2e-→Rh6+
the technical scheme of the invention has the beneficial effects that:
according to the invention, the precious metal layer is plated on the surface of the probe firstly, then the thicker rhodium metal layer is plated on the precious metal layer, and through the design of a plurality of composite layers, the cracking of the plating layer is avoided, meanwhile, the mechanical property of the product is improved, the contact resistance and the wear resistance are improved, and further, the test life of the probe is prolonged.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below, and it is obvious that the described embodiments are a part of the embodiments of the present invention, but not all of the embodiments.
The invention provides a preparation method of a superhard wear-resistant electroplating coating on the surface of an MEMS probe, which comprises the following steps:
(1) surface cleaning: removing foreign matters on the surface of the probe matrix in a mode of organic solvent surface wiping, surfactant cleaning or ultrasonic cleaning, and confirming that the surface of the probe matrix is clean;
(2) removing an oxidation layer: removing oxide on the surface of the probe substrate by acid washing;
(3) electroplating noble metal: electroplating a layer of noble metal on the surface of a probe substrate, wherein the noble metal is Au or Pd & Ni, Rh is positioned at the positive end in an electrochemical sequence table, the displacement plating tendency is very large, and in a strong acid bath solution with high rhodium content, all the substrate metals are required to be fully protected by a noble metal pre-plating layer to avoid displacement plating during dipping;
(4) electroplating Rh: electroplating a layer of Rh on the precious metal coating on the surface of the probe substrate;
(5) cleaning: after Rh is electroplated, the workpiece is timely and quickly cleaned by deionized water, so that the liquid medicine is prevented from staying, and oxidation is formed on the surface;
(6) and (3) post-treatment: after the cleaning is finished, soaking and cleaning in pure water, and then washing with hot water at 30-80 ℃ to prevent the surface film from generating spots;
(7) drying: and after the post-treatment is finished, drying the plated part at 50-90 ℃.
Specifically, the deoxidation layer in the step (2) is specifically as follows: under the temperature condition of 20-35 ℃, removing CuO and Cu on the surface of the probe by acid cleaning through sulfuric acid solution with the concentration of 10-30Be2O or Fe2O3If the concentration of the oxide is too low, the effect of removing the oxide is insufficient, and if the concentration is too high, the oxide has a corrosion effect on a probe matrix, and the specific reaction principle is as follows:
CuO+H2SO4→CuSO4+H2O;
Cu2O+3H2SO4→2CuSO4+3H2O+SO2↑;
Fe2O3+3H2SO4→Fe2(SO4)3+3H2O。
specifically, when the noble metal in the step (3) is Au, the Au is supplied as a metal ion required for electroplating+The main salt of (A) is KAu (CN)2The anode is a platinum-niobium mesh, the pH of the plating solution is reduced by citric acid, and generally the pH of the plating solution rises along with the electroplating, when the pH is>And 5, the transition metal and cyanide generate a stable complex which is easy to codeposit with Au, so that the coating loses luster, the hardness and the wear resistance are poor, and the pH value of the electroplating solution is controlled to be 4.5-4.9.
Specifically, when Rh is electroplated in the step (4), metal ions Rh in the electroplating solution3+The concentration of (A) is 2-15g/L, H2SO4The concentration is 20-120ml/L, the total concentration of the complex and the halide is 0.0001-0.001ml/L, and the complex and the halide reduce the problem that the plating metal and alloy are likely to generate too large stress, thereby causing functional influence such as cracking, crackle and the like.
Specifically, in the step (4), Rh is electroplated3+And H+Discharging and reducing on the cathode, generating a large amount of oxygen in the anode area, leading trivalent rhodium to lose electrons and generate quadrivalent or hexavalent rhodium,
the cathode reaction comprises:
Rh2(SO4)3+6e-→2Rh+3SO4 2-
2H++2e-→H2
the anode reaction comprises the following steps:
2H20-4e-→02+4H+
Rh3+-e-→Rh4+
Rh4+-2e-→Rh6+
in summary, according to the invention, the precious metal layer is plated on the surface of the probe, and then the thicker rhodium metal layer is plated on the precious metal layer, through the design of a plurality of composite layers, the cracking of the plating layer is avoided, and simultaneously, the mechanical performance of the product is improved, the contact resistance and the wear resistance are improved, and further, the test life of the probe is prolonged.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.

Claims (6)

1. A preparation method of a superhard wear-resistant electroplating coating on the surface of an MEMS probe is characterized by comprising the following steps:
(1) surface cleaning: removing foreign matters on the surface of the probe substrate in a mode of organic solvent surface wiping, surfactant cleaning or ultrasonic cleaning;
(2) removing an oxidation layer: removing oxide on the surface of the probe substrate;
(3) electroplating noble metal: electroplating a layer of noble metal on the surface of the probe substrate;
(4) electroplating Rh: electroplating a layer of Rh on the precious metal coating on the surface of the probe substrate;
(5) cleaning: after Rh electroplating is finished, timely and quickly cleaning with deionized water;
(6) and (3) post-treatment: after cleaning, soaking and cleaning in pure water, and then washing with hot water at 30-80 ℃;
(7) drying: and after the post-treatment is finished, drying the plated part at 50-90 ℃.
2. The method for preparing the superhard wear-resistant electroplating coating on the surface of the MEMS probe according to the claim 1, wherein the deoxidation layer in the step (2) is specifically as follows: under the temperature condition of 20-35 ℃, removing CuO and Cu on the surface of the probe by acid cleaning through sulfuric acid solution with the concentration of 10-30Be2O or Fe2O3The oxide has the following specific reaction principle:
CuO+H2SO4→CuSO4+H2O;
Cu2O+3H2SO4→2CuSO4+3H2O+SO2↑;
Fe2O3+3H2SO4→Fe2(SO4)3+3H2O。
3. the method for preparing the superhard wear-resistant electroplating coating on the surface of the MEMS probe according to the claim 1, wherein the noble metal in the step (3) is Au or Pd & Ni.
4. The method for preparing the superhard wear-resistant electroplated coating on the surface of the MEMS probe according to the claim 3, wherein when the noble metal in the step (3) is Au, the Au is a metal ion required for electroplating+The main salt of (A) is KAu (CN)2The anode is a platinum-niobium mesh, and the pH of the electroplating solution is 4.5-4.9.
5. The method for preparing the superhard wear-resistant electroplating coating on the surface of the MEMS probe according to the claim 1, wherein when Rh is electroplated in the step (4), metal ions Rh in the electroplating solution3+The concentration of (A) is 2-15g/L, H2SO4The concentration is 20-120ml/L, and the total concentration of complex and halide is 0.0001-0.001 ml/L.
6. The method for preparing the superhard wear-resistant electroplating coating on the surface of the MEMS probe according to the claim 5, wherein when Rh is electroplated in the step (4),
the cathode reaction comprises:
Rh2(SO4)3+6e-→2Rh+3SO4 2-
2H++2e-→H2
the anode reaction comprises the following steps:
2H20-4e-→02+4H+
Rh3+-e-→Rh4+
Rh4+-2e-→Rh6+
CN202111251633.6A 2021-10-25 2021-10-25 Preparation method of super-hard wear-resistant electroplating coating on surface of MEMS probe Withdrawn CN114016100A (en)

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CN202111251633.6A CN114016100A (en) 2021-10-25 2021-10-25 Preparation method of super-hard wear-resistant electroplating coating on surface of MEMS probe

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Application Number Priority Date Filing Date Title
CN202111251633.6A CN114016100A (en) 2021-10-25 2021-10-25 Preparation method of super-hard wear-resistant electroplating coating on surface of MEMS probe

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115029747A (en) * 2022-07-26 2022-09-09 上海泽丰半导体科技有限公司 Probe processing method and probe

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115029747A (en) * 2022-07-26 2022-09-09 上海泽丰半导体科技有限公司 Probe processing method and probe
WO2024021198A1 (en) * 2022-07-26 2024-02-01 上海泽丰半导体科技有限公司 Probe treatment method and probe

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Application publication date: 20220208