CN112410760A - Process chamber in semiconductor process equipment and semiconductor process equipment - Google Patents

Process chamber in semiconductor process equipment and semiconductor process equipment Download PDF

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Publication number
CN112410760A
CN112410760A CN202011154664.5A CN202011154664A CN112410760A CN 112410760 A CN112410760 A CN 112410760A CN 202011154664 A CN202011154664 A CN 202011154664A CN 112410760 A CN112410760 A CN 112410760A
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China
Prior art keywords
chamber
cover body
assembly
cover
lid
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Granted
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CN202011154664.5A
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Chinese (zh)
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CN112410760B (en
Inventor
王帅伟
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Beijing Naura Microelectronics Equipment Co Ltd
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Beijing Naura Microelectronics Equipment Co Ltd
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Priority to CN202011154664.5A priority Critical patent/CN112410760B/en
Publication of CN112410760A publication Critical patent/CN112410760A/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The invention provides a process chamber in semiconductor process equipment and the semiconductor process equipment, wherein the process chamber comprises a chamber body and a chamber cover, the chamber cover is used for sealing the chamber body, the chamber cover comprises a cover body assembly and a support assembly, the cover body assembly is rotatably connected with the chamber body, and the cover body assembly can be lifted relative to the chamber body; the supporting assembly is connected with the cover body assembly and used for supporting the cover body assembly in the process that the cover body assembly rotates towards the cavity body, the cover body assembly is prevented from contacting with the cavity body, a gap exists between the cover body assembly and the cavity body, and after the cover body assembly is parallel to two opposite surfaces of the cavity body, the cover body assembly stops being supported, and the cover body assembly is enabled to contact with the cavity body. The process chamber in the semiconductor process equipment and the semiconductor process equipment provided by the invention can avoid the abrasion of the sealing part, thereby prolonging the service life of the sealing part, prolonging the maintenance period and facilitating the closing of the chamber cover.

Description

Process chamber in semiconductor process equipment and semiconductor process equipment
Technical Field
The invention relates to the technical field of semiconductor equipment, in particular to a process chamber in semiconductor process equipment and the semiconductor process equipment.
Background
Currently, the tungsten plug (W-plug) process is usually performed by Atomic Layer Deposition (ALD) or Chemical Vapor Deposition (CVD).
As shown in fig. 1, the process chamber for both processes generally includes a chamber body 11 and a chamber lid 12, wherein a kit (Kits) for the process such as a carrier (not shown) for carrying a Wafer (Wafer) is provided in the chamber body 11, and a gas inlet (not shown) for supplying a process gas is provided in the chamber lid 12. As shown in fig. 1, a rotating shaft seat 13, a sealing ring 14 and a positioning pin hole 15 are arranged on the chamber body 11, a rotating shaft 16 and a positioning pin 17 are arranged on the chamber cover 12, wherein the rotating shaft 16 can rotate in the rotating shaft seat 13 to enable the chamber cover 12 to rotate relative to the chamber body 11 when the chamber cover 12 is closed, the sealing ring 14 protrudes relative to the surface of the chamber body 11 on one side of the chamber cover 12 to enable the sealing ring to be compressed by the chamber cover 12 when the chamber cover 12 is closed to seal between the chamber cover 12 and the chamber body 11, and the positioning pin 17 is matched with the positioning pin hole 15 to position the chamber cover 12, so that the relative position of the air inlet component and the mating component meets the process requirement.
However, as shown in fig. 2 and 3, in the closing process of the chamber lid 12, since the sealing ring 14 protrudes relative to the surface of the chamber body 11 facing the chamber lid 12 side, one side of the chamber lid 12 facing the chamber body 11 may first contact the sealing ring 14, and then during the continuous rotation of the chamber lid 12, one side of the chamber lid 12 facing the chamber body 11 may generate sliding friction with the sealing ring 14, which may cause abrasion of the sealing ring 14, which may result in a reduction in the life of the sealing ring 14 and a reduction in the maintenance cycle, and if the weight of the chamber lid 12 is light, the friction force between the sealing ring 14 and the chamber lid 12 may also cause the chamber lid 12 to be supported and lifted by the sealing ring 14, which may not be sealed smoothly, and the chamber lid 12 may be completely closed by manually pressing the chamber lid 12, which may not facilitate the closing of the chamber lid 12.
Disclosure of Invention
The invention aims to at least solve one technical problem in the prior art, and provides a chamber cover and a process chamber, which can avoid the abrasion of a sealing part, thereby prolonging the service life of the sealing part, prolonging the maintenance period and facilitating the closing of the chamber cover.
To achieve the object of the present invention, there is provided a process chamber in semiconductor processing equipment, comprising a chamber body and a chamber lid for sealing the chamber body, the chamber lid comprising a lid assembly and a support assembly, the lid assembly being rotatably connected with the chamber body and being liftable with respect to the chamber body;
the supporting assembly is connected with the cover body assembly and used for supporting the cover body assembly in the process that the cover body assembly rotates towards the cavity body, the cover body assembly is prevented from contacting the cavity body, a gap is formed between the cover body assembly and the cavity body, and after the cover body assembly and two opposite surfaces of the cavity body are parallel, the cover body assembly stops being supported, and the cover body assembly is enabled to contact the cavity body.
Preferably, the cover body assembly comprises a cover body and a rotating matching piece, wherein the rotating matching piece is arranged on the cavity body, a rotating part is arranged on the cover body, the rotating part is in rotating matching with the rotating matching piece, and the cover body can lift relative to the rotating matching piece.
Preferably, the rotating part comprises a rotating shaft, a strip-shaped hole is formed in the rotating fitting piece, the rotating shaft is rotatably arranged in the strip-shaped hole and can move along the length direction of the strip-shaped hole.
Preferably, the support assembly comprises a support component, an elastic component and a limiting structure, wherein the support component is rotatably arranged on the cover body, can protrude out of the cover body in the process that the cover body rotates towards the chamber body, can rotate to no longer protrude out of the cover body after two opposite surfaces of the cover body and the chamber body are parallel, and is in rolling contact with the chamber body;
the limiting structure is arranged on the cover body and used for abutting against the supporting component in the process that the cover body rotates towards the chamber body, and limiting the rotating angle of the supporting component so that the supporting component supports the cover body;
the elastic component is respectively connected with the cover body and the supporting component and used for enabling the supporting component to rotate to be abutted against the limiting structure, and the elastic component can generate elastic deformation when the supporting component rotates to be not protruded out of the cover body any more.
Preferably, the elastic component comprises a compression spring, the limiting structure is positioned on one side of the supporting component far away from the rotating matching piece, and the compression spring is positioned on one side of the supporting component close to the rotating matching piece and forms an included angle with the supporting component;
or, the elastic component comprises an extension spring, the limiting structure is located on one side, close to the rotating matching piece, of the supporting component, and the extension spring is located on one side, far away from the rotating matching piece, of the supporting component and forms an included angle with the supporting component.
Preferably, the supporting member includes a supporting rod and a roller, one end of the supporting rod is rotatably connected with the cover body, the roller is rotatably disposed on the other end of the supporting rod, and the roller can protrude out of the cover body to be in rolling contact with the chamber body in the process that the cover body rotates toward the chamber body; one end of the elastic component is connected with the cover body, and the other end of the elastic component is connected to the supporting rod.
Preferably, the limiting structure comprises a limiting groove, the limiting groove is formed in the side wall of the cover body, the supporting part is rotatably arranged in the limiting groove, and in the process that the cover body rotates towards the chamber body, the side wall, far away from the rotating fitting part, of the limiting groove abuts against the supporting part; when the cover body is horizontally placed, a preset included angle is formed between the side wall of the limiting groove and the horizontal plane, and the value range of the preset included angle is 60-90 degrees.
Preferably, the chamber body is provided with a positioning hole, the cover assembly comprises a positioning piece matched with the positioning hole, and the height of the positioning piece is smaller than the height of a gap between the cover assembly and the chamber body in the process that the cover assembly rotates towards the chamber body.
Preferably, the chamber cover comprises at least three support assemblies, and the at least three support assemblies are respectively arranged on two opposite side walls of the cover body.
Preferably, the cover assembly further comprises a synchronous connecting member, and the synchronous connecting member is used for connecting the plurality of supporting assemblies on the same side wall of the cover body to enable the supporting assemblies to rotate synchronously.
The invention also provides semiconductor processing equipment comprising the processing chamber provided by the invention.
The invention has the following beneficial effects:
the invention provides a process chamber in semiconductor process equipment, which enables a cover body assembly to be rotatably connected with a chamber body and also enables the cover body assembly to be lifted and lowered relative to the chamber body so as to support the cover body assembly by means of a support assembly in the process of rotating the cover body assembly towards the chamber body, namely, in the process of closing a chamber cover, prevent the cover body assembly from contacting with the chamber body and enable a gap to exist between the cover body assembly and the chamber body, thereby avoiding a sealing member from contacting and rubbing with the cover body assembly in the process of closing the chamber cover, avoiding the abrasion of the sealing member, further prolonging the service life of the sealing member and prolonging the maintenance period, and because the cover body assembly does not contact with the sealing member in the process of closing the chamber cover, no interaction force exists between the cover body assembly and the sealing member, therefore, the situation that the chamber cover cannot be smoothly closed due to the fact that the cover body assembly is propped against the sealing component due to the fact that interaction force exists between the cover body assembly and the sealing component is avoided, and the chamber cover can be conveniently closed.
The semiconductor equipment provided by the invention can avoid the abrasion of the sealing part by virtue of the process chamber in the semiconductor process equipment, thereby prolonging the service life of the sealing part, prolonging the maintenance period and facilitating the closing of the chamber cover.
Drawings
FIG. 1 is a schematic diagram of a prior art process chamber configuration;
FIG. 2 is a schematic view of a prior art chamber lid of a process chamber in a first state during closing;
FIG. 3 is a schematic view of a prior art chamber lid of a process chamber in a second state during closing;
FIG. 4 is a schematic diagram of a process chamber in semiconductor processing equipment according to an embodiment of the present invention;
FIG. 5 is a partially enlarged schematic view of FIG. 4;
FIG. 6 is a schematic structural diagram of a limiting groove according to an embodiment of the present invention;
FIG. 7 is a schematic structural diagram of a support rod according to an embodiment of the present invention;
FIG. 8 is a schematic structural diagram of a roller according to an embodiment of the present invention;
FIG. 9 is a schematic view of a first state of a chamber lid of a process chamber during closing of the chamber lid, in accordance with an embodiment of the present invention;
FIG. 10 is an enlarged partial schematic view of FIG. 9;
FIG. 11 is a schematic view of a chamber lid of a process chamber during a closing process according to an embodiment of the invention;
FIG. 12 is a partially enlarged schematic view of FIG. 11;
FIG. 13 is a schematic view of a third state of a chamber lid of a process chamber during closing of the chamber lid, in accordance with an embodiment of the present invention;
FIG. 14 is an enlarged partial schematic view of FIG. 13;
FIG. 15 is a schematic view of a mounting structure of the synchronization connection provided in the embodiment of the present invention;
description of reference numerals:
11-a chamber body; 12-chamber lid; 13-a rotating shaft seat; 14-a sealing ring; 15-positioning pin holes; 16-a rotating shaft; 17-a locating pin; 21-a lid body; 22-a support assembly; 221-a support member; 2211-support bar; 2212-roller; 222-a limit structure; 223-an elastic member; 23-a rotating counterpart; 231-strip-shaped holes; 24-a rotating member; 241-a rotating shaft; 25-a positioning element; 26-a synchronizing connector; 271-a first connecting shaft; 272-a first shaft hole; 281-through holes; 282-second axle hole; 291-a third connecting shaft; 31-a chamber body; 32-positioning holes; 33-sealing means.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the following describes a process chamber and a semiconductor processing apparatus in detail with reference to the accompanying drawings.
As shown in fig. 4 and 5, the present embodiment provides a process chamber in semiconductor processing equipment, comprising a chamber body 31 and a chamber lid for sealing the chamber body 31, the chamber lid comprising a lid assembly and a support assembly 22, the lid assembly being rotatably coupled to the chamber body 31 and being liftable with respect to the chamber body 31; the supporting component 22 is connected to the cover component, and is configured to support the cover component during the rotation of the cover component toward the chamber body 31, so as to prevent the cover component from contacting the chamber body 31, so that a gap exists between the cover component and the chamber body 31, and after two opposite surfaces of the cover component and the chamber body 31 are parallel, the cover component stops being supported, so that the cover component contacts the chamber body 31.
In the process chamber of the semiconductor process equipment provided in this embodiment, the lid assembly is rotatably connected to the chamber body 31, and is also movable up and down with respect to the chamber body 31 so as to be able to support the lid assembly by the support assembly 22 during the rotation of the lid assembly toward the chamber body 31, i.e., during the closing of the chamber lid, prevent the lid assembly from contacting the chamber body 31, and allow a gap to exist between the lid assembly and the chamber body 31, thereby preventing the sealing member 33 from contacting and rubbing against the lid assembly during the closing of the chamber lid, so as to prevent the sealing member 33 from wearing, thereby increasing the life of the sealing member 33 and prolonging the maintenance period, and since the lid assembly does not contact the sealing member 33 during the closing of the chamber lid, there is no interaction force between the lid assembly and the sealing member 33 during the closing of the chamber lid, therefore, the situation that the chamber cover cannot be smoothly closed due to the fact that the cover body assembly is supported by the sealing component 33 due to the fact that interaction force exists between the cover body assembly and the sealing component 33 is avoided, and the chamber cover can be conveniently closed.
As shown in fig. 4 and 5, in a preferred embodiment of the present invention, the cover assembly may include a cover body 21 and a rotation fitting 23, wherein the rotation fitting 23 is disposed on the chamber body 31, the cover body 21 is provided with a rotation member 24, the rotation member 24 is rotatably fitted with the rotation fitting 23, and the cover body 21 can be lifted and lowered with respect to the rotation fitting 23.
The rotating part 24 is rotatably matched with the rotating matching piece 23, so that the cover body 21 can rotate relative to the rotating matching piece 23, the cover body assembly is rotatably connected with the cavity body 31, the cover body 21 can lift relative to the rotating matching piece 23, the cover body assembly can lift relative to the cavity body 31, the cover body assembly is rotatably connected with the cavity body 31, and the cover body assembly can lift relative to the cavity body 31.
As shown in fig. 4 and 5, in a preferred embodiment of the present invention, the rotating member 24 may include a rotating shaft 241, a strip-shaped hole 231 may be provided in the rotation fitting 23, and the rotating shaft 241 may be rotatably provided in the strip-shaped hole 231 and may be capable of moving along a length direction of the strip-shaped hole 231.
The rotating member 24 is rotatably engaged with the rotation fitting member 23 by rotatably disposing the rotating shaft 241 in the strip-shaped hole 231, and the rotating member 24 is lifted and lowered relative to the rotation fitting member 23 by moving the rotating shaft 241 in the length direction of the strip-shaped hole 231, so that the cover body 21 is lifted and lowered relative to the rotation fitting member 23.
As shown in fig. 4 and 5, the elongated hole 231 may be an oblong hole.
As shown in fig. 4 and 5, during the rotation of the cover body 21 toward the chamber body 31, that is, during the downward rotation and closing of the chamber lid, the support assembly 22 supports the cover body 21, and by the support of the support assembly 22 on the cover body 21, the support assembly 22 applies an upward acting force to the cover body 21 to prevent the cover body 21 from contacting the chamber body 31, and since the cover body 21 can be lifted relative to the chamber body 31, the cover body 21 is lifted relative to the chamber body 31 by the upward acting force to form a gap between the cover body and the chamber body 31, so that the cover body 21 and the sealing member 33 on the chamber body 31 do not contact with each other, and thus, during the rotation of the cover body 21 toward the chamber body 31, the cover body 21 and the sealing member 33 are prevented from contacting and rubbing against each other. After the cover body 21 is rotated towards the chamber body 31 to be parallel to the two opposite surfaces of the chamber body 31, the support assembly 22 stops supporting the cover body 21, so that the upward acting force applied to the cover body 21 by the support assembly 22 disappears, and therefore, the cover body 21 is lowered relative to the chamber body 31 until contacting the chamber body 31 to press the sealing part 33 on the chamber body 31, and the sealing between the cover body 21 and the chamber body 31 is realized.
As shown in fig. 4 and 5, in a preferred embodiment of the present invention, the supporting assembly 22 may include a supporting member 221, an elastic member 223 and a limiting structure 222, wherein the supporting member 221 is rotatably disposed on the cover body 21, can protrude out of the cover body 21 during the rotation of the cover body 21 towards the chamber body 31, and can rotate to no longer protrude out of the cover body 21 after two opposite surfaces of the cover body 21 and the chamber body 31 are parallel, and the supporting member 221 is in rolling contact with the chamber body 31; the limiting structure 222 is disposed on the cover body 21, and is used for abutting against the supporting member 221 in the process that the cover body 21 rotates towards the chamber body 31, limiting the rotation angle of the supporting member 221, and enabling the supporting member 221 to support the cover body 21; the elastic component 223 is respectively connected with the cover body 21 and the supporting component 221, and is used for enabling the supporting component 221 to rotate to abut against the limiting structure 222, and the elastic component 223 can generate elastic deformation when the supporting component 221 rotates to no longer protrude out of the cover body 21.
When the chamber cover is in an open state, the elastic member 223 makes the support member 221 rotate to abut against the limit structure 222 by virtue of the elastic force of the elastic member 223, and the limit structure 222 abuts against the support member 221 to limit the rotation angle of the support member 221, so that the support member 221 cannot support the cover body 21 due to the fact that the elastic member 223 makes the rotation angle of the support member 221 be too large. In the process of rotating the cover body 21 toward the chamber body 31, the support member 221 protrudes from the cover body 21 and can be in rolling contact with the chamber body 31 to support the cover body 21. After the supporting member 221 is in rolling contact with the chamber body 31, in the process that the cover body 21 continues to rotate towards the chamber body 31, the limiting structure 222 abuts against the supporting member 221 to prevent the supporting member 221 from rotating, so that the supporting member 221 cannot support the cover body 21, and in the process, the supporting member 221 can continuously apply upward acting force to the cover body 21, so that the supporting member 221 gradually jacks up the cover body 21, and a gap is always formed between the cover body 21 and the chamber body 31. Through making the supporting part 221 and the chamber body 31 rolling contact, particulate matters generated by mutual friction between the supporting part 221 and the chamber body 31 can be reduced, so that pollution to the process environment inside the chamber body 31 is avoided, and influence on a semiconductor process is avoided.
When the cover body 21 rotates towards the chamber body 31 to be parallel to two opposite surfaces of the chamber body 31, the supporting member 221 rotates to be not protruded out of the cover body 21 any more, and applies an acting force to the elastic member 223 in the rotating process to enable the elastic member 223 to generate elastic deformation, at this time, the force applied to the supporting member 221 in the other direction is larger, so that the elastic member 223 cannot rely on the elastic force of the supporting member 221 to abut against the limiting structure 222, at this time, the supporting member 221 stops supporting the cover body 21, and the cover body 21 falls to be in contact with the chamber body 31.
As shown in fig. 5 and 6, in a preferred embodiment of the present invention, the limiting structure 222 may include a limiting groove, the limiting groove is opened on the side wall of the cover body 21, the supporting part 221 is rotatably disposed in the limiting groove, and during the rotation of the cover body 21 toward the chamber body 31, the side wall of the limiting groove far away from the rotation fitting part 23 is abutted against the supporting part 221; when the cover body 21 is horizontally placed, a preset included angle (shown as an included angle α in fig. 11) is formed between the side wall of the limiting groove and the horizontal plane, and the value range of the preset included angle is 60-90 °. Preferably, the predetermined included angle is 90 °.
When the chamber lid is in an open state, the elastic member 223 makes the supporting member 221 rotate to abut against the side wall of the stopper groove away from the rotation fitting member 23 by virtue of its own elastic force, so as to keep away from the side wall of the rotation fitting member 23 through the stopper groove, and limit the rotation angle of the supporting member 221, and after the cover body 21 rotates towards the chamber body 31 until the two surfaces opposite to the chamber body 31 are parallel, the supporting member 221 rotates to the stopper groove.
However, the form of the stopper structure is not limited to this, and for example, the stopper structure 222 may be a convex portion that is projected from the side wall of the cover body 21 and can abut against the support member 221.
As shown in fig. 4, 5, 7 and 8, in a preferred embodiment of the present invention, the supporting member 221 includes a supporting rod 2211 and a roller 2212, the supporting rod 2211 is rotatably connected to the cover body 21 at one end, the roller 2212 is rotatably disposed on the other end of the supporting rod 2211, and the roller 2212 can protrude from the cover body 21 to be in rolling contact with the chamber body 31 during the rotation of the cover body 21 toward the chamber body 31; the elastic member 223 has one end connected to the cover body 21 and the other end connected to the support rod 2211.
When the chamber lid is in an open state, the support rod 2211 can rotate to abut against the limiting structure 222 under the action of the elastic force of the elastic component 223, and the roller 2212 protrudes out of the cover body 21, in the process that the cover body 21 rotates towards the chamber body 31, the roller 2212 protrudes out of the cover body 21 to be capable of rolling contact with the chamber body 31, so that the support component 221 is in rolling contact with the chamber body 31, after the roller 2212 is in contact with the chamber body 31, in the process that the cover body 21 continues to rotate towards the chamber body 31, the roller 2212 rolls on the chamber body 31, and the support rod 2211 gradually jacks up the cover body 21.
Alternatively, the height of the roller 2212 (as shown by height s in fig. 5) may be 8mm-20 mm.
Preferably, the height of the roller 2212 may be 14 mm.
Alternatively, as shown in fig. 6 and 7, the first connecting shaft 271 may be disposed in the limiting groove, the support bar 2211 is provided with a first shaft hole 272 matched with the first connecting shaft 271, and the first connecting shaft 271 is inserted into the first shaft hole 272, so that the support bar 2211 is rotatably disposed in the limiting groove.
Alternatively, as shown in fig. 7 and 8, the supporting member 221 may further include a second connecting shaft (not shown), a through hole 281 is formed at the other end of the supporting rod 2211 to be engaged with the second connecting shaft, a second shaft hole 282 is formed in the roller 2212 to be engaged with the second connecting shaft, and the second connecting shaft is adapted to pass through the through hole 281 and the second shaft hole 282, so that the roller 2212 is rotatably disposed at the other end of the supporting rod 2211. However, the manner in which the roller 2212 is rotatably disposed on the support bar 2211 is not limited thereto, and a second connecting shaft may be disposed at the other end of the support bar 2211, the roller 2212 is provided with a second shaft hole 282 engaged with the second connecting shaft, and the second connecting shaft is inserted into the first shaft hole 272, so that the roller 2212 is rotatably disposed at the other end of the support bar 2211.
As shown in fig. 4 and 5, in a preferred embodiment of the present invention, the elastic member 223 may include a compression spring, the limiting structure 222 is located on a side of the supporting member 221 away from the rotating fitting member 23, and the compression spring is located on a side of the supporting member 221 close to the rotating fitting member 23 and forms an included angle with the supporting member 221.
As shown in fig. 4 and 5, when the chamber lid is in an open state, the compression spring pushes the support rod 2211 connected thereto against the limiting structure 222 by its own elastic force, and the roller 2212 protrudes from the lid body 21 and does not contact with the chamber body 31. As shown in fig. 9 and 10, in the process of rotating the cover body 21 toward the chamber body 31, the roller 2212 contacts with the chamber body 31, and then the cover body 21 continues to rotate toward the chamber body 31, in the process, the chamber body 31 supports the roller 2212, the roller 2212 rolls on the chamber body 31, and the supporting force of the chamber body 31 supporting the roller 2212 is transmitted to the supporting rod 2211 through the roller 2212 and then transmitted to the cover body 21 through the supporting rod 2211, so that the cover body 21 is lifted by an upward acting force. As shown in fig. 11 and 12, when the cover body 21 rotates towards the chamber body 31 with its two surfaces opposite to the chamber body 31 being parallel, the cover body 21 will have a rotational inertia continuing to rotate towards the chamber body 31, and under the rotational inertia, the support rod 2211 will rotate towards the rotation fitting member 23. Thereafter, as shown in fig. 13 and 14, the support rod 2211 applies a force to the compression spring, the compression spring is compressed by the force, the roller 2212 does not protrude from the cover body 21 any more, the support member 221 stops supporting the cover body 21, and the cover body 21 falls into contact with the chamber body 31 to press the sealing member 33 on the chamber body 31, so as to seal the cover body 21 and the chamber body 31.
Alternatively, as shown in fig. 6 and 7, a third connecting shaft 291 may be disposed in the stopper groove, and the compression spring may be installed in the stopper groove through the third connecting shaft 291.
However, the type of the elastic member 223 is not limited thereto, and the elastic member 223 may further include an extension spring, which is different from the elastic member 223 including a compression spring in that the limiting structure 222 is located on a side of the supporting member 221 close to the rotation matching member 23, and the extension spring is located on a side of the supporting member 221 far from the rotation matching member 23 and has an angle with the supporting member 221.
When the chamber lid is in an open state, the extension spring pulls the support rod 2211 connected thereto to abut against the limiting structure 222 by virtue of its own elastic force, after the cover body 21 rotates towards the chamber body 31 until the support rod 2211 is parallel to two opposite surfaces of the chamber body 31, the support rod 2211 applies an acting force to the extension spring under the action of the rotational inertia of the cover body 21, the extension spring is extended under the action of the acting force, so that the roller 2212 no longer protrudes out of the cover body 21, the support member 221 stops supporting the cover body 21, and the cover body 21 falls down to contact with the chamber body 31, so as to compress the sealing member 33 on the chamber body 31, thereby realizing the sealing between the cover body 21 and the chamber body 31.
As shown in fig. 4 and 5, in a preferred embodiment of the present invention, the chamber body 31 may be provided with a positioning hole 32, the cover assembly may include a positioning member 25 engaged with the positioning hole 32, and a height (as shown by a height h in fig. 5) of the positioning member 25 is smaller than a height of a gap between the cover assembly and the chamber body 31 during the rotation of the cover assembly toward the chamber body 31.
The positioning member 25 is inserted into the positioning hole 32 when the cover assembly falls into contact with the chamber body 31, so as to define the relative position between the cover assembly and the chamber body 31. Through making the height of locating piece 25 be less than the height of the clearance between lid subassembly and the cavity body 31 of the in-process that the lid subassembly rotated towards cavity body 31, can avoid locating piece 25 at the lid subassembly towards the pivoted in-process of cavity body 31, contact with cavity body 31, cause the interference to the rotation of lid subassembly, and, because locating piece 25 at the lid subassembly towards the pivoted in-process of cavity body 31, can not contact with cavity body 31, therefore, locating piece 25 at the lid subassembly towards the pivoted in-process of cavity body 31, can not stretch into locating hole 32 from the skew direction, thereby can make the size of locating hole 32 need not to be greater than the size of locating piece 25, make the size of locating hole 32 can be the same with the size of locating piece 25, so that locating hole 32 and locating piece 25 can have more accurate positioning effect.
Alternatively, the height of the positioning member 25 may be 5mm to 15 mm.
Preferably, the height of the positioning member 25 may be 8 mm.
As shown in fig. 4 and 5, in a preferred embodiment of the present invention, the chamber lid includes at least three support members 22, and the at least three support members 22 are respectively disposed on two opposite sidewalls of the lid body 21 to improve the stability of the support members 22 supporting the lid body 21.
As shown in fig. 15, in a preferred embodiment of the present invention, the cover assembly may further include a synchronous connecting member 26, and the synchronous connecting member 26 is used for connecting a plurality of supporting members 22 on the same side wall of the cover body 21 to rotate synchronously.
The plurality of supporting assemblies 22 on the same side wall of the cover body 21 are connected through the synchronous connecting piece 26, so that the plurality of supporting assemblies 22 on the same side wall of the cover body 21 can synchronously rotate, the plurality of supporting assemblies 22 on the same side wall of the cover body 21 synchronously support the cover body 21, or the supporting of the cover body 21 is synchronously stopped, the consistency of the supporting assemblies 22 supporting the cover body 21 and stopping supporting the cover body 21 is improved, and the working accuracy of the supporting assemblies 22 is improved.
As another technical solution, an embodiment of the present invention further provides a semiconductor processing apparatus, including the process chamber provided in the embodiment of the present invention.
The semiconductor processing equipment provided by the embodiment of the invention can avoid the abrasion of the sealing part 33 by the process chamber provided by the embodiment of the invention, thereby prolonging the service life of the sealing part 33, prolonging the maintenance period and facilitating the closing of the chamber cover.
In summary, the process chamber and the semiconductor process apparatus in the semiconductor process apparatus according to the embodiments of the present invention can avoid the abrasion of the sealing member 33, thereby improving the life of the sealing member 33, prolonging the maintenance period, and facilitating the closing of the chamber lid.
It is to be understood that the above embodiments are merely exemplary embodiments that have been employed to illustrate the principles of the present invention, and that the present invention is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.

Claims (11)

1. A process chamber in semiconductor processing equipment, comprising a chamber body and a chamber lid for sealing the chamber body, wherein the chamber lid comprises a lid assembly and a support assembly, the lid assembly being rotatably connected to the chamber body and being liftable with respect to the chamber body;
the supporting assembly is connected with the cover body assembly and used for supporting the cover body assembly in the process that the cover body assembly rotates towards the cavity body, the cover body assembly is prevented from contacting the cavity body, a gap is formed between the cover body assembly and the cavity body, and after the cover body assembly and two opposite surfaces of the cavity body are parallel, the cover body assembly stops being supported, and the cover body assembly is enabled to contact the cavity body.
2. The process chamber of claim 1, wherein the lid assembly comprises a lid body and a rotating mating piece, wherein the rotating mating piece is disposed on the chamber body, wherein a rotating member is disposed on the lid body, wherein the rotating member is rotatably mated with the rotating mating piece, and wherein the lid body is capable of being lifted relative to the rotating mating piece.
3. The process chamber of claim 2, wherein the rotating member comprises a rotating shaft, and the rotating fitting member is provided with a strip-shaped hole, and the rotating shaft is rotatably arranged in the strip-shaped hole and can move along the length direction of the strip-shaped hole.
4. The process chamber of claim 2 or 3, wherein the support assembly comprises a support member, an elastic member and a limiting structure, wherein the support member is rotatably disposed on the cover body and can protrude out of the cover body during the rotation of the cover body towards the chamber body, and can rotate to no longer protrude out of the cover body after two surfaces of the cover body opposite to the chamber body are parallel, and the support member is in rolling contact with the chamber body;
the limiting structure is arranged on the cover body and used for abutting against the supporting component in the process that the cover body rotates towards the chamber body, and limiting the rotating angle of the supporting component so that the supporting component supports the cover body;
the elastic component is respectively connected with the cover body and the supporting component and used for enabling the supporting component to rotate to be abutted against the limiting structure, and the elastic component can generate elastic deformation when the supporting component rotates to be not protruded out of the cover body any more.
5. The process chamber of claim 4, wherein the resilient member comprises a compression spring, the limiting structure is located on a side of the support member away from the rotating fitting, and the compression spring is located on a side of the support member close to the rotating fitting and forms an included angle with the support member;
or, the elastic component comprises an extension spring, the limiting structure is located on one side, close to the rotating matching piece, of the supporting component, and the extension spring is located on one side, far away from the rotating matching piece, of the supporting component and forms an included angle with the supporting component.
6. The process chamber of claim 4, wherein the support member comprises a support bar and a roller, the support bar is rotatably connected to the cover body at one end, the roller is rotatably disposed at the other end of the support bar, and the roller is capable of protruding out of the cover body to be in rolling contact with the chamber body during rotation of the cover body toward the chamber body; one end of the elastic component is connected with the cover body, and the other end of the elastic component is connected to the supporting rod.
7. The process chamber of claim 4, wherein the limiting structure comprises a limiting groove, the limiting groove is formed in the side wall of the cover body, the supporting member is rotatably disposed in the limiting groove, and the side wall of the limiting groove, which is far away from the rotating fitting member, abuts against the supporting member during the rotation of the cover body towards the chamber body; when the cover body is horizontally placed, a preset included angle is formed between the side wall of the limiting groove and the horizontal plane, and the value range of the preset included angle is 60-90 degrees.
8. The process chamber of any of claims 1-3, wherein the chamber body is provided with a locating hole, the lid assembly comprises a locating member that mates with the locating hole, and a height of the locating member is less than a height of a gap between the lid assembly and the chamber body during rotation of the lid assembly toward the chamber body.
9. The process chamber of claim 2 or 3, wherein the chamber lid comprises at least three support assemblies disposed on two opposing sidewalls of the lid body.
10. The process chamber of claim 9, wherein the lid assembly further comprises a synchronization connection for connecting the plurality of support assemblies on the same sidewall of the lid body for synchronized rotation.
11. A semiconductor processing apparatus comprising the process chamber of any of claims 1-10.
CN202011154664.5A 2020-10-26 2020-10-26 Process chamber in semiconductor process equipment and semiconductor process equipment Active CN112410760B (en)

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JP2009032878A (en) * 2007-07-26 2009-02-12 Tokyo Electron Ltd Apparatus and method for processing substrate, and storage medium
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CN101985745A (en) * 2009-07-28 2011-03-16 丽佳达普株式会社 Chemical vapor deposition (CVD) apparatus and substrate processing apparatus
CN205802285U (en) * 2015-11-17 2016-12-14 应用材料公司 Pit cover device, transfer chamber device and for promoting the device of lid
CN109706435A (en) * 2017-10-25 2019-05-03 北京北方华创微电子装备有限公司 Chamber cap assemblies, processing chamber and semiconductor processing equipment
CN110534448A (en) * 2018-05-25 2019-12-03 北京北方华创微电子装备有限公司 Gas integrated block structure, processing chamber and semiconductor processing equipment
CN210529056U (en) * 2019-08-29 2020-05-15 中国电子科技集团公司第四十八研究所 Flat PECVD equipment chamber lid device that opens and shuts
CN111559242A (en) * 2019-02-14 2020-08-21 丰田合成株式会社 Lid opening and closing structure

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009032878A (en) * 2007-07-26 2009-02-12 Tokyo Electron Ltd Apparatus and method for processing substrate, and storage medium
CN101833357A (en) * 2009-03-13 2010-09-15 鸿富锦精密工业（深圳）有限公司 Electronic device
CN101985745A (en) * 2009-07-28 2011-03-16 丽佳达普株式会社 Chemical vapor deposition (CVD) apparatus and substrate processing apparatus
CN205802285U (en) * 2015-11-17 2016-12-14 应用材料公司 Pit cover device, transfer chamber device and for promoting the device of lid
CN109706435A (en) * 2017-10-25 2019-05-03 北京北方华创微电子装备有限公司 Chamber cap assemblies, processing chamber and semiconductor processing equipment
CN110534448A (en) * 2018-05-25 2019-12-03 北京北方华创微电子装备有限公司 Gas integrated block structure, processing chamber and semiconductor processing equipment
CN111559242A (en) * 2019-02-14 2020-08-21 丰田合成株式会社 Lid opening and closing structure
CN210529056U (en) * 2019-08-29 2020-05-15 中国电子科技集团公司第四十八研究所 Flat PECVD equipment chamber lid device that opens and shuts

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