CN112399104B - Global exposure low-noise high-speed three-dimensional sensor phase-locked pixel and reading mode - Google Patents

Global exposure low-noise high-speed three-dimensional sensor phase-locked pixel and reading mode Download PDF

Info

Publication number
CN112399104B
CN112399104B CN201910750469.XA CN201910750469A CN112399104B CN 112399104 B CN112399104 B CN 112399104B CN 201910750469 A CN201910750469 A CN 201910750469A CN 112399104 B CN112399104 B CN 112399104B
Authority
CN
China
Prior art keywords
pixel
speed
msel
nmos
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201910750469.XA
Other languages
Chinese (zh)
Other versions
CN112399104A (en
Inventor
徐江涛
史晓琳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tianjin University Marine Technology Research Institute
Original Assignee
Tianjin University Marine Technology Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tianjin University Marine Technology Research Institute filed Critical Tianjin University Marine Technology Research Institute
Priority to CN201910750469.XA priority Critical patent/CN112399104B/en
Publication of CN112399104A publication Critical patent/CN112399104A/en
Application granted granted Critical
Publication of CN112399104B publication Critical patent/CN112399104B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/60Noise processing, e.g. detecting, correcting, reducing or removing noise
    • H04N25/65Noise processing, e.g. detecting, correcting, reducing or removing noise applied to reset noise, e.g. KTC noise related to CMOS structures by techniques other than CDS
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/71Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
    • H04N25/75Circuitry for providing, modifying or processing image signals from the pixel array
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors

Abstract

A global exposure low-noise high-speed three-dimensional sensor phase-locked pixel and a reading mode; the dual-input high-speed column parallel ADC mainly comprises NMOS (N-channel metal oxide semiconductor) tubes M1-M3, photodiodes Photo-detectors, NMOS tubes SF 1-SF 3, NMOS tubes Msel 1-Msel 3, tail current sources I1 and I2 and dual-input high-speed column parallel ADCs; the pixel can adopt a global exposure mode, and can effectively inhibit image distortion; the readout process of the pixel is similar to that of a 4T pixel in a common image sensor, and the correlated double sampling technique can be used to suppress reset noise. The photosensitive part in the pixel adopts a novel structure, so that the charge transfer efficiency can be effectively promoted, and the imaging frame frequency can be improved.

Description

Global exposure low-noise high-speed three-dimensional sensor phase-locked pixel and reading mode
Technical Field
The invention relates to the field of image sensors, in particular to a phase-locked pixel and a reading mode of a three-dimensional sensor capable of realizing global exposure, low noise and high speed.
Background
The sensor is used as the extension of human sense, and the accurate and reliable acquisition and conversion of external information are realized. CMOS image sensors play an important role in various fields. In recent years, the demand for three-dimensional image sensors has increased, and the three-dimensional image sensors can be used for three-dimensional reconstruction, automatic processing, height measurement and the like in the industrial field; the method can be used for unmanned aerial vehicle investigation, submarine underwater navigation, interstar telemetry imaging and the like in the military field; the automobile can be used for unmanned driving and auxiliary driving in the automobile field; in consumer electronics, applications are in motion sensing games, gesture recognition, etc. Three-dimensional image sensors based on time of flight (ToF) have a broader application prospect due to the simpler imaging system. The principle of the 3D image sensor based on square wave modulated optical signals is shown in fig. 1, the light source generator emits modulated optical signals, after the round trip distance delay, the phase reaching the detector changes, and the target distance information L is calculated according to the formula 1 by measuring the change of the modulated light flight time Tflight, namely
Figure SMS_1
According to the measurement principle of the flight time, three or four times of sampling are needed to be completed in one light wave modulation period to obtain phase change information, a three-phase integral schematic diagram is shown in fig. 2, the modulation light period is Tmod, three phases are respectively 0, tmod/3 and 2Tmod/3, integral results at the three phases are respectively Q1, Q2 and Q3, and further distance information is obtained through calculation. The detected distance can be obtained from the integration result as shown in equation 2:
Figure SMS_2
when the phase change information is acquired, each phase of the reflected light signal needs to be sampled and accumulated multiple times to reduce the error. If a sampling signal of one phase is read for each frame, three or four frames are sampled continuously, the frame frequency is inevitably reduced, and the imaging quality is obviously reduced when a moving object is shot. Meanwhile, a roller exposure mode is often adopted because the traditional three-dimensional image sensor is influenced by the speed of a reading circuit. In this exposure mode, the exposure process of the conventional three-dimensional image sensor is similar to that of the 3T pixel in the general image sensor, and thus reset noise in the pixel cannot be suppressed, resulting in a decrease in sensor accuracy.
Disclosure of Invention
Aiming at the problems existing in the prior art, the invention provides a phase-locked pixel and a reading mode of a global exposure low-noise high-speed three-dimensional sensor. The pixel can adopt a global exposure mode, and can effectively inhibit image distortion. The readout process of the pixel is similar to that of a 4T pixel in a common image sensor, and the correlated double sampling technique can be used to suppress reset noise. The photosensitive part in the pixel adopts a novel structure, so that the charge transfer efficiency can be effectively promoted, and the imaging frame frequency can be improved.
As shown in FIG. 3, the phase-locked pixel structure of the global exposure low-noise high-speed three-dimensional sensor mainly comprises NMOS (N-channel metal oxide semiconductor) tubes M1-M3, photodiodes Photo-detector, NMOS tubes SF 1-SF 3, NMOS tubes Msel 1-Msel 3, tail current sources I1 and I2 and dual-input high-speed column parallel ADC; the connection relation of each component is as follows: the drains of the NMOS tubes M1-M3 are connected with a power supply VDD, the gates are connected with RST signals, and the sources are respectively connected with FD 1-FD 3 of the photodiodes Photo-detector; the drains of the NMOS tubes SF 1-SF 3 are connected with a power supply VDD, the gates are respectively connected with FD 1-FD 3 of the photodiodes Photo-detector, and the sources are respectively connected with the drains of the NMOS tubes Msel 1-Msel 3; the gates of NMOS transistors Msel 1-Msel 3 are respectively connected with control signals Sel 1-Sel 3, the source of Msel1 is connected with the source of Msel2, and meanwhile, the positive end of a tail current source I1 and the vin+ end of a high-speed column parallel ADC are connected, and the source of Msel3 is connected with the positive end of the tail current source I2 and the Vin-end of the high-speed column parallel ADC. The negative terminals of the current sources I1, I2 are both connected to ground.
The implementation method of the phase-locked pixel structure of the global exposure low-noise high-speed three-dimensional sensor comprises the following steps: in order to improve the transfer efficiency and speed of photo-generated charges in the pixels, the transfer of charges is accelerated by a method of constructing an internal electric field. The photosensitive area adopts a comb-shaped PPD structure to accelerate the transfer speed of photo-generated charges in the PPD area to the FD area, and the problem of incomplete charge transfer in the integral time is avoided. The pixel adopts a structure with three single-side FD, and the nodes FD1, FD2 and FD3 can collect photo-generated charges at three different phases, so that all phase difference information required by the pixel is directly output within one frame time, and further depth information is acquired, thereby effectively improving the imaging speed of the sensor.
The implementation method of the low-error phase-locked pixel comprises the following steps: from the error transfer function, it is possible to obtain:
Figure SMS_3
wherein A is the maximum light intensity after the modulated light is reflected, B is the background light intensity, N is the integration times, and c is the light speed. The detection errors of the method for obtaining the depth information by the three phases and the four phases are respectively calculated according to the deduction of the detection distance error transfer function formula 3, and the method for obtaining the depth information by the three phases is smaller in detection errors compared with the four phases as shown in the formulas 4 and 5.
Figure SMS_4
Figure SMS_5
By means of the timing control as shown in fig. 4, two sets of source follower circuits realize spatial double sampling readout. The kTC noise introduced by the reset circuit can be effectively reduced through the optimized reset time sequence. The fully differential CDS circuit is adopted to perform double sampling operation in time, so that the non-uniformity of the source follower is effectively reduced, and the reset noise and the non-uniformity of the pixels can be effectively reduced by adopting the structure.
The phase-locked pixel and the readout mode of the global exposure low-noise high-speed three-dimensional sensor have the advantages of faster imaging performance, higher imaging precision and lower kTC noise, and further enlarge the application occasions of the 3D image sensor.
Drawings
FIG. 1 is a schematic diagram of a 3D image sensor based on square wave modulated optical signals;
FIG. 2 is a schematic diagram of three-phase integration based on a time-of-flight three-dimensional image sensor;
FIG. 3 is a diagram showing a phase-locked pixel structure and a readout circuit of a low-noise high-speed three-dimensional image sensor using a global exposure mode;
fig. 4 is a readout circuit control timing of the proposed pixel structure;
FIG. 5 is a schematic diagram of a two-stage Cyclic ADC used in the examples; FIG. 6 is a timing diagram of the operation of the two-stage Cyclic ADC used in the example.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clear, a specific description of embodiments of the present invention will be given below with reference to examples.
In this example, the invention designs square waves with pixel sizes of 10um×10um, a fill factor of 40%, FD 1-FD 3 sizes of 1.5 um2, a modulated light source with a duty cycle of 1:3, a period tmod=250 ns, and an average power of 1W. The readout circuit adopts a two-input two-stage 14-bit Cyclic ADC schematic diagram as shown in FIG. 5, and the overall data conversion rate is 100KSPS. The control time sequence of the two-stage Cyclic ADC adopted by the invention is shown in figure 6, for the first-stage Cyclic ADC, the acquisition of CDS output signals is completed, the quantification of the highest bit is completed at the same time, and after 5 times of circulation, the first-stage Cyclic ADC completes the data conversion of the high 5 bits. And when the first-stage Cyclic ADC performs the 5 th cycle, the second-stage Cyclic ADC starts to sample the output signal of the first-stage Cyclic ADC, and the low-9-bit data conversion is completed after 9 cycle periods. The data conversion of the first-stage Cyclic ADC and the second-stage Cyclic ADC is carried out in a pipeline form, so that the conversion time of the first stage is equal to the conversion time of the second stage, namely the conversion time of the whole ADC. The Cyclic ADC adopted by the invention realizes half-cycle data conversion by adding one sampling capacitor, namely, 1bit data conversion can be completed in each half clock period, so that the integral ADC only needs 2.5 clock periods for completing one complete data conversion. Each cycle time of the first stage Cyclic ADC is set to 25ns; the signal sampling time of the second stage Cyclic ADC is 35s, and then each cycle time is 10ns. The invention can realize the output frame frequency of 60fps and effectively reduce the noise of 500uV.

Claims (1)

1. A global exposure low noise high speed three dimensional sensor phase locked pixel, characterized by: the dual-input high-speed column parallel ADC mainly comprises NMOS (N-channel metal oxide semiconductor) tubes M1-M3, photodiodes Photo-detectors, NMOS tubes SF 1-SF 3, NMOS tubes Msel 1-Msel 3, tail current sources I1 and I2; the drains of the NMOS tubes M1-M3 are connected with a power supply VDD, the gates are connected with RST signals, and the sources are respectively connected with FD 1-FD 3 of the photodiodes Photo-detector; the drains of the NMOS tubes SF 1-SF 3 are connected with a power supply VDD, the gates are respectively connected with FD 1-FD 3 of the photodiodes Photo-detector, and the sources are respectively connected with the drains of the NMOS tubes Msel 1-Msel 3; the gates of NMOS transistors Msel 1-Msel 3 are respectively connected with control signals Sel 1-Sel 3, the source of Msel1 is connected with the source of Msel2, and meanwhile, the positive end of a tail current source I1 and the vin+ end of a high-speed column parallel ADC are connected, and the source of Msel3 is connected with the positive end of the tail current source I2 and the Vin-end of the high-speed column parallel ADC; negative terminals of the current sources I1 and I2 are connected with the ground;
accelerating the transfer of charge by constructing an internal electric field; the photosensitive area adopts a comb-shaped PPD structure to accelerate the transfer speed of photo-generated charges in the PPD area to the FD area; the pixel adopts a structure of three single-side FD, and the nodes FD1, FD2 and FD3 can collect photo-generated charges at three different phases;
from the error transfer function, it is possible to obtain:
Figure QLYQS_1
wherein A is the maximum light intensity after the modulated light is reflected, B is the background light intensity, N is the integration times, and c is the light speed; the detection errors of the method for obtaining depth information by three phases and four phases are respectively calculated according to the deduction of the detection distance error transfer function formula 3, and are shown in the following formulas 4 and 5:
Figure QLYQS_2
Figure QLYQS_3
through time sequence control, two sets of source-level follower circuits realize spatial double sampling readout.
CN201910750469.XA 2019-08-14 2019-08-14 Global exposure low-noise high-speed three-dimensional sensor phase-locked pixel and reading mode Active CN112399104B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910750469.XA CN112399104B (en) 2019-08-14 2019-08-14 Global exposure low-noise high-speed three-dimensional sensor phase-locked pixel and reading mode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910750469.XA CN112399104B (en) 2019-08-14 2019-08-14 Global exposure low-noise high-speed three-dimensional sensor phase-locked pixel and reading mode

Publications (2)

Publication Number Publication Date
CN112399104A CN112399104A (en) 2021-02-23
CN112399104B true CN112399104B (en) 2023-06-16

Family

ID=74601420

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910750469.XA Active CN112399104B (en) 2019-08-14 2019-08-14 Global exposure low-noise high-speed three-dimensional sensor phase-locked pixel and reading mode

Country Status (1)

Country Link
CN (1) CN112399104B (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6975356B1 (en) * 1999-06-28 2005-12-13 Fujitsu Limited Solid-state imaging device with the elimination of thermal noise
CN104333720A (en) * 2014-11-12 2015-02-04 上海集成电路研发中心有限公司 High-frame-rate global pixel CMOS (Complementary Metal Oxide Semiconductor) image sensor and signal transmission method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101094246B1 (en) * 2009-03-16 2011-12-19 이재웅 Wide Dynamic Range CMOS Image Sensor
JP2011229120A (en) * 2010-03-30 2011-11-10 Sony Corp Solid-state imaging device, signal processing method of solid-state imaging device, and electronic apparatus
JP6056126B2 (en) * 2011-10-21 2017-01-11 ソニー株式会社 Solid-state imaging device and camera system
EP3605606B1 (en) * 2018-08-03 2022-06-15 ams Sensors Belgium BVBA Imaging system comprising an infrared light source and an image sensor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6975356B1 (en) * 1999-06-28 2005-12-13 Fujitsu Limited Solid-state imaging device with the elimination of thermal noise
CN104333720A (en) * 2014-11-12 2015-02-04 上海集成电路研发中心有限公司 High-frame-rate global pixel CMOS (Complementary Metal Oxide Semiconductor) image sensor and signal transmission method thereof

Also Published As

Publication number Publication date
CN112399104A (en) 2021-02-23

Similar Documents

Publication Publication Date Title
Piron et al. A review of single-photon avalanche diode time-of-flight imaging sensor arrays
US9442196B2 (en) Demodulation sensor with separate pixel and storage arrays
US8829408B2 (en) Sensor pixel array and separated array of storage and accumulation with parallel acquisition and readout wherein each pixel includes storage sites and readout nodes
EP2758801B1 (en) Time of flight sensor with subframe compression and method
CN107300705B (en) Laser radar ranging system and method based on carrier modulation
CN107247269B (en) Detection device, pixel unit and array for collecting and processing laser signals
CN111727602B (en) Single chip RGB-D camera
US8908063B2 (en) Method and apparatus for a time-of-flight sensor with charge storage
US8432304B2 (en) Error correction in thermometer codes
Kim et al. Indirect time-of-flight CMOS image sensor with on-chip background light cancelling and pseudo-four-tap/two-tap hybrid imaging for motion artifact suppression
CN109374139B (en) Single photon flight time detection circuit and measurement method
Kim et al. 7.2 A 48× 40 13.5 mm depth resolution flash LiDAR sensor with in-pixel zoom histogramming time-to-digital converter
CN109510955B (en) Background noise suppression pixel circuit based on time-of-flight three-dimensional image sensor
KR102003322B1 (en) Method of operating depth pixel included in three-dimensional image sensor
WO2019146457A1 (en) Time-of-flight image sensor with distance determination
CN106937063B (en) Method and system for the analog/digital conversion time for reducing dark signal
Park et al. An 80× 60 flash LiDAR sensor with in-pixel histogramming TDC based on quaternary search and time-gated Δ-intensity phase detection for 45m detectable range and background light cancellation
Gyongy et al. A direct time-of-flight image sensor with in-pixel surface detection and dynamic vision
Sesta et al. Time-to-digital converters and histogram builders in SPAD arrays for pulsed-LiDAR
CN112399104B (en) Global exposure low-noise high-speed three-dimensional sensor phase-locked pixel and reading mode
CN112437238B (en) Phase-locked pixel structure of low kTC noise three-dimensional image sensor
Stoppa et al. A 16/spl times/16-pixel range-finding CMOS image sensor
Yamada et al. A distance measurement method using a time-of-flight cmos range image sensor with 4-tap output pixels and multiple time-windows
CN112505722A (en) ToF pixel structure capable of simultaneously capturing depth and gray scale information
CN115508852A (en) ToF system

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant