CN112321168A - Processing method for forming precise optical grains on glass surface - Google Patents
Processing method for forming precise optical grains on glass surface Download PDFInfo
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- CN112321168A CN112321168A CN202011115911.0A CN202011115911A CN112321168A CN 112321168 A CN112321168 A CN 112321168A CN 202011115911 A CN202011115911 A CN 202011115911A CN 112321168 A CN112321168 A CN 112321168A
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- glass
- film
- cleaning
- mask
- pure water
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- 239000011521 glass Substances 0.000 title claims abstract description 48
- 230000003287 optical effect Effects 0.000 title claims abstract description 11
- 238000003672 processing method Methods 0.000 title claims abstract description 9
- 238000005530 etching Methods 0.000 claims abstract description 24
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 18
- 238000004140 cleaning Methods 0.000 claims description 17
- 238000005520 cutting process Methods 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 230000001681 protective effect Effects 0.000 claims description 12
- 239000000853 adhesive Substances 0.000 claims description 9
- 230000001070 adhesive effect Effects 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 238000001035 drying Methods 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 9
- 239000002994 raw material Substances 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 6
- 239000003814 drug Substances 0.000 claims description 6
- 238000005507 spraying Methods 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims description 6
- 238000005516 engineering process Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000012459 cleaning agent Substances 0.000 claims description 3
- 150000003384 small molecules Chemical class 0.000 claims description 3
- 238000007664 blowing Methods 0.000 claims description 2
- 238000007790 scraping Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 4
- 238000001459 lithography Methods 0.000 abstract description 3
- 238000007493 shaping process Methods 0.000 abstract description 3
- 238000007639 printing Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000005034 decoration Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses a processing method for forming precise optical grains on the surface of glass, which is characterized in that pattern etching is changed on the basis of exposure and development processing on the surface of the prior glass. On the basis of original figure, increase the touch and feel, decorate the demand according to different glass, design different figures, realize the figure shaping through lithography process, rethread etching process etching glass surface, the figure fineness can reach 0.015mm finest, and the graphic effect is very beautiful.
Description
Technical Field
The invention relates to the technical field of glass thinning production equipment, in particular to a processing method for forming precise optical grains on the surface of glass.
Background
At present, the decoration patterns and the functional patterns on the surface of the optical electronic glass are printed with ink or pasted with a texture film.
The pattern made by printing has a pattern fineness of more than 0.1mm and a poor edge fine sawtooth effect. The cost of making the patterns by a film pasting mode is high, and the patterns can only be made on the back of the product by the two modes without touching hand feeling.
The maximum processing size of the printing and film pasting process is 100 x 100mm, and the printing precision cannot be achieved due to the fact that the size is larger.
Disclosure of Invention
The invention aims to solve the technical problem of forming precise optical grains on the surface of glass by etching large glass, thereby improving the efficiency, reducing the cost and overcoming the defects in the technology.
The invention is realized by the following technical scheme: a processing method for forming precise optical grains on the surface of glass comprises the following specific steps:
s1, selecting raw materials, cutting the raw material glass by a cutter wheel cutting machine, and cutting the glass into more than one piece of middle glass;
s2, after cutting, cleaning the cut glass before leveling, cleaning the horizontal cleaning line by a cleaning agent, simultaneously spraying and cleaning by a brush and pure water, and drying by two air knives;
s3, drying for another time at 150 ℃ for 1 minute, removing oil stain by using UV light for another time, and cooling to 25 ℃;
s4, coating a photosensitive resist protective film in a scraping mode, wherein the film thickness is 1.5-2 mu m;
s5, after blade coating of the protective film is completed, baking in a horizontal tunnel furnace at the baking temperature of 100 ℃ for 5 min;
s6, after baking, taking out the product, and cooling the product to 25 ℃ by using a cold plate;
s7, exposing, namely covering the mask on the surface of the glass, enabling the distance between the photosensitive film and the mask surface to be 80 microns, adopting parallel light to irradiate the mask on the glass, projecting the pattern on the mask onto the glass, decomposing the photosensitive film passing through an exposure area into small molecules which can be washed away, and enabling the unexposed area to be in a macromolecular hinge state and not to be washed away;
s8, developing, namely washing the surface of the glass by using a sodium hydroxide solution with the mass concentration of 0.5% at the temperature of 30 ℃, developing the pattern, wherein the length of the developing section is 4 m, the conveying speed is 3 m/min, then spraying and cleaning by 8 paths of pure water, and drying by an air knife;
s9, after the steps are finished, turning over by using a plate turning machine;
s10, after the plate copying is finished, coating a protective adhesive on the back of the glass, wherein the protective adhesive is also suitable for photosensitive adhesives, and the film thickness is a little 2-3 μm thicker than that of the first pass;
s11, baking at 150 ℃ for 5 minutes after the steps are carried out;
s12, the insert basket passes through the automatic etching line, etching is carried out in etching liquid medicine for 2-5 minutes at the temperature of 35 ℃, the etching liquid medicine is rinsed by 1 groove of pure water, then the insert basket enters and exits the film groove, the film exiting liquid is 5% sodium hydroxide solution, the temperature is 50 ℃, the time is 2 minutes, and then the insert basket passes through 4 grooves of pure water for cleaning;
and S13, after the film is etched and removed, the film is washed by pure water through a horizontal washing line and dried by blowing, and then the texture processing technology is completed.
As a preferred technical scheme, the length and width of the selected raw material are 1520X 1460mm, the thickness is generally 0.4-0.8 mm, and a knife wheel cutting machine with the width of 1600X 1500mm is adopted.
As a preferred technical scheme, before processing begins, a graphic mask needs to be designed, the mask design generally uses auto CAD to draw, and the drawing is sent to a professional mask manufacturer for production after being drawn.
The invention has the beneficial effects that: the invention changes the pattern etching into the pattern etching on the basis of the exposure and development processing of the prior glass surface. On the basis of original figure, increase the touch and feel, decorate the demand according to different glass, design different figures, realize the figure shaping through lithography process, rethread etching process etching glass surface, the figure fineness can reach 0.015mm finest, and the graphic effect is very beautiful.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a drawing of a decorative texture of a lens of a mobile phone camera according to the present invention;
FIG. 2 is a microscope magnified view of the texture of the back cover of the handset of the invention.
Detailed Description
All of the features disclosed in this specification, or all of the steps in any method or process so disclosed, may be combined in any combination, except combinations of features and/or steps that are mutually exclusive.
Any feature disclosed in this specification (including any accompanying claims, abstract and drawings), may be replaced by alternative features serving equivalent or similar purposes, unless expressly stated otherwise. That is, unless expressly stated otherwise, each feature is only an example of a generic series of equivalent or similar features.
In the description of the present invention, it is to be understood that the terms "one end", "the other end", "outside", "upper", "inside", "horizontal", "coaxial", "central", "end", "length", "outer end", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are used only for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, should not be construed as limiting the present invention.
Further, in the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
The use of terms such as "upper," "above," "lower," "below," and the like in describing relative spatial positions herein is for the purpose of facilitating description to describe one element or feature's relationship to another element or feature as illustrated in the figures. The spatially relative positional terms may be intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "below" or "beneath" other elements or features would then be oriented "above" the other elements or features. Thus, the exemplary term "below" can encompass both an orientation of above and below. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly
In the present invention, unless otherwise explicitly specified or limited, the terms "disposed," "sleeved," "connected," "penetrating," "plugged," and the like are to be construed broadly, e.g., as a fixed connection, a detachable connection, or an integral part; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
As shown in fig. 1-2, in the processing method for forming precise optical lines on the glass surface of the present invention, before the processing starts, a graphic mask needs to be designed, the mask design generally uses auto CAD for drawing, and the drawing is sent to a professional mask manufacturer for production after being drawn, and the specific steps are as follows:
(1) selecting raw materials, cutting the raw material glass by a cutter wheel cutting machine, and cutting the glass into more than one piece of middle glass; (2) after cutting, cleaning the cut glass before leveling, cleaning the horizontal cleaning line by a cleaning agent, simultaneously spraying and cleaning by a brush and pure water, and drying by two air knives; (3) drying at 150 ℃ for 1 minute again, removing oil stains by using UV (ultraviolet) again, and cooling to 25 ℃; (4) coating a photosensitive resist protective film with a film thickness of 1.5-2 μm; (5) after finishing blade coating of the protective film, baking in a horizontal tunnel furnace at the baking temperature of 100 ℃ for 5 min; (6) after baking is finished, taking out the product, cooling the product by using a cold plate, and reducing the temperature to 25 ℃; (7) exposing, namely covering the mask on the surface of the glass, enabling the photosensitive film to be 80 microns away from the surface of the mask, adopting parallel light to irradiate the mask, projecting the pattern on the mask onto the glass, decomposing the photosensitive film passing through an exposure area into small molecules which can be washed away, and enabling the unexposed area to be in a macromolecular hinge state and not to be washed away; (8) developing, namely washing the surface of the glass by using a sodium hydroxide solution with the mass concentration of 0.5% at the temperature of 30 ℃, developing the pattern, wherein the length of the developing section is 4 m, the conveying speed is 3 m/min, then spraying and cleaning by 8 paths of pure water, and drying by an air knife; (9) after the steps are finished, the plate turning machine is used for turning; (10) after the plate copying is finished, coating a protective adhesive on the back of the glass, wherein the protective adhesive is also suitable for photosensitive adhesives, and the film thickness is a bit 2-3 mu m thicker than that of the first pass; (11) baking at 150 ℃ for 5 minutes; (12) the basket passes through the automatic etching line, etching is carried out for 2-5 minutes in etching liquid medicine, the temperature of the liquid medicine is 35 ℃, the basket is rinsed by 1 groove of pure water after etching is finished, then the basket enters and exits the film groove, the film exiting liquid is 5% sodium hydroxide solution, the temperature is 50 ℃, the time is 2 minutes, and then the basket is cleaned by 4 grooves of pure water; (13) and after the film is etched and removed, the film is washed by a horizontal washing line and pure water, and the texture processing technology is completed after the film is dried.
In the embodiment, the selected raw material has the length and width dimension of 1520 × 1460mm and the thickness of 0.4-0.8 mm, and a knife wheel cutting machine with the width of 1600 × 1500mm is adopted.
The invention has the beneficial effects that: the invention changes the pattern etching into the pattern etching on the basis of the exposure and development processing of the prior glass surface. On the basis of original figure, increase the touch and feel, decorate the demand according to different glass, design different figures, realize the figure shaping through lithography process, rethread etching process etching glass surface, the figure fineness can reach 0.015mm finest, and the graphic effect is very beautiful.
The above description is only an embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that are not thought of through the inventive work should be included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope defined by the claims.
Claims (3)
1. A processing method for forming precise optical grains on the surface of glass is characterized by comprising the following specific steps:
s1, selecting raw materials, cutting the raw material glass by a cutter wheel cutting machine, and cutting the glass into more than one piece of middle glass;
s2, after cutting, cleaning the cut glass before leveling, cleaning the horizontal cleaning line by a cleaning agent, simultaneously spraying and cleaning by a brush and pure water, and drying by two air knives;
s3, drying for another time at 150 ℃ for 1 minute, removing oil stain by using UV light for another time, and cooling to 25 ℃;
s4, coating a photosensitive resist protective film in a scraping mode, wherein the film thickness is 1.5-2 mu m;
s5, after blade coating of the protective film is completed, baking in a horizontal tunnel furnace at the baking temperature of 100 ℃ for 5 min;
s6, after baking, taking out the product, and cooling the product to 25 ℃ by using a cold plate;
s7, exposing, namely covering the mask on the surface of the glass, enabling the distance between the photosensitive film and the mask surface to be 80 microns, adopting parallel light to irradiate the mask on the glass, projecting the pattern on the mask onto the glass, decomposing the photosensitive film passing through an exposure area into small molecules which can be washed away, and enabling the unexposed area to be in a macromolecular hinge state and not to be washed away;
s8, developing, namely washing the surface of the glass by using a sodium hydroxide solution with the mass concentration of 0.5% at the temperature of 30 ℃, developing the pattern, wherein the length of the developing section is 4 m, the conveying speed is 3 m/min, then spraying and cleaning by 8 paths of pure water, and drying by an air knife;
s9, after the steps are finished, turning over by using a plate turning machine;
s10, after the plate copying is finished, coating a protective adhesive on the back of the glass, wherein the protective adhesive is also suitable for photosensitive adhesives, and the film thickness is a little 2-3 μm thicker than that of the first pass;
s11, baking at 150 ℃ for 5 minutes after the steps are carried out;
s12, the insert basket passes through the automatic etching line, etching is carried out in etching liquid medicine for 2-5 minutes at the temperature of 35 ℃, the etching liquid medicine is rinsed by 1 groove of pure water, then the insert basket enters and exits the film groove, the film exiting liquid is 5% sodium hydroxide solution, the temperature is 50 ℃, the time is 2 minutes, and then the insert basket passes through 4 grooves of pure water for cleaning;
and S13, after the film is etched and removed, the film is washed by pure water through a horizontal washing line and dried by blowing, and then the texture processing technology is completed.
2. The processing method of forming a precision optical texture on a glass surface according to claim 1, wherein: the selected raw material has the length and width dimension of 1520 x 1460mm and the thickness of 0.4-0.8 mm, and a knife wheel cutting machine with the width of 1600 x 1500mm is adopted.
3. The processing method of forming a precision optical texture on a glass surface according to claim 1, wherein: before the processing is started, a graphic mask needs to be designed, the mask design generally uses auto CAD to draw, and the drawing is sent to a professional mask manufacturer for production after being drawn.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011115911.0A CN112321168A (en) | 2020-10-19 | 2020-10-19 | Processing method for forming precise optical grains on glass surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011115911.0A CN112321168A (en) | 2020-10-19 | 2020-10-19 | Processing method for forming precise optical grains on glass surface |
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| Publication Number | Publication Date |
|---|---|
| CN112321168A true CN112321168A (en) | 2021-02-05 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011115911.0A Pending CN112321168A (en) | 2020-10-19 | 2020-10-19 | Processing method for forming precise optical grains on glass surface |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113955946A (en) * | 2021-10-20 | 2022-01-21 | 滁州明永光电科技有限公司 | Novel texture effect manufacturing method |
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|---|---|---|---|---|
| CN103130417A (en) * | 2011-11-29 | 2013-06-05 | 昆山汉白精密设备有限公司 | Manufacture technology of glass panel of electronic product |
| CN105665925A (en) * | 2016-03-25 | 2016-06-15 | 南京京晶光电科技有限公司 | Method for conducting CD pattern corrosion machining and laser cutting on surface of base material to form LOGO |
| WO2017097204A1 (en) * | 2015-12-08 | 2017-06-15 | 金英花 | Metal mesh single-film dual sided capacitive screen sensor and manufacturing method thereof |
| CN107450282A (en) * | 2017-09-14 | 2017-12-08 | 深圳市锦瑞新材料股份有限公司 | A kind of hyperfine nanometer line glass mold preparation method |
| CN110989292A (en) * | 2019-12-10 | 2020-04-10 | 东莞市友辉光电科技有限公司 | Method for preparing fine texture on substrate |
-
2020
- 2020-10-19 CN CN202011115911.0A patent/CN112321168A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103130417A (en) * | 2011-11-29 | 2013-06-05 | 昆山汉白精密设备有限公司 | Manufacture technology of glass panel of electronic product |
| WO2017097204A1 (en) * | 2015-12-08 | 2017-06-15 | 金英花 | Metal mesh single-film dual sided capacitive screen sensor and manufacturing method thereof |
| CN105665925A (en) * | 2016-03-25 | 2016-06-15 | 南京京晶光电科技有限公司 | Method for conducting CD pattern corrosion machining and laser cutting on surface of base material to form LOGO |
| CN107450282A (en) * | 2017-09-14 | 2017-12-08 | 深圳市锦瑞新材料股份有限公司 | A kind of hyperfine nanometer line glass mold preparation method |
| CN110989292A (en) * | 2019-12-10 | 2020-04-10 | 东莞市友辉光电科技有限公司 | Method for preparing fine texture on substrate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113955946A (en) * | 2021-10-20 | 2022-01-21 | 滁州明永光电科技有限公司 | Novel texture effect manufacturing method |
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Application publication date: 20210205 |
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