CN112309822A - Ion probe mass spectrometer and imaging method thereof - Google Patents
Ion probe mass spectrometer and imaging method thereof Download PDFInfo
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Abstract
The embodiment of the specification provides an ion probe mass spectrometer and an imaging method thereof. Specifically, the ion probe mass spectrometer includes: a compression deflection plate configured to compress a secondary ion beam generated by scanning and bombarding a sample with a primary ion beam in time series by applying a first voltage; a mass spectrometer configured to analyze the compressed secondary ion beam; a decompression deflection plate configured to decompress secondary ion beams passing through the mass spectrometer in time series by applying a second voltage; wherein the first voltage and the second voltage have the same frequency; and an imaging component configured to acquire a secondary ion beam image decompressed by the decompression deflection plate. Through the technical scheme, on the basis of an ion microscope mode, the improvement of the mass resolution is realized through the compression and decompression of the secondary ion beam, meanwhile, the point-to-point microscopic function can be met, and the imaging efficiency is high.
Description
Technical Field
One or more embodiments of the present disclosure relate to the field of detection technologies, and in particular, to an ion probe mass spectrometer and an imaging method thereof.
Background
Secondary Ion Mass Spectrometry (SIMS) or Ion probe (Ion probe) is an advanced method for in situ analysis of micro-zones. The accelerated primary ion beam is focused and then bombarded on the surface of a sample to be detected, the surface components of the sample are sputtered, and partial atoms, molecules and atomic groups are ionized, namely secondary ions, enter a mass spectrometer for analysis after being accelerated at high pressure on the surface of the sample, and the element and isotope information of the sample in the micro-area range is obtained.
The method is characterized in that a large (5-30 mu m) primary ion beam is used as an excitation source, a group of ion optical lenses are used for directly imaging secondary ions generated on the surface of a sample through a point-to-point microscopic function, and the imaging mode is called as an ion microscope mode. The ion microscope mode is adopted, the intensity of primary ion beams can be guaranteed, and the method has the advantages of strong signals and high imaging efficiency. However, the secondary ion beam generated by the larger primary ion beam scan still has a larger diameter at the ion convergence position, which causes a decrease in mass resolution, and cannot effectively resolve ions with different mass/charge ratios, and particularly for some special samples and special elements, signal mixing easily occurs, and accurate sample distribution cannot be given.
Disclosure of Invention
In view of this, one or more embodiments of the present disclosure are directed to an ion probe mass spectrometer and an imaging method thereof, so as to solve the technical problem in the prior art that ions with different mass/charge ratios cannot be effectively resolved due to low mass resolution in an ion microscope mode.
In view of the above, in a first aspect of the present specification, there is provided an ion probe mass spectrometer, specifically comprising:
a compression deflection plate configured to compress a secondary ion beam generated by scanning and bombarding a sample with a primary ion beam in time series by applying a first voltage;
a mass spectrometer configured to analyze the compressed secondary ion beam;
a decompression deflection plate configured to decompress secondary ion beams passing through the mass spectrometer in time series by applying a second voltage; wherein the first voltage and the second voltage have the same frequency; and
an imaging component configured to acquire a secondary ion beam image decompressed by the decompression deflection plate.
Further, the compression deflection plate is arranged at the position where the secondary ions in the secondary ion beam light path are converged.
Further, still include:
a converging lens disposed between the mass spectrometer and the decompression deflection plate configured to converge the secondary ion beam passing through the mass spectrometer to the decompression deflection plate.
Further, still include:
a scanning deflection plate configured to apply a third voltage to the primary ion beam to cause the primary ion beam to scan the sample.
In a second aspect of the present description, there is also provided a method of imaging an ion probe mass spectrometer, characterized in that the ion probe mass spectrometer comprises a compression deflection plate, a mass spectrometer, a decompression deflection plate and an imaging assembly;
the imaging method specifically comprises the following steps:
applying a first voltage to a secondary ion beam generated by scanning and bombarding a sample by a primary ion beam through a compression deflection plate according to a time sequence;
analyzing the secondary ion beam passing through the compression deflection plate by a mass spectrometer;
applying a second voltage in time series to the secondary ion beam passing through the mass spectrometer by decompressing the deflection plate; wherein the first voltage and the second voltage have the same frequency
Acquiring, by an imaging assembly, a secondary ion beam image decompressed by the decompression deflection plate.
Further, the ion probe mass spectrometer further comprises a converging lens;
the imaging method further comprises:
converging the secondary ion beam passing through the mass spectrometer to the decompression deflection plate through the converging lens.
Further, the ion probe mass spectrometer further comprises a scanning deflection plate;
before the step of applying the first voltage to the secondary ion beam generated by scanning and bombarding the primary ion beam on the sample by compressing the deflection plate in time sequence, the imaging method further comprises the following steps:
applying a third voltage to the primary ion beam through the scanning deflection plate to cause the primary ion beam to scan the sample.
Further, the frequencies of the first voltage, the second voltage, and the third voltage are the same.
Further, the step of applying a second voltage in time series to the secondary ion beam passing through the mass spectrometer by decompressing the deflection plate comprises:
determining a delay phase of the second voltage relative to the first voltage based on a time of flight of the secondary ion beam through the compressed deflection plate in the mass spectrometer.
Further, the step of applying a second voltage in time series to the secondary ion beam passing through the mass spectrometer by decompressing the deflection plate comprises:
and determining the amplitude of the second voltage according to the magnification factor of a preset secondary ion beam image.
As can be seen from the foregoing, in the ion probe mass spectrometer and the imaging method thereof provided in one or more embodiments of the present disclosure, the ion probe mass spectrometer includes a compression deflection plate and a decompression deflection plate, and a secondary ion beam generated by scanning and bombarding a sample with a primary ion beam is compressed in time sequence by applying a first voltage to the compression deflection plate, so that the mass spectrometer can analyze the compressed secondary ion beam with a smaller diameter, thereby improving mass resolution and effectively resolving ions with different mass/charge ratios; decompressing the secondary ion beam passing through the mass spectrometer by applying a second voltage in time sequence at a decompressed deflection plate and the first voltage and the second voltage have the same frequency, thereby decompressing the compressed secondary ion beam with a smaller diameter to restore the position attribute thereof, and finally the imaging component can obtain the image of the secondary ion beam decompressed by the decompressed deflection plate. According to the technical scheme, on the basis of an ion microscope mode, the quality resolution ratio is improved by compressing and decompressing the secondary ion beam, meanwhile, the point-to-point microscopic function can be met, and the imaging efficiency is high.
Drawings
In order to more clearly illustrate one or more embodiments or prior art solutions of the present specification, the drawings that are needed in the description of the embodiments or prior art will be briefly described below, and it is obvious that the drawings in the following description are only one or more embodiments of the present specification, and that other drawings may be obtained by those skilled in the art without inventive effort from these drawings.
FIG. 1 is a schematic illustration of a mass spectrometer resolution reduction provided by one or more embodiments of the present disclosure;
FIG. 2 is a schematic diagram of a partial structure of an ion probe mass spectrometer provided in one or more embodiments of the present disclosure;
fig. 3 is a schematic view of a sequence in which a primary ion beam is scanned over a sample, as provided by one or more embodiments of the present disclosure;
FIG. 4 is a waveform diagram of a scan voltage provided in one or more embodiments of the present disclosure
Fig. 5 is a schematic flow diagram of an imaging method provided in one or more embodiments of the present disclosure.
Detailed Description
For the purpose of promoting a better understanding of the objects, aspects and advantages of the present disclosure, reference is made to the following detailed description taken in conjunction with the accompanying drawings.
It is to be noted that unless otherwise defined, technical or scientific terms used in one or more embodiments of the present specification should have the ordinary meaning as understood by those of ordinary skill in the art to which this disclosure belongs. The use of "first," "second," and similar terms in one or more embodiments of the specification is not intended to indicate any order, quantity, or importance, but rather is used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.
For a mass spectrometer, the clearer and narrower the secondary ions are imaged at the point of convergence, the higher the mass resolution, with other parameters being the same. In the ion microscope mode, although a primary ion beam with a large size (5-30 μm) is used as an excitation source, the surface of the sample is usually more than 30 μm; at this time, the primary ion beam is used to scan the sample at a high speed, and when the scanning speed is fast enough, the primary ion beam can cover a larger area at the same time. For example, if a time point in the high-speed scan is taken, for example, the primary ion beam is located at the upper left corner of the sample at a time point, then the secondary ion beam is also emitted from the position at the same time, and the primary ion beam can cover the whole sample surface and generate the secondary ion beam correspondingly through the whole high-speed scan period. Therefore, the secondary ion beam generated by scanning and bombarding the sample has position information, and can be directly used for imaging after mass screening of the mass spectrometer, so that mass spectrometry and secondary ion imaging of the sample can be rapidly completed.
As will be appreciated by those skilled in the art, in this manner, the surface area of the sample determines that the secondary ion beam must have a larger diameter, such that the secondary ion beam still has a larger diameter at the point where the ions converge, and the larger the surface area of the sample the larger the diameter at the point where the ions converge. As shown in fig. 1, the increase of the diameter of the secondary ion beam increases the spherical aberration of the ion optical system, which results in a blurred interface at the ion beam convergence, the image formed at the ion beam convergence is shown as 21 in fig. 1, and the mark 31 in fig. 1 has a larger diameter, which results in a blurred boundary at the convergence, thereby causing a decrease in mass resolution of the mass spectrometer, resulting in a decrease in mass resolution, and failing to effectively resolve ions with different mass/charge ratios.
Thus, in a first aspect of the present specification, there is provided an ion probe mass spectrometer. Specifically, as shown in fig. 2, the ion probe mass spectrometer includes:
a compression deflection plate 6 configured to compress the secondary ion beam 4 generated by scanning and bombarding the sample 5 with the primary ion beam in time series by applying a first voltage;
a mass spectrometer configured to analyze the compressed secondary ion beam;
a decompression deflection plate 13 configured to decompress the secondary ion beam passing through the mass spectrometer in time series by applying a second voltage; wherein the first voltage and the second voltage have the same frequency; and
an imaging component configured to acquire a secondary ion beam image decompressed by the decompression deflection plate.
Here, it should be understood that since the primary ion beam scans different positions of the sample surface based on time series; accordingly, the secondary ion beams emitted from different positions include timing information. Thus, the first voltage is varied according to a timing so that the secondary ion beams emitted from different positions are all returned to the center of the optical axis. Thus, the secondary ion beam in the mass spectrometer is compressed, which maintains a high mass resolution regardless of the area to be imaged. Meanwhile, the second voltage changes according to the time sequence, and the secondary ion beam passing through the mass spectrometer is restored to the position where the secondary ion beam is located, so that the distribution image of the elements and the isotopes on the sample is obtained.
Here, the spatial resolution of the secondary ion beam image is independent of the diameter of the primary ion beam, and is only dependent on the optical path setting of the ion probe mass spectrometer. Illustratively, the image of the secondary ion beam may achieve a spatial resolution of 1 micron. In addition, the mass resolution of the secondary ion beam is not affected by the image size, that is, the mass spectrometer can be guaranteed to perform accurate mass analysis on the secondary ion beam even if the sample surface is large.
It should be noted that, when the second voltage is not applied, the image of the secondary ion beam is similar to the image of the primary ion beam when viewed by the back-end equipment of the ion probe mass spectrometer (for example, the imaging component), and only an image matching the size of the primary ion beam can be obtained, and neither the timing information nor the position information included in the secondary ion beam can be represented in the image.
From the above, the ion probe mass spectrometer provided by the specification comprises a compression deflection plate and a decompression deflection plate, wherein a first voltage is applied to the compression deflection plate to compress a secondary ion beam generated by scanning and bombarding a sample by a primary ion beam according to a time sequence, so that the mass spectrometer can analyze the compressed secondary ion beam with a smaller diameter, thereby improving the mass resolution and effectively distinguishing ions with different mass/charge ratios; decompressing the secondary ion beam passing through the mass spectrometer by applying a second voltage in time sequence to a decompression deflection plate and the first voltage and the second voltage have the same frequency, thereby decompressing the compressed secondary ion beam with smaller diameter in time sequence to restore the position attribute, and finally the imaging component can obtain the secondary ion beam image decompressed by the decompression deflection plate. According to the technical scheme, on the basis of an ion microscope mode, the quality resolution ratio is improved by compressing and decompressing the secondary ion beam, meanwhile, the point-to-point microscopic function can be met, and the imaging efficiency is high.
It should be appreciated that the primary ion beam (as indicated by reference numeral 1 in fig. 2) in one or more embodiments of the present description is formed by a primary ion emission system. The primary ion emission system is prior art and will not be described in detail herein.
It should be noted that, those skilled in the art can reasonably set the specific structures of the compression deflection plate 6 and the decompression deflection plate 13 according to the range and the direction of the secondary ion beam 4, and the specific structure is not limited herein.
Illustratively, the compression deflection plate 6 and the decompression deflection plate 13 each comprise two pairs of voltage plates, which are perpendicular to each other. Through setting up two pairs of perpendicular electric plate each other, can effectively carry out the compression of two directions of mutually perpendicular to secondary ion beam to reduce the diameter of secondary ion beam. Such an arrangement has the advantages of simple structure and easy implementation.
Alternatively, the magnitude of the first voltage may be determined by: by observing the image acquired by the imaging assembly without activating the decompressed voltage (i.e. without applying the second voltage to the decompressed deflection plates 13), the amplitude of the first voltage is adjusted until the size of the acquired image is minimal.
In one or more embodiments of the present disclosure, the compression deflector 6 is disposed in the secondary ion beam path at the secondary ion convergence.
In the optical path of the secondary ion beam 4, the secondary ions are collected many times. By arranging the compression deflection plates 6 at the convergence, a better deflection effect can be obtained with a smaller voltage. One of these can be chosen as a reasonable choice for the location of the compression deflector 6 for the plurality of convergence points, without being limited in any way here.
In one or more embodiments of the present description, the mass spectrometer is selected from a dual focusing magnetic mass spectrometer.
Further, as shown in fig. 2, the mass spectrometer includes an electrostatic analyzer 9 and a magnetic sector 10. The main optical axis 7 of the optical path of the secondary ion beam 4 enters the electrostatic analyzer 9 through the entrance slit 8 for energy focusing, and the ion beam is converged at different positions according to the difference of the charged energy. The ion beam is mass-screened by the fan-shaped magnetic field 10 and the secondary ion beam is emitted through the exit slit 11.
It should be noted that the secondary ion beam passing through the compression deflection plate 6 is compressed to a smaller range and converged on the main optical axis 7, so as to better enter the mass spectrometer for analysis, and ensure that the mass spectrometer can perform high-quality-resolution analysis on the secondary ion beam.
Note that, although the secondary ion beam passing through the mass spectrometer is subjected to mass screening, the secondary ion beam is still a mixed ion beam.
Further, by applying a second voltage having an opposite direction to the first voltage to the decompression deflection plate 13, the position information of the mixed ion beam can be restored, and the imaging assembly can be effectively ensured to acquire the image of the secondary ion beam.
In one or more embodiments of the present description, referring to FIG. 2, the imaging assembly includes an imaging lens 14 and an image receptor 15. By the cooperation of the imaging lens 14 and the image receptor 15, an image of the secondary ion beam passing through the decompression deflection plate 13 can be obtained, thereby realizing efficient image analysis.
According to the embodiment, the technical scheme of the specification firstly utilizes the compression deflection plate to compress the secondary ion beam in a smaller range, so that the mass resolution under the ion microscope mode is effectively improved; and the secondary ion beam is subjected to quality screening, and then the position information of the secondary ions is restored through decompressing a deflection plate, so that high-efficiency image analysis is realized. The solution of the present description preserves the advantages of ion microscopy mode imaging while overcoming its disadvantage of losing mass resolution due to too large a primary ion beam size.
Further, the exit slit 11 of the mass spectrometer is itself the ion beam convergence point, and the following ion beam diverges.
Thus, referring to fig. 2, in one or more embodiments of the present description, the ion probe mass spectrometer further comprises: a converging lens 12 disposed between the mass spectrometer and the decompression deflection plate 13, configured to converge the secondary ion beam passing through the mass spectrometer to the decompression deflection plate 13.
By the technical scheme, a better decompression effect can be obtained by using smaller voltage, and the imaging component is favorably ensured to obtain high-quality secondary ion imaging.
Optionally, the ion probe mass spectrometer further comprises a faraday cup, a secondary electron multiplier tube, and the like. It should be understood that the arrangement of the faraday cup, secondary electron multiplier tube, etc. is well within the art and will not be described in detail herein.
To facilitate a comprehensive analysis of the sample surface at one time, the ion probe mass spectrometer further comprises: scanning the deflection plate 2 (see fig. 2).
Further, the scanning deflection plate is configured to apply a third voltage to the primary ion beam to cause the primary ion beam to scan the sample.
By the technical scheme, the primary ion beam can scan the surface of the sample 5, so that the comprehensive analysis of the surface of the sample 5 is realized.
Referring to fig. 2, the primary ion beam is labeled 1 before entering the scan deflection plate 2 and 3 after passing through the scan deflection plate 2. It will be appreciated by those skilled in the art that the position of the primary ion beam, designated 3, on the surface of the sample 5 can be adjusted by applying different voltages to the scanning deflection plate 2, thereby achieving a scan of the surface of the sample 5.
For example, referring to fig. 3, the primary ion beam is denoted by 1, the scanning paths of the primary ion beam in two XY directions on the sample 5 are shown by lines in fig. 3, and arrows in the lines indicate the moving directions of the primary ion beam.
Alternatively, as shown in FIG. 4, the third voltage applied to the scanning deflection plate 2 is of a sawtooth waveform. The marked O line is the reference voltage, so the third voltage is scanned from the negative to the positive.
As can be seen in fig. 3 and 4, the transverse (X) scanning frequency is high, the longitudinal (Y) scanning frequency is low, and the transverse scanning frequency should be an integer multiple of the longitudinal scanning frequency.
Alternatively, in order to obtain a more uniform scanning effect, the horizontal scanning frequency should be more than 100 times the vertical frequency, and the vertical scanning frequency determines the refresh rate of the frame, so the vertical scanning frequency is more than 10Hz to obtain a more continuous frame.
Alternatively, the voltage amplitude for the XY direction scan is the same.
It should be noted that the first voltage can correspond to a scanning range of the primary ion beam, so as to ensure that all the secondary ion beams can be effectively compressed. It should be noted that the third voltage is opposite to the first voltage in direction and has the same frequency, in this way, the secondary ions excited by the primary ion beam at a position on the sample surface far from the optical axis can return to the position on the optical axis by the deflection of the first voltage, thereby realizing "compression".
Illustratively, the diameter of the compressed secondary ion beam is the same as the diameter of the primary ion beam, and is usually in the range of 20-30 μm. On these 20-30 μm scales, the ion beam still retains its positional information.
In a second aspect of the present description, there is also provided a method of imaging an ion probe mass spectrometer. In particular, the imaging method is applicable to ion probe mass spectrometers that include a compression deflection plate, a mass spectrometer, a decompression deflection plate, and an imaging assembly.
As shown in fig. 5, the imaging method specifically includes:
step S501: a first voltage is applied in time sequence to a secondary ion beam generated by scanning and bombarding the sample by a primary ion beam through a compression deflection plate. Here, the first voltage can compress the secondary ion beam, reduce the diameter of the secondary ion beam, and avoid a fuzzy boundary of the secondary ion beam imaging, so as to improve mass resolution of the mass spectrometer.
Step S502: the secondary ion beam passing through the compression deflection plate is analyzed by a mass spectrometer.
Step S503: applying a second voltage in time series to the secondary ion beam passing through the mass spectrometer by decompressing the deflection plate; wherein the first voltage and the second voltage have the same frequency.
Through the steps, the second reverse voltage is applied to the secondary ion beam subjected to mass screening of the mass spectrometer, so that the reduction of the position information carried by the compressed secondary ion beam is realized, and the subsequent imaging component can directly obtain the image of the secondary ion beam conveniently.
Step S504: acquiring, by an imaging assembly, a secondary ion beam image decompressed by the decompression deflection plate.
Therefore, by the imaging method of the embodiment, the secondary ion beam is compressed in a smaller range by using the first voltage, so that the mass resolution in the ion microscope mode is effectively improved; and after the secondary ion beam is subjected to mass screening, the position information of the secondary ion is restored through the reverse second voltage with the same frequency, and high-efficiency image analysis is realized. The solution of the present description preserves the advantages of ion microscopy mode imaging while overcoming its disadvantage of losing mass resolution due to too large a primary ion beam size.
In one or more embodiments of the present description, the ion probe mass spectrometer further comprises a focusing lens; the imaging method further comprises:
converging the secondary ion beam passing through the mass spectrometer to the decompression deflection plate through the converging lens.
By the technical scheme, a better decompression effect can be obtained by using a smaller voltage, and the imaging component is favorably ensured to obtain high-quality secondary ion imaging.
In one or more embodiments of the present description, the ion probe mass spectrometer further comprises a scanning deflection plate; before the step of applying the first voltage to the secondary ion beam generated by scanning and bombarding the primary ion beam on the sample by compressing the deflection plate in time sequence, the imaging method further comprises the following steps:
applying a third voltage to the primary ion beam through the scanning deflection plate to cause the primary ion beam to scan the sample.
According to the technical scheme, the primary ion beam can scan the surface of the sample 5, so that the comprehensive analysis of the surface of the sample 5 is realized.
In one or more embodiments of the present description, the frequencies of the first voltage, the second voltage, and the third voltage are the same.
It should be noted that the first voltage, the second voltage, and the third voltage are set to have the same frequency, which is beneficial to ensure that the secondary ion beam is compressed and decompressed in a targeted manner.
Illustratively, the frequencies in the X and Y directions of the sawtooth waves of the first voltage applied to the compression deflection plate 6 and the second voltage applied to the decompression deflection plate 13 coincide with the frequencies in the X and Y directions loaded on the scanning deflection plate 2 of the primary ion beam, respectively, so as to achieve an accurate compression and decompression time sequence.
At higher secondary ion beam velocities, the time required for ions to fly from the compression deflector plate 6 to the decompression deflector plate 13 is very short, typically in the order of nanoseconds, and is negligible, at which time the first, second and third voltages are scanned synchronously.
If the ion beam energy is low, or the mass spectrometer is large and the ion flight time is long, time-of-flight compensation is required. Thus, in one or more embodiments of the present disclosure, the step of applying a second voltage to the secondary ion beam passing through the mass spectrometer in a time sequence by decompressing the deflection plate comprises:
determining a delay phase of the second voltage relative to the first voltage based on a time of flight of the secondary ion beam through the compressed deflection plate in the mass spectrometer.
By the method, the compressed secondary ion beam can be decompressed in a targeted manner, and the position information of the secondary ion beam is effectively restored.
It should be noted that, as for the flight time of the secondary ion beam in the mass spectrometer, the skilled person can determine the flight time as required, including but not limited to the energy of the primary ion beam, the size of the mass spectrometer, etc. This embodiment is not particularly limited thereto.
Illustratively, the time of flight is t and the scanning frequency in the X direction is FxThe scanning frequency in the Y direction being FyThen the phases to be retarded in the XY directions are 2 π tF, respectivelyxAnd 2 π tFy。
In ion microscope mode, the magnification of secondary ion beam imaging is typically determined by the ion probe mass spectrometer setup. In one or more embodiments of the present disclosure, the step of applying a second voltage to the secondary ion beam passing through the mass spectrometer in a time sequence by decompressing the deflection plate comprises:
and determining the amplitude of the second voltage according to the magnification factor of a preset secondary ion beam image.
According to the technical scheme, the offset of the secondary ion beam can be adjusted by controlling the second voltage, so that the requirement of magnification is met and a clear ion image is generated.
The foregoing description has been directed to specific embodiments of this disclosure. Other embodiments are within the scope of the following claims. In some cases, the actions or steps recited in the claims may be performed in a different order than in the embodiments and still achieve desirable results. In addition, the processes depicted in the accompanying figures do not necessarily require the particular order shown, or sequential order, to achieve desirable results. In some embodiments, multitasking and parallel processing may also be possible or may be advantageous.
Those of ordinary skill in the art will understand that: the discussion of any embodiment above is meant to be exemplary only, and is not intended to intimate that the scope of the disclosure, including the claims, is limited to these examples; within the spirit of the present disclosure, features from the above embodiments or from different embodiments may also be combined, steps may be implemented in any order, and there are many other variations of different aspects of one or more embodiments of the present description as described above, which are not provided in detail for the sake of brevity.
While the present disclosure has been described in conjunction with specific embodiments thereof, many alternatives, modifications, and variations of these embodiments will be apparent to those of ordinary skill in the art in light of the foregoing description. For example, other memory architectures (e.g., dynamic ram (dram)) may use the discussed embodiments.
It is intended that the one or more embodiments of the present specification embrace all such alternatives, modifications and variations as fall within the broad scope of the appended claims. Therefore, any omissions, modifications, substitutions, improvements, and the like that may be made without departing from the spirit and principles of one or more embodiments of the present disclosure are intended to be included within the scope of the present disclosure.
Claims (10)
1. An ion probe mass spectrometer, comprising:
a compression deflection plate configured to compress a secondary ion beam generated by scanning and bombarding a sample with a primary ion beam in time series by applying a first voltage;
a mass spectrometer configured to analyze the compressed secondary ion beam;
a decompression deflection plate configured to decompress secondary ion beams passing through the mass spectrometer in time series by applying a second voltage; wherein the first voltage and the second voltage have the same frequency; and
an imaging component configured to acquire a secondary ion beam image decompressed by the decompression deflection plate.
2. The ion probe mass spectrometer of claim 1, wherein the compression deflection plate is disposed at a secondary ion convergence in the secondary ion beam path.
3. The ion probe mass spectrometer of claim 1, further comprising:
a converging lens disposed between the mass spectrometer and the decompression deflection plate configured to converge the secondary ion beam passing through the mass spectrometer to the decompression deflection plate.
4. The ion probe mass spectrometer of claim 1, further comprising:
a scanning deflection plate configured to apply a third voltage to the primary ion beam to cause the primary ion beam to scan the sample.
5. A method of imaging an ion probe mass spectrometer, the ion probe mass spectrometer comprising a compression deflection plate, a mass spectrometer, a decompression deflection plate and an imaging assembly;
the imaging method specifically comprises the following steps:
applying a first voltage to a secondary ion beam generated by scanning and bombarding a sample by a primary ion beam through a compression deflection plate according to a time sequence;
analyzing the secondary ion beam passing through the compression deflection plate by a mass spectrometer;
applying a second voltage in time series to the secondary ion beam passing through the mass spectrometer by decompressing the deflection plate; wherein the first voltage and the second voltage have the same frequency;
acquiring, by an imaging assembly, a secondary ion beam image decompressed by the decompression deflection plate.
6. The imaging method of claim 5, wherein the ion probe mass spectrometer further comprises a converging lens;
the imaging method further comprises:
converging the secondary ion beam passing through the mass spectrometer to the decompression deflection plate through the converging lens.
7. The imaging method of claim 5, wherein the ion probe mass spectrometer further comprises a scanning deflection plate;
before the step of applying the first voltage to the secondary ion beam generated by scanning and bombarding the primary ion beam on the sample by compressing the deflection plate in time sequence, the imaging method further comprises the following steps:
applying a third voltage to the primary ion beam through the scanning deflection plate to cause the primary ion beam to scan the sample.
8. The imaging method of claim 7, wherein the first voltage, the second voltage, and the third voltage are at the same frequency.
9. The imaging method of claim 5, wherein the step of applying a second voltage in a time sequence to the secondary ion beam passing through the mass spectrometer by decompressing the deflection plate comprises:
determining a delay phase of the second voltage relative to the first voltage based on a time of flight of the secondary ion beam through the compressed deflection plate in the mass spectrometer.
10. The imaging method of claim 5, wherein the step of applying a second voltage in a time sequence to the secondary ion beam passing through the mass spectrometer by decompressing the deflection plate comprises:
and determining the amplitude of the second voltage according to the magnification factor of a preset secondary ion beam image.
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| CN202011052319.0A CN112309822B (en) | 2020-09-29 | 2020-09-29 | Ion probe mass spectrometer and imaging method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101467033A (en) * | 2006-06-13 | 2009-06-24 | 国立大学法人京都大学 | Secondary ion mass spectrometry method and imaging method |
| CN101894727A (en) * | 2010-07-09 | 2010-11-24 | 复旦大学 | Primary ion source of secondary ion mass spectrometry |
| CN102157328A (en) * | 2011-03-21 | 2011-08-17 | 复旦大学 | SIMS (Secondary Ion Mass Spectrum) primary ion source with ion selection and storage functions |
| CN103875057A (en) * | 2011-10-13 | 2014-06-18 | 佳能株式会社 | Mass spectrometer |
| CN105869980A (en) * | 2015-02-05 | 2016-08-17 | 布鲁克道尔顿有限公司 | High duty cycle trapping ion mobility spectrometer |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101467033A (en) * | 2006-06-13 | 2009-06-24 | 国立大学法人京都大学 | Secondary ion mass spectrometry method and imaging method |
| CN101894727A (en) * | 2010-07-09 | 2010-11-24 | 复旦大学 | Primary ion source of secondary ion mass spectrometry |
| CN102157328A (en) * | 2011-03-21 | 2011-08-17 | 复旦大学 | SIMS (Secondary Ion Mass Spectrum) primary ion source with ion selection and storage functions |
| CN103875057A (en) * | 2011-10-13 | 2014-06-18 | 佳能株式会社 | Mass spectrometer |
| CN105869980A (en) * | 2015-02-05 | 2016-08-17 | 布鲁克道尔顿有限公司 | High duty cycle trapping ion mobility spectrometer |
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