CN112296010A - Equipment for removing organic deposits on surface of semiconductor ceramic component - Google Patents
Equipment for removing organic deposits on surface of semiconductor ceramic component Download PDFInfo
- Publication number
- CN112296010A CN112296010A CN202011072240.4A CN202011072240A CN112296010A CN 112296010 A CN112296010 A CN 112296010A CN 202011072240 A CN202011072240 A CN 202011072240A CN 112296010 A CN112296010 A CN 112296010A
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- Prior art keywords
- block
- piece
- ceramic
- wall
- protection device
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning In General (AREA)
Abstract
The invention discloses a device for removing organic deposits on the surface of a semiconductor ceramic part, which structurally comprises a machine body, a drainage tube, a top cover and a control panel, wherein the drainage tube is arranged at the middle lower part of the right side of the machine body, the top cover is arranged at the top of the machine body, the machine body is provided with an impeller, a supporting block and a protection device, when the rotation speed of water flow in the cleaning machine is accelerated, the ceramic part flows along with liquid, the phenomenon that the ceramic part collides with the inner wall of the cleaning machine is easily caused, the ceramic part is limited and buffered by the protection device, the damage caused by the mutual collision of the ceramic part moving along with the flow of the water is reduced, the change of the electric conductivity of the ceramic part is facilitated, the ceramic particles are easily accumulated outside a contact block due to the uneven outer surface of the contact block, the particles outside the contact block, the contact block is accelerated to remove particles outside the ceramic component, and the conductivity of the semiconductor of the ceramic component is increased.
Description
Technical Field
The invention belongs to the field of conductor ceramics, and particularly relates to equipment for removing organic deposits on the surface of a semiconductor ceramic component.
Background
The conductivity of the ceramic is obviously changed due to external conditions, so that the ceramic is processed into sensitive elements with various purposes, wherein the semiconductor material is a type, the ceramic is formed by firing clay, during the process of cutting the ceramic by processing a semiconductor, a large amount of powder is generated on the ceramic and is deposited on the surface of a ceramic part, and a cleaning machine is adopted to remove organic sediments outside the semiconductor material; when using the cleaning machine to get rid of the outside organic deposit of ceramic part among the prior art, because the inside impeller that is equipped with of cleaning machine drives rivers and rotates and accelerate to the outside powder that erodees of part and drop, when rivers slew velocity accelerates, easily lead to ceramic part along with liquid flow, the phenomenon of ceramic part and cleaning machine inner wall collision appears, and ceramic hardness is big, and has the fragility, causes the outer wall of pottery to appear the breakage fracture for ceramic part's electric conductive property descends.
Disclosure of Invention
In order to solve the problems that when the cleaning machine is used for removing organic sediments outside a ceramic part in the prior art, the impeller arranged inside the cleaning machine drives water flow to rotate so as to accelerate the washing of powder outside the part to fall off, when the water flow rotating speed is accelerated, the ceramic part flows along with liquid, the phenomenon that the ceramic part collides with the inner wall of the cleaning machine easily occurs, the ceramic is high in hardness and has brittleness, the outer wall of the ceramic is broken and fractured, and the electric conductivity of the ceramic part is reduced, the invention provides the device for removing the organic sediments on the surface of the semiconductor ceramic part.
In order to achieve the purpose, the invention is realized by the following technical scheme: the structure of the equipment for removing organic sediments on the surface of the semiconductor ceramic component comprises a machine body, a drainage tube, a top cover and a control panel, wherein the drainage tube is arranged at the middle lower part of the right side of the machine body, and the top cover is arranged at the top of the machine body.
The machine body is provided with an impeller, a supporting block and a protection device, the impeller is installed at the bottom in the machine body, and the protection device is installed inside the machine body through the supporting block.
As a further improvement of the invention, the protection device is provided with an outer layer, an inner layer, a clamping block, a cleaning cavity, a limiting tooth and a reset strip, wherein the outer layer is arranged on the outer layer of the protection device, the inner layer is positioned on the inner layer of the protection device, the clamping block is fixed at an included angle between the outer layer and the inner layer, the cleaning cavity is positioned between the outer layer and the inner layer, the limiting tooth is arranged on the inner wall of the outer layer, the reset strip is connected between the limiting tooth and the outer wall of the inner layer, the limiting tooth is made of rubber, and the reset strip has elasticity.
As a further improvement of the invention, the limiting tooth is provided with a brush plate, connecting strips, liquid inlet holes and five liquid accumulation cavities, the brush plate is positioned at two sides of the limiting tooth, the connecting strips are clamped on the inner wall of the top end of the brush plate, the liquid inlet holes penetrate through the surface of the top of the limiting tooth, the liquid accumulation cavities are positioned inside the limiting tooth, and the liquid inlet holes are provided with five liquid accumulation cavities.
As a further improvement of the invention, the brush plate is provided with a partition plate, a reset block, an opening, an inner cavity and a contact block, the partition plate is positioned in the brush plate, the reset block is clamped between the left side of the top end of the partition plate and the inner wall of the right side of the brush plate, the opening penetrates through the right side of the brush plate, the inner cavity is positioned in the brush plate, the contact block penetrates through the opening and is fixed on the right side surface of the partition plate, and the contact block is made of sponge.
As a further improvement of the invention, the opening is provided with a push block, a connecting plate, an elastic block and semicircular blocks, the push block is fixed on the inner wall of the opening, the connecting plate is movably matched with the push block, the semicircular blocks are arranged on the surface of the connecting plate through the elastic blocks, and the semicircular blocks are totally provided with six semicircular blocks which are symmetrically distributed.
As a further improvement of the invention, the semicircular block is provided with an inner clamping block, a sliding block, a clearing block, a pushing strip and a groove, the inner clamping block is positioned inside the semicircular block, the sliding block is positioned between the inner clamping blocks, the clearing block is arranged on the outer wall of the semicircular block, the pushing strip is clamped between the semicircular blocks, the groove is sunken on the surface of the clearing block, and the pushing strip has elasticity.
Advantageous effects
Compared with the prior art, the invention has the following beneficial effects:
1. when rivers slew velocity because the inside cleaning machine is accelerated, easily lead to ceramic part along with liquid flows, the phenomenon of ceramic part and cleaning machine inner wall collision appears, carries out spacing buffering to ceramic part through protection device, reduces ceramic part and removes collision each other and damage along with rivers flow, is favorable to ceramic part's electric conductive property not to change.
2. Because contact piece surface unevenness for ceramic particle easily piles up in contact piece outside, clears away the outside granule of contact piece through the inside semicircle piece of opening, is favorable to keeping contact piece outside to keep clean and tidy, accelerates contact piece to clear away the outside granule of ceramic part, increases the electric conductivity of ceramic part semiconductor.
Drawings
FIG. 1 is a schematic structural diagram of an apparatus for removing organic deposits from the surface of a semiconductor ceramic device according to the present invention.
Fig. 2 is a schematic structural view of the inside of the body of the present invention viewed from above.
Fig. 3 is a schematic top view of a protection device according to the present invention.
Fig. 4 is a schematic sectional view of a limiting tooth in a top view.
FIG. 5 is a schematic top view, in cross section, of a brush plate according to the present invention.
Fig. 6 is a schematic sectional view of an opening in a top view.
Fig. 7 is a schematic top sectional view of a semicircular block according to the present invention.
In the figure: the device comprises a machine body-1, a drainage tube-2, a top cover-3, a control panel-4, an impeller-11, a supporting block-12, a protection device-13, an outer layer-a 1, an inner layer-a 2, a clamping block-a 3, a cleaning cavity-a 4, a limiting tooth-a 5, a reset bar-a 6, a brush board-s 1, a connecting bar-s 2, a liquid inlet hole-s 3, a liquid accumulation cavity-s 4, a partition plate-d 1, a reset block-d 2, an opening-d 3, an inner cavity-d 4, a contact block-d 5, a push block-r 1, a connecting plate-r 2, an elastic block-r 3, a semicircular block-r 4, an inner clamping block-t 1, a sliding block-t 2, a clearing block-t 3, a push bar-t 4 and a groove-t 5.
Detailed Description
The invention is further described below with reference to the accompanying drawings:
example 1:
as shown in figures 1 to 5:
the invention provides equipment for removing organic deposits on the surface of a semiconductor ceramic component, which structurally comprises a machine body 1, a drainage tube 2, a top cover 3 and a control panel 4, wherein the drainage tube 2 is arranged at the middle lower part of the right side of the machine body 1, and the top cover 3 is arranged at the top of the machine body 1.
The machine body 1 is provided with an impeller 11, a supporting block 12 and a protection device 13, the impeller 11 is installed at the bottom in the machine body 1, and the protection device 13 is installed inside the machine body 1 through the supporting block 12.
The protection device 13 is provided with an outer layer a1, an inner layer a2, a clamping block a3, a cleaning cavity a4, a limiting tooth a5 and a reset strip a6, the outer layer a1 is arranged on the outer layer of the protection device 13, the inner layer a2 is located on the inner layer of the protection device 13, the clamping block a3 is fixed at an included angle between the outer layer a1 and the inner layer a2, the cleaning cavity a4 is located between the outer layer a1 and the inner layer a2, the limiting tooth a5 is mounted on the inner wall of the outer layer a1, the reset strip a6 is connected between the limiting tooth a5 and the outer wall of the inner layer a2, the limiting tooth a5 is made of rubber and has elasticity, so that the ceramic component is buffered, the ceramic component is reduced in collision, the ceramic component is protected from the outside, the reset strip a6 has elasticity, the limiting tooth a5 is driven to swing, and the contact between the limiting tooth a 5.
Wherein, spacing tooth a5 is equipped with brush board s1, connecting strip s2, feed liquor hole s3, hydrops chamber s4, brush board s1 is located spacing tooth a5 both sides, connecting strip s2 presss from both sides at brush board s1 top inner wall, feed liquor hole s3 runs through spacing tooth a5 top surface, hydrops chamber s4 is located inside spacing tooth a5, feed liquor hole s3 is equipped with five altogether, is favorable to accelerating liquid and enters into hydrops chamber s4 inside, increases the impact force of the inside liquid of hydrops chamber s4, and the granule impact outside brush board s1 drops.
The brush plate s1 is provided with a partition plate d1, a reset block d2, an opening d3, an inner cavity d4 and a contact block d5, the partition plate d1 is located inside the brush plate s1, the reset block d2 is clamped between the left side of the top end of the partition plate d1 and the inner wall of the right side of the brush plate s1, the opening d3 penetrates through the right side of the brush plate s1, the inner cavity d4 is located inside the brush plate s1, the contact block d5 penetrates through the opening d3 and is fixed on the right side face of the partition plate d1, and the contact block d5 is made of sponge and has strong cleaning performance, so that the cleaning of particles on the outer wall of a ceramic component is accelerated, and the outer cleanness of the.
The specific use mode and function of the embodiment are as follows:
in the invention, a drainage tube 2 of a cleaning machine is connected with a water pipeline, cleaning liquid is introduced into a machine body 1, a top cover 3 is opened, a ceramic component is placed into a cleaning cavity a4 in the machine body 1, a control panel 4 starts an impeller 11 of the cleaning machine to rotate, the impeller 11 drives the cleaning liquid to flow to clean the exterior of the component, the component moves and buffers between a limiting tooth a5 and a clamping block a3 in a protection device 13 along with the thrust of water flow, when the component collides with the limiting tooth a5, the component pushes the limiting tooth a5, the limiting tooth a5 pulls a6 to deform, so that the limiting tooth a5 vibrates, the liquid enters a liquid accumulation cavity s4 through a liquid inlet hole s3 of the limiting tooth a5, the liquid in the liquid accumulation cavity s4 pushes a brush plate s 8, the liquid enters an inner cavity d4 in the brush plate s1, the liquid pushes a baffle d1, the baffle d4 pulls the reset block d2 to move, and the baffle d5 pushes an opening through a contact block d3, contact piece d5 clears away outside granule organic matter with the contact of part outer wall, and liquid sprays towards opening d3 and washes the granule of contact piece d5 outer wall, carries out spacing buffering to ceramic unit through protection device 13, reduces ceramic unit and moves collision each other and damage along with water flow, is favorable to ceramic unit's electric conductive property not to change.
Example 2:
as shown in fig. 6 to 7:
wherein, opening d3 is equipped with ejector pad r1, connecting plate r2, bullet piece r3, semicircle piece r4, ejector pad r1 is fixed at opening d3 inner wall, connecting plate r2 and ejector pad r1 clearance fit, semicircle piece r4 passes through ejector pad r3 and installs on connecting plate r2 surface, semicircle piece r4 is equipped with six pieces altogether, and is the semicircle shape, is the symmetric distribution, is favorable to the increase with the outside area of contact piece d5 for extrude contact piece d5, accelerate and clear away the outside granule of contact piece d 5.
Wherein, semicircle piece r4 is equipped with interior clamp splice t1, slider t2, clears away piece t3, pushes away strip t4, recess t5, interior clamp splice t1 is located semicircle piece r4 inside, slider t2 is located between interior clamp splice t1, it installs at semicircle piece r4 outer wall to clear away piece t3, it presss from both sides between semicircle piece r4 to push away strip t4, recess t5 is sunken in clearing away piece t3 surface, it has elasticity to push away strip t4, is favorable to driving and clears away the swing of piece t3 for clear away piece t3 and produce the shaking force, accelerate the granule of clearing away piece t3 and clearing away and receive the power landing.
The specific use mode and function of the embodiment are as follows:
in the invention, when the liquid in the inner cavity d4 is gradually reduced, the thrust of the reset block d2 is greater than that of the liquid, the reset block d2 pulls the partition plate d1 in the opposite direction, the partition plate d1 drives the contact block d5 to return to the inside of the opening d3, the push block r3 in the opening d3 pushes the connecting plate r3 to the middle of the opening d3, the connecting plate r3 drives the semicircular block r3 to contact with the outer wall of the contact block d3, the cleaning block t3 of the semicircular block r3 cleans particles outside the contact block d3, the push bar t3 drives the cleaning block t3 to vibrate, the particles slide along the groove t3, the slide block t3 collides with the inner clamping block t3 to make the semicircular block r3 vibrate, and the elastic block r3 drives the semicircular block r3 to shake and accelerate the cleaning of the particles outside the cleaning block t3 to slide down, so that the particles outside the contact block d3 are cleaned and the contact block d3 is kept clean and the outside the ceramic particle cleaning component is accelerated. Increasing the conductivity of the semiconductor of the ceramic component.
The technical solutions of the present invention or similar technical solutions designed by those skilled in the art based on the teachings of the technical solutions of the present invention are all within the scope of the present invention to achieve the above technical effects.
Claims (6)
1. The utility model provides a removal equipment of organic deposit on semiconductor ceramic part surface, its structure includes organism (1), drainage tube (2), top cap (3), control panel (4), lower part in organism (1) right side is established in drainage tube (2), install at organism (1) top in top cap (3), its characterized in that:
the machine body (1) is provided with an impeller (11), a supporting block (12) and a protection device (13), the impeller (11) is installed at the bottom in the machine body (1), and the protection device (13) is installed inside the machine body (1) through the supporting block (12).
2. The apparatus for removing organic deposits from the surface of a semiconductive ceramic member according to claim 1, wherein: protection device (13) are equipped with skin (a1), inlayer (a2), fixture block (a3), wash chamber (a4), spacing tooth (a5), strip (a6 resets), skin (a1) is established at protection device (13) skin, inlayer (a2) are located protection device (13) inlayer, the contained angle between skin (a1) and inlayer (a2) is fixed in fixture block (a3), wash chamber (a4) and be located between skin (a1) and inlayer (a2), spacing tooth (a5) are installed at skin (a1) inner wall, strip (a6) that resets is connected between spacing tooth (a5) and inlayer (a2) outer wall.
3. The apparatus for removing organic deposits from the surface of a semiconductive ceramic member according to claim 2, wherein: spacing tooth (a5) is equipped with brush board (s1), connecting strip (s2), feed liquor hole (s3), hydrops chamber (s4), brush board (s1) are located spacing tooth (a5) both sides, connecting strip (s2) clamp is at brush board (s1) top inner wall, spacing tooth (a5) top surface is run through in feed liquor hole (s3), hydrops chamber (s4) are located inside spacing tooth (a 5).
4. The apparatus for removing organic deposits from the surface of a semiconductive ceramic member according to claim 3, wherein: the brush plate (s1) is provided with a partition plate (d1), a reset block (d2), an opening (d3), an inner cavity (d4) and a contact block (d5), the partition plate (d1) is located inside the brush plate (s1), the reset block (d2) is clamped between the left side of the top end of the partition plate (d1) and the inner wall of the right side of the brush plate (s1), the opening (d3) penetrates through the right side of the brush plate (s1), the inner cavity (d4) is located inside the brush plate (s1), and the contact block (d5) penetrates through the opening (d3) and is fixed on the right side face of the partition plate (d 1).
5. The apparatus for removing organic deposits from the surface of a semiconductive ceramic member according to claim 4, wherein: opening (d3) are equipped with ejector pad (r1), connecting plate (r2), bullet piece (r3), semicircle piece (r4), ejector pad (r1) are fixed at opening (d3) inner wall, connecting plate (r2) and ejector pad (r1) clearance fit, semicircle piece (r4) are installed on connecting plate (r2) surface through bullet piece (r 3).
6. The apparatus for removing organic deposits from the surface of a semiconductive ceramic member according to claim 5, wherein: half circle piece (r4) are equipped with interior clamp splice (t1), slider (t2), clear away piece (t3), push away strip (t4), recess (t5), interior clamp splice (t1) is located half circle piece (r4) inside, slider (t2) are located between interior clamp splice (t1), clear away piece (t3) and install at half circle piece (r4) outer wall, it presss from both sides between half circle piece (r4) to push away strip (t4), recess (t5) are sunken and are being clear away piece (t3) surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011072240.4A CN112296010A (en) | 2020-10-09 | 2020-10-09 | Equipment for removing organic deposits on surface of semiconductor ceramic component |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011072240.4A CN112296010A (en) | 2020-10-09 | 2020-10-09 | Equipment for removing organic deposits on surface of semiconductor ceramic component |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112296010A true CN112296010A (en) | 2021-02-02 |
Family
ID=74488827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011072240.4A Withdrawn CN112296010A (en) | 2020-10-09 | 2020-10-09 | Equipment for removing organic deposits on surface of semiconductor ceramic component |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112296010A (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN206661778U (en) * | 2017-04-15 | 2017-11-24 | 江苏辰熠机械科技有限公司 | A kind of plastic products cleaning device |
| CN108210948A (en) * | 2018-04-08 | 2018-06-29 | 倪菁菁 | A kind of scalpel high-efficiency cleaning disinfecting instrument |
| CN110364474A (en) * | 2019-06-28 | 2019-10-22 | 上海提牛机电设备有限公司 | A kind of ceramic disk cleaning manipulator mechanism and cleaning system |
| CN209903393U (en) * | 2018-11-28 | 2020-01-07 | 福建省将乐好家园木业有限公司 | Bamboo wood cutting processingequipment with remove bits function |
| CN210701379U (en) * | 2019-07-22 | 2020-06-09 | 绍兴市达冷肯生物科技有限公司 | Cover glass cleaner for biological experiments |
| CN111584401A (en) * | 2020-05-15 | 2020-08-25 | 郭志锋 | Chip acid dip pickle |
| CN111729997A (en) * | 2020-06-30 | 2020-10-02 | 福州凯辉铭机械设备有限公司 | Motor-driven construction machinery |
-
2020
- 2020-10-09 CN CN202011072240.4A patent/CN112296010A/en not_active Withdrawn
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN206661778U (en) * | 2017-04-15 | 2017-11-24 | 江苏辰熠机械科技有限公司 | A kind of plastic products cleaning device |
| CN108210948A (en) * | 2018-04-08 | 2018-06-29 | 倪菁菁 | A kind of scalpel high-efficiency cleaning disinfecting instrument |
| CN209903393U (en) * | 2018-11-28 | 2020-01-07 | 福建省将乐好家园木业有限公司 | Bamboo wood cutting processingequipment with remove bits function |
| CN110364474A (en) * | 2019-06-28 | 2019-10-22 | 上海提牛机电设备有限公司 | A kind of ceramic disk cleaning manipulator mechanism and cleaning system |
| CN210701379U (en) * | 2019-07-22 | 2020-06-09 | 绍兴市达冷肯生物科技有限公司 | Cover glass cleaner for biological experiments |
| CN111584401A (en) * | 2020-05-15 | 2020-08-25 | 郭志锋 | Chip acid dip pickle |
| CN111729997A (en) * | 2020-06-30 | 2020-10-02 | 福州凯辉铭机械设备有限公司 | Motor-driven construction machinery |
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Application publication date: 20210202 |
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| WW01 | Invention patent application withdrawn after publication |