CN112239328B - Radiation refrigeration film and preparation method thereof, radiation refrigeration glass and preparation method thereof - Google Patents
Radiation refrigeration film and preparation method thereof, radiation refrigeration glass and preparation method thereof Download PDFInfo
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- CN112239328B CN112239328B CN202011090292.4A CN202011090292A CN112239328B CN 112239328 B CN112239328 B CN 112239328B CN 202011090292 A CN202011090292 A CN 202011090292A CN 112239328 B CN112239328 B CN 112239328B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3642—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing a metal layer
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F5/00—Air-conditioning systems or apparatus not covered by F24F1/00 or F24F3/00, e.g. using solar heat or combined with household units such as an oven or water heater
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F5/00—Air-conditioning systems or apparatus not covered by F24F1/00 or F24F3/00, e.g. using solar heat or combined with household units such as an oven or water heater
- F24F5/0046—Air-conditioning systems or apparatus not covered by F24F1/00 or F24F3/00, e.g. using solar heat or combined with household units such as an oven or water heater using natural energy, e.g. solar energy, energy from the ground
- F24F2005/0064—Air-conditioning systems or apparatus not covered by F24F1/00 or F24F3/00, e.g. using solar heat or combined with household units such as an oven or water heater using natural energy, e.g. solar energy, energy from the ground using solar energy
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Abstract
The invention discloses a radiation refrigeration film and a preparation method thereof, radiation refrigeration glass and a preparation method thereof, wherein the film sequentially comprises a transparent emitter and a transparent reflector, the transparent emitter has high emissivity in a middle infrared light wavelength range, low absorptivity and high transmittance in a visible light wavelength range, and the transparent reflector has high reflectivity in a near infrared sunlight wavelength range; in the visible wavelength range, the effective refractive indexes of air, the transparent emitter and the transparent reflector are gradually increased. The transparent reflector reflects near-infrared sunlight, so that the phenomenon that the sunlight penetrates through the film body to aggravate refrigeration energy consumption can be avoided, efficient radiation refrigeration is realized by using the transparent emitter, on the basis, the refraction relation between the transparent emitter and the transparent reflector is controlled, the transparent emitter and the transparent reflector can be combined, the visible light is guaranteed to be highly transparent, lighting is not influenced, and an efficient refrigeration effect is realized.
Description
Technical Field
The invention belongs to the field of radiation refrigeration, and particularly relates to a radiation refrigeration film and a preparation method thereof, radiation refrigeration glass and a preparation method thereof.
Background
Windows have important value in applications such as buildings, vehicles, greenhouses and the like. Conventional window glass has high transparency to solar radiation and allows near infrared light (wavelength range of 0.7-2.5 μm) to pass through, which aggravates the refrigeration energy consumption of the interior space.
The window glass absorbs heat under the irradiation of sunlight, and especially the window with some functional layers, such as colored glass, electrochromic glass, thermochromic glass, etc., has especially obvious heat absorbing effect under the sunlight. The heat absorption of the window causes its temperature to rise, which increases the non-radiative heat exchange with the indoor space, thereby affecting the cooling power consumption of the room.
The development of a simple, green and energy-saving refrigeration window film is urgently needed.
Radiation refrigeration has received a great deal of attention in the recent years as a technology for reducing its own temperature without requiring energy input. Compared with the threat of the refrigerating working media such as CFCS, HCFCS, HFC and the like which are used in a large amount in the air-conditioning refrigeration to the ozone layer and the environmental climate, the radiation refrigeration is a more green refrigeration technology and has very important significance for environmental protection and energy utilization. Radiation refrigeration generally achieves spontaneous cooling without energy consumption by strongly reflecting sunlight while emitting thermal radiation in the atmospheric window (wavelength range of 8-13 μm).
However, the radiation refrigeration technology is mostly applied to walls or roofs and is rarely applied to windows, because the window scenes have higher requirements on the visible light transmittance of the radiation refrigeration material, and it is very difficult to achieve passive refrigeration for reducing energy consumption, but also cannot reduce the light transmittance of the windows and ensure the service life.
Disclosure of Invention
In view of the above defects or improvement needs of the prior art, the present invention provides a radiation refrigeration film and a preparation method thereof, radiation refrigeration glass and a preparation method thereof, and aims to meet the requirements of application scenarios with higher requirements by using a more simplified radiation refrigeration film structure.
To achieve the above object, according to one aspect of the present invention, there is provided a radiation refrigerating film including, in order, a transparent emitter having a high emissivity in a mid-infrared light wavelength range and a low absorptivity and high transmittance in a visible light wavelength range, and a transparent reflector having a high reflectivity in a near-infrared solar light wavelength range; the effective refractive indices of air, the transparent emitter and the transparent reflector gradually increase in the visible wavelength range.
Through above-mentioned technical scheme, utilize transparent reflector to reflect near-infrared sunlight, thereby can avoid it to see through the ambient temperature that the membrane body improves this side, aggravate the refrigeration energy consumption, utilize transparent emitter to realize efficient radiation refrigeration, on this basis, control the refraction relation between transparent emitter and the transparent reflector, can make the two combine to have both guaranteed that visible light is highly transparent, does not influence daylighting, and realizes efficient refrigeration effect simultaneously.
According to another aspect of the present invention, there is provided a method of preparing a radiation refrigerating film, comprising the steps of:
s1, forming one or more layers of transparent emitters in a roll-to-roll mode, wherein the materials of the transparent emitters are selected from the following materials: polydimethylsiloxane, poly (p-xylylene glycol), polymethyl methacrylate, polyimide, polystyrene, polycarbonate, styrene acrylonitrile, and polyvinyl butyral;
s2, preparing one or more transparent reflectors on the transparent emitters.
By the method, a roll of transparent radiation refrigerating film can be prepared, is convenient for practical application, and can be flexibly attached to various application scenes, especially windows.
According to another aspect of the invention, there is provided a radiation refrigerating glass comprising the radiation refrigerating film described above, and further comprising a common glass on a side of the transparent reflector remote from the transparent emitter.
The radiation refrigeration glass can be applied to window scenes, and can meet the dual requirements of windows on visible light transmittance and refrigeration effect.
According to another aspect of the invention, the invention also provides a preparation method of the radiation refrigeration glass, which comprises the following steps:
s1, taking common glass;
s2, forming one or more layers of transparent reflectors on the common glass, wherein the transparent reflectors have high reflectivity in the wavelength range of near-infrared sunlight;
s3, forming one or more transparent emitters on the transparent reflector, the transparent emitters having high emissivity in the mid-infrared wavelength range, low absorptivity in the visible wavelength range, and high solar transmittance.
By the method, the glass with the radiation refrigeration function can be directly prepared on the premise of not influencing the optical performance of the glass.
Drawings
FIG. 1 is a schematic illustration of the principle of the present application for radiation refrigeration;
FIG. 2 is a schematic diagram of a radiation-cooled membrane;
FIG. 3 is a schematic diagram comparing the transmittance of the radiation refrigeration glass and the ordinary glass to light;
fig. 4 is a schematic diagram comparing the temperature of the radiation refrigeration glass of the present application with that of ordinary glass.
In the figure, 1, a transparent emitter; 2. a transparent reflector; 3. common glass; a. visible light; b. near infrared light; c. heat radiation.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
As shown in fig. 1 and fig. 2, the present invention provides a radiation refrigeration film, which has an upper and lower layer structure, and sequentially includes a transparent emitter 1 and a transparent reflector 2. The transparent emitter 1 has a high emissivity in the mid-infrared wavelength range (2.5 μm to 20 μm), and has a low absorption and a high solar transmittance in the visible wavelength range (0.4 μm to 0.7 μm), and the transparent reflector 2 has a high reflectance in the near-infrared solar wavelength range (0.7 μm to 2.5 μm). Visible light a can enter the other side of the film through the transparent emitter 1 and the transparent reflector 2 in sequence to realize the transparency of the film, and can be applied to the surface of an object with requirements on lighting, and near infrared light b is reflected on the surface of the transparent reflector 2, so that the refrigeration energy consumption of the other side of the film is reduced, and the transparent emitter 1 carries out heat radiation c outwards to realize spontaneous cooling without energy consumption.
Further, the effective refractive index of the transparent emitter 1 is higher than that of air by not more than 50%, and the effective refractive index of the transparent reflector 2 is higher than that of the transparent emitter 1 by not more than 50%.
In the visible light wavelength range, the effective refractive indexes of air, the transparent emitter 1 and the transparent reflector 2 are gradually increased, and since the refractive index of the material after film formation is slightly different from the refractive index of the material itself due to factors such as shape, thickness and uniformity after the material is formed into a film in the present application, the effective refractive index is used to represent the refractive index of the transparent emitter 1 and the transparent reflector 2 when they are used as an integral layer.
Through the arrangement, the effective refractive index of the whole film forms a gradient change relationship, according to a Fresnel formula, the larger the refractive index is, the higher the reflectivity is, therefore, the refractive index of the uppermost layer is the smallest through the gradient change, more visible light can be transmitted, in addition, the refractive index difference between two adjacent layers is limited in the required range, the reflection and escape of the visible light can be reduced as much as possible, and further, more visible light can be emitted from the transparent reflector 2 after passing through the transparent emitter 1 and the transparent reflector 2 in sequence from the air.
Further, the transparent emitter 1 may be formed by one layer or by stacking a plurality of layers, and the material of each layer is a single material, not a composite material. Specifically, each layer may be made of one selected from the following materials: silicon dioxide, titanium dioxide, silicon carbide, silicon nitride, polydimethylsiloxane, poly (p-xylylene glycol), polymethyl methacrylate, polyimide, polystyrene, polycarbonate, styrene acrylonitrile, polyvinyl butyral, and the like. These materials are transparent when made into a thin film. When the transparent emitter 1 is a multilayer, the materials of the layers may be different, and several materials may be selected from the above materials. Because the one deck of transparent emitter 1 is made for a material, and not composite material or combine means cooperation such as nanoparticle to form, consequently, the film forming of this application is simpler, and easy processing still can effectively avoid the mie scattering problem that the nanoparticle caused to visible light, has guaranteed the highly transparent nature to visible light.
The thickness range of the transparent emitter 1 is preferably: 20-100 μm, when the selected material is different or the number of layers is different, the total thickness can be changed according to the material setting, and is not limited to this range.
The transparent reflector 2 may be formed by one layer or by stacking a plurality of layers, and the material of each layer is a single material rather than a composite material. Specifically, each layer may be made of one selected from the following materials: indium tin oxide, fluorine-doped tin oxide, aluminum-doped tin oxide, poly (3, 4-ethylenedioxythiophene) -polystyrene sulfonic acid. In some embodiments, the transparent reflector 2 may also be made of a metal material, and in particular, a metal mesh layer is required to achieve the transparent effect. It is noted that the electron concentration range of the material of the transparent reflector is 1020～1021cm-3So as to ensure that the reflector has certain reflection effect and certain transparent effect. Too high an electron concentration leads to a decrease in the visible light transmittance (opacity) of the transparent reflector, and too low leads to a decrease in the reflectance of the transparent reflector.
The thickness range of the transparent reflector 2 is preferably: 200-400 nm, when the selected materials are different or the number of layers to be manufactured is different, the total thickness can be changed according to the setting of the materials, and the range is not limited.
In combination with the above analysis of the visible light reflection process, it can be seen that when the structure of the transparent emitter and the transparent reflector having a plurality of layers is adopted in the present application, the visible light can further pass through the whole radiation refrigerating film under the condition that the refractive index is changed in a gradient manner, and the high transmittance can be achieved.
Further, the transparent emitter 1 may further include a protective layer, and the material of the protective layer is a mid-infrared transparent material, and is selected from one or more of the following materials: polyethylene, poly-4-methylpentene, styrene-ethylene/butylene-styrene block copolymer, and a protective layer disposed over the transparent emitter 1. The protective layer is transparent to visible light and mid-infrared light, and serves to improve the durability and stability of the entire film.
The invention also provides a preparation method of the radiation refrigerating film, which comprises the following steps:
s1, forming one or more layers of transparent emitter 1 in a roll-to-roll manner, the material of the transparent emitter 1 being selected from: polydimethylsiloxane, poly (p-xylylene glycol), polymethyl methacrylate, polyimide, polystyrene, polycarbonate, styrene acrylonitrile, and polyvinyl butyral; these materials have high emissivity in the mid-infrared wavelength range, and low absorptivity and high solar transmittance in the visible wavelength range;
s2, preparing one or more layers of transparent reflectors 2 on the transparent emitter 1, wherein the transparent reflectors 2 are made of indium tin oxide, fluorine-doped tin oxide, aluminum-doped tin oxide and poly (3, 4-ethylenedioxythiophene) -polystyrene sulfonic acid, and have high reflectivity in the near infrared light wavelength range.
In S2, the material of the transparent reflector 2 may be metal, and the refractive index of metal is usually higher than those of the above four materials, and the metal has a large influence on the visible light transmittance, so that it can be made into a metal mesh layer, so that the effective refractive index of the layer is reduced, and the visible light transmittance is increased, that is, the transparent effect is formed.
The film can be prepared in a roll mode through the steps, and industrial production, transportation, storage, sale, installation and use are facilitated.
The invention also provides radiation refrigeration glass, as shown in fig. 1, on the basis of the radiation refrigeration film, the radiation refrigeration glass also comprises common glass 3 positioned on one side of the transparent reflector 2 far away from the transparent emitter 1, and the glass has both the light transmission function and the radiation refrigeration function and can be applied to window scenes.
The invention also provides a preparation method of the radiation refrigeration glass, which comprises the following steps:
s1, taking common glass;
s2, forming one or more layers of transparent reflectors 2 on common glass through magnetron sputtering or other processing technologies, wherein the transparent reflectors 2 have high reflectivity in the near infrared light wavelength range; in particular, the material of the transparent reflector 2 may be selected from one or more of the following: indium tin oxide, fluorine-doped tin oxide, aluminum-doped tin oxide and poly (3, 4-ethylenedioxythiophene) -polystyrene sulfonic acid, wherein the indium tin oxide, the fluorine-doped tin oxide and the aluminum-doped tin oxide are formed by means of magnetron sputtering, and the poly (3, 4-ethylenedioxythiophene) -polystyrene sulfonic acid is formed by means of spin coating. Or metal, when the material used for one layer of the transparent reflector 2 is metal, the layer of the transparent reflector 2 is subjected to mask lithography in the step to form a metal grid; so that a transparent effect can be achieved and the effective refractive index can be reduced.
S3, forming one or more layers of transparent emitters 1 on the transparent reflector 2 by spin coating or other methods, wherein the material of the transparent emitters 1 is selected from the following: silicon dioxide, titanium dioxide, silicon carbide, silicon nitride, polydimethylsiloxane, poly (p-xylylene glycol), polymethyl methacrylate, polyimide, polystyrene, polycarbonate, styrene acrylonitrile and polyvinyl butyral, wherein the silicon dioxide, titanium dioxide, silicon carbide and silicon nitride are formed by magnetron sputtering, and the poly (dimethylsiloxane), poly (p-xylylene glycol), polymethyl methacrylate, polyimide, polystyrene, polycarbonate, styrene acrylonitrile and polyvinyl butyral are formed by spin coating, so that the materials have high emissivity in the middle infrared light wavelength range, low absorptivity in the visible light wavelength range and high solar transmittance.
Example 1
The transparent emitter is a layer, the material is polydimethylsiloxane, and the thickness is 100 mu m; the transparent reflector is a layer made of indium tin oxide with the thickness of 400 nm.
The radiation refrigeration glass of the common glass, the transparent reflector 2 and the transparent emitter 1 in the embodiment is prepared by the preparation method. Wherein the refractive index of air is 1, the effective refractive index of the transparent emitter made of polydimethylsiloxane is 1.35, and the effective refractive index of the transparent reflector made of indium tin oxide is 1.9. And taking the same piece of ordinary glass without any treatment.
The two glass structures were subjected to a comparative test, and the light transmittances in the wavelength range of 0.3 μm to 2.5 μm were compared, and the comparison result is shown in fig. 3. It can be found that in the visible light wavelength range of 0.4-0.7 μm, the transmittance of the radiation refrigeration glass is lower than that of the common glass by less than 10%, and is still more than 80%, which indicates that the transmittance of the glass is not affected after the radiation refrigeration film is combined with the glass. In the wavelength range of near infrared light, the transmittance of the radiation refrigeration glass to the near infrared light is greatly reduced within 0.7-2.5 microns, which shows that the radiation refrigeration glass can effectively reflect the near infrared light and reduce the influence on the temperature rise of the other side.
Meanwhile, the refrigeration effects of the two pieces of glass are compared in the time period of 12:25 to 12:55, the comparison result is shown in fig. 4, and it can be found that the glass structure can be cooled to about 7 ℃ compared with the common glass, and the good refrigeration effect can be achieved under the condition that the influence of the light transmittance of the glass structure is extremely low.
Example 2
The transparent emitter is a layer made of silicon dioxide, the thickness of the silicon dioxide is 100 micrometers, and the effective refractive index of the silicon dioxide is 1.45; the transparent reflector is a layer made of aluminum-doped tin oxide, the thickness of the transparent reflector is 300nm, and the effective refractive index of the transparent reflector is 1.85.
Example 3
The transparent emitter is a layer made of polymethyl methacrylate, the thickness of the transparent emitter is 100 mu m, and the effective refractive index of the transparent emitter is 1.5; the transparent reflector is a metal grid layer with the thickness of 300nm and the effective refractive index of 2. The protective layer is a layer made of polyethylene, the thickness of the protective layer is 10 micrometers, and the effective refractive index of the protective layer is 1.52.
Example 4
The transparent emitter is composed of two layers, one layer close to the transparent reflector is made of poly-p-xylylene glycol ester, the thickness of the poly-p-xylylene glycol ester is 50 micrometers, the effective refractive index of the poly-p-xylylene glycol ester is 1.58, the other layer is made of silicon dioxide, the thickness of the silicon dioxide is 20 micrometers, and the effective refractive index of the silicon dioxide is 1.45; the transparent reflector is a layer made of indium tin oxide, the thickness of the transparent reflector is 350nm, and the effective refractive index of the transparent reflector is 1.9.
Example 5
The transparent emitter is a layer, the material is polydimethylsiloxane, the thickness is 100 mu m, and the effective refractive index is 1.35; the transparent reflector is composed of two layers, one layer near the transparent reflector is made of aluminum-doped tin oxide with thickness of 150 μm and effective refractive index of 1.85, and the other layer is made of indium tin oxide with thickness of 200nm and effective refractive index of 1.9.
The effects of examples 2 to 5 are similar to those of example 1, and thus are not described in detail.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (8)
1. A radiation refrigeration film is characterized by comprising a transparent emitter and a transparent reflector in sequence, wherein the transparent emitter has high emissivity in the middle infrared light wavelength range, low absorptivity and high transmittance in the visible light wavelength range, and the transparent reflector has high reflectivity in the near infrared sunlight wavelength range; under the wavelength range of visible light, the effective refractive indexes of air, the transparent emitter and the transparent reflector are gradually increased, the transparent emitter and the transparent reflector are one or more layers, each layer is made of a single material, and the electron concentration of the material of the transparent reflector is 1020~1021cm-3。
2. The film of claim 1, wherein the effective refractive index of the transparent emitter is no more than 50% higher than the effective refractive index of air, and the effective refractive index of the transparent reflector is no more than 50% higher than the effective refractive index of the transparent emitter.
3. The film of claim 2, wherein the transparent emitter is made of one or more of the following materials: silicon dioxide, titanium dioxide, silicon carbide, silicon nitride, polydimethylsiloxane, poly (p-xylylene glycol), polymethyl methacrylate, polyimide, polystyrene, polycarbonate, styrene acrylonitrile and polyvinyl butyral;
the transparent reflector is made of one or more of the following materials: indium tin oxide, fluorine-doped tin oxide, aluminum-doped tin oxide, poly (3, 4-ethylenedioxythiophene) -polystyrene sulfonic acid; or the transparent reflector is one of an ultrathin metal layer and a metal grid layer.
4. The radiation refrigerating film as recited in claim 2, further comprising a protective layer in said transparent emitter, wherein said protective layer is a mid-infrared transparent material selected from one or more of the following: polyethylene, poly-4-methylpentene, styrene-ethylene/butylene-styrene block copolymers.
5. A method for producing a radiation refrigerating film according to claim 1, comprising the steps of:
s1, forming one or more layers of transparent emitters in a roll-to-roll mode, wherein the materials of the transparent emitters are selected from the following materials: polydimethylsiloxane, poly (p-xylylene glycol), polymethyl methacrylate, polyimide, polystyrene, polycarbonate, styrene acrylonitrile, and polyvinyl butyral;
s2, preparing one or more layers of transparent reflectors on the transparent emitters, wherein each layer of the transparent emitters and the transparent reflectors is made of a single material, and the electron concentration of the material of the transparent reflectors is 1020~1021cm-3。
6. A radiation refrigerating glass comprising a radiation refrigerating film as claimed in any one of claims 1 to 4, and further comprising a common glass on a side of said transparent reflector remote from said transparent emitter.
7. A method for preparing the radiation refrigerating glass as claimed in claim 6, which comprises the following steps:
s1, taking common glass;
s2, forming one or more layers of transparent reflectors on the common glass, wherein the transparent reflectors have high reflectivity in the wavelength range of near-infrared sunlight;
s3, forming one or more layers of transparent emitters on the transparent reflector, wherein the transparent emitters have high emissivity in the mid-infrared wavelength range and low absorptivity and high solar light transmittance in the visible wavelength range, each layer of the transparent emitters and the transparent reflector is made of a single material, and the material of the transparent reflector has an electron concentration of 1020~1021cm-3。
8. The method for preparing a radiation refrigerating glass according to claim 7, wherein when the material used for forming the transparent reflector in S2 is metal, the method further comprises: and making the transparent reflector into a metal grid layer by adopting a mask photoetching mode.
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| CN117471593B (en) * | 2023-12-28 | 2024-04-02 | 迈默智塔(无锡)科技有限公司 | Selective transmission diaphragm and selective transmission glass |
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