CN112210246A - Ink-jet printing ink and its application in preparing organic semiconductor single crystal film - Google Patents
Ink-jet printing ink and its application in preparing organic semiconductor single crystal film Download PDFInfo
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- CN112210246A CN112210246A CN201911055522.0A CN201911055522A CN112210246A CN 112210246 A CN112210246 A CN 112210246A CN 201911055522 A CN201911055522 A CN 201911055522A CN 112210246 A CN112210246 A CN 112210246A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 77
- 239000013078 crystal Substances 0.000 title claims abstract description 51
- 238000007641 inkjet printing Methods 0.000 title claims abstract description 48
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 claims abstract description 56
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 claims abstract description 40
- 239000004094 surface-active agent Substances 0.000 claims abstract description 40
- 230000005669 field effect Effects 0.000 claims abstract description 14
- 238000002156 mixing Methods 0.000 claims abstract description 10
- WFRUBUQWJYMMRQ-UHFFFAOYSA-M potassium;1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctane-1-sulfonate Chemical group [K+].[O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F WFRUBUQWJYMMRQ-UHFFFAOYSA-M 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims description 15
- YWIGIVGUASXDPK-UHFFFAOYSA-N 2,7-dioctyl-[1]benzothiolo[3,2-b][1]benzothiole Chemical group C12=CC=C(CCCCCCCC)C=C2SC2=C1SC1=CC(CCCCCCCC)=CC=C21 YWIGIVGUASXDPK-UHFFFAOYSA-N 0.000 claims description 12
- 229910052681 coesite Inorganic materials 0.000 claims description 9
- 229910052906 cristobalite Inorganic materials 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052682 stishovite Inorganic materials 0.000 claims description 9
- 229910052905 tridymite Inorganic materials 0.000 claims description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 abstract description 18
- 238000000034 method Methods 0.000 abstract description 10
- 230000008569 process Effects 0.000 abstract description 10
- 230000007547 defect Effects 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 57
- 239000000976 ink Substances 0.000 description 31
- 239000012046 mixed solvent Substances 0.000 description 21
- 239000002904 solvent Substances 0.000 description 16
- 238000010586 diagram Methods 0.000 description 15
- 238000000879 optical micrograph Methods 0.000 description 15
- 238000000935 solvent evaporation Methods 0.000 description 12
- 238000007639 printing Methods 0.000 description 10
- 238000000151 deposition Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- 238000009835 boiling Methods 0.000 description 6
- 230000010287 polarization Effects 0.000 description 6
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- 238000010899 nucleation Methods 0.000 description 4
- 230000006911 nucleation Effects 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000032258 transport Effects 0.000 description 3
- MXMNNVPFTLPVBE-UHFFFAOYSA-N FC(C(C(C(C(C(C(F)(F)[K])(F)F)(F)F)(F)F)(F)F)(F)F)(C(F)(F)F)F Chemical group FC(C(C(C(C(C(C(F)(F)[K])(F)F)(F)F)(F)F)(F)F)(F)F)(C(F)(F)F)F MXMNNVPFTLPVBE-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000007847 structural defect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Thin Film Transistor (AREA)
Abstract
The invention discloses an ink-jet printing ink and application thereof in preparing an organic semiconductor single crystal film, wherein the ink-jet printing ink is prepared by mixing o-dichlorobenzene, isophorone, an organic semiconductor and a surfactant, the volume ratio of the o-dichlorobenzene to the isophorone in the ink-jet printing ink is 3:1, the concentration of the organic semiconductor in the ink-jet printing ink is 2-3 mg/ml, the concentration of the surfactant in the ink-jet printing ink is 0.1-0.3 mg/ml, and the surfactant is potassium perfluorooctyl sulfonate. The surface tension in the process of volatilizing the liquid drop is controlled by adding the surfactant, the Marangoni flow is induced, the solute is promoted to crystallize in the center of the liquid drop, and an organic semiconductor single crystal film and an organic semiconductor are formed in the ink-jet printing inkThe semiconductor single crystal film has no crystal boundary and few defects, the performance of the prepared field effect transistor is improved, and the highest mobility is found to reach 1.57cm2V‑1s‑1。
Description
Technical Field
The invention belongs to the technical field of ink-jet printing, and particularly relates to ink-jet printing ink and application thereof in preparation of an organic semiconductor single crystal film.
Background
Organic semiconductor single crystals are ideal structures for charge transport, enabling the fabrication of high performance optoelectronic devices due to their long range order, fewer structural defects and higher mobility. The conventional methods for growing organic semiconductor single crystals such as drop casting, spin coating and dip coating cannot be used on a large scale in practical production. The ink-jet printing is a liquid-based, digital and non-contact direct patterning technology, and the drop-on-demand mode has the advantages of low cost and high material utilization efficiency. Over the last decade, inkjet printing has had great success in applications including Organic Field Effect Transistors (OFETs), Organic Light Emitting Diodes (OLEDs), biosensors and perovskite solar cells. However, there are still some problems in obtaining large-scale highly ordered organic single crystal arrays by inkjet printing, such as: during the volatilization process of the liquid drops, the coffee ring effect solute forms annular accumulation to form a discontinuous annular polycrystalline film, and the discontinuous annular polycrystalline film has crystal boundaries and a large number of defects, is not favorable for the transmission of current carriers, and reduces the performance of the device, such as mobility, contact resistance and the like.
Disclosure of Invention
In view of the deficiencies of the prior art, it is an object of the present invention to provide an ink for ink jet printing.
The invention also aims to provide application of the ink-jet printing ink in preparing the organic semiconductor single crystal film.
It is another object of the present invention to provide a field effect transistor prepared from the ink for ink jet printing.
It is another object of the present invention to provide the use of an ink for ink jet printing to improve the mobility of field effect transistors.
The purpose of the invention is realized by the following technical scheme.
The ink-jet printing ink is formed by mixing o-dichlorobenzene, isophorone, an organic semiconductor and a surfactant, wherein the volume ratio of the o-dichlorobenzene to the isophorone in the ink-jet printing ink is 3:1, the concentration of the organic semiconductor in the ink-jet printing ink is 2-3 mg/ml, the concentration of the surfactant in the ink-jet printing ink is 0.1-0.3 mg/ml, and the surfactant is potassium perfluorooctyl sulfonate.
In the technical scheme, the organic semiconductor is C8-BTBT.
The application of the ink-jet printing ink in preparing an organic semiconductor single crystal film.
In the technical scheme, the ink-jet printer is used for carrying out ink-jet printing on the substrate to obtain the organic semiconductor single-crystal film.
In the technical scheme, the thickness of the organic semiconductor single crystal film is 10-20 nm.
In the above technical scheme, the substrate is Si/SiO2And (3) a silicon wafer.
In the above technical scheme, the Si/SiO2The silicon chip is ultrasonically cleaned by deionized water, acetone and ethanol in sequence before use.
A field effect transistor prepared from an ink for ink jet printing.
Use of an ink for ink jet printing as described above to increase the mobility of a field effect transistor.
In the technical scheme, ink-jet printing is carried out on a substrate by using ink-jet printing ink to obtain an organic semiconductor single crystal film, the organic semiconductor single crystal film is made into a field effect transistor, and the highest mobility of the field effect transistor reaches 1.57cm2V-1s-1Average mobility 0.65cm2V-1s-1。
The surface tension of the ink-jet printing ink in the process of volatilizing liquid drops is controlled by adding the surfactant, the Marangoni flow is induced, the solute is promoted to crystallize in the centers of the liquid drops to form an organic semiconductor single crystal film, the organic semiconductor single crystal film has no crystal boundary and few defects, the performance of a prepared field effect transistor is improved, and the highest mobility is found to be 1.57cm2V-1s-1(average mobility 0.65 cm)2V-1s-1). The ink-jet printing ink makes it possible to manufacture high-performance flexible integrated circuits by ink-jet printing.
Drawings
Fig. 1 is an optical micrograph, in which fig. 1a is an optical micrograph of an organic semiconductor film obtained in example 1; FIG. 1b is an optical micrograph of an organic semiconductor film obtained in example 7; FIG. 1c is an optical micrograph of an organic semiconductor film obtained in example 8; FIG. 1d is an optical micrograph of an organic semiconductor film obtained in example 9; FIG. 1e is an optical micrograph of an organic semiconductor film obtained in example 12; FIG. 1f is an optical micrograph of an organic semiconductor film obtained in example 14;
FIG. 2 is a schematic flow diagram, wherein FIG. 2a is a schematic internal capillary flow diagram of a single solvent evaporation process; FIG. 2b is a schematic diagram of capillary flow and Marangoni flow inside the mixed solvent evaporation process; FIG. 2c is a schematic diagram of capillary flow and Marangoni flow during volatilization of a surfactant-containing mixed solvent; FIG. 2d is a schematic view of a single solvent evaporation deposition profile; FIG. 2e is a schematic view of a mixed solvent evaporation deposition profile; FIG. 2f is a schematic diagram of the mixed solvent evaporation deposition profile with added surfactant;
FIG. 3a is a graph of surface tension change versus different surfactant concentrations;
FIG. 3b is a bar graph of the drop surface tension difference;
FIG. 4 is a polarization microscope photograph, an X-ray diffraction chart and an atomic force microscope photograph of the organic semiconductor single crystal film, in which FIG. 4a is a polarization microscope photograph of the organic semiconductor single crystal film obtained in example 12; FIG. 4b is a polarizing microscope photograph showing the single-crystal organic semiconductor film obtained in example 12 rotated by 45 °; FIG. 4c is SiO2An out-of-plane X-ray diffraction pattern of the single-crystal organic semiconductor film obtained in example 12 on a Si substrate; FIG. 4d is an atomic force microscope photograph of a single-crystal organic semiconductor film obtained in example 12;
fig. 5 is a schematic structural diagram and a performance test chart of a bottom-gate top-contact transistor, wherein fig. 5a is a schematic structural diagram of a bottom-gate top-contact transistor, and an inset diagram is an actual diagram; FIG. 5b is a transfer curve for a bottom-gate top-contact transistor; FIG. 5c is a histogram of the mobility statistics for a bottom-gate top-contact transistor; fig. 5d is a graph of the output of a bottom-gate top-contact transistor.
Detailed Description
The technical scheme of the invention is further explained by combining specific examples.
The following examples relate to instruments and their types:
TABLE 1
The drugs and purities referred to in the following examples are:
TABLE 2
Examples 1 to 3 (comparative)
A printing ink is prepared by mixing o-dichlorobenzene (solvent) and an organic semiconductor, wherein the concentration of the organic semiconductor in the printing ink is shown in Table 3, and the organic semiconductor is C8-BTBT.
Examples 4 to 6 (comparative)
The printing ink is prepared by mixing o-dichlorobenzene (solvent), an organic semiconductor and a surfactant, wherein the concentration of the organic semiconductor and the concentration of the surfactant in the printing ink are shown in Table 3, the surfactant is potassium perfluorooctyl sulfonate, and the organic semiconductor is C8-BTBT.
Example 7 (comparative)
A printing ink is prepared by mixing isophorone (solvent) and an organic semiconductor, the concentration of the organic semiconductor in the printing ink is shown in Table 3, and the organic semiconductor is C8-BTBT.
Examples 8 to 10 (comparative)
The printing ink is prepared by mixing ortho-dichlorobenzene, isophorone and an organic semiconductor (ortho-dichlorobenzene and isophorone are used as solvents), wherein the organic semiconductor is C8-BTBT, and the concentration of the organic semiconductor and the volume ratio of the ortho-dichlorobenzene to the isophorone in the printing ink are shown in Table 3.
Examples 11 to 14
The ink for ink jet printing is prepared by mixing ortho-dichlorobenzene, isophorone, an organic semiconductor and a surfactant (the ortho-dichlorobenzene and the isophorone are used as solvents), the concentration of the organic semiconductor, the concentration of the surfactant and the volume ratio of the ortho-dichlorobenzene to the isophorone in the ink for ink jet printing are shown in Table 3, the surfactant is potassium perfluorooctyl sulfonate, and the organic semiconductor is C8-BTBT.
TABLE 3
Performing ink-jet printing on a substrate by using an ink-jet printer, and drying at room temperature and normal pressure to obtain an organic semiconductor film, wherein the ink-jet printing comprises the following specific steps: inserting ink into the cartridge>Selecting a print Pattern>Placing a print substrate and setting a substrate thickness —>Print settings (drop spacing, voltage, and waveform) —>And (7) printing. Wherein the substrate is Si/SiO2The ink used for ink-jet printing of the silicon wafer is one of the ink-jet printing inks and the printing inks in examples 1 to 14.
The above Si/SiO2The silicon wafer is 1.5cm multiplied by 1.0cm in size and 0.4mm in thickness, and is sequentially ultrasonically cleaned for 10min by deionized water, acetone and ethanol respectively before use and is dried for later use.
Fig. 1a is an optical micrograph of the organic semiconductor film obtained in example 1, and fig. 1b is an optical micrograph of the organic semiconductor film obtained in example 7, and it is seen that a ring-shaped deposition is evident in a single solvent evaporation process. Examples 2 to 5 showed a significant coffee ring phenomenon and formed a ring-like pile, similarly to the optical micrographs of examples 1 and 7.
FIG. 1c is an optical micrograph of an organic semiconductor film obtained in example 8; fig. 1d is an optical micrograph of the organic semiconductor film obtained in example 9. As can be seen from the figure, the mixed solvent of o-dichlorobenzene and isophorone significantly suppressed the coffee ring effect to give a relatively flat film, but formed an irregular polycrystalline film. Examples 6 and 10 were similar to the optical micrographs of examples 8 and 9, and formed discontinuous or irregular polycrystalline films.
FIG. 1e is an optical photomicrograph of an organic semiconductor film (organic semiconductor single-crystal film) obtained in example 12; fig. 1f is an optical micrograph of an organic semiconductor film (organic semiconductor single-crystal film) obtained in example 14. As can be seen from the figure, after the surfactant is added, the change of the surface tension in the volatilization process of the liquid drop is changed, the Magnus flow is promoted, the solute is driven to move to the center of the liquid drop, and the solute is promoted to crystallize in the center of the liquid drop, so that the single crystal film is obtained. Examples 11 and 13 were similar to the optical micrographs of example 14, and formed a relatively uniform and continuous single crystal film.
The schematic diagrams of the droplet evaporation process are shown in fig. 2 a-e. FIG. 2a is a schematic diagram of the internal capillary flow during single solvent evaporation. FIG. 2d is a schematic view of a single solvent evaporation deposition profile. The drop surface is a convex surface, and the solvent evaporation rate at the edge of the drop is faster than at the center, resulting in a radial capillary flow of the inner solution from the center to the edge to compensate for the solvent loss. As the solvent evaporates, capillary flow continuously transports small solute molecules from the center of the drop to the edge of the drop, where nucleation of crystals randomly occurs, which will affect the subsequent growth of the nuclei. And the solute is accumulated at the edge of the liquid drop, so that the edge of the liquid drop is pinned and fixed at a three-phase contact line to form a vicious circle, and the solute is further accumulated at the edge of the liquid drop. On the substrate surface, most small molecules accumulate at the droplet edges, which results in a high nucleation density at the droplet edges. Due to the lack of directional control, nucleation sites are randomly distributed at the edge of the droplet and grow continuously, forming a ring-shaped polycrystalline thin film with a very large defect density in a single solvent.
FIG. 2b is a schematic diagram of capillary flow and Marangoni flow inside the mixed solvent evaporation process. FIG. 2e is a schematic diagram of the mixed solvent evaporation deposition profile. O-dichlorobenzene is used as a low boiling point solvent, and isophorone is used as a high boiling point solvent. The ink-jet printing ink is a mixed solvent with low boiling point and high surface tension as a main solvent and high boiling point and low surface tension as a secondary solvent, and the solvent with high boiling point and low surface tension is left at the edge of a liquid drop because the solvent with low boiling point is volatilized quickly. Therefore, in the volatilization of the droplets of the mixed solvent, a difference in surface tension is generated between the edge and the center of the droplet surface, which causes an inward maraging flow against the capillary flow at the droplet surface. Although the maldistribution of solute is balanced by the marlagoni flow induced by the difference in surface tension, it still presents a band-like polycrystalline film.
FIG. 2c is a schematic diagram of capillary flow and Marangoni flow inside the surfactant-added solvent mixture during volatilization. FIG. 2f is a schematic diagram of the mixed solvent evaporation deposition morphology with the addition of the surfactant. By changing the surface tension of the droplets by introducing the fluorine-containing surfactant, as shown in fig. 3a, the fluorine-containing surfactant has stronger surface activity, and the surface tension of a common solvent (water, an organic solvent, or the like) can be reduced to about 18mN/m, and therefore, the use of the surfactant is more effective than the mixed solvent. In the process of volatilizing the liquid drops, the surfactant is added, so that the surface tension difference of the liquid drops can reach 18mN/m, the surface tension difference of the mixed solvent is only about 10mN/m, and stronger Marangoni flow is caused by the large surface tension difference, and the solute is driven to flow back to the center of the liquid drops for crystallization. In addition, the surface tension difference changes with the volatilization of the droplets. Compared with the mixed solvent, the surfactant can form surface tension difference more quickly in the early stage of volatilization, thereby reducing the possibility of crystallization and nucleation of solute at the edges of the liquid drops and promoting the formation of a single crystal film at the centers of the liquid drops.
The ortho-dichlorobenzene and the surfactant are uniformly mixed to obtain the ortho-dichlorobenzene mixed solvent, wherein the surfactant is perfluorooctyl potassium sulfonate (PFOS) or tetrabutyl ammonium bromide (TBAB), fig. 3a shows the relationship between the surface tension change of the ortho-dichlorobenzene mixed solvent and different surfactant concentrations, the surface tension of the ortho-dichlorobenzene mixed solvent is rapidly reduced along with the increase of the surfactant concentration, but when the surfactant concentration is more than 0.2mg/ml, the surface tension of the ortho-dichlorobenzene mixed solvent is basically unchanged, when the surfactant is tetrabutyl ammonium bromide (TBAB), the minimum surface tension after the TBAB is added is about 30mN/m, and when the surfactant is perfluorooctyl potassium sulfonate (PFOS), the minimum surface tension after the PFOS is added reaches about 18 mN/m.
Uniformly mixing ortho-dichlorobenzene and isophorone to obtain a mixed solvent, wherein the volume ratio of ortho-dichlorobenzene to isophorone is 3: 1; uniformly mixing ortho-dichlorobenzene, isophorone and potassium perfluorooctyl sulfonate to obtain a surfactant mixed solution, wherein the volume ratio of ortho-dichlorobenzene to isophorone is 3:1, the concentration of potassium perfluorooctyl sulfonate in the surfactant mixed solution is 0.2
mg/mL; according to FIG. 3a, the difference in surface tension of the droplets during the volatilization of the droplets of the mixed solution of o-dichlorobenzene, the mixed solvent and the surfactant can be obtained, as shown in FIG. 3b, the difference in surface tension of o-dichlorobenzene (single solvent in FIG. 3 b), the difference in surface tension of the mixed solvent of o-dichlorobenzene and isophorone is 10mN/m (mixed solvent in FIG. 3 b), and the difference in surface tension of the droplets of the mixed solution of the surfactant is 18mN/m (surfactant in FIG. 3 b).
As can be seen from fig. 3a and 3b, the addition of surfactant increases the surface tension difference, and the greater the surface tension difference, the more favorable the marangoni flow.
FIG. 4a is a polarization microscope photograph (polarization microscope photograph at 0 ℃) of the organic semiconductor single-crystal film obtained in example 12, and FIG. 4b is a polarization microscope photograph (polarization microscope photograph at 45 ℃) corresponding to the rotation of the organic semiconductor single-crystal film obtained in example 12 by 45 °. When the object stage is rotated, the brightness changes for four times when the object stage is rotated for 360 degrees, the object stage becomes dark once every 90 degrees, the object stage is completely extinguished after being rotated for 45 degrees, and most importantly, the color changes uniformly, so that the organic semiconductor single crystal film obtained by the invention is proved to be a complete single crystal film.
FIG. 4c is SiO2Out-of-plane X-ray diffraction (XRD) pattern of single-crystal film of C8-BTBT organic semiconductor obtained in example 12 on/Si substrate. As can be seen, the relatively smooth baseline and sharp diffraction indicate a highly ordered single crystal film. From the single crystal data simulation, the diffraction peak at 2 θ ═ 3 ° corresponds toIs similar to the theoretical length of C8-BTBT, and is well-distributed at the (001) diffraction peak. It was also observed that the temperature was at 6.1 ℃ andthe corresponding second and third diffraction peaks at 9.2 ° indicate that the ab plane of the C8-BTBT organic semiconductor single crystal film is parallel to the substrate, i.e. the C8-BTBT molecules stand obliquely on the substrate, facilitating the transport of carriers in the conduction channel.
FIG. 4d is an Atomic Force Microscope (AFM) view of the single-crystal organic semiconductor film obtained in example 12. As can be seen, the thickness of the organic semiconductor single crystal film was 10 to 15nm, indicating that there were three to five uniform single crystal films.
By using evaporated gold films as source and drain electrodes, SiO2The performance of the C8-BTBT organic semiconductor single crystal film was measured by constructing a Field Effect Transistor (FET) of a top contact/Bottom Gate (BGTC) structure with/Si as a dielectric layer/gate electrode (fig. 5 a). The preparation method of the field effect transistor comprises the following steps: 2 gold films were applied in parallel to the organic semiconductor single crystal film of example 12, and the 2 gold films were used as a source electrode and a drain electrode, respectively, with an aspect ratio of 8:1 and a gold film thickness of 150 nm.
All measurements were performed in an ambient air environment at room temperature of 20-25 ℃. As shown in FIG. 5b, the transfer and output curves of the FET exhibit ideal typical p-type semiconductor characteristics with an average on/off current ratio of 107(maximum ratio of 10)9) As shown in fig. 5b and 5 d. The highest mobility of the organic semiconductor single crystal film obtained in the saturated state under a bias of 60V was 1.57cm2V-1s-1Average mobility 0.65cm2V-1s-1(FIG. 5c), superior to most reported ink-jet printed single crystal semiconductor films.
In FIG. 5d, the source/drain current-voltage is shown by a slight nonlinearityThe dependence at low voltages, the injection barrier at the source/drain contact may still exist.
The invention has been described in an illustrative manner, and it is to be understood that any simple variations, modifications or other equivalent changes which can be made by one skilled in the art without departing from the spirit of the invention fall within the scope of the invention.
Claims (10)
1. The ink-jet printing ink is characterized by being formed by mixing o-dichlorobenzene, isophorone, an organic semiconductor and a surfactant, wherein the volume ratio of the o-dichlorobenzene to the isophorone in the ink-jet printing ink is 3:1, the concentration of the organic semiconductor in the ink-jet printing ink is 2-3 mg/ml, the concentration of the surfactant in the ink-jet printing ink is 0.1-0.3 mg/ml, and the surfactant is potassium perfluorooctyl sulfonate.
2. The ink jet printing ink of claim 1, wherein the organic semiconductor is C8-BTBT.
3. Use of the ink for ink-jet printing according to claim 1 or 2 for the preparation of an organic semiconductor single-crystal film.
4. Use according to claim 3, wherein the organic semiconductor single crystal film is obtained by ink-jet printing on a substrate using an ink-jet printer.
5. The use according to claim 4, wherein the thickness of the organic semiconductor single crystal film is 10 to 20 nm.
6. Use according to claim 4 or 5, wherein the substrate is Si/SiO2And (3) a silicon wafer.
7. Use according to claim 6, wherein the Si/SiO2The silicon chip is ultrasonically cleaned by deionized water, acetone and ethanol in sequence before use.
8. A field effect transistor prepared from the ink jet printing ink of claim 1.
9. Use of an ink jet printing ink as claimed in claim 1 for increasing the mobility of a field effect transistor.
10. Use according to claim 9, wherein the organic semiconductor single crystal film is formed into a field effect transistor having a maximum mobility of up to 1.57cm by ink-jet printing on a substrate with an ink-jet printing ink to obtain an organic semiconductor single crystal film2 V-1s-1Average mobility 0.65cm2 V-1s-1。
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CN114464762A (en) * | 2022-02-14 | 2022-05-10 | 中国科学院化学研究所 | Printing preparation method and application of single-orientation organic semiconductor crystal patterned array |
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