CN112178227A - Vacuum sealing valve for semiconductor wafer production - Google Patents

Vacuum sealing valve for semiconductor wafer production Download PDF

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Publication number
CN112178227A
CN112178227A CN202011045936.8A CN202011045936A CN112178227A CN 112178227 A CN112178227 A CN 112178227A CN 202011045936 A CN202011045936 A CN 202011045936A CN 112178227 A CN112178227 A CN 112178227A
Authority
CN
China
Prior art keywords
sealing
valve
section
arc
horizontal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202011045936.8A
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Chinese (zh)
Inventor
吴雅琪
赵明洋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ningbo Henghe Mould Co ltd
Original Assignee
Ningbo Henghe Mould Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ningbo Henghe Mould Co ltd filed Critical Ningbo Henghe Mould Co ltd
Priority to CN202011045936.8A priority Critical patent/CN112178227A/en
Publication of CN112178227A publication Critical patent/CN112178227A/en
Pending legal-status Critical Current

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/0281Guillotine or blade-type valves, e.g. no passage through the valve member
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00Construction of housing; Use of materials therefor
    • F16K27/04Construction of housing; Use of materials therefor of sliding valves
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/30Details
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00Actuating devices; Operating means; Releasing devices
    • F16K31/12Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston

Abstract

A vacuum sealing valve for semiconductor wafer production comprises a valve body, wherein a valve cavity is formed in the valve body, a first boss and a second boss are formed in the valve cavity, a channel opening is formed in the first boss, the first boss and the second boss are connected in a staggered mode and combined to form a first sealing ring surface, and the first sealing ring surface is annularly arranged on the periphery of the channel opening; the valve core plate is arranged in the valve body and comprises a first sealing part and a second sealing part, the second sealing part and the first sealing part are connected in a staggered mode and combined to form a second sealing ring surface, an annular sealing strip which is consistent with the second sealing ring surface in shape is wrapped outside the second sealing ring surface, and the annular sealing strip abuts against the first sealing ring surface during sealing; the valve core plate is connected with the valve core plate and drives the valve core plate to move up and down, so that the passage opening is opened and closed by the valve core plate. Through the staggered and vertical sealing structure, the sealing structure forms a complete closed loop, and the requirement of high vacuum degree of the valve during sealing is further ensured.

Description

Vacuum sealing valve for semiconductor wafer production
Technical Field
The invention relates to the field of valves, in particular to a vacuum sealing valve for semiconductor wafer production.
Background
The manufacturing level of the semiconductor integrated circuit industry is a main mark for measuring the high-precision technology level of the large country and is also important for the national security of China. At present, the international advanced chip manufacturing process enters the 5nm era from the 7nm era, and the international country with the America as the first international country implements technical blockade on China in the field of chip manufacturing, so that the international advanced chip manufacturing process becomes the 'bottleneck' problem in China, the passive position of China in the field of chip manufacturing is caused, and the chip manufacturing is a very complicated process and mainly comprises the processes and steps of wet washing, photoetching, dry etching, wet etching, plasma washing, heat treatment, annealing, vapor deposition, electroplating and the like. In the above processes, the wafer is transported in a vacuum environment in an ultra-clean overpressure protection gas environment, and needs to be completely isolated from an external environment to prevent the wafer from being polluted by particles, and emerging technologies in modern semiconductor industry, such as 3D NAND and multiple exposure technologies, need longer and more difficult etching processes, wherein most of the processes need high-performance vacuum valves, so the vacuum valves play an increasingly important role in semiconductor integrated circuit manufacturing.
The semiconductor manufacturing belongs to high-precision manufacturing, so that a vacuum valve for related products firstly needs to have extremely high processing flatness and precision to avoid possible problems in the installation and assembly processes; secondly, to improve the purity and quality of the ionized gas, the valve requires an extremely high vacuum (10)-9) The sealing of the valve is the most critical link; in addition, in the production process of the chip, the pollution of impurities can generate extremely harmful influence, and the integrated circuit chip can be scrapped due to the oxygen content below one millionth, so that the high cleanness of the valve needs to be ensured; finally, since semiconductor manufacturing equipment is very sophisticated and expensive, the life requirements of a valve often require more than a million cycles, and it is also extremely important how to design and evaluate the service life and stability of a valve body. At present, the products are internationally and all the timeMonopolized by the countries of the United states, Switzerland and the like, and kept the technology of China secret, and reports of successfully researching and developing related products are not found in China.
Disclosure of Invention
To overcome the above-mentioned deficiencies of the prior art, the present invention provides a vacuum tight valve for semiconductor wafer manufacturing.
The technical scheme for solving the technical problem is as follows: a vacuum sealing valve for semiconductor wafer production comprises a valve body arranged between an externally connected first plate body and a second plate body, wherein a valve cavity is formed in one side of the valve body, a first boss extending from inside to outside and a second boss extending from the outer end face of the first boss are formed in the valve cavity, a channel opening is formed in the first boss, the outer ring face of the first boss is connected with the outer ring face of the second boss in a staggered mode and combined to form a first sealing ring face, and the first sealing ring face is annularly arranged on the periphery of the channel opening;
the vacuum sealing valve also comprises a valve core plate which is arranged in the valve body and used for sealing the channel port, the valve core plate comprises a first sealing part and a second sealing part which extends outwards from the first sealing part, the outer annular surface of the second sealing part and the outer annular surface of the first sealing part are connected in a staggered manner and combined to form a second sealing annular surface, the second sealing annular surface is matched with the first sealing annular surface, an annular sealing strip with the same shape as the second sealing annular surface is wrapped outside the second sealing annular surface, and the annular sealing strip is abutted against the first sealing annular surface during sealing;
the vacuum sealing valve also comprises a driving mechanism, and the driving mechanism is connected with and drives the valve core plate to move up and down, so that the valve core plate can open and close the passage port.
Preferably, the first seal ring surface comprises a first horizontal seal surface section positioned at the upper end of the first boss, a first arc-shaped seal surface section positioned on the first boss and connected with the first horizontal seal surface section, a second horizontal seal surface section positioned at the upper end of the second boss, and a second arc-shaped seal surface section positioned on the second boss and connected with the second horizontal seal surface section, the first horizontal seal surface section and the second horizontal seal surface section are parallel to each other, and the first arc-shaped seal surface section is connected with the second arc-shaped seal surface section;
the annular sealing strip comprises a first horizontal sealing strip section positioned in the first sealing part, a first arc-shaped sealing strip section positioned in the first sealing part and connected with the first horizontal sealing strip section, a second horizontal sealing strip section positioned on the outer side of the second sealing part, and a second arc-shaped sealing strip section positioned on the second sealing part and connected with the second horizontal sealing strip section, wherein the first horizontal sealing strip section and the second horizontal sealing strip section are parallel to each other, and the first arc-shaped sealing strip section is connected with the second arc-shaped sealing strip section;
during sealing, the first horizontal sealing surface section is abutted with the first horizontal sealing strip section, the first arc-shaped sealing surface section is abutted with the first arc-shaped sealing strip section, the second horizontal sealing surface section is abutted with the second horizontal sealing strip section, and the second arc-shaped sealing surface section is abutted with the second arc-shaped sealing strip section.
Preferably, the first arc-shaped sealing strip section is smoothly connected with the second arc-shaped sealing strip section through an arc section.
Preferably, a plurality of sealing rubber sleeves are further arranged in the valve cavity, and the sealing rubber sleeves are opposite to and close to the second horizontal sealing surface section.
Preferably, the valve body is provided with a movable cavity for the valve core plate to move up and down, and the movable cavity is communicated with the valve cavity.
Preferably, the driving mechanism comprises two driving cylinders symmetrically arranged by taking the valve core plate as a center, two guide seats connected with the two driving cylinders, a connecting plate connected with the two guide seats and horizontally arranged, and two sliders arranged at the lower end of the connecting plate, wherein the two sliders are respectively connected to two sides of the valve core plate.
Preferably, a linear bearing is arranged in the guide seat.
Preferably, a baffle plate for closing the valve cavity is further arranged on the side face of the valve body.
Preferably, a first sealing ring is arranged between the external first plate body and the valve body, a second sealing ring is arranged between the baffle plate and the valve body, and a third sealing ring is arranged between the baffle plate and the external second plate body.
Preferably, the valve core plate is made of aluminum metal.
The invention has the beneficial effects that: 1. this vacuum seal valve offsets with first sealed anchor ring through the annular sealing strip on the case board and forms seal structure, because the case board is through actuating mechanism up-and-down motion, so the cooperation annular sealing strip makes its extrusion through the sealed of vertical extrusion formula on first sealed anchor ring perpendicularly, and then guarantees stability and the persistence when sealed. 2. And the annular sealing strip and the first sealing ring surface are arranged in a staggered manner, namely, two staggered and parallel sealing surfaces (namely, a first horizontal sealing surface section and a second horizontal sealing surface section, and a first horizontal sealing strip section and a second horizontal sealing strip section which are matched with each other) are arranged, and the sealing structure forms a complete closed loop through the staggered and vertical sealing structure, so that the requirement of high vacuum degree of the valve during sealing is further ensured.
Drawings
Fig. 1 is an exploded view of the present invention.
Fig. 2 is a structural view of the valve body of the present invention.
Fig. 3 is a structural view of the valve core plate of the present invention.
Fig. 4 is a top view of the overall structure of the present invention.
Fig. 5 is a cross-sectional view a-a of fig. 4 of the present invention.
Fig. 6 is a cross-sectional view B-B of fig. 4 of the present invention.
Fig. 7 is an enlarged view C of fig. 6 of the present invention.
Fig. 8 is a state view of the vacuum sealing valve of the present invention when it is opened.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
Referring to fig. 1 to 8, a vacuum sealing valve for semiconductor wafer production includes a valve body 3 disposed between an external first plate 1 and an external second plate 2, a valve cavity 4 is disposed on one side of the valve body 3, a first boss 5 extending from inside to outside and a second boss 6 extending outward from an outer end surface of the first boss 5 are formed in the valve cavity 4, and thus the first boss 5 and the second boss 6 form a staggered and abutting structure to facilitate subsequent dual closed-loop sealing. The valve is characterized in that a channel opening 7 is formed in the first boss 5, the main function of the valve is to close the channel opening 7 so as to ensure the vacuum degree of equipment, the outer ring surface of the first boss 5 and the outer ring surface of the second boss 6 are connected in a staggered mode and combined to form a first sealing ring surface 8, and the first sealing ring surface 8 is annularly arranged around the channel opening 7, so that when the first sealing ring surface 8 is closed, the channel opening 7 can be sealed;
the vacuum sealing valve also comprises a valve core plate 9 which is arranged in the valve body 3 and used for sealing the passage opening 7, and the valve core plate 9 is a main sealing structure and plays a role in sealing the passage opening 7. The valve core plate 9 comprises a first sealing part 10 and a second sealing part 11 extending outwards from the first sealing part 10, the outer annular surface of the second sealing part 11 and the outer annular surface of the first sealing part 10 are connected in a staggered manner and combined to form a second sealing annular surface 12, the second sealing annular surface 12 is matched with the first sealing annular surface 8, an annular sealing strip 13 with the same shape is wrapped outside the second sealing annular surface 12, and the annular sealing strip 13 is abutted against the first sealing annular surface 8 during sealing;
and the vacuum sealing valve also comprises a driving mechanism 14, and the driving mechanism 14 is connected with and drives the valve core plate 9 to move up and down, so that the opening and closing of the passage opening 7 by the valve core plate 9 are realized.
To sum up, the vacuum sealing valve is a sealing structure formed by the fact that the annular sealing strip 13 on the valve core plate 9 abuts against the first sealing ring surface 8, and the valve core plate 9 moves up and down through the driving mechanism 14, so that the annular sealing strip 13 is matched to vertically extrude the valve core plate on the first sealing ring surface 8, namely, the valve core plate is sealed through vertical extrusion, and stability and durability during sealing are further guaranteed. Meanwhile, the annular sealing strips 13 and the first sealing ring surface 8 are arranged in a staggered mode, namely two vertical extrusion type sealing structures are arranged, so that the sealing structures form a complete closed ring, and the requirement of high vacuum degree of the valve during sealing is further met.
Specifically, the first seal ring surface 8 includes a first horizontal seal surface section 15 located at the upper end of the first boss 5, a first arc-shaped seal surface section 16 located on the first boss 5 and connected to the first horizontal seal surface section 15, a second horizontal seal surface section 17 located at the upper end of the second boss 6, and a second arc-shaped seal surface section 18 located on the second boss 6 and connected to the second horizontal seal surface section 17, wherein the first horizontal seal surface section 15 and the second horizontal seal surface section 17 are parallel to each other, so that the staggered arrangement is ensured, a closed-loop seal structure is formed, and the horizontal arrangement is ensured, so that the whole matched seal surface sections are better abutted to form a seal, and meanwhile, a vertical extrusion type seal structure is ensured, and a seal effect is ensured. The first arc-shaped sealing surface section 16 is connected with the second arc-shaped sealing surface section 18, so that each sealing surface section forms a complete first sealing ring surface 8, the closed-loop sealing of the channel opening 7 is further ensured, and the sealing effect is ensured;
the annular sealing strip 13 comprises a first horizontal sealing strip section 19 located in the first sealing portion 10, a first arc-shaped sealing strip section 20 located in the first sealing portion 10 and connected with the first horizontal sealing strip section 19, a second horizontal sealing strip section 21 located on the outer side of the second sealing portion 9, and a second arc-shaped sealing strip section 22 located on the second sealing portion 9 and connected with the second horizontal sealing strip section 20, wherein the first horizontal sealing strip section 19 and the second horizontal sealing strip section 21 are parallel to each other, so that staggered arrangement is guaranteed, a closed sealing structure is formed by matching with the first sealing ring surface 8, horizontal arrangement is guaranteed, sealing can be formed by better abutting the matched sealing strip sections, a vertical extrusion type sealing structure can be guaranteed, and a sealing effect is guaranteed. And the first arc-shaped sealing strip section 20 is connected with the second arc-shaped sealing strip section 22, so that the annular sealing strip 13 forms a whole, and further, the closed-loop integral sealing with the first sealing ring surface 8 is ensured, and the sealing effect is ensured.
Through the specific structure, in the sealing process of the embodiment, the first horizontal sealing surface section 15 abuts against the first horizontal sealing strip section 19, the first arc-shaped sealing surface section 16 abuts against the first arc-shaped sealing strip section 20, the second horizontal sealing surface section 17 abuts against the second horizontal sealing strip section 21, and the second arc-shaped sealing surface section 18 abuts against the second arc-shaped sealing strip section 22, so that the vertical extrusion type integral closed-loop sealing is realized through the mutual matching of the sealing surface sections and the sealing strip sections, and the sealing stability and the sealing durability are ensured.
Preferably, the first arc-shaped sealing strip section 20 and the second arc-shaped sealing strip section 22 are smoothly connected through an arc section 23, and the annular sealing strip 13 is internally provided with the first horizontal sealing strip section 19 and the second horizontal sealing strip section 21 which are staggered, so that the overall smoothness of the annular sealing strip 13 is ensured through the arc section 23, a stable closed-loop sealing structure can be realized, and the stability and the durability of the sealing to the first sealing ring surface 8 are further ensured.
In this embodiment, a plurality of sealing rubber sleeves 24 are further disposed in the valve cavity 4, and the sealing rubber sleeves 24 are opposite to and close to the second horizontal sealing surface section 17. Second horizontal seal strip section 21 that second horizontal seal face section 17 corresponds receives can the skew backward after long-time extrusion and makes and produce the gap between second horizontal seal strip section 21 and the second horizontal seal face section 17, and then leads to sealed inefficacy, and the design through sealed gum cover 24, can play the effect that prevents this second horizontal seal strip section 21 outside skew, and then make second horizontal seal strip section 21 offset with second horizontal seal face section 17 all the time, guarantee sealed persistence and stability.
In this embodiment, the valve body 3 is provided with a movable cavity 25 for the valve core plate 9 to move up and down, and the movable cavity 25 is communicated with the valve cavity 4. The valve core plate 9 can move up and down along the movable cavity 25 to open and close the passage opening 7, and the valve core plate 9 is matched with the movable cavity 25 so as to position and guide the valve core plate 9.
In this embodiment, the driving mechanism 14 includes two driving cylinders 26 symmetrically disposed about the valve core plate 9, two guide seats 27 connected to the two driving cylinders 26, a connecting plate 28 horizontally disposed and connected to the two guide seats 27, and two sliders 29 disposed at a lower end of the connecting plate 28, wherein the two sliders 29 are respectively connected to two sides of the valve core plate 9. When in use, the two driving cylinders 26 sequentially drive the guide seat 27, the connecting plate 28 and the two sliders 29, and finally the valve core plate 9 is driven to move up and down.
Preferably, a linear bearing 30 is arranged in the guide seat 27. Because the two driving cylinders 26 simultaneously drive the driving mechanism 14 to realize the up-and-down movement of the valve core plate 9, the two driving cylinders 26 must be ensured to synchronously move, and the valve core plate 9 is inclined in slightly different steps, so that the sealing is invalid, and the design of the synchronous bearing 30 ensures the stability and consistency when the acting force is transmitted, and simultaneously ensures the long-term use of the driving mechanism 14.
In this embodiment, the side surface of the valve body 3 is further provided with a baffle 31 for closing the valve cavity 4. Therefore, the baffle 31 can prevent the external environment from influencing the sealing structure in the valve cavity 4, and the sealing is disabled.
In this embodiment, a first sealing ring 32 is disposed between the external first plate 1 and the valve body 3, a second sealing ring 33 is disposed between the baffle plate 31 and the valve body 3, and a third sealing ring 33 is disposed between the baffle plate 31 and the external second plate 2. Thereby guarantee the leakproofness between first plate body 1 and the valve body 3, between baffle 31 and the valve body 3 and between baffle 31 and the external second plate body 2 through the design of above-mentioned each sealing washer, guarantee the stable seal between equipment and the valve.
In this embodiment, the valve core plate 9 is made of aluminum. Compare because the aluminium metal is light metal, the quality is lighter relatively to the accuracy nature of the up-and-down motion position of aluminium material case board 9 is controlled more easily, has better corrosion resistance simultaneously, adapts to comparatively complicated operational environment, has the formability simultaneously, guarantees that this case board 9 forms a crooked closed loop structure.
The above embodiment is only one of the preferable embodiments of the present patent, and any changes made without departing from the scope of the present patent are within the scope of the present patent.

Claims (10)

1. A vacuum sealing valve for semiconductor wafer production, comprising: the valve comprises a valve body arranged between an externally connected first plate body and a second plate body, wherein a valve cavity is formed in one side of the valve body, a first boss extending from inside to outside and a second boss extending outwards from the outer end face of the first boss are formed in the valve cavity, a channel opening is formed in the first boss, the outer ring face of the first boss and the outer ring face of the second boss are connected in a staggered mode and combined to form a first sealing ring face, and the first sealing ring face is annularly arranged on the periphery of the channel opening;
the vacuum sealing valve also comprises a valve core plate which is arranged in the valve body and used for sealing the channel port, the valve core plate comprises a first sealing part and a second sealing part which extends outwards from the first sealing part, the outer annular surface of the second sealing part and the outer annular surface of the first sealing part are connected in a staggered manner and combined to form a second sealing annular surface, the second sealing annular surface is matched with the first sealing annular surface, an annular sealing strip with the same shape as the second sealing annular surface is wrapped outside the second sealing annular surface, and the annular sealing strip is abutted against the first sealing annular surface during sealing;
the vacuum sealing valve also comprises a driving mechanism, and the driving mechanism is connected with and drives the valve core plate to move up and down, so that the valve core plate can open and close the passage port.
2. The vacuum sealing valve for semiconductor wafer production as claimed in claim 1, wherein: the first sealing ring surface comprises a first horizontal sealing surface section positioned at the upper end of the first boss, a first arc-shaped sealing surface section positioned on the first boss and connected with the first horizontal sealing surface section, a second horizontal sealing surface section positioned at the upper end of the second boss, and a second arc-shaped sealing surface section positioned on the second boss and connected with the second horizontal sealing surface section, the first horizontal sealing surface section and the second horizontal sealing surface section are parallel to each other, and the first arc-shaped sealing surface section is connected with the second arc-shaped sealing surface section;
the annular sealing strip comprises a first horizontal sealing strip section positioned in the first sealing part, a first arc-shaped sealing strip section positioned in the first sealing part and connected with the first horizontal sealing strip section, a second horizontal sealing strip section positioned on the outer side of the second sealing part, and a second arc-shaped sealing strip section positioned on the second sealing part and connected with the second horizontal sealing strip section, wherein the first horizontal sealing strip section and the second horizontal sealing strip section are parallel to each other, and the first arc-shaped sealing strip section is connected with the second arc-shaped sealing strip section;
during sealing, the first horizontal sealing surface section is abutted with the first horizontal sealing strip section, the first arc-shaped sealing surface section is abutted with the first arc-shaped sealing strip section, the second horizontal sealing surface section is abutted with the second horizontal sealing strip section, and the second arc-shaped sealing surface section is abutted with the second arc-shaped sealing strip section.
3. The vacuum sealing valve for semiconductor wafer production as claimed in claim 2, wherein: the first arc-shaped sealing strip section is smoothly connected with the second arc-shaped sealing strip section through an arc section.
4. The vacuum sealing valve for semiconductor wafer production as claimed in claim 3, wherein: and a plurality of sealing rubber sleeves are arranged in the valve cavity and are opposite to and close to the second horizontal sealing surface section.
5. The vacuum sealing valve for semiconductor wafer production as claimed in claim 1, wherein: the valve body is provided with a movable cavity for the valve core plate to move up and down, and the movable cavity is communicated with the valve cavity.
6. The vacuum sealing valve for semiconductor wafer production as claimed in claim 1, wherein: the driving mechanism comprises two driving cylinders which are symmetrically arranged by taking the valve core plate as a center, two guide seats connected with the two driving cylinders, a connecting plate which is connected with the two guide seats and is horizontally arranged, and two pull heads arranged at the lower end of the connecting plate, wherein the two pull heads are respectively connected to two sides of the valve core plate.
7. The vacuum sealing valve for semiconductor wafer production as claimed in claim 6, wherein: and a linear bearing is arranged in the guide seat.
8. The vacuum sealing valve for semiconductor wafer production as claimed in claim 1, wherein: and a baffle plate for sealing the valve cavity is also arranged on the side surface of the valve body.
9. The vacuum sealing valve for semiconductor wafer production as claimed in claim 8, wherein: be equipped with first sealing washer between external first plate body and the valve body, baffle and valve body between be equipped with the second sealing washer, baffle and external second plate body between be equipped with the third sealing washer.
10. The vacuum sealing valve for semiconductor wafer production as claimed in claim 1, wherein: the valve core plate is made of aluminum metal.
CN202011045936.8A 2020-09-29 2020-09-29 Vacuum sealing valve for semiconductor wafer production Pending CN112178227A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202011045936.8A CN112178227A (en) 2020-09-29 2020-09-29 Vacuum sealing valve for semiconductor wafer production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202011045936.8A CN112178227A (en) 2020-09-29 2020-09-29 Vacuum sealing valve for semiconductor wafer production

Publications (1)

Publication Number Publication Date
CN112178227A true CN112178227A (en) 2021-01-05

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202011045936.8A Pending CN112178227A (en) 2020-09-29 2020-09-29 Vacuum sealing valve for semiconductor wafer production

Country Status (1)

Country Link
CN (1) CN112178227A (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0258475A1 (en) * 1986-09-02 1988-03-09 Perkin-Elmer-Metco Gmbh Vacuum sliding valve
US20080083897A1 (en) * 2005-07-18 2008-04-10 G-Light Display Corp. Vacuum Gate
WO2009130995A1 (en) * 2008-04-22 2009-10-29 シャープ株式会社 Gate valve and vacuum device using the same
EP2224153A1 (en) * 2009-02-25 2010-09-01 VAT Holding AG Vacuum double gate valve
WO2012022565A1 (en) * 2010-08-16 2012-02-23 Vat Holding Ag Vacuum valve and closure element for gas-tight sealing of a flow path by means of a linear displacement
WO2012126704A1 (en) * 2011-03-18 2012-09-27 Vat Holding Ag Vacuum valve for the gas-tight closure of a flow path by means of a linear movement of a closure element
EP2551565A1 (en) * 2011-07-28 2013-01-30 VAT Holding AG Vacuum valve and locking link for gas-tight closing of a flow path using a linear movement

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0258475A1 (en) * 1986-09-02 1988-03-09 Perkin-Elmer-Metco Gmbh Vacuum sliding valve
US20080083897A1 (en) * 2005-07-18 2008-04-10 G-Light Display Corp. Vacuum Gate
WO2009130995A1 (en) * 2008-04-22 2009-10-29 シャープ株式会社 Gate valve and vacuum device using the same
EP2224153A1 (en) * 2009-02-25 2010-09-01 VAT Holding AG Vacuum double gate valve
WO2012022565A1 (en) * 2010-08-16 2012-02-23 Vat Holding Ag Vacuum valve and closure element for gas-tight sealing of a flow path by means of a linear displacement
WO2012126704A1 (en) * 2011-03-18 2012-09-27 Vat Holding Ag Vacuum valve for the gas-tight closure of a flow path by means of a linear movement of a closure element
EP2551565A1 (en) * 2011-07-28 2013-01-30 VAT Holding AG Vacuum valve and locking link for gas-tight closing of a flow path using a linear movement
US20140158924A1 (en) * 2011-07-28 2014-06-12 Vat Holding Ag Vacuum valve and closure member for closing a flow path in a gas-tight manner by means of a linear movement

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Application publication date: 20210105

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