CN112162395A - 一种深紫外斜入射高分辨率暗场照明光学系统 - Google Patents
一种深紫外斜入射高分辨率暗场照明光学系统 Download PDFInfo
- Publication number
- CN112162395A CN112162395A CN202011162660.1A CN202011162660A CN112162395A CN 112162395 A CN112162395 A CN 112162395A CN 202011162660 A CN202011162660 A CN 202011162660A CN 112162395 A CN112162395 A CN 112162395A
- Authority
- CN
- China
- Prior art keywords
- lens
- light
- objective lens
- light source
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 117
- 238000005286 illumination Methods 0.000 title claims abstract description 31
- 230000005855 radiation Effects 0.000 claims abstract description 20
- 230000004075 alteration Effects 0.000 claims description 23
- 238000003384 imaging method Methods 0.000 claims description 12
- 210000001747 pupil Anatomy 0.000 claims description 11
- 230000005540 biological transmission Effects 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 230000000694 effects Effects 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 230000010287 polarization Effects 0.000 claims description 4
- 238000002310 reflectometry Methods 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000005350 fused silica glass Substances 0.000 claims description 2
- 229910052594 sapphire Inorganic materials 0.000 claims description 2
- 239000010980 sapphire Substances 0.000 claims description 2
- 238000001514 detection method Methods 0.000 abstract description 19
- 238000010586 diagram Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 8
- 238000012546 transfer Methods 0.000 description 6
- 230000007547 defect Effects 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 206010010071 Coma Diseases 0.000 description 3
- 201000009310 astigmatism Diseases 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000013041 optical simulation Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
- G02B21/08—Condensers
- G02B21/10—Condensers affording dark-field illumination
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/16—Microscopes adapted for ultraviolet illumination ; Fluorescence microscopes
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202011162660.1A CN112162395A (zh) | 2020-10-27 | 2020-10-27 | 一种深紫外斜入射高分辨率暗场照明光学系统 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202011162660.1A CN112162395A (zh) | 2020-10-27 | 2020-10-27 | 一种深紫外斜入射高分辨率暗场照明光学系统 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN112162395A true CN112162395A (zh) | 2021-01-01 |
Family
ID=73864749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202011162660.1A Pending CN112162395A (zh) | 2020-10-27 | 2020-10-27 | 一种深紫外斜入射高分辨率暗场照明光学系统 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112162395A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113092483A (zh) * | 2021-04-02 | 2021-07-09 | 常州雷射激光设备有限公司 | 一种基于深紫外线光斑照明的倾斜物体成像系统 |
CN116661119A (zh) * | 2023-05-31 | 2023-08-29 | 之江实验室 | 基于干涉散射和暗场照明的双模态显微成像装置和方法 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050046842A1 (en) * | 2000-05-15 | 2005-03-03 | Craig Uhrich | Refractive focusing element for spectroscopic ellipsometry |
CN101069115A (zh) * | 2004-04-16 | 2007-11-07 | 奥本大学 | 显微镜照明装置及其适配器 |
CN101595414A (zh) * | 2006-09-14 | 2009-12-02 | 珀金埃尔默新加坡私人有限公司 | 扫描共焦显微术中的改进以及与之相关的改进 |
CN102436152A (zh) * | 2011-12-22 | 2012-05-02 | 北京理工大学 | 一种深紫外光刻照明系统 |
CN103038691A (zh) * | 2009-12-22 | 2013-04-10 | 张渺 | 一个提高成像系统图像分辨率的方法和系统 |
CN204439923U (zh) * | 2015-03-05 | 2015-07-01 | 北京大学 | 一种暗场显微镜 |
CN108803066A (zh) * | 2014-02-12 | 2018-11-13 | 科磊股份有限公司 | 多点扫描收集光学器件 |
CN109143562A (zh) * | 2018-09-12 | 2019-01-04 | 苏州大学 | 一种基于变焦原理的可变光片照明系统 |
CN109343226A (zh) * | 2018-11-22 | 2019-02-15 | 常州英诺激光科技有限公司 | 一种将激光光斑转化成均匀线列光斑的光学系统 |
CN111812831A (zh) * | 2014-08-06 | 2020-10-23 | 卡尔蔡司显微镜有限责任公司 | 具有在至少两个波长范围之间的区分功能的高分辨率扫描显微术 |
-
2020
- 2020-10-27 CN CN202011162660.1A patent/CN112162395A/zh active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050046842A1 (en) * | 2000-05-15 | 2005-03-03 | Craig Uhrich | Refractive focusing element for spectroscopic ellipsometry |
CN101069115A (zh) * | 2004-04-16 | 2007-11-07 | 奥本大学 | 显微镜照明装置及其适配器 |
CN101595414A (zh) * | 2006-09-14 | 2009-12-02 | 珀金埃尔默新加坡私人有限公司 | 扫描共焦显微术中的改进以及与之相关的改进 |
CN103038691A (zh) * | 2009-12-22 | 2013-04-10 | 张渺 | 一个提高成像系统图像分辨率的方法和系统 |
CN102436152A (zh) * | 2011-12-22 | 2012-05-02 | 北京理工大学 | 一种深紫外光刻照明系统 |
CN108803066A (zh) * | 2014-02-12 | 2018-11-13 | 科磊股份有限公司 | 多点扫描收集光学器件 |
CN111812831A (zh) * | 2014-08-06 | 2020-10-23 | 卡尔蔡司显微镜有限责任公司 | 具有在至少两个波长范围之间的区分功能的高分辨率扫描显微术 |
CN204439923U (zh) * | 2015-03-05 | 2015-07-01 | 北京大学 | 一种暗场显微镜 |
CN109143562A (zh) * | 2018-09-12 | 2019-01-04 | 苏州大学 | 一种基于变焦原理的可变光片照明系统 |
CN109343226A (zh) * | 2018-11-22 | 2019-02-15 | 常州英诺激光科技有限公司 | 一种将激光光斑转化成均匀线列光斑的光学系统 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113092483A (zh) * | 2021-04-02 | 2021-07-09 | 常州雷射激光设备有限公司 | 一种基于深紫外线光斑照明的倾斜物体成像系统 |
CN116661119A (zh) * | 2023-05-31 | 2023-08-29 | 之江实验室 | 基于干涉散射和暗场照明的双模态显微成像装置和方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Hoffnagle et al. | Beam shaping with a plano-aspheric lens pair | |
US11054627B2 (en) | Four-dimensional multi-plane broadband imaging system based on non-reentry quadratically distorted (NRQD) grating and grism | |
CN112162395A (zh) | 一种深紫外斜入射高分辨率暗场照明光学系统 | |
CN111221122B (zh) | 较大视场强容差超分辨望远成像系统设计方法 | |
CN109239897A (zh) | 一种离轴三反无焦光学系统 | |
US20210389229A1 (en) | Optical system and flow cytometer | |
WO2014100480A1 (en) | Generating an array of spots on inclined surfaces | |
US7692867B2 (en) | Enhanced parfocality | |
JP2002258153A (ja) | 高い開口数の対物レンズ組み立て品 | |
CN212364709U (zh) | 一种大视场长焦距离轴三反式平行光管光学系统 | |
CN113311573A (zh) | 包含一个非球面折反射全景成像光学系统 | |
Sagan | Optical systems for laser scanners | |
CN114185152B (zh) | 一种用于飞点扫描干涉仪的像方远心物镜 | |
CN113433678B (zh) | 一种色散物镜光路结构 | |
CN113607385A (zh) | 一种用于拼接主镜光学系统子镜间位置误差检测系统 | |
US2683393A (en) | Reflecting objective for microscopes | |
CN113092483B (zh) | 一种基于深紫外线光斑照明的倾斜物体成像系统 | |
JP2008536166A (ja) | 非球面を使用した小型で超高naの反射屈折対物レンズ | |
CN218675673U (zh) | 一种高轴向分辨率的线性色散物镜装置 | |
Saha et al. | Wavefront sensing of x-ray telescopes | |
CN218298637U (zh) | 物镜以及光学系统 | |
CN220853866U (zh) | 一种体相位全息透射式光栅光谱仪 | |
US9170414B2 (en) | Method and apparatus for producing a super-magnified wide-field image | |
CN209961682U (zh) | 宽谱边缘能量提升装置 | |
RU220310U1 (ru) | Зеркально-линзовый объектив |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20210311 Address after: 210000 no.4-605-209, Yintan wenchuangyuan, 88 Yapeng Road, Jiangxinzhou street, Jianye District, Nanjing City, Jiangsu Province Applicant after: Nanjing sumicos Semiconductor Equipment Co.,Ltd. Address before: Room 101, building 5, Changzhou inspection and testing industrial park, Tianning District, Changzhou City, Jiangsu Province 213000 Applicant before: Jiangsu sumicos Semiconductor Equipment Co.,Ltd. |
|
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20211122 Address after: 230088 d8-2256, phase I, innovation industrial park, No. 800, Wangjiang West Road, high tech Zone, Hefei, Anhui Province Applicant after: Hefei Nanuo Semiconductor Co.,Ltd. Address before: 210000 no.4-605-209, Yintan wenchuangyuan, 88 Yapeng Road, Jiangxinzhou street, Jianye District, Nanjing City, Jiangsu Province Applicant before: Nanjing sumicos Semiconductor Equipment Co.,Ltd. |
|
TA01 | Transfer of patent application right | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20210101 |
|
WD01 | Invention patent application deemed withdrawn after publication |