CN112160017A - Continuous purifier of plating bath - Google Patents
Continuous purifier of plating bath Download PDFInfo
- Publication number
- CN112160017A CN112160017A CN202011142310.9A CN202011142310A CN112160017A CN 112160017 A CN112160017 A CN 112160017A CN 202011142310 A CN202011142310 A CN 202011142310A CN 112160017 A CN112160017 A CN 112160017A
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- CN
- China
- Prior art keywords
- tank
- plating solution
- activated carbon
- carbon adsorption
- electrolytic
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/06—Filtering particles other than ions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
Abstract
The invention discloses a continuous plating solution purifying device, which comprises a plating solution storage tank, a dosing tank, an electrolytic tank, a primary activated carbon adsorption tank and a secondary activated carbon adsorption tank; a first liquid inlet is formed in the side wall of the chemical feeding groove and is communicated with the plating solution storage groove through a flow-in pipeline, and a filtering device is arranged on the flow-in pipeline; an electrode group for electrolytic impurity removal is arranged in the electrolytic cell; be provided with first overflow mouth on the lateral wall of secondary activated carbon adsorption groove, first overflow mouth is through outflow pipeline and plating bath hold up tank intercommunication. The invention effectively improves the purity of the plating solution, and avoids production delay caused by stopping the electroplating process when the plating solution is purified, thereby improving the production efficiency.
Description
Technical Field
The invention relates to the field of electroplating equipment, in particular to a continuous purifying device for plating solution.
Background
High-speed plate electroplating is one of electroplating industries, and gradually occupies an important position due to the advantages of high linear speed, high productivity, low cost and the like, the high-speed electroplating generally needs to realize the circulation of a plating solution of continuous electroplating by using a storage tank and an electroplating tank in a mutual circulation manner, the traditional rack plating and barrel plating can carry out electroplating operation only by using the electroplating tank, but the electroplating solution needs to be purified no matter the continuous electroplating or the rack plating is carried out, the purification treatment of the traditional rack plating solution is usually intermittent operation, and the solution of the electroplating tank is filtered, electrolyzed, adsorbed by activated carbon and the like by using production stop gaps.
Disclosure of Invention
The invention aims to provide a plating solution continuous purification device, which solves the problem that plating solution purification equipment in the prior art cannot continuously purify and treat plating solution.
In order to solve the technical problems, the invention adopts the following technical scheme:
the invention relates to a continuous plating solution purifying device, which comprises a plating solution storage tank, a dosing tank, an electrolytic tank, a primary activated carbon adsorption tank and a secondary activated carbon adsorption tank;
the chemical feeding tank, the electrolytic tank, the primary activated carbon adsorption tank and the secondary activated carbon adsorption tank are communicated in sequence according to a purification process and are higher than the plating solution storage tank;
a first liquid inlet is formed in the side wall of the chemical feeding groove and is communicated with the plating solution storage groove through a flowing-in pipeline, and a filtering device is arranged on the flowing-in pipeline;
an electrode group for electrolytic impurity removal is arranged in the electrolytic cell;
be provided with first overflow mouth on the lateral wall of secondary activated carbon adsorption groove, first overflow mouth through the outflow pipeline with plating bath hold up tank intercommunication.
Further, the dosing tank, the electrolytic tank, the primary activated carbon adsorption tank and the secondary activated carbon adsorption tank are arranged into an integral structure;
a second liquid inlet is formed in the bottom of the partition plate between the dosing tank and the electrolytic tank;
a second overflow port is formed in the top of the partition plate between the electrolytic tank and the primary activated carbon adsorption tank;
and a third liquid inlet is formed in the bottom of the partition plate between the primary activated carbon adsorption tank and the secondary activated carbon adsorption tank.
Further, the electrode group includes an anode plate using a nickel plate, and a cathode plate using an iron plate.
Further, the plating solution storage tank is arranged to be an underground tank.
Furthermore, the plating solution storage tank, the dosing tank, the electrolytic tank, the primary activated carbon adsorption tank and the secondary activated carbon adsorption tank are all formed by welding PP plates.
Further, a Ph electrode probe is arranged in the plating solution storage tank.
Compared with the prior art, the invention has the beneficial technical effects that:
according to the automatic-adjustment continuous purification device for the plating solution, the plating solution is lifted from the storage tank to the chemical adding tank, the electrolytic tank and the active carbon adsorption tank through the filtering device, so that the plating solution is subjected to filtering, chemical adding adjustment, electrolytic impurity removal and active carbon adsorption system treatment, and the purpose of stable and continuous purification is achieved.
Drawings
The invention is further illustrated in the following description with reference to the drawings.
FIG. 1 is a schematic structural view of a continuous plating solution purification apparatus according to the present invention.
Description of reference numerals: 1. a plating solution storage tank; 2. a medicine feeding groove; 3. an electrolytic cell; 4. a primary activated carbon adsorption tank; 5. a secondary activated carbon adsorption tank; 6. a first liquid inlet; 7. flowing into a pipeline; 8. a filtration device; 9. a first overflow port; 10. an outflow conduit; 11. a second liquid inlet; 12. a second overflow port; 13. a third liquid inlet; 14. a Ph electrode probe.
Detailed Description
In order to make the technical solutions of the present invention better understood by those skilled in the art, the present invention will be further described in detail with reference to the accompanying drawings and the detailed description.
As shown in fig. 1, the present embodiment discloses a continuous purification apparatus for plating solution, which comprises a plating solution storage tank 1, a chemical feeding tank 2, an electrolytic tank 3, a primary activated carbon adsorption tank 4 and a secondary activated carbon adsorption tank 5.
The dosing tank 2, the electrolytic tank 3, the primary activated carbon adsorption tank 4 and the secondary activated carbon adsorption tank 5 are communicated in sequence according to the purification process and are higher than the plating solution storage tank 1. In this embodiment, the dosing tank 2, the electrolytic tank 3, the primary activated carbon adsorption tank 4 and the secondary activated carbon adsorption tank 5 are integrated and welded by pp plates with a thickness of 15 mm. A second liquid inlet 11 is arranged at the bottom of the clapboard between the dosing tank 2 and the electrolytic tank 3; a second overflow port 12 is arranged at the top of the clapboard between the electrolytic tank 3 and the primary activated carbon adsorption tank 4; a third liquid inlet 13 is arranged at the bottom of the partition board between the primary activated carbon adsorption tank 4 and the secondary activated carbon adsorption tank 5.
A first liquid inlet 6 is arranged on the side wall of the chemical feeding groove 2, the first liquid inlet 6 is communicated with the plating solution storage groove 1 through a flowing-in pipeline 7, and a filtering device 8 is arranged on the flowing-in pipeline 7. Plating bath in the liquid holding vessel 1 promotes to adding medicine groove 2 through filter equipment 8, and filter equipment 8 configuration flow 400L/min's self priming pump promotes solution, and the configuration filter bore diameter is filtered solution for 5 um's filter core.
The side wall of the secondary activated carbon adsorption tank 5 is provided with a first overflow port 9, the first overflow port 9 is communicated with the plating solution storage tank 1 through an outflow pipeline 10, and the plating solution after being filtered overflows into the plating solution storage tank 1 under the action of gravity. In order to make the height of the plating bath storage tank 1 lower than the above-mentioned functional tanks, the plating bath storage tank 1 is set as an underground tank buried under the ground surface. The plating solution storage tank 1 is also formed by welding 15 mm-thick pp plates.
The chemical feeding groove 2 is provided with a chemical feeding port, and chemicals are manually fed through the chemical feeding port on the chemical feeding groove 2 according to the concentration of the plating solution. The chemicals mainly comprise nickel sulfate, nickel chloride and boric acid.
The Ph electrode probe 14 is arranged in the plating solution storage tank 1, the Ph electrode probe 14 is electrically connected with a control system, the Ph electrode probe 14 monitors the pH value in the plating solution storage tank 1 and feeds back an electric signal to the control system, the control system injects acid or alkali into the chemical adding tank 2 by controlling a flow pump, and the acid-alkali regulation in the plating solution storage tank 1 is automatically started by the system according to the Ph setting range.
An electrode group for removing impurities through electrolysis is arranged in the electrolytic tank 3; the electrode group includes an anode plate using a nickel plate and a cathode plate using an iron plate.
When in use, the activated carbon bags are filled in the secondary activated carbon adsorption tank 5 and the primary activated carbon adsorption tank 4, and the activated carbon bags are used for adsorbing organic impurities decomposed by the additives in the plating solution.
The purification process of the invention is as follows:
the plating solution in the plating solution storage tank 1 is lifted to the chemical adding tank 2 through the filtering device 8, then flows to the electrolytic tank 3 through the second liquid inlet 11, and the electrode group in the electrolytic tank 3 carries out electrolytic impurity removal on the plating solution. The plating solution after the electrolytic impurity removal flows into the primary activated carbon adsorption tank 4 from the second overflow port 12, the plating solution flows into the secondary activated carbon adsorption tank 5 from the third liquid inlet 13 after the primary activated carbon adsorption for secondary activated carbon adsorption, and the plating solution after the final purification flows back into the plating solution storage tank 1 through the outflow pipeline 10 again. Continuous purification of the plating solution can be realized by the repeated purification operation.
The above-described embodiments are merely illustrative of the preferred embodiments of the present invention, and do not limit the scope of the present invention, and various modifications and improvements of the technical solutions of the present invention can be made by those skilled in the art without departing from the spirit of the present invention, and the technical solutions of the present invention are within the scope of the present invention defined by the claims.
Claims (6)
1. A continuous purifier of plating bath which characterized in that: comprises a plating solution storage tank (1), a medicine adding tank (2), an electrolytic tank (3), a primary activated carbon adsorption tank (4) and a secondary activated carbon adsorption tank (5);
the chemical feeding tank (2), the electrolytic tank (3), the primary activated carbon adsorption tank (4) and the secondary activated carbon adsorption tank (5) are communicated in sequence according to a purification process and are higher than the plating solution storage tank (1);
a first liquid inlet (6) is formed in the side wall of the chemical feeding groove (2), the first liquid inlet (6) is communicated with the plating solution storage groove (1) through a flowing-in pipeline (7), and a filtering device (8) is arranged on the flowing-in pipeline (7);
an electrode group for electrolytic impurity removal is arranged in the electrolytic tank (3);
be provided with first overflow mouth (9) on the lateral wall of secondary activated carbon adsorption groove (5), first overflow mouth (9) through outflow pipeline (10) with plating bath hold up tank (1) intercommunication.
2. The continuous purifying apparatus for plating solution according to claim 1, characterized in that: the dosing tank (2), the electrolytic tank (3), the primary activated carbon adsorption tank (4) and the secondary activated carbon adsorption tank (5) are arranged into an integral structure;
a second liquid inlet (11) is formed at the bottom of the clapboard between the dosing tank (2) and the electrolytic tank (3);
a second overflow port (12) is formed in the top of the partition plate between the electrolytic tank (3) and the primary activated carbon adsorption tank (4);
and a third liquid inlet (13) is formed in the bottom of the partition plate between the primary activated carbon adsorption tank (4) and the secondary activated carbon adsorption tank (5).
3. The continuous purifying apparatus for plating solution according to claim 1, characterized in that: the electrode group includes an anode plate using a nickel plate, and a cathode plate using an iron plate.
4. The continuous purifying apparatus for plating solution according to claim 1, characterized in that: the plating solution storage tank (1) is arranged as an underground tank.
5. The continuous purifying apparatus for plating solution according to claim 1, characterized in that: the plating solution storage tank (1), the dosing tank (2), the electrolytic tank (3), the primary activated carbon adsorption tank (4) and the secondary activated carbon adsorption tank (5) are all formed by welding PP plates.
6. The continuous purifying apparatus for plating solution according to claim 1, characterized in that: a Ph electrode probe (14) is arranged in the plating solution storage tank (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011142310.9A CN112160017A (en) | 2020-10-23 | 2020-10-23 | Continuous purifier of plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011142310.9A CN112160017A (en) | 2020-10-23 | 2020-10-23 | Continuous purifier of plating bath |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112160017A true CN112160017A (en) | 2021-01-01 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011142310.9A Pending CN112160017A (en) | 2020-10-23 | 2020-10-23 | Continuous purifier of plating bath |
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| CN (1) | CN112160017A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114045548A (en) * | 2021-12-23 | 2022-02-15 | 江苏舒扬智能装备有限公司 | But perpendicular continuous electroplating equipment |
-
2020
- 2020-10-23 CN CN202011142310.9A patent/CN112160017A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114045548A (en) * | 2021-12-23 | 2022-02-15 | 江苏舒扬智能装备有限公司 | But perpendicular continuous electroplating equipment |
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