CN112143399A - OLED (organic light emitting diode) protective film capable of blocking infrared light and preparation method thereof - Google Patents

OLED (organic light emitting diode) protective film capable of blocking infrared light and preparation method thereof Download PDF

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Publication number
CN112143399A
CN112143399A CN202010948287.6A CN202010948287A CN112143399A CN 112143399 A CN112143399 A CN 112143399A CN 202010948287 A CN202010948287 A CN 202010948287A CN 112143399 A CN112143399 A CN 112143399A
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China
Prior art keywords
layer
infrared
film
release film
blocking
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Inventor
孔善右
张仕明
黄德云
葛栋
李丽咱
任军
韦华
朱崇芝
王国庆
王梓
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Jiangsu Shibang Flexible Electronics Research Institute Co ltd
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Jiangsu Shibang Flexible Electronics Research Institute Co ltd
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Priority to CN202010948287.6A priority Critical patent/CN112143399A/en
Publication of CN112143399A publication Critical patent/CN112143399A/en
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29—Laminated material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J107/00—Adhesives based on natural rubber
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/08—Macromolecular additives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/40—Adhesives in the form of films or foils characterised by release liners
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2227—Oxides; Hydroxides of metals of aluminium
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2231—Oxides; Hydroxides of metals of tin
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2400/00—Presence of inorganic and organic materials
    • C09J2400/10—Presence of inorganic materials
    • C09J2400/14—Glass
    • C09J2400/143—Glass in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2407/00—Presence of natural rubber
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2423/00—Presence of polyolefin
    • C09J2423/04—Presence of homo or copolymers of ethene
    • C09J2423/045—Presence of homo or copolymers of ethene in the release coating
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2467/00—Presence of polyester
    • C09J2467/006—Presence of polyester in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2481/00—Presence of sulfur containing polymers
    • C09J2481/006—Presence of sulfur containing polymers in the substrate

Abstract

The invention is suitable for the technical field of OLED protective films, and provides an OLED protective film capable of blocking infrared light and a preparation method thereof. Through setting up antistatic layer one and antistatic layer two to can reduce the static that produces at the use in-process friction with the condition that the particulate matter adsorbs. By arranging the release film, the substrate layer and the PET film, the protective film disclosed by the invention is higher in overall structural strength and better in protective performance.

Description

OLED (organic light emitting diode) protective film capable of blocking infrared light and preparation method thereof
Technical Field
The invention belongs to the technical field of OLED (organic light emitting diode) protective films, and particularly relates to an OLED protective film capable of blocking infrared light and a preparation method thereof.
Background
In a smart phone represented by a novel OLED display screen, a face recognition function can be designed under the screen. Therefore, in the whole machine assembly production line, in order to avoid misjudgment of the face recognition function, a functional protective film with infrared light blocking function is required to be applied to the whole machine assembly production line of the face recognition mobile phone.
And the structural strength and the antistatic property of the existing protective film are not enough, so that dust adsorption cannot be reduced when the protective film is used, and the OLED screen can be damaged by particles such as dust.
Disclosure of Invention
The invention provides an OLED (organic light emitting diode) protective film capable of blocking infrared light and a preparation method thereof, and aims to solve the problems in the prior art.
The OLED protective film capable of blocking infrared light comprises a release film, an antistatic layer I, a pressure-sensitive adhesive layer, a base material layer, an infrared-proof layer, a PET film and an antistatic layer II;
the release film has a first surface and a second surface;
the antistatic layer I is attached to the first surface of the release film;
the pressure-sensitive adhesive layer is formed on the second surface of the release film;
the substrate layer is attached to the surface of one side, far away from the release film, of the pressure-sensitive adhesive layer;
the infrared-proof layer is formed on the surface of one side, far away from the pressure-sensitive adhesive layer, of the base material layer;
the PET film is attached to the surface of one side, far away from the base material layer, of the infrared-proof layer;
the second antistatic layer is formed on the surface of one side of the PET film, which is far away from the infrared-proof layer.
Preferably, the release film is one of a PE release film, a PET release film, an OPP release film and a PC release film.
Preferably, the first antistatic layer and the second antistatic layer are both indium tin oxide transparent conductive film glass.
Preferably, the pressure-sensitive adhesive layer is prepared by melting and mixing natural rubber, tackifying resin, softening agent and ultraviolet absorbent, uniformly coating the mixture on the second surface of the release film, and drying and curing the mixture at 50-70 ℃.
Preferably, the substrate layer is an optical film made of one of PET, PI, PEN, COP, PPS or PC with light transmittance of more than 91%.
Preferably, the infrared-proof layer is an infrared-proof heat-insulating coating coated on the substrate layer.
Preferably, the antistatic coating further comprises a hydrophobic coating formed on the surface of the second antistatic layer.
Preferably, the hydrophobic coating is obtained by uniformly coating the mixture of nano silicon dioxide, aluminum oxide, epoxy resin, a curing agent and a solvent on the second antistatic layer, and drying and curing the mixture at 50-70 ℃.
The invention also provides a preparation method of the OLED protective film capable of blocking infrared light, which comprises the following steps:
s1, providing a release film with a first surface and a second surface;
s2, attaching an antistatic layer I on the first surface of the release film;
s3, coating a pressure-sensitive adhesive layer on the second surface of the release film;
s4, attaching a base material layer on the first pressure-sensitive adhesive layer far away from the antistatic layer;
s5 the infrared layer is prevented in coating on the substrate layer prevent attached PET membrane on the infrared layer attached antistatic layer two on the PET membrane.
Compared with the prior art, the invention has the beneficial effects that: according to the OLED protective film capable of blocking infrared light and the preparation method thereof, the release film, the antistatic layer I, the pressure-sensitive adhesive layer, the base material layer, the infrared-proof layer, the PET film and the antistatic layer II are sequentially formed, and due to the arrangement of the infrared-proof layer, infrared rays can be effectively blocked or absorbed, and misjudgment of the face recognition function of a mobile phone is avoided.
Through setting up antistatic layer one and antistatic layer two to can reduce the static that produces at the use in-process friction with the condition that the particulate matter adsorbs. By arranging the release film, the substrate layer and the PET film, the protective film disclosed by the invention is higher in overall structural strength and better in protective performance.
Drawings
Fig. 1 is a schematic view of the overall structure of an OLED protection film capable of blocking infrared light according to the present invention.
In the figure: 1-a release film, 2-an antistatic layer I, 3-a pressure-sensitive adhesive layer, 4-a base material layer, 5-an infrared-proof layer, 6-a PET film, 7-an antistatic layer II and 8-a hydrophobic coating.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Referring to fig. 1, the present invention provides a technical solution: the OLED protective film comprises a release film 1, an antistatic layer I2, a pressure-sensitive adhesive layer 3, a base material layer 4, an anti-infrared layer 5, a PET film 6, an antistatic layer II 7 and a hydrophobic coating 8.
The release film 1 has a first surface and a second surface; the release film 1 is one of a PE release film, a PET release film, an OPP release film and a PC release film. In this embodiment, a PE release film is used.
The antistatic layer one 2 is attached to the first surface of the release film 1.
The pressure sensitive adhesive layer 3 is formed on the second surface of the release film 1. The pressure-sensitive adhesive layer 3 is prepared by melting and mixing natural rubber, tackifying resin, a softening agent and an ultraviolet absorbent, uniformly coating the mixture on the second surface of the release film 1, and drying and curing the mixture at 50-70 ℃.
The substrate layer 4 is attached to the surface of the pressure-sensitive adhesive layer 3, which is far away from the release film 1. The base material layer 4 is an optical film made of one of PET, PI, PEN, COP, PPS or PC with light transmittance of more than 91%. In the present embodiment, the base material layer 4 is made of PPS material.
The infrared-shielding layer 5 is formed on the surface of the base material layer 4 on the side away from the pressure-sensitive adhesive layer 3. The infrared-proof layer 5 is an infrared-proof heat-insulating coating coated on the base material layer 4. The infrared-resistant heat-insulating coating in the embodiment can be a glass infrared-resistant ultraviolet-resistant heat-insulating coating and comprises the following materials in parts by weight: 1-6 parts of cesium oxide; 0.02-0.1 part of tin dioxide; 2-13 parts of propylene glycol methyl ether acetate; 23-35 parts of acrylic resin; 23-35 parts of butyl acetate; 0.01-0.1 part of 2- (2H-benzotriazole-2-yl) -4-methylphenol; 10-15 parts of 2-butoxyethyl acetate (publication number CN108504215A, application number CN201810274389, entitled glass infrared and ultraviolet resistant heat insulation coating material and its preparation method in paragraphs [0021] to [0022 ]).
The PET film 6 is attached to the surface of the infrared-proof layer 5 on the side away from the base material layer 4.
The second antistatic layer 7 is formed on the surface of the PET film 6 on the side away from the infrared-preventing layer 5. The first antistatic layer 2 and the second antistatic layer 7 are made of indium tin oxide transparent conductive film glass.
And a hydrophobic coating layer 8 is formed on the surface of the second antistatic layer 7. The hydrophobic coating 8 is prepared by mixing nano silicon dioxide, aluminum oxide, epoxy resin, a curing agent and a solvent, uniformly coating the mixture on the antistatic layer II 7, and drying and curing the mixture at 50-70 ℃. Silica in the material of hydrophobic coating can provide effectual hydrophobic oleophobic performance, and aluminium oxide can provide effectual wear-resisting scratch resistance to as the outermost structure of protection film, can provide effectual multi-functional protection to the protection film, the life of extension protection film.
The invention provides a preparation method of an OLED (organic light emitting diode) protective film capable of blocking infrared light, which is used for preparing the OLED protective film capable of blocking infrared light and comprises the following steps:
s1, providing a release film 1 which is provided with a first surface and a second surface. And the release film 1 adopts PE release film
S2, attaching an antistatic layer I2 on the first surface of the release film 1.
S3, coating the pressure sensitive adhesive layer 3 on the second surface of the release film 1. The method specifically comprises the following steps: the pressure-sensitive adhesive layer 3 is prepared by melting and mixing natural rubber, tackifying resin, softening agent and ultraviolet absorbent, uniformly coating the mixture on the second surface of the release film 1, drying the mixture at 50-70 ℃, and curing the dried mixture
S4, attaching a base material layer 4 to the pressure sensitive adhesive layer 3 away from the antistatic layer I2;
and S5, coating the anti-infrared layer 5 on the base material layer 4, attaching the PET film 6 on the anti-infrared layer 5, and attaching the antistatic layer II 7 on the PET film 6.
S6, mixing nano silicon dioxide, aluminum oxide, epoxy resin, a curing agent and a solvent, uniformly coating the mixture on the antistatic layer II 7, and drying and curing the mixture at the temperature of 50-70 ℃ to obtain the hydrophobic coating 8. The OLED protective film capable of blocking infrared light is obtained.
According to the OLED protective film capable of blocking infrared light and the preparation method thereof, the OLED protective film is provided with the release film 1, the antistatic layer I2, the pressure-sensitive adhesive layer 3, the base material layer 4, the infrared-proof layer 5, the PET film 6, the antistatic layer II 7 and the hydrophobic coating 8 which are sequentially formed, and due to the arrangement of the infrared-proof layer 5, infrared light can be effectively blocked or absorbed, so that misjudgment caused by the face recognition function of a mobile phone is avoided.
Through setting up antistatic layer one 2 and antistatic layer two 7 to can reduce the static that produces at the use in the friction with the condition that the particulate matter adsorbs. By arranging the release film 1, the substrate layer 4 and the PET film 6, the protective film disclosed by the invention has higher overall structural strength and better protective performance.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.

Claims (9)

1. An OLED protection film capable of blocking infrared light is characterized in that: the anti-infrared-reflection coating comprises a release film (1), an antistatic layer I (2), a pressure-sensitive adhesive layer (3), a base material layer (4), an anti-infrared layer (5), a PET film (6) and an antistatic layer II (7);
the release film (1) is provided with a first surface and a second surface;
the antistatic layer I (2) is attached to the first surface of the release film (1);
the pressure-sensitive adhesive layer (3) is formed on the second surface of the release film (1);
the base material layer (4) is attached to the surface of one side, far away from the release film (1), of the pressure-sensitive adhesive layer (3);
the infrared-proof layer (5) is formed on the surface of one side, far away from the pressure-sensitive adhesive layer (3), of the base material layer (4);
the PET film (6) is attached to the surface of one side, far away from the base material layer (4), of the infrared-proof layer (5);
the antistatic layer II (7) is formed on one side surface, far away from the infrared-proof layer (5), of the PET film (6).
2. The protective film for infrared-blocking OLEDs of claim 1, wherein: the release film (1) is one of a PE release film, a PET release film, an OPP release film and a PC release film.
3. The protective film for infrared-blocking OLEDs of claim 1, wherein: and the first antistatic layer (2) and the second antistatic layer (7) are both indium tin oxide transparent conductive film glass.
4. The protective film for infrared-blocking OLEDs of claim 1, wherein: the pressure-sensitive adhesive layer (3) is prepared by melting and mixing natural rubber, tackifying resin, softening agent and ultraviolet absorbent, uniformly coating the mixture on the second surface of the release film (1), and curing the mixture after drying at 50-70 ℃.
5. The protective film for infrared-blocking OLEDs of claim 1, wherein: the substrate layer (4) is an optical film made of one of PET, PI, PEN, COP, PPS or PC with light transmittance larger than 91%.
6. The protective film for infrared-blocking OLEDs of claim 1, wherein: the infrared-proof layer (5) is an infrared-proof heat-insulating coating coated on the base material layer (4).
7. The protective film for infrared-blocking OLEDs of claim 1, wherein: and the antistatic coating further comprises a hydrophobic coating (8), wherein the hydrophobic coating (8) is formed on the surface of the second antistatic layer (7).
8. The protective film for infrared-blocking OLEDs of claim 7, wherein: the hydrophobic coating (8) is prepared by mixing nano silicon dioxide, aluminum oxide, epoxy resin, a curing agent and a solvent, uniformly coating the mixture on the antistatic layer II (7), and drying and curing the mixture at 50-70 ℃.
9. The method for preparing the OLED protective film capable of blocking infrared light according to any one of claims 1 to 8, wherein: the method comprises the following steps:
s1, providing a release film (1) with a first surface and a second surface;
s2, attaching a first antistatic layer (2) on the first surface of the release film (1);
s3, coating a pressure-sensitive adhesive layer (3) on the second surface of the release film (1);
s4, attaching a base material layer (4) on the pressure-sensitive adhesive layer (3) far away from the antistatic layer I (2);
s5 coating on the substrate layer (4) prevents infrared layer (5) prevent attached PET membrane (6) on infrared layer (5) attached antistatic layer two (7) on PET membrane (6).
CN202010948287.6A 2020-09-10 2020-09-10 OLED (organic light emitting diode) protective film capable of blocking infrared light and preparation method thereof Pending CN112143399A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3171555U (en) * 2011-08-26 2011-11-04 博霖股▲ふん▼有限公司Ｂｏｊａｌｃｏ．，Ｌｔｄ． Protective film structure for electronic products
CN104816524A (en) * 2014-02-05 2015-08-05 日东电工株式会社 Surface protective sheet substrate and surface protective sheet
CN110172292A (en) * 2019-06-28 2019-08-27 中国人民解放军国防科技大学 Mechanically durable super-hydrophobic nano coating and preparation method thereof
CN209836069U (en) * 2019-03-06 2019-12-24 江西蓝海芯科技集团有限公司 Infrared light blocking functional protective film

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3171555U (en) * 2011-08-26 2011-11-04 博霖股▲ふん▼有限公司Ｂｏｊａｌｃｏ．，Ｌｔｄ． Protective film structure for electronic products
CN104816524A (en) * 2014-02-05 2015-08-05 日东电工株式会社 Surface protective sheet substrate and surface protective sheet
CN209836069U (en) * 2019-03-06 2019-12-24 江西蓝海芯科技集团有限公司 Infrared light blocking functional protective film
CN110172292A (en) * 2019-06-28 2019-08-27 中国人民解放军国防科技大学 Mechanically durable super-hydrophobic nano coating and preparation method thereof

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