CN112129795B - 用于确定分子结构的方法和系统 - Google Patents
用于确定分子结构的方法和系统 Download PDFInfo
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- CN112129795B CN112129795B CN202010578893.3A CN202010578893A CN112129795B CN 112129795 B CN112129795 B CN 112129795B CN 202010578893 A CN202010578893 A CN 202010578893A CN 112129795 B CN112129795 B CN 112129795B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20083—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by using a combination of at least two measurements at least one being a transmission measurement and one a scatter measurement
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/2055—Analysing diffraction patterns
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/205—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials using diffraction cameras
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/03—Investigating materials by wave or particle radiation by transmission
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/056—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction
- G01N2223/0565—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction diffraction of electrons, e.g. LEED
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/056—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction
- G01N2223/0566—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction analysing diffraction pattern
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/071—Investigating materials by wave or particle radiation secondary emission combination of measurements, at least 1 secondary emission
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
- G01N2223/1016—X-ray
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/102—Different kinds of radiation or particles beta or electrons
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/40—Imaging
- G01N2223/401—Imaging image processing
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/612—Specific applications or type of materials biological material
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/450321 | 2019-06-24 | ||
| US16/450,321 US10935506B2 (en) | 2019-06-24 | 2019-06-24 | Method and system for determining molecular structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112129795A CN112129795A (zh) | 2020-12-25 |
| CN112129795B true CN112129795B (zh) | 2024-11-12 |
Family
ID=71614674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010578893.3A Active CN112129795B (zh) | 2019-06-24 | 2020-06-23 | 用于确定分子结构的方法和系统 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10935506B2 (https=) |
| EP (1) | EP3764091B1 (https=) |
| JP (1) | JP7374860B2 (https=) |
| CN (1) | CN112129795B (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11499926B2 (en) * | 2020-06-30 | 2022-11-15 | Fei Company | Method for diffraction pattern acquisition |
| JP2024075799A (ja) * | 2021-03-24 | 2024-06-05 | 国立研究開発法人理化学研究所 | 3次元像観察装置、及び方法 |
| US11988618B2 (en) * | 2021-03-31 | 2024-05-21 | Fei Company | Method and system to determine crystal structure |
| US11694874B2 (en) * | 2021-07-13 | 2023-07-04 | Fei Company | Method and system for generating a diffraction image |
| TWI783896B (zh) | 2022-04-08 | 2022-11-11 | 國立清華大學 | 用於輕元素薄膜的三維影像重建方法及系統 |
| CN120142345B (zh) * | 2025-04-07 | 2025-12-12 | 上海交通大学 | 单晶材料的三维中子衍射数据处理方法及系统 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5353236A (en) * | 1992-04-23 | 1994-10-04 | The Board Of Trustees Of The Leland Stanford University | High-resolution crystallographic modelling of a macromolecule |
| JP3335680B2 (ja) * | 1992-11-12 | 2002-10-21 | 健太郎 山口 | 三次元分子構造解析法 |
| US6438205B1 (en) | 2000-05-08 | 2002-08-20 | Accelrys Inc. | System and method for reducing phase ambiguity of crystal structure factors |
| AU8292901A (en) | 2000-07-20 | 2002-02-05 | Jonathan M Friedman | A method for ab initio determination of macromolecular crystallographic phases at moderate resolution by symmetry-enforced orthogonal multicenter spherical harmonic-spherical bessel expansion |
| GB0115714D0 (en) | 2001-06-27 | 2001-08-22 | Imperial College | Structure determination of macromolecules |
| US7576325B2 (en) * | 2004-05-20 | 2009-08-18 | National University Corporation Hokkaido University | Electron microscopic method and electron microscope using same |
| JP4726048B2 (ja) * | 2005-05-27 | 2011-07-20 | 株式会社日立製作所 | 位相回復方式の電子顕微鏡による観察方法 |
| US8131481B2 (en) * | 2007-05-03 | 2012-03-06 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Portland State University | Database supported nanocrystal structure identification by lattice-fringe fingerprinting with structure factor extraction |
| GB0709796D0 (en) * | 2007-05-22 | 2007-06-27 | Phase Focus Ltd | Three dimensional imaging |
| US8076640B2 (en) * | 2009-08-27 | 2011-12-13 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. | Method and device for measuring electron diffraction of a sample |
| JP2010117365A (ja) * | 2010-02-10 | 2010-05-27 | Japan Synchrotron Radiation Research Inst | 構造因子テンソル要素決定法及びそのためのx線回折装置利用法 |
| EP2402976A1 (en) * | 2010-06-30 | 2012-01-04 | Fei Company | Method of electron diffraction tomography |
| EP2485239A1 (en) * | 2011-02-07 | 2012-08-08 | FEI Company | Method for centering an optical element in a TEM comprising a contrast enhancing element |
| GB201302624D0 (en) * | 2013-02-14 | 2013-04-03 | Univ Antwerpen | High-resolution amplitude contrast imaging |
| US9279777B2 (en) * | 2013-08-06 | 2016-03-08 | International Business Machines Corporation | Analyzing strain distribution in semiconductor structures using nano-beam diffraction |
| US9978557B2 (en) * | 2016-04-21 | 2018-05-22 | Fei Company | System for orienting a sample using a diffraction pattern |
| KR102149947B1 (ko) * | 2017-04-27 | 2020-09-02 | 킹 압둘라 유니버시티 오브 사이언스 앤드 테크놀로지 | 투과 전자 현미경 샘플 정렬 시스템 및 방법 |
| EP3444836B1 (en) * | 2017-08-17 | 2020-01-29 | FEI Company | Diffraction pattern detection in a transmission charged particle microscope |
-
2019
- 2019-06-24 US US16/450,321 patent/US10935506B2/en active Active
-
2020
- 2020-06-22 EP EP20181297.1A patent/EP3764091B1/en active Active
- 2020-06-22 JP JP2020107072A patent/JP7374860B2/ja active Active
- 2020-06-23 CN CN202010578893.3A patent/CN112129795B/zh active Active
Non-Patent Citations (4)
| Title |
|---|
| Contrast transfer function correction applied to cryo-electron tomography and sub-tomogram averaging;Giulia Zanetti et al.;《Journal of Structural Biology》;20090808(第第168期期);第305–312页 * |
| Crystal Structure Determination from EM Images and Electron Diffraction Patterns;SVEN HOVMOLLER et al.;《ADVANCES IN IMAGING AND ELECTRON PHYSICS》;20000101;第第123卷卷;第257-289页 * |
| Glaeser,R.M.et al..High resolution electron crystallography of protein molecules.《Ultramicroscopy》.1993,第52卷第478-486页. * |
| SVEN HOVMOLLER et al..Crystal Structure Determination from EM Images and Electron Diffraction Patterns.《ADVANCES IN IMAGING AND ELECTRON PHYSICS》.2000,第123卷第257-289页. * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20200400594A1 (en) | 2020-12-24 |
| JP7374860B2 (ja) | 2023-11-07 |
| CN112129795A (zh) | 2020-12-25 |
| US10935506B2 (en) | 2021-03-02 |
| JP2021001887A (ja) | 2021-01-07 |
| EP3764091A1 (en) | 2021-01-13 |
| EP3764091B1 (en) | 2022-11-02 |
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