CN112126097B - Infrared-radar compatible stealth film material and preparation method thereof - Google Patents
Infrared-radar compatible stealth film material and preparation method thereof Download PDFInfo
- Publication number
- CN112126097B CN112126097B CN202010946450.5A CN202010946450A CN112126097B CN 112126097 B CN112126097 B CN 112126097B CN 202010946450 A CN202010946450 A CN 202010946450A CN 112126097 B CN112126097 B CN 112126097B
- Authority
- CN
- China
- Prior art keywords
- microspheres
- infrared
- radar
- film
- film material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/04—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing chlorine atoms
- C09D127/06—Homopolymers or copolymers of vinyl chloride
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D193/00—Coating compositions based on natural resins; Coating compositions based on derivatives thereof
- C09D193/04—Rosin
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/30—Camouflage paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/70—Additives characterised by shape, e.g. fibres, flakes or microspheres
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F41—WEAPONS
- F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
- F41H3/00—Camouflage, i.e. means or methods for concealment or disguise
- F41H3/02—Flexible, e.g. fabric covers, e.g. screens, nets characterised by their material or structure
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2323/00—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
- C08J2323/02—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers not modified by chemical after treatment
- C08J2323/04—Homopolymers or copolymers of ethene
- C08J2323/06—Polyethene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2323/00—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
- C08J2323/02—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers not modified by chemical after treatment
- C08J2323/10—Homopolymers or copolymers of propene
- C08J2323/12—Polypropene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2347/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds; Derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2369/00—Characterised by the use of polycarbonates; Derivatives of polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2427/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2427/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2427/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing chlorine atoms
- C08J2427/06—Homopolymers or copolymers of vinyl chloride
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2463/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2493/00—Characterised by the use of natural resins; Derivatives thereof
- C08J2493/04—Rosin
Abstract
The invention discloses an infrared-radar compatible stealth film material and a preparation method thereof. The infrared-radar compatible stealth film material comprises a polymer film and hollow metal microspheres fixed on the surface of the polymer film through an adhesive, and the preparation method comprises the following steps: mixing the adhesive, the diluent and the hollow metal microspheres to prepare a mixed solution, spraying the mixed solution on a polymer film, and drying to obtain the infrared-radar compatible stealth film material. The infrared-radar compatible stealth film material disclosed by the invention is low in infrared radiance, large in electromagnetic loss to radar waves, free of glare phenomenon, integrated with infrared stealth, radar stealth and anti-glare, and capable of effectively performing infrared radar stealth defense and identity identification when being applied to military forces.
Description
Technical Field
The invention relates to the technical field of functional materials, in particular to an infrared-radar compatible stealth film material and a preparation method thereof.
Background
In night investigation, the infrared detection technology can detect and find the target according to the infrared radiation difference between the target and the background, and the larger the infrared radiation difference between the target and the environment is, the stronger the image contrast is, and the easier the target is to be found. Therefore, in modern war, if the possibility that own strength is discovered by infrared detection is reduced, the infrared radiance of the target surface needs to be reduced to be close to the environment, so that the target is integrated with the environment in the infrared image. The low infrared radiation material can reduce the brightness of a target in an infrared band, so that the brightness of the target is close to the ambient brightness, and infrared stealth is realized. The low infrared radiation material can also be used as an infrared identity recognition material, a specific symbol made of the low infrared radiation material is arranged on a recognition target, and the specific symbol can be recognized due to the low infrared radiation rate of the low infrared radiation material, so that the aim of identity recognition is fulfilled.
When infrared light is irradiated on the surface of the material, a part of energy is absorbed, a part of energy is reflected, and a part of energy is transmitted through the material, which can be expressed by the following formula: α + β + γ =1, α is an absorption rate of the material to the infrared ray, β is a reflectance of the material to the infrared ray, and γ is a transmittance of the material to the infrared ray. The infrared emissivity epsilon of the material at a given temperature is equal to the absorptivity alpha of the material to infrared rays at the same temperature, so that the reflectivity beta of the material to infrared rays or/and the transmittance gamma of the material to infrared rays must be improved to achieve a low infrared emissivity epsilon of the material. The existing low infrared radiation material has low infrared emissivity epsilon, and the smooth surface of the material is easy to generate glare phenomenon under the irradiation of visible light, so the actual stealth effect is not good.
In modern war, the reconnaissance means for enemies is many, and most common is infrared detection and radar detection, so that it is not enough to realize infrared stealth only, and radar stealth is also important, and the realization of infrared stealth and radar stealth simultaneously is a trend of modern stealth technology development. The radar stealth material has the key point of improving the electromagnetic loss of radar waves, and the existing radar stealth material has poor electromagnetic loss effect and cannot completely meet the requirements of practical application.
Therefore, the development of a film material having infrared stealth, radar stealth and anti-glare effects is urgently needed.
Disclosure of Invention
The invention aims to provide an infrared-radar compatible stealth film material.
The second purpose of the invention is to provide a preparation method of the infrared-radar compatible stealth film material.
The technical scheme adopted by the invention is as follows:
an infrared-radar compatible stealth film material comprises a polymer film and hollow metal microspheres fixed on the surface of the polymer film through an adhesive.
Preferably, the polymer film is one of a Polycarbonate (PC) film, a Polyethylene (PE) film, a polypropylene (PP) film, a trans 1,4-polyisoprene (TPI) film, a polymethyl methacrylate (PMMA) film, an acrylonitrile-butadiene-styrene copolymer (ABS) film, and a polyethylene terephthalate (PET) film.
Preferably, the polymer film has a thickness of 10 to 500 μm.
Preferably, the adhesive is at least one of rosin ester, tung oil, acrylic resin, polyurethane resin, epoxy resin, polyamide resin, phenolic resin, ethylene-vinyl acetate resin and vinyl chloride resin. Rosin esters, tung oil, acrylic resins, polyurethane resins, epoxy resins, polyamide resins, phenol resins, ethylene-vinyl acetate resins, and vinyl chloride resins have low infrared emissivity, and the problem of increased infrared emissivity caused by adhesives can be avoided by using them as adhesives.
Preferably, the hollow metal microspheres are composed of at least one of iron, nickel and cobalt.
Preferably, the particle size of the hollow metal microspheres is 500 nm-900 nm.
Preferably, the hollow metal microspheres are prepared by the following steps:
1) Sensitizing the polystyrene microspheres or the silicon dioxide microspheres by using tin salt to obtain sensitized microspheres;
2) Activating the sensitized microspheres by using palladium salt to obtain activated microspheres;
3) Carrying out chemical plating on the activated microspheres to obtain microspheres coated with a metal layer;
4) And adding the microspheres coated with the metal layer into a template removing agent, and dissolving and removing the polystyrene microspheres or the silicon dioxide microspheres in the microspheres to obtain the hollow metal microspheres.
Preferably, the tin salt in step 1) is SnCl 2 、SnSO 4 、SnF 2 At least one of (1).
Further preferably, the tin salt in step 1) is SnCl 2 。
Preferably, the palladium salt in the step 2) is PdCl 2 、Pd(NH 3 ) 4 Cl 2 、Pd(CH 3 COO) 2 、Pd(NO 3 ) 2 ·2H 2 O、K 2 PdCl 4 At least one of (1).
Further preferably, the palladium salt in step 2) is PdCl 2 。
Preferably, the chemical plating solution adopted by the chemical plating in the step 3) comprises 0.3-0.7 g/L of polyvinylpyrrolidone, 15-30 g/L of ammonium chloride, 10-20 g/L of sodium citrate, 15-30 g/L of sodium hypophosphite and 10-35 g/L of water-soluble metal salt, and the solvent is water.
Preferably, the water-soluble metal salt is at least one of water-soluble iron salt, water-soluble nickel salt and water-soluble cobalt salt.
Preferably, the template removing agent in the step 4) is at least one of dichloromethane, chloroform, tetrahydrofuran, N-dimethylformamide, potassium hydroxide solution and sodium hydroxide solution.
The preparation method of the infrared-radar compatible stealth film material comprises the following steps: mixing the adhesive, the diluent and the hollow metal microspheres to prepare a mixed solution, spraying the mixed solution on a polymer film, and drying to obtain the infrared-radar compatible stealth film material.
Preferably, the mass ratio of the adhesive to the diluent to the hollow metal microspheres is 1: (20 to 30): (1-3).
Preferably, the diluent is at least one of toluene, xylene, ethyl acetate, butyl acetate, acetone, butanone, cyclohexanone, ethanol, ethylene glycol, n-butanol and isopropanol.
The beneficial effects of the invention are: the infrared-radar compatible stealth film material disclosed by the invention is low in infrared radiance, large in electromagnetic loss to radar waves, free of glare phenomenon, capable of integrating infrared stealth, radar stealth and anti-glare, and capable of effectively performing infrared radar stealth defense and identity recognition when being applied to military forces.
Specifically, the method comprises the following steps:
1) The infrared-radar compatible stealth film material is added with the hollow metal microspheres, so that a concave-convex structure can be formed on the surface of the film material, coherent light waves are superposed by utilizing diffraction and interference phenomena of light, redistribution of reflected light and incident light intensity is realized, and the aim of reducing infrared radiation is further realized;
2) The infrared-radar compatible stealth film material is added with the hollow metal microspheres, so that the film material has larger specific surface area, electromagnetic loss of radar waves is facilitated, the radar waves entering the inner cavity of the hollow sphere can be subjected to multiple intracavity reflections, loss of the radar waves is greatly improved, and an excellent radar stealth effect can be obtained;
3) In the process of preparing the infrared-radar compatible stealth film material, the film material with different infrared radiance can be obtained by controlling the spraying thickness, and the infrared stealth requirements under different environmental temperatures can be met.
Detailed Description
The invention will be further explained and illustrated with reference to specific examples.
Example 1:
the preparation method of the hollow iron microsphere comprises the following steps:
1) Adding 3 parts by mass of polystyrene microspheres with the particle size of 300-500 nm and 0.1 part by mass of polyvinylpyrrolidone into 65 parts by mass of SnCl with the concentration of 12g/L 2 Stirring and sensitizing the solution for 30min, filtering, washing the filtered solid with distilled water, and adding waterDrying in a drying oven at 50 ℃ to obtain sensitized microspheres;
2) 2 parts by mass of sensitized microspheres are added with 60 parts by mass of Pd (NH) with the concentration of 0.25g/L 3 ) 4 Cl 2 Stirring and activating the solution for 30min, performing suction filtration, washing the filtered solid with distilled water, and drying the solid in an oven at 50 ℃ to obtain activated microspheres;
3) Adding 4 parts by mass of activated microspheres into 65 parts by mass of chemical plating solution, wherein the chemical plating solution contains 0.5g/L of polyvinylpyrrolidone, 20g/L of ammonium chloride, 10g/L of sodium citrate, 15g/L of sodium hypophosphite and 15g/L of ferric nitrate, the solvent is water, adjusting the pH value of the chemical plating solution to 8 by using NaOH, heating to 70 ℃, reacting for 1h, carrying out suction filtration, washing the filtered solid by using distilled water, and drying in an oven at 50 ℃ to obtain microspheres coated with an iron layer;
4) Adding 3 parts by mass of microspheres coated with an iron layer into 40 parts by mass of dichloromethane, stirring for 1h at 25 ℃, filtering, washing the filtered solid with ethanol, and drying in an oven at 50 ℃ to obtain the hollow iron microspheres (with the particle size of 500-700 nm).
An infrared-radar compatible stealth film material and a preparation method thereof comprise the following steps:
and (2) uniformly mixing 1 part by mass of the hollow iron microspheres, 1 part by mass of epoxy resin and 20 parts by mass of ethanol to prepare a mixed solution, spraying the mixed solution on a polycarbonate film with the thickness of 20 mu m, and drying in an oven at 50 ℃ to obtain the infrared-radar compatible stealth film material.
Example 2:
the preparation method of the hollow cobalt microsphere comprises the following steps:
1) Adding 5 parts by mass of polystyrene microspheres with the particle size of 500-700 nm and 0.2 part by mass of polyvinylpyrrolidone into 90 parts by mass of SnF with the concentration of 12g/L 2 Stirring and sensitizing the solution for 30min, carrying out suction filtration, washing the filtered solid with distilled water, and then placing the solid in an oven to dry at 50 ℃ to obtain sensitized microspheres;
2) Adding 4 parts by mass of sensitized microspheres into 70 parts by mass of PdCl with the concentration of 0.25g/L 2 Stirring and activating the solution for 30min, filtering, washing the filtered solid with distilled waterDrying the activated microspheres in an oven at 50 ℃ to obtain activated microspheres;
3) Adding 5 parts by mass of activated microspheres into 95 parts by mass of chemical plating solution, wherein the chemical plating solution contains 0.5g/L of polyvinylpyrrolidone, 15g/L of ammonium chloride, 15g/L of sodium citrate, 25g/L of sodium hypophosphite and 20g/L of cobalt nitrate, the solvent is water, adjusting the pH value of the chemical plating solution to 8 by using NaOH, heating to 80 ℃, reacting for 1h, carrying out suction filtration, washing the filtered solid by using distilled water, and drying in an oven at 50 ℃ to obtain microspheres coated with a cobalt layer;
4) Adding 4.5 parts by mass of microspheres coated with a cobalt layer into 35 parts by mass of chloroform, stirring for 1h at 30 ℃, filtering, washing the filtered solid with ethanol, and drying in an oven at 50 ℃ to obtain the hollow cobalt microspheres (the particle size is 700-900 nm).
An infrared-radar compatible stealth film material is prepared by the following steps:
and (2) uniformly mixing 2 parts by mass of the hollow cobalt microspheres, 1 part by mass of rosin ester and 25 parts by mass of isopropanol to prepare a mixed solution, spraying the mixed solution on a polypropylene film with the thickness of 300 mu m, and drying in an oven at 80 ℃ to obtain the infrared-radar compatible stealth film material.
Example 3:
a preparation method of the hollow nickel-cobalt microsphere comprises the following steps:
1) Adding 4 parts by mass of silicon dioxide microspheres with the particle size of 400-500 nm and 0.2 part by mass of polyvinylpyrrolidone into 70 parts by mass of SnSO with the concentration of 12g/L 4 Stirring and sensitizing the solution for 30min, carrying out suction filtration, washing the filtered solid with distilled water, and then placing the solid in an oven to dry at 50 ℃ to obtain sensitized microspheres;
2) Adding 3 parts by mass of sensitized microspheres into 65 parts by mass of K with the concentration of 0.25g/L 2 PdCl 4 Stirring and activating the solution for 30min, performing suction filtration, washing the filtered solid with distilled water, and drying the solid in an oven at 50 ℃ to obtain activated microspheres;
3) Adding 4.5 parts by mass of activated microspheres into 70 parts by mass of chemical plating solution, wherein the chemical plating solution contains 0.5g/L of polyvinylpyrrolidone, 28g/L of ammonium chloride, 12g/L of sodium citrate, 20g/L of sodium hypophosphite, 10g/L of nickel chloride and 10g/L of cobalt nitrate, the solvent is water, adjusting the pH value of the chemical plating solution to 9 by NaOH, heating to 60 ℃, reacting for 1h, carrying out suction filtration, washing the filtered solid by distilled water, and drying in an oven at 50 ℃ to obtain microspheres coated with a nickel-cobalt layer;
4) Adding 3 parts by mass of microspheres coated with a nickel-cobalt layer into 50 parts by mass of a sodium hydroxide solution with the concentration of 6mol/L, stirring for 1h at 60 ℃, filtering, washing the filtered solid with ethanol, and drying in an oven at 50 ℃ to obtain the hollow nickel-cobalt microspheres (with the particle size of 600 nm-800 nm).
An infrared-radar compatible stealth film material is prepared by the following steps:
uniformly mixing 3 parts by mass of the hollow nickel-cobalt microspheres, 1 part by mass of vinyl chloride resin and 30 parts by mass of isopropanol to prepare a mixed solution, spraying the mixed solution on a trans-1,4-polyisoprene film with the thickness of 150 mu m, and drying in an oven at 60 ℃ to obtain the infrared-radar compatible stealth film material.
Example 4:
a preparation method of the hollow nickel microsphere comprises the following steps:
1) 2 parts by mass of silicon dioxide microspheres with the particle size of 400 nm-500 nm and 0.1 part by mass of polyvinylpyrrolidone are added into 65 parts by mass of SnCl with the concentration of 12g/L 2 Stirring and sensitizing the solution for 30min, carrying out suction filtration, washing the filtered solid with distilled water, and then placing the solid in an oven to dry at 50 ℃ to obtain sensitized microspheres;
2) Adding 3 parts by mass of sensitized microspheres into 90 parts by mass of Pd (NO) with the concentration of 0.25g/L 3 ) 2 ·2H 2 Stirring and activating for 30min in the O solution, carrying out suction filtration, washing the filtered solid with distilled water, and drying in an oven at 50 ℃ to obtain activated microspheres;
3) Adding 3.5 parts by mass of activated microspheres into 100 parts by mass of chemical plating solution, wherein the chemical plating solution contains 0.5g/L of polyvinylpyrrolidone, 25g/L of ammonium chloride, 15g/L of sodium citrate, 15g/L of sodium hypophosphite and 20g/L of nickel chloride, the solvent is water, adjusting the pH value of the chemical plating solution to 9 by NaOH, heating to 75 ℃, reacting for 1h, carrying out suction filtration, washing the filtered solid by distilled water, and drying in an oven at 50 ℃ to obtain microspheres coated with a nickel layer;
4) Adding 3 parts by mass of microspheres coated with a nickel layer into 40 parts by mass of potassium hydroxide solution with the concentration of 6mol/L, stirring for 1h at 50 ℃, filtering, washing the filtered solid with ethanol, and drying in an oven at 50 ℃ to obtain the hollow nickel microspheres (the particle size is 500-700 nm).
An infrared-radar compatible stealth film material is prepared by the following steps:
and (2) uniformly mixing 2 parts by mass of the hollow nickel microspheres, 1 part by mass of acrylic resin and 25 parts by mass of acetone to prepare a mixed solution, spraying the mixed solution on a polyethylene film with the thickness of 50 microns, and drying in an oven at 70 ℃ to obtain the infrared-radar compatible stealth film material.
Comparative example 1:
a film material is prepared by the following steps:
uniformly mixing 2 parts by mass of nickel powder with the particle size of 500-700 nm, 1 part by mass of acrylic resin and 25 parts by mass of acetone to prepare a mixed solution, spraying the mixed solution on a polyethylene film with the thickness of 50 mu m, and drying in an oven at 70 ℃ to obtain the film material.
Comparative example 2:
a film material is prepared by the following steps:
uniformly mixing 1 part by mass of acrylic resin and 25 parts by mass of acetone to prepare a mixed solution, spraying the mixed solution on a polyethylene film with the thickness of 50 micrometers, and drying in an oven at 70 ℃ to obtain the film material.
Comparative example 3:
polyethylene film having a thickness of 50 μm.
And (3) performance testing:
the performance of the thin film materials of examples 1 to 4 and comparative examples 1 to 3 was tested, the infrared radiance of the thin film materials of examples 1 to 4 and comparative examples 1 to 3 was tested in the wavelength range of 8 μm to 14 μm by referring to the "GJB 8700-2015 infrared radiance measuring method", the minimum reflection loss of radar waves of the thin film materials of examples 1 to 4 and comparative examples 1 to 3 in the wavelength range of 8GHz to 18GHz by referring to the "GJB2038-1994 radar wave absorbing material reflectivity testing method", the visible light reflection value of the thin film materials of examples 1 to 4 and comparative examples 1 to 3 was tested by a visible light reflectivity tester at an angle of 60 degrees, and the test results are shown in the following table:
TABLE 1 results of Performance test of film materials of examples 1 to 4 and comparative examples 1 to 3
As can be seen from Table 1:
1) The adhesive with low infrared radiance has little influence on the infrared radiance of the film material, the change of the reflection value of visible light at an angle of 60 degrees is not obvious (generally required to be less than 3), and the effect on eliminating glare is little; the comparative example 1 contains nickel powder, the visible light 60-degree angle reflection value of the film material can be effectively reduced, and the examples 1-4 containing the hollow metal microspheres have lower visible light 60-degree angle reflection value and can obtain more excellent anti-glare effect;
2) Compared with nickel powder, the hollow nickel microspheres have more excellent infrared radiation reduction effect and radar wave loss effect;
3) The film materials of examples 1-4 have low infrared radiance, good loss effect on radar waves, and basically eliminated glare phenomenon, and integrate infrared stealth, radar stealth, and anti-glare.
The above embodiments are preferred embodiments of the present invention, but the present invention is not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications which do not depart from the spirit and principle of the present invention should be construed as equivalents thereof, and all such changes, modifications, substitutions, combinations, and simplifications are intended to be included in the scope of the present invention.
Claims (7)
1. An infrared-radar compatible stealth film material is characterized by comprising a polymer film and hollow metal microspheres fixed on the surface of the polymer film through an adhesive; the mass ratio of the adhesive to the hollow metal microspheres is 1: (1-3); the hollow metal microspheres are composed of at least one of iron, nickel and cobalt; the particle size of the hollow metal microspheres is 500-900 nm; the hollow metal microsphere is prepared by the following steps: 1) Sensitizing polystyrene microspheres or silicon dioxide microspheres by using tin salt to obtain sensitized microspheres; 2) Activating the sensitized microspheres by using palladium salt to obtain activated microspheres; 3) Carrying out chemical plating on the activated microspheres to obtain microspheres coated with a metal layer; 4) Adding the microspheres coated with the metal layer into a template removing agent, and dissolving and removing the polystyrene microspheres or silicon dioxide microspheres in the microspheres to obtain hollow metal microspheres; the particle size of the polystyrene microsphere in the step 1) is 300-700 nm; the particle size of the silicon dioxide microspheres in the step 1) is 400-500 nm.
2. The ir-radar compatible stealth film material of claim 1, wherein: the polymer film is one of a polycarbonate film, a polyethylene film, a polypropylene film, a trans-1,4-polyisoprene film, a polymethyl methacrylate film, an acrylonitrile-butadiene-styrene copolymer film and a polyethylene terephthalate film.
3. The infrared-radar compatible stealth film material of claim 1, characterized in that: the adhesive is at least one of rosin ester, tung oil, acrylic resin, polyurethane resin, epoxy resin, polyamide resin, phenolic resin, ethylene-vinyl acetate resin and vinyl chloride resin.
4. The ir-radar compatible stealth film material of claim 1, wherein: step 1) the tin salt is SnCl 2 、SnSO 4 、SnF 2 At least one of (a); step 2) the palladium salt is PdCl 2 、Pd(NH 3 ) 4 Cl 2 、Pd(CH 3 COO) 2 、Pd(NO 3 ) 2 ·2H 2 O、K 2 PdCl 4 At least one of; the chemical plating solution adopted by the chemical plating in the step 3) comprises 0.3-0.7 g/L of polyvinylpyrrolidone and 15-30 g/L of ammonium chloride10 g/L-20 g/L sodium citrate, 15 g/L-30 g/L sodium hypophosphite and 10 g/L-35 g/L water-soluble metal salt, wherein the solvent is water; the template removing agent in the step 4) is at least one of dichloromethane, chloroform, tetrahydrofuran, N-dimethylformamide, potassium hydroxide solution and sodium hydroxide solution.
5. The method for preparing an infrared-radar compatible stealth film material according to any one of claims 1 to 4, comprising the steps of: mixing the adhesive, the diluent and the hollow metal microspheres to prepare a mixed solution, spraying the mixed solution on a polymer film, and drying to obtain the infrared-radar compatible stealth film material.
6. The method for preparing the infrared-radar compatible stealth film material according to claim 5, characterized in that: the mass ratio of the adhesive to the diluent to the hollow metal microspheres is 1: (20 to 30): (1-3).
7. The method for preparing an infrared-radar compatible stealth film material according to claim 5 or 6, characterized in that: the diluent is at least one of toluene, xylene, ethyl acetate, butyl acetate, acetone, butanone, cyclohexanone, ethanol, ethylene glycol, n-butanol and isopropanol.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010946450.5A CN112126097B (en) | 2020-09-10 | 2020-09-10 | Infrared-radar compatible stealth film material and preparation method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010946450.5A CN112126097B (en) | 2020-09-10 | 2020-09-10 | Infrared-radar compatible stealth film material and preparation method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
CN112126097A CN112126097A (en) | 2020-12-25 |
CN112126097B true CN112126097B (en) | 2022-12-20 |
Family
ID=73846505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010946450.5A Active CN112126097B (en) | 2020-09-10 | 2020-09-10 | Infrared-radar compatible stealth film material and preparation method thereof |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112126097B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112920442B (en) * | 2021-01-29 | 2023-04-07 | 中国人民解放军国防科技大学 | Resin-based heat-proof composite material with surface coated with high-temperature infrared stealth coating and preparation method thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101294047A (en) * | 2008-06-04 | 2008-10-29 | 北京航空航天大学 | Radar wave absorbing paint with hollow microsphere as filling material and preparation method thereof |
CN101716483A (en) * | 2009-11-30 | 2010-06-02 | 中国科学院长春应用化学研究所 | Method for preparing metal-phosphorus alloy hollow microsphere |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8138673B1 (en) * | 2002-05-21 | 2012-03-20 | Imaging Systems Technology | Radiation shielding |
CN102019427A (en) * | 2010-12-20 | 2011-04-20 | 吴浩 | High-efficiency wave-absorbing particles, wave-absorbing material, and application and preparation method thereof |
CN111154172A (en) * | 2020-01-08 | 2020-05-15 | 江苏科麦特科技发展有限公司 | Shielding type plastic film and composite belt prepared from same |
-
2020
- 2020-09-10 CN CN202010946450.5A patent/CN112126097B/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101294047A (en) * | 2008-06-04 | 2008-10-29 | 北京航空航天大学 | Radar wave absorbing paint with hollow microsphere as filling material and preparation method thereof |
CN101716483A (en) * | 2009-11-30 | 2010-06-02 | 中国科学院长春应用化学研究所 | Method for preparing metal-phosphorus alloy hollow microsphere |
Also Published As
Publication number | Publication date |
---|---|
CN112126097A (en) | 2020-12-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN112126097B (en) | Infrared-radar compatible stealth film material and preparation method thereof | |
KR101047946B1 (en) | Electromagnetic shielding film having a transparent function and a near infrared ray absorption function, an optical filter comprising the same, and a plasma display panel comprising the same | |
CN100580042C (en) | Transparent coating capable of absorbing visible light and infrared light, preparing method and use thereof | |
CN109337558B (en) | Blue-light-proof coating liquid, blue-light-proof coating optical material and preparation method thereof | |
CN115322641B (en) | High-absorptivity stray light inhibition coating and preparation method and application thereof | |
CN103827704A (en) | Heat-ray shielding material | |
CN107200860B (en) | Night vision compatible near-infrared absorption anti-glare optical film and preparation method and application thereof | |
US20160256891A1 (en) | Decorative coating film | |
JP6076699B2 (en) | Infrared shielding film | |
EP3055903B1 (en) | Electromagnetic field absorbing composition | |
CN111777932A (en) | Composite radar wave-absorbing coating and preparation method thereof | |
CN103920436B (en) | A kind of modification tiny balloon and application thereof | |
CN107556900A (en) | A kind of water-based class coating material for touch-screen and preparation method and application | |
JP2014056205A (en) | Far infrared ray shielding material | |
KR20140093380A (en) | Window film for vehicle having improved light-reflection | |
CN112608639B (en) | Preparation method of high-brightness colored microspheres | |
CN112125997B (en) | Functionalized polystyrene microsphere and infrared invisible anti-glare film material | |
CN112129169B (en) | Infrared radar double-stealth film material and preparation method thereof | |
US10954398B2 (en) | Decorative coating film | |
US20160152834A1 (en) | Decorative coating | |
JPWO2007099990A1 (en) | Near-infrared absorbing film and optical filter for plasma display panel using the same | |
CN114364244A (en) | SiCnwPreparation method of/Co composite wave-absorbing material | |
CN113321963A (en) | Radar-proof stealth material for airplane and preparation method thereof | |
CN2508957Y (en) | Hollow micro bead for hidden material | |
CN109369939B (en) | Blue light prevention/color change dual-function optical resin material and preparation method thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |