CN112125534A - 一种镀膜玻璃的制备方法 - Google Patents
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- 238000004544 sputter deposition Methods 0.000 claims abstract description 22
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 18
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Abstract
本发明提供一种镀膜玻璃的制备方法。所述镀膜玻璃制备方法包括:执行步骤S1,提供玻璃基底;执行步骤S2,在所述玻璃基底上溅射沉积功能膜层;执行步骤S3,在所述功能膜层之异于玻璃基底一侧溅射沉积氧化锆耐磨耗层,且所述氧化锆耐磨耗层之溅射腔体与相邻的所述功能膜层之溅射腔体的隔离系数至少为30,所述氧化锆耐磨耗层采用中频电源,并在电流模式下控制溅射沉积。本发明所述镀膜玻璃的制备方法可以保证氧化锆耐磨耗层在溅射沉积过程中启辉稳定,膜层溅射均一,同时所述氧化锆靶材表面不结瘤。另一方面,通过本发明镀膜玻璃制备方法所获得的镀膜玻璃膜层强度改善明显,可满足玻璃深加的冷加工、热处理,值得业内推广使用。
Description
技术领域
本发明涉及建筑玻璃幕墙技术领域,尤其涉及一种镀膜玻璃的制备方法。
背景技术
目前,镀膜玻璃由于其优良的性能已经在各个领域得到了广泛的应用。然而,其在运输和储藏的过程中,基片膜层容易划伤、磨损,并且其银层容易氧化。另外,镀膜玻璃在进行各种冷加工和热处理,如切片、磨损,夹层等处理后,物理化学性能容易发生改变。
针对上述问题,目前国内大部分玻璃深加工企业使用PE有机贴膜保护基片膜层,虽然能起到一定的保护作用,但是在需要使用基片时,需要人工揭膜,且该膜层不能重复利用,又不易降解,批量使用势必会造成大量的固体废物,对环保不利。
故针对现有技术存在的问题,本案设计人凭借从事此行业多年的经验,积极研究改良,于是有了本发明一种镀膜玻璃的制备方法。
发明内容
本发明是针对现有技术中,镀膜玻璃在运输和储藏的过程中,基片膜层容易划伤、磨损,并且其银层容易氧化等缺陷提供一种镀膜玻璃的制备方法
为实现本发明之目的,本发明提供一种镀膜玻璃的制备方法。所述镀膜玻璃制备方法包括:执行步骤S1,提供玻璃基底;执行步骤S2,在所述玻璃基底上溅射沉积功能膜层;执行步骤S3,在所述功能膜层之异于玻璃基底一侧溅射沉积氧化锆耐磨耗层,且所述氧化锆耐磨耗层之溅射腔体与相邻的所述功能膜层之溅射腔体的隔离系数至少为30,所述氧化锆耐磨耗层采用中频电源,并在电流模式下控制溅射沉积。
可选地,所述氧化锆耐磨耗层采用中频电源,通过电流模式控制,所述氧化锆耐磨耗层的中频电源之脉冲频率为20~55kHz。
可选地,所述氧化锆耐磨耗层的电源之脉冲频率为30~45kHz。
可选地,所述氧化锆耐磨耗层在纯氩气工艺气氛下,启辉功率范围为1.0~1.45kWAC/m。
可选地,在所述氧化锆耐磨耗层启辉后,以0.05~0.15Amp/m的速度进行功率提升。
可选地,在所述氧化锆耐磨耗层的功率达到设定值时,逐渐在工艺腔室内通入氧气,使得所述氧化锆耐磨耗层电弧数稳定。
可选地,所述电弧数必须小于250arec/min/m。
可选地,所述氧化锆耐磨耗层溅射沉积结束后,所述氧化锆耐磨耗层的功率下降为1.5~2.5kW/m。
可选地,当氧化锆耐磨耗层的功率下降至2.5kW AC/m以下时,关闭所述脉冲电源。
综上所述,本发明所述镀膜玻璃的制备方法可以保证氧化锆耐磨耗层在溅射沉积过程中启辉稳定,膜层溅射均一,同时所述氧化锆靶材表面不结瘤。另一方面,通过本发明镀膜玻璃制备方法所获得的镀膜玻璃膜层强度改善明显,可满足玻璃深加的冷加工、热处理,值得业内推广使用。
附图说明
图1所示为本发明镀膜玻璃的制备方法所制备的镀膜玻璃之结构示意图;
图2 所示为本发明镀膜玻璃的制备方法之流程图;
图3所示为本发明镀膜玻璃的制备方法所获得的镀膜玻璃之结构示意图。
具体实施方式
为详细说明本发明创造的技术内容、构造特征、所达成目的及功效,下面将结合实施例并配合附图予以详细说明。
目前,镀膜玻璃由于其优良的性能已经在各个领域得到了广泛的应用。然而,其在运输和储藏的过程中,基片膜层容易划伤、磨损,并且其银层容易氧化。另外,镀膜玻璃在进行各种冷加工和热处理,如切片、磨损,夹层等处理后,物理化学性能容易发生改变。
针对上述问题,目前国内大部分玻璃深加工企业使用PE有机贴膜保护基片膜层,虽然能起到一定的保护作用,但是在需要使用基片时,需要人工揭膜,且该膜层不能重复利用,又不易降解,批量使用势必会造成大量的固体废物,对环保不利。
请参阅图1,图1所示为通过本发明镀膜玻璃的制备方法所制备的镀膜玻璃之结构示意图。所述镀膜玻璃1,包括玻璃基底10,磁控溅射沉积在所述玻璃基底10上功能膜层11,以及溅射在所述功能膜层11之异于所述玻璃基底10一侧的氧化锆耐磨耗层12。所述氧化锆耐磨耗层12、所述功能膜层11、所述玻璃基底10自上而下成纵向叠置。所述功能膜层11包括但不限于阳光控制膜层、低辐射膜层、超保温膜层等,所述功能膜层11可通过磁控溅射镀膜、激光脉冲沉积镀膜,或者化学气相沉积镀膜等形成。
请参阅图2,并结合参阅图1,图2 所示为本发明镀膜玻璃的制备方法之流程图。所示镀膜玻璃的制备方法,包括:
执行步骤S1,提供玻璃基底10;
执行步骤S2,在所述玻璃基底10上溅射沉积功能膜层11;
执行步骤S3,在所述功能膜层11之异于玻璃基底一侧溅射沉积氧化锆耐磨耗层12,且所述氧化锆耐磨耗层12之溅射腔体与相邻的所述功能膜层11之溅射腔体的隔离系数至少为30。
作为本领域技术人员,容易知晓的,所述隔离系数为相邻工艺腔室之一通入工艺气体后,达到一定的真空度时,对另一工艺腔室真空度的影响之表征,在此不予赘述。
在本发明中,为了达到氧化锆耐磨耗层12之功能特性,所述步骤S3,进一步包括:
步骤S31,所述氧化锆耐磨耗层12采用中频电源,通过电流模式控制,所述氧化锆耐磨耗层12的中频电源之脉冲频率为20~55kHz。通常地,电源在高频输出时,电弧敏感度会较低。故,在本发明镀膜玻璃的制备方法中,优选的保证最高电弧敏感度,而使用较低的脉冲频率,更具体地,所述氧化锆耐磨耗层12的电源之脉冲频率为30~45kHz。
步骤S32,在纯氩气工艺气氛下,启辉功率范围为1.0~1.45kW AC/m。
步骤S33,在所述氧化锆耐磨耗层12启辉后,以0.05~0.15Amp/m的速度进行功率提升。
执行步骤S34,在所述氧化锆耐磨耗层12的功率达到设定值时,逐渐在工艺腔室内通入氧气,使得所述氧化锆耐磨耗层12电弧数稳定。
显然地,所述氧化锆耐磨耗层12在溅射沉积时的电弧数越低,薄膜溅射越稳定。更具体地,所述电弧数必须小于250arec/min/m。
执行步骤S35,通过上述步骤,获得所述氧化锆耐磨耗层12。
与所述氧化锆耐磨耗层12的启辉溅射相对应,所述氧化锆耐磨耗层12在完成溅射沉积后,亦需要一个逐步功率下降的过程,以保证在氧化锆靶材表面形成最小的热应力结构。优选地,所述氧化锆耐磨耗层12之氧化锆靶材的功率下降为1.5~2.5kW/m。当所述功率下降至2.5kW AC/m以下时,可关闭所述脉冲电源。
为了更直观的揭露本发明之技术方案,凸显本发明之有益效果,现结合具体实施方式,对本发明镀膜玻璃的制备方法和所制备的镀膜玻璃之有益效果进行阐述,但本实施例中涉及的具体膜层结构、材料等仅为列举,不应视为对本发明创造的限制。如图3所示,图3所示为通过本发明镀膜玻璃的制备方法所获得的镀膜玻璃之结构示意图。在本发明中,功能膜层11非限制性的为低辐射功能膜层,为了满足加工性,所述低辐射功能膜层为氮化硅\镍铬\银\镍铬\氮化硅,则所述镀膜玻璃10的膜系架构为玻璃基底\氮化硅\镍铬\银\镍铬\氮化硅\氧化锆耐磨耗层。通过铅笔硬度测试,所述镀膜玻璃10之膜层强度达到6H。
综上所述,本发明所述镀膜玻璃的制备方法可以保证氧化锆耐磨耗层在溅射沉积过程中启辉稳定,膜层溅射均一,同时所述氧化锆靶材表面不结瘤。另一方面,通过本发明镀膜玻璃制备方法所获得的镀膜玻璃膜层强度改善明显,可满足玻璃深加的冷加工、热处理,值得业内推广使用。
本领域技术人员均应了解,在不脱离本发明的精神或范围的情况下,可以对本发明进行各种修改和变型。因而,如果任何修改或变型落入所附权利要求书及等同物的保护范围内时,认为本发明涵盖这些修改和变型。
Claims (9)
1.一种镀膜玻璃的制备方法,其特征在于,所述制备方法包括:
执行步骤S1,提供玻璃基底;
执行步骤S2,在所述玻璃基底上溅射沉积功能膜层;
执行步骤S3,在所述功能膜层之异于玻璃基底一侧溅射沉积氧化锆耐磨耗层,且所述氧化锆耐磨耗层之溅射腔体与相邻的所述功能膜层之溅射腔体的隔离系数至少为30,所述氧化锆耐磨耗层采用中频电源,并在电流模式下控制溅射沉积。
2.如权利要求1所述镀膜玻璃的制备方法,其特征在于,所述氧化锆耐磨耗层的中频电源之脉冲频率为20~55kHz。
3.如权利要求1所述镀膜玻璃的制备方法,其特征在于,所述氧化锆耐磨耗层的电源之脉冲频率为30~45kHz。
4.如权利要求1所述镀膜玻璃的制备方法,其特征在于,所述氧化锆耐磨耗层在纯氩气工艺气氛下,启辉功率范围为1.0~1.45kW AC/m。
5.如权利要求4所述镀膜玻璃的制备方法,其特征在于,在所述氧化锆耐磨耗层启辉后,以0.05~0.15Amp/m的速度进行功率提升。
6.如权利要求5所述镀膜玻璃的制备方法,其特征在于,在所述氧化锆耐磨耗层的功率达到设定值时,逐渐在工艺腔室内通入氧气,使得所述氧化锆耐磨耗层电弧数稳定。
7.如权利要求6所述镀膜玻璃的制备方法,其特征在于,所述电弧数必须小于250arec/min/m。
8.如权利要求1所述镀膜玻璃的制备方法,其特征在于,所述氧化锆耐磨耗层溅射沉积结束后,所述氧化锆耐磨耗层的功率下降为1.5~2.5kW/m。
9.如权利要求8所述镀膜玻璃的制备方法,其特征在于,当氧化锆耐磨耗层的功率下降至2.5kW AC/m以下时,关闭所述脉冲电源。
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