CN112110579A - RO + EDI high-efficient boron system that removes - Google Patents
RO + EDI high-efficient boron system that removes Download PDFInfo
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- CN112110579A CN112110579A CN202011072409.6A CN202011072409A CN112110579A CN 112110579 A CN112110579 A CN 112110579A CN 202011072409 A CN202011072409 A CN 202011072409A CN 112110579 A CN112110579 A CN 112110579A
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- 229910052796 boron Inorganic materials 0.000 title claims abstract description 91
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 title claims abstract description 66
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 83
- 238000005498 polishing Methods 0.000 claims abstract description 6
- 239000012528 membrane Substances 0.000 claims description 24
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 16
- 239000012498 ultrapure water Substances 0.000 claims description 16
- 239000011347 resin Substances 0.000 claims description 13
- 229920005989 resin Polymers 0.000 claims description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 238000001223 reverse osmosis Methods 0.000 claims description 5
- 239000002131 composite material Substances 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000002455 scale inhibitor Substances 0.000 claims description 2
- 238000002203 pretreatment Methods 0.000 claims 1
- -1 boron ions Chemical class 0.000 abstract description 25
- 238000000034 method Methods 0.000 abstract description 12
- 238000011084 recovery Methods 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
- C02F1/4693—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis electrodialysis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/08—Multistage treatments, e.g. repetition of the same process step under different conditions
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Removal Of Specific Substances (AREA)
Abstract
The invention provides an RO + EDI high-efficiency boron removal system which comprises a pretreatment system, a primary RO system, a secondary RO system, an EDI system, a boron removal device and a water supply system in sequence, wherein the primary RO system comprises a security filter, a primary RO high-pressure pump and a primary RO device, the secondary RO system comprises a secondary RO high-pressure pump, a secondary RO device and a secondary RO water tank, the EDI system comprises an EDI booster pump, an EDI security filter and an EDI device, the water supply system comprises a super pure water tank and a rear-end polishing system, and a PH adjusting device is arranged between a water outlet of the primary RO device and a water inlet of the secondary RO high-pressure pump. The invention solves the problems that the prior art can not reduce boron ions to a target value through the traditional two-stage RO + EDI process and can not ensure the effluent requirement of the system.
Description
Technical Field
The invention relates to a water treatment system, in particular to an RO + EDI high-efficiency boron removal system.
Background
With the increasing size of silicon wafers, the requirements on the quality of ultrapure water are continuously improved, in the 8 'and 12' semiconductor industry, the requirements of the effluent of an ultrapure system on the boron ion content are increased to 50-10 ppt, the boron content in tap water in various regions is different, the boron content in tap water in Zhejiang and Tianjin regions reaches 60000ppt, the boron ions are weak electric and are not easily removed, and most of boron in water is removedBoric acid (B (OH)3The method has the form that the electrical property is very weak, and reversible hydrolysis reaction can be generated in water, so a special boron removal method needs to be changed in an ultrapure water system, and the problem of removing boron ions in a two-stage RO + EDI system is solved. In the prior art, under the condition of severe regional water quality, on the premise of considering economy and practicability, a two-stage RO system and an EDI system are selected, corresponding equipment is configured according to different water quality requirements, but a general two-stage RO is selected, the boron removal efficiency is not high, the boron removal efficiency of a general one-stage RO is only about 25 percent, and the removal efficiency of a rear-end two-stage RO is 10, the conductivity value of effluent is influenced, although the boron removal efficiency is slightly increased, the water quality of the two-stage RO effluent is deteriorated, so that the boron ions can not be removed by improving the pH value, the stable operation of the rear-end EDI system also needs to be considered, in addition, the boron removal efficiency of the general EDI is very limited, and the water inlet conductivity has certain requirements, so the boron ions can not be reduced from the 60000ppt of an inlet to 20ppt at all, therefore, how to ensure the requirement of boron ions at the outlet and the process design of secondary RO and EDI are all important during operation.
As can be seen from the above, the prior art has the following problems: the process of unable second grade RO + EDI of passing through falls to the target value with boron ion, can't guarantee the play water requirement of system, if boron ion exceeds standard, can make the wafer of output appear defects such as surface depression, influence the yields, if for reaching boron ion's requirement, increase the resin of removing boron at the rear end, then because the boron ion volume of advancing this resin is huge, need more resin volume of removing boron, this chelating type removes boron resin, and the price is expensive, all get rid of by this kind of resin, will increase the investment cost and the running cost of total system certainly, it is very uneconomical, and the practicality is low.
Disclosure of Invention
The invention provides an RO + EDI high-efficiency boron removal system, which aims to solve the problems that boron ions can not be reduced to a target value through a traditional two-stage RO + EDI process and the water outlet requirement of the system can not be ensured in the prior art.
In order to solve the technical problems, the invention provides an RO + EDI high-efficiency boron removal system, which comprises a pretreatment system, a primary RO system, a secondary RO system, an EDI system, a boron removal device and a water supply system in sequence, wherein the primary RO system comprises a security filter, a primary RO high-pressure pump and a primary RO device, the secondary RO system comprises a secondary RO high-pressure pump, a secondary RO device and a secondary RO water tank, the EDI system comprises an EDI booster pump, an EDI security filter and an EDI device, the water supply system comprises a super pure water tank and a rear-end polishing system, a water outlet pipe of the primary RO device is communicated with the secondary RO high-pressure pump, the secondary RO water tank is communicated with a water inlet of the EDI booster pump of the EDI system, and a PH adjusting device is arranged between a water outlet of the primary RO device and a water inlet of the secondary RO.
The first-stage RO device is a low-pressure membrane or an enhanced low-pollution low-pressure reverse osmosis composite membrane.
The secondary RO device is a sea-fresh membrane or a low-pressure membrane.
The second-stage RO water tank is a nitrogen-sealed water tank.
The ultra-pure water tank is a nitrogen-sealed ultra-pure water tank.
And an antisludging agent adding device is arranged between the pretreatment system and the security filter of the primary RO system.
And the boron removing device is internally provided with boron removing resin.
And the water outlet of the boron removal device is communicated with the secondary RO water tank.
And the PH adjusting device is a NaOH adding device and is used for adjusting the PH of the effluent of the primary RO device to be more than 9 before the effluent enters the secondary RO high-pressure pump.
The invention has the following beneficial effects: the invention adopts the processes of the high-efficiency boron removal RO device, the high-efficiency boron removal EDI device and the boron removal device to treat the ultrapure water system, and has the following advantages:
(1) the outlet boron ion content can be more effectively stabilized to reach the design required value, the whole content is lower than 50ppt, and the content can be stably lower than 20ppt by matching with the boron removal resin;
(2) the recovery rate of EDI is high, the discharge water quantity of EDI can be effectively reduced, and the waste of water quantity is reduced;
(3) the investment cost and the cost of operation and maintenance are effectively reduced;
(4) the risk that boron exceeds the standard is effectively reduced, and the defective rate risk of the wafer is reduced.
Drawings
FIG. 1 is a flow diagram according to an embodiment of the invention.
The system comprises a pretreatment system 1, a cartridge filter 2, a first-stage RO high-pressure pump 3, a first-stage RO device 4, a second-stage RO high-pressure pump 5, a second-stage RO device 6, a second-stage RO water tank 7, an EDI booster pump 8, an EDI cartridge filter 9, an EDI device 10, a boron removal device 11, a ultrapure water tank 12, a rear-end polishing system 13, a scale inhibitor adding device 14 and a PH adjusting device 15.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments.
As shown in fig. 1, the present invention provides an RO + EDI high-efficiency boron removal system, which comprises a pretreatment system 1, a primary RO system, a secondary RO system, an EDI system, a boron removal device 11, and a water supply system, wherein the primary RO system comprises a cartridge filter 2, a primary RO high-pressure pump 3, and a primary RO device 4, the secondary RO system comprises a secondary RO high-pressure pump 5, a secondary RO device 6, and a secondary RO water tank 7, the EDI system comprises an EDI booster pump 8, an EDI cartridge filter 9, and an EDI device 10, the water supply system comprises a ultrapure water tank 12, and a rear-end polishing system 13, a water outlet pipe of the primary RO device 4 is communicated with the secondary RO high-pressure pump 5, the secondary RO water tank is communicated with a water inlet of the EDI booster pump of the EDI system, and a PH adjusting device 15 is arranged between a water outlet of the primary RO device and a water inlet of the secondary.
The first-stage RO device is a low-pressure membrane or an enhanced low-pollution low-pressure reverse osmosis composite membrane.
The secondary RO device is a sea-fresh membrane or a low-pressure membrane.
The second-stage RO water tank is a nitrogen-sealed water tank.
The ultra-pure water tank is a nitrogen-sealed ultra-pure water tank.
An antisludging agent adding device 14 is arranged between the pretreatment system and the security filter of the primary RO system.
And the boron removing device is internally provided with boron removing resin.
And the water outlet of the boron removal device 11 is communicated with the secondary RO water tank 7.
The PH adjusting device 15 is a NaOH adding device and is used for adjusting the PH of the effluent of the first-stage RO device 4 to be more than 9 before the effluent enters the second-stage RO high-pressure pump 5.
The invention belongs to the field of ultrapure water treatment, and aims to solve the problem that in the ultrapure water industry, the high requirement of boron ion water outlet requirement is met through a two-stage RO + EDI process under the conditions that raw water is poor in quality and is not suitable for a 2B3T process and the boron ion index requirement of the outlet water is less than 20 ppt.
The invention aims to adjust and combine an RO membrane, EDI and boron removal resin, a special construction method is selected to achieve that the EDI outlet boron ions can be stabilized below 50ppt under the condition that the inlet boron ions are 60000ppt, and an ion construction method is selected later to stabilize the final outlet boron ions at 20 ppt. The design of the invention adopts the combination of a first-level high release film, PH adjustment, a second-level sea-fresh film, a high boron removal EDI device and a boron removal resin device to meet the requirement of ensuring boron at the outlet.
According to the invention, the boron removal capacity of the primary RO membrane is increased by selecting the primary RO membrane, the boron ion removal efficiency of a common ultra-low pressure membrane is low, the boron removal efficiency of the primary RO unit can be effectively improved by selecting a low pressure membrane or an enhanced low-pollution low-pressure reverse osmosis composite membrane, and the boron removal efficiency can be improved to 25% from the original removal rate of 10%; the combination of 10 percent NaOH and a pipeline mixer is added at the water production of the first-stage RO device and the inlet of the second-stage RO device, and the pH value of the inlet of the second-stage RO device is ensured to be about 9.5 through the effective control of a pH meter (the principle is that boric acid is dissociated into an ionic state when the pH is about 9.5, so that the molecules are enlarged and the electronegativity is increased, and the effective boron removal effect of a reverse osmosis membrane is enhanced); the selection of the secondary RO membrane is that a sea-fresh membrane is selected, so that the boron removal efficiency can be improved again, the removal efficiency of the secondary RO membrane device is improved from the original 25 percent to 93 percent, the boron removal efficiency of the RO membrane device is greatly improved, and the boron ions at the outlet of the secondary RO membrane are controlled to be about 4500ppt under the condition that the raw water is 64000 ppt; the special EDI device matched with the rear end selects VNX-EX series, the recovery rate of EDI can be increased to more than 97.5-98%, the removal rate of boron is increased to more than 99%, the discharge amount of EDI concentrated water is reduced, the overall recovery rate of the system is reduced, and the boron ions at the EDI outlet can be ensured to reach about 50 ppt; the rear end is provided with a group of boron removal devices (resin type), so that boron ions can be stably and effectively controlled to be below 20ppt, and the boron removal devices do not need to be added when the outlet boron is less than 50 ppt. Effectively reduces the water discharge of the system, and effectively saves the investment cost and the operation cost under the condition that the outlet water of boron ions can be stably controlled to meet the requirements.
The process principle is as follows: the pre-treated water is produced, after passing through a cartridge filter, a first-stage RO system is carried out, concentrated water is discharged, the discharged water enters a second-stage RO system, before entering the second-stage RO system, the PH is adjusted to be about 9.5, the concentrated water of the second-stage RO system is discharged, and the pre-treated water can also be used as a regenerated water source or for watering flowers; the water produced is processed by a second-stage RO water tank, in order to prevent the water quality from becoming worse, the water tank is arranged in a nitrogen seal mode, the water produced by the second-stage RO water tank passes through an EDI device, the water quality is further improved to reach a set value, and the EDI concentrated water is discharged and can also be used as a regenerated water source or for watering flowers; and the produced water enters a boron removal device to further remove boron ions. The final product water was taken in a ultrapure water tank (nitrogen seal) as raw water for the polishing system.
The process is suitable for the water quantity of the system of 20m3The water producing capacity per hour has higher economical efficiency.
The invention adopts the processes of the high-efficiency boron removal RO device, the high-efficiency boron removal EDI device and the boron removal device to treat the ultrapure water system, and has the following advantages:
(1) the outlet boron ion content can be more effectively stabilized to reach the design required value, the whole content is lower than 50ppt, and the content can be stably lower than 20ppt by matching with the boron removal resin;
(2) the recovery rate of EDI is high, the discharge water quantity of EDI can be effectively reduced, and the waste of water quantity is reduced;
(3) the investment cost and the cost of operation and maintenance are effectively reduced;
(4) the risk that boron exceeds the standard is effectively reduced, and the defective rate risk of the wafer is reduced.
The above description is only an example of the present invention, and is not intended to limit the present invention, and it is obvious to those skilled in the art that various modifications and variations can be made in the present invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the claims of the present invention.
Claims (9)
1. An RO + EDI high-efficiency boron removal system sequentially comprises a pretreatment system (1), a primary RO system, a secondary RO system, an EDI system, a boron removal device (11) and a water supply system, characterized in that the primary RO system comprises a security filter (2), a primary RO high-pressure pump (3) and a primary RO device (4), the secondary RO system comprises a secondary RO high-pressure pump (5), a secondary RO device (6) and a secondary RO water tank (7), the EDI system comprises an EDI booster pump (8), an EDI security filter (9) and an EDI device (10), the water supply system comprises an ultra pure water tank (12) and a rear end polishing system (13), the water outlet pipe of the primary RO device (4) is communicated with the secondary RO high-pressure pump (5), the secondary RO water tank is communicated with the water inlet of an EDI booster pump of the EDI system, a PH adjusting device (15) is arranged between the water outlet of the first-stage RO device and the water inlet of the second-stage RO high-pressure pump.
2. The RO + EDI high efficiency boron removal system of claim 1, wherein the primary RO unit is selected from low pressure membranes or enhanced low pollution low pressure reverse osmosis composite membranes.
3. The RO + EDI high efficiency boron removal system of claim 1 wherein the secondary RO device is selected from a marine membrane or a low pressure membrane.
4. The RO + EDI high efficiency boron removal system of claim 1 wherein the secondary RO tank is a nitrogen seal tank.
5. The RO + EDI high efficiency boron removal system of claim 1, wherein the ultrapure water tank is a nitrogen-sealed ultrapure water tank.
6. The RO + EDI high efficiency boron removal system according to claim 1, wherein a scale inhibitor addition device (14) is provided between the pre-treatment system and the cartridge filter of the primary RO system.
7. The RO + EDI high efficiency boron removal system of claim 1 wherein said boron removal means incorporates a boron removal resin.
8. An RO + EDI high efficiency boron removal system as claimed in claim 7, characterized in that the water outlet of said boron removal device (11) is connected to the secondary RO water tank (7).
9. The RO + EDI high efficiency boron removal system of claim 1, wherein the PH adjusting means (15) is NaOH adding means for adjusting the PH of the effluent from the primary RO unit (4) to above 9 prior to entering the secondary RO high pressure pump (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011072409.6A CN112110579A (en) | 2020-10-09 | 2020-10-09 | RO + EDI high-efficient boron system that removes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011072409.6A CN112110579A (en) | 2020-10-09 | 2020-10-09 | RO + EDI high-efficient boron system that removes |
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| Publication Number | Publication Date |
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| CN112110579A true CN112110579A (en) | 2020-12-22 |
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| CN202011072409.6A Pending CN112110579A (en) | 2020-10-09 | 2020-10-09 | RO + EDI high-efficient boron system that removes |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1408653A (en) * | 2002-09-24 | 2003-04-09 | 天津大学 | Producing process and technology for electronic grade water by intergrated film process |
| CN203683265U (en) * | 2013-11-12 | 2014-07-02 | 厦门市中智海海洋科技有限公司 | Secondary reverse osmosis system of reverse osmosis boron removal system |
| CN203683262U (en) * | 2013-11-12 | 2014-07-02 | 厦门市中智海海洋科技有限公司 | Reverse osmosis (RO) boron removal system |
| CN210885649U (en) * | 2019-04-11 | 2020-06-30 | 江苏达诺尔科技股份有限公司 | Boron removal ultrapure water system for IC semiconductor industry |
-
2020
- 2020-10-09 CN CN202011072409.6A patent/CN112110579A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1408653A (en) * | 2002-09-24 | 2003-04-09 | 天津大学 | Producing process and technology for electronic grade water by intergrated film process |
| CN203683265U (en) * | 2013-11-12 | 2014-07-02 | 厦门市中智海海洋科技有限公司 | Secondary reverse osmosis system of reverse osmosis boron removal system |
| CN203683262U (en) * | 2013-11-12 | 2014-07-02 | 厦门市中智海海洋科技有限公司 | Reverse osmosis (RO) boron removal system |
| CN210885649U (en) * | 2019-04-11 | 2020-06-30 | 江苏达诺尔科技股份有限公司 | Boron removal ultrapure water system for IC semiconductor industry |
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| Title |
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| 《水工业市场》杂志社 * |
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| 张茂于: "《产业专利分析报告—海水淡化》", 30 June 2017 * |
| 房春生等: "用反渗透膜模拟核电厂含硼废水的脱硼效率", 《吉林大学学报（理学版）》 * |
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