CN112087852A - Control method and control device for plasma generator - Google Patents
Control method and control device for plasma generator Download PDFInfo
- Publication number
- CN112087852A CN112087852A CN201910505455.1A CN201910505455A CN112087852A CN 112087852 A CN112087852 A CN 112087852A CN 201910505455 A CN201910505455 A CN 201910505455A CN 112087852 A CN112087852 A CN 112087852A
- Authority
- CN
- China
- Prior art keywords
- voltage
- power supply
- signal
- plasma generator
- phase difference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 28
- 238000009413 insulation Methods 0.000 claims description 7
- 230000003247 decreasing effect Effects 0.000 claims description 5
- 210000002381 plasma Anatomy 0.000 abstract 9
- 238000010586 diagram Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000004146 energy storage Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
Abstract
The invention provides a control method and a control device for a plasma generator, and belongs to the technical field of plasmas. The control method for the plasma generator includes: acquiring a voltage signal and a current signal in a power supply line connected with the plasma generator; determining a phase difference of the voltage signal and the current signal; and adjusting the voltage frequency output by a power supply for supplying power to the plasma generator when the phase difference exceeds a preset range. The control method for the plasma generator adjusts the voltage frequency, can realize good matching of the power supply and the plasma generator, injects more electric energy into the plasma generator, and further improves the efficiency of the plasma generator.
Description
Technical Field
The invention relates to the technical field of plasma, in particular to a control method and a control device for a plasma generator.
Background
The high-voltage discharge plasma technology has wide application prospect in the fields of petrochemical industry, material preparation and modification, environmental protection and the like. The plasma is classified according to different standards, and can be divided into high-temperature plasma and low-temperature plasma according to the particle temperature, and can be divided into microwave plasma, high-voltage discharge plasma, nuclear fusion plasma, laser plasma and the like according to the driving energy form. In practical application, on one hand, in consideration of technical feasibility, convenience and applicability, the generation of gas or liquid discharge driven by a high-voltage power supply is a main mode for generating plasma, and on the other hand, the energy consumption of a high-voltage discharge plasma system or device is also a key factor for determining technical economy, so that the improvement of the energy efficiency of discharge plasma generation is of great importance.
When a high-frequency high-voltage power supply is adopted to drive a plasma generator to discharge to generate uniform and stable plasma, the impedance of the power supply is matched with the load impedance of the plasma generator. When the impedance is matched, the energy output by the power supply can be more effectively injected into the plasma generator, more electric energy is used for high-voltage discharge, if the impedance cannot be well matched, the discharge cannot be stably carried out, plasma is efficiently generated, a large amount of reactive power can be transmitted in a power supply circuit, and circuit elements are heated to cause damage.
The inventors of the present application have found that a prior art solution is to tailor the drive power supply to the plasma generator after the structure of the generator has been determined. However, in practical applications, on one hand, the plasma generator has various structures, materials and sizes, and the difference between equivalent load capacitance and resistance is large, and on the other hand, the equivalent capacitance and resistance before and after plasma generation also change, and how to flexibly match the plasma generator with various high-voltage power supplies and dynamically changed parameters is a key problem for improving the plasma generation efficiency.
Disclosure of Invention
The embodiment of the invention aims to provide a control method and a control device for a plasma generator. For solving one or more of the above technical problems.
In order to achieve the above object, an embodiment of the present invention provides a control method for a plasma generator, the method including: acquiring a voltage signal and a current signal in a power supply line connected with the plasma generator; determining a phase difference of the voltage signal and the current signal; and adjusting the voltage frequency output by a power supply for supplying power to the plasma generator when the phase difference exceeds a preset range.
Optionally, the preset range is- Δ T to + Δ T, and when the phase difference is smaller than- Δ T, it is determined that the current signal leads the voltage signal, and the voltage frequency is increased; and when the phase difference is greater than + Δ T, decreasing the voltage frequency if the current signal is determined to lag the voltage signal, wherein Δ T is ten percent of the period of the electrical signal.
Optionally, the Δ T is five percent of the period of the electrical signal.
Optionally, the method further includes: detecting the voltage signal by adopting a voltage sensor connected with a high-voltage wire in the power supply circuit; and detecting the current signal with a current sensor coupled to a high voltage line or a low voltage line in the power supply line.
Optionally, when the current signal is detected by using a current sensor coupled to a high-voltage line in the power supply line, the current sensor is subjected to insulation protection.
Correspondingly, the embodiment of the invention also provides a control device of the plasma generator, which comprises: the acquisition module is used for acquiring a voltage signal and a current signal in a power supply line connected with the plasma generator; and the processing module is connected with the acquisition module and used for determining the phase difference between the voltage signal and the current signal and adjusting the voltage frequency output by a power supply for supplying power to the plasma generator when the phase difference exceeds a preset range.
Optionally, the preset range is- Δ T to + Δ T, and the processing module is configured to perform the following operations: when the phase difference is smaller than minus delta T, determining that the current signal leads the voltage signal, and increasing the voltage frequency; and when the phase difference is greater than + Δ T, decreasing the voltage frequency if the current signal is determined to lag the voltage signal, wherein Δ T is ten percent of the period of the electrical signal.
Optionally, the obtaining module includes: the voltage sensor is connected with a high-voltage wire in the power supply line and used for detecting a voltage signal in the power supply line; and the current sensor is coupled with the high-voltage line or the low-voltage line in the power supply line and is used for detecting a current signal in the power supply line.
Optionally, when the current sensor is coupled to a high-voltage line in the power supply line, the current sensor is subjected to insulation protection by an insulation protection module.
Optionally, when the plasma generator is powered after the electrical signal output by the power supply is boosted by using the step-up transformer, the voltage sensor is connected to a high-voltage line between the power supply and the step-up transformer, and the current sensor is coupled to the high-voltage line or a low-voltage line between the power supply and the step-up transformer; or the voltage sensor is connected with a high-voltage wire between the step-up transformer and the plasma generator, and the current sensor is coupled with a high-voltage wire or a low-voltage wire between the step-up transformer and the plasma generator.
Through the technical scheme, the output voltage frequency is adjusted according to the phase difference of the voltage signal and the current signal, and the phase difference of the voltage signal and the current signal is controlled to be always kept within a reasonable range, so that the power supply and the plasma generator are well matched, more electric energy can be injected into the plasma generator, and the efficiency of the plasma generator is improved.
Additional features and advantages of embodiments of the invention will be set forth in the detailed description which follows.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the embodiments of the invention without limiting the embodiments of the invention. In the drawings:
FIG. 1 is a schematic flow chart of a control method for a plasma generator according to an embodiment of the present invention;
fig. 2 is a block diagram of a control device for a plasma generator according to an embodiment of the present invention;
fig. 3 is a schematic structural diagram of a control device for a plasma generator according to an embodiment of the present invention.
Detailed Description
The following detailed description of embodiments of the invention refers to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating embodiments of the invention, are given by way of illustration and explanation only, not limitation.
Fig. 1 is a schematic flowchart of a control method for a plasma generator according to an embodiment of the present invention, where the control method for a plasma generator, as shown in fig. 1, includes: acquiring a voltage signal and a current signal in a power supply line connected with the plasma generator; determining a phase difference of the voltage signal and the current signal; and adjusting the voltage frequency output by a power supply for supplying power to the plasma generator when the phase difference exceeds a preset range.
The acquisition of the voltage signal and the current signal, the determination of the phase difference between the voltage signal and the current signal and the adjustment of the voltage frequency in the method are selected to be performed in real time, namely, the parameters are monitored and the voltage frequency is adjusted in real time during the working period of the plasma generator, and after the voltage frequency is adjusted each time, the real-time monitoring state still needs to be maintained, so that the energy efficiency of the plasma generator during the working period is effectively improved and the reactive power is reduced.
Normally, the plasma generator is provided with driving electric energy through alternating current with a voltage value and a frequency value within a specified range of the plasma generator, and as a load in the whole circuit comprises energy storage elements such as an inductor and a capacitor, the energy storage elements do not consume active power, and only energy absorption and feedback are carried out, so that a phase difference between voltage and current is caused. Therefore, according to the technical scheme provided by the embodiment of the invention, the voltage signal in the power line (namely, the high-voltage line) for transmitting the electric energy and the current signal in the power line (namely, the low-voltage line) for forming the working loop can be detected in real time or the voltage signal and the current signal in the high-voltage line can be detected in real time, the phase difference in the voltage signal and the current signal detected in real time is determined, and whether the frequency of the alternating current needs to be adjusted or not is determined according to the comparison result of the determined phase difference and the preset range.
Alternatively, the device for detecting the voltage signal may be a voltage sensor, and the device for detecting the current signal may be a current sensor.
When the current sensor is used to detect a current signal in a high-voltage line, the current sensor needs to be protected in an insulating manner to avoid safety accidents, for example, the current sensor is usually protected or isolated by using an insulating material. Considering that various properties of an insulating material for insulation protection may be degraded by environmental influences or may be damaged, etc., which may cause an electrical accident, it is preferable that the current sensor is coupled to a low voltage line in the line, so that the connected current sensor is at a zero potential and no safety accident occurs.
Alternatively, the phase difference between the voltage signal and the current signal may be determined by any method in the prior art, for example, the phase difference between the voltage signal and the current signal may be determined according to the time difference between the zero crossings of the voltage and the current, and the like.
In addition, an embodiment of the present invention further provides a method for adjusting a voltage frequency according to a phase difference between a voltage signal and a current signal, where the method includes: the method comprises the steps of firstly setting a preset range from-delta T to + delta T, determining that a current signal leads the voltage signal and needs to be improved if the phase difference between the voltage signal and the current signal is smaller than-delta T, determining that the current signal lags the voltage signal and needs to be reduced if the phase difference between the voltage signal and the current signal is larger than-delta T, and determining that the matching degree between a current power supply and a plasma generator is good if the phase difference between the voltage signal and the current signal is between-delta T and + delta T without adjusting the voltage frequency.
Optionally, the user may set the adjustment amount for adjusting the voltage frequency each time according to actual needs.
Alternatively, the specific value of Δ T may be any value, for example, Δ T is ten percent of the period of the electrical signal, or is preferably five percent of the period of the electrical signal.
According to the scheme provided by the embodiment of the invention, the output voltage frequency is adjusted according to the phase difference of the voltage signal and the current signal, and the phase difference of the voltage signal and the current signal is controlled to be always kept in a reasonable range, so that the power supply and the plasma generator are well matched, more electric energy can be injected into the plasma generator, and the efficiency of the plasma generator is improved.
Fig. 2 is a block diagram of a control device for a plasma generator according to an embodiment of the present invention. As shown in fig. 2, the control apparatus for a plasma generator includes an acquisition module 210 and a processing module 220 connected to each other. The acquiring module 210 is configured to acquire a voltage signal and a current signal in a power supply line connected to the plasma generator, and the processing module 220 is configured to determine a phase difference between the voltage signal and the current signal, and adjust a voltage frequency output by a power supply that supplies power to the plasma generator when the phase difference exceeds a preset range.
The preset range may be represented by- Δ T to + Δ T, and if the phase difference between the voltage signal and the current signal is smaller than- Δ T, it is determined that the current signal leads the voltage signal and the voltage frequency needs to be increased, and if the phase difference between the voltage signal and the current signal is larger than- Δ T, it is determined that the current signal lags the voltage signal and the voltage frequency needs to be decreased, and if the phase difference between the voltage signal and the current signal is between- Δ T to + Δ T, it is determined that the matching degree between the current power supply and the plasma generator is good, and the voltage frequency does not need to be adjusted.
Alternatively, the Δ T may be ten percent of the period of the electrical signal, or five percent of the period of the electrical signal, or the like.
Alternatively, the obtaining module 210 may include a voltage sensor connected to a high voltage line of the power supply line and configured to detect a voltage signal in the power supply line, and a current sensor coupled to the high voltage line or a low voltage line of the power supply line and configured to detect a current signal in the power supply line.
When the current sensor is coupled with a high-voltage line in a power supply line, the current sensor needs to be insulated and protected through the insulation protection module so as to avoid safety accidents.
Further, when the plasma generator is powered by the power supply, a step-up transformer generally needs to be added between the power supply and the plasma generator, so that the power supply can meet the requirements of the plasma generator.
A control apparatus for a plasma generator according to an embodiment of the present invention will be explained with reference to an embodiment.
Fig. 3 is a schematic structural diagram of a control device for a plasma generator according to an embodiment of the present invention. As shown in fig. 3, the control device for the plasma generator mainly comprises a processing module 1, a driving power output module 2, a plasma generator 3, a ground wire 4, a current sensor 5, a low-voltage high-frequency alternating current line 6, a voltage sensor 7 and a step-up transformer 8.
The driving power supply output module 2 outputs low-voltage high-frequency alternating voltage, the high-voltage high-frequency alternating voltage is changed into high-voltage high-frequency alternating voltage through the step-up transformer 8 to provide driving electric energy for the plasma generator 3, the voltage transformer 7 is installed on the low-voltage high-frequency alternating current line 6 on the output side of the driving power supply output module 2, the current transformer 5 is installed on the ground wire 4, voltage signals detected by the voltage transformer 7 and current signals detected by the current transformer 5 are uploaded to the processing module 1, and the processing module 1 calculates the phase difference between the voltage signals and the current signals. If the phase difference is within the range of-delta T to + delta T, the driving power supply is judged to be well matched with the plasma generator; if the phase difference is smaller than-delta T, the current is judged to be advanced, the driving processing module 1 increases the output frequency delta f of the driving power supply output module 2, and the phase difference value is continuously detected until the phase difference is within the range of-delta T to + delta T; if the phase difference is greater than +/- Δ T, it is determined as current lag, and the processing module 1 decreases the output frequency Δ f of the driving power output module 2, and continues to detect the phase difference value until the phase difference is within the range of- Δ T to + Δ T.
The specific operating principle and benefits of the control method for the plasma generating device provided by the embodiment of the invention are similar to those of the plasma generating device provided by the embodiment of the invention, and will not be described again here.
Although the embodiments of the present invention have been described in detail with reference to the accompanying drawings, the embodiments of the present invention are not limited to the details of the above embodiments, and various simple modifications can be made to the technical solutions of the embodiments of the present invention within the technical idea of the embodiments of the present invention, and the simple modifications all belong to the protection scope of the embodiments of the present invention.
It should be noted that the various features described in the above embodiments may be combined in any suitable manner without departing from the scope of the invention. In order to avoid unnecessary repetition, the embodiments of the present invention do not describe every possible combination.
Those skilled in the art will understand that all or part of the steps in the method according to the above embodiments may be implemented by a program, which is stored in a storage medium and includes several instructions to enable a single chip, a chip, or a processor (processor) to execute all or part of the steps in the method according to the embodiments of the present application. And the aforementioned storage medium includes: a U-disk, a removable hard disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk or an optical disk, and other various media capable of storing program codes.
In addition, any combination of various different implementation manners of the embodiments of the present invention is also possible, and the embodiments of the present invention should be considered as disclosed in the embodiments of the present invention as long as the combination does not depart from the spirit of the embodiments of the present invention.
Claims (10)
1. A control method for a plasma generator, the method comprising:
acquiring a voltage signal and a current signal in a power supply line connected with the plasma generator;
determining a phase difference of the voltage signal and the current signal; and
and when the phase difference exceeds a preset range, adjusting the voltage frequency output by a power supply for supplying power to the plasma generator.
2. The control method according to claim 1,
the preset range is- Δ T to + Δ T,
when the phase difference is smaller than minus delta T, determining that the current signal leads the voltage signal, and increasing the voltage frequency; and
determining that the current signal lags the voltage signal when the phase difference is greater than + Δ T, then decreasing the voltage frequency,
wherein the Δ T is ten percent of a period of the electrical signal.
3. The control method according to claim 2, characterized in that the Δ T is five percent of the period of the electric signal.
4. The control method according to claim 1, characterized in that the method further comprises:
detecting the voltage signal by adopting a voltage sensor connected with a high-voltage wire in the power supply circuit; and
and detecting the current signal by adopting a current sensor coupled with a high-voltage line or a low-voltage line in the power supply line.
5. The control method according to claim 4, characterized in that when the current signal is detected with a current sensor coupled to a high-voltage line in the power supply line, the current sensor is insulation-protected.
6. A control device for a plasma generator, the device comprising:
the acquisition module is used for acquiring a voltage signal and a current signal in a power supply line connected with the plasma generator; and
and the processing module is connected with the acquisition module and used for determining the phase difference between the voltage signal and the current signal and adjusting the voltage frequency output by a power supply for supplying power to the plasma generator when the phase difference exceeds a preset range.
7. The apparatus of claim 6, wherein the preset range is- Δ T to + Δ T, and wherein the processing module is configured to:
when the phase difference is smaller than minus delta T, determining that the current signal leads the voltage signal, and increasing the voltage frequency; and
determining that the current signal lags the voltage signal when the phase difference is greater than + Δ T, then decreasing the voltage frequency,
wherein the Δ T is ten percent of a period of the electrical signal.
8. The apparatus of claim 6, wherein the obtaining module comprises:
the voltage sensor is connected with a high-voltage wire in the power supply line and used for detecting a voltage signal in the power supply line; and
and the current sensor is coupled with a high-voltage line or a low-voltage line in the power supply line and is used for detecting a current signal in the power supply line.
9. The apparatus of claim 8, wherein the current sensor is insulation protected by an insulation protection module when the current sensor is coupled with a high voltage line in the power supply line.
10. The apparatus of claim 8, wherein when the electrical signal output by the power supply is boosted by the step-up transformer to power the plasma generator,
the voltage sensor is connected with a high-voltage wire between the power supply and the boosting transformer, and the current sensor is coupled with the high-voltage wire or the low-voltage wire between the power supply and the boosting transformer; or
The voltage sensor is connected with a high-voltage line between the step-up transformer and the plasma generator, and the current sensor is coupled with a high-voltage line or a low-voltage line between the step-up transformer and the plasma generator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910505455.1A CN112087852A (en) | 2019-06-12 | 2019-06-12 | Control method and control device for plasma generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910505455.1A CN112087852A (en) | 2019-06-12 | 2019-06-12 | Control method and control device for plasma generator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112087852A true CN112087852A (en) | 2020-12-15 |
Family
ID=73734426
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910505455.1A Pending CN112087852A (en) | 2019-06-12 | 2019-06-12 | Control method and control device for plasma generator |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112087852A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005116818A (en) * | 2003-10-08 | 2005-04-28 | Nec Yamagata Ltd | Plasma generator |
| US20160234922A1 (en) * | 2013-10-04 | 2016-08-11 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Power supply apparatus |
| WO2018101126A1 (en) * | 2016-12-02 | 2018-06-07 | Tdk株式会社 | Plasma generator |
| CN108353493A (en) * | 2016-01-22 | 2018-07-31 | Spp科技股份有限公司 | Plasma control apparatus |
| CN109004882A (en) * | 2017-11-09 | 2018-12-14 | 苏州工业园区艾思科技有限公司 | A kind of control method improving Induction Motor-Driven efficiency |
-
2019
- 2019-06-12 CN CN201910505455.1A patent/CN112087852A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005116818A (en) * | 2003-10-08 | 2005-04-28 | Nec Yamagata Ltd | Plasma generator |
| US20160234922A1 (en) * | 2013-10-04 | 2016-08-11 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Power supply apparatus |
| CN108353493A (en) * | 2016-01-22 | 2018-07-31 | Spp科技股份有限公司 | Plasma control apparatus |
| WO2018101126A1 (en) * | 2016-12-02 | 2018-06-07 | Tdk株式会社 | Plasma generator |
| CN109004882A (en) * | 2017-11-09 | 2018-12-14 | 苏州工业园区艾思科技有限公司 | A kind of control method improving Induction Motor-Driven efficiency |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101819840B1 (en) | Power-supply device | |
| US10063076B2 (en) | Energy storage devices and methods for fast charging of energy storage devices at very low temperatures | |
| CN102904323B (en) | Pulse wave modulation charging method and pulse wave modulation charging device | |
| Isayama et al. | Neoclassical tearing mode control using electron cyclotron current drive and magnetic island evolution in JT-60U | |
| CN101720563B (en) | Power supply for radio frequency heating apparatus | |
| TW201233252A (en) | Measuring and controlling parameters of a plasma generator | |
| KR101863031B1 (en) | Power-supply device | |
| KR101819839B1 (en) | Power-supply device | |
| CN112087852A (en) | Control method and control device for plasma generator | |
| US9848484B2 (en) | Power-supply apparatus | |
| Raman et al. | Non-inductive solenoid-less plasma current startup in NSTX using transient CHI | |
| JP2000331798A (en) | Control method for high frequency power supply | |
| CN103787278B (en) | A kind of ozone generation system based on Bipolar pulse power | |
| CN112020164B (en) | Radio frequency heating circuit and radio frequency heating equipment | |
| WO2015074155A1 (en) | Method and device for controlling an ozone generator power supply | |
| Kruglov et al. | Study of a gas-discharge current interrupter with a slotted configuration of holes in the grid node and improved discharge parameters in a high-voltage pulse generator with inductive energy storage | |
| CN113543444B (en) | Microwave-induced metal discharge combustion-supporting method and control system thereof | |
| JPH01223789A (en) | Power source device for solid laser pumping lamp | |
| CN109692637A (en) | A kind of integral type electric discharge device and liquid discharge system | |
| CN109379795B (en) | Inversion frequency tracking phase-locking control system of induction heating power supply | |
| CN202006326U (en) | Energy-saving electro discharge drilling machine | |
| Raman et al. | Plasma startup in the National Spherical Torus Experiment using transient coaxial helicity injection | |
| Alim et al. | Electrical Characterization of Inductively Coupled Plasma Reactor Excited by RF (13.56 MHz) | |
| Li et al. | High-Accuracy and Fast Charging Method Based on Multi-Channel Two-Stage Charging Strategy for Surface Nuclear Magnetic Resonance | |
| KR101458933B1 (en) | Multi-level power converting system for resonance load and method for controlling the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20201215 |
|
| RJ01 | Rejection of invention patent application after publication |