CN112076094A - High moisture-retaining facial mask and preparation method thereof - Google Patents

High moisture-retaining facial mask and preparation method thereof Download PDF

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Publication number
CN112076094A
CN112076094A CN202011005798.0A CN202011005798A CN112076094A CN 112076094 A CN112076094 A CN 112076094A CN 202011005798 A CN202011005798 A CN 202011005798A CN 112076094 A CN112076094 A CN 112076094A
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mask
moisture
retention
parts
collecting
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CN112076094B (en
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刘翠芳
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Guangzhou Fanzhirong Cosmetics Co ltd
Guangzhou Qingnong Biotechnology Co ltd
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Nanjing Feitian Yimiao Technology Service Co ltd
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/73Polysaccharides
    • A61K8/736Chitin; Chitosan; Derivatives thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/02Cosmetics or similar toiletry preparations characterised by special physical form
    • A61K8/0212Face masks
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/33Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
    • A61K8/34Alcohols
    • A61K8/345Alcohols containing more than one hydroxy group
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/33Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
    • A61K8/36Carboxylic acids; Salts or anhydrides thereof
    • A61K8/365Hydroxycarboxylic acids; Ketocarboxylic acids
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/49Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds
    • A61K8/4973Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds with oxygen as the only hetero atom
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/64Proteins; Peptides; Derivatives or degradation products thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/73Polysaccharides
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/81Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • A61K8/8141Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • A61K8/8147Homopolymers or copolymers of acids; Metal or ammonium salts thereof, e.g. crotonic acid, (meth)acrylic acid; Compositions of derivatives of such polymers
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/96Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
    • A61K8/97Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
    • A61K8/9706Algae
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/96Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
    • A61K8/97Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
    • A61K8/9706Algae
    • A61K8/9711Phaeophycota or Phaeophyta [brown algae], e.g. Fucus
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin

Abstract

The invention provides a high moisture mask and a preparation method thereof, the mask comprises substrate mask paper and a moisture preserving stock solution, and the moisture preserving stock solution comprises the following substances in parts by weight: 55-80 parts of deionized water, 25-30 parts of moisturizing gel liquid, 6-8 parts of glycerol, 1-2 parts of carbomer, 3-5 parts of silk fibroin and 0.5-1.0 part of span-80; the moisturizing gel liquid comprises water-extracted polysaccharide dialysate of a mixture of kelp and seaweed. According to the high-moisture-retention facial mask disclosed by the embodiment of the invention, the moisture-retention film layer can be formed on the surface of facial skin through the moisture-retention components continuously released by the prepared moisture-retention gel liquid, so that good coating property and durability can be formed on the surface of the facial skin, the moisture-retention performance is improved, and the moisture-retention time is prolonged.

Description

High moisture-retaining facial mask and preparation method thereof
Technical Field
The invention belongs to the technical field of cosmetics, and particularly relates to a high-moisture-retention facial mask and a preparation method thereof.
Background
The facial mask is a paste-like to transparent fluid jelly made of powder. Its action principle is to use powder or film material to retain water. These materials are applied to the skin surface in a suitable thickness and allowed to dry over a period of time. During this time, the stratum corneum of the skin remains soft due to moisture from the mask and moisture from the covered skin. The basic procedure of skin moisturizing is well done, so that the skin aging can be delayed, the barrier function of the skin can be recovered, the skin elasticity can be enhanced, wrinkles and color spots can be reduced, the skin can be kept beautiful and the like, so that the moisturizing product is always one of the key points of attention of consumers, and for skin care product developers, the improvement of the moisturizing capability of the product can become the center of gravity and the footing of all the development work of the developers.
The traditional mask materials simply improve the moisture retention of skin by moisturizing the surface of the human body, and the defects that nutrients are absorbed back by the mask due to overlong application time of the existing mask, the face skin is dry and the like are caused, so that how to improve the moisture retention performance of the mask and prolong the moisture retention timeliness of the mask after use are the key points of the development of the existing moisture retention mask materials.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art.
In view of the above, the present invention provides a high moisture retention mask and a preparation method thereof, wherein the high moisture retention mask can form a moisture retention film layer on the surface of facial skin through moisture retention components continuously released from a prepared moisture retention gel solution, so that the high moisture retention mask can form good coverage and durability on the surface of the facial skin, thereby improving the moisture retention performance and prolonging the moisture retention time.
According to the first aspect of the invention, the high moisture-keeping mask comprises a base mask paper and a moisture-keeping stock solution, wherein the moisture-keeping stock solution comprises the following substances in parts by weight: 55-80 parts of deionized water, 25-30 parts of moisturizing gel liquid, 6-8 parts of glycerol, 1-2 parts of carbomer, 3-5 parts of silk fibroin and 0.5-1.0 part of span-80; the moisturizing gel liquid comprises water-extracted polysaccharide dialysate of a mixture of kelp and seaweed.
According to the high moisture retention facial mask disclosed by the embodiment of the invention, the water extract product of kelp and a kelp mixture is selected as a moisture retention material, and as a large number of polar groups such as hydroxyl groups or carboxyl groups exist in the extracted structure of the kelp and kelp compound polysaccharide, hydrogen bonds can be formed between the kelp and water molecules and the kelp compound polysaccharide are mutually crosslinked to form a net structure, so that the kelp and kelp compound polysaccharide shows good moisture absorption and moisture retention performances, silk fibroin is used as a moisture retention raw material, is modified by adding silk fibroin in an auxiliary manner, the excellent film forming performance of the silk fibroin is effectively compounded and synergistically improved with moisture retention polysaccharide components, and through the good film forming performance of mucopolysaccharide in the silk fibroin, a uniform film is formed on the surface of skin, so that the evaporation of skin moisture is reduced, the stratum corneum is further hydrated, the moisture of the skin is preserved, and the.
The high moisture mask according to the embodiment of the present invention may further have the following additional technical features:
according to one embodiment of the present invention, the moisturizing gel liquid includes: 5-50 parts of deionized water, 10-15 parts of chitosan, 3-5 parts of citric acid, 6-8 parts of agarose and 10-15 parts of dialysate; the preparation method of the moisturizing gel liquid comprises the following steps: taking kelp and seaweed, freeze-drying, crushing, grinding and sieving, filtering and collecting filtrate; putting the filtrate collected by filtration into a dialysis bag, performing dialysis treatment and collecting dialysate; taking the raw materials according to the formula, stirring, mixing, centrifuging, removing supernatant, and preparing the moisturizing gel liquid.
According to one embodiment of the invention, the dialysis treatment is a dialysis treatment in a 5000-8000 molecular weight dialysis bag.
According to one embodiment of the invention, the seaweed is a mixture of equal mass of green algae and gloiopeltis algae.
According to one embodiment of the invention, the base facial mask paper preparation step comprises: mixing herba Zosterae Marinae and Sargassum, freeze drying, grinding, crushing, sieving, filtering, collecting filtrate, and grinding in high concentration disc grinder; and grinding the pulp by a collector, placing the pulp in a fluffer, fluffing and collecting the fluffed pulp, placing the fluffed pulp in a beater for beating, collecting the beaten pulp and making paper, and after drying is finished, collecting and drying to obtain the substrate facial mask paper.
According to one embodiment of the invention, the mechanical grinding process is to control the grinding to be three-pass grinding, the grinding disc spacing is 0.2mm, 0.1mm and 0.1mm, and the mechanical grinding process is to collect mechanical grinding liquid;
according to one embodiment of the invention, the beating concentration of the beating liquid is 12-15%.
According to one embodiment of the invention, the basis weight of the base mask paper is 45-50 g/m 2.
According to the method for preparing a high moisture-retaining mask in accordance with the embodiment of the second aspect of the present invention, the preparation step includes: s1, weighing the raw materials according to the formula, placing the raw materials into a stirrer, stirring and mixing the raw materials, adjusting the pH value of the mixture, and homogenizing the mixture at room temperature; s2, collecting the homogeneous solution, soaking the substrate facial mask paper in the homogeneous solution, soaking under high pressure, drying, sterilizing, cutting, and packaging to obtain the facial mask with high moisture retention.
According to an embodiment of the invention, the high-pressure soaking pressure is 0.6-0.8 MPa.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a flowchart of a method for preparing a high moisture mask according to the present invention.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
First, a high moisturizing mask according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.
The high moisture retention mask comprises base mask paper and a moisture retention stock solution, wherein the moisture retention stock solution comprises the following substances in parts by weight: 55-80 parts of deionized water, 25-30 parts of moisturizing gel liquid, 6-8 parts of glycerol, 1-2 parts of carbomer, 3-5 parts of silk fibroin and 0.5-1.0 part of span-80; the moisturizing gel liquid comprises water-extracted polysaccharide dialysate of a mixture of kelp and seaweed.
Therefore, according to the high moisture retention facial mask provided by the embodiment of the invention, the water extract product of kelp and kelp mixture is selected as the moisture retention material, and as a large number of polar groups such as hydroxyl groups or carboxyl groups exist in the extracted structure of the kelp and kelp compound polysaccharide, hydrogen bonds can be formed between the kelp and water molecules, the kelp and kelp compound polysaccharide and the molecules are mutually crosslinked to form a net structure, and good moisture absorption and moisture retention performances are shown, the kelp and kelp compound polysaccharide is used as the moisture retention raw material, silk fibroin is added for modification in an auxiliary manner, the excellent film forming performance of the silk fibroin is effectively compounded and synergistically improved with moisture retention polysaccharide components, and through the good film forming performance of mucopolysaccharide in the silk fibroin, a uniform film is formed on the surface of skin, so that the evaporation of skin moisture is reduced, the stratum corneum is further hydrated, the moisture of the skin is preserved, and the moisture.
According to one embodiment of the present invention, the moisturizing gel liquid includes: 5-50 parts of deionized water, 10-15 parts of chitosan, 3-5 parts of citric acid, 6-8 parts of agarose and 10-15 parts of dialysate; the preparation method of the moisturizing gel liquid comprises the following steps: (1) taking kelp and seaweed, freeze-drying, crushing, grinding and sieving, filtering and collecting filtrate; (2) putting the filtrate collected by filtration into a dialysis bag, performing dialysis treatment and collecting dialysate; (3) taking the raw materials according to the formula, stirring, mixing, centrifuging, removing supernatant, and preparing the moisturizing gel liquid. Agarose and citric acid are used as modified materials, the agarose has obvious sol-gel transition behavior, agarose molecular chains are associated through hydrogen bonds to form spiral chain conformation under the room temperature condition, and then gelation occurs, chitosan and the agarose are mixed according to a certain proportion, and after the chitosan and the agarose are added into the facial mask, because the gel material in the dry facial mask material can continuously release moisture to the skin of the human face, the water content of the skin of the human face is improved, and the duration of the skin moisture retention performance is prolonged.
In some embodiments of the invention, the dialysis treatment is a dialysis treatment in a 5000-8000 molecular weight dialysis bag. By optimizing the molecular weight of the dialysis bag, the molecular weight of the dialysate is in a proper range, and the polysaccharide substances released can be effectively combined by a human skin matrix while a film is effectively formed on the surface of the facial skin, so that the combination strength between the facial skin and the polysaccharide materials is improved, and the moisturizing performance of the materials is improved.
Furthermore, the seaweed is equal-mass mixed green algae and gloiopeltis algae. The polysaccharide materials provided by the gloiopeltis algae and the green algae form hydrogen bonds with water molecules and are mutually crosslinked to form a net structure, so that the gloiopeltis algae and the green algae have good moisture absorption and retention performances.
Optionally, the preparation step of the base facial mask paper comprises the following steps: (1) mixing herba Zosterae Marinae and Sargassum, freeze drying, grinding, crushing, sieving, filtering, collecting filtrate, and grinding in high concentration disc grinder; (2) and grinding the pulp by a collector, placing the pulp in a fluffer, fluffing and collecting the fluffed pulp, placing the fluffed pulp in a beater for beating, collecting the beaten pulp and making paper, and after drying is finished, collecting and drying to obtain the substrate facial mask paper.
That is to say, by optimizing the preparation scheme of the substrate facial mask paper, the manufacturing process of the substrate facial mask paper is effectively reduced, and meanwhile, the preparation cost is saved.
In some embodiments of the invention, the mechanical grinding process is controlled to be three-pass grinding, the grinding disc spacing is 0.2mm, 0.1mm and 0.1mm, and the mechanical grinding process is carried out and the mechanical grinding liquid is collected.
Through the scheme of multiple times of machine grinding treatment, the prepared cellulose-based mask paper material has excellent mechanical properties, meanwhile, the cellulose in the kelp plays a role in constructing a framework in the paper after the actual paper making, so that the gel material has a compact network structure, and through the multistage network structure, the matrix mask paper and the moisturizing gel can be effectively mixed, the structural properties and the load properties of the material are improved, the material can more effectively load the moisturizing gel, and the long-acting moisturizing property is further improved.
According to one embodiment of the invention, the beating concentration of the beating liquid is 12-15%.
In some embodiments of the invention, the basis weight of the base mask paper is 45-50 g/m2. By optimizing papermaking quantification, the base facial mask paper material is guaranteed to have good toughness strength and film forming performance, and meanwhile, the moisturizing gel solution can be further adsorbed, so that the long-acting moisturizing performance of the facial mask is improved.
According to the method for preparing a high moisture-retaining mask in accordance with the embodiment of the second aspect of the present invention, the preparation step includes: s1, weighing the raw materials according to the formula, placing the raw materials into a stirrer, stirring and mixing the raw materials, adjusting the pH value of the mixture, and homogenizing the mixture at room temperature; s2, collecting the homogeneous solution, soaking the substrate facial mask paper in the homogeneous solution, soaking under high pressure, drying, sterilizing, cutting, and packaging to obtain the facial mask with high moisture retention.
In some embodiments of the invention, the high pressure soaking pressure is 0.6-0.8 MPa. By optimizing the high-pressure soaking pressure, the moisturizing gel liquid can be more deeply and effectively combined with the substrate facial mask paper material, so that the moisturizing duration of the moisturizing facial mask is further prolonged.
In summary, according to the high moisture retention facial mask of the embodiment of the present invention, an aqueous extract of a mixture of kelp and kelp is selected as a moisture retention material, and since a large number of polar groups such as hydroxyl groups or carboxyl groups exist in the extracted structure of the kelp and kelp complex polysaccharide, which can form hydrogen bonds with water molecules and cross-link with each other to form a network structure, and exhibit good moisture absorption and moisture retention properties, silk fibroin is used as a moisture retention raw material, and is added for modification, so that the excellent film formation properties of silk fibroin are effectively compounded and synergistically improved with moisture retention polysaccharide components, and by virtue of the good film formation properties of mucopolysaccharide in silk fibroin, a uniform film is formed on the skin surface, thereby reducing the evaporation of skin moisture, further hydrating the stratum corneum, and preserving the moisture of the skin, thereby further improving the moisture retention properties of the skin after the facial mask material is used.
Secondly, agarose and citric acid are used as modified materials, the agarose has obvious sol-gel transition behavior, agarose molecular chains are associated through hydrogen bonds to form spiral chain conformation under the condition of room temperature, and then gelation occurs, chitosan and the agarose are mixed according to a certain proportion, and after the chitosan and the agarose are added into the facial mask, because the gel material in the dry facial mask material can continuously release moisture to the skin of the human face, the water content of the skin of the human face is improved, and the duration of the skin moisture retention performance is prolonged.
The following will describe in detail the method for preparing a high moisture mask according to an embodiment of the present invention with reference to specific examples.
Example 1
Mixing and washing kelp, green algae and gloiopeltis furcata according to a mass ratio of 3:2:2, naturally drying, freeze-drying, grinding and crushing, sieving with a 200-mesh sieve, collecting sieved particles, stirring and mixing the sieved particles with deionized water according to a mass ratio of 1:10, standing for 10 hours, collecting and filtering a standing mixture, respectively collecting filtrate and filter cakes, placing the filter cakes in a high-concentration disc mill for machine milling treatment, controlling the milling to be three-path milling, controlling the spacing between the milling discs to be 0.2mm, 0.1mm and 0.1mm, collecting machine milled pulp and placing the machine milled pulp in a defibering machine, performing defibering treatment and collecting defibered pulp, placing the defibered pulp in a pulping machine for pulping treatment and controlling the pulping concentration to be 12%, collecting the pulped pulp and papermaking, and controlling the papermaking quantitative to be 45g/m2After drying, collecting and drying to obtain paper;
putting the filtered and collected filtrate into a dialysis bag, dialyzing in the dialysis bag with the molecular weight of 5000-8000, collecting dialysate, respectively weighing 45 parts of deionized water, 10 parts of chitosan, 3 parts of citric acid, 6 parts of agarose and 10 parts of dialysate by weight, putting into a beaker, stirring, mixing, centrifuging, removing supernatant, and preparing into moisturizing gel;
respectively weighing 55 parts by weight of deionized water, 25 parts by weight of 6 parts by weight of glycerol, 25 parts by weight of moisturizing gel liquid, 1 part by weight of carbomer, 3 parts by weight of silk fibroin and 0.5 part by weight of span-80, placing the materials into a stirrer, stirring and mixing, adjusting the pH to 6.5 by using triethanolamine, homogenizing at 2500r/min for 1h, collecting the homogenized liquid, soaking the substrate facial mask paper into the homogenized liquid, soaking for 3h at 0.6MPa, taking out and drying, drying until the water content is 35%, performing ultraviolet sterilization treatment, cutting and packaging, and thus obtaining the high-moisturizing facial mask.
Example 2
Mixing and washing kelp, green algae and gloiopeltis furcata according to a mass ratio of 3:2:2, naturally drying, freeze-drying, grinding and crushing, sieving with a 200-mesh sieve, collecting sieved particles, stirring and mixing the sieved particles with deionized water according to a mass ratio of 1:10, standing for 12 hours, collecting and filtering a standing mixture, respectively collecting filtrate and filter cakes, placing the filter cakes in a high-concentration disc mill for machine milling treatment, controlling the milling to be three-path milling, controlling the spacing between the milling discs to be 0.2mm, 0.1mm and 0.1mm, collecting machine milled pulp and placing the machine milled pulp in a defibering machine, performing defibering treatment and collecting defibered pulp, placing the defibered pulp in a pulping machine for pulping treatment and controlling the pulping concentration to be 13%, collecting the pulped pulp and papermaking, and controlling the papermaking quantitative to be 47g/m2After drying, collecting and drying to obtain paper;
putting the filtered and collected filtrate into a dialysis bag, dialyzing in a 6500 molecular weight dialysis bag, collecting dialysate, respectively weighing 47 parts of deionized water, 12 parts of chitosan, 4 parts of citric acid, 7 parts of agarose and 12 parts of dialysate by weight, putting into a beaker, stirring, mixing, centrifuging, removing supernatant, and preparing to obtain moisturizing gel;
respectively weighing 65 parts of deionized water, 27 parts of moisturizing gel liquid, 7 parts of glycerol, 1 part of carbomer, 4 parts of silk fibroin and 0.7 part of span-80 in a stirrer, stirring and mixing, adjusting the pH to 6.7 by triethanolamine, homogenizing at 2750r/min for 1h, collecting the homogenized liquid, soaking the substrate facial mask paper in the homogenized liquid for 4h at 0.7MPa, taking out and drying, drying until the water content is 40%, performing ultraviolet sterilization, cutting and packaging, and thus obtaining the high-moisturizing facial mask.
Example 3
Mixing and washing the kelp, the green alga and the gloiopeltis with the mass ratio of 3:2:2, naturally drying the kelp, the green alga and the gloiopeltis, freeze-drying the kelp, the green alga and the gloiopeltis, and carrying outGrinding and crushing, sieving with a 200-mesh sieve, collecting sieved particles, mixing the sieved particles with deionized water in a mass ratio of 1:10, standing for 15 hours, collecting and filtering a standing mixture, respectively collecting filtrate and filter cakes, placing the filter cakes in a high-concentration disc mill for mechanical milling treatment, controlling the milling to be three-pass milling, wherein the distances between the milling discs are 0.2mm, 0.1mm and 0.1mm, collecting mechanically milled pulp and placing the mechanically milled pulp in a fluffer, fluffing and collecting fluffed pulp, placing the fluffed pulp in a beater for beating treatment, controlling the beating concentration to be 15%, collecting the beaten pulp and making paper, and controlling the quantitative paper making to be 50g/m2After drying, collecting and drying to obtain paper;
putting the filtered and collected filtrate into a dialysis bag, dialyzing in the dialysis bag with the molecular weight of 5000-8000, collecting dialysate, respectively weighing 50 parts of deionized water, 15 parts of chitosan, 5 parts of citric acid, 8 parts of agarose and 15 parts of dialysate by weight, putting into a beaker, stirring, mixing, centrifuging, removing supernatant, and preparing to obtain moisturizing gel;
respectively weighing 80 parts by weight of deionized water, 30 parts by weight of moisturizing gel liquid, 8 parts by weight of glycerol, 2 parts by weight of carbomer, 5 parts by weight of silk fibroin and 1.0 part by weight of span-80, placing the materials into a stirrer, stirring and mixing, adjusting the pH to 7.0 by triethanolamine, homogenizing at 2000r/min for 2 hours, collecting the homogenized liquid, soaking the substrate facial mask paper into the homogenized liquid, soaking at 0.8MPa for 5 hours, taking out and drying, drying until the water content is 45%, performing ultraviolet sterilization treatment, cutting and packaging, and thus obtaining the high-moisturizing facial mask.
Examples 4 to 5
In the high moisturizing masks of examples 4 to 5, the dialysate was used instead of the moisturizing gel solution, and the remaining conditions and component ratios were the same as those in example 1, as shown in table 1.
TABLE 1 parameters of homogenization treatment in examples 4-5
Item Example 4 Example 5
Dialysis liquid 25 30
Deionized water 55 55
Glycerol 6 6
Carbomer 1 1
Silk fibroin 3 3
Span-80 0.5 0.5
Performance test
The performance tests of examples 1 to 5 were carried out, specifically, the moisturizing performance and moisture permeability of the prepared high moisturizing facial mask were tested.
Detection method/test method
(1) The sample is tested for moisture retention by placing the mask in a petri dish, placing 10mL of distilled water in a handheld liquid spray gun, uniformly spraying the distilled water on the mask, weighing, placing the mask in a constant temperature incubator at 37 ℃ for 30min, and weighing. The formula for calculating the moisture retention rate is as follows: m ═ ((a-C)/(B-C) × 100%), where C is the mass of the dish.
(2) The specific detection results of the moisture permeability of the mask by referring to GB/T12704.1-2009 moisture absorption test are shown in the following table 2:
TABLE 2 Performance test Table
Figure BDA0002695818910000071
Figure BDA0002695818910000081
The performance test in table 2 shows that the performance of example 3 is the best, because the ratio of the added materials is the highest in example 3, which indicates that the technical solution of the present application can be implemented.
Comparing the performances of examples 1-5, the performance of example 5 is significantly lower than that of examples 1-3 because the dialysate is used and citric acid and agarose are not added, which illustrates that chitosan and agarose are mixed according to a certain proportion, and after the chitosan and agarose are added into the facial mask, the gel material in the dry facial mask material can continuously release moisture to the facial skin of human body to improve the water content of the facial skin of human body, thereby prolonging the duration of the skin moisture retention performance.
Comparative examples 1 to 2
In comparison with example 1, comparative examples 1-5 and example 1 were compared without adding silk fibroin, and other conditions and components were identical to those of example 1.
Comparative examples 3 to 5
Compared with the example 1, and compared with the example 1, the dialysis treatment adopts the dialysis treatment in a 15000-20000 molecular weight dialysis bag, and other conditions and components are consistent with the example 1.
Comparative examples 6 to 7
Comparing with example 1, comparing with 6-7 and 1, the machine grinding treatment is two-pass refining, the distance between the grinding discs is 0.2mm, 0.1mm, the machine grinding treatment and the collection of the machine grinding liquid, and other conditions and components are consistent with example 1.
Performance test
And respectively carrying out performance tests on the comparative examples 1-7, and specifically testing the moisturizing performance and the moisture permeability of the prepared high-moisturizing facial mask.
Detection method/test method
(1) The sample is tested for moisture retention by placing the mask in a petri dish, placing 10mL of distilled water in a handheld liquid spray gun, uniformly spraying the distilled water on the mask, weighing, placing the mask in a constant temperature incubator at 37 ℃ for 30min, and weighing. The formula for calculating the moisture retention rate is as follows: m ═ ((a-C)/(B-C) × 100%), where C is the mass of the dish.
(2) The specific detection results of the moisture permeability of the mask by referring to GB/T12704.1-2009 moisture absorption test are shown in the following table 3:
TABLE 3 Performance test Table
Figure BDA0002695818910000091
Comparing the performances of comparative examples 1-2 and example 1, the moisture retention rate of the mask is greatly reduced, because the film forming property of the moisture retention gel liquid is reduced due to the loss of silk fibroin, a uniform film cannot be formed on the surface of the skin, the moisture evaporation of the skin is improved, and the moisture retention performance of the skin after the mask material is used is further reduced.
Comparing the performances of comparative examples 3-5 with those of example 1, the film-forming property is poor due to the macromolecular structure of the dialysis treatment, and meanwhile, the macromolecular material formed by dialysis cannot be effectively combined by the human skin matrix, so that the combination strength between the facial skin and the polysaccharide material is weakened, and the moisturizing performance of the mask material is reduced.
Comparing the performances of comparative examples 6-7 with those of example 1, the cellulose-based facial mask paper material has excellent mechanical properties due to the mechanical grinding treatment, so that the cellulose-based facial mask paper material has the function of constructing a framework, the structural performance and the load performance of the material are improved, more moisturizing gel is more effectively loaded, and the long-acting moisturizing performance is further improved, so that the moisturizing performance is greatly reduced compared with that of example 1.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims (10)

1. The high-moisture-retention mask is characterized by comprising base mask paper and a moisture-retention stock solution, wherein the moisture-retention stock solution comprises the following substances in parts by weight:
Figure FDA0002695818900000011
the moisturizing gel liquid comprises water-extracted polysaccharide dialysate of a mixture of kelp and seaweed.
2. The high moisture mask as claimed in claim 1, wherein the moisture gel liquid comprises:
Figure FDA0002695818900000012
the preparation method of the moisturizing gel liquid comprises the following steps:
taking kelp and seaweed, freeze-drying, crushing, grinding and sieving, filtering and collecting filtrate;
putting the filtrate collected by filtration into a dialysis bag, performing dialysis treatment and collecting dialysate;
taking the raw materials according to the formula, stirring, mixing, centrifuging, removing supernatant, and preparing the moisturizing gel liquid.
3. The high moisture retention mask according to claim 2, wherein the dialysis treatment is a dialysis treatment in a 5000-8000 molecular weight dialysis bag.
4. The mask pack according to claim 2, wherein the seaweed is a mixture of equal amounts of green algae and gloiopeltis.
5. The high moisture retention mask as set forth in claim 1, wherein the base mask paper is prepared by the steps of:
mixing herba Zosterae Marinae and Sargassum, freeze drying, grinding, crushing, sieving, filtering, collecting filtrate, and grinding in high concentration disc grinder;
and grinding the pulp by a collector, placing the pulp in a fluffer, fluffing and collecting the fluffed pulp, placing the fluffed pulp in a beater for beating, collecting the beaten pulp and making paper, and after drying is finished, collecting and drying to obtain the substrate facial mask paper.
6. The mask according to claim 5, wherein the mechanical grinding process is controlled to be three-pass grinding, the grinding intervals are 0.2mm, 0.1mm and 0.1mm, and mechanical grinding liquid is processed and collected by the mechanical grinding.
7. The mask pack for high moisture retention according to claim 5, wherein the beating concentration of the beating liquid is 12 to 15%.
8. The high moisture mask as set forth in claim 5, whereinThe paper-making quantitative of the base mask paper is 45-50 g/m2
9. A preparation method of a high moisture retention mask is characterized by comprising the following preparation steps:
s1, weighing the raw materials according to the formula, placing the raw materials into a stirrer, stirring and mixing the raw materials, adjusting the pH value of the mixture, and homogenizing the mixture at room temperature;
s2, collecting the homogeneous solution, soaking the substrate facial mask paper in the homogeneous solution, soaking under high pressure, drying, sterilizing, cutting, and packaging to obtain the facial mask with high moisture retention.
10. The method of preparing a high moisture retention mask according to claim 9, wherein the high pressure soaking pressure is 0.6 to 0.8 MPa.
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