CN112063337B - Photovoltaic adhesive film resisting mechanical impact and preparation method thereof - Google Patents
Photovoltaic adhesive film resisting mechanical impact and preparation method thereof Download PDFInfo
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- CN112063337B CN112063337B CN202011015244.9A CN202011015244A CN112063337B CN 112063337 B CN112063337 B CN 112063337B CN 202011015244 A CN202011015244 A CN 202011015244A CN 112063337 B CN112063337 B CN 112063337B
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- adhesive film
- resin system
- photovoltaic
- hot
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- 239000002313 adhesive film Substances 0.000 title claims abstract description 61
- 238000002360 preparation method Methods 0.000 title abstract description 10
- 229920005989 resin Polymers 0.000 claims abstract description 79
- 239000011347 resin Substances 0.000 claims abstract description 79
- 239000012943 hotmelt Substances 0.000 claims abstract description 52
- 229920001971 elastomer Polymers 0.000 claims abstract description 46
- 239000000806 elastomer Substances 0.000 claims abstract description 46
- 239000003963 antioxidant agent Substances 0.000 claims abstract description 33
- 230000003078 antioxidant effect Effects 0.000 claims abstract description 33
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 32
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 29
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 20
- 239000003365 glass fiber Substances 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 16
- 150000003254 radicals Chemical class 0.000 claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 claims abstract description 4
- 230000035939 shock Effects 0.000 claims abstract description 3
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 claims description 28
- 238000001125 extrusion Methods 0.000 claims description 23
- 239000003795 chemical substances by application Substances 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 19
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 17
- 238000005266 casting Methods 0.000 claims description 13
- 238000004049 embossing Methods 0.000 claims description 13
- 238000002156 mixing Methods 0.000 claims description 13
- 239000004593 Epoxy Substances 0.000 claims description 10
- -1 azo compound Chemical class 0.000 claims description 9
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 claims description 6
- 239000004925 Acrylic resin Substances 0.000 claims description 6
- 229920000178 Acrylic resin Polymers 0.000 claims description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims description 6
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 claims description 6
- 238000004132 cross linking Methods 0.000 claims description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N methyl pentane Natural products CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 6
- 150000001451 organic peroxides Chemical class 0.000 claims description 6
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 claims description 6
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 claims description 6
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 claims description 6
- 239000004634 thermosetting polymer Substances 0.000 claims description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 6
- SYXTYIFRUXOUQP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy butaneperoxoate Chemical compound CCCC(=O)OOOC(C)(C)C SYXTYIFRUXOUQP-UHFFFAOYSA-N 0.000 claims description 4
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 claims description 4
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 claims description 4
- FIYMNUNPPYABMU-UHFFFAOYSA-N 2-benzyl-5-chloro-1h-indole Chemical compound C=1C2=CC(Cl)=CC=C2NC=1CC1=CC=CC=C1 FIYMNUNPPYABMU-UHFFFAOYSA-N 0.000 claims description 4
- NPCRFXPZMMRNAA-UHFFFAOYSA-N 4-nonylphenol;phosphorous acid Chemical compound OP(O)O.CCCCCCCCCC1=CC=C(O)C=C1.CCCCCCCCCC1=CC=C(O)C=C1.CCCCCCCCCC1=CC=C(O)C=C1 NPCRFXPZMMRNAA-UHFFFAOYSA-N 0.000 claims description 4
- JKIJEFPNVSHHEI-UHFFFAOYSA-N Phenol, 2,4-bis(1,1-dimethylethyl)-, phosphite (3:1) Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C JKIJEFPNVSHHEI-UHFFFAOYSA-N 0.000 claims description 4
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 claims description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 4
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 claims description 3
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 claims description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 3
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 claims description 3
- 239000001361 adipic acid Substances 0.000 claims description 3
- 235000011037 adipic acid Nutrition 0.000 claims description 3
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 claims description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 3
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 claims description 3
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 claims description 3
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 claims description 3
- 239000001530 fumaric acid Substances 0.000 claims description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 3
- 239000011976 maleic acid Substances 0.000 claims description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 3
- 238000007493 shaping process Methods 0.000 claims description 3
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims 2
- ZKJRBWBAOPPIDO-UHFFFAOYSA-N 2-methylbutan-2-yloxy pentaneperoxoate Chemical compound CCCCC(=O)OOOC(C)(C)CC ZKJRBWBAOPPIDO-UHFFFAOYSA-N 0.000 claims 1
- SPTHWAJJMLCAQF-UHFFFAOYSA-M ctk4f8481 Chemical compound [O-]O.CC(C)C1=CC=CC=C1C(C)C SPTHWAJJMLCAQF-UHFFFAOYSA-M 0.000 claims 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- RRJTYGXYWTVHDE-UHFFFAOYSA-N tributyl(ethenyl)silane Chemical compound CCCC[Si](CCCC)(CCCC)C=C RRJTYGXYWTVHDE-UHFFFAOYSA-N 0.000 claims 1
- 238000003860 storage Methods 0.000 abstract description 6
- 238000007731 hot pressing Methods 0.000 abstract description 3
- 238000012545 processing Methods 0.000 abstract description 3
- 238000005336 cracking Methods 0.000 abstract description 2
- 238000012360 testing method Methods 0.000 description 20
- 238000002834 transmittance Methods 0.000 description 12
- 239000012948 isocyanate Substances 0.000 description 9
- 150000002513 isocyanates Chemical class 0.000 description 9
- 238000005096 rolling process Methods 0.000 description 5
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 4
- 239000005038 ethylene vinyl acetate Substances 0.000 description 4
- 150000002894 organic compounds Chemical group 0.000 description 4
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 4
- 229920001225 polyester resin Polymers 0.000 description 4
- 239000004645 polyester resin Substances 0.000 description 4
- 239000013638 trimer Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000004224 protection Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- SYEWHONLFGZGLK-UHFFFAOYSA-N 2-[1,3-bis(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COCC(OCC1OC1)COCC1CO1 SYEWHONLFGZGLK-UHFFFAOYSA-N 0.000 description 2
- SEFYJVFBMNOLBK-UHFFFAOYSA-N 2-[2-[2-(oxiran-2-ylmethoxy)ethoxy]ethoxymethyl]oxirane Chemical compound C1OC1COCCOCCOCC1CO1 SEFYJVFBMNOLBK-UHFFFAOYSA-N 0.000 description 2
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 2
- CYCBPQPFMHUATH-UHFFFAOYSA-N 4-(oxiran-2-ylmethoxy)butan-1-ol Chemical compound OCCCCOCC1CO1 CYCBPQPFMHUATH-UHFFFAOYSA-N 0.000 description 2
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 2
- 239000005058 Isophorone diisocyanate Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical class C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 238000011056 performance test Methods 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- 239000011118 polyvinyl acetate Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- 229920006337 unsaturated polyester resin Polymers 0.000 description 2
- 229940070710 valerate Drugs 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- 230000006750 UV protection Effects 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000013083 solar photovoltaic technology Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/10—Adhesives in the form of films or foils without carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/20—Applications use in electrical or conductive gadgets
- C08L2203/204—Applications use in electrical or conductive gadgets use in solar cells
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
The invention relates to a photovoltaic adhesive film resisting mechanical impact and a preparation method thereof. The photovoltaic adhesive film resisting mechanical impact is made of 0.1-45% of elastomer resin system, 20-95% of hot-melt thermosetting resin system and 0.1-5% of glass fiber as basic materials; the elastomer resin system is prepared from 95-99% of elastomer resin, 0.05-5% of antioxidant, 0.25-5% of free radical crosslinking agent and 0.1-4% of silane coupling agent. The photovoltaic adhesive film adopts the hot-melt thermosetting resin and the curing system thereof to provide mechanical shock resistance for the photovoltaic adhesive film; glass fiber is adopted to provide mechanical impact resistance for the photovoltaic adhesive film; the elastomer is adopted to provide toughness for the adhesive film, and the adhesive film is prevented from being cracked in the processes of processing, preparation, transportation, storage and use. In addition, the photovoltaic adhesive film can provide mechanical strength for the assembly after hot pressing, effectively resist mechanical impact and simultaneously prevent the photovoltaic adhesive film from cracking in the processes of production, storage, transportation, use and the like.
Description
Technical Field
The invention relates to the technical field of solar cells, in particular to a photovoltaic adhesive film resisting mechanical impact and a preparation method thereof.
Background
The photovoltaic packaging adhesive film is an important material in the solar photovoltaic technology industry, plays an important role in bonding a battery piece, photovoltaic glass and a back plate, and simultaneously has multiple functions of mechanical buffering and protection of a photovoltaic module, PID resistance of the module and ultraviolet resistance protection of the back plate. Because the photovoltaic module is gradually developed towards thinning, thinning and flexibility at present, the photovoltaic glass is gradually thinned and even needs to be replaced, and therefore the packaging adhesive film and the back plate need to be enhanced in mechanical property to have the function of resisting mechanical impact of the module.
The traditional photovoltaic adhesive film is made of EVA (ethylene-vinyl acetate) or POE (ethylene-octene) polymer as a basic material, is an elastomer adhesive film, is very soft and cannot play a role in resisting mechanical impact.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a photovoltaic adhesive film resisting mechanical impact and a preparation method thereof.
The invention provides a photovoltaic adhesive film resisting mechanical impact, which is made of 0.1-45% of elastomer resin system, 20-95% of hot-melt thermosetting resin system and 0.1-5% of glass fiber as basic materials;
the elastomer resin system is prepared from 95-99% of elastomer resin, 0.05-5% of antioxidant, 0.25-5% of free radical crosslinking agent and 0.1-4% of silane coupling agent.
The invention provides a photovoltaic adhesive film resisting mechanical impact, which also comprises the following auxiliary technical scheme:
wherein the softening points of the elastomer resin system and the hot-melt thermosetting resin system are 50-130 ℃;
the thickness of the photovoltaic adhesive film resisting mechanical impact is 300-1000 mu m.
Wherein the hot melt thermoset resin system comprises:
70 to 98 percent of hot-melt epoxy resin and 2 to 30 percent of organic dicarboxylic acid; or the like, or a combination thereof,
70-95% of hot-melt unsaturated polyester resin and 5-30% of cross-linking agent; or the like, or a combination thereof,
70-95% of hydroxyl-terminated hot-melt polyester resin and 5-30% of isocyanate curing agent; or,
70-95% of carboxyl-terminated hot-melt polyester resin, 0-30% of epoxy curing agent and 0-30% of isocyanate curing agent; or,
70-99% of hot-melt epoxy modified acrylic resin and 1-30% of organic dicarboxylic acid; or,
80-95% of hot-melt acrylic resin, 0-20% of epoxy curing agent and 0-20% of isocyanate curing agent.
Wherein the elastomer resin comprises one or the combination of any more of EVA, POE, hydrogenated styrene-butadiene block copolymer, polybutadiene rubber, polyvinyl acetate or polyvinyl butyral.
Wherein the antioxidant comprises a main antioxidant and an auxiliary antioxidant; wherein,
the main antioxidant group comprises octadecyl beta- (3, 5-di-tert-butyl-4-hydroxyphenyl) propionate;
the auxiliary antioxidant comprises one or two of tris (4-nonylphenol) phosphite or tris (2, 4-di-tert-butylphenyl) phosphite.
Wherein the cross-linking agent comprises a cross-linking curing agent and an auxiliary cross-linking agent; wherein,
the crosslinking curing agent comprises one or a mixture of two of organic peroxide or azo compound;
the organic peroxide comprises one or the combination of any more of cumyl peroxide, di-tert-butyl peroxide, dicumyl hydroperoxide, 2, 5-dimethyl-2, 5-di-tert-butyl peroxy hexane, 4-di (tert-amyl peroxy) n-butyl valerate, tert-butyl peroxy-2-ethylhexyl carbonate or ethyl 3, 3-di (tert-butyl peroxy) butyrate;
the auxiliary crosslinking agent comprises one or a combination of any of triallyl isocyanurate, triallyl cyanurate, trimethylolpropane trimethacrylate or diethylene glycol dimethacrylate.
Wherein, the silane coupling agent is one or the combination of any more of vinyltriethoxysilane, vinyltrimethoxysilane, vinyltri-tert-butyl peroxide silane, vinyltriacetoxysilane or vinyltri (beta-methoxyethoxy) silane.
Wherein, the organic dicarboxylic acid comprises one or the combination of any of maleic anhydride, maleic acid, fumaric acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid or sebacic acid.
Wherein the isocyanate curing agent is an organic compound containing a plurality of isocyanate groups, and comprises isophorone diisocyanate and a trimer thereof or hexamethylene diisocyanate and a trimer thereof.
Wherein the epoxy curing agent is an organic compound containing a plurality of epoxy groups, including 2,2' - [ [2, 2-bis [ (oxetanylmethoxy) methyl ] -1, 3-propylene ] bis (oxymethylene) ] bis-oxirane, 1, 4-butanediol glycidyl ether, diethylene glycol diglycidyl ether, glycerol triglycidyl ether, or neopentyl glycol diglycidyl ether.
The invention also provides a preparation method of the photovoltaic adhesive film resisting mechanical impact, which comprises the following steps:
fully mixing 0.1-45% of elastomer resin system and 20-95% of hot-melt thermosetting resin system, then carrying out banburying and plasticizing, producing by an extrusion casting process, and carrying out embossing and shaping treatment to form the photovoltaic adhesive film resisting mechanical impact; wherein,
the elastomer resin system is prepared from 95-99% of elastomer resin, 0.05-5% of antioxidant, 0.25-5% of free radical crosslinking agent and 0.1-4% of silane coupling agent.
The photovoltaic adhesive film adopts the hot-melt thermosetting resin and the curing system thereof to provide mechanical impact resistance for the photovoltaic adhesive film; glass fiber is adopted to provide mechanical impact resistance for the photovoltaic adhesive film; the elastomer is adopted to provide toughness for the adhesive film, and the adhesive film is prevented from being cracked in the processes of processing, preparation, transportation, storage and use. In addition, the photovoltaic adhesive film can provide mechanical strength for the assembly after hot pressing, effectively resist mechanical impact and simultaneously prevent the photovoltaic adhesive film from cracking in the processes of production, storage, transportation, use and the like.
Detailed Description
The present invention will be described in detail with reference to examples.
The specific embodiments are merely illustrative and not restrictive, and those skilled in the art who review this disclosure may make modifications to the embodiments without any inventive contribution, as desired, while remaining within the scope of the appended claims.
The invention provides a photovoltaic adhesive film with resistance to mechanical impact, which is made of 0.1-45% of elastomer resin system, 20-95% of hot-melt thermosetting resin system and 0.1-5% of glass fiber as basic materials;
the elastomer resin system is prepared from 95-99% of elastomer resin, 0.05-5% of antioxidant, 0.25-5% of free radical crosslinking agent and 0.1-4% of silane coupling agent.
The softening points of the elastomer resin system and the hot-melt thermosetting resin system are 50-130 ℃; the thickness of the photovoltaic adhesive film resisting mechanical impact is 300-1000 mu m.
The photovoltaic adhesive film adopts the hot-melt thermosetting resin and the curing system thereof to provide mechanical impact resistance for the photovoltaic adhesive film; the glass fiber is adopted to provide mechanical impact resistance for the photovoltaic adhesive film; the elastomer is adopted to provide toughness for the adhesive film, and the adhesive film is prevented from being cracked in the processes of processing, preparation, transportation, storage and use. In addition, the photovoltaic adhesive film can provide mechanical strength for the assembly after hot pressing, effectively resist mechanical impact and prevent the photovoltaic adhesive film from being cracked in the processes of production, storage, transportation, use and the like.
Wherein the hot melt thermoset resin system comprises: 70 to 98 percent of hot-melt epoxy resin and 2 to 30 percent of organic dicarboxylic acid; or 70 to 95 percent of hot-melt unsaturated polyester resin and 5 to 30 percent of cross-linking agent; or 70-95% of end hydroxyl hot-melt polyester resin and 5-30% of isocyanate curing agent; or 70-95% of carboxyl-terminated hot-melt polyester resin, 0-30% of epoxy curing agent and 0-30% of isocyanate curing agent; or 70 to 99 percent of hot-melt epoxy modified acrylic resin and 1 to 30 percent of organic dicarboxylic acid; or 80 to 95 percent of hot-melt acrylic resin, 0 to 20 percent of epoxy curing agent and 0 to 20 percent of isocyanate curing agent.
Preferably, the elastomer resin comprises one or a combination of any of EVA, POE, hydrogenated styrene-butadiene block copolymer, polybutadiene rubber, polyvinyl acetate, or polyvinyl butyral.
Preferably, the antioxidant comprises a primary antioxidant and a secondary antioxidant; more preferably, the primary antioxidant group comprises octadecyl beta- (3, 5-di-tert-butyl-4-hydroxyphenyl) propionate; the auxiliary antioxidant comprises one or two of tris (4-nonylphenol) phosphite or tris (2, 4-di-tert-butylphenyl) phosphite.
Preferably, the crosslinking agent comprises a crosslinking curing agent and a co-crosslinking agent; more preferably, the crosslinking curing agent comprises one or a mixture of two of an organic peroxide or an azo compound; the organic peroxide comprises one or the combination of any more of cumyl peroxide, di-tert-butyl peroxide, dicumyl hydroperoxide, 2, 5-dimethyl-2, 5-di-tert-butyl peroxy hexane, 4-di (tert-amyl peroxy) n-butyl valerate, tert-butyl peroxy-2-ethylhexyl carbonate or ethyl 3, 3-di (tert-butyl peroxy) butyrate; the auxiliary crosslinking agent comprises one or a combination of any of triallyl isocyanurate, triallyl cyanurate, trimethylolpropane trimethacrylate or diethylene glycol dimethacrylate.
Preferably, the silane coupling agent is one or a combination of any of vinyltriethoxysilane, vinyltrimethoxysilane, vinyltri-tert-butyl-peroxide silane, vinyltriacetoxysilane or vinyltris (beta-methoxyethoxy) silane.
Preferably, the organic dicarboxylic acid comprises one or a combination of any of maleic anhydride, maleic acid, fumaric acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid or sebacic acid.
Preferably, the isocyanate curing agent is an organic compound containing a plurality of isocyanate groups; more preferably, the isocyanate curing agent includes isophorone diisocyanate and its trimer or hexamethylene diisocyanate and its trimer.
Preferably, the epoxy curing agent is an organic compound containing a plurality of epoxy groups, including 2,2' - [ [2, 2-bis [ (oxetanylmethoxy) methyl ] -1, 3-propylene ] bis (oxymethylene) ] bis-oxirane, 1, 4-butanediol glycidyl ether, diethylene glycol diglycidyl ether, glycerol triglycidyl ether or neopentyl glycol diglycidyl ether.
The invention also provides a preparation method of the photovoltaic adhesive film resisting mechanical impact, which comprises the following steps:
fully mixing 0.1-45% of elastomer resin system and 20-95% of hot-melt thermosetting resin system, then carrying out banburying and plasticizing, producing by an extrusion casting process, and carrying out embossing and shaping treatment to form the photovoltaic adhesive film resisting mechanical impact; wherein,
the elastomer resin system is prepared from 95-99% of elastomer resin, 0.05-5% of antioxidant, 0.25-5% of free radical crosslinking agent and 0.1-4% of silane coupling agent.
The inventive photovoltaic adhesive film resistant to mechanical shock will be described in detail below with specific examples.
In the embodiment described below, it is preferred that,
elastomeric resin system: ethylene-octene copolymer (POE) in which the octene content is 30%.
Antioxidant: the main anti-oxygen group is beta- (3, 5-di-tert-butyl-4-hydroxyphenyl) propionic acid octadecyl ester; the auxiliary antioxidant is a compound of tris (4-nonylphenol) phosphite and tris (2, 4-di-tert-butylphenyl) phosphite.
The crosslinking agent is a compound of tert-butyl peroxy-2-ethylhexyl carbonate and ethyl 3, 3-di (tert-butylperoxy) butyrate; the auxiliary crosslinking agent is a compound of triallyl isocyanurate, triallyl cyanurate and trimethylolpropane trimethacrylate.
Silane coupling agent: vinyltris (. Beta. -methoxyethoxy) silane.
Hot melt thermosetting resin system: hot melt epoxy modified acrylic resin, azelaic acid.
Glass fiber: the length is 3mm.
Example 1
The formula of the elastomer resin system is as follows: antioxidant: a crosslinking agent: silane coupling agent = 100; the formula of the hot-melt thermosetting resin system is as follows: azelaic acid =100:2; elastomeric resin system: hot melt thermosetting resin system: glass fiber =1:2:0.02. the materials are fully and uniformly mixed according to the proportion, the mixture is added into an internal mixer for internal mixing, the plasticizing temperature is 60-90 ℃, the mixture is transferred to an extruder for melt extrusion after being completely plasticized, the temperature and humidity of each area of the extruder and a die head are 80-90 ℃, the mixture is extruded through a co-extrusion die head, the mixture is cooled by a casting roller and shaped after an embossing process, and finally, the thickness is measured, the edge is cut, the rolled adhesive film is observed for toughness, and the rolled adhesive film is packaged and stored in a warehouse. The assembly was laminated for 20min at 160 ℃ and then subjected to an impact resistance test, and the film was laminated alone to test light transmittance.
Example 2
The formula of the elastomer resin system is as follows: antioxidant: a crosslinking agent: silane coupling agent = 100; the formula of the hot-melt thermosetting resin system is as follows: azelaic acid =100:2; elastomer resin system: hot melt thermoset resin system: glass fiber =1:4:0.02. the materials are fully and uniformly mixed according to the proportion, the mixture is added into an internal mixer for internal mixing, the plasticizing temperature is 60-90 ℃, the mixture is transferred to an extruder for melt extrusion after being completely plasticized, the temperature and humidity of each area of the extruder and a die head are 80-90 ℃, the mixture is extruded through a co-extrusion die head, the mixture is cooled by a casting roller and shaped after an embossing process, and finally, the thickness is measured, the edge is cut, the rolled adhesive film is observed for toughness, and the rolled adhesive film is packaged and stored in a warehouse. The assembly was laminated for 20min at 160 ℃ and then subjected to an impact resistance test, and the film was laminated alone to test light transmittance.
Example 3
The formula of the elastomer resin system is as follows: antioxidant: a crosslinking agent: silane coupling agent = 100; the formula of the hot-melt thermosetting resin system is as follows: azelaic acid =100:2; elastomer resin system: hot melt thermosetting resin system: glass fiber =1:6:0.02. the materials are fully and uniformly mixed according to the proportion, the mixture is added into an internal mixer for internal mixing, the plasticizing temperature is 60-90 ℃, the mixture is transferred to an extruder for melt extrusion after being completely plasticized, the temperature and humidity of each area of the extruder and a die head are 80-90 ℃, the mixture is extruded through a co-extrusion die head, the mixture is cooled by a casting roller and shaped after an embossing process, and finally, the thickness is measured, the edge is cut, the rolled adhesive film is observed for toughness, and the rolled adhesive film is packaged and stored in a warehouse. The assembly was laminated for 20min at 160 ℃ and then subjected to an impact resistance test, and the film was laminated alone to test light transmittance.
Example 4
The formula of the elastomer resin system is as follows: antioxidant: a crosslinking agent: silane coupling agent = 100; the formula of the hot-melt thermosetting resin system is as follows: azelaic acid =100:2; elastomer resin system: hot melt thermosetting resin system: glass fiber =1:8:0.02. the materials are fully and uniformly mixed according to the proportion, the mixture is added into an internal mixer for internal mixing, the plasticizing temperature is 60-90 ℃, the mixture is transferred to an extruder for melt extrusion after being completely plasticized, the temperature and humidity of each area of the extruder and a die head are 80-90 ℃, the mixture is extruded through a co-extrusion die head, the mixture is cooled by a casting roller and shaped after an embossing process, and finally, the thickness is measured, the edge is cut, the rolled adhesive film is observed for toughness, and the rolled adhesive film is packaged and stored in a warehouse. The assembly was laminated for 20min at 160 ℃ and then subjected to an impact resistance test, and the film was laminated alone to test light transmittance.
Example 5
The formula of the elastomer resin system is as follows: antioxidant: a crosslinking agent: silane coupling agent = 100; the formula of the hot-melt thermosetting resin system is as follows: azelaic acid =100:2; elastomer resin system: hot melt thermosetting resin system: glass fiber =1:12:0.02. the materials are fully and uniformly mixed according to the proportion, added into an internal mixer for internal mixing, the plasticizing temperature is 60-90 ℃, transferred to an extruder for melt extrusion after complete plasticizing, the temperature and humidity of each area of the extruder and a die head are 80-90 ℃, extruded by a co-extrusion die head, cooled by a casting roller, shaped after an embossing process, finally measured in thickness, trimmed, rolled, observed in toughness of a rolled adhesive film, and packaged and stored in a warehouse. The assembly was laminated for 20min at 160 ℃ and then subjected to an impact resistance test, and the film was laminated alone to test light transmittance.
TABLE 1-examples 1-5 Performance test
Item | Example 1 | Example 2 | Example 3 | Example 4 | Example 5 |
Glue film rolling | Intact | Is intact | Is intact | Crushing | Crushing |
Impact resistance | NO | YES | YES | YES | YES |
Transmittance (%) | 92.3 | 92.2 | 92.0 | 91.9 | 91.8 |
Example 6
The formula of the elastomer resin system is as follows: antioxidant: a crosslinking agent: silane coupling agent: 0.5; the formula of the hot-melt thermosetting resin system is as follows: azelaic acid =100:2; elastomer resin system: hot melt thermoset resin system: glass fiber =1:6:0.01. the materials are fully and uniformly mixed in proportion, added into an internal mixer for internal mixing, the plasticizing temperature is 60-90 ℃, transferred to an extruder for melt extrusion after complete plasticizing, the temperature and humidity of each area of the extruder and a die head are 80-90 ℃, extruded through a co-extrusion die head, cooled by a casting roller, shaped after an embossing process, finally subjected to thickness measurement, edge cutting and rolling, the toughness of a rolled adhesive film is observed, and packaged and stored in a warehouse. The assembly was laminated for 20min at 160 ℃ and then subjected to an impact resistance test, and the film was laminated alone to test light transmittance.
Example 7
The formula of the elastomer resin system is as follows: antioxidant: a crosslinking agent: silane coupling agent: 0.5; the formula of the hot-melt thermosetting resin system is as follows: azelaic acid =100:2; elastomeric resin system: hot melt thermosetting resin system: glass fiber =1:6:0.02. the materials are fully and uniformly mixed in proportion, added into an internal mixer for internal mixing, the plasticizing temperature is 60-90 ℃, transferred to an extruder for melt extrusion after complete plasticizing, the temperature and humidity of the extruder and each area of a die head are 80-90 ℃, extruded by a co-extrusion die head, cooled by a casting roller, shaped after an embossing process, finally measured in thickness, trimmed, rolled, observed in toughness of a rolled adhesive film, and packaged and stored in a warehouse. The assembly was laminated for 20min at 160 ℃ and then subjected to an impact resistance test, and the film was laminated alone to test light transmittance.
Example 8
The formula of the elastomer resin system is as follows: antioxidant: a crosslinking agent: silane coupling agent: 0.5; the formula of the hot-melt thermosetting resin system is as follows: azelaic acid =100:2; elastomeric resin system: hot melt thermoset resin system: glass fiber =1:6:0.03. the materials are fully and uniformly mixed in proportion, added into an internal mixer for internal mixing, the plasticizing temperature is 60-90 ℃, transferred to an extruder for melt extrusion after complete plasticizing, the temperature and humidity of each area of the extruder and a die head are 80-90 ℃, extruded through a co-extrusion die head, cooled by a casting roller, shaped after an embossing process, finally subjected to thickness measurement, edge cutting and rolling, the toughness of a rolled adhesive film is observed, and packaged and stored in a warehouse. The assembly was laminated for 20min at 160 ℃ and then subjected to an impact resistance test, and the film was laminated alone to test light transmittance.
Example 9
The formula of the elastomer resin system is as follows: antioxidant: a crosslinking agent: silane coupling agent: 0.5; the formula of the hot-melt thermosetting resin system is as follows: azelaic acid =100:2; elastomeric resin system: hot melt thermosetting resin system: glass fiber =1:6:0.04. the materials are fully and uniformly mixed in proportion, added into an internal mixer for internal mixing, the plasticizing temperature is 60-90 ℃, transferred to an extruder for melt extrusion after complete plasticizing, the temperature and humidity of the extruder and each area of a die head are 80-90 ℃, extruded by a co-extrusion die head, cooled by a casting roller, shaped after an embossing process, finally measured in thickness, trimmed, rolled, observed in toughness of a rolled adhesive film, and packaged and stored in a warehouse. The assembly was laminated for 20min at 160 ℃ and then subjected to an impact resistance test, and the film was laminated alone to test light transmittance.
Example 10
The formula of the elastomer resin system is as follows: antioxidant: a crosslinking agent: silane coupling agent: 0.5; the formula of the hot-melt thermosetting resin system is as follows: azelaic acid =100:2; elastomer resin system: hot melt thermosetting resin system: glass fiber =1:6:0.05. the materials are fully and uniformly mixed in proportion, added into an internal mixer for internal mixing, the plasticizing temperature is 60-90 ℃, transferred to an extruder for melt extrusion after complete plasticizing, the temperature and humidity of each area of the extruder and a die head are 80-90 ℃, extruded through a co-extrusion die head, cooled by a casting roller, shaped after an embossing process, finally subjected to thickness measurement, edge cutting and rolling, the toughness of a rolled adhesive film is observed, and packaged and stored in a warehouse. The assembly was laminated for 20min at 160 ℃ and then subjected to an impact resistance test, and the film was laminated alone to test light transmittance.
TABLE 2-EXAMPLES 6-10 Performance test
Item | Example 6 | Example 7 | Example 8 | Example 9 | Example 10 |
Glue film rolling | Crushing | Intact | Intact | Intact | Intact |
Impact resistance | NO | YES | YES | YES | YES |
Light transmittance | 92.4 | 92.0 | 91.8 | 91.5 | 91.3 |
Finally, it should be noted that the above embodiments are only used for illustrating the technical solutions of the present invention, and not for limiting the protection scope of the present invention, although the present invention is described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions can be made on the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention.
Claims (6)
1. The photovoltaic adhesive film with the mechanical impact resistance is characterized in that the photovoltaic adhesive film with the mechanical impact resistance is made of an elastomer resin system, a hot-melt thermosetting resin system and glass fibers as basic materials;
the elastomer resin system is prepared by 95-99% of elastomer resin, 0.05-5% of antioxidant, 0.25-5% of free radical crosslinking agent and 0.1-4% of silane coupling agent; wherein the elastomer resin is POE;
the hot-melt thermosetting resin system is as follows:
70 to 99 percent of hot-melt epoxy modified acrylic resin and 1 to 30 percent of organic dicarboxylic acid;
the softening points of the elastomer resin system and the hot-melt thermosetting resin system are 50 to 130 ℃; the thickness of the photovoltaic adhesive film resisting the mechanical impact is 300 to 1000 mu m;
the elastomer resin system: hot melt thermoset resin system: the proportion of the glass fiber is 1:4-6:0.02.
2. the chemically resistant photovoltaic adhesive film of claim 1, wherein the antioxidant comprises a primary antioxidant and a secondary antioxidant; wherein,
the main antioxidant group comprises octadecyl beta- (3, 5-di-tert-butyl-4-hydroxyphenyl) propionate;
the auxiliary antioxidant comprises one or a compound of two of tris (4-nonylphenol) phosphite or tris (2, 4-di-tert-butylphenyl) phosphite.
3. The mechanical impact resistant photovoltaic film as set forth in claim 1, wherein said crosslinking agent comprises a crosslinking curing agent and a co-crosslinking agent; wherein,
the crosslinking curing agent comprises one or a mixture of two of organic peroxide or azo compound;
the organic peroxide comprises one or the combination of any more of cumyl peroxide, di-tert-butyl peroxide, diisopropylbenzene hydroperoxide, 2, 5-dimethyl-2, 5-di-tert-butyl peroxy hexane, n-butyl 4, 4-di (tert-amyl peroxy) valerate, tert-butyl peroxy 2-ethyl hexyl carbonate or ethyl 3, 3-di (tert-butyl peroxy) butyrate;
the auxiliary crosslinking agent comprises one or the combination of any more of triallyl isocyanurate, triallyl cyanurate, trimethylolpropane trimethacrylate or diethylene glycol dimethacrylate.
4. The optical shock resistant photovoltaic film as claimed in any one of claims 1-3, wherein the silane coupling agent is one or a combination of any two of vinyltriethoxysilane, vinyltrimethoxysilane, vinyltributylsilane, vinyltriacetoxysilane or vinyltris (β -methoxyethoxy) silane.
5. The resistive optical impact photovoltaic film of claim 1, wherein the organic dicarboxylic acid comprises one or a combination of any of maleic anhydride, maleic acid, fumaric acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, or sebacic acid.
6. The method for preparing a photovoltaic adhesive film resistant to mechanical impact according to claim 1, wherein the method comprises the following steps:
an elastomer resin system: hot melt thermosetting resin system: glass fiber is proportionally 1:4-6:0.02, fully mixing, carrying out banburying and plasticizing, carrying out extrusion casting process production, and carrying out embossing and shaping treatment to form the photovoltaic adhesive film with resistance to mechanical impact.
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