CN112044903A - Component cleaning device - Google Patents
Component cleaning device Download PDFInfo
- Publication number
- CN112044903A CN112044903A CN202010832196.6A CN202010832196A CN112044903A CN 112044903 A CN112044903 A CN 112044903A CN 202010832196 A CN202010832196 A CN 202010832196A CN 112044903 A CN112044903 A CN 112044903A
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- CN
- China
- Prior art keywords
- component
- acid solution
- bearing
- bearing cavity
- cavity
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/045—Cleaning involving contact with liquid using perforated containers, e.g. baskets, or racks immersed and agitated in a liquid bath
- B08B3/047—Containers specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
Abstract
The invention provides a part cleaning device, which comprises a bearing component and a cleaning tank, wherein the bearing component is arranged on the cleaning tank; the bearing assembly comprises a bearing cavity and a handle, the handle is arranged on the bearing cavity, an opening for the part to enter and exit is arranged on the bearing cavity, and a plurality of liquid inlet and outlet ports are arranged on the cavity wall of the bearing cavity; the cleaning tank contains cell body, fluid-discharge tube and flowing back valve, the cell body is used for holding the acid solution, the cell body with the fluid-discharge tube intercommunication, flowing back valve set up in on the fluid-discharge tube. The invention solves the problems that operators are easily damaged by strong acid and parts are easily dropped in the cleaning process.
Description
Technical Field
The invention relates to the technical field of equipment cleaning, in particular to a component cleaning device.
Background
At present, parts of some semiconductor equipment need to be cleaned by acid solution, and the cleaning mode is that an operator puts the parts needing to be cleaned into the acid solution with acid-resistant gloves for soaking, and takes out the parts and puts the parts under deionized water for washing.
When the acid-resistant gloves are damaged, the skin of the operator is easily corroded by strong acid; when an operator puts a component to be cleaned into a container containing an acid solution, if the component falls into the container containing the acid solution carelessly, the acid solution is easy to splash, and the operator is damaged by splashed strong acid; when an operator transfers a part from strong acid to deionized water, the surface of the soaked part is wet and smooth, and if the part is accidentally dropped, the part is damaged, so that the cost loss is caused.
Disclosure of Invention
The invention aims to provide a part cleaning device to solve the problems that operators are easily damaged by strong acid and parts are easily dropped in the cleaning process.
In order to achieve the above object, the present invention provides a component cleaning apparatus, comprising a bearing assembly and a cleaning tank;
the bearing assembly comprises a bearing cavity and a handle, the handle is arranged on the bearing cavity, an opening for the part to enter and exit is arranged on the bearing cavity, and a plurality of liquid inlet and outlet ports are arranged on the cavity wall of the bearing cavity;
the cleaning tank contains cell body, fluid-discharge tube and flowing back valve, the cell body is used for holding the acid solution, the cell body with the fluid-discharge tube intercommunication, flowing back valve set up in on the fluid-discharge tube.
Optionally, the liquid inlet and outlet ports are uniformly distributed on the cavity wall of the bearing cavity.
Optionally, the bearing cavity is square, cylindrical or truncated cone-shaped.
Optionally, the bearing assembly and the cleaning tank are both made of PP materials.
Optionally, the size of the notch of the tank body is larger than that of the bearing cavity, so that the bearing cavity can enter the tank body.
Optionally, the height of the groove body is greater than the sum of the height of the component and the wall thickness of the bearing cavity.
Optionally, the component is a metal component, and the acid solution is a hydrofluoric acid solution.
Optionally, the component is a quartz component or a corrosion-resistant plastic component, and the acid solution is a nitric acid solution.
Optionally, the concentration of the hydrofluoric acid solution is less than or equal to 49%, and the concentration of the nitric acid solution is less than or equal to 30%.
Optionally, the method further includes: and the deionized water faucet is connected with a deionized water supply device, is arranged above the tank body and is used for flushing the components.
In the part cleaning device provided by the invention, an acid solution is placed in a groove body, and a part is placed in a bearing cavity for soaking through an opening of the bearing cavity; the bearing cavity is provided with a handle, so that an operator can move the bearing assembly conveniently; the wall of the bearing cavity is provided with a plurality of liquid inlet and outlet ports, so that when the bearing assembly is placed in a groove body containing acid solution, the acid solution can conveniently and quickly flow back into the bearing cavity; the liquid discharge pipe is communicated with the groove body, a liquid discharge valve is arranged on the liquid discharge pipe, after the parts are soaked, the liquid discharge valve is opened to discharge acid solution, deionized water washing can be carried out after the acid solution is discharged for a little time, and the cleaned parts can be taken out after the acid solution is discharged for a little time. In the whole working process, no contact exists between the operating personnel and the acid solution, the personal safety of the operating personnel is ensured, the hands are not needed to move the parts to carry out deionized water washing, and the risk of falling and damage during part washing is avoided.
Drawings
Fig. 1 is a schematic structural view illustrating a carrier assembly and a cleaning tank according to an embodiment of the present invention;
FIG. 2 is a schematic structural view of a carrier assembly immersion cleaning tank according to an embodiment of the present invention;
in the drawings: 11-a load-bearing cavity; 12-a handle; 13-opening; 14-liquid inlet and outlet; 15-a component; 16-a trough body; 17-a drain pipe; 18-liquid drain valve.
Detailed Description
The following describes in more detail embodiments of the present invention with reference to the schematic drawings. The advantages and features of the present invention will become more apparent from the following description. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
Fig. 1 is a schematic structural view illustrating the separation of the carrier assembly and the cleaning tank provided in this embodiment, and fig. 2 is a schematic structural view illustrating the immersion of the carrier assembly into the cleaning tank provided in this embodiment. Referring to fig. 1 and 2, the present invention provides a component cleaning apparatus for cleaning a component 15, which includes a carrier assembly and a cleaning tank. Wherein, the bearing component comprises a bearing cavity 11 and a handle 12, and the cleaning tank comprises a tank body 16, a liquid discharge pipe 17 and a liquid discharge valve 18.
Specifically, the load-bearing chamber 11 is provided with an opening 13 for the component 15 to enter and exit, so as to facilitate the placement of the component 15 in the load-bearing chamber 11. In the present embodiment, the supporting cavity 11 is square, but is not limited thereto, and may also be cylindrical or truncated cone, etc., however, no matter what the shape of the supporting cavity is, the supporting cavity 11 needs to satisfy the condition of being able to be placed in the cleaning tank smoothly.
The handle 12 is specifically arranged on the upper surface of the bearing cavity 11, and two ends of the handle 12 are respectively connected with the cavity wall of the bearing cavity 11 and located on two sides of the opening 13, so that the operator can stably lift the bearing cavity 11 through the handle 12.
The cavity wall of the bearing cavity 11 is provided with a plurality of liquid inlet and outlet ports 14, and the liquid inlet and outlet ports 14 are uniformly distributed on the cavity wall of the bearing cavity 11 so as to communicate the bearing cavity 11 with the outside. The liquid inlet and outlet 14 are through holes, the liquid inlet and outlet 14 are uniformly distributed on the bottom and the periphery of the bearing cavity 11, the number of the liquid inlet and outlet 14 is increased, the aperture of the liquid inlet and outlet 14 is increased, the speed of liquid flowing into/out of the bearing cavity 11 is increased, and the cleaning speed can be increased. In this embodiment, the number of the liquid inlet and outlet 14 is plural, but is not limited thereto, and may be a single liquid inlet and outlet with a larger size. In this embodiment, the plurality of liquid inlets and liquid outlets 14 are uniformly distributed on the cavity wall of the bearing cavity 11, but not limited thereto, the distribution of the liquid inlets and liquid outlets 14 on the cavity wall of the bearing cavity 11 may also be in other distribution manners.
In this embodiment, the component 15 is a sampling component of an inductively coupled plasma mass spectrometer (ICP-MS), the ICP-MS is a component for measuring and analyzing metal forms in inorganic elements and organic substances, and the sampling component is specifically a component for collecting samples in a sample injection system of the ICP-MS, and the sampling component is tapered, so the sampling component is also called a sampling cone, the sampling cone is generally made of metal materials such as nickel, platinum or copper, and the sampling cone can directly contact with different samples for sampling during sampling, wherein part of the samples have strong corrosivity, which easily causes impurities such as oxides to be generated on the sampling cone, the sampling cone is not cleaned and is continuously used, which affects verification results of the ICP-MS, and the sampling cone is damaged due to long-time corrosion, so the sampling cone needs to be cleaned, but the impurities such as the oxides are generally difficult to be removed by a washing method, preferably, the solution is soaked for a period of time, and the impurities such as oxide and the like are easily removed when the impurities react with the solution to form salts.
Further, the size of the notch of the slot body 16 is larger than that of the bearing cavity 11, so that the bearing cavity 11 can enter the slot body 16. In this embodiment, the slot 16 is square, two adjacent sides of the slot 16 are larger than two adjacent bottom edges of the bearing cavity 11, and the bearing cavity 11 can be completely placed in the slot 16. The height of the groove body 16 is larger than the sum of the height of the component 15 and the wall thickness of the bearing cavity 11, so that enough acid solution can be contained in the groove body 16, and the component 15 in the bearing cavity 11 is completely immersed in the acid solution. The height of the tank 16 in this embodiment is greater than the sum of the height occupied by the sampling cone 15 and the wall thickness of the carrier chamber 11 to enable the component 15 to be fully immersed by sufficient acid solution. In this embodiment, the groove body is square, but not limited to this shape, and may also be cylindrical or truncated cone-shaped.
When the component 15 is cleaned, an acid solution with a proper volume is contained in the tank body 16, a liquid discharge port is formed in the position, close to the bottom, of the tank body 16, and the liquid discharge pipe 17 is connected with the liquid discharge port so that the tank body 16 is communicated with the liquid discharge pipe 17. The waste liquid discharged from the liquid discharge pipe 17 may be sent to a waste liquid system.
A drain valve 18 is provided on the drain pipe 17, and the flow rate of the solution in the drain pipe 17 or the flow rate of the solution therethrough is controlled by the drain valve 18. After the component 15 is soaked, the drain valve 18 is opened to drain the acid solution, or the drain valve 18 is opened to flush the component 15 or clean the tank body 16.
Because the bearing assembly and the cleaning tank need to be in contact with the acid solution, in order to avoid corrosion of the acid solution to the bearing assembly and the cleaning tank, the bearing assembly and the cleaning tank are integrally made of a PP material, the PP material generally refers to polypropylene, the polypropylene can resist corrosion of acid, alkali, salt solution and various organic solvents at the temperature of below 80 ℃, the polypropylene is light in weight, and operation of operators is facilitated. In this embodiment, the supporting assembly and the cleaning tank are not limited to be made of PP material, but may be made of other materials that are resistant to corrosion of acid, alkali, salt solution and various organic solvents, such as teflon.
Furthermore, the present invention further includes a deionized water faucet connected to a deionized water supply device, and in this embodiment, the deionized water faucet is disposed above the tank 16 for flushing the component 15. The part 15 can adopt the deionized water to wash after soaking, and when the deionized water washed, the part 15 washed in bearing assembly, avoided operation personnel and acid solution contact, also avoided the accident of washing in-process part 15 to drop the damage. The deionized water is deionized and purified water, the contents of various salts and metal ions in the water are low, the conductivity is low, the deionized water is used for washing the component 15, the cleaning quality of the component 15 is further ensured, and the oxidation of the component 15 in the cleaning process is reduced.
Further, the member 15 in the present invention is not limited to a metal member, and may be a quartz member, a corrosion-resistant plastic member, or the like.
Since some acid solutions have too fast a metal dissolution rate to be controlled easily and cause damage to the component 15 itself, it is necessary to use a suitable acid solution to both remove the oxide and ensure that the component 15 itself is not unduly affected. Therefore, in this embodiment, the acid solution for cleaning the sampling cone is a 49% hydrofluoric acid solution, which is an aqueous solution of hydrogen fluoride gas and has very strong corrosivity, and can quickly permeate into tissues when contacting the skin to erode the muscle and bone, and the fluorine ions affect the nerve function to reduce the bone density, so that even if the lower concentration hydrofluoric acid solution contacts the skin, burns can be caused and harm is caused to the human body, and the hydrofluoric acid solution is often used for etching glass, pickling metal, and the like. The concentration of the hydrofluoric acid solution used in this embodiment is less than or equal to 49%, but it should be understood that when the cleaning is actually performed, the proper concentration is selected or proportioned, and when the amount of oxide is large, the acid soaking with high concentration is needed to complete the soaking as soon as possible.
It should be noted that, in this embodiment, the waste liquid after the hydrofluoric acid solution is soaked in the sampling cone contains a high amount of fluorine, which causes pollution and cannot be discharged at will, and the waste liquid needs to be collected, processed and then discharged.
When the member 15 is a quartz member or a corrosion-resistant plastic member, the hydrofluoric acid solution may be replaced with a nitric acid solution, and the concentration of the nitric acid solution in this embodiment is less than or equal to 30%, because a high concentration of the nitric acid solution may generate more foam-irritating odor, cause contamination, and cause excessive corrosion to the member 15, the concentration is selected with attention, but not limited thereto, and the appropriate concentration is selected in combination with actual conditions.
The specific cleaning step of this example: firstly, placing a cleaning tank into a drainage tank, wherein the drainage tank is equipped in a laboratory and is used for recovering waste liquid after cleaning experimental parts; then, a proper amount of prepared hydrofluoric acid solution is placed in the cleaning tank, and the sampling cone is stably placed in the bearing cavity 11; then slowly lifting the handle 12 to slowly immerse the bearing cavity 11 in the hydrofluoric acid solution, so that the sampling cone is immersed in the hydrofluoric acid solution; waiting for 10 seconds of soaking, then opening a liquid discharge valve 18 to discharge waste liquid into a water discharge groove, and enabling the waste liquid in the water discharge groove to flow to a waste liquid system; after the waste liquid is completely discharged, opening a deionized water faucet to flush the sampling cone; and (3) washing for 15 minutes by using deionized water, enabling the washed waste liquid to flow into a waste liquid system through a drainage groove, and taking out the sampling cone after the waste liquid is drained, wherein the process is the whole process of cleaning the sampling cone. In the above embodiment, the soaking time is 10 seconds and the rinsing time is 15 minutes, which is the preferable time of the embodiment, but the time is not limited thereto, and may be other suitable times. In the present embodiment, it is mentioned that the cleaning tank is placed in the drain tank as a preferable cleaning step of the present embodiment, but not limited thereto, and the cleaning tank may be placed in a safe place such as a laboratory bench, and the drain pipe 17 may be connected to the waste liquid system to drain the waste liquid.
In summary, in the component cleaning apparatus provided by the present invention, the carrying cavity 11 and the cleaning tank are made of PP material, and can resist corrosion of acid, alkali, salt solution and various organic solvents, so that the cleaning tank and the carrying cavity 11 can directly contact with the acid solution. An opening 13 is formed in the bearing cavity 11, so that an operator can conveniently put the part 15 into the bearing cavity 11 for soaking, and a handle 12 is arranged on the bearing cavity, so that the operator can conveniently move the bearing assembly; through set up a plurality of business turn over liquid ports 14 on the chamber wall of bearing chamber 11, be convenient for acid solution fast reflux in bearing chamber 11, improve washing speed. The drain pipe 17 is provided with a drain valve 18, and after the component 15 is soaked, the drain valve 18 is opened to drain the waste liquid, and the deionized water is washed for a little time. In the whole cleaning process, only dozens of seconds are needed for soaking the parts 15 to washing the parts 15, so that the cleaning efficiency is high; in the whole working process, no contact exists between the operating personnel and the acid solution, the personal safety of the operating personnel is ensured, the part 15 is not required to be moved by hands to carry out deionized water washing, and the risk of falling and damage when the part 15 is washed is avoided.
The above description is only a preferred embodiment of the present invention, and does not limit the present invention in any way. It will be understood by those skilled in the art that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (10)
1. The part cleaning device is characterized by comprising a bearing assembly and a cleaning tank;
the bearing assembly comprises a bearing cavity and a handle, the handle is arranged on the bearing cavity, an opening for the part to enter and exit is arranged on the bearing cavity, and a plurality of liquid inlet and outlet ports are arranged on the cavity wall of the bearing cavity;
the cleaning tank contains cell body, fluid-discharge tube and flowing back valve, the cell body is used for holding the acid solution, the cell body with the fluid-discharge tube intercommunication, flowing back valve set up in on the fluid-discharge tube.
2. The component cleaning apparatus of claim 1, wherein the fluid inlet and outlet ports are evenly distributed across the walls of the load-bearing chamber.
3. The parts washing system as claimed in claim 1 wherein the load chamber is square, cylindrical or frusto-conical.
4. The parts washing system as claimed in claim 1, wherein the carrier assembly and the sink are made of PP material.
5. The parts washing system as claimed in claim 1 wherein the slot of the tank is of a size greater than the size of the load chamber to enable the load chamber to enter the tank.
6. The parts washing system as claimed in claim 5 wherein the height of the trough is greater than the sum of the height of the parts and the wall thickness of the load chamber.
7. The component cleaning apparatus according to claim 1, wherein the component is a metal component, and the acid solution is a hydrofluoric acid solution.
8. The component cleaning apparatus according to claim 1, wherein the component is a quartz component or a corrosion-resistant plastic component, and the acid solution is a nitric acid solution.
9. The component cleaning apparatus according to claim 7 or 8, wherein the concentration of the hydrofluoric acid solution is 49% or less, and the concentration of the nitric acid solution is 30% or less.
10. The parts washing apparatus as claimed in claim 1, further comprising:
and the deionized water faucet is connected with a deionized water supply device, is arranged above the tank body and is used for flushing the components.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010832196.6A CN112044903A (en) | 2020-08-18 | 2020-08-18 | Component cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010832196.6A CN112044903A (en) | 2020-08-18 | 2020-08-18 | Component cleaning device |
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| Publication Number | Publication Date |
|---|---|
| CN112044903A true CN112044903A (en) | 2020-12-08 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010832196.6A Pending CN112044903A (en) | 2020-08-18 | 2020-08-18 | Component cleaning device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US20050103360A1 (en) * | 2003-11-19 | 2005-05-19 | Tafoya David J. | Apparatus and method of removing water soluble support material from a rapid prototype part |
| CN205436449U (en) * | 2016-01-07 | 2016-08-10 | 浙江谷高光伏科技有限公司 | Improved generation solar energy polycrystal silicon chip cleaning equipment |
| CN208116350U (en) * | 2018-01-29 | 2018-11-20 | 西安金域医学检验所有限公司 | A kind of washing lotion infuser device |
| CN109570119A (en) * | 2017-09-29 | 2019-04-05 | 新昌县鼎石科技咨询服务有限公司 | A kind of fitting of medical apparatus cleaning device |
| CN110813885A (en) * | 2019-11-27 | 2020-02-21 | 江苏晶曌半导体有限公司 | LED epitaxial wafer belt cleaning device |
| CN111438133A (en) * | 2020-04-30 | 2020-07-24 | 深圳市路维光电股份有限公司 | Chromium plate cleaning jig and cleaning method |
-
2020
- 2020-08-18 CN CN202010832196.6A patent/CN112044903A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050103360A1 (en) * | 2003-11-19 | 2005-05-19 | Tafoya David J. | Apparatus and method of removing water soluble support material from a rapid prototype part |
| CN205436449U (en) * | 2016-01-07 | 2016-08-10 | 浙江谷高光伏科技有限公司 | Improved generation solar energy polycrystal silicon chip cleaning equipment |
| CN109570119A (en) * | 2017-09-29 | 2019-04-05 | 新昌县鼎石科技咨询服务有限公司 | A kind of fitting of medical apparatus cleaning device |
| CN208116350U (en) * | 2018-01-29 | 2018-11-20 | 西安金域医学检验所有限公司 | A kind of washing lotion infuser device |
| CN110813885A (en) * | 2019-11-27 | 2020-02-21 | 江苏晶曌半导体有限公司 | LED epitaxial wafer belt cleaning device |
| CN111438133A (en) * | 2020-04-30 | 2020-07-24 | 深圳市路维光电股份有限公司 | Chromium plate cleaning jig and cleaning method |
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Application publication date: 20201208 |
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