CN110813885A

CN110813885A - LED epitaxial wafer belt cleaning device

Info

Publication number: CN110813885A
Application number: CN201911185951.XA
Authority: CN
Inventors: 不公告发明人
Original assignee: Jiangsu Crystal Semiconductor Co Ltd
Current assignee: Jiangsu Crystal Semiconductor Co Ltd
Priority date: 2019-11-27
Filing date: 2019-11-27
Publication date: 2020-02-21

Abstract

The invention discloses a cleaning device for an LED epitaxial wafer, and particularly relates to the technical field of manufacturing of the LED epitaxial wafer. According to the epitaxial wafer cleaning device, the cleaning basket is used for soaking and cleaning the epitaxial wafer, the spray head is used for washing away the cleaning agent after the epitaxial wafer is soaked, manual touch and manual cleaning are not needed in the whole cleaning process, manpower is effectively saved, and the personal safety of cleaning personnel is guaranteed.

Description

LED epitaxial wafer belt cleaning device

Technical Field

The invention relates to the technical field of LED epitaxial wafer manufacturing, in particular to an LED epitaxial wafer cleaning device.

Background

The LED is a short-term LED, and is a semiconductor component, the light source of which is mainly radiated by the combination of electrons and holes, is called as a fourth generation illumination light source or a green light source, and has the characteristics of energy conservation, environmental protection, long service life, small volume and the like, and is widely applied to the fields of various indications, display, decoration, backlight sources, common illumination, urban night scenes and the like.

In the prior art, the epitaxial wafer is mainly cleaned by cleaning solution manually, so that not only is manpower and time wasted, but also the cleaning solution can cause harm to the health of cleaning personnel, and therefore, the invention provides the LED epitaxial wafer cleaning device for solving the problems.

Disclosure of Invention

In order to overcome the defects in the prior art, embodiments of the present invention provide an LED epitaxial wafer cleaning apparatus, in which a cleaning basket capable of moving up and down is arranged, the cleaning basket moves down to soak an epitaxial wafer in a cleaning pool, the epitaxial wafer is cleaned by a cleaning solution, the epitaxial wafer is moved up to be cleaned by a nozzle, the cleaning process does not require manual touch of the cleaning solution, and manual cleaning is not required, so that manpower is effectively saved, and personal safety of cleaning personnel is ensured, thereby solving the problems in the background art.

In order to achieve the purpose, the invention provides the following technical scheme: a cleaning device for an LED epitaxial wafer comprises a cleaning table, wherein a cleaning pool is embedded in the cleaning table, the cleaning pool extends out of the bottom of the cleaning table, a waste liquid box is arranged at the bottom of the cleaning pool, a water pipe is arranged between the cleaning pool and the waste liquid box, a cleaning agent box is fixedly arranged at the top of the cleaning table and is arranged at the rear side of the cleaning pool, a first supporting rod is fixedly arranged at one side of the cleaning pool, a second supporting rod is fixedly arranged at the other side of the cleaning pool, a rod sleeve is sleeved on the second supporting rod, a cleaning basket is fixedly arranged at one side of the rod sleeve, a bolt is arranged at the other side of the rod sleeve and penetrates through the rod sleeve to be in contact with the second supporting rod, the bolt is in threaded connection with the rod sleeve, the cleaning basket is arranged at the top of the cleaning pool, a water tank is arranged at the top of the cleaning basket, and the bottom of, the bottom of the water tank is provided with a spray head, and the spray head is arranged at the top of the cleaning basket.

In a preferred embodiment, an outlet pipe is arranged on one side of the waste liquid tank.

In a preferred embodiment, a third on-off valve is arranged on a water pipe between the cleaning pool and the waste liquid tank.

In a preferred embodiment, a second switch valve is arranged on the spray head.

In a preferred embodiment, the top of the cleaning agent box is provided with a liquid injection port, and the front side of the cleaning agent box is provided with a first switch valve.

The invention has the technical effects and advantages that:

through setting up the washing basket that can reciprocate, place the epitaxial wafer in wasing the basket, make its downstream epitaxial wafer soak in wasing the pond, utilize the washing liquid to wash it, the rebound washs the basket and utilizes shower nozzle epitaxial wafer to wash, and whole cleaning process does not need artifical touching cleaner, also need not artifical the washing, has practiced thrift the manpower effectively to cleaning personnel's personal safety has been ensured.

Drawings

Fig. 1 is a schematic view of the overall structure of the present invention.

Fig. 2 is a left side view of the overall structure of the present invention.

FIG. 3 is a top view of the wash station of the present invention.

The reference signs are: 1 clean bench, 2 wash ponds, 3 waste liquid cases, 4 cleaner cases, 5 first bracing pieces, 6 second bracing pieces, 7 pole covers, 8 wash baskets, 9 water tanks, 10 shower nozzles.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

The LED epitaxial wafer cleaning device shown in the figures 1-3 comprises a cleaning table 1, wherein a cleaning pool 2 is inlaid in the cleaning table 1, the cleaning pool 2 extends out of the bottom of the cleaning table 1, a waste liquid tank 3 is arranged at the bottom of the cleaning pool 2, a water pipe is arranged between the cleaning pool 2 and the waste liquid tank 3, a cleaning agent tank 4 is fixedly arranged at the top of the cleaning table 1, the cleaning agent tank 4 is arranged at the rear side of the cleaning pool 2, a first supporting rod 5 is fixedly arranged at one side of the cleaning pool 2, a second supporting rod 6 is fixedly arranged at the other side of the cleaning pool 2, a rod sleeve 7 is sleeved on the second supporting rod 6, a cleaning basket 8 is fixedly arranged at one side of the rod sleeve 7, a bolt is arranged at the other side of the rod sleeve 7, the bolt penetrates through the rod sleeve 7 to be in contact with the second supporting rod 6, the bolt is in threaded connection with the rod sleeve 7, the cleaning basket 8 is arranged, the top of the cleaning basket 8 is provided with a water tank 9, the bottom of the water tank 9 is fixedly connected with the first supporting rod 5 and the second supporting rod 6, the bottom of the water tank 9 is provided with a spray head 10, and the spray head 10 is arranged at the top of the cleaning basket 8.

Further, a water outlet pipe is arranged on one side of the waste liquid tank 3;

further, a third switch valve is arranged on a water pipe between the cleaning pool 2 and the waste liquid tank 3;

further, a second switch valve is arranged on the spray head 10;

furthermore, a liquid injection port is formed in the top of the cleaning agent box 4, and a first switch valve is arranged on the front side of the cleaning agent box 4.

The working principle of the invention is as follows:

referring to the attached drawings 1-3 of the specification, an epitaxial wafer is firstly placed into a cleaning basket 8, then a bolt on a rod sleeve 7 is unscrewed, the rod sleeve 7 moves downwards to drive the cleaning basket 8 to move downwards, the cleaning basket 8 stops moving after the rod sleeve 7 moves to the lowest position, at the moment, the cleaning basket 8 is embedded in a cleaning pool 2, then a first switch valve on one side of a cleaning agent box 4 is opened to enable the cleaning agent to flow into the cleaning pool 2, when the cleaning agent submerges the epitaxial wafer in the cleaning basket 8, the first switch valve is closed, after soaking for a period of time, the rod sleeve 7 moves upwards to drive the cleaning basket 8 to move upwards, when the cleaning basket 8 moves to be close to a spray head 10, the bolt on one side of the rod sleeve 7 is screwed, then a second switch valve on the spray head 10 is opened to enable water flow to wash the epitaxial wafer through the spray head 10, and after the epitaxial wafer is washed completely, the second switch valve on the spray head 10 is closed, and opening a third switch valve on a water pipe between the cleaning pool 2 and the waste liquid tank 3, enabling the cleaned waste liquid to flow into the waste liquid tank 3, closing the third switch valve after the waste liquid flows out, and taking out the epitaxial wafer in the cleaning basket 8.

The points to be finally explained are: first, in the description of the present application, it should be noted that, unless otherwise specified and limited, the terms "mounted," "connected," and "connected" should be understood broadly, and may be a mechanical connection or an electrical connection, or a communication between two elements, and may be a direct connection, and "upper," "lower," "left," and "right" are only used to indicate a relative positional relationship, and when the absolute position of the object to be described is changed, the relative positional relationship may be changed;

secondly, the method comprises the following steps: in the drawings of the disclosed embodiments of the invention, only the structures related to the disclosed embodiments are referred to, other structures can refer to common designs, and the same embodiment and different embodiments of the invention can be combined with each other without conflict;

and finally: the above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that are within the spirit and principle of the present invention are intended to be included in the scope of the present invention.

Claims

1. The utility model provides a LED epitaxial wafer belt cleaning device, includes wash platform (1), its characterized in that: the cleaning device is characterized in that a cleaning pool (2) is inlaid in the cleaning table (1), the cleaning pool (2) extends out of the bottom of the cleaning table (1), a waste liquid box (3) is arranged at the bottom of the cleaning pool (2), a water pipe is arranged between the cleaning pool (2) and the waste liquid box (3), a cleaning agent box (4) is fixedly arranged at the top of the cleaning table (1), the cleaning agent box (4) is arranged at the rear side of the cleaning pool (2), a first supporting rod (5) is fixedly arranged at one side of the cleaning pool (2), a second supporting rod (6) is fixedly arranged at the other side of the cleaning pool (2), a rod sleeve (7) is sleeved on the second supporting rod (6), a cleaning basket (8) is fixedly arranged at one side of the rod sleeve (7), a bolt is arranged at the other side of the rod sleeve (7), the bolt penetrates through the rod sleeve (7) and is in contact with the second supporting rod (6), and is in threaded connection with, wash basket (8) and establish at washing pond (2) top, wash basket (8) top and be equipped with water tank (9), water tank (9) bottom and first bracing piece (5) and second bracing piece (6) fixed connection, water tank (9) bottom is equipped with shower nozzle (10), establish at washing basket (8) top shower nozzle (10).

2. The LED epitaxial wafer cleaning device of claim 1, wherein: and a water outlet pipe is arranged on one side of the waste liquid tank (3).

3. The LED epitaxial wafer cleaning device of claim 1, wherein: and a third switch valve is arranged on a water pipe between the cleaning pool (2) and the waste liquid tank (3).

4. The LED epitaxial wafer cleaning device of claim 1, wherein: and a second switch valve is arranged on the spray head (10).

5. The LED epitaxial wafer cleaning device of claim 1, wherein: the cleaning agent box (4) top is equipped with annotates the liquid mouth, cleaning agent box (4) front side is equipped with first ooff valve.