CN112038262A - Exhaust control device - Google Patents
Exhaust control device Download PDFInfo
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- CN112038262A CN112038262A CN202010740047.7A CN202010740047A CN112038262A CN 112038262 A CN112038262 A CN 112038262A CN 202010740047 A CN202010740047 A CN 202010740047A CN 112038262 A CN112038262 A CN 112038262A
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- 230000001105 regulatory effect Effects 0.000 claims abstract description 27
- 238000005530 etching Methods 0.000 claims abstract description 22
- 238000001514 detection method Methods 0.000 claims abstract description 13
- 239000007788 liquid Substances 0.000 claims description 22
- 239000002245 particle Substances 0.000 description 13
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Lift Valve (AREA)
Abstract
The application discloses exhaust control device is applied to etching equipment or developing equipment, and it includes: an exhaust pipe; the air pressure detection device comprises an air pressure sensor, and the air pressure sensor is arranged on the exhaust pipe and used for detecting the pressure of air in the exhaust pipe; an electric flow regulating valve mounted on the exhaust pipe; and the control system is electrically connected with the electric flow regulating valve and the air pressure sensor and is used for regulating the opening degree of the electric flow regulating valve according to the gas pressure. The electric flow regulating valve automatically controls the opening of the valve according to the gas pressure, and realizes intelligent control of the gas flow discharged by an exhaust pipeline of an etching machine or developing equipment.
Description
Technical Field
The application relates to the technical field of chips, in particular to an exhaust control device.
Background
A chip, also known as an integrated circuit, refers to a silicon chip containing an integrated circuit, which is small in size and is often a part of a computer or other electronic device.
The manufacture of the chip comprises an etching process, namely, a photoresist layer is coated on a wafer, a circuit structure is branded on the photoresist layer through etching equipment or developing equipment, the exposed photoresist layer becomes a water-soluble substance, and finally the water-soluble substance is blown off by gas. And introducing the gas carrying the water-soluble substance into a plant equipment pipeline connected with the exhaust pipeline through the exhaust pipeline of the etching equipment or the developing equipment, and finally discharging the gas from the plant equipment pipeline. At present, butterfly valves or pneumatic valves are installed on plant service equipment pipelines and used for controlling gas circulation. The butterfly valve can control the flow of gas, but the air displacement of the butterfly valve needs to be manually controlled; the pneumatic valve can be automatically controlled, but only can control the on-off of gas, and cannot control the exhaust amount.
Disclosure of Invention
Accordingly, the present invention provides an exhaust gas control apparatus that at least partially solves the above-mentioned problems.
The invention provides an exhaust control device, which is applied to etching equipment or developing equipment and comprises:
an exhaust pipe;
the air pressure detection device comprises an air pressure sensor, and the air pressure sensor is arranged on the exhaust pipe and used for detecting the pressure of air in the exhaust pipe;
an electric flow regulating valve mounted on the exhaust pipe;
and the control system is electrically connected with the electric flow regulating valve and the air pressure sensor and is used for regulating the opening degree of the electric flow regulating valve according to the gas pressure.
As a preferable mode for realizing the control method, an opening degree detection device is arranged on the electric flow regulating valve, and the opening degree detection device is electrically connected with the control system and is used for detecting the opening degree of the electric flow regulating valve.
As a preferable mode, the device also comprises an alarm device which is electrically connected with the control system,
and when the opening degree of the electric flow regulating valve exceeds a preset value, the control system controls the alarm device to give an alarm.
Preferably, the bottom of the exhaust pipe is provided with a liquid discharge hole.
As the preferable mode of realization, the device also comprises a connecting pipe and a liquid storage tank, wherein the connecting pipe is connected with the liquid discharge hole and the liquid storage tank.
In a preferable embodiment, the exhaust pipe includes a first section, a second section, and a third section arranged in the exhaust direction,
the first section and the second section form an obtuse angle, and the second section and the third section form an obtuse angle.
As a preferable mode of realization, an included angle between the first section and the second section is 135 °, an included angle between the second section and the third section is 135 °, and an included angle between the first section and the third section is 90 °.
As an implementable preference, the air pressure sensor is disposed within the first segment.
In a preferable mode that can be realized, the electric flow rate control valve is provided in the second section.
Preferably, the electric flow control valve is a butterfly valve.
The electric flow regulating valve automatically controls the opening of the valve according to the gas pressure, so that the flow of gas discharged from an exhaust pipeline of an etching machine table is intelligently controlled; the exhaust pipe can be prevented from being blocked by particles, so that the etching machine can normally work; the particles in the exhaust pipe are removed regularly, so that the service life of the exhaust pipe is prolonged; the liquid can be prevented from being stored in the exhaust pipe for a long time, so that the liquid can not corrode the exhaust pipe, and the service life of the exhaust pipe can be prolonged; the gas is fully contacted with the inner wall of the exhaust pipe, so that suspended particles in the gas are favorably attached to the exhaust pipe, the floating particle amount of the gas exhausted from an exhaust pipeline of a plant facility is reduced, and the atmosphere pollution is avoided; the gas and the exhaust pipe are condensed to form liquid, the liquid amount formed by condensation of the gas and the exhaust pipe of the plant facility is reduced, and the corrosion to the exhaust pipe of the plant facility is reduced; is favorable for reducing the exhaust pressure loss caused by steering
Drawings
Other features, objects and advantages of the present application will become more apparent upon reading of the following detailed description of non-limiting embodiments thereof, made with reference to the accompanying drawings in which:
fig. 1 is a schematic structural view of an exhaust gas control apparatus according to an embodiment of the present application;
fig. 2 is a schematic diagram of a butterfly valve according to an embodiment of the present application;
FIG. 3 is an isometric view of FIG. 2;
100. an exhaust pipe 11, a first section 111, a drain hole 12, a second section 121, a first part 122, a second part 13, and a third section;
200. the device comprises an electric flow regulating valve 21, a valve 300, a connecting pipe 400, a liquid storage tank 500, an exhaust pipeline of etching equipment 600 and an exhaust pipeline of plant facilities.
Detailed Description
The present application will be described in further detail with reference to the following drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the relevant application and are not limiting of the application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application. It should be noted that, for the convenience of description, only the portions relevant to the application are shown in the drawings.
In the description of the present application, it is to be understood that the terms "radial," axial, "" upper "inner," "outer," and the like refer to an orientation or positional relationship based on that shown in the drawings, which is for convenience in describing the present application and simplifying the description, and does not indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present application. In the description of the present application, "a plurality" means two or more unless otherwise specified.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted", "disposed" and "connected" are to be understood in a broad sense, e.g. either fixedly or detachably or integrally connected: may be directly connected or indirectly connected through an intermediate. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
Referring to fig. 1 to 3, there is shown an exhaust gas control apparatus applied to an etching apparatus or a developing apparatus. The exhaust gas control device includes: an exhaust pipe 100; a gas pressure detecting device (not shown) including a gas pressure sensor mounted on the exhaust pipe 100 for detecting a gas pressure inside the exhaust pipe 100; an electric flow rate control valve 200, the electric flow rate control valve 200 being mounted on the exhaust pipe 100; and the control system is electrically connected with the electric flow regulating valve 200 and the gas pressure sensor and is used for regulating the opening degree of the electric flow regulating valve 200 according to the gas pressure.
As shown in fig. 1, an exhaust gas control apparatus includes an exhaust pipe 100, an air pressure sensor, an electric flow rate adjustment valve 200, and a control system. The exhaust pipe 100 may be a bent pipe or a straight pipe, the exhaust pipe 100 may be integrally formed or may be composed of a plurality of pipe members, one end of the exhaust pipe 100 is flanged to the exhaust pipe 500 of the etching apparatus, and the other end of the exhaust pipe 100 is flanged to the exhaust pipe 600 of the plant facility. The air pressure sensor is mounted on the exhaust pipe 100. The electric flow rate adjustment valve 200 may be a butterfly valve or a throttle valve, which is mounted on the exhaust pipe 100. The control system is a control system of the etching apparatus 500, and the control system is electrically connected with the electric flow regulating valve 200 and the gas pressure sensor, respectively. It should be noted that the control system may be a control system of the developing device, and one end of the exhaust pipe 100 is flange-connected to the exhaust pipe 100 of the developing device.
When the exhaust control apparatus is operated, gas exhausted from the exhaust duct 500 of the etching apparatus enters the exhaust duct 100, and finally, the gas is exhausted from the exhaust duct 600 of the plant facility. The pressure sensor can detect the pressure of the gas in real time and produce a pressure signal, and the pressure sensor sends the pressure signal to the control system. The control system determines a valve opening corresponding to the pressure using a relationship table and the received pressure signal. The control system controls the electric flow regulating valve 200 to regulate the valve to a corresponding opening degree by using the valve opening degree. It should be noted that the "relationship table" herein is a correspondence table between the pressure and the valve opening, and the correspondence table needs to be set by a designer according to an actual situation.
For example, the electric flow control valve 200 is a butterfly valve, and the exhaust pipe 500 of the etching apparatus exhausts gas containing suspended particles. When gas enters the exhaust pipe 100, the valve 21 of the butterfly valve rotates to 30 degrees, the butterfly valve controls the flow of the gas passing through the exhaust pipe 100 to be Q1, and the gas pressure detected by the gas pressure sensor is 60 MPa. The suspended particles in the gas can be attached to the inner wall of the exhaust pipe 100, and as time goes on, a large amount of accumulated suspended particles occupy the flowing space of the gas in the exhaust pipe 100, the gas pressure gradually rises to 70MPa, and the gas flow rate drops to Q2. To continue the flow of gas at Q1, the control system controls the butterfly valve to operate so that the valve 21 of the butterfly valve is turned to 50 ° and the flow of gas through the exhaust pipe 100 is increased so that the flow of gas changes from Q1 to Q2.
Compared with the prior art, the electric flow regulating valve automatically controls the opening of the valve according to the gas pressure, and realizes intelligent control of the gas flow discharged from the exhaust pipeline 500 of the etching equipment.
Referring to fig. 1 to 3, the exhaust gas control apparatus further includes an opening degree detection means (not shown) and an alarm means (not shown) as a preferable mode to be realized. The opening detection device is disposed on the electric flow rate control valve 200 and is configured to detect the opening of the electric flow rate control valve 200.
The opening degree detection device and the alarm device are respectively and electrically connected with the control system. When the opening degree detection device detects that the opening degree of the electric flow regulating valve 200 reaches a preset value, the opening degree detection device generates an opening degree signal and sends the opening degree signal to the control system, and the control system controls the alarm device to act by using the opening degree signal. It should be noted that the preset value needs to be set by a designer according to actual conditions.
Specifically, the opening detection device is a pressure sensor, and the electric flow rate control valve 200 is a butterfly valve. Pressure sensor fixed connection is on the inner wall of blast pipe 100, and pressure sensor corresponds the valve 21 setting of butterfly valve for when the valve 21 of butterfly valve rotated to predetermineeing the angle, valve 21 can support and lean on and trigger pressure sensor.
For example, the suspended particles may be accumulated to a certain degree and may block the exhaust pipe 100, so that the etching machine 500 may not work normally. While the particles attached for a long time can corrode the exhaust pipe 100. When the gas pressure rises to 110MPa, the valve 21 of the butterfly valve rotates to a preset angle of 85 degrees, and the valve 21 triggers the pressure sensor. The control system controls the action of the alarm device, and the alarm device sends out buzzing sound. After hearing the beep, the worker knows that the amount of the attachments in the exhaust pipe 10 is sufficient and needs to clean the attachments.
The arrangement of the opening detection device and the alarm device can avoid the particles from blocking the exhaust pipe 100, so that the etching machine 500 works normally; the exhaust pipe 100 is cleaned of particles periodically, which is beneficial to prolonging the service life of the exhaust pipe 100.
Referring to fig. 1 to 3, the exhaust control apparatus further includes a connection pipe 300 and a reservoir tank 400 as a preferable mode to be realized. A liquid discharge hole 111 is formed at the bottom of the exhaust pipe 100, one end of the connecting pipe 300 is welded at the liquid discharge hole 111, and the other end of the connecting pipe 300 is connected with the liquid storage tank 400 through a flange. It should be noted that, here, the "bottom" is a part of the sidewall of the exhaust pipe 100 near the ground; the liquid storage tank 400 may also be a drain pipe of a plant facility, and the other end of the connection pipe 300 is flanged with the drain pipe of the plant facility.
For example, the gas exhausted from the exhaust duct 500 of the etching apparatus may be condensed by the exhaust pipe 100 to form a liquid, and the liquid may be introduced into the storage tank 400 through the drain hole 111 of the exhaust pipe 100.
The arrangement mode can prevent liquid from being stored in the exhaust pipe 100 for a long time, so that the liquid cannot corrode the exhaust pipe 100, and the service life of the exhaust pipe 100 is prolonged.
Referring to fig. 1 to 3, as a preferable implementation manner, the exhaust pipe 100 includes a first section 11, a second section 12, and a third section 13 arranged along the exhaust direction, where the first section 11 and the second section 12 form an obtuse angle, and the second section 12 and the third section 13 form an obtuse angle.
Specifically, the exhaust duct 500 of the etching apparatus is horizontally arranged, the first section 11 is connected with the exhaust duct 500 of the etching apparatus through a flange, and the axis of the first section 11 and the axis of the exhaust duct 500 of the etching apparatus are located on the same straight line. The air pressure sensor is fixedly connected to the middle position of the first section 11 or the position close to the second section 12, and a liquid discharge hole 111 is formed at one end of the first section 11 close to the second section 12.
To assemble the butterfly valve on the second section 12, the second section 12 is divided into a first portion 121 and a second portion 122 that are equidistant. The first portion 121 of the second section 12, the butterfly valve and the second portion 122 of the second section 12 are arranged in sequence, the first portion 121 and the butterfly valve are connected through a flange, and the butterfly valve and the second portion 122 are connected through a flange. Wherein, the included angle between the axis of the first section 11 and the axis of the second section 12 is a, and a is an obtuse angle.
The second section 12 is connected with the third section 13 through a flange, an included angle between the axis of the second section 12 and the axis of the third section 13 is b, and b is an obtuse angle.
The third section 13 is flanged to the exhaust pipe 600 of the plant. The exhaust duct 600 of the plant is arranged vertically, and the axis of the third section 13 is aligned with the axis of the exhaust duct 600 of the plant.
a + b is 270 °, for example a is 97 °, b is 143 °; a is 143 ° and b is 127 °; a is 150 °, b is 120 °, etc.
The structure of the exhaust pipe 100 enables the gas to fully contact the inner wall of the exhaust pipe 100, which is beneficial for attaching the suspended particles in the gas to the exhaust pipe 100, reduces the amount of the floating particles in the gas exhausted from the exhaust pipeline 600 of the plant facility, and avoids polluting the atmosphere; the gas and the exhaust pipe 100 are condensed to form liquid, the liquid amount formed by condensation of the gas and the exhaust pipe 600 of the plant facility is reduced, and the corrosion to the exhaust pipe 600 of the plant facility is reduced; the exhaust pressure loss caused by steering is favorably reduced.
In order to further optimize the scheme, the angle a is 135 degrees, the angle b is 135 degrees, the exhaust pressure loss caused by steering is further reduced, the processing is convenient, the assembly difficulty among the first section 11, the second section 12 and the third section 13 is reduced, and the requirement on the assembly angle can be ensured.
The above embodiments are merely illustrative of the technical solutions of the application and not restrictive, and although the present application is described in detail with reference to the embodiments, those of ordinary skill in the art should understand that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present application.
Claims (10)
1. An exhaust control device applied to an etching apparatus or a developing apparatus, comprising:
an exhaust pipe;
the air pressure detection device comprises an air pressure sensor, and the air pressure sensor is arranged on the exhaust pipe and used for detecting the pressure of air in the exhaust pipe;
an electric flow regulating valve mounted on the exhaust pipe;
and the control system is electrically connected with the electric flow regulating valve and the air pressure sensor and is used for regulating the opening degree of the electric flow regulating valve according to the gas pressure.
2. The exhaust gas control apparatus according to claim 1, wherein an opening degree detecting means is provided on the electric flow rate adjusting valve,
the opening detection device is electrically connected with the control system and used for detecting the opening of the electric flow regulating valve.
3. The exhaust control apparatus of claim 2, further comprising an alarm device electrically connected to the control system,
and when the opening degree of the electric flow regulating valve exceeds a preset value, the control system controls the alarm device to give an alarm.
4. The exhaust gas control apparatus according to claim 1, wherein a drain hole is opened in a bottom portion of the exhaust pipe.
5. The exhaust gas control apparatus according to claim 4, further comprising a connecting pipe and a reservoir tank,
the connecting pipe is connected with the liquid discharge hole and the liquid storage tank.
6. The exhaust gas control apparatus according to claim 1, characterized in that the exhaust pipe includes a first section, a second section, and a third section that are arranged in an exhaust direction,
the first section and the second section form an obtuse angle, and the second section and the third section form an obtuse angle.
7. The exhaust gas control apparatus according to claim 6, characterized in that an angle between the first section and the second section is 135 °, an angle between the second section and the third section is 135 °, and an angle between the first section and the third section is 90 °.
8. The exhaust control device of claim 7, wherein the air pressure sensor is disposed within the first segment.
9. The exhaust gas control apparatus according to claim 7, characterized in that the electric flow rate adjustment valve is provided on the second segment.
10. The exhaust gas control device according to any one of claims 1 to 9, wherein the electric flow rate control valve is a butterfly valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010740047.7A CN112038262A (en) | 2020-07-28 | 2020-07-28 | Exhaust control device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010740047.7A CN112038262A (en) | 2020-07-28 | 2020-07-28 | Exhaust control device |
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| Publication Number | Publication Date |
|---|---|
| CN112038262A true CN112038262A (en) | 2020-12-04 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010740047.7A Pending CN112038262A (en) | 2020-07-28 | 2020-07-28 | Exhaust control device |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20000043979A (en) * | 1998-12-29 | 2000-07-15 | 김영환 | Pressure control system |
| CN201097105Y (en) * | 2007-06-27 | 2008-08-06 | 中芯国际集成电路制造(上海)有限公司 | An automatic control and monitoring device for exhaust flow |
| CN102564103A (en) * | 2012-01-18 | 2012-07-11 | 新乡市鼎鑫机械有限公司 | Novel exhaust system |
| CN103403426A (en) * | 2010-11-25 | 2013-11-20 | 株式会社富士金 | Automatic-valve opening degree detection device |
| CN204113494U (en) * | 2013-12-13 | 2015-01-21 | 舟山市奥博管业有限公司 | A kind of waste gas circulation pipe |
| CN105159334A (en) * | 2015-06-23 | 2015-12-16 | 长沙开元仪器股份有限公司 | Gas flow regulating device |
-
2020
- 2020-07-28 CN CN202010740047.7A patent/CN112038262A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20000043979A (en) * | 1998-12-29 | 2000-07-15 | 김영환 | Pressure control system |
| CN201097105Y (en) * | 2007-06-27 | 2008-08-06 | 中芯国际集成电路制造(上海)有限公司 | An automatic control and monitoring device for exhaust flow |
| CN103403426A (en) * | 2010-11-25 | 2013-11-20 | 株式会社富士金 | Automatic-valve opening degree detection device |
| CN102564103A (en) * | 2012-01-18 | 2012-07-11 | 新乡市鼎鑫机械有限公司 | Novel exhaust system |
| CN204113494U (en) * | 2013-12-13 | 2015-01-21 | 舟山市奥博管业有限公司 | A kind of waste gas circulation pipe |
| CN105159334A (en) * | 2015-06-23 | 2015-12-16 | 长沙开元仪器股份有限公司 | Gas flow regulating device |
Non-Patent Citations (1)
| Title |
|---|
| 陈文元，张卫平，陈迪: "《非硅MEMS技术及其应用》", 31 March 2015, 上海交通大学出版社 * |
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Application publication date: 20201204 |