CN112034684A - Photosensitive glue material for spacing point and preparation process of spacing point - Google Patents
Photosensitive glue material for spacing point and preparation process of spacing point Download PDFInfo
- Publication number
- CN112034684A CN112034684A CN202010778175.0A CN202010778175A CN112034684A CN 112034684 A CN112034684 A CN 112034684A CN 202010778175 A CN202010778175 A CN 202010778175A CN 112034684 A CN112034684 A CN 112034684A
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- CN
- China
- Prior art keywords
- photosensitive
- glycol methyl
- spacer
- raw materials
- photoinitiator
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
Abstract
The invention discloses a photosensitive resist material for spacing points and a preparation process of the spacing points, wherein the material comprises the following raw materials in parts by weight: 25-45% of propylene glycol monomethyl ether acetate, 15-30% of diethylene glycol methyl ether, 15-35% of acrylic resin and 5-10% of photoinitiator, and can also comprise 0.5-5% of methyl methacrylate, 0.5-3% of carbon black and 0.5-5% of cross-linking agent. The raw materials are prepared into the approximately transparent interval point photosensitive material. Suitable for use at spaced points on a pressure sensing layer. Specifically, the array spacing points are made on the glass or PET substrate by a yellow light process. The light passing through the interval points forms diffuse reflection in the film layer, and the problem of interval point lightening in the preparation of the conventional transparent photosensitive adhesive material is effectively solved. The spacing points prepared by the material can improve the use experience of the product, and particularly has great advantages in the field of consumer electronics products and wide market prospect.
Description
Technical Field
The invention relates to the field of touch display, in particular to a photosensitive emulsion material for spacing points and a preparation process of the spacing points.
Background
After the self-capacitance touch screen is applied to the fields of mobile phone panels and the like, the 3D touch function is realized on the basis of touch control in the later period. Mobile phone panels with 3D touch functions and the like are available in the market. To realize the 3D touch function, a layer of spacer dots needs to be formed on the surface of the touch screen contacting the display screen. At present, two solutions for the spacing point are yellow light solution and silk screen solution.
The silk screen printing scheme has simple production equipment, is easy to realize, is rich in ink selection, and has great challenge on the silk screen printing jig and the product yield. The silk screen printing jig is used for forming holes in a thin steel plate, and the hole forming precision requirement is high, so that the uniformity of the hole diameter is difficult to keep consistent. From the description of the silk-screen process, each small piece has tens of thousands of dots, so that poor printing missing dots, wire drawing and the like are easily generated in the silk-screen process, and because of the poor printing missing dots, large-piece silk-screen printing is more difficult to realize, the small pieces can be cut into pieces for silk-screen printing, and the production efficiency is low.
The yellow light scheme can avoid the defects of silk screen printing in the process, can easily realize the processing of a large number of spaced points, and can greatly improve the production efficiency and the quality. However, since the spaced dots are densely distributed in the visible region, a black or color photosensitive material cannot be used, or the arranged color dots can be clearly seen. Although the existing transparent OC photosensitive adhesive meets the requirement of good permeability, the prepared finished product can form bright spots at intervals after the screen is lightened, and the visual effect is seriously influenced. Especially, consumer electronics such as mobile phone tablet are difficult to accept by consumers. Therefore, the products produced by the yellow light process have limited application range and can only be used on products with lower requirements on visual effect.
Disclosure of Invention
The invention provides a photosensitive material for spacing points and a preparation process of the spacing points.
The invention has the technical scheme that the photosensitive resist material for the spacer dots comprises the following raw materials in parts by weight: 25-45% of propylene glycol methyl ether acetate, 15-30% of diethylene glycol methyl ethyl ether, 15-35% of acrylic resin and 5-10% of photoinitiator.
Further, the acrylic resin is methyl methacrylate resin.
Further, the photoinitiator is n-butyl acetate.
Furthermore, the raw materials of the photosensitive rubber material also comprise 0.5-5% of methyl methacrylate, 0.5-3% of carbon black and 0.5-5% of a cross-linking agent.
Further, the cross-linking agent is dicumyl peroxide.
Furthermore, the photosensitive emulsion material also comprises polymethyl methacrylate accounting for 3-10% of the total weight of other raw materials.
The preferable formula comprises the following raw materials in percentage by weight: 30% of propylene glycol methyl ether acetate, 25% of diethylene glycol methyl ethyl ether, 25% of acrylic resin, 10% of photoinitiator, 4% of methyl methacrylate, 2% of carbon black and 4% of crosslinking agent.
The invention also relates to a preparation method of the photosensitive adhesive material, which comprises the steps of firstly uniformly mixing propylene glycol methyl ether acetate, diethylene glycol methyl ethyl ether and acrylic resin, and then adding the photoinitiator and other raw materials to uniformly mix.
The invention also relates to a process for preparing spacing points by adopting the photosensitive emulsion material, which comprises the following specific steps:
uniformly coating a layer of the photosensitive material on the surface of a base material by adopting a gluing device, transferring a pattern designed on a mask to the photosensitive rubber material film by utilizing a designed spacer mask through a UV (ultraviolet) exposure process, and removing redundant photoresist outside the spacer by a developing process to obtain a spacer pattern.
Furthermore, the base material is made of glass or PET material.
The invention has the following beneficial effects:
1. the light sensitive glue material is prepared by taking propylene glycol methyl ether acetate, diethylene glycol methyl ethyl ether and acrylic resin as main raw materials and adding auxiliary materials such as a photoinitiator, methyl methacrylate carbon black and a cross-linking agent, so that the light intensity passing through the interval point can be weakened, the polymethyl methacrylate is added to be matched with the carbon black, and the light passing through the interval point forms diffuse reflection in the film layer, so that the problem of interval point lightening in the conventional transparent light sensitive glue material preparation is effectively solved.
2. The spacer dots prepared by the material of the invention greatly improve the use experience of the product, and particularly have great advantages in the field of consumer electronics products and wider market prospects.
Detailed Description
The present invention will be further illustrated with reference to the following examples, but the present invention should not be construed as being limited thereto.
The photosensitive emulsion material can be used for preparing spacing points of touch screen products with structures of G + G, G + GG, G + FF and the like. The spaced points are arranged in a matrix.
The acrylic resin below is a methyl methacrylate resin. The photoinitiator was n-butyl acetate. The cross-linking agent is dicumyl peroxide.
Example 1:
the photosensitive glue material for the spacer comprises 30g of propylene glycol methyl ether acetate, 25g of diethylene glycol methyl ethyl ether, 25g of acrylic resin, 10g of photoinitiator, 4g of methyl methacrylate, 2g of carbon black and 4g of crosslinking agent.
Example 2:
a photoresist material for spacer dots, which was prepared by adding 5g of polymethyl methacrylate to the photoresist material of example 1.
Example 3:
the photosensitive glue material for the spacer comprises 25g of propylene glycol methyl ether acetate, 30g of diethylene glycol methyl ethyl ether, 35g of acrylic resin, 5g of photoinitiator, 2g of methyl methacrylate, 1g of carbon black and 2g of crosslinking agent.
Example 4:
the photosensitive glue material for the spacer comprises 45g of propylene glycol methyl ether acetate, 15g of diethylene glycol methyl ethyl ether, 15g of acrylic resin, 10g of photoinitiator, 2g of methyl methacrylate, 1g of carbon black and 2g of crosslinking agent.
Example 5:
a photosensitive glue material for spacing points comprises 40g of propylene glycol methyl ether acetate, 30g of diethylene glycol methyl ethyl ether, 20g of acrylic resin and 10g of photoinitiator.
When the photosensitive adhesive material is prepared, firstly, uniformly mixing propylene glycol methyl ether acetate, diethylene glycol methyl ethyl ether and acrylic resin, then adding a photoinitiator and other raw materials, and uniformly mixing.
When the specific interval points are prepared, a layer of photosensitive material is uniformly coated on the surface of the base material by adopting a gluing device, the designed pattern on the mask is transferred onto the base material by utilizing the designed interval point mask through a UV exposure process, and the redundant photoresist outside the interval points is removed through a developing process to obtain the interval point pattern.
By utilizing the spaced points made of the material provided by the embodiment, after the touch display screen is manufactured and installed on an electronic product, the problem that the spaced points shine can be well solved, and the spaced bright points cannot be seen by naked eyes. If OC glue is used as raw material and is directly made into spacer dots, the problem of obvious lightening is caused.
Claims (10)
1. The photoresist material for the spacer dots is characterized by comprising the following raw materials in parts by weight: 25-45% of propylene glycol methyl ether acetate, 15-30% of diethylene glycol methyl ethyl ether, 15-35% of acrylic resin and 5-10% of photoinitiator.
2. A photoresist material for spacer dots according to claim 1, wherein: the acrylic resin is methyl methacrylate resin.
3. A photoresist material for spacer dots according to claim 1, wherein: the photoinitiator is n-butyl acetate.
4. A photoresist material for spacer dots according to claim 1, wherein: the raw material of the photosensitive resist material also comprises 0.5-5% of methyl methacrylate, 0.5-3% of carbon black and 0.5-5% of cross-linking agent.
5. The photoresist material for spacer dots according to claim 4, wherein: the cross-linking agent is dicumyl peroxide.
6. A photoresist material for spacer dots according to claim 1, wherein: the photosensitive emulsion material also comprises polymethyl methacrylate accounting for 3-10% of the total weight of other raw materials.
7. A photoresist material for spacer dots according to any one of claims 1 to 5, wherein: comprises the following raw materials in percentage by weight: 30% of propylene glycol methyl ether acetate, 25% of diethylene glycol methyl ethyl ether, 25% of acrylic resin, 10% of photoinitiator, 4% of methyl methacrylate, 2% of carbon black and 4% of crosslinking agent.
8. A process for preparing a photosensitive adhesive material according to any one of claims 1 to 7, characterized in that: firstly, uniformly mixing propylene glycol methyl ether acetate, diethylene glycol methyl ethyl ether and acrylic resin, and then adding a photoinitiator and other raw materials to uniformly mix.
9. A process for spaced point preparation using a photoresist material according to any one of claims 1 to 7, comprising the steps of:
uniformly coating a layer of the photosensitive material on the surface of a base material by adopting a gluing device, transferring a pattern designed on a mask to the photosensitive rubber material film by utilizing a designed spacer mask through a UV (ultraviolet) exposure process, and removing redundant photoresist outside the spacer by a developing process to obtain a spacer pattern.
10. The process according to claim 9, characterized in that: the base material is made of glass or PET.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010778175.0A CN112034684A (en) | 2020-08-05 | 2020-08-05 | Photosensitive glue material for spacing point and preparation process of spacing point |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010778175.0A CN112034684A (en) | 2020-08-05 | 2020-08-05 | Photosensitive glue material for spacing point and preparation process of spacing point |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112034684A true CN112034684A (en) | 2020-12-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010778175.0A Pending CN112034684A (en) | 2020-08-05 | 2020-08-05 | Photosensitive glue material for spacing point and preparation process of spacing point |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0764282A (en) * | 1993-08-30 | 1995-03-10 | Nippon Steel Corp | Photosensitive resin composition and its hardened product and image forming material |
| KR19990015097A (en) * | 1997-08-01 | 1999-03-05 | 한형수 | Photosensitive resin composition containing a photoinitiator component in a side chain |
| JP2000243173A (en) * | 1998-12-21 | 2000-09-08 | Taiyo Ink Mfg Ltd | Dot spacer for touch panel and forming method thereof |
| JP2005189575A (en) * | 2003-12-26 | 2005-07-14 | Sumitomo Chemical Co Ltd | Radiation sensitive resin composition |
| CN1711520A (en) * | 2002-11-12 | 2005-12-21 | 3M创新有限公司 | Touch sensor and method of making |
| CN101566902A (en) * | 2008-04-23 | 2009-10-28 | 比亚迪股份有限公司 | Preparation method of isolating points of resistor type touch screen |
| JP2010080826A (en) * | 2008-09-29 | 2010-04-08 | Dainippon Printing Co Ltd | Electromagnetic shield member |
| JP2011039779A (en) * | 2009-08-11 | 2011-02-24 | Hitachi Chem Co Ltd | Optical member for touch panel, and display device |
-
2020
- 2020-08-05 CN CN202010778175.0A patent/CN112034684A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0764282A (en) * | 1993-08-30 | 1995-03-10 | Nippon Steel Corp | Photosensitive resin composition and its hardened product and image forming material |
| KR19990015097A (en) * | 1997-08-01 | 1999-03-05 | 한형수 | Photosensitive resin composition containing a photoinitiator component in a side chain |
| JP2000243173A (en) * | 1998-12-21 | 2000-09-08 | Taiyo Ink Mfg Ltd | Dot spacer for touch panel and forming method thereof |
| CN1711520A (en) * | 2002-11-12 | 2005-12-21 | 3M创新有限公司 | Touch sensor and method of making |
| JP2005189575A (en) * | 2003-12-26 | 2005-07-14 | Sumitomo Chemical Co Ltd | Radiation sensitive resin composition |
| CN101566902A (en) * | 2008-04-23 | 2009-10-28 | 比亚迪股份有限公司 | Preparation method of isolating points of resistor type touch screen |
| JP2010080826A (en) * | 2008-09-29 | 2010-04-08 | Dainippon Printing Co Ltd | Electromagnetic shield member |
| JP2011039779A (en) * | 2009-08-11 | 2011-02-24 | Hitachi Chem Co Ltd | Optical member for touch panel, and display device |
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