CN112014993A

CN112014993A - Display panel and preparation method thereof

Info

Publication number: CN112014993A
Application number: CN202010958419.3A
Authority: CN
Inventors: 杨超群; 黄长治
Original assignee: Wuhan China Star Optoelectronics Technology Co Ltd
Current assignee: Wuhan China Star Optoelectronics Technology Co Ltd
Priority date: 2020-09-14
Filing date: 2020-09-14
Publication date: 2020-12-01

Abstract

The application discloses a display panel and a preparation method thereof, wherein the preparation method comprises the following steps: providing a first substrate, and forming an array functional layer on the first substrate; providing a second substrate, and forming a quantum dot color film layer on the second substrate; providing a third substrate, and forming a polarizing layer on the third substrate; peeling the polarizing layer from the third substrate and adhering the polarizing layer to the quantum dot color film layer; and assembling the first substrate and the second substrate, and forming a liquid crystal layer between the first substrate and the second substrate. Compared with the method that the polarizing layer is directly formed on the quantum dot color film, the substrate has a flatter surface than the plane of the quantum dot color film, and therefore a more uniform polarizing layer structure can be obtained.

Description

Display panel and preparation method thereof

Technical Field

The application relates to the technical field of display, in particular to a display panel and a preparation method thereof.

Background

The quantum dots have wide excitation wavelength, narrow half-width peak, high luminous efficiency and adjustable color, and are widely applied to the display field in recent years. The Liquid Crystal Display is applied to a color film in an LCD (Liquid Crystal Display), so that the LCD manufacturing process can be continued to a greater extent, the color expression can be improved, and the Liquid Crystal Display has excellent expression in color purity and color gamut, thereby gradually drawing wide attention in the panel industry in recent years.

However, since the quantum dots are self-luminous materials, the light emitted therefrom cannot be turned on or off even if a polarizer is attached to the outside of the display panel case. The built-in polaroid is manufactured in the quantum dot display panel box by adopting a nano-imprinting technology, so that the on-off of a light path can be realized. However, in actual operation, the quantum dot color film is difficult to be absolutely flat, when a nano-scale grating structure is imprinted on the quantum dot color film, the imprinted morphology is affected by the flatness of the substrate, the residual glue amount of the nano imprinting becomes difficult to control, and the etching results at different positions are different during etching, so that the uniformity of the prepared built-in polarizer is poor, and the display effect is affected.

Disclosure of Invention

In order to solve the above problems, in a first aspect, the present invention provides a method for manufacturing a display panel, including the steps of:

s10, providing a first substrate, and forming an array functional layer on the first substrate;

s20, providing a second substrate, and forming a quantum dot color film layer on the second substrate;

s30, providing a third substrate, and forming a polarizing layer on the third substrate;

s40, peeling the polarizing layer from the third substrate and adhering the polarizing layer to the quantum dot color film layer; and

and S50, assembling the first substrate and the second substrate, and forming a liquid crystal layer between the first substrate and the second substrate.

Further, the S30 includes the following steps:

s301, providing a third substrate, and forming a sacrificial layer on the third substrate;

s302, forming a polarizing layer on the sacrificial layer; and

and S303, forming an adhesive layer on the polarizing layer.

Further, the S40 includes: and stripping the polarizing layer from the sacrificial layer, and adhering the polarizing layer to the quantum dot color film layer through the adhesive layer.

Further, the S302 includes:

sequentially forming a first inorganic layer, a metal layer and a second inorganic layer on the sacrificial layer;

forming a photoresist layer on the second inorganic layer;

imprinting the light resistance layer by using a nano imprinting template to form a light resistance pattern layer;

etching the first inorganic layer, the metal layer and the second inorganic layer together under the shielding of the photoresist pattern layer to form the polarization layer; and

and stripping off the photoresist pattern layer.

Further, the photoresist pattern layer comprises a plurality of strip-shaped photoresist arranged at equal intervals, so that the formed polarizing layer comprises a plurality of wire grid structures arranged at equal intervals.

Further, the material of the bonding layer is a transparent polymer material with a bonding function.

Further, the polarized light layer and the sacrificial layer are stripped through a laser stripping process.

Furthermore, an encapsulation layer which is coated on the quantum dot color film layer is formed on the quantum dot color film layer, so that the polarization layer is adhered to the encapsulation layer.

Furthermore, a blue backlight is formed on the side of the first substrate away from the liquid crystal layer, and the quantum dot color film layer includes a black matrix formed in a non-pixel region, a red quantum dot color resistor formed in a red sub-pixel region, and a green quantum dot color resistor formed in a green sub-pixel region.

On the other hand, the invention also provides a display panel prepared by the preparation method of the display panel.

Has the advantages that: the invention provides a display panel and a preparation method thereof, wherein in the preparation method, a substrate is provided, a polarizing layer is formed on the substrate with a flat surface, and then the prepared polarizing layer is peeled off from a third substrate and transferred to a quantum dot color film.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.

Fig. 1 is a schematic text flow chart of a method for manufacturing a display panel according to an embodiment of the present invention;

fig. 2A-2N are schematic cross-sectional structural flow diagrams of a method for manufacturing a display panel according to an embodiment of the invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.

In this application, the word "exemplary" is used to mean "serving as an example, instance, or illustration. Any embodiment described herein as "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments. The following description is presented to enable any person skilled in the art to make and use the invention. In the following description, details are set forth for the purpose of explanation. It will be apparent to one of ordinary skill in the art that the present invention may be practiced without these specific details. In other instances, well-known structures and processes are not shown in detail to avoid obscuring the description of the invention with unnecessary detail. Thus, the present invention is not intended to be limited to the embodiments shown, but is to be accorded the widest scope consistent with the principles and features disclosed herein.

The embodiment of the invention provides a method for manufacturing a display panel, which is described in detail below with reference to a text flow diagram shown in fig. 1 and cross-sectional structure flow diagrams shown in fig. 2A to 2N, respectively.

Specifically, the preparation method comprises the following steps:

s10, providing a first substrate 100, and forming an array functional layer 110 on the first substrate, i.e. forming the structure shown in fig. 2A;

s20, providing a second substrate 200, and forming a quantum dot color film layer 210 on the second substrate 200, i.e. forming the structure shown in fig. 2B;

s30, providing a third substrate 300, and forming a polarizing layer 320 on the third substrate 300, namely forming a structure as shown in FIG. 2J, wherein the specific structure and preparation process of the polarizing layer 320 are described in detail later;

s40, peeling the polarizing layer 320 from the third substrate 300, and adhering the polarizing layer to the quantum dot color film layer 210 to form the structure shown in fig. 2L; and

s50, assembling the first substrate 100 and the second substrate 200, and forming the liquid crystal layer 400 between the first substrate 100 and the second substrate 200, i.e. forming the structure shown in fig. 2M.

Because the degree of flatness on the various rete surface of quantum dot is relatively poor, even add the planarization layer on the various rete of quantum dot, also be difficult to compensate the not enough of the various rete degree of flatness of quantum dot, in order to solve this problem, in this embodiment, directly carry out the preparation of polarisation layer on another base plate, peel off the polarisation layer that obtains with preparing from the base plate again, shift to the various rete of quantum dot, can be by the more even surface of base plate, prepare out the polarisation layer that the structure is more homogeneous to reach best display effect.

In some embodiments, the S30 includes the following steps:

s301, providing a third substrate 300, and forming a sacrificial layer 310 on the third substrate 300 to form a structure as shown in FIG. 2D, wherein the sacrificial layer 310 is a structural layer easy to peel off, so as to prevent the prepared polarizing layer from being directly peeled off from the substrate to cause damage to the film layer;

s302, forming a polarization layer 320 on the sacrificial layer 310, namely forming a structure shown in FIG. 2J; and

s303, forming an adhesive layer 350 on the polarizing layer 320, that is, forming the structure shown in fig. 2K, where the adhesive layer 350 is a whole adhesive layer, and all the structures on the polarizing layer 320 can be adhered together and transferred onto the quantum dot color film layer 210, thereby simplifying the preparation process.

In some embodiments, the S40 includes: the polarizing layer 320 is peeled off from the sacrificial layer 310, and the polarizing layer 320 is adhered to the quantum dot color film layer 210 through the adhesive layer 350, so as to form the structure shown in fig. 2L.

In some embodiments, the step S302, namely the polarizing layer, includes:

forming a first inorganic layer 321a, a metal layer 322a and a second inorganic layer 323a on the sacrificial layer 310 in sequence, that is, forming the structure shown in fig. 2E, generally, the first inorganic layer 321a and the second inorganic layer 323a are made of one or more materials independently selected from silicon oxide, silicon nitride and aluminum oxide for protecting the metal layer 322a sandwiched therein, and the metal layer 322a is made of at least one material selected from aluminum, copper, gold, silver, chromium and nickel;

coating the second inorganic layer 323a to form a photoresist layer 330a, thereby forming the structure shown in fig. 2F;

imprinting the photoresist layer 330a by using a nano-imprinting template 340, so that the photoresist layer 330a is imprinted by a nano-imprinting template 340 with a predetermined shape to form a photoresist pattern layer 330b, i.e. forming the structure shown in fig. 2G;

after removing the nanoimprint template 340, as shown in fig. 2H, the first inorganic layer 321a, the metal layer 322a, and the second inorganic layer 323a are etched together under the shielding of the photoresist pattern layer 330b to form the polarizing layer 320, i.e., the structure shown in fig. 2I is formed; and

the photoresist pattern layer 330b is stripped off, so as to form the structure shown in fig. 2J.

Specifically, by the shape of the nanoimprint template 340, the formed photoresist pattern layer 330b includes a plurality of strip-shaped photoresists arranged at equal intervals, and the formed polarizing layer 320 includes a plurality of wire grid structures arranged at equal intervals, so as to implement a grating structure with a polarizer function.

Generally, the width of any one wire grid structure is only 40-60nm, and the mutual distance is only 40-60nm, but the existing exposure technology commonly used for patterning is difficult to achieve such high precision, and the patterning can only be performed by applying the nano-imprinting technology, and meanwhile, due to the high precision, the flatness of the substrate is extremely high during the nano-imprinting process, if the flatness of the substrate is insufficient, the uniformity of the residual glue amount of the imprinted photoresistive is affected, so that the etching effect is affected, and the uniformity of the wire grid structure of the nano-imprinting is damaged.

In some embodiments, the material of the bonding layer 350 is a transparent polymer material with a bonding function to avoid brightness loss due to absorption of light.

In some embodiments, the polarization layer 320 and the sacrificial layer 310 are stripped by a laser stripping process, but other stripping processes may be used, and the material of the sacrificial layer 310 is selected accordingly according to the stripping process in practical application.

In some embodiments, an encapsulation layer 220 is further formed on the quantum dot color film layer 210 to encapsulate the quantum dot color film layer 210, that is, to form a structure as shown in fig. 2C, so that the polarizing layer 320 is attached to the encapsulation layer 220, that is, as shown in fig. 2I.

In some embodiments, a blue backlight 500 is further formed on a side of the first substrate 100 away from the liquid crystal layer 400, that is, a structure as shown in fig. 2N is formed, the blue backlight 500 is usually a blue LED backlight, and correspondingly, the quantum dot color film layer 210 includes a black matrix 211 formed in the non-pixel region, a red quantum dot color resist 212 formed in the red sub-pixel region, and a green quantum dot color resist 213 formed in the green sub-pixel region, and the blue color resist 214 in the blue sub-pixel region may be a blue quantum dot color resist, a blue resist, a transparent color resist for optimizing the viewing angle, or an empty resist according to actual requirements.

Of course, other types of backlights can be adopted and the corresponding quantum dot color film layer structure can be matched to realize full-color display.

It should be noted that, in the embodiment of the method for manufacturing the display panel, only the above structure is described, and it is understood that any other necessary structure may be formed as needed besides the above structure, and the details are not limited herein.

Another embodiment of the present invention further provides a display panel, which is prepared by the method for preparing a display panel provided in the foregoing embodiments, and the structure of the display panel is please refer to the foregoing embodiments, which is not described in detail again.

In the above embodiments, the descriptions of the respective embodiments have respective emphasis, and parts that are not described in detail in a certain embodiment may refer to the above detailed descriptions of other embodiments, and are not described herein again.

The display panel and the method for manufacturing the same provided by the embodiment of the present invention are described in detail above, and the principle and the embodiment of the present invention are explained in detail herein by applying specific examples, and the description of the above embodiments is only used to help understanding the method and the core idea of the present invention; meanwhile, for those skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.

Claims

1. A preparation method of a display panel is characterized by comprising the following steps:

2. The method for manufacturing a display panel according to claim 1, wherein the S30 includes the steps of:

s302, forming a polarizing layer on the sacrificial layer; and

and S303, forming an adhesive layer on the polarizing layer.

3. The method for manufacturing a display panel according to claim 2, wherein the S40 includes: and stripping the polarizing layer from the sacrificial layer, and adhering the polarizing layer to the quantum dot color film layer through the adhesive layer.

4. The method for manufacturing a display panel according to claim 2, wherein the S302 includes:

forming a photoresist layer on the second inorganic layer;

and stripping off the photoresist pattern layer.

5. The method of manufacturing a display panel according to claim 4, wherein the photoresist pattern layer comprises a plurality of strip-shaped photoresists arranged at equal intervals, so that the formed polarizing layer comprises a plurality of wire grid structures arranged at equal intervals.

6. The method for manufacturing a display panel according to claim 2, wherein a material of the adhesive layer is a transparent polymer material having an adhesive function.

7. The method for manufacturing a display panel according to claim 3, wherein the polarizing layer and the sacrificial layer are peeled off by a laser peeling process.

8. The method of manufacturing a display panel according to claim 1, wherein an encapsulation layer is further formed on the quantum dot color film layer to encapsulate the quantum dot color film layer, so that the polarizing layer is attached to the encapsulation layer.

9. The method for manufacturing a display panel according to claim 1, wherein a blue backlight is further formed on a side of the first substrate facing away from the liquid crystal layer, and the quantum dot color film layer includes a black matrix formed in a non-pixel region, a red quantum dot color resist formed in a red sub-pixel region, and a green quantum dot color resist formed in a green sub-pixel region.

10. A display panel produced by the production method for a display panel according to any one of claims 1 to 9.