CN112013958A - Spectrum measuring method, system, storage medium and high-frequency induction plasma - Google Patents
Spectrum measuring method, system, storage medium and high-frequency induction plasma Download PDFInfo
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- 238000001228 spectrum Methods 0.000 title claims abstract description 42
- 230000006698 induction Effects 0.000 title claims abstract description 28
- 238000000034 method Methods 0.000 title claims abstract description 22
- 230000003595 spectral effect Effects 0.000 claims abstract description 64
- 238000012545 processing Methods 0.000 claims abstract description 27
- 238000010606 normalization Methods 0.000 claims abstract description 22
- 238000000691 measurement method Methods 0.000 claims abstract description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 11
- 230000010354 integration Effects 0.000 claims abstract description 9
- 238000000295 emission spectrum Methods 0.000 claims description 23
- 238000003745 diagnosis Methods 0.000 claims description 11
- 239000013307 optical fiber Substances 0.000 claims description 11
- 230000005855 radiation Effects 0.000 claims description 11
- 238000004364 calculation method Methods 0.000 claims description 8
- 238000004020 luminiscence type Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 4
- 230000035945 sensitivity Effects 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 238000004590 computer program Methods 0.000 claims description 2
- 238000013507 mapping Methods 0.000 claims 2
- 238000005259 measurement Methods 0.000 abstract description 13
- 238000012360 testing method Methods 0.000 abstract description 12
- 230000008569 process Effects 0.000 abstract description 6
- 238000012423 maintenance Methods 0.000 abstract description 3
- 210000002381 plasma Anatomy 0.000 description 65
- 238000011160 research Methods 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000000306 component Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000003491 array Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004993 emission spectroscopy Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000001675 atomic spectrum Methods 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- DOTMOQHOJINYBL-UHFFFAOYSA-N molecular nitrogen;molecular oxygen Chemical compound N#N.O=O DOTMOQHOJINYBL-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/443—Emission spectrometry
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B64—AIRCRAFT; AVIATION; COSMONAUTICS
- B64F—GROUND OR AIRCRAFT-CARRIER-DECK INSTALLATIONS SPECIALLY ADAPTED FOR USE IN CONNECTION WITH AIRCRAFT; DESIGNING, MANUFACTURING, ASSEMBLING, CLEANING, MAINTAINING OR REPAIRING AIRCRAFT, NOT OTHERWISE PROVIDED FOR; HANDLING, TRANSPORTING, TESTING OR INSPECTING AIRCRAFT COMPONENTS, NOT OTHERWISE PROVIDED FOR
- B64F5/00—Designing, manufacturing, assembling, cleaning, maintaining or repairing aircraft, not otherwise provided for; Handling, transporting, testing or inspecting aircraft components, not otherwise provided for
- B64F5/60—Testing or inspecting aircraft components or systems
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M9/00—Aerodynamic testing; Arrangements in or on wind tunnels
- G01M9/06—Measuring arrangements specially adapted for aerodynamic testing
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M9/00—Aerodynamic testing; Arrangements in or on wind tunnels
- G01M9/08—Aerodynamic models
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Abstract
The invention belongs to the technical field of ground aerodynamic thermal tests of aircrafts, and discloses a spectral measurement method, a system, a storage medium and high-frequency induction plasma, wherein the emission intensity without an atomic emission waveband is selected from received spectral data as a reference value, and the received spectral data is subjected to normalization processing; selecting the intensities of atomic oxygen at 777nm and 845nm in the spectrum data after normalization processing as an integral to obtain an integral intensity value; the intensities of atomic nitrogen at 747nm and 818nm or 821nm or 822nm or 868nm are selected for integration treatment in the wave band to be measured. The method has very high time resolution, can realize the resolution of the enthalpy value and the electron density of a plasma flow field of tens of ms magnitude, monitors the enthalpy value and the electron density of the multi-track plasma in real time and on line in the test debugging and model thermal assessment test processes, and reflects the operation stability of the high-frequency plasma generator; the volume is small, the weight is light, the price is low, and the realization difficulty and the maintenance cost of the spectrum measurement system are low.
Description
Technical Field
The invention belongs to the technical field of ground aerodynamic thermal tests of aircrafts, and particularly relates to a spectral measurement method, a spectral measurement system, a storage medium and high-frequency induction plasma.
Background
At present, the high frequency induction thermal plasma is also called as radio frequency induction plasma because of its high frequency. The high-frequency plasma has the following characteristics: (1) the high-frequency plasma is mainly generated by strong electromagnetic phase combination, and an electrode is not needed, so that the problem of evaporation pollution of the electrode does not exist, and the generated plasma atmosphere is pure; (2) the action of joule heat effect can make the plasma flow reach the extremely high temperature of 3000-l 0000K; (3) the high-frequency plasma has larger volume, low flame flow speed and uniform and flat temperature distribution. Therefore, the high-frequency plasma is particularly suitable for processing refractory particles (such as spheroidization, solid-gas reaction, ultrafine powder preparation and the like) and ground heating experimental research on a thermal protection material of a deep space probe with higher requirement on thermal environment atmosphere. The high-frequency induction plasma is mainly generated by a high-frequency induction plasma generator, and the working principle of the high-frequency induction plasma generator is as follows: the high-frequency current provided by the high-frequency power supply is combined with plasma in the discharge tube through a magnetic field which is generated by a coil of the reactor and changed, so that gas is ionized, and an induced alternating electric field generated by the alternating magnetic field in the coil induces current in the conductive gas and generates joule heat. Therefore, the induction coil is a core component of the plasma generator, and the number of turns of the induction wire circle, the matching of the size of the induction wire circle and the quartz lamp tube, the cooling effect of the induction wire circle, the matching of the size of the coil and power supply parameters and the like play a vital role in the ionization effect and the safe operation of the high-frequency plasma generator.
The emission spectrum is used as a non-contact measuring method to diagnose the flow field by utilizing the radiation transition of atomic (or molecular) energy level, and the plasma parameter characteristics are ensured to be obtained under the condition of not damaging the flow field characteristics. In recent years, with the appearance of high-resolution and high-performance spectrum test instruments, an emission spectrum diagnosis method has become an important direction in the field of high-temperature flow field parameter diagnosis. In view of the above advantages of emission spectroscopy, researchers at home and abroad have developed the on-line diagnosis work of applying emission spectroscopy to high-temperature plasma of an arc heater. The Japanese JAXA astronavigation research center utilizes an emission spectrum diagnosis method to research the state of the high-flame plasma in the high-frequency induction wind tunnel and analyze the stability of the high-flame plasma. The research topic group of the high-flame plasma of the university of Stuttgart in Germany utilizes the emission spectrum technology to carry out quantitative research on a flow field on an arc heater and a high-frequency induction wind tunnel, and obtains quantitative information of the temperature and the density of the plasma. However, in the existing research, quantitative experimental research on the enthalpy value and the electron density of the high-frequency induction heating plasma is carried out by using an emission spectrum, and the problems of large error and the like exist.
Through the above analysis, the problems and defects of the prior art are as follows: in the current research, quantitative experimental research on the enthalpy value and the electron density of the high-frequency induction heating plasma is carried out directly by using an emission spectrum, and the research is less and has larger error.
The difficulty in solving the above problems and defects is: the existing spectrum diagnosis model has the problems of large error and the like in diagnosis of the enthalpy value and the electron density of the high-temperature plasma flow field, and needs to be calibrated in advance by other means.
The significance of solving the problems and the defects is as follows: the method has very high time resolution, can realize the resolution of the enthalpy value and the electron density of the plasma flow field in tens of ms magnitude, monitors the enthalpy value and the electron density of the multi-track plasma in real time and on line in the test debugging and model thermal assessment test processes, and reflects the operation stability of the high-frequency plasma generator; the volume is small, the weight is light, the price is low, and the realization difficulty and the maintenance cost of the spectrum measurement system are low.
Disclosure of Invention
Aiming at the problems in the prior art, the invention provides a spectral measurement method, a system, a storage medium and high-frequency induction plasma.
The present invention is achieved as such, a spectral measurement method including:
selecting emission intensity without an atomic emission waveband from received spectral data as a reference value, and performing normalization processing on the received spectral data;
selecting the intensities of atomic oxygen at 777nm and 845nm in the spectrum data after normalization processing as an integral to obtain an integral intensity value;
the intensities of atomic nitrogen at 747nm and 818nm or 821nm or 822nm or 868nm are selected for integration treatment in the wave band to be measured.
Further, the corresponding relation of the emission spectrum intensity of the spectrum measurement method, the plasma enthalpy value and the electron density comprises the following steps:
comparing the integral intensities of two target component spectral lines with different temperature sensitivities to obtain a relational expression of an emission spectrum intensity ratio and temperature and pressure;
secondly, obtaining the discrete numerical relation between the flame value, the temperature and the pressure within the range of 5-25MJ/kg of the enthalpy value of the high-temperature plasma by utilizing NASA chemical equilibrium calculation; obtaining the numerical relation of the electron density, the temperature and the pressure in the high-temperature plasma flow field by utilizing high-precision far-infrared laser interference diagnosis;
and thirdly, combining the results of the first step and the second step to obtain the relation between the emission spectrum intensity ratio and the enthalpy value and the electron density.
It is another object of the present invention to provide a computer-readable storage medium storing a computer program which, when executed by a processor, causes the processor to perform the steps of:
selecting emission intensity without an atomic emission waveband from received spectral data as a reference value, and performing normalization processing on the received spectral data;
selecting the intensities of atomic oxygen at 777nm and 845nm in the spectrum data after normalization processing as an integral to obtain an integral intensity value;
the intensities of atomic nitrogen at 747nm and 818nm or 821nm or 822nm or 868nm are selected for integration treatment in the wave band to be measured.
Another object of the present invention is to provide a spectral measurement system implementing the spectral measurement method, the spectral measurement system including:
the spectrum data normalization processing module is used for selecting the emission intensity without an atomic emission waveband from the received spectrum data as a reference value and performing normalization processing on the received spectrum data;
the integral intensity value calculation module is used for selecting the intensities of the atomic oxygen at 777nm and 845nm in the spectrum data after the normalization processing to be integrated to obtain an integral intensity value;
and the intensity integration processing module is used for integrating intensities of atomic nitrogen at 747nm and 818nm or 821nm or 822nm or 868nm in the wave band to be detected.
The invention also aims to provide a spectral measurement device provided with the spectral measurement system, and the spectral measurement device comprises a high-frequency induction plasma, a spray pipe, a spectrometer, an optical fiber, a spectrum acquisition unit and an upper computer;
the high-temperature plasma radiation penetrates through the optical window and enters the optical fiber, the spectrum acquisition unit acquires the radiation luminescence in the optical fiber and converts the radiation luminescence into spectral data with wavelength resolution in the range of 200-800nm and outputs the spectral data to the upper computer, the upper computer analyzes the received spectral data to obtain the emission spectral intensity of the atomic oxygen spectral line, and the emission spectral intensity is compared with the corresponding relation between the emission spectral intensity calibrated in advance and the enthalpy value of the plasma to obtain the flame value of the high-temperature plasma.
Another object of the present invention is to provide a high-frequency induction thermal plasma to which the spectral measuring apparatus is mounted.
By combining all the technical schemes, the invention has the advantages and positive effects that: the method does not obtain the total plasma flame by using the 777nm emission spectrum characteristic, avoids errors caused by various parameters such as plasma volume, heater arc chamber pressure and the like in the debugging process of a high-frequency plasma wind tunnel test, simplifies the test process, and can intuitively and quickly obtain the enthalpy value and electron density of the high-temperature plasma. The method is used for ground simulation tests of laminated, segmented and tubular plasmas, and the like, and the emission spectrum of a high-temperature flow field in the plasmas is monitored in real time by using an emission spectrum measurement system, and the enthalpy value and the electron density of the high-temperature plasmas of the high-frequency plasma induction heater are obtained by analyzing the relative change of the intensity of the characteristic spectrum.
The invention adopts the emission spectrum diagnosis method to measure the enthalpy value and the electron density of the plasma, the target object is to aim at high-temperature plasmas under different temperatures and obtained radiation spectra, and the target object is not limited to a certain type of plasma generator, so the invention has very wide application range. The method for obtaining the correct value through the emission spectrum line ratio can avoid subsequent complex calculation, can simply and directly obtain the enthalpy value and the electron density of the high-temperature plasma through calibration curve interpolation, and can obtain the state change of the plasma in the whole experimental process in a very high-efficiency and real-time manner.
The method has very high time resolution, can realize flow field enthalpy value resolution of tens of ms magnitude, can realize real-time and online monitoring of the multi-track plasma enthalpy value in the test debugging and model thermal assessment test processes, and reflects the operation stability of the arc heater. The spectrometer adopted by the invention is a miniature optical fiber spectrometer, has small volume, light weight and low price, the realization difficulty and the maintenance cost of the spectral measurement system are lower, and the automatic monitoring operation can be realized.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed to be used in the embodiments of the present application will be briefly described below, and it is obvious that the drawings described below are only some embodiments of the present application, and it is obvious for those skilled in the art that other drawings can be obtained from the drawings without creative efforts.
Fig. 1 is a flow chart of a spectral measurement method according to an embodiment of the present invention.
FIG. 2 is a schematic diagram of a spectral measurement system according to an embodiment of the present invention;
in fig. 2: 1. a spectrum data normalization processing module; 2. an integral intensity value calculation module; 3. and an intensity integral processing module.
FIG. 3 is a schematic structural diagram of a spectrum measuring apparatus according to an embodiment of the present invention;
in fig. 3: 4. high-frequency induction plasma; 5. a nozzle; 6. a spectrometer; 7. an optical fiber; 8. a spectrum acquisition unit; 9. and (4) an upper computer.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail with reference to the following embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
In view of the problems in the prior art, the present invention provides a method, a system, a storage medium, and a high frequency induction plasma for spectrum measurement, and the present invention is described in detail below with reference to the accompanying drawings.
As shown in fig. 1, the spectral measurement method provided by the present invention includes the following steps:
s101: selecting emission intensity without an atomic emission waveband from received spectral data as a reference value, and performing normalization processing on the received spectral data;
s102: selecting the intensities of atomic oxygen at 777nm and 845nm in the spectrum data after normalization processing as an integral to obtain an integral intensity value;
s103: the intensities of atomic nitrogen at 747nm and 818nm or 821nm or 822nm or 868nm are selected for integration treatment in the wave band to be measured.
The corresponding relation between the emission spectrum intensity and the plasma enthalpy value is realized by the following modes:
comparing the integral intensities of two target component spectral lines with different temperature sensitivities to obtain a relational expression of an emission spectrum intensity ratio and temperature and pressure;
secondly, obtaining the discrete numerical relation between the flame value, the temperature and the pressure within the range of 5-25MJ/kg of the flame value of the high-temperature plasma by utilizing NASA chemical equilibrium calculation; obtaining the numerical relation of the electron density, the temperature and the pressure in the high-temperature plasma flow field by utilizing high-precision far-infrared laser interference diagnosis;
and thirdly, combining the results of the first step and the second step to obtain the relation between the emission spectrum intensity ratio and the enthalpy value and the electron density.
The spectral measurement method provided by the present invention can be implemented by other steps by those skilled in the art, and the spectral measurement method provided by the present invention of fig. 1 is only one specific example.
As shown in fig. 2, the present invention provides a spectral measurement system including:
the spectrum data normalization processing module 1 is used for selecting an emission intensity without an atomic emission waveband from the received spectrum data as a reference value, and performing normalization processing on the received spectrum data.
And the integral intensity value calculation module 2 is used for selecting the intensities of the atomic oxygen at 777nm and 845nm in the spectrum data after the normalization processing to be integrated to obtain an integral intensity value.
And the intensity integration processing module 3 is used for integrating intensities of atomic nitrogen at 747nm and 818nm or 821nm or 822nm or 868nm selected by the waveband to be measured.
The technical solution of the present invention is further described below with reference to the accompanying drawings.
As shown in fig. 3, the high-frequency induction plasma spectrum measuring device provided by the invention comprises a high-frequency induction plasma 4, a nozzle 5, a spectrometer 6, an optical fiber 7, a spectrum acquisition unit 8 and an upper computer 9.
The high-temperature plasma radiation penetrates through the optical window and enters the optical fiber 7, the spectrum acquisition unit 8 acquires the radiation luminescence in the optical fiber and converts the radiation luminescence into spectral data with wavelength resolution in the range of 200-1100nm and outputs the spectral data to the upper computer 9, the upper computer 9 analyzes the received spectral data to obtain the emission spectral intensity of the atomic oxygen spectral line, and the emission spectral intensity is compared with the corresponding relation between the emission spectral intensity calibrated in advance and the enthalpy value and the electron density of the plasma to obtain the enthalpy value and the electron density of the high-temperature plasma. The ICP power supply is connected with an induction coil of the plasma generator through a water cooling pipe, after the argon gas enters the argon gas system, the power supply starts to work, argon gas plasma is generated in the generator, then an air valve is opened, the argon gas valve is closed, and the air plasma is switched into.
The invention adopts a spectrometerThe plasma is diagnosed to obtain the spectral data with the time resolution of tens of ms, and the spectral components comprise a nitrogen molecular spectrum in a 300-400nm wave band and a nitrogen-oxygen atomic spectrum in a 700-900nm wave band. 5-25MJ/kg enthalpy value and 0.1-1.9 x 10 enthalpy value under different temperatures and pressures obtained by combining a heat flow probe and far infrared laser interference diagnosis13cm-3Electron density of (2). And calculating the intensity ratio of the emission spectrum according to the emission spectrum data, and establishing the relation between the intensity ratio and the enthalpy value and the electron density. And further obtaining the enthalpy value and the electron density by measuring the emission spectrum.
In the description of the present invention, "a plurality" means two or more unless otherwise specified; the terms "upper", "lower", "left", "right", "inner", "outer", "front", "rear", "head", "tail", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, are only for convenience in describing and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, should not be construed as limiting the invention. Furthermore, the terms "first," "second," "third," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
It should be noted that the embodiments of the present invention can be realized by hardware, software, or a combination of software and hardware. The hardware portion may be implemented using dedicated logic; the software portions may be stored in a memory and executed by a suitable instruction execution system, such as a microprocessor or specially designed hardware. Those skilled in the art will appreciate that the apparatus and methods described above may be implemented using computer executable instructions and/or embodied in processor control code, such code being provided on a carrier medium such as a disk, CD-or DVD-ROM, programmable memory such as read only memory (firmware), or a data carrier such as an optical or electronic signal carrier, for example. The apparatus and its modules of the present invention may be implemented by hardware circuits such as very large scale integrated circuits or gate arrays, semiconductors such as logic chips, transistors, or programmable hardware devices such as field programmable gate arrays, programmable logic devices, etc., or by software executed by various types of processors, or by a combination of hardware circuits and software, e.g., firmware.
The above description is only for the purpose of illustrating the present invention and the appended claims are not to be construed as limiting the scope of the invention, which is intended to cover all modifications, equivalents and improvements that are within the spirit and scope of the invention as defined by the appended claims.
Claims (6)
1. A spectral measurement method, characterized in that the spectral measurement method comprises:
selecting emission intensity without an atomic emission waveband from received spectral data as a reference value, and performing normalization processing on the received spectral data;
selecting the intensities of atomic oxygen at 777nm and 845nm in the spectrum data after normalization processing as an integral to obtain an integral intensity value;
the intensities of atomic nitrogen at 747nm and 818nm or 821nm or 822nm or 868nm are selected for integration treatment in the wave band to be measured.
2. The method of claim 1, wherein the spectral measurement method comprises the steps of mapping the emission spectrum intensity to the plasma enthalpy and the electron density, wherein the mapping comprises:
comparing the integral intensities of two target component spectral lines with different temperature sensitivities to obtain a relational expression of an emission spectrum intensity ratio and temperature, pressure and electron density;
secondly, obtaining the discrete numerical relation between the flame value, the temperature and the pressure within the range of 5-25MJ/kg of the flame value of the high-temperature plasma by utilizing NASA chemical equilibrium calculation; obtaining the numerical relation of the electron density, the temperature and the pressure in the high-temperature plasma flow field by utilizing high-precision far-infrared laser interference diagnosis;
and thirdly, combining the results of the first step and the second step to obtain the relation between the emission spectrum intensity ratio and the enthalpy value and the electron density.
3. A computer-readable storage medium storing a computer program which, when executed by a processor, causes the processor to perform the steps of:
selecting emission intensity without an atomic emission waveband from received spectral data as a reference value, and performing normalization processing on the received spectral data;
selecting the intensities of atomic oxygen at 777nm and 845nm in the spectrum data after normalization processing as an integral to obtain an integral intensity value;
the intensities of atomic nitrogen at 747nm and 818nm or 821nm or 822nm or 868nm are selected for integration treatment in the wave band to be measured.
4. A spectrum measuring system for carrying out the spectrum measuring method according to any one of claims 1 to 2, wherein the spectrum measuring system comprises:
the spectrum data normalization processing module is used for selecting the emission intensity without an atomic emission waveband from the received spectrum data as a reference value and performing normalization processing on the received spectrum data;
the integral intensity value calculation module is used for selecting the intensities of the atomic oxygen at 777nm and 845nm in the spectrum data after the normalization processing to be integrated to obtain an integral intensity value;
and the intensity integration processing module is used for integrating intensities of atomic nitrogen at 747nm and 818nm or 821nm or 822nm or 868nm in the wave band to be detected.
5. A spectral measuring device equipped with the spectral measuring system of claim 4, wherein the spectral measuring device comprises a high-frequency induction plasma, a nozzle, a spectrometer, an optical fiber, a spectrum collecting unit and an upper computer;
the high-temperature plasma radiation penetrates through the optical window and enters the optical fiber, the spectrum acquisition unit acquires the radiation luminescence in the optical fiber and converts the radiation luminescence into spectral data with wavelength resolution in the range of 200-1100nm and outputs the spectral data to the upper computer, the upper computer analyzes the received spectral data to obtain the emission spectral intensity of the atomic oxygen spectral line, and the emission spectral intensity is compared with the corresponding relation between the emission spectral intensity calibrated in advance and the enthalpy value and the electron density of the plasma to obtain the flame value and the electron density of the high-temperature plasma.
6. A high-frequency induction thermal plasma equipped with the spectral measuring device according to claim 5.
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CN114245556A (en) * | 2021-12-16 | 2022-03-25 | 中国航天空气动力技术研究院 | Arc radiation characteristic measuring system and method for arc plasma generator |
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