CN111988951A - Vapor Chamber Capillary Support Structure - Google Patents

Abstract

A capillary support structure for a temperature-vaporizing plate includes a plate-shaped shell and a capillary support plate disposed in the plate-shaped shell. The capillary support plate is divided into an upper layer and a lower layer by its thickness. The upper layer forms an upper support portion and an upper bare portion arranged adjacent to each other on the capillary support plate in a first direction, and the lower layer forms a lower support portion and a lower bare portion arranged adjacent to each other on the capillary support plate in a second direction, and capillary channels are disposed on both the upper support portion and the lower support portion. Thus, the capillary and support effects in the temperature-vaporizing plate can be provided at the same time under the requirement of thinness.

Description

Vapor Chamber Capillary Support Structure

technical field

The invention relates to a heat transfer structure, in particular to a capillary support structure for a temperature chamber.

Background technique

Due to the demand for thinning of 3C electronic products today, components such as vapor chambers that are used as heat dissipation and heat transfer components inside are also required to be thinned. However, in addition to the thickness of the upper and lower plates, the most important thing for a general temperature chamber is that the internal vapor space must be sufficient. In the past, a support structure was usually installed in the vapor space to ensure the existence of the vapor space and avoid influence. Internal heat exchange.

However, under the requirements of the above-mentioned thinning, in addition to the thinner upper and lower plate bodies of many current vapor chambers, the support structure is also omitted in the internal vapor space. In this way, because the vapor space is in a vacuum shape, the too thin plate body cannot withstand the external pressure and is concave inward, which affects the existence of the vapor space.

SUMMARY OF THE INVENTION

The main purpose of the present invention is to provide a capillary support structure for the vapor chamber, which can be installed in the vapor chamber under the requirement of thinning and simultaneously provide capillary and support effects.

In order to achieve the above-mentioned purpose, the present invention provides a capillary support structure for a vapor chamber, which includes a plate-shaped shell and a capillary support plate disposed in the plate-shaped shell, and the capillary support plate is divided into an upper layer by its thickness. and the lower layer part, the upper layer part forms an upper support part and an upper bare part adjacent to each other on the capillary support plate in a first direction, and the lower layer part forms an adjacent arrangement on the capillary support plate in a second direction The lower support part and the lower bare hollow part are provided with capillary channels on both the upper support part and the lower support part.

The present invention is described in detail below with reference to the accompanying drawings and specific embodiments, but is not intended to limit the present invention.

Description of drawings

Fig. 1 is the three-dimensional exploded schematic diagram of the present invention;

Fig. 2 is the enlarged detail view of A part of Fig. 1;

Fig. 3 is the stereoscopic combination schematic diagram of the present invention;

Fig. 4 is the enlarged detailed view of B part of Fig. 3;

Fig. 5 is the plane combination schematic diagram of the present invention;

Fig. 6 is the sectional view of 6-6 of Fig. 5;

FIG. 7 is a cross-sectional view taken along the line 7-7 of FIG. 5 .

where the reference number

plate shell 1

Bottom plate 10

top plate 11

Capillary Support Plate 2

Upper part 20 Upper support part 200

Upper Bare Hole 201 Capillary Channel 202

Lower layer part 21 Lower support part 210

Lower Bare Hole 211 Capillary Channel 212

frame border 22

Detailed ways

In order to further understand the features and technical content of the present invention, please refer to the following detailed description of the present invention and the accompanying drawings, however, the accompanying drawings are only for reference and description, and are not intended to limit the present invention.

Please refer to FIG. 1 and FIG. 2 , which are an exploded perspective view of the present invention and an enlarged detailed view of part A of FIG. 1 , respectively. The present invention provides a capillary support structure for a uniform temperature plate, comprising a plate-shaped shell 1 and a capillary support plate 2 disposed in the plate-shaped shell 1; wherein:

The plate-shaped shell 1 can be divided into a bottom plate 10 and a top plate 11, and after sandwiching the capillary support plate 2 above and below, the three-layer plates are attached to each other and the edges are sealed by processing such as electric welding, and then the capillary support plate 2 can be The capillary support plate 2 is sealed in the plate-shaped casing 1 and vacuumized.

As shown in FIG. 3 and FIG. 4 , the capillary support plate 2 can be formed of a metal plate, such as a copper plate, which is arranged in the above-mentioned plate-shaped casing 1 , and a frame edge 22 can be formed on the outer periphery thereof for the base plate 10 It is sandwiched with the top plate 11 on the frame edge 22 of the capillary support plate 2, and is sealed in the plate-shaped casing 1 together with the edge sealing. The capillary support plate 2 can be fabricated by processing such as etching to form the following structure: an upper layer portion 20 and a lower layer portion 21 are separated by the thickness of the capillary support plate 2 , and the upper layer portion 20 faces the capillary support plate in a first direction in a first direction. The upper support portion 200 and the upper bare portion 201 arranged adjacent to each other are formed on the upper portion 2 , and the lower support portion 210 and the lower bare portion 211 arranged adjacent to each other are formed on the capillary support plate 2 on the lower layer portion 21 in a second direction. , and capillary channels 202 and 212 are provided on both the upper support portion 200 and the lower support portion 210 .

5, 6 and shown, in more detail, the upper layer portion 20 exceeds the thickness of the capillary support plate 2 by more than half, and the lower layer portion 21 also exceeds the thickness of the capillary support plate 2 by more than half; 20 and 21 can still maintain the part where the upper and lower support parts 200 and 210 overlap each other to form an integral form of the capillary support plate 2 . In addition, the capillary channels 202 and 212 located on the upper and lower support parts 200 and 210 can also be formed into grooves according to the first direction and the second direction respectively, so as to facilitate the work stored in the accommodating space 100 . The fluid (not shown) can be diffused or distributed on the plate surface of the plate-shaped casing 1 by capillary action along the first or second direction, so as to achieve the effect of uniform heat transfer.

Furthermore, please refer to FIGS. 5 and 7 together, since the first direction and the second direction are staggered on the projection of the plate surface of the plate shell 1, the upper layer of the capillary support sample 2 is The upper bare part 201 of the lower layer part 20 and the lower bare part 211 of the lower layer part 21 overlap each other, so the overlapping parts can constitute the steam space directly connecting the bottom plate 10 and the top plate 11 of the plate-shaped casing 1, In order to maintain the shortest distance (that is, the thickness of the capillary support plate 2 ), the steam can flow smoothly and without obstruction, so as to facilitate the heat exchange of the uniform temperature plate and ensure its function and effect. Especially under the premise that the upper layer part 20 of the capillary support plate 2 is attached to the inner surface of the top plate 11 and the lower layer part 21 is attached to the inner surface of the bottom plate 10 , the present invention can effectively prevent the existence of the steam space described in the plate-shaped shell 1 from being trapped inside the plate shell 1 . Concave and other problems occur.

Therefore, the capillary support structure of the vapor chamber of the present invention can be obtained by the above structure.

Of course, the present invention can also have other various embodiments, without departing from the spirit and essence of the present invention, those skilled in the art can make various corresponding changes and modifications according to the present invention, but these corresponding Changes and deformations should belong to the protection scope of the appended claims of the present invention.

Claims (9)

1. a capillary support structure for a uniform temperature plate, characterized in that, comprising: a plate-like housing; and A capillary support plate is installed in the plate-shaped shell, and is divided into an upper layer portion and a lower layer portion by the thickness of the capillary support plate, and the upper layer portion is formed adjacent to each other on the capillary support plate in a first direction The upper support part and the upper bare part are arranged, and the lower part forms the lower support part and the lower bare part adjacent to each other on the capillary support plate in a second direction, and the upper support part and the lower support There are capillary channels on the upper part. 2 . The capillary support structure of the vapor chamber according to claim 1 , wherein the plate-shaped casing has a bottom plate and a top plate. 3 . 3 . The capillary support structure of the vapor chamber according to claim 2 , wherein the outer periphery of the capillary support plate forms a frame edge, and the bottom plate and the top plate are sandwiched on the frame edge of the capillary support plate and are 3. 4 . Edge banding. 4 . The capillary support structure of the vapor chamber according to claim 1 , wherein the capillary support plate is a metal plate. 5 . 5. The capillary support structure of the vapor chamber according to claim 1 or 4, wherein the capillary support plate is formed by etching. 6 . The capillary support structure of the vapor chamber according to claim 1 , wherein the upper layer portion exceeds half of the thickness of the capillary support plate. 7 . 7 . The capillary support structure of the vapor chamber according to claim 1 or 6 , wherein the lower layer portion is more than half of the thickness of the capillary support plate. 8 . 8 . The capillary support structure of the vapor chamber according to claim 1 , wherein the capillary channels on the upper and lower support parts are respectively matched with the first direction and the second direction to form a groove shape. 9 . 9 . The capillary support structure of the vapor chamber according to claim 1 , wherein the first direction and the second direction are staggered with each other on the projection of the plate surface of the plate-shaped casing. 10 .

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