CN111941271A - Glass polishing pad and preparation method thereof - Google Patents

Glass polishing pad and preparation method thereof Download PDF

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Publication number
CN111941271A
CN111941271A CN202010910933.XA CN202010910933A CN111941271A CN 111941271 A CN111941271 A CN 111941271A CN 202010910933 A CN202010910933 A CN 202010910933A CN 111941271 A CN111941271 A CN 111941271A
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abrasive
pad
polishing
adhesive
soaking
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CN202010910933.XA
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CN111941271B (en
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卞振伟
何鹏
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DONGGUAN GOLDEN SUN ABRASIVES CO LTD
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DONGGUAN GOLDEN SUN ABRASIVES CO LTD
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B24B37/245Pads with fixed abrasives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001Manufacture of flexible abrasive materials
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/32Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/45Oxides or hydroxides of elements of Groups 3 or 13 of the Periodic System; Aluminates
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M15/00Treating fibres, threads, yarns, fabrics, or fibrous goods made from such materials, with macromolecular compounds; Such treatment combined with mechanical treatment
    • D06M15/19Treating fibres, threads, yarns, fabrics, or fibrous goods made from such materials, with macromolecular compounds; Such treatment combined with mechanical treatment with synthetic macromolecular compounds
    • D06M15/37Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • D06M15/564Polyureas, polyurethanes or other polymers having ureide or urethane links; Precondensation products forming them
    • D06M15/568Reaction products of isocyanates with polyethers

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The invention relates to the technical field of polishing consumables, in particular to a glass polishing pad and a preparation method thereof. The abrasive material adhesive comprises a base carrying pad and an abrasive material adhesive attached to the surface and gaps of the base carrying pad, wherein the abrasive material adhesive comprises the following raw materials in parts by weight: 15-30 parts of polyether monomer, 1-5 parts of isocyanate, 25-40 parts of abrasive, 3-7 parts of pore-forming agent and 15-30 parts of solvent. The glass polishing pad disclosed by the invention bonds the abrasive on the carrier base pad by taking the adhesive as a medium, so that the abrasive is contained on the fibers of the carrier base pad and in the gaps, the abrasive and the carrier base pad synchronously fall off in the polishing process of the polishing pad, the abrasive and cooling water simultaneously act to achieve a polishing effect superior to that of polishing solution, the service life and efficiency of the polishing pad can be prolonged, the environmental pollution is reduced, the harm to human bodies is reduced, and the polishing effect is good.

Description

Glass polishing pad and preparation method thereof
Technical Field
The invention relates to the technical field of polishing consumables, in particular to a glass polishing pad and a preparation method thereof.
Background
The rare earth polishing powder has the advantages of small using amount, high polishing speed and high polishing efficiency, and can change the polishing quality and the operating environment. In general, the rare earth glass polishing powder mainly uses cerium-rich oxide, cerium oxide, which is an extremely effective polishing compound because it can simultaneously polish glass in both chemical decomposition and mechanical friction. The rare earth cerium polishing powder is widely used for polishing cameras, camera lenses, television kinescopes, spectacle lenses and the like, and in recent years, glass mobile phone shells, screens, integrated circuit boards and the like in the field of 3C electronic products are rapidly developed, so that the glass polishing material has wide application prospects.
The glass grinding in the market at present mainly uses cerium oxide polishing powder, and the cerium oxide polishing powder is prepared into solution and then matched with a polishing pad for polishing. This method requires the polishing powder to be prepared into the polishing solution in advance, and the process is complicated. In later use, due to the characteristics of consumables, a large amount of waste is inevitably caused in the production and processing processes, and the defects of serious environmental pollution, harm to human health and the like exist.
Disclosure of Invention
In order to overcome the defects and shortcomings in the prior art, the invention aims to provide a glass polishing pad, wherein an abrasive is adhered to a carrier base pad by taking an adhesive as a medium, so that the abrasive is contained on fibers of the carrier base pad and among gaps, the abrasive and the carrier base pad synchronously fall off in the polishing process of the polishing pad, the abrasive and cooling water simultaneously act to achieve the polishing effect superior to that of polishing solution, the service life and efficiency of the polishing pad can be prolonged, the environmental pollution is reduced, and the harm to human bodies is reduced.
The invention also aims to provide a preparation method of the glass polishing pad, which is simple to operate and easy to control, adopts the modes of twice soaking and twice extruding, can uniformly infiltrate the adhesive into the gap and the surface of the base-carrying pad, promotes the dispersion uniformity of the abrasive, and can be used for large-scale production.
Still another object of the present invention is to provide an apparatus for manufacturing a glass polishing pad, which is compact in structure, realizes continuous production of polishing pads, has high production efficiency, and can be used for mass production.
The purpose of the invention is realized by the following technical scheme: the glass polishing pad comprises a base-carrying pad and an abrasive adhesive attached to the surface and the gap of the base-carrying pad, wherein the abrasive adhesive comprises the following raw materials in parts by weight:
Figure BDA0002663244520000021
the glass polishing pad disclosed by the invention bonds the abrasive on the carrier base pad by taking the adhesive as a medium, so that the abrasive is contained on the fibers of the carrier base pad and in the gaps, the abrasive and the carrier base pad synchronously fall off in the polishing process of the polishing pad, the abrasive and cooling water simultaneously act to achieve a polishing effect superior to that of polishing solution, the service life and efficiency of the polishing pad can be prolonged, the environmental pollution is reduced, the harm to a human body is reduced, and the glass polishing pad is suitable for special consumables of a five-axis polishing machine for polishing glass and the like.
The adhesive has better water resistance, bonding strength and self-sharpening property, can freely fall off along with the polishing process, and the falling part comprises the fiber yarns of the base pad, the abrasive material and the resin component of the adhesive; the resin component is bi-component polyurethane resin generated by the cross-linking reaction of polyether monomer and isocyanate, wherein the isocyanate can also be diisocyanate.
Preferably, the porosity of the base-carrying pad is 30-50%, the pore diameter is 0.5-1mm, the thickness is less than 1cm, and the gram weight is 180-220 g/square meter.
The carrier base pad adopted by the invention is preferably natural biological fiber, such as wool fiber, is used as the carrier base pad, has a fluffy and soft structure, has better adhesion with an adhesive in production, is soft in unit fiber, can automatically fall off in the polishing process, and does not scratch the surface layer of glass in the grinding and polishing process and damage the complete surface of the polished glass; the surface of the fiber can be well bonded with the adhesive and the abrasive powder, so that the grinding force and the polishing force due to consumable materials are achieved; enough space is reserved between fiber gaps, a certain amount of free abrasive powder in a free state can be contained, the free abrasive powder can fall off freely in the polishing process, and the free abrasive powder in the polishing solution is fitted in a state.
Compared with the single polyurethane resin as a grinding base material, the fiber-made base-carrying pad can reduce part of the cost of the resin raw material, and in the grinding process, the natural fiber base material is easier to fall off synchronously with grinding, so that the self-sharpening property of forming a new cutting edge while grinding is achieved; the fiber base material with large porosity can reserve more abrasive polishing powder to a greater extent in the manufacturing process, and the service life of consumable materials is prolonged; in addition, some polyurethane resins have problems of poor water resistance and heat resistance, and the addition of a fiber base material can reduce the disadvantages caused by these defects to some extent.
Preferably, each part of the abrasive comprises 15-25 parts of polishing grade cerium oxide powder and 10-15 parts of polishing grade aluminum oxide powder. According to the invention, the polishing-grade cerium oxide powder and the polishing-grade alumina powder are combined to be used as the abrasive, so that the cost of the polishing-grade cerium oxide powder can be reduced by introducing the polishing-grade alumina powder, the dispersity of the polishing-grade cerium oxide powder can be improved, the abrasive is promoted to permeate into the base-carrying pad when the glass polishing pad is prepared, and the grinding force of the cerium oxide polishing powder can be enhanced.
Preferably, the pore-forming agent is sodium bicarbonate powder; the solvent is at least one of ethyl ester, xylene and butanone.
When the pore-forming agent is used in a glass polishing pad product, the pore-forming agent is in contact with water to form a sodium bicarbonate or sodium carbonate aqueous solution, so that an alkaline environment is manufactured, the surface layer of glass is softened, and the polishing difficulty is reduced. The adopted solvent is an oily solvent, can promote the dispersibility of materials, has good permeability, can promote the abrasive adhesive to permeate into the glass polishing pad, further promotes the abrasive to be embedded in fiber gaps of the glass polishing pad, and is easy to dry, volatilize and remove. More preferably, the solvent is ethyl ester, xylene and butanone in a weight ratio of 1-3: 1: 2, and (b) a mixture of the components.
Preferably, the abrasive adhesive further comprises an anti-settling agent, and the dosage of the anti-settling agent is 1-5% of the total dosage of the abrasive adhesive.
Preferably, the anti-settling agent is fumed silica powder.
The anti-settling agent adopted by the invention and the dosage of the anti-settling agent is strictly controlled, so that the material dispersibility in the abrasive adhesive can be promoted, and the agglomeration and settling phenomena of abrasive powder are reduced.
Preferably, the preparation of the abrasive adhesive comprises the following steps:
according to the weight portion, adding the polyether monomer and the isocyanate into the solvent, uniformly mixing, then adding the rest materials, and uniformly mixing to obtain the abrasive adhesive.
The polyether monomer and the isocyanate are added into the solvent firstly, the polyurethane resin is formed by crosslinking in advance, then the other materials such as the grinding material are added, the other materials are uniformly dispersed in the resin component, the dispersibility of the grinding material is improved, the grinding material can permeate into fiber gaps of the carrier pad along with the permeability of the resin and the solvent, and the operation is convenient and easy to control.
The other purpose of the invention is realized by the following technical scheme: a method for preparing the glass polishing pad comprises the following steps:
A. primary soaking and primary extrusion: soaking the base carrying pad in the abrasive adhesive for the first time, and then extruding the base carrying pad soaked and adsorbed with the abrasive adhesive for the first time;
B. second soaking and second extrusion: and C, soaking the base carrying pad extruded in the step A in an abrasive adhesive for the second time, then extruding the base carrying pad soaked and adsorbed with the abrasive adhesive for the second time, and finally drying and curing to obtain the glass polishing pad.
Preferably, in the step A, the time for the first soaking is 2-10min, and the pressure for the first extrusion is 0.4-1.0 MPa; in the step B, the time for the second soaking is 1-5 min.
Preferably, in the step B, the drying and curing are carried out through three drying temperature sections, and low-temperature drying at 80-90 ℃, medium-temperature drying at 90-100 ℃ and high-temperature curing at 115-125 ℃ are sequentially carried out, and the heat preservation time of each temperature section is not less than 3 h.
The preparation method of the glass polishing pad is simple to operate and easy to control, adopts the modes of twice soaking and twice extruding, can uniformly soak the adhesive in the gap and the surface of the base-carrying pad, promotes the dispersion uniformity of the abrasive, and can be used for large-scale production.
The whole process adopts a production method of 'soaking-pressing-soaking-pressing', and is drawn by a machine, the base pad firstly passes through a material pool loaded with the abrasive material adhesive to enable the surface to be adhered with the sufficient abrasive material adhesive, then passes through a slit of an extrusion roller to enable the surface layer rubber material to be pressed into the inner layer of the base material, then passes through the next material pool, and is repeatedly operated, and the secondary extrusion can enable the inner layer of the base pad to retain the sufficient adhesive material and the abrasive material, and scrape the redundant abrasive material adhesive on the surface.
Soaking the base-carrying pad at normal temperature, wherein the first soaking time is not less than 2min, the second soaking time is not less than 1min, the first extrusion process has requirements on pressure, and the extrusion pressure is strictly controlled to be 0.4-1.0MPa, so that the surface rubber material is pressed into the inner layer of the base material; the second extrusion process only needs to scrape the floating materials on the surface of the base pad, and has no fixed pressure requirement.
And in the drying and curing process, the three-stage drying treatment of low-temperature drying, medium-temperature drying and high-temperature curing is adopted, and the drying temperature and time are strictly controlled, so that the uniform and compact porosity of the carrier base pad can be ensured, and the inner part and the surface of the carrier base pad are completely cured.
The back of the base pad product prepared by the invention can be provided with flannelette and sponge, and particularly, the complete product is adhered to a film (such as a PET film) by an adhesive, and the sponge and the flannelette are adhered to the other side of the film in sequence, so that the base pad product is convenient to use by a five-axis machine.
The other purpose of the invention is realized by the following technical scheme: the equipment for preparing the glass polishing pad comprises a first soaking material pool, a first extrusion roller, a second soaking material pool and a second extrusion roller which are sequentially connected according to the using sequence, wherein the first soaking material pool and the second soaking material pool are both loaded with abrasive material adhesives. The equipment for preparing the glass polishing pad has a compact structure, adopts a production method of soaking-pressing-soaking-pressing in the whole process, is drawn by a machine, leads the base-carrying pad to pass through the first soaking pool loaded with the abrasive adhesive to lead the surface to be adhered with enough abrasive adhesive, then passes through the slit of the first extrusion roller to lead the surface layer adhesive to be pressed into the inner layer of the base material, and then passes through the second soaking pool to repeat the operation, and the second extrusion roller can lead the inner layer of the base-carrying pad to retain enough adhesive and abrasive and scrape the redundant abrasive adhesive on the surface, thereby realizing the continuous production of the polishing pad, having high production efficiency and being applicable to large-scale production.
The invention has the beneficial effects that: the glass polishing pad disclosed by the invention bonds the abrasive on the carrier base pad by taking the adhesive as a medium, so that the abrasive is contained on the fibers of the carrier base pad and in the gaps, the abrasive and the carrier base pad synchronously fall off in the polishing process of the polishing pad, the abrasive and cooling water simultaneously act to achieve a polishing effect superior to that of polishing solution, the service life and efficiency of the polishing pad can be prolonged, the environmental pollution is reduced, and the harm to human bodies is reduced.
The preparation method of the glass polishing pad is simple to operate and easy to control, adopts the modes of twice soaking and twice extruding, can uniformly soak the adhesive in the gap and the surface of the base-carrying pad, promotes the dispersion uniformity of the abrasive, and can be used for large-scale production.
The equipment for preparing the glass polishing pad has a compact structure, realizes continuous production of the polishing pad, has high production efficiency, and can be used for large-scale production.
Drawings
FIG. 1 is a schematic partial cross-sectional view of the present invention;
FIG. 2 is a schematic view showing the construction of an apparatus for producing a glass polishing pad according to example 6 of the present invention;
the reference signs are: the production process comprises the following steps of 1-fiber filament, 2-abrasive, 3-abrasive adhesive, 4-base-carrying pad, 5-first soaking material pool, 6-first extrusion roller, 7-second soaking material pool and 8-second extrusion roller.
Detailed Description
For the understanding of those skilled in the art, the present invention will be further described with reference to the following examples and accompanying fig. 1-2, which are not intended to limit the present invention.
Example 1
Referring to fig. 1, the glass polishing pad comprises a carrier base pad 4 and an abrasive adhesive attached to the surface and the gap of the carrier base pad 4, wherein the abrasive adhesive comprises the following raw materials in parts by weight:
Figure BDA0002663244520000061
the porosity of the base loading pad 4 is 30%, the pore diameter is 0.5mm, the thickness is less than 1cm, and the gram weight is 180 g/square meter.
The base-carrying mat 4 comprises a plurality of filaments 1.
Each part of the abrasive 2 comprises 15 parts of polishing grade cerium oxide powder and 15 parts of polishing grade aluminum oxide powder.
The pore-forming agent is sodium bicarbonate powder; the solvent is butanone.
The abrasive adhesive also comprises an anti-settling agent, and the using amount of the anti-settling agent is 1% of the total using amount of the abrasive adhesive.
The anti-settling agent is fumed silica powder.
The preparation method of the abrasive adhesive comprises the following steps:
according to the weight portion, adding the polyether monomer and the isocyanate into the solvent, uniformly mixing, then adding the rest materials, and uniformly mixing to obtain the abrasive adhesive.
A method for preparing the glass polishing pad comprises the following steps:
A. primary soaking and primary extrusion: soaking the base carrying pad 4 in the abrasive adhesive 3 for the first time, and then extruding the base carrying pad 4 soaked and adsorbed with the abrasive adhesive 3 for the first time;
B. second soaking and second extrusion: and C, soaking the base carrying pad 4 extruded in the step A in the abrasive adhesive 3 for the second time, then extruding the base carrying pad 4 soaked and adsorbed with the abrasive adhesive 3 for the second time, and finally drying and curing to obtain the glass polishing pad.
In the step A, the time of the first soaking is 2min, and the pressure of the first extrusion is 0.4 MPa; in the step B, the time for the second soaking is 1 min.
In the step B, drying and curing are carried out through three drying temperature sections, low-temperature drying at 80 ℃, medium-temperature drying at 90 ℃ and high-temperature curing at 115 ℃ are carried out in sequence, and the heat preservation time of each temperature section is 3.5 hours.
Example 2
Referring to fig. 1, the glass polishing pad comprises a carrier base pad 4 and an abrasive adhesive attached to the surface and the gap of the carrier base pad 4, wherein the abrasive adhesive comprises the following raw materials in parts by weight:
Figure BDA0002663244520000071
the base loading pad 4 has the porosity of 35 percent, the pore diameter of 0.6mm, the thickness of less than 1cm and the gram weight of 190g per square meter.
The base-carrying mat 4 comprises a plurality of filaments 1.
Each part of the abrasive 2 comprises 18 parts of polishing grade cerium oxide powder and 14 parts of polishing grade aluminum oxide powder.
The pore-forming agent is sodium bicarbonate powder; the solvent is xylene.
The abrasive adhesive also comprises an anti-settling agent, and the using amount of the anti-settling agent is 2% of the total using amount of the abrasive adhesive.
The anti-settling agent is fumed silica powder.
The preparation method of the abrasive adhesive comprises the following steps:
according to the weight portion, adding the polyether monomer and the isocyanate into the solvent, uniformly mixing, then adding the rest materials, and uniformly mixing to obtain the abrasive adhesive.
A method for preparing the glass polishing pad comprises the following steps:
A. primary soaking and primary extrusion: soaking the base carrying pad 4 in the abrasive adhesive 3 for the first time, and then extruding the base carrying pad 4 soaked and adsorbed with the abrasive adhesive 3 for the first time;
B. second soaking and second extrusion: and C, soaking the base carrying pad 4 extruded in the step A in the abrasive adhesive 3 for the second time, then extruding the base carrying pad 4 soaked and adsorbed with the abrasive adhesive 3 for the second time, and finally drying and curing to obtain the glass polishing pad.
In the step A, the time of the first soaking is 4min, and the pressure of the first extrusion is 0.6 MPa; in the step B, the time for the second soaking is 2 min.
In the step B, drying and curing are carried out through three drying temperature sections, low-temperature drying at 82 ℃, medium-temperature drying at 92 ℃ and high-temperature curing at 119 ℃ are carried out in sequence, and the heat preservation time of each temperature section is 4 hours.
Example 3
Referring to fig. 1, the glass polishing pad comprises a carrier base pad 4 and an abrasive adhesive attached to the surface and the gap of the carrier base pad 4, wherein the abrasive adhesive comprises the following raw materials in parts by weight:
Figure BDA0002663244520000081
Figure BDA0002663244520000091
the porosity of the base loading pad 4 is 40%, the pore diameter is 0.8mm, the thickness is less than 1cm, and the gram weight is 200 g/square meter.
The base-carrying mat 4 comprises a plurality of filaments 1.
Each part of the abrasive comprises 20 parts of polishing grade cerium oxide powder and 13 parts of polishing grade aluminum oxide powder.
The pore-forming agent is sodium bicarbonate powder; the solvent is ethyl ester.
The abrasive adhesive also comprises an anti-settling agent, and the using amount of the anti-settling agent is 3% of the total using amount of the abrasive adhesive.
The anti-settling agent is fumed silica powder.
The preparation method of the abrasive adhesive comprises the following steps:
according to the weight portion, adding the polyether monomer and the isocyanate into the solvent, uniformly mixing, then adding the rest materials, and uniformly mixing to obtain the abrasive adhesive.
A method for preparing the glass polishing pad comprises the following steps:
A. primary soaking and primary extrusion: soaking the base carrying pad 4 in the abrasive adhesive 3 for the first time, and then extruding the base carrying pad 4 soaked and adsorbed with the abrasive adhesive 3 for the first time;
B. second soaking and second extrusion: and C, soaking the base carrying pad 4 extruded in the step A in the abrasive adhesive 3 for the second time, then extruding the base carrying pad 4 soaked and adsorbed with the abrasive adhesive 3 for the second time, and finally drying and curing to obtain the glass polishing pad.
In the step A, the time of the first soaking is 6min, and the pressure of the first extrusion is 0.7 MPa; in the step B, the time for the second soaking is 3 min.
In the step B, drying and curing are carried out through three drying temperature sections, low-temperature drying at 85 ℃, medium-temperature drying at 95 ℃ and high-temperature curing at 120 ℃ are carried out in sequence, and the heat preservation time of each temperature section is 4.5 hours.
Example 4
Referring to fig. 1, the glass polishing pad comprises a carrier base pad 4 and an abrasive adhesive attached to the surface and the gap of the carrier base pad 4, wherein the abrasive adhesive comprises the following raw materials in parts by weight:
Figure BDA0002663244520000101
the base loading pad 4 has a porosity of 45%, a pore diameter of 0.9mm, a thickness of less than 1cm and a gram weight of 210 g/square meter.
The base-carrying mat 4 comprises a plurality of filaments 1.
Each part of the abrasive 2 comprises 23 parts of polishing grade cerium oxide powder and 12 parts of polishing grade aluminum oxide powder.
The pore-forming agent is sodium bicarbonate powder; the solvent is ethyl ester, dimethylbenzene and butanone in a weight ratio of 1: 1: 2, and (b) a mixture of the components.
The abrasive adhesive also comprises an anti-settling agent, and the using amount of the anti-settling agent is 4% of the total using amount of the abrasive adhesive.
The anti-settling agent is fumed silica powder.
The preparation method of the abrasive adhesive comprises the following steps:
according to the weight portion, adding the polyether monomer and the isocyanate into the solvent, uniformly mixing, then adding the rest materials, and uniformly mixing to obtain the abrasive adhesive.
A method for preparing the glass polishing pad comprises the following steps:
A. primary soaking and primary extrusion: soaking the base carrying pad 4 in the abrasive adhesive 3 for the first time, and then extruding the base carrying pad 4 soaked and adsorbed with the abrasive adhesive 3 for the first time;
B. second soaking and second extrusion: and C, soaking the base carrying pad 4 extruded in the step A in the abrasive adhesive 3 for the second time, then extruding the base carrying pad 4 soaked and adsorbed with the abrasive adhesive 3 for the second time, and finally drying and curing to obtain the glass polishing pad.
In the step A, the time of the first soaking is 8min, and the pressure of the first extrusion is 0.8 MPa; in the step B, the time for the second soaking is 4 min.
In the step B, drying and curing are carried out through three drying temperature sections, low-temperature drying at 88 ℃, medium-temperature drying at 96 ℃ and high-temperature curing at 123 ℃ are carried out in sequence, and the heat preservation time of each temperature section is 5 hours.
Example 5
Referring to fig. 1, the glass polishing pad comprises a carrier base pad 4 and an abrasive adhesive attached to the surface and the gap of the carrier base pad 4, wherein the abrasive adhesive comprises the following raw materials in parts by weight:
Figure BDA0002663244520000111
the porosity of the base loading pad 4 is 50%, the pore diameter is 1mm, the thickness is less than 1cm, and the gram weight is 220 g/square meter.
The base-carrying mat 4 comprises a plurality of filaments 1.
Each part of the abrasive 2 comprises 25 parts of polishing grade cerium oxide powder and 10 parts of polishing grade aluminum oxide powder.
The pore-forming agent is sodium bicarbonate powder; the solvent is ethyl ester, dimethylbenzene and butanone in a weight ratio of 3: 1: 2, and (b) a mixture of the components.
The abrasive adhesive also comprises an anti-settling agent, and the using amount of the anti-settling agent is 5% of the total using amount of the abrasive adhesive.
The anti-settling agent is fumed silica powder.
The preparation method of the abrasive adhesive comprises the following steps:
according to the weight portion, adding the polyether monomer and the isocyanate into the solvent, uniformly mixing, then adding the rest materials, and uniformly mixing to obtain the abrasive adhesive.
A method for preparing the glass polishing pad comprises the following steps:
A. primary soaking and primary extrusion: soaking the base carrying pad 4 in the abrasive adhesive 3 for the first time, and then extruding the base carrying pad 4 soaked and adsorbed with the abrasive adhesive 3 for the first time;
B. second soaking and second extrusion: and C, soaking the base carrying pad 4 extruded in the step A in the abrasive adhesive 3 for the second time, then extruding the base carrying pad 4 soaked and adsorbed with the abrasive adhesive 3 for the second time, and finally drying and curing to obtain the glass polishing pad.
In the step A, the time of the first soaking is 10min, and the pressure of the first extrusion is 1.0 MPa; in the step B, the time for the second soaking is 5 min.
In the step B, drying and curing are carried out through three drying temperature sections, low-temperature drying at 90 ℃, medium-temperature drying at 100 ℃ and high-temperature curing at 125 ℃ are carried out in sequence, and the heat preservation time of each temperature section is 5.5 hours.
Example 6
An apparatus for preparing the glass polishing pad of the above examples 1-5 comprises a first soaking pool 5, a first squeezing roller 6, a second soaking pool 7 and a second squeezing roller 8 which are connected in sequence, wherein the first soaking pool 5 and the second soaking pool 7 are loaded with the abrasive material adhesive 3 of the above examples 1-5.
Comparative example 1
This comparative example differs from example 3 above in that:
the abrasive adhesive comprises the following raw materials in parts by weight:
Figure BDA0002663244520000121
comparative example 2
This comparative example differs from example 3 above in that:
the abrasive 2 is polishing grade cerium oxide powder.
Comparative example 3
This comparative example differs from example 3 above in that:
a method for preparing the glass polishing pad comprises the following steps:
and (3) scraping the abrasive adhesive on the two surfaces of the base-loaded pad 4, drying and curing to obtain the glass polishing pad.
Comparative example 4
This comparative example differs from example 3 above in that:
the glass polishing pad is prepared from an abrasive adhesive, wherein the abrasive adhesive comprises the following raw materials in parts by weight:
Figure BDA0002663244520000131
each part of the abrasive 2 comprises 20 parts of polishing grade cerium oxide powder and 13 parts of polishing grade aluminum oxide powder.
The pore-forming agent is sodium bicarbonate powder; the solvent is ethyl ester.
The abrasive adhesive also comprises an anti-settling agent, and the using amount of the anti-settling agent is 3% of the total using amount of the abrasive adhesive.
The anti-settling agent is fumed silica powder.
The preparation method of the abrasive adhesive comprises the following steps:
according to the weight portion, adding the polyether monomer and the isocyanate into the solvent, uniformly mixing, then adding the rest materials, and uniformly mixing to obtain the abrasive adhesive.
A method for preparing the glass polishing pad comprises the following steps:
and filling the abrasive adhesive into a die cavity, drying, curing and demolding to obtain the glass polishing pad.
The polishing effect test was performed on the glass polishing pads obtained in example 3 and comparative examples 1 to 4, and the test results were as follows:
Figure BDA0002663244520000132
Figure BDA0002663244520000141
the grinding mode adopts a wet grinding method, and the glass polishing pad is soaked in water for 2 hours and then ground. Polishing with a disc water mill or a five-axis polishing machine in the presence of washing water, wherein when a polishing pad is used for polishing, the pressing quantity parameter is between 1.50mm and 3.00mm, the rotating speed of a machine main shaft is controlled to be between 500r/min and 1500r/min, and the surface of the glass is polished for 2 to 4 minutes each time.
According to the test data, the grinding materials 2 are adhered to the carrier base pad 4 by taking the adhesive as a medium, so that the grinding materials 2 are contained on the fibers of the carrier base pad 4 and in the gaps, the grinding materials 2 and the carrier base pad 4 synchronously fall off in the polishing process of the polishing pad, the grinding materials 2 and the cooling water simultaneously act to achieve the polishing effect superior to that of the polishing solution, the service life and the efficiency of the polishing pad can be prolonged, the environmental pollution is reduced, and the harm to human bodies is reduced.
The abrasive adhesive 3 of the comparative example 1 does not contain pore-forming agent, so that the polishing amount is reduced, slight stains exist on the surface of the polished glass, and the polishing effect is reduced compared with that of the example 3; the invention shows that the grinding material adhesive 3 adopts the pore-forming agent, and when the glass polishing pad product is used, the pore-forming agent can be contacted with water for use, sodium bicarbonate or sodium carbonate aqueous solution can be formed, an alkaline environment is manufactured, the glass surface layer is softened, the polishing difficulty is reduced, and the polishing and grinding effect is improved.
The abrasive 2 in the comparative example 2 is single polishing-grade cerium oxide powder, the polishing amount is obviously reduced, slight stains exist on the surface of the polished glass, and the polishing effect is reduced compared with that of the example 3; the invention shows that the polishing-grade cerium oxide powder and the polishing-grade aluminum oxide powder are combined to be used as the abrasive 2, the introduction of the polishing-grade aluminum oxide powder can reduce the cost of the polishing-grade cerium oxide powder, simultaneously can improve the dispersibility of the polishing-grade cerium oxide powder, promotes the abrasive 2 to permeate into the base pad 4 when preparing the glass polishing pad, and can enhance the grinding force of the cerium oxide polishing powder.
The preparation process in the comparative example 3 does not adopt a soaking and extruding mode, but only coats the abrasive adhesive 3 on the two surfaces of the carrier base pad 4, so that the polishing amount is obviously reduced, obvious stains exist on the glass surface after polishing, and the polishing effect is obviously reduced compared with that of the example 3; the invention can evenly soak the adhesive in the gap and the surface of the carrier base pad 4 by adopting the modes of twice soaking and twice extruding, can ensure that the grinding materials 2 are adhered to the carrier base pad 4 by taking the adhesive as a medium, ensures that the grinding materials 2 are contained on the fibers of the carrier base pad 4 and in the gap, ensures that the grinding materials 2 and the carrier base pad 4 synchronously fall off in the polishing use process of the polishing pad, and has excellent polishing effect.
The polishing pad obtained in the comparative example 4 has no base-carrying pad 4, only contains resin components, the polishing amount is obviously reduced, obvious stains and slight scratches exist on the surface of the polished glass, and the polishing effect is obviously reduced compared with that of the polishing pad obtained in the example 3; the invention shows that the abrasive material adhesive 3 is evenly soaked in the gaps and the surfaces of the carrier base pads 4, so that the abrasive materials 2 are contained on the fibers of the carrier base pads 4 and between the gaps, and the abrasive materials 2 and the carrier base pads 4 synchronously fall off in the polishing process of the polishing pads, thereby having excellent polishing effect.
The above-described embodiments are preferred implementations of the present invention, and the present invention may be implemented in other ways without departing from the spirit of the present invention.

Claims (10)

1. A glass polishing pad characterized by: the abrasive material adhesive comprises a base carrying pad and an abrasive material adhesive attached to the surface and gaps of the base carrying pad, wherein the abrasive material adhesive comprises the following raw materials in parts by weight:
Figure FDA0002663244510000011
2. a glass polishing pad according to claim 1, wherein: the porosity of the base-carrying pad is 30-50%, the pore diameter is 0.5-1mm, the thickness is less than 1cm, and the gram weight is 180-charge 220 g/square meter.
3. A glass polishing pad according to claim 1, wherein: each part of the abrasive comprises 15-25 parts of polishing-grade cerium oxide powder and 10-15 parts of polishing-grade aluminum oxide powder.
4. A glass polishing pad according to claim 1, wherein: the pore-forming agent is sodium bicarbonate powder; the solvent is at least one of ethyl ester, xylene and butanone.
5. A glass polishing pad according to claim 1, wherein: the abrasive adhesive also comprises an anti-settling agent, and the dosage of the anti-settling agent is 1-5% of the total dosage of the abrasive adhesive.
6. A glass polishing pad according to claim 5, wherein: the anti-settling agent is fumed silica powder.
7. A glass polishing pad according to claim 1 or 5, characterized in that: the preparation method of the abrasive adhesive comprises the following steps:
according to the weight portion, adding the polyether monomer and the isocyanate into the solvent, uniformly mixing, then adding the rest materials, and uniformly mixing to obtain the abrasive adhesive.
8. A method for producing a glass polishing pad according to any one of claims 1 to 7, characterized in that: the method comprises the following steps:
A. primary soaking and primary extrusion: soaking the base carrying pad in the abrasive adhesive for the first time, and then extruding the base carrying pad soaked and adsorbed with the abrasive adhesive for the first time;
B. second soaking and second extrusion: and C, soaking the base carrying pad extruded in the step A in an abrasive adhesive for the second time, then extruding the base carrying pad soaked and adsorbed with the abrasive adhesive for the second time, and finally drying and curing to obtain the glass polishing pad.
9. The method for producing a glass polishing pad according to claim 8, wherein: in the step A, the time of the first soaking is 2-10min, and the pressure of the first extrusion is 0.4-1.0 MPa; in the step B, the time for the second soaking is 1-5 min.
10. An apparatus to be applied to the method for producing a glass polishing pad according to claim 8, characterized in that: the grinding material soaking device comprises a first soaking material pool, a first extrusion roller, a second soaking material pool and a second extrusion roller which are sequentially connected according to the using sequence, wherein the first soaking material pool and the second soaking material pool are both loaded with grinding material adhesives.
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