CN111913251B - Hybrid plasmon waveguide capable of simultaneously supporting TE (transverse electric) mode and TM (transverse magnetic) mode - Google Patents
Hybrid plasmon waveguide capable of simultaneously supporting TE (transverse electric) mode and TM (transverse magnetic) mode Download PDFInfo
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- CN111913251B CN111913251B CN201910382612.4A CN201910382612A CN111913251B CN 111913251 B CN111913251 B CN 111913251B CN 201910382612 A CN201910382612 A CN 201910382612A CN 111913251 B CN111913251 B CN 111913251B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1226—Basic optical elements, e.g. light-guiding paths involving surface plasmon interaction
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/126—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind using polarisation effects
Abstract
The invention discloses a mixed plasmon waveguide simultaneously supporting TE (transverse electric) and TM (transverse magnetic) modes, which can be vertically arranged on the premise of not exciting a traditional mode waveguideThe mixed plasmon modes of TM and TE are supported in the vertical direction and the horizontal direction respectively. The vertical and horizontal directions are respectively provided with three layers of structures: with SiO2For the substrate, the first layer structure is high refractive index material Si and the second layer structure is low refractive index material SiO2The third layer structure is metal Ag; the first layer structure in the horizontal direction is a high-refractive-index material Si and is consistent with the first layer structure in the horizontal direction, the second layer structure is low-refractive-index medium air, and the third layer structure is metal Ag. The second layer structures in the vertical and horizontal directions are both positioned between the first layer structure and the third layer structure. The waveguide realizes the control of the polarization state of the optical wave, and provides possibility for realizing high-density integration of various applications requiring polarization control.
Description
Technical Field
The invention belongs to the technical field of sub-wavelength photonics, and particularly relates to a mixed plasmon waveguide capable of supporting TE and TM modes simultaneously.
Background art:
the polarization state is one of the important characteristics of light, and the vector characteristic of the light makes the light and a substance have complicated interaction, so that various optical devices and optical systems can be manufactured. Past research has been directed primarily to spatially uniform polarization states, such as linear polarization, circular polarization, and the like, for which the polarization state is not dependent on the spatial position of the beam.
Hybrid Plasmon Waveguides (HPW) are generally composed of a metal layer and a high refractive index dielectric material layer sandwiching a low refractive index dielectric material layer, and the performance of the HPW is closely related to the thickness of the low refractive index dielectric layer: when the dielectric layer thickness is large, the two modes are separated and plasmon modes cannot be excited in general; when the thickness of the dielectric layer is reduced to a certain degree, the two modes are mixed and superposed into a new mode, and the optical field is mainly limited in the middle low-refractive-index dielectric material layer.
Disclosure of Invention
The invention aims to provide a mixed plasmon waveguide which supports TE and TM modes simultaneously so as to improve the performance of the existing structure.
The utility model provides a support TE, mixed plasmon waveguide of TM mode simultaneously, includes the plasmon waveguide that vertical direction and horizontal direction mix and form, vertical direction's plasmon waveguide comprises the three-layer material, including the high refractive index material of first layer, the low refractive index material of second layer and the metal material of third layer, horizontal direction's plasmon waveguide comprises the three-layer material, including the high refractive index material of first layer, the low refractive index material of second layer and the metal material of third layer, vertical direction and horizontal direction's second layer structure all are located between first layer and the third layer structure.
Further, the refractive index of the high refractive index material Si is 3.478, and the refractive index of the low refractive index material SiO is2Is 1.44 and the low index material air has a refractive index of 1.
Furthermore, the height of Si is selected to be between 100 and 400nm, the width is selected to be between 100 and 300nm, and the low refractive index layer is selected to be between 30 and 80 nm.
The optical field is well limited in a low-refractive-index medium layer (air, SiO)2) Meanwhile, the structure is still compact, and the characteristics of low loss and long propagation distance are achieved.
The real part of the mode effective index represents the index of refraction in a hybrid plasmonic waveguide structure, while the magnitude of the imaginary part determines the magnitude of the transmission loss as the hybrid mode propagates in the waveguide.
The invention has the advantages that: the mixed plasmon waveguide simultaneously supporting TE and TM modes comprises the following components:
(1) the structure is simple and easy to design, the material is easy to obtain, and the preparation is easy to realize;
(2) the mixed plasmon mode of TE and TM can be respectively supported in the horizontal direction and the vertical direction on the premise of not exciting the traditional mode waveguide, and the limitation of the existing structure is broken through;
(3) the lower transmission loss can be kept through the proper selection of materials and the reasonable design of the structure size;
(4) the structure is compact, so that the photonic integrated circuit is convenient for photonic integration, can be applied to an ultra-high density integrated optical circuit, and is easy to be applied to an optical waveguide chip with high integration level.
Drawings
FIG. 1 is a cross-sectional view of a hybrid plasmon waveguide structure supporting both TE and TM modes according to an embodiment.
Fig. 2 is a distribution diagram of TE polarization optical waveguide mode with wavelength λ of 1550nm according to an embodiment.
Fig. 3 is a distribution diagram of the mode of the TM polarization optical waveguide of the embodiment at a wavelength λ of 1550 nm.
Fig. 4 is a graph showing the change of the real part of the effective refractive index of the optical waveguide mode with the wavelength λ of 1550nm according to the embodiment in accordance with the width of Si.
FIG. 5 is a graph showing the change of the real part of the effective refractive index of an optical waveguide mode at λ 1550nm according to the height of Si in the embodiment.
FIG. 6 shows the real part of the effective refractive index of an optical waveguide mode with a wavelength λ of 1550nm as a function of the thickness of a low-refractive-index dielectric layer (SiO)2Height and air layer width) g.
Detailed Description
In order to make the technical means, the creation characteristics, the achievement purposes and the effects of the invention easy to understand, the invention is further described with the specific embodiments.
As shown in FIG. 1, the hybrid plasmon waveguide supporting both TE and TM mode optical waveguide modes has a structure composed of three materials A, B and C, which are divided into a left part and a right part, i.e., a high refractive index medium Si and a low refractive index medium SiO2And noble metal Ag. Corresponding SiO2And the width of the air layer between the left and right portions is g.
The high refractive index medium, the low refractive index medium and the noble metal in the embodiment are Si and SiO2And air, Ag, where Si has a refractive index of 3.478, SiO2Is provided with a folding deviceThe refractive index is 1.44 and the refractive index of air is 1. The refractive index of the corresponding metal silver is 0.145+11.438i under the incidence of light with the wavelength of 1550 nm.
Fig. 2 and 3 are graphs of the mode profiles of TE and TM polarized optical waveguides, respectively, for example, at a wavelength λ of 1550 nm. Wherein the thickness of the low refractive index dielectric layer (SiO)2Height and air layer width) g ═ 50 nm. As can be seen from the figure, under the incidence of the 1550nm wavelength light, the hybrid plasmon waveguide has an obvious field enhancement effect in a low-refractive-index medium region and has super-strong mode field limiting capability.
Fig. 4 shows the variation of the real part of the effective refractive index of the optical waveguide mode with the wavelength λ of 1550nm according to the width w _ Si of Si in the embodiment. As can be seen, the real part of the effective refractive index of the optical waveguide mode increases with the increase of the width w _ Si of Si, indicating that the waveguide's ability to confine the transmission mode increases with the increase of the width of Si.
Fig. 5 shows the real part of the effective refractive index of the optical waveguide mode at 1550nm as a function of the height h _ Si of Si in the embodiment. As can be seen, the real part of the effective refractive index of the optical waveguide mode increases with the increase of the height h _ Si of Si, indicating that the waveguide's ability to confine the transmission mode increases with the increase of the height of Si.
FIG. 6 shows the real part of the effective refractive index of the optical waveguide mode with wavelength λ 1550nm as a function of the thickness of the low-refractive-index dielectric layer (SiO)2Height and air layer width) g. As can be seen, the real part of the effective refractive index of the optical waveguide mode is dependent on the thickness of the low-refractive-index dielectric layer (SiO)2Height and air layer width) g, increases, indicating that the waveguide's confinement ability to the transmission mode increases with the thickness of the low-index dielectric layer, and the real part of the TM mode's effective index is larger than that of the TE mode.
It will be appreciated by those skilled in the art that the invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. The embodiments disclosed above are therefore to be considered in all respects as illustrative and not restrictive. All changes which come within the scope of or equivalence to the invention are intended to be embraced therein.
Claims (2)
1. The mixed plasmon waveguide capable of simultaneously supporting TE (transverse electric) and TM (transverse magnetic) modes is characterized by comprising a plasmon waveguide formed by mixing a vertical direction and a horizontal direction, wherein the plasmon waveguide in the vertical direction is formed by three layers of materials, including a first layer of high-refractive-index material, a second layer of low-refractive-index material and a third layer of metal material, the plasmon waveguide in the horizontal direction is formed by three layers of materials, including a first layer of high-refractive-index material, a second layer of low-refractive-index material and a third layer of metal material, the high-refractive-index material of the first layer in the horizontal direction is consistent with the high-refractive-index material of the first layer in the vertical direction in structure, and the second layer structures in the vertical direction and the horizontal direction are both positioned between the first layer and the third layer;
the plasmon waveguide in the vertical direction and the plasmon waveguide in the horizontal direction are both made of SiO2Is a substrate;
the high-refractive-index materials of the first layer of the plasmon waveguide in the vertical direction and the horizontal direction are all Si, and the refractive index of the high-refractive-index materials is 3.478; the height of the high refractive index material Si is 100-400nm, and the width is 100-300 nm;
the low-refractive-index material of the second layer of the vertical plasmon waveguide is SiO2A refractive index of 1.44;
the widths of the low-refractive-index materials of the second layer of the plasmon waveguide in the vertical direction and the horizontal direction are both 30-80 nm;
the third layer of the plasmon waveguide in the vertical direction and the horizontal direction is made of Ag;
and the low-refractive-index material of the second layer of the plasmon waveguide in the horizontal direction is dielectric air, and the refractive index of the low-refractive-index material is 1.
2. The hybrid plasmon waveguide capable of supporting both TE and TM modes according to claim 1, wherein: the working wavelength of the mixed plasmon waveguide is 1550 nm.
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| CN103558661B (en) * | 2013-11-11 | 2016-04-13 | 东南大学 | A kind of integrated polarizing converter based on silica-based L shape waveguiding structure |
| CN105093408B (en) * | 2015-09-22 | 2018-03-20 | 东南大学 | A kind of silica-based nanowire polarization beam apparatus based on schema evolution principle |
| CN105842787B (en) * | 2016-05-30 | 2019-09-03 | 东南大学 | A kind of polarization rotator based on plasma waveguide |
| CN205982716U (en) * | 2016-08-23 | 2017-02-22 | 南京邮电大学 | Polarization beam splitter based on graphite alkene is mixed equal from excimer waveguide |
| CN108051889B (en) * | 2017-12-15 | 2019-09-03 | 东南大学 | A kind of slot type waveguide TE mould analyzer of mixing plasma effect auxiliary |
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