CN111910220A - Preparation method of metallic three-dimensional microstructure - Google Patents

Preparation method of metallic three-dimensional microstructure Download PDF

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CN111910220A
CN111910220A CN202010794373.6A CN202010794373A CN111910220A CN 111910220 A CN111910220 A CN 111910220A CN 202010794373 A CN202010794373 A CN 202010794373A CN 111910220 A CN111910220 A CN 111910220A
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electroforming
metallic
layer
microstructure
dimensional microstructure
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钱双庆
赵勇飞
季峰
吕慧琳
刘岩
韩蕾
张华�
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Nantong University
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/0033D structures, e.g. superposed patterned layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/10Moulds; Masks; Masterforms

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  • Chemical Kinetics & Catalysis (AREA)
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  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

The invention provides a preparation method of a metallic three-dimensional microstructure, which comprises the following steps: s10, preparing a core mold with a microstructure; s20 performing a conductive treatment on the mandrel to form a first conductive layer, removing the first conductive layer on the top of the mandrel, and forming an electroformed cathode with the remaining first conductive layer and the mandrel; s30 electroforming a first electroformed layer on the electroformed cathode; s40, conducting treatment is carried out on the top of the first electroforming layer to obtain a second conducting layer, and electroforming is carried out on the second conducting layer to obtain a second electroforming layer; and S50 removing the mandrel to obtain the metallic three-dimensional microstructure. According to the preparation method of the metal three-dimensional microstructure, the metal three-dimensional microstructure is obtained by electroforming on the surface of the core mould by using a layered electroforming method, and the core mould is obtained by using a 3D printing technology.

Description

一种金属质三维微结构的制备方法A kind of preparation method of metallic three-dimensional microstructure

技术领域technical field

本发明涉及电化学制造技术领域,具体涉及一种金属质三维微结构的制备方法。The invention relates to the technical field of electrochemical manufacturing, in particular to a preparation method of a metallic three-dimensional microstructure.

背景技术Background technique

现如今,世界经济已经从工业化转向信息化的发展阶段,高新技术正在向着微型化、集成化、智能化方向发展,在工业制造领域中微型化制造已成为密不可分的一部分,其本质都是围绕着“微型化”。微结构在其中扮演着重要角色,能够使物体实现特定的物理、化学等功能。因此,金属微结构被广泛应用在航天航空、电子仪器、通讯设备、生物医学、光学设备等领域。而微结构的特征尺寸和尺寸精度对零件的性能起着决定性影响,随着零件的尺寸越来越微型化,对材料表面的加工要求也越来越高,其制备工艺成为当前科学技术研究的前沿和热点之一。Today, the world economy has shifted from industrialization to informatization. High-tech is developing towards miniaturization, integration, and intelligence. In the field of industrial manufacturing, miniaturization has become an inseparable part of its essence. "Miniaturization". Microstructure plays an important role in it, enabling objects to achieve specific physical, chemical and other functions. Therefore, metal microstructures are widely used in aerospace, electronic instruments, communication equipment, biomedicine, optical equipment and other fields. The characteristic size and dimensional accuracy of the microstructure have a decisive impact on the performance of the part. As the size of the part becomes more and more miniaturized, the processing requirements for the surface of the material are also getting higher and higher, and its preparation process has become the focus of current scientific and technological research. One of the front and hot spots.

表面微结构种类繁多,可根据维数、尺度大小和实现功能进行分类。按维数可分为一维线性结构、二维面结构和三维立体结构;根据微结构的尺度可分为纳微结构、亚微结构和宏观微结构。不同形貌的微结构可以实现不同的性能,例如信号传输、减阻减摩、热能交换等功能。馈源喇叭中波纹微结构可以实现传输和接受太赫兹波信号。发动机活塞/缸套表面加工微小凹坑阵列可以有效降低发动机的磨损。热管中的沟槽结构可以实现热量交换。There are a wide variety of surface microstructures, which can be classified according to dimensionality, scale size, and implementation function. According to the dimension, it can be divided into one-dimensional linear structure, two-dimensional surface structure and three-dimensional structure; according to the scale of microstructure, it can be divided into nano-micro structure, sub-micro structure and macro-micro structure. Microstructures with different morphologies can achieve different performances, such as signal transmission, drag reduction and friction reduction, and heat energy exchange. The corrugated microstructure in the feed horn can transmit and receive terahertz wave signals. The surface of the engine piston/cylinder liner is processed with an array of tiny pits, which can effectively reduce the wear of the engine. The groove structure in the heat pipe can realize the heat exchange.

由于表面微结构尺度较小,在加工时不仅要满足一定的精度和成形质量,而且对加工环境也有严格的要求。表面微结构的加工方法主要分为机械加工技术和特种加工技术。机械加工技术主要由旋压成形、微塑性成形、微细切削加工等组成。特种加工技术包括电火花加工、激光加工、电解加工、电铸工艺等。旋压成形在加工过程中刀具损耗较大;微塑性成形工艺需要较大成形力,模具磨损大,工件会残余较大应力,而且金属板材容易发生变形;微细切削工艺加工速度较慢,无法加工硬度高于刀具的材料,且工件残余较大应力。电火花加工是利用高温来蚀除材料,可能导致工件发生变形,而且存在加工速度慢和电极损耗等问题;激光加工过程中,氧化现象和易覆盖在加工表面的熔渣和熔融物质极大地制约了加工表面的质量;电解加工的定域性不高、电解产物难以排出加工区域。Due to the small size of the surface microstructure, not only a certain precision and forming quality must be met during processing, but also strict requirements on the processing environment. The processing methods of surface microstructure are mainly divided into mechanical processing technology and special processing technology. Machining technology is mainly composed of spinning forming, microplastic forming, micro-cutting and so on. Special machining technologies include EDM, laser machining, electrolytic machining, electroforming, etc. Spinning has a large tool loss during processing; the microplastic forming process requires a large forming force, the mold wear is large, the workpiece will have a large residual stress, and the metal sheet is prone to deformation; the micro-cutting process has a slow processing speed and cannot be processed. The hardness of the material is higher than that of the tool, and the residual stress of the workpiece is large. EDM uses high temperature to remove materials, which may cause deformation of the workpiece, and there are problems such as slow processing speed and electrode loss; during laser processing, oxidation and slag and molten substances that easily cover the machined surface greatly restrict The quality of the machined surface is improved; the localization of electrolytic machining is not high, and the electrolytic products are difficult to discharge from the machining area.

使用传统的加工方法对金属三维微结构制备存在工件精度不高、均匀性较差、残余应力较大以及微结构深宽比不高的问题,Using traditional processing methods to prepare metal three-dimensional microstructures has the problems of low workpiece precision, poor uniformity, large residual stress and low aspect ratio of microstructures.

发明内容SUMMARY OF THE INVENTION

为了解决上述问题,本发明提供一种金属质三维微结构的制备方法,使用分层电铸的方法在芯模表面电铸获得金属质三维微结构,所述芯模通过3D打印技术获得,与传统制备方法相比,制备精度高、电铸层均匀性好,可以用来制备深宽比大的金属质三维微结构。In order to solve the above problems, the present invention provides a method for preparing a metallic three-dimensional microstructure. The metal three-dimensional microstructure is obtained by electroforming on the surface of a core mold by using a layered electroforming method, and the core mold is obtained by 3D printing technology. Compared with the traditional preparation method, the preparation precision is high and the uniformity of the electroformed layer is good, and it can be used to prepare a metallic three-dimensional microstructure with a large aspect ratio.

为了实现以上目的,本发明采取的一种技术方案是:In order to realize the above purpose, a kind of technical scheme that the present invention adopts is:

一种金属质三维微结构的制备方法,包括如下步骤:S10制备具有微结构的芯模;S20将所述芯模进行导电化处理形成第一导电层,将所述芯模的顶部的所述第一导电层去除,剩余的所述第一导电层与所述芯模形成了电铸阴极;S30在所述电铸阴极上进行电铸获得第一电铸层;S40在所述第一电铸层的顶部进行导电处理后获得第二导电层,在所述第二导电层上继续电铸获得第二电铸层;以及S50去除所述芯模,获得金属质三维微结构。A method for preparing a metallic three-dimensional microstructure, comprising the steps of: S10 preparing a core mold with a microstructure; S20 conducting conductive treatment on the core mold to form a first conductive layer, and placing the core mold on the top of the core mold The first conductive layer is removed, and the remaining first conductive layer and the core mold form an electroforming cathode; S30, perform electroforming on the electroforming cathode to obtain a first electroforming layer; S40, perform electroforming on the first electroforming cathode. The top of the cast layer is subjected to conductive treatment to obtain a second conductive layer, and electroforming is continued on the second conductive layer to obtain a second electroformed layer; and S50, the core mold is removed to obtain a metallic three-dimensional microstructure.

进一步地,所述具有微结构的非金属基体通过3D打印技术打印获得。Further, the non-metallic substrate with microstructure is obtained by printing with 3D printing technology.

进一步地,所述芯模的为非金属材料。Further, the core mold is made of non-metallic material.

进一步地,所述第一电铸层与所述电铸阴极的顶部在同一平面内。Further, the first electroformed layer and the top of the electroformed cathode are in the same plane.

本发明的上述技术方案相比现有技术具有以下优点:The above-mentioned technical scheme of the present invention has the following advantages compared with the prior art:

(1)本发明的一种金属质三维微结构的制备方法,使用分层电铸的方法在芯模表面电铸获得金属质三维微结构,所述芯模通过3D打印技术获得,与传统制备方法相比,制备精度高、电铸层均匀性好,可以用来制备深宽比大的金属质三维微结构;(1) In a method for preparing a metallic three-dimensional microstructure of the present invention, a metal three-dimensional microstructure is obtained by electroforming on the surface of a core mold by using a layered electroforming method. Compared with the method, the preparation precision is high and the electroformed layer uniformity is good, and it can be used to prepare a metallic three-dimensional microstructure with a large aspect ratio;

(2)本发明的一种金属质三维微结构的制备方法,由于电铸层是通过金属离子堆积而成,因而它可以精密复制阴极表面结构,理论上可达离子级加工精度,所成形的零件能够精确复制阴极形状及其表面微结构,可以用来制作异型、复杂的精密零件;(2) In a method for preparing a metallic three-dimensional microstructure of the present invention, since the electroformed layer is formed by the accumulation of metal ions, it can precisely replicate the surface structure of the cathode, and theoretically achieve ion-level machining accuracy. The parts can accurately replicate the cathode shape and its surface microstructure, and can be used to make special-shaped and complex precision parts;

(3)本发明的一种金属质三维微结构的制备方法,在制备的过程中并未引入杂质离子和污染源,提高了制备工艺的环保性能。(3) The preparation method of a metallic three-dimensional microstructure of the present invention does not introduce impurity ions and pollution sources in the preparation process, thereby improving the environmental protection performance of the preparation process.

附图说明Description of drawings

下面结合附图,通过对本发明的具体实施方式详细描述,将使本发明的技术方案及其有益效果显而易见。The technical solutions of the present invention and its beneficial effects will be apparent through the detailed description of the specific embodiments of the present invention below in conjunction with the accompanying drawings.

图1所示为本发明一实施例的金属质三维微结构的制备方法流程图;1 is a flow chart of a method for preparing a metallic three-dimensional microstructure according to an embodiment of the present invention;

图2~8所示为本发明一实施例的所述金属质三维微结构的制备过程图;2 to 8 are diagrams illustrating the preparation process of the metallic three-dimensional microstructure according to an embodiment of the present invention;

图9所示为本发明一实施例的非金属基体实物图;FIG. 9 shows a physical diagram of a non-metallic substrate according to an embodiment of the present invention;

图10所示为本发明一实施例的非金属基体实物沟槽放大图;FIG. 10 is an enlarged view of a real trench of a non-metallic substrate according to an embodiment of the present invention;

图11所示为本发明一实施例的通过本方法获得金属质三维微结构的实物图;FIG. 11 shows a physical diagram of obtaining a metallic three-dimensional microstructure by this method according to an embodiment of the present invention;

图12所示为本发明一实施例的金属质三维微结构扫描电子显微镜测得的微沟槽横截面图;12 is a cross-sectional view of a microgroove measured by a scanning electron microscope of a metallic three-dimensional microstructure according to an embodiment of the present invention;

图13所示为本发明一实施例的金属质三维微结构的三维形貌图。FIG. 13 is a three-dimensional topography diagram of a metallic three-dimensional microstructure according to an embodiment of the present invention.

图中附图标记:Reference numbers in the figure:

1芯模、2第一导电层、3电铸阴极、4第一电铸层、5第二导电层、6第二电铸层、7金属质三维微结构。1 core mold, 2 first conductive layer, 3 electroformed cathode, 4 first electroformed layer, 5 second conductive layer, 6 second electroformed layer, 7 metallic three-dimensional microstructure.

具体实施方式Detailed ways

下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts shall fall within the protection scope of the present invention.

本实施例提供了一种金属质三维微结构的制备方法,如图1所示,包括如下步骤:S10制备具有微结构的芯模1。S20将所述芯模1进行导电化处理形成第一导电层2,将所述芯模1的顶部的所述第一导电层2去除,剩余的所述第一导电层2与所述芯模1形成了电铸阴极3。S30在所述电铸阴极3上进行电铸获得第一电铸层4。S40在所述第一电铸层4的顶部进行导电处理后获得第二导电层5,在所述第二导电层5上继续电铸获得第二电铸层6。以及S50去除所述芯模1,获得金属质三维微结构。This embodiment provides a method for preparing a metallic three-dimensional microstructure, as shown in FIG. 1 , including the following steps: S10 , preparing a core mold 1 having a microstructure. S20 Conducting conductive treatment on the core mold 1 to form a first conductive layer 2, removing the first conductive layer 2 on the top of the core mold 1, and the remaining first conductive layer 2 and the core mold 1 An electroformed cathode 3 is formed. S30 Perform electroforming on the electroforming cathode 3 to obtain a first electroforming layer 4 . S40 , a second conductive layer 5 is obtained after conducting conductive treatment on the top of the first electroformed layer 4 , and a second electroformed layer 6 is obtained by continuing electroforming on the second conductive layer 5 . and S50 to remove the core mold 1 to obtain a metallic three-dimensional microstructure.

电铸成型是利用电沉积的方法在阴极芯模上还原、沉积金属离子,然后将金属沉积层与阴极芯模分离获取零件的一种特种加工方法。由于电铸层是通过金属离子堆积而成,因而它可以精密复制阴极表面结构,理论上可达离子级加工精度。所成形的零件能够精确复制阴极形状及其表面微结构,可以用来制作异型、复杂的精密零件。Electroforming is a special processing method that uses electrodeposition to reduce and deposit metal ions on the cathode core mold, and then separate the metal deposition layer from the cathode core mold to obtain parts. Since the electroformed layer is formed by the accumulation of metal ions, it can precisely replicate the surface structure of the cathode, and theoretically it can achieve ion-level machining accuracy. The formed parts can accurately replicate the cathode shape and its surface microstructure, and can be used to make special-shaped and complex precision parts.

所述S10所述具有微结构的非金属基体通过3D打印技术打印获得。所述芯模1的为非金属材料。所述S20所述第一电铸层4与所述电铸阴极3的顶部在同一平面内。The non-metallic substrate with microstructure described in S10 is obtained by printing with 3D printing technology. The core mold 1 is made of non-metallic material. In S20, the first electroformed layer 4 and the top of the electroformed cathode 3 are in the same plane.

以制备如图2所示金属质三维微结构7为例对本发明的制备方法进行说明:Taking the preparation of the metallic three-dimensional microstructure 7 as shown in FIG. 2 as an example, the preparation method of the present invention will be described:

如图3所示,S10通过3D打印技术打印制备具有微结构的芯模1。As shown in Figure 3, S10 prints a core mold 1 with a microstructure by 3D printing technology.

如图4所示,S20将所述芯模1进行导电化处理形成第一导电层2,如图5所示,将所述芯模1的顶部的所述第一导电层2去除,剩余的所述第一导电层2与所述芯模1形成了电铸阴极3。As shown in FIG. 4 , S20 conducts conductive treatment on the core mold 1 to form a first conductive layer 2 . As shown in FIG. 5 , the first conductive layer 2 on the top of the core mold 1 is removed, and the remaining The first conductive layer 2 and the core mold 1 form an electroforming cathode 3 .

如图6所示,如图S30在所述电铸阴极3上进行电铸获得第一电铸层4。As shown in FIG. 6 , electroforming is performed on the electroforming cathode 3 as shown in FIG. S30 to obtain the first electroforming layer 4 .

如图7所示,S40在所述第一电铸层4的顶部进行导电处理后获得第二导电层5,如图8所示,在所述第二导电层5上继续电铸获得第二电铸层6。As shown in FIG. 7 , in S40 , a second conductive layer 5 is obtained after conducting conductive treatment on the top of the first electroforming layer 4 . As shown in FIG. 8 , electroforming is continued on the second conductive layer 5 to obtain a second conductive layer 5 . Electroformed layer 6.

S50去除所述芯模1,获得金属质三维微结构7。S50 , the core mold 1 is removed to obtain a metallic three-dimensional microstructure 7 .

如图9~13所示,使用本发明的金属质三维微结构的制备方法获得金属质三维微结构7,微沟槽的深度为547μm,宽度为355μm,而复制前阴极模板上微沟槽的深度为600μm,宽度为300μm。该制备工艺制备的微结构复制精度较高,采用分层电铸的方式制备的铸层均匀性较好,没有出现厚度不均的现象,避免了铸层空洞的出现,从而提高了微结构的质量和性能。As shown in FIGS. 9 to 13 , a metallic three-dimensional microstructure 7 is obtained by using the method for preparing a metallic three-dimensional microstructure of the present invention. The depth of the microgrooves is 547 μm and the width is 355 μm, while the microgrooves on the front cathode template are replicated. The depth is 600 μm and the width is 300 μm. The microstructure prepared by this preparation process has high replication accuracy, and the cast layer prepared by layered electroforming has better uniformity, and there is no phenomenon of uneven thickness, which avoids the appearance of voids in the cast layer, thereby improving the microstructure. quality and performance.

以上所述仅为本发明的示例性实施例,并非因此限制本发明专利保护范围,凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本发明的专利保护范围内。The above descriptions are only exemplary embodiments of the present invention, and are not intended to limit the scope of patent protection of the present invention. Any equivalent structure or equivalent process transformation made by using the contents of the description and drawings of the present invention, or directly or indirectly applied to other related The technical field of the present invention is similarly included in the scope of patent protection of the present invention.

Claims (4)

1.一种金属质三维微结构的制备方法,其特征在于,包括如下步骤:1. a preparation method of metallic three-dimensional microstructure, is characterized in that, comprises the steps: S10制备具有微结构的芯模;S10 prepares a mandrel with a microstructure; S20将所述芯模进行导电化处理形成第一导电层,将所述芯模的顶部的所述第一导电层去除,剩余的所述第一导电层与所述芯模形成了电铸阴极;S20 Conducting conductive treatment on the core mold to form a first conductive layer, removing the first conductive layer on the top of the core mold, and forming an electroforming cathode with the remaining first conductive layer and the core mold ; S30在所述电铸阴极上进行电铸获得第一电铸层;S30, performing electroforming on the electroforming cathode to obtain a first electroforming layer; S40在所述第一电铸层的顶部进行导电处理后获得第二导电层,在所述第二导电层上继续电铸获得第二电铸层;以及S40 after conducting conductive treatment on the top of the first electroforming layer to obtain a second conductive layer, and continuing electroforming on the second conductive layer to obtain a second electroforming layer; and S50去除所述芯模,获得金属质三维微结构。S50 removes the core mold to obtain a metallic three-dimensional microstructure. 2.根据权利要求1所述的金属质三维微结构的制备方法,其特征在于,所述具有微结构的非金属基体通过3D打印技术打印获得。2 . The method for preparing a metallic three-dimensional microstructure according to claim 1 , wherein the non-metallic substrate with the microstructure is obtained by printing with a 3D printing technology. 3 . 3.根据权利要求1所述的金属质三维微结构的制备方法,其特征在于,所述芯模的为非金属材料。3 . The method for preparing a metallic three-dimensional microstructure according to claim 1 , wherein the core mold is made of a non-metallic material. 4 . 4.根据权利要求1所述的金属质三维微结构的制备方法,其特征在于,所述第一电铸层与所述电铸阴极的顶部在同一平面内。4 . The method for preparing a metallic three-dimensional microstructure according to claim 1 , wherein the first electroformed layer and the top of the electroformed cathode are in the same plane. 5 .
CN202010794373.6A 2020-08-10 2020-08-10 Preparation method of metallic three-dimensional microstructure Pending CN111910220A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113072035A (en) * 2021-03-29 2021-07-06 上海航天测控通信研究所 Method for manufacturing terahertz rectangular circular waveguide electroforming core mold microstructure

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
吴媛媛等: "基于3D打印技术的微沟槽金属铜电铸工艺", 《电镀与涂饰》 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113072035A (en) * 2021-03-29 2021-07-06 上海航天测控通信研究所 Method for manufacturing terahertz rectangular circular waveguide electroforming core mold microstructure

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Application publication date: 20201110