CN111893446A - 一种强织构的金属复合基带的制备方法 - Google Patents
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- MOWMLACGTDMJRV-UHFFFAOYSA-N nickel tungsten Chemical compound [Ni].[W] MOWMLACGTDMJRV-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000000151 deposition Methods 0.000 claims abstract description 9
- 238000005098 hot rolling Methods 0.000 claims abstract description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 7
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical group [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
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Abstract
本发明公开了一种强织构的金属复合基带的制备方法，采用熔炼法获得合金铸锭，其成分为：9.5at.%~12at.%W，余量为Ni，采用热轧获得镍钨合金热轧板材，对热轧板材进行大变形量冷轧至80~100μm厚获得冷轧带材，将冷轧带材表面清洗干净，然后在冷轧带材表面沉积铜薄膜获得复合带材，最后对复合带材进行退火处理获得高性能的金属复合基带。本发明有效避免了对高强度镍钨合金进行织构优化，而是在高强度、无铁磁性的镍钨合金带材表面沉积一层铜薄膜，通过沉积工艺调整可以在薄膜中形成强的织构，该方法保留了镍钨合金的高力学性能和无铁磁性，从而最终获得高性能金属复合基带。
Description
技术领域
本发明涉及一种强织构的金属复合基带的制备方法，属于第二代涂层超导带材用织构金属基底的制备技术领域。
背景技术
高温超导带材具有特殊的物理性能，使其在交通、军事等诸多领域均有广泛的应用价值，自第二代高温涂层超导带材被发明以来，人们掀起了涂层超导研究的热潮，在韧性的强立方织构金属基底上外延生长缓冲层及超导层是制备第二代涂层超导带材的主要方法之一，金属基底的作用是外延生长外层薄膜，薄膜的织构对超导带材的电学性能有重要的影响，具有强立方织构的超导层且具有高的临界电流密度，而强立方织构的金属基底是制备强织构薄膜的关键，因此，金属基带的强织构问题是金属基带领域研究的重点。除了对金属基带具有强立方织构的要求外，金属基带还应具有高的屈服强度，并且在液氮温区无铁磁性。目前，商业化的Ni-5at.%W合金基带容易获得强立方织构，但是其在室温下的屈服强度不高，并且在液氮温区具有铁磁性。研究表明，增加钨原子的含量可以有效提高镍钨合金的屈服强度，并且可以降低磁性能，但是通过传统的方法难以形成强立方织构，故高性能的金属基带的制备仍然存在很大的困难，如何开发新的合金体系来制备高性能的金属基带，具有重要的研究价值和工业意义。
发明内容
本发明的目的是提供了一种强织构的金属复合基带的制备方法，该方法最终能够获得高性能的金属复合基带。
本发明为实现上述目的采用如下技术方案，一种强织构的金属复合基带的制备方法，其特征在于具体步骤为：
步骤S1：初始坯锭的制备
采用真空感应熔炼获得合金铸锭，其成分为：9.5at.%~12at.% W，余量为Ni，再采用热轧获得镍钨合金热轧板材，厚度为7~9mm，热轧温度控制在1000~1200℃；
步骤S2：对热轧板材进行冷轧
将步骤S1得到的热轧板材进行大变形量冷轧至80~100μm厚，冷轧中间无退火处理，冷轧最后一道次变形量为10%~18%，表面粗糙度Ra控制在0.2~0.8μm，最终获得冷轧带材；
步骤S3：冷轧带材表面沉积薄膜
将步骤S2得到的冷轧带材表面清洗干净，再在冷轧带材表面沉积铜薄膜获得复合带材，薄膜厚度为0.5~10μm，薄膜纯度为99.99%以上，沉积方法为磁控溅射法，其中溅射功率为200~250W，溅射温度为120~200℃；
步骤S4：复合带材的退火
将步骤S3得到的复合带材进行高温退火，高温退火工艺为：随炉升温的方式加热至800℃保温1~2小时，再随炉冷却至室温，最终获得强织构的金属复合基带。
本发明与现有技术相比具有以下有益效果：本发明有效避免了对高强度镍钨合金进行织构优化，而是在高强度、无铁磁性的镍钨合金带材表面沉积一层铜薄膜，通过沉积工艺调整可以在薄膜中形成强的织构，该方法保留了镍钨合金的高力学性能和无铁磁性，从而最终获得高性能的金属复合基带。
附图说明
图1是实施例1制得金属复合带材的Φ扫描图；
图2是实施例2制得金属复合基带的Φ扫描图。
具体实施方式
下面结合附图对本发明做进一步的详细说明。本发明采用美国QUATEK INC铁电工作仪测定了所制备的聚合物基柔性复合薄膜材料的储能性能，以上性能参数皆在室温下测得。
实施例1
采用真空感应熔炼获得合金铸锭，其成分为：10at.%W，余量为Ni。然后采用热轧获得镍钨合金热轧板材，厚度为7mm，热轧温度控制在1200℃。对该热轧板材进行大变形量冷轧至80μm厚，冷轧中间无退火处理，冷轧最后一道次变形量为10%，表面粗糙度Ra控制在0.2μm。将该冷轧带材表面清洗干净，然后在冷轧带材表面沉积铜薄膜获得复合带材，薄膜厚度为10μm，薄膜纯度为99.99%，沉积方法为磁控溅射法，其中溅射功率为200W，溅射温度为120℃。将该复合带材进行高温退火，高温退火工艺为：随炉升温的方式加热至800℃保温1小时，然后随炉冷却至室温，最终获得强织构的金属复合基带。该金属复合基带表面的Φ扫描如图1所示，该金属复合基带在室温下的屈服强度为730MPa，明显高于Ni-5at.%W合金基带的屈服强度。
实施例2
采用真空感应熔炼获得合金铸锭，其成分为：12at.%W，余量为Ni。然后采用热轧获得镍钨合金热轧板材，厚度为9mm，热轧温度控制在1000℃。对该热轧板材进行大变形量冷轧至100μm厚，冷轧中间无退火处理，冷轧最后一道次变形量为18%，表面粗糙度Ra控制在0.8μm。将该冷轧带材表面清洗干净，然后在冷轧带材表面沉积铜薄膜获得复合带材，薄膜厚度为0.5μm，薄膜纯度为99.99%，沉积方法为磁控溅射法，其中溅射功率为250W，溅射温度为200℃。将该复合带材进行高温退火，高温退火工艺为：随炉升温的方式加热至800℃保温2小时，然后随炉冷却至室温，最终获得强织构的金属复合基带。该金属复合基带表面的Φ扫描如图2所示，该金属复合基带在室温下的屈服强度为750MPa，明显高于Ni-5at.%W合金基带的屈服强度。
以上显示和描述了本发明的基本原理，主要特征和优点，在不脱离本发明精神和范围的前提下，本发明还有各种变化和改进，这些变化和改进都落入要求保护的本发明的范围。
Claims (1)
1.一种强织构的金属复合基带的制备方法，其特征在于具体步骤为：
步骤S1：初始坯锭的制备
采用真空感应熔炼获得合金铸锭，其成分为：9.5at.%~12at.% W，余量为Ni，再采用热轧获得镍钨合金热轧板材，厚度为7~9mm，热轧温度控制在1000~1200℃；
步骤S2：对热轧板材进行冷轧
将步骤S1得到的热轧板材进行大变形量冷轧至80~100μm厚，冷轧中间无退火处理，冷轧最后一道次变形量为10%~18%，表面粗糙度Ra控制在0.2~0.8μm，最终获得冷轧带材；
步骤S3：冷轧带材表面沉积薄膜
将步骤S2得到的冷轧带材表面清洗干净，再在冷轧带材表面沉积铜薄膜获得复合带材，薄膜厚度为0.5~10μm，薄膜纯度为99.99%以上，沉积方法为磁控溅射法，其中溅射功率为200~250W，溅射温度为120~200℃；
步骤S4：复合带材的退火
将步骤S3得到的复合带材进行高温退火，高温退火工艺为：随炉升温的方式加热至800℃保温1~2小时，再随炉冷却至室温，最终获得强织构的金属复合基带。
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004060900A1 (de) * | 2004-12-14 | 2006-06-29 | Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. | Halbzeug auf Nickelbasis mit Würfeltextur und Verfahren zu seiner Herstellung |
| CN109536907A (zh) * | 2018-12-27 | 2019-03-29 | 河南城建学院 | 一种高强度强立方织构层状复合基带及其制备方法 |
| CN109576644A (zh) * | 2018-12-14 | 2019-04-05 | 北京工业大学 | 一种制备涂层导体用高钨合金基带的方法 |
| CN109811310A (zh) * | 2019-01-21 | 2019-05-28 | 河南工学院 | 无铁磁性、高强度、强立方织构镍钨复合基带及制备方法 |
| CN111101007A (zh) * | 2020-01-13 | 2020-05-05 | 周口师范学院 | 一种高性能镍基合金复合带材的制备方法 |
| CN111180134A (zh) * | 2020-01-16 | 2020-05-19 | 河南城建学院 | 一种强立方织构金属复合带材的制备方法 |
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004060900A1 (de) * | 2004-12-14 | 2006-06-29 | Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. | Halbzeug auf Nickelbasis mit Würfeltextur und Verfahren zu seiner Herstellung |
| CN109576644A (zh) * | 2018-12-14 | 2019-04-05 | 北京工业大学 | 一种制备涂层导体用高钨合金基带的方法 |
| CN109536907A (zh) * | 2018-12-27 | 2019-03-29 | 河南城建学院 | 一种高强度强立方织构层状复合基带及其制备方法 |
| CN109811310A (zh) * | 2019-01-21 | 2019-05-28 | 河南工学院 | 无铁磁性、高强度、强立方织构镍钨复合基带及制备方法 |
| CN111101007A (zh) * | 2020-01-13 | 2020-05-05 | 周口师范学院 | 一种高性能镍基合金复合带材的制备方法 |
| CN111180134A (zh) * | 2020-01-16 | 2020-05-19 | 河南城建学院 | 一种强立方织构金属复合带材的制备方法 |
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