CN111854020A - Infrared radiation humidifying device and humidifying method thereof - Google Patents
Infrared radiation humidifying device and humidifying method thereof Download PDFInfo
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- F24F6/00—Air-humidification, e.g. cooling by humidification
- F24F6/02—Air-humidification, e.g. cooling by humidification by evaporation of water in the air
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- F24F6/12—Air-humidification, e.g. cooling by humidification by forming water dispersions in the air
- F24F6/14—Air-humidification, e.g. cooling by humidification by forming water dispersions in the air using nozzles
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F2110/00—Control inputs relating to air properties
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Abstract
The invention discloses an infrared radiation humidifying device and a humidifying method thereof. Wherein the main cavity is an evaporation cavity; the infrared wave device consists of a spiral shaped special-shaped infrared generator and an infrared controller and is used for providing infrared waves with certain wave spectrum and power; the liquid phase water supply device consists of a liquid supply control diaphragm valve and an atomizing nozzle, the carrier gas flow passage comprises a dry gas supply flow passage and a wet gas outlet flow passage, and a temperature sensor and a liquid level sensor are arranged in the evaporation type cavity and used for ensuring the internal temperature of the evaporation cavity and controlling the internal residual liquid amount; the droplet removing device is used for filtering and removing unvaporized droplets entrained in the wet gas; the infrared radiation mode is adopted to accelerate the evaporation of the water mist, and the device has the advantages of adjustable humidification quantity, small temperature difference between the carrier gas inlet and the carrier gas outlet, no influence on the ambient temperature due to working conditions and the like, is high in humidification efficiency, and improves the high cleanliness of the ambient gas.
Description
Technical Field
The invention relates to a gas humidifying device, in particular to a humidifying device and a humidifying method thereof which are used in semiconductor industrial production and have high-cleanliness environmental gas requirements.
Background
In many occasions in the semiconductor industry, high-cleanliness gas is required to be used, and the adjustment and control of the humidity of the gas is also one of the common gas processing flows. For example, the applicant mentioned in chinese patent application No. 201711395951.3 that an immersion lithography machine supplies air with high relative humidity above a silicon wafer to reduce evaporation of immersion liquid on the wafer and prevent the wafer from being deformed due to cooling. The existing traditional gas humidification technology mainly adopts the following steps: ultrasonic atomization humidification, packed tower bubbling humidification and spray cooling humidification; although the novel gas humidification technology includes hollow fiber membrane humidification, mass transfer membrane humidification and the like. In the humidification technology, the mass transfer process is humidified by the water vapor transfer membrane, and the mass transfer power is the concentration difference of water vapor at the gas-liquid interface; the specific surface area of gas-liquid contact and the concentration gradient of vapor at the gas-liquid two-phase interface in the humidification process are main factors for determining the humidification efficiency; the above conventional gas humidification techniques have certain limitations: for example, the humidification efficiency is low, the influence of ambient temperature is large, the humidification is not controllable or the control efficiency is low; although the hollow fiber membrane and the mass transfer membrane have high humidifying efficiency and high cleanliness, the defects of narrow temperature application range and uncontrollable humidifying humidity exist; furthermore, the devices and materials used in the conventional gas mass transfer humidification method may also be difficult to meet the gas cleanliness requirements of the semiconductor industry, thereby reducing the high cleanliness of the ambient gas.
Disclosure of Invention
The invention provides an infrared radiation humidifying device and a humidifying method thereof, which can improve the humidifying efficiency, are low in influence of the ambient temperature, improve the temperature application range and improve the high cleanliness of ambient gas, and solve the problems that the existing humidifying device used in the semiconductor industrial production and having the requirement of high cleanliness of ambient gas has the defects of low humidifying efficiency, large influence of the ambient temperature, uncontrollable humidifying, low control efficiency, narrow temperature application range, uncontrollable humidifying humidity and the like.
The invention adopts the following specific technical scheme for solving the technical problems: an infrared radiation humidifying device comprises an evaporation chamber, a liquid phase water supply device, a carrier gas flow channel and a controller, wherein the liquid phase water supply device comprises a liquid supply control valve and an atomizing nozzle, and is characterized in that: the liquid phase water evaporation device also comprises an infrared heater, wherein the infrared heater is positioned in the evaporation chamber and is used for providing infrared waves to gasify the liquid phase water; the carrier gas flow passage comprises a dry gas inlet and a wet gas outlet, the rear stage of the wet gas outlet is connected with the gas output flow passage, a downstream pipeline of the rear stage gas output flow passage of the wet gas outlet is provided with a liquid drop removing device, and the liquid drop removing device is used for removing unvaporized small liquid drops carried in the wet gas and carrying out secondary filtration to remove the liquid drops; the gas flows in the evaporating chamber from top to bottom approximately through the gas-carrying flow channel, and the wet gas outlet is positioned at the lower part of the evaporating chamber and at the upper part of the inner bottom; a temperature sensor for monitoring the internal temperature of the evaporation chamber and a liquid level sensor for monitoring the liquid level of residual liquid in the evaporation chamber are arranged in the evaporation chamber; the bottom of the evaporation chamber is provided with a liquid discharge hole and a liquid discharge control valve; the liquid phase supply device is located at the upper part of the device, and the atomizing nozzle is located at the top of the evaporation chamber. The gas humidification function is realized by using the technical combination of atomized liquid and infrared heating. The characteristics of strong penetration, quick response, different infrared spectra, selectivity of infrared absorption of materials and the like of infrared radiation are utilized, so that the micron-sized liquid drop surface at the outlet of the nozzle is quickly subjected to phase change and volatilized into carrier gas. A gas-liquid separation structure of the liquid drop removing device is arranged in a gas output flow path of the humidifying device, so that small water drops are prevented from being carried in gas. And a spiral infrared heating pipe is used to increase the coverage area of infrared rays. Can improve the humidifying efficiency, is less influenced by the ambient temperature, improves the temperature application range and improves the high cleanliness of the ambient gas.
Preferably, the infrared heater has a spiral line shape, and the infrared heater has a cylindrical spiral line shape, a reverse tapered spiral line shape with a large upper part and a small lower part, a tapered spiral line shape with a small upper part and a large lower part, or a biconical spiral line shape with a small upper end and a small middle part. The heating efficiency is improved, the lower heating temperature can be used under the condition of achieving the same gasification efficiency, and the condition of gas humidity fluctuation caused by temperature change is favorably inhibited.
Preferably, the evaporation chamber is of a cylindrical polygonal cylinder chamber structure or a substantially cylindrical chamber structure. The uniformity, stability and effectiveness of the gas humidification and heating treatment in the evaporation chamber are improved.
Preferably, the wet gas outlet is located at the periphery of the lower part of the evaporation chamber, and the wet gas outlet is in an inverted conical circular ring shape, that is, the wet gas outlet adopts an inverted conical circular ring outlet structure which extends from the inner wall surface of the evaporation chamber to the outer wall surface of the evaporation chamber in an inclined and upward manner. The reflux effectiveness of dropping and refluxing incompletely gasified liquid drops into the evaporation chamber by using gravity and the inertia of the rotation of the wet gas flow is improved.
Preferably, the atomizing nozzles may be ultrasonic atomizing nozzles, single-phase liquid atomizing nozzles or two-phase gas-liquid atomizing nozzles, and the number and arrangement of the atomizing nozzles may be determined according to the working parameters such as the gas flow rate and the temperature of the evaporation chamber 2. The atomization treatment for supplying liquid phase water is improved, and the atomization treatment has flexible, effective and reliable performance.
Preferably, one end of the dry gas inlet positioned in the evaporation chamber is provided with a gas flow homogenizing device which enables gas flow to uniformly flow into the evaporation chamber, and the gas flow homogenizing device is provided with a porous sieve plate structure which enables the flow of each part of outlet gas to be uniform and the flow rate to be stable; the airflow homogenizing device is located on the periphery of the upper part of the evaporation chamber and distributed at the position close to the inner circumferential wall surface of the evaporation chamber. The flow uniformity and the flow speed stability of each part of the outlet gas are improved, the effectiveness of uniform treatment of the gas flow of the evaporation chamber into which the dry gas enters is improved, and the effectiveness of humidification treatment is improved.
Preferably, the liquid removing device adopts a micron-sized filter or a high-efficiency gas-liquid separator. The filtration separation effectiveness of the liquid removal treatment is improved.
Preferably, the gas output flow path is provided with a relative humidity sensor and an outlet three-way valve, and the relative humidity sensor and the outlet three-way valve are both electrically connected with the controller; the relative humidity sensor is used for monitoring the relative humidity of the gas on the gas output flow path, and the outlet three-way valve is used for adjusting the flow of the output gas according to the temperature and humidity data information detected by the humidity sensor. The relative humidity detection and feedback regulation functions of the output gas are improved.
Preferably, the gas output pipeline is provided with a gas storage bottle, the gas storage bottle is arranged on the gas output pipeline at the rear stage of the liquid drop removing device, and the gas humidified by the humidifying device is firstly collected into the gas storage bottle and then is output to the downstream pipeline. And an output flow is improved, and an air storage bottle is arranged on the output flow to realize the relative humidity buffering function.
Another object of the present invention is to provide an infrared radiation humidifying method, comprising: comprises the following humidification treatment steps
a. When humidification treatment is needed, the controller controls and opens the mass flow controller arranged on the pipeline at the outer end of the dry gas inlet of the carrier gas flow channel to provide supply adjustment quantity of dry air for humidification treatment;
b. dry air to be humidified enters the airflow homogenizing device in one of the above technical solutions from a dry air inlet of the carrier airflow channel in one of the above technical solutions;
c. the dry air flows into the upper space inside the evaporation chamber from the upper end of the airflow homogenizing device uniformly;
d. the dry air flows from the upper space inside the evaporation chamber to the wet air outlet direction of the carrier gas flow channel in one of the above technical solutions from the top to the bottom;
e. The liquid phase water supply device opens the liquid supply control valve, the liquid phase water source passes through the liquid supply control valve and downwards passes through the atomizing nozzle, atomized and humidified liquid phase water is downwards sprayed out from the upper part inside the evaporation chamber, and dry air flowing from the upper space inside the evaporation chamber in the direction from top to bottom is humidified and mixed; of course, this step may also be started before the above-mentioned c step is started or started and executed synchronously with the above-mentioned c step;
f. under the control of the infrared controller, the external heater 5 starts to heat and provide infrared heating waves for generating an external heating effect; carrying out infrared heating wave heating and dehumidifying treatment on the mixed gas after humidification and mixing by using infrared heating waves; of course, this step may also be started before the start of the above-mentioned e-th step or started and executed synchronously with the above-mentioned e-th step;
g. the humidified gas after being heated and dehumidified by the infrared heating wave flows to the direction of a wet gas outlet of the carrier gas flow channel in one of the technical schemes, and then flows through the liquid drop removing device through the wet gas outlet to remove the non-gasified small liquid drops carried in the wet gas;
h. the humidified gas dehumidified by the liquid drop removing device enters a downstream pipeline from the gas output flow path to be used or stored.
And in the above step, the liquid discharge control valve is linked with the liquid level sensor to automatically discharge liquid to control the residual liquid amount in the evaporation chamber.
The gas humidifying function is realized by combining the technologies of atomized liquid and infrared heating, dry gas flows downwards from the upper part in the evaporation chamber to the wet gas outlet, the liquid-phase water supply device performs humidifying treatment on the dry gas after atomization, the infrared controller and the infrared heater also perform infrared heating and dehumidifying treatment on the humidified gas after humidification, and when the humidified gas after infrared heating and dehumidifying treatment is output to a downstream pipeline of the gas output flow path, the humidified gas further obtains the removing treatment on unvaporized small liquid drops through the liquid drop removing device, so that the more efficient humidifying and dehumidifying treatment efficiency is obtained, the influence of ambient temperature is low, the temperature application range is improved, and the high cleanliness of the ambient gas is improved.
The invention has the beneficial effects that: the characteristics of strong penetration, quick response, different infrared spectra, selectivity of infrared absorption of materials and the like of infrared radiation are utilized, so that the micron-sized liquid drop surface at the outlet of the nozzle is quickly subjected to phase change and volatilized into carrier gas. The humidifying device has the advantages of adjustable humidifying amount, controllable carrier gas flow, small carrier gas temperature difference and adjustable carrier gas outlet humidity. The humidifying cavity is made of stainless steel, the infrared lamp tube is made of quartz glass, and particle pollutants generated in the working process are few. A gas-liquid separation structure is arranged in an output passage of the device, so that small water drops are prevented from being carried in gas. And a spiral infrared heating pipe is used to increase the coverage area of infrared rays. And a humidity detection and backflow passage is arranged in the output passage, so that the outlet is further ensured to obtain gas with high relative humidity. Can improve the humidifying efficiency, is less influenced by the ambient temperature, improves the temperature application range and improves the high cleanliness of the ambient gas.
Description of the drawings:
the invention is described in further detail below with reference to the figures and the detailed description.
FIG. 1 is a schematic view of an infrared radiation humidifying device according to the present invention;
FIG. 2 is a schematic view of an infrared heater of the infrared radiation humidifying device of the present invention;
FIG. 3 is a schematic view of an infrared humidifying device according to another embodiment of the present invention;
fig. 4 is a schematic view of an infrared radiation humidifying device according to another embodiment of the present invention.
Detailed Description
Example 1:
in the embodiment shown in fig. 1, an infrared radiation humidifying device comprises an evaporation chamber 2, a liquid phase water supply device 30, a carrier gas flow channel and a controller 90, wherein the liquid phase water supply device 30 comprises a liquid supply control valve 31 and an atomizing nozzle 32, and further comprises an infrared heater 50 and an infrared controller 60, and the main body of the infrared radiation humidifying device is an evaporation chamber made of clean, heat-insulating and high-temperature-resistant materials; the infrared controller 60 is used for providing infrared waves for the infrared heater 50 to generate external heat control, the infrared heater 50 is arranged in the evaporation chamber 20, and the infrared heater is used for providing the infrared waves to gasify the liquid-phase water; the carrier gas flow channel comprises a dry gas inlet 42 and a wet gas outlet 43, wherein one end of the dry gas inlet 42 positioned in the evaporation chamber 20 is provided with a gas flow uniformizing device 41 which enables gas flow to uniformly flow into the evaporation chamber, the rear stage of the wet gas outlet 43 is connected with a gas output flow path, a downstream pipeline of the gas output flow path at the rear stage of the wet gas outlet 43 is provided with a liquid drop removing device 44, the liquid drop removing device 44 is used for removing unvaporized small liquid drops carried in wet gas and carrying out secondary filtration to remove liquid drops, and the liquid removing device 44 can be a micron-sized filter or a high-efficiency gas-liquid separator; the gas flows in the evaporating chamber 20 from top to bottom through the gas flow passage, and the wet gas outlet 43 is located at the lower part of the evaporating chamber 20 and at the upper part of the inner bottom; a temperature sensor 13 for monitoring the internal temperature of the evaporation chamber 20 and a liquid level sensor 12 for monitoring the liquid level of residual liquid in the evaporation chamber 20 are arranged in the evaporation chamber 20; the bottom of the evaporation chamber 20 is provided with a liquid discharge hole 10 and a liquid discharge control valve 11, and the liquid discharge control valve 11 is linked with the liquid level sensor 12 and used for automatically discharging liquid and controlling the residual liquid amount; the liquid phase supply device 30 is positioned at the upper part of the device, and the atomizing nozzle 32 is installed at the top of the evaporation chamber 20; the airflow uniformizing devices 41 are installed at the upper periphery of the evaporation chamber 20 and distributed at the positions close to the inner peripheral wall surface of the evaporation chamber; the infrared heater 50 has a spiral shape. The infrared controller 60 can use or refer to the infrared heating control technology in the prior art, the infrared heater 50 has a cylindrical spiral shape, the heating area of the cylindrical spiral shape is large, the heating efficiency is high, a lower heating temperature can be used under the condition of achieving the same gasification efficiency, and the condition of gas humidity fluctuation caused by temperature change can be favorably inhibited. The evaporation chamber 20 has a cylindrical polygonal cylinder chamber structure or a substantially cylindrical chamber structure. The wet gas outlet 43 is located at the periphery of the lower portion of the evaporation chamber, the wet gas outlet 43 is in an inverted conical circular ring shape, that is, the wet gas outlet adopts an inverted conical circular ring-shaped outlet structure extending from the inner wall surface of the evaporation chamber to the outer wall surface of the evaporation chamber, and the purpose is to make the incompletely gasified liquid drops fall and flow back to the evaporation chamber 20 by using gravity and inertia of wet gas flow rotation, further, the wet gas outlet 43 is annularly and continuously distributed on the circumferential wall of the evaporation chamber 20 for a circle, and certainly, a plurality of wet gas outlets 43 can be distributed on the circumferential wall of the evaporation chamber 20. The atomizing nozzles can be ultrasonic atomizing nozzles, single-phase liquid atomizing nozzles or two-phase gas-liquid atomizing nozzles, and the number and arrangement of the atomizing nozzles can be determined according to working parameters such as gas flow, temperature of the evaporation chamber 20 and the like. The gas flow uniformizing device 41 has a perforated screen structure for making the flow rate of each part of the outlet gas uniform and stable. The liquid removing device 44 employs a micron-sized filter or a high-efficiency gas-liquid separator. Many parts of the device adopt the design that adapts to the requirement of high cleanliness, including the valve uses the diaphragm valve, and the humidification cavity uses the stainless steel, and infrared heating pipe outer wall is the quartz glass material. A liquid drop removing structure is arranged on an output flow path of the device and comprises an inclined wet gas outlet design and a filter or a high-efficiency gas-liquid separator on the output flow path. A mass flow controller 45 is installed at the front end of the dry gas inlet 42 and used for adjusting the supply amount of dry air; in the evaporation chamber 20, the dry gas and/or the humidified gas after humidification flow in a direction from top to bottom, and the gas with high humidity naturally falls into the vicinity of the wet gas outlet 43 below the evaporation chamber 20 due to its high density, which is beneficial to obtaining the gas with high relative humidity. The wet gas outlet 43 is located at a position below the evaporation chamber 20, but not too close to the bottom, otherwise there is a risk of flooding with residual liquid and blocking the gas outlet, a certain safety distance height should be maintained. The infrared controller 60, together with the dry gas mass flow controller 45 and the liquid supply control valve 31, effects regulation of the gas flow rate, humidification amount, and heating power under the coordination of the controller 90. The temperature sensor 13 is used for monitoring the internal temperature of the evaporation chamber and preventing accidents such as abnormal operation of the infrared generator 50.
Example 2:
in the embodiment shown in fig. 2, the infrared heater 50 has a shape of an inverted conical spiral with a large upper end and a small lower end, but may also have a shape of a conical spiral with a small upper end and a large lower end or a shape of a biconical spiral with a small upper end and a small middle part. When the inverted cone-shaped spiral line with a large upper part and a small lower part is adopted, a first heating connecting end 53 and a second heating connecting end 54 of the infrared heater 50 are vertically arranged in parallel and led out to be arranged at the outer position of the lower bottom end of the whole infrared heater 50 (see fig. 2), wherein the first heating connecting end 53 extends upwards and penetrates through the spiral line-shaped inner bucket-shaped channel 51 formed by the whole infrared heater 50, and then the spiral line-shaped extension with the large upper part and the small lower part is carried out from the upper end head 52 of the first heating connecting end 53 to be connected with the upper end of the second heating connecting end 54; the infrared rays emitted from the infrared heater 50 of the conical spiral shape can directly radiate a larger area on the horizontal plane than the cylindrical spiral shape in embodiment 1, further improving the heating efficiency and the humidifying efficiency. The rest is the same as in example 1.
Example 3:
in the embodiment shown in fig. 3, a relative humidity sensor 71 and an outlet three-way valve 72 are arranged on the body output flow path, and both the relative humidity sensor 71 and the outlet three-way valve 72 are electrically connected with the controller; the relative humidity sensor 71 is used for monitoring the relative humidity of the gas on the gas output flow path, and the outlet three-way valve 72 is used for adjusting the output gas flow rate according to the temperature and humidity data information detected by the humidity sensor 71. Part or all of the output gas is reintroduced into the dry gas inlet 42 along the return flow path 73 through the inlet three-way valve 74, so that the relative humidity of the gas is readjusted. The other steps are the same as those in embodiment 1 or embodiment 2.
Example 4:
in the embodiment shown in fig. 4, the gas storage cylinder 80 is installed on the gas output flow path at the rear stage of the droplet removal device 44, and the humidified gas humidified by the humidifying device 44 is collected into the gas storage cylinder 80 and then output to the downstream pipeline. Thus, the gas storage bottle 80 has the function of temporarily storing and mixing the humidified gas generated in a period of time, so that the relative humidity fluctuation of the humidified gas output by the humidifying device is smaller; the gas cylinder 80 may further be provided with a relative humidity sensor 71 for detecting the relative humidity of the output gas and for feedback regulation. The other steps are the same as in example 1, example 2 or example 3.
Example 5:
in the embodiment shown in fig. 1, 2, 3 and 4, an infrared radiation humidifying method includes the following humidifying processing steps:
a. when humidification treatment is needed, the controller controls to open a mass flow controller 45 arranged on a pipeline at the outer end of a dry gas inlet 42 of the carrier gas flow channel so as to provide supply adjustment quantity of dry air for humidification treatment;
b. dry air gas to be humidified enters the gas flow uniforming device (shown by gas flow arrows in fig. 1, 3 and 4) of one of the above embodiments from the dry gas inlet 42 of the carrier gas flow channel of one of the above embodiments;
c. The dry air gas flows uniformly from the upper end of the gas flow uniforming device into the upper space inside the evaporating chamber 20 (as indicated by the gas flow arrows shown in fig. 1, 3, 4);
d. the dry air flows from the upper space inside the evaporation chamber 2 in a direction from top to bottom in the direction of the wet air outlet 43 from the carrier gas flow channel in one of the above embodiments;
e. the liquid phase water supply device 30 opens the liquid supply control valve 31, the liquid phase water source passes through the liquid supply control valve and downwards passes through the atomizing nozzle 32, atomized and humidified liquid phase water is downwards sprayed from the upper part inside the evaporation chamber 20, and dry air flowing from the upper space inside the evaporation chamber 20 in the direction from top to bottom is humidified and mixed; of course, this step may also be started before the above-mentioned c step is started or started and executed synchronously with the above-mentioned c step;
f. the external heater 5 according to one of the above embodiments starts heating the infrared heating wave providing the infrared generating heating effect by the external heater 50 under the control of the infrared controller 60; carrying out infrared heating wave heating and dehumidifying treatment on the mixed gas after humidification and mixing by using infrared heating waves; of course, this step may also be started before the start of the above-mentioned e-th step or started and executed synchronously with the above-mentioned e-th step;
g. The humidified gas after being heated and dehumidified by the infrared heating wave flows to the direction of the wet gas outlet 43 of the carrier gas flow channel in one of the above embodiments, and then flows through the droplet removing device through the wet gas outlet 43 to remove the non-gasified small droplets entrained in the wet gas;
h. the humidified gas dehumidified by the liquid drop removing device enters a downstream pipeline from the gas output flow path to be used or stored.
In the above step, the liquid discharge control valve 11 is linked with the liquid level sensor 8 to automatically discharge liquid to control the residual liquid amount in the evaporation chamber 20.
The other steps are the same as in embodiment 1, embodiment 2, embodiment 3 or embodiment 4.
In the positional relationship description of the present invention, the appearance of terms such as "inner", "outer", "upper", "lower", "left", "right", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the drawings is merely for convenience of describing the embodiments and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation and operation, and thus, is not to be construed as limiting the present invention.
The foregoing summary and structure are provided to explain the principles, general features, and advantages of the product and to enable others skilled in the art to understand the invention. The foregoing examples and description have been presented to illustrate the principles of the invention and are intended to provide various changes and modifications within the spirit and scope of the invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (10)
1. An infrared radiation humidifying device comprises an evaporation chamber, a liquid phase water supply device, a carrier gas flow channel and a controller, wherein the liquid phase water supply device comprises a liquid supply control valve and an atomizing nozzle, and is characterized in that: the liquid phase water evaporation device also comprises an infrared heater, wherein the infrared heater is positioned in the evaporation chamber and is used for providing infrared waves to gasify the liquid phase water; the carrier gas flow passage comprises a dry gas inlet and a wet gas outlet, the rear stage of the wet gas outlet is connected with the gas output flow passage, a downstream pipeline of the rear stage gas output flow passage of the wet gas outlet is provided with a liquid drop removing device, and the liquid drop removing device is used for removing unvaporized small liquid drops carried in the wet gas and carrying out secondary filtration to remove the liquid drops; the gas flows in the evaporating chamber from top to bottom approximately through the gas-carrying flow channel, and the wet gas outlet is positioned at the lower part of the evaporating chamber and at the upper part of the inner bottom; a temperature sensor for monitoring the internal temperature of the evaporation chamber and a liquid level sensor for monitoring the liquid level of residual liquid in the evaporation chamber are arranged in the evaporation chamber; the bottom of the evaporation chamber is provided with a liquid discharge hole and a liquid discharge control valve; the liquid phase supply device is located at the upper part of the device, and the atomizing nozzle is located at the top of the evaporation chamber.
2. An infrared radiation humidifying device as defined in claim 1, wherein: the infrared heater is in a spiral line shape, and adopts a cylindrical spiral line shape, an inverted cone spiral line shape with a large upper part and a small lower part, a cone spiral line shape with a small upper part and a large lower part or a double cone spiral line shape with a small upper end and a small lower end and a large middle part.
3. An infrared radiation humidifying device as defined in claim 1, wherein: the evaporation chamber is of a cylindrical polygonal cylinder chamber structure or a substantially cylindrical chamber structure.
4. An infrared radiation humidifying device as defined in claim 1, wherein: the wet gas outlet is positioned at the periphery of the lower part of the evaporation chamber and is in an inverted conical circular ring shape, namely the wet gas outlet adopts an inverted conical circular ring-shaped outlet structure which obliquely extends upwards from the inner wall surface of the evaporation chamber to the outer wall surface of the evaporation chamber.
5. An infrared radiation humidifying device as defined in claim 1, wherein: the atomizing nozzles can be ultrasonic atomizing nozzles, single-phase liquid atomizing nozzles or two-phase gas-liquid atomizing nozzles, and the number and the arrangement of the atomizing nozzles can be determined according to working parameters such as gas flow, the temperature of the evaporation chamber 2 and the like.
6. An infrared radiation humidifying device as defined in claim 1, wherein: one end of the dry gas inlet positioned in the evaporation chamber is provided with a gas flow homogenizing device which enables gas flow to uniformly flow into the evaporation chamber, and the gas flow homogenizing device is provided with a porous sieve plate structure which enables the flow of each part of outlet gas to be uniform and the flow rate to be stable; the airflow homogenizing device is located on the periphery of the upper part of the evaporation chamber and distributed at the position close to the inner circumferential wall surface of the evaporation chamber.
7. An infrared radiation humidifying device as defined in claim 1, wherein: the liquid removing device adopts a micron-sized filter or a high-efficiency gas-liquid separator.
8. An infrared radiation humidifying device as defined in claim 1, wherein: the gas output flow path is provided with a relative humidity sensor and an outlet three-way valve, and the relative humidity sensor and the outlet three-way valve are both electrically connected with the controller; the relative humidity sensor is used for monitoring the relative humidity of the gas on the gas output flow path, and the outlet three-way valve is used for adjusting the flow of the output gas according to the temperature and humidity data information detected by the humidity sensor.
9. An infrared radiation humidifying device as defined in claim 1, wherein: and the gas storage bottle is arranged on the gas output pipeline, the gas storage bottle is arranged on the gas output pipeline at the rear stage of the liquid drop removing device, and the gas humidified by the humidifying device is collected into the gas storage bottle and then output to the downstream pipeline.
10. An infrared radiation humidifying method is characterized in that: comprises the following humidification treatment steps
a. When humidification treatment is needed, the controller controls and opens the mass flow controller arranged on the pipeline at the outer end of the dry gas inlet of the carrier gas flow channel to provide supply adjustment quantity of dry air for humidification treatment;
b. dry air gas to be humidified enters the gas flow homogenizing device of one of claims 1 to 9 from a dry gas inlet of the carrier gas flow channel of one of claims 1 to 9;
c. the dry air flows into the upper space inside the evaporation chamber from the upper end of the airflow homogenizing device uniformly;
d. the dry air flows from the upper space inside the evaporation chamber 2 to the wet air outlet direction of the carrier gas flow channel of any one of claims 1 to 9 from the top to the bottom;
e. the liquid phase water supply device opens the liquid supply control valve, the liquid phase water source passes through the liquid supply control valve and downwards passes through the atomizing nozzle, atomized and humidified liquid phase water is downwards sprayed out from the upper part inside the evaporation chamber, and dry air flowing from the upper space inside the evaporation chamber in the direction from top to bottom is humidified and mixed; of course, this step may also be started before the above-mentioned c step is started or started and executed synchronously with the above-mentioned c step;
f. The external heater of any one of claims 1 to 9, wherein the external heater starts to heat an infrared heating wave providing an infrared-generated external heating effect under the control of the infrared controller; carrying out infrared heating wave heating and dehumidifying treatment on the mixed gas after humidification and mixing by using infrared heating waves; of course, this step may also be started before the start of the above-mentioned e-th step or started and executed synchronously with the above-mentioned e-th step;
g. the humidified gas subjected to the heating and dehumidification treatment by the infrared heating wave flows to the direction of a wet gas outlet of the carrier gas flow channel according to any one of claims 1 to 9, and then flows through a liquid drop removing device through the wet gas outlet to remove non-gasified small liquid drops carried in the wet gas;
h. the humidified gas subjected to dehumidification treatment by the liquid drop removing device enters a downstream pipeline from the gas output flow path for use or storage;
i. and in the above step, the liquid discharge control valve is linked with the liquid level sensor to automatically discharge liquid to control the residual liquid amount in the evaporation chamber.
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