CN111850654A - Special process for hard anode used in high-temperature environment - Google Patents
Special process for hard anode used in high-temperature environment Download PDFInfo
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- CN111850654A CN111850654A CN202010605822.8A CN202010605822A CN111850654A CN 111850654 A CN111850654 A CN 111850654A CN 202010605822 A CN202010605822 A CN 202010605822A CN 111850654 A CN111850654 A CN 111850654A
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/32—Anodisation of semiconducting materials
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- Chemical Kinetics & Catalysis (AREA)
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- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
The invention is a special process of a hard anode used in a high-temperature environment, and the process parameters are mainly used for improving the corrosion resistance, the wear resistance, the weather resistance, the insulativity and the adsorbability of the hard anode on the surface of a chemical vapor deposition key part; the hard oxidation is obtained at low temperature, and the generated film layer is thicker and generally has 50-63 um; due to the particularity of the hard anode, differences in anode performance can occur when different temperatures and current densities are adopted; the appearance and the service performance of the hard anode manufacturing process at high temperature are ensured; according to the invention, the current density of the hard anode is 1.5A/dm2, the hard anode surface can meet the use requirement in the high-temperature (350-500 ℃) environment at the temperature of-2-0 ℃, and the hard anode has good appearance and surface performance.
Description
Technical Field
The invention belongs to an optimization method of a hard anode process of a chemical vapor deposition key part, the surface of the hard anode part can influence the performance and the surface state under the high-temperature state, and further directly influences the service life and the deposition quality of semi-chemical vapor deposition equipment, so the process development technology becomes very key. The invention relates to a special process of a hard anode used in a high-temperature environment.
Background
With the rapid development of the semiconductor field, the hard anode process becomes a common and important surface treatment process of key semiconductor equipment such as chemical vapor deposition, and with the continuous upgrade of wafers and chips, the hard anode parameter optimization is a key technology for improving semiconductor products. Therefore, research and development of the hard anode process for a special use environment become more important, and optimization and development of the hard anode process in a high temperature environment become urgent.
Disclosure of Invention
The invention aims to provide a special process for a hard anode used in a high-temperature environment.
The technical scheme of the invention is as follows:
a special process for a hard anode used in a high-temperature environment is characterized in that process parameters are mainly used for improving the corrosion resistance, the wear resistance, the weather resistance, the insulativity and the adsorbability of the hard anode on the surface of a chemical vapor deposition key part; the hard oxidation is obtained at low temperature, and the generated film layer is thicker and generally has 50-63 um; due to the particularity of the hard anode, differences in anode performance can occur when different temperatures and current densities are adopted;
the appearance and the service performance of the hard anode manufacturing process at high temperature are ensured;
the first technological parameter is as follows:
6) Target film thickness: 50.8-63.5 μm;
7) workpiece size: 40 x 70 x 400 mm;
8) the process requirements are as follows: current density 2A/dm 2; the temperature is 0-2 ℃;
9) the process flow is as follows: degreasing, washing with alkali, washing with acid, washing with high-position water, washing with hot water, and drying with CDA;
10) keeping the temperature at 500 ℃ for 8 hours; slowly cooling to normal temperature;
appearance: the surface of the part is observed by visual observation, and the anode is peeled off;
and (3) performance testing: observing the surface appearance and the film thickness of the part through a 180-time magnifier, and comparing breakdown voltage resistance tests to obtain the following conclusion: the appearance of the surface of the workpiece in the test area is not obviously different by 180 times; the film thickness has no obvious change, and the breakdown voltage resistance is reduced.
The second process parameter is as follows:
6) target film thickness: 50.8-63.5 μm;
7) workpiece area: 40 x 70 x 400 mm;
8) the process requirements are as follows: current density 1.5A/dm 2; the temperature is-2 to 0 ℃;
9) the process flow is as follows: degreasing, washing with alkali, washing with acid, washing with high-position water, washing with hot water, and drying with CDA;
10) keeping the temperature at 500 ℃ for 8 hours; slowly cooling to normal temperature;
appearance: the surface of the part is observed by visual observation, and the appearance of the anode on the surface is good;
and (3) performance testing: observing the surface appearance and the film thickness of the part through a 180-time magnifier, and comparing breakdown voltage resistance tests to obtain the following conclusion: the appearance of the surface of the workpiece in the test area is not obviously different by 180 times; the micro-morphology of the anode film gradually changes and is relatively fuzzy, and the influence of the film thickness and DBV is small.
The invention has the beneficial effects that:
1. according to the invention, the hard anode surface can meet the use requirement in a high-temperature environment (350-500 ℃) by adopting the current density of 1.5A/dm2 and the temperature of-2-0 ℃ and presents good appearance and surface performance through two groups of comparison data.
2. The determination of the special process parameters realizes the stable mass production of key parts of the chemical vapor deposition equipment, reduces the quality abnormity of the series of products and meets the use requirement of a client.
Detailed Description
Experimental hard anode process parameters
1) Target film thickness: 50.8-63.5 μm
2) Workpiece size: 40 x 70 x 400mm
3) The process requirements are as follows: current density 2A/dm 2; the temperature is 0-2 DEG C
4) The process flow is as follows: degreasing, washing with alkali, washing with acid, washing with high-level water, washing with hard sun (time is based on actual film thickness), washing with high-level water, washing with hot water, and drying with CDA
5) Keeping the temperature at 500 ℃ for 8 hours; slowly cooling to normal temperature
Results display
Appearance: the surface of the part was visually observed for the presence of anode flaking.
And (3) performance testing: observing the surface appearance and the film thickness of the part through a 180-time magnifier, and comparing breakdown voltage resistance tests to obtain the following conclusion:
1) the workpiece surface in the test area has no obvious difference under 180 times.
2) The film thickness has no obvious change, and the breakdown voltage resistance is reduced
Experimental hard anode process parameters
1) Target film thickness: 50.8-63.5 μm
2) Workpiece area: 40 x 70 x 400mm
3) The process requirements are as follows: current density 1.5A/dm 2; the temperature is-2-0 DEG C
4) The process flow is as follows: degreasing, washing with alkali, washing with acid, washing with high-level water, washing with hard sun (time is based on actual film thickness), washing with high-level water, washing with hot water, and drying with CDA
5) Keeping the temperature at 500 ℃ for 8 hours; slowly cooling to normal temperature
Experimental results show
Appearance: the appearance of the anode was visually observed to be good on the surface of the part.
And (3) performance testing: observing the surface appearance and the film thickness of the part through a 180-time magnifier, and comparing breakdown voltage resistance tests to obtain the following conclusion: the workpiece surface in the test area has no obvious difference under 180 times. The micro-morphology of the anode film gradually changes and is relatively fuzzy, and the influence of the film thickness and DBV is small.
Claims (2)
1. A special process for a hard anode used in a high-temperature environment is characterized in that process parameters are mainly used for improving the corrosion resistance, the wear resistance, the weather resistance, the insulativity and the adsorbability of the hard anode on the surface of a chemical vapor deposition key part; the hard oxidation is obtained at low temperature, and the generated film layer is thicker and generally has 50-63 um; due to the particularity of the hard anode, differences in anode performance can occur when different temperatures and current densities are adopted;
The appearance and the service performance of the hard anode manufacturing process at high temperature are ensured;
the first technological parameter is as follows:
1) target film thickness: 50.8-63.5 μm;
2) workpiece size: 40 x 70 x 400 mm;
3) the process requirements are as follows: current density 2A/dm 2; the temperature is 0-2 ℃;
4) the process flow is as follows: degreasing, washing with alkali, washing with acid, washing with high-position water, washing with hot water, and drying with CDA;
5) keeping the temperature at 500 ℃ for 8 hours; slowly cooling to normal temperature;
appearance: the surface of the part is observed by visual observation, and the anode is peeled off;
and (3) performance testing: observing the surface appearance and the film thickness of the part through a 180-time magnifier, and comparing breakdown voltage resistance tests to obtain the following conclusion: the appearance of the surface of the workpiece in the test area is not obviously different by 180 times; the film thickness has no obvious change, and the breakdown voltage resistance is reduced.
2. A special process for a hard anode used in a high-temperature environment is characterized in that the second process parameter is as follows:
1) target film thickness: 50.8-63.5 μm;
2) workpiece area: 40 x 70 x 400 mm;
3) the process requirements are as follows: current density 1.5A/dm 2; the temperature is-2 to 0 ℃;
4) the process flow is as follows: degreasing, washing with alkali, washing with acid, washing with high-position water, washing with hot water, and drying with CDA;
5) keeping the temperature at 500 ℃ for 8 hours; slowly cooling to normal temperature;
Appearance: the surface of the part is observed by visual observation, and the appearance of the anode on the surface is good;
and (3) performance testing: observing the surface appearance and the film thickness of the part through a 180-time magnifier, and comparing breakdown voltage resistance tests to obtain the following conclusion: the appearance of the surface of the workpiece in the test area is not obviously different by 180 times; the micro-morphology of the anode film gradually changes and is relatively fuzzy, and the influence of the film thickness and DBV is small.
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Citations (7)
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---|---|---|---|---|
CN102286766A (en) * | 2011-09-26 | 2011-12-21 | 西华大学 | Aluminum alloy hard anode oxidation film and process method thereof |
CN104711652A (en) * | 2013-12-11 | 2015-06-17 | 贵州红林机械有限公司 | High-hardness hard anodization technology for processing hard aluminum alloy |
CN105088303A (en) * | 2014-05-16 | 2015-11-25 | 哈尔滨飞机工业集团有限责任公司 | Hard anodizing technological process for 7050 super-thick aluminum alloy |
CN105506705A (en) * | 2015-12-31 | 2016-04-20 | 江苏大学 | Preparing method of aluminum alloy hard anode oxide film |
CN105887151A (en) * | 2016-05-23 | 2016-08-24 | 沈阳富创精密设备有限公司 | Corrosion resistance sulfuric acid hard anodizing process |
CN108193250A (en) * | 2018-02-24 | 2018-06-22 | 沈阳富创精密设备有限公司 | A kind of sulfuric acid+nitration mixture mixing anode oxidation process |
CN109267134A (en) * | 2018-11-28 | 2019-01-25 | 中国航发长春控制科技有限公司 | A kind of cast aluminium alloy gold high rigidity Hard Anodic Oxidation Process method |
-
2020
- 2020-06-29 CN CN202010605822.8A patent/CN111850654A/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102286766A (en) * | 2011-09-26 | 2011-12-21 | 西华大学 | Aluminum alloy hard anode oxidation film and process method thereof |
CN104711652A (en) * | 2013-12-11 | 2015-06-17 | 贵州红林机械有限公司 | High-hardness hard anodization technology for processing hard aluminum alloy |
CN105088303A (en) * | 2014-05-16 | 2015-11-25 | 哈尔滨飞机工业集团有限责任公司 | Hard anodizing technological process for 7050 super-thick aluminum alloy |
CN105506705A (en) * | 2015-12-31 | 2016-04-20 | 江苏大学 | Preparing method of aluminum alloy hard anode oxide film |
CN105887151A (en) * | 2016-05-23 | 2016-08-24 | 沈阳富创精密设备有限公司 | Corrosion resistance sulfuric acid hard anodizing process |
CN108193250A (en) * | 2018-02-24 | 2018-06-22 | 沈阳富创精密设备有限公司 | A kind of sulfuric acid+nitration mixture mixing anode oxidation process |
CN109267134A (en) * | 2018-11-28 | 2019-01-25 | 中国航发长春控制科技有限公司 | A kind of cast aluminium alloy gold high rigidity Hard Anodic Oxidation Process method |
Non-Patent Citations (1)
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张丽 等: ""3003铝合金低温硫酸硬质阳极氧化"", 《电镀与涂饰》 * |
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Address after: No.18a-1, Feiyun Road, Hunnan District, Shenyang City, Liaoning Province Applicant after: Shenyang fuchuang precision equipment Co.,Ltd. Address before: No.18a-1, Feiyun Road, Dongling District, Shenyang, Liaoning Province, 110000 Applicant before: Shenyang Fortune Precision Equipment Co.,Ltd. |
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Application publication date: 20201030 |
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