CN111847900A - Low-emissivity coated glass and preparation method thereof - Google Patents
Low-emissivity coated glass and preparation method thereof Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3634—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing carbon, a carbide or oxycarbide
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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Abstract
The invention provides low-emissivity coated glass and a preparation method thereof, relating to the field of low-emissivity coated glass and comprising a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are distributed in sequence; the glass substrate is common float glass; the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating; the absorption coating is any one of tin oxide, titanium oxide, magnesium oxide, zinc oxide, iron oxide and nickel oxide; the first coating is silicon nitride or silicon carbide; the second plating layer is lanthanum-doped chromium nitride; the third coating is silicon nitride or silicon carbide; the reflective coating is any one of gallium, germanium, indium, tin and antimony or oxide, nitride and oxynitride thereof; the protective layer is made of graphene, the emissivity of the low-radiation coated glass is 0.042-0.054, the light transmittance is 82-90%, and the far infrared reflectivity is more than or equal to 99%, so that the use requirement is met.
Description
Technical Field
The invention relates to the field of low-emissivity coated glass, in particular to low-emissivity coated glass and a preparation method thereof.
Background
Modern architectural design tends to use large-area glass for natural lighting, however, ordinary single glass cannot block heat energy in sunlight from transferring to the indoor in summer and cannot block indoor heat energy from leaking in winter, and the cost for maintaining the appropriate indoor temperature is only a large amount of energy consumption, such as air conditioning, heating and the like. The direct consequence of this is a great loss of energy saving of the entire building. The energy loss of the glass is reduced to the minimum on the premise of ensuring good indoor lighting. Therefore, the development and use of the low-emissivity coated glass with the above functions and good effects become one of the main products in the glass market.
As for the condition of China, the latitude span of China is large, and the northern area has cold winter climate and the southern area is hot in summer and warm in winter. The energy consumption of buildings in China accounts for 35 percent of the total energy consumption, the energy conservation of the buildings is lagged, the energy consumption is high, the pollution is serious, and the method becomes a prominent problem restricting the sustainable development of economy in China. The research surface shows that the heat loss of the outer wall of the Chinese building is 3-5 times of that of the similar building in Canada and North America, the heat loss of the window is more than 2 times, the area of the window and the door accounts for 20-30% of the building area, the glass accounts for 70-80% of the window and door area, 70% of the building energy consumption is lost through the window and the door, wherein 1/3 is lost through the glass, so that the large-scale popularization and use of the low-radiation coated glass have great significance for reducing the overall energy consumption of the society.
Chinese patent CN 106045333B provides a low-emissivity coated glass and a preparation method thereof, wherein the low-emissivity coated glass comprises a glass substrate, and an inner dielectric layer, a functional layer and an outer dielectric layer which are sequentially sputtered on the glass substrate; the inner dielectric layer and the outer dielectric layer are both (Ti, Al) N films, the functional layer is a copper-doped silver film, and an anti-oxidation layer can be sputtered between the functional layer and the outer dielectric layer. The preparation method comprises the following steps: sputtering an inner dielectric layer on a glass substrate in argon and nitrogen atmosphere; then sputtering a functional layer on the inner dielectric layer in an argon atmosphere; and sputtering an outer dielectric layer on the functional layer in the argon and nitrogen atmosphere to obtain the low-emissivity coated glass. The low-radiation coated glass has the radiance of 0.052-0.054, the light transmittance of 74.4-78.36% and the far infrared reflectivity of 99.8-99.99%.
Disclosure of Invention
Technical problem to be solved
Aiming at the defects of the prior art, the invention provides low-emissivity coated glass and a preparation method thereof.
(II) technical scheme
In order to achieve the purpose, the invention is realized by the following technical scheme:
the low-emissivity coated glass comprises a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
The glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption coating is any one of tin oxide, titanium oxide, magnesium oxide, zinc oxide, iron oxide and nickel oxide;
the first coating is silicon nitride or silicon carbide;
the second plating layer is lanthanum-doped chromium nitride;
the third coating is silicon nitride or silicon carbide;
the reflective coating is any one of gallium, germanium, indium, tin and antimony or oxide, nitride and oxynitride thereof;
the protective layer is graphene.
Furthermore, the low-emissivity coated glass comprises a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption coating is zinc oxide;
the first plating layer is silicon nitride;
the second plating layer is lanthanum-doped chromium nitride;
the third plating layer is silicon nitride;
the reflective coating is gallium oxynitride;
the protective layer is graphene.
Furthermore, the low-radiation coated glass has the radiance of 0.042-0.054, the light transmittance of 82-90 percent and the far infrared reflectivity of more than or equal to 99 percent.
Furthermore, the thickness of the glass substrate is 1-5mm, the thickness of the Ag layer is 10-15nm, the thickness of the absorption coating is 20-30nm, the thickness of the first coating is 1-5nm, the thickness of the second coating is 5-10nm, the thickness of the third coating is 1-5nm, the thickness of the reflection coating is 20-30nm, and the thickness of the protection layer is 30-50 nm.
Furthermore, the thickness of the glass substrate is 5mm, the Ag layer is 10nm, the absorption coating is 20nm, the first coating is 5nm, the second coating is 5nm, the third coating is 5nm, the reflection coating is 20nm, and the protective layer is 50 nm.
The preparation method of the low-emissivity coated glass comprises the following specific steps:
cleaning and drying the glass substrate by deionized water and acetone, conveying the glass substrate to magnetron sputtering equipment by a roller way, and sequentially plating an Ag layer, an absorption plating layer, a first plating layer, a second plating layer, a third plating layer, a reflection plating layer, an Ag layer and a protective layer.
Further, working gases of the magnetron sputtering coating are Ar and N2Gas mixed according to the volume ratio of 10-20: 1.
Further, when plating Ag layer, the working gas flow is 1000--3Pa, sputtering time of 1-10s, working gas flow of 600--3Pa, sputtering time of 1-10s, working gas flow of 600- -3Pa, sputtering time of 1-10s, working gas flow of 600-800sccm, vacuum degree of 3 × 10-3Pa, and the sputtering time is 10-30 s.
(III) advantageous effects
The invention provides low-emissivity coated glass and a preparation method thereof, and the low-emissivity coated glass has the following beneficial effects:
the low-radiation coated glass is formed by superposing a plurality of coating structures, compared with the traditional low-radiation coated glass, the low-radiation coated glass has more excellent optical and thermal properties, lower radiance, shading coefficient and thermal stability, can ensure that a silver layer is not oxidized or discolored as far as possible in the magnetron sputtering process, has more stable performance of each film layer, ensures that the product performance is kept consistent before and after being heated, and has excellent optical and thermal properties, so that the low-radiation coated glass has lower light reflectivity, can ensure that the external visual effect of a building is more transparent and bright, and effectively reduces the glare phenomenon; the low-radiation coated glass has better heat preservation and heat insulation performance due to lower radiance and lower shading coefficient, the radiance of the low-radiation coated glass is 0.042-0.054, the light transmittance is 82-90%, and the far infrared reflectivity is more than or equal to 99%, so that the use requirement is met.
Detailed Description
Example 1:
the low-emissivity coated glass comprises a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption plating layer is tin oxide;
the first coating is silicon carbide;
the second plating layer is chromium nitride doped with lanthanum;
the third coating is silicon carbide;
the reflecting coating is gallium nitride;
the protective layer is graphene.
The thickness of the glass substrate is 5mm, the thickness of the Ag layer is 10nm, the thickness of the absorption coating is 20nm, the thickness of the first coating is 5nm, the thickness of the second coating is 5nm, the thickness of the third coating is 5nm, the thickness of the reflection coating is 20nm, and the thickness of the protection layer is 50 nm.
The preparation method of the low-radiation coated glass comprises the following steps:
cleaning glass substrate deionized water and acetone, drying, conveying the glass substrate deionized water and acetone to a magnetron sputtering device through a roller way, wherein working gas for magnetron sputtering coating is gas formed by mixing Ar and N2 according to the volume ratio of 10:1, an Ag layer, an absorption coating, a first coating, a second coating, a third coating, a reflection coating, an Ag layer and a protective layer are sequentially coated, when the Ag layer is coated, the flow of the working gas is 1200sccm, and the vacuum degree is 3 multiplied by 10-3Pa, sputtering time of 5s, working gas flow of 600sccm, vacuum degree of 5 × 10 -3Pa, sputtering time of 10s, working gas flow of 800sccm and vacuum degree of 3 × 10 when plating the first, second and third plating layers-3Pa, sputtering time of 5s, working gas flow of 800sccm and vacuum degree of 3 × 10 during protective layer plating-3Pa, and the sputtering time is 20 s.
Example 2:
the low-emissivity coated glass is characterized by comprising a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption coating is zinc oxide;
the first coating is silicon nitride;
the second plating layer is chromium nitride doped with lanthanum;
the third coating is silicon nitride;
the reflective coating is gallium oxynitride;
the protective layer is graphene.
The thickness of the glass substrate is 5mm, the thickness of the Ag layer is 10nm, the thickness of the absorption coating is 20nm, the thickness of the first coating is 1nm, the thickness of the second coating is 5nm, the thickness of the third coating is 1nm, the thickness of the reflection coating is 20nm, and the thickness of the protection layer is 30 nm.
The preparation method of the low-radiation coated glass comprises the following steps:
cleaning glass substrate deionized water and acetone, drying, conveying the glass substrate deionized water and acetone to a magnetron sputtering device through a roller way, wherein working gas for magnetron sputtering coating is gas formed by mixing Ar and N2 according to the volume ratio of 20:1, an Ag layer, an absorption coating, a first coating, a second coating, a third coating, a reflection coating, an Ag layer and a protective layer are sequentially coated, when the Ag layer is coated, the flow of the working gas is 1200sccm, and the vacuum degree is 3 multiplied by 10 -3Pa, sputtering time of 10s, working gas flow of 800sccm, vacuum degree of 5 × 10-3Pa, sputtering time of 2s, working gas flow of 800sccm, vacuum degree of 3 × 10-3Pa, sputtering time of 8s, working gas flow of 800sccm and vacuum degree of 3 × 10 during protective layer plating-3Pa, and the sputtering time is 18 s.
Example 3:
the low-emissivity coated glass is characterized by comprising a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption plating layer is tin oxide;
the first coating is silicon nitride;
the second plating layer is chromium nitride doped with lanthanum;
the third coating is silicon nitride;
the reflective coating is tin nitride;
the protective layer is graphene.
The thickness of the glass substrate is 5mm, the thickness of the Ag layer is 15nm, the thickness of the absorption coating is 30nm, the thickness of the first coating is 5nm, the thickness of the second coating is 10nm, the thickness of the third coating is 5nm, the thickness of the reflection coating is 30nm, and the thickness of the protection layer is 50 nm.
The preparation method of the low-radiation coated glass comprises the following steps:
cleaning glass substrate deionized water and acetone, drying, conveying the glass substrate deionized water and acetone to a magnetron sputtering device through a roller way, wherein working gas for magnetron sputtering coating is gas formed by mixing Ar and N2 according to the volume ratio of 20:1, an Ag layer, an absorption coating, a first coating, a second coating, a third coating, a reflection coating, an Ag layer and a protective layer are sequentially coated, when the Ag layer is coated, the flow of the working gas is 1200sccm, and the vacuum degree is 3 multiplied by 10 -3Pa, sputtering time of 10s, working gas flow of 800sccm, vacuum degree of 5 × 10-3Pa, sputtering time of 10s, working gas flow of 800sccm and vacuum degree of 3 × 10 when plating the first, second and third plating layers-3Pa, sputtering time of 10s, working gas flow of 800sccm and vacuum degree of 3 × 10 during protective layer plating-3Pa, and the sputtering time is 30 s.
Example 4:
the low-emissivity coated glass is characterized by comprising a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption plating layer is titanium oxide;
the first coating is silicon carbide;
the second plating layer is chromium nitride doped with lanthanum;
the third coating is silicon nitride;
the reflective coating is antimony oxide;
the protective layer is graphene.
The thickness of the glass substrate is 2mm, the thickness of the Ag layer is 12nm, the thickness of the absorption coating is 20nm, the thickness of the first coating is 1nm, the thickness of the second coating is 10nm, the thickness of the third coating is 5nm, the thickness of the reflection coating is 30nm, and the thickness of the protection layer is 40 nm.
The preparation method of the low-radiation coated glass comprises the following steps:
cleaning glass substrate deionized water and acetone, drying, conveying the glass substrate deionized water and acetone to a magnetron sputtering device through a roller way, wherein working gas for magnetron sputtering coating is gas formed by mixing Ar and N2 according to the volume ratio of 15:1, an Ag layer, an absorption coating, a first coating, a second coating, a third coating, a reflection coating, an Ag layer and a protective layer are sequentially coated, when the Ag layer is coated, the flow of the working gas is 1100sccm, and the vacuum degree is 3 multiplied by 10 -3Pa, sputtering time of 4s, working gas flow of 600sccm, vacuum degree of 5 × 10-3Pa, sputtering time of 5s, working gas flow of 600sccm, vacuum degree of 3 × 10-3Pa, sputtering time of 10s, working gas flow of 800sccm and vacuum degree of 3 × 10 during protective layer plating-3Pa, and the sputtering time is 20 s.
Example 5:
the low-emissivity coated glass is characterized by comprising a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption plating layer is nickel oxide;
the first coating is silicon nitride;
the second plating layer is chromium nitride doped with lanthanum;
the third coating is silicon nitride;
the reflective coating is germanium nitride;
the protective layer is graphene.
The thickness of the glass substrate is 1mm, the thickness of the Ag layer is 15nm, the thickness of the absorption coating is 20nm, the thickness of the first coating is 5nm, the thickness of the second coating is 5nm, the thickness of the third coating is 5nm, the thickness of the reflection coating is 20nm, and the thickness of the protection layer is 50 nm.
The preparation method of the low-radiation coated glass comprises the following steps:
cleaning glass substrate deionized water and acetone, drying, conveying the glass substrate deionized water and acetone to a magnetron sputtering device through a roller way, wherein working gas for magnetron sputtering coating is gas formed by mixing Ar and N2 according to the volume ratio of 10:1, an Ag layer, an absorption coating, a first coating, a second coating, a third coating, a reflection coating, an Ag layer and a protective layer are sequentially coated, when the Ag layer is coated, the flow of the working gas is 1200sccm, and the vacuum degree is 3 multiplied by 10 -3Pa, sputtering time of 1s, working gas flow of 800sccm, vacuum degree of 5 × 10-3Pa, sputtering time of 1s, working gas flow of 800sccm, vacuum degree of 3 × 10-3Pa, sputtering time of 1s, working gas flow of 800sccm and vacuum degree of 3 × 10 during protective layer plating-3Pa, and the sputtering time is 15 s.
Example 6:
the low-emissivity coated glass is characterized by comprising a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption coating is zinc oxide;
the first coating is silicon carbide;
the second plating layer is chromium nitride doped with lanthanum;
the third coating is silicon carbide;
the reflective coating is tin nitride;
the protective layer is graphene.
The thickness of the glass substrate is 5mm, the thickness of the Ag layer is 10nm, the thickness of the absorption coating is 30nm, the thickness of the first coating is 1nm, the thickness of the second coating is 10nm, the thickness of the third coating is 1nm, the thickness of the reflection coating is 30nm, and the thickness of the protection layer is 30 nm.
The preparation method of the low-radiation coated glass comprises the following steps:
cleaning glass substrate deionized water and acetone, drying, conveying the glass substrate deionized water and acetone to a magnetron sputtering device through a roller way, wherein working gas for magnetron sputtering coating is gas formed by mixing Ar and N2 according to the volume ratio of 20:1, an Ag layer, an absorption coating, a first coating, a second coating, a third coating, a reflection coating, an Ag layer and a protective layer are sequentially coated, when the Ag layer is coated, the flow of the working gas is 1000sccm, and the vacuum degree is 3 multiplied by 10 -3Pa, sputtering time of 10s, working gas flow of 600sccm, vacuum degree of 5 × 10-3Pa, sputtering time of 10s, working gas flow of 600sccm, vacuum degree of 3 × 10-3Pa, sputtering time of 10s, working gas flow of 600sccm and vacuum degree of 3 × 10 during protective layer plating-3Pa, and the sputtering time is 30 s.
Example 7:
the low-emissivity coated glass is characterized by comprising a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption plating layer is tin oxide;
the first coating is silicon carbide;
the second plating layer is chromium nitride doped with lanthanum;
the third coating is silicon carbide;
the reflecting coating is gallium oxide;
the protective layer is graphene.
The thickness of the glass substrate is 5mm, the thickness of the Ag layer is 15nm, the thickness of the absorption coating is 30nm, the thickness of the first coating is 5nm, the thickness of the second coating is 10nm, the thickness of the third coating is 5nm, the thickness of the reflection coating is 30nm, and the thickness of the protection layer is 50 nm.
The preparation method of the low-radiation coated glass comprises the following steps:
cleaning glass substrate deionized water and acetone, drying, conveying the glass substrate deionized water and acetone to a magnetron sputtering device through a roller way, wherein working gas for magnetron sputtering coating is gas formed by mixing Ar and N2 according to the volume ratio of 20:1, an Ag layer, an absorption coating, a first coating, a second coating, a third coating, a reflection coating, an Ag layer and a protective layer are sequentially coated, when the Ag layer is coated, the flow of the working gas is 1200sccm, and the vacuum degree is 3 multiplied by 10 -3Pa, sputtering time of 10s, working gas flow of 800sccm, vacuum degree of 5 × 10-3Pa, sputtering time of 10s, working gas flow of 800sccm and vacuum degree of 3 × 10 when plating the first, second and third plating layers-3Pa, sputtering time of 10s, working gas flow of 800sccm and vacuum degree of 3 × 10 during protective layer plating-3Pa, and the sputtering time is 30 s.
Example 8:
the low-emissivity coated glass is characterized by comprising a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption plating layer is ferric oxide;
the first coating is silicon nitride;
the second plating layer is chromium nitride doped with lanthanum;
the third coating is silicon nitride;
the reflective coating is indium nitride;
the protective layer is graphene.
The thickness of the glass substrate is 1mm, the thickness of the Ag layer is 10nm, the thickness of the absorption coating is 20nm, the thickness of the first coating is 1nm, the thickness of the second coating is 5nm, the thickness of the third coating is 1nm, the thickness of the reflection coating is 20nm, and the thickness of the protection layer is 30 nm.
The preparation method of the low-radiation coated glass comprises the following steps:
cleaning glass substrate with deionized water and acetone, drying, and conveying to magnetron sputtering equipment through a roller way The working gas of the magnetron sputtering coating is a gas formed by mixing Ar and N2 according to the volume ratio of 10:1, and an Ag layer, an absorption coating, a first coating, a second coating, a third coating, a reflection coating, an Ag layer and a protective layer are sequentially coated, wherein when the Ag layer is coated, the flow rate of the working gas is 1000sccm, the vacuum degree is 3 multiplied by 10-3Pa, sputtering time of 1s, working gas flow of 600sccm, vacuum degree of 5 × 10-3Pa, sputtering time of 1s, working gas flow of 600sccm, vacuum degree of 3 × 10-3Pa, sputtering time of 1s, working gas flow of 600sccm and vacuum degree of 3 × 10 during protective layer plating-3Pa, and the sputtering time is 10 s.
The following table 1 shows the performance test results of the low-emissivity coated glass using the embodiments 1-3 of the invention.
Table 1:
as can be seen from the above table 1, the low-radiation coated glass prepared by the invention has the advantages of extremely low radiance, extremely high far infrared reflectivity, good heat preservation effect, high light transmittance, and more beautiful and transparent appearance.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
The above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (8)
1. The low-emissivity coated glass is characterized by comprising a glass substrate, an Ag layer, a composite coating, an Ag layer and a protective layer which are sequentially distributed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption coating is any one of tin oxide, titanium oxide, magnesium oxide, zinc oxide, iron oxide and nickel oxide;
the first coating is silicon nitride or silicon carbide;
the second plating layer is lanthanum-doped chromium nitride;
the third coating is silicon nitride or silicon carbide;
the reflective coating is any one of gallium, germanium, indium, tin and antimony or oxide, nitride and oxynitride thereof;
The protective layer is graphene.
2. The low-emissivity coated glass according to claim 1, comprising a glass substrate, an Ag layer, a composite coating layer, an Ag layer, and a protective layer, which are sequentially disposed;
the glass substrate is common float glass;
the composite coating comprises an absorption coating, a first coating, a second coating, a third coating and a reflection coating;
the absorption coating is zinc oxide;
the first plating layer is silicon nitride;
the second plating layer is lanthanum-doped chromium nitride;
the third plating layer is silicon nitride;
the reflective coating is gallium oxynitride;
the protective layer is graphene.
3. The low-emissivity coated glass according to claim 1, wherein the low-emissivity coated glass has an emissivity of 0.042-0.054, a light transmittance of 82-90%, and a far infrared reflectance of 99% or more.
4. The low-emissivity coated glass according to claim 1, wherein the glass substrate has a thickness of 1 to 5mm, an Ag layer of 10 to 15nm, an absorbing coating of 20 to 30nm, a first coating of 1 to 5nm, a second coating of 5 to 10nm, a third coating of 1 to 5nm, a reflecting coating of 20 to 30nm, and a protective layer of 30 to 50 nm.
5. The low-emissivity coated glass according to claim 4, wherein the glass substrate has a thickness of 5mm, an Ag layer of 10nm, an absorption coating of 20nm, a first coating of 5nm, a second coating of 5nm, a third coating of 5nm, a reflection coating of 20nm, and a protective layer of 50 nm.
6. The method for preparing a low-emissivity coated glass according to any one of claims 1 to 5, wherein the method comprises the following steps:
cleaning and drying the glass substrate by deionized water and acetone, conveying the glass substrate to magnetron sputtering equipment by a roller way, and sequentially plating an Ag layer, an absorption plating layer, a first plating layer, a second plating layer, a third plating layer, a reflection plating layer, an Ag layer and a protective layer.
7. The method for preparing a low-emissivity coated glass according to claim 6, wherein the working gas for magnetron sputtering coating is Ar and N2Gas mixed according to the volume ratio of 10-20: 1.
8. The low-emissivity coated glass of claim 6The preparation method of the glass is characterized in that when the Ag layer is plated, the flow rate of the working gas is 1000-1200sccm, the vacuum degree is 3 multiplied by 10-3Pa, sputtering time of 1-10s, working gas flow of 600--3Pa, sputtering time of 1-10s, working gas flow of 600--3Pa, sputtering time of 1-10s, working gas flow of 600-800sccm, vacuum degree of 3 × 10-3Pa, and the sputtering time is 10-30 s.
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