CN111845140A - Template-free laser nano in-situ patterning method and device - Google Patents

Template-free laser nano in-situ patterning method and device Download PDF

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Publication number
CN111845140A
CN111845140A CN202010804585.8A CN202010804585A CN111845140A CN 111845140 A CN111845140 A CN 111845140A CN 202010804585 A CN202010804585 A CN 202010804585A CN 111845140 A CN111845140 A CN 111845140A
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laser
substrate
silk screen
nano
template
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李灵侠
贾国治
郭鸿柱
王建
白琳
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Tianjin Chengjian University
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Tianjin Chengjian University
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/12—Stencil printing; Silk-screen printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F15/00—Screen printers
    • B41F15/08—Machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F15/00—Screen printers
    • B41F15/08—Machines
    • B41F15/12—Machines with auxiliary equipment, e.g. for drying printed articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F33/00—Indicating, counting, warning, control or safety devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F33/00—Indicating, counting, warning, control or safety devices
    • B41F33/0036—Devices for scanning or checking the printed matter for quality control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/26—Printing on other surfaces than ordinary paper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
    • B41P2200/00—Printing processes
    • B41P2200/40—Screen printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
    • B41P2215/00—Screen printing machines
    • B41P2215/50—Screen printing machines for particular purposes

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Quality & Reliability (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Laser Beam Processing (AREA)

Abstract

The invention provides a template-free laser nanometer in-situ patterning method and device, which comprise the following steps: s1, establishing laser action, substrate approaching mechanism and laser alignment mechanism system parameters; s2, scraping a film by using a silk screen to form a high-quality uniform nano solution film on the silk screen plate; s3, the substrate approaches, the height of the substrate workbench is accurately adjusted, and the distance between the wire mesh plate and the substrate material is controlled; s4, laser positioning is carried out, and a laser action route is generated at the position of the substrate required to be patterned according to the written pattern; s5, curing, and heating and curing by the substrate workbench to complete the patterning process. The invention has the beneficial effects that: the process flow is simple, the operation is easy, and the range of applicable materials and substrates is wide; a mask or die preparation process and a product compression period are omitted, so that the processing precision is improved, and the process cost is reduced; the method has obvious advantages in the aspects of rapid development of new products, preparation of various small-batch products and meeting the requirements of various nonstandard devices, and has wide application prospect.

Description

Template-free laser nano in-situ patterning method and device
Technical Field
The invention belongs to the field of micro-electronics and micro-nano processing, and particularly relates to a template-free laser nano in-situ patterning method and device, which are used for printing and patterning nano materials.
Background
Products such as flexible electronics, flexible sensors, LED imaging, solar panels, high-definition flat panel displays, anti-reflection and self-cleaning glass, wafer-level micro-nano optical devices and the like all need to be printed on a substrate base material or a substrate to prepare a nano structure, so that wide market demands are brought to the growth.
The current patterned preparation method of nano materials is mainly based on screen printing technology, nano imprinting technology, photoetching technology and derivative technology thereof. For example, chinese patent CN108263106B discloses a method for patterning a nanomaterial, which comprises covering a filter membrane with a screen, forming a patterned polymer slurry layer on the surface of the filter membrane by screen printing polymer slurry, depositing a nanomaterial on the patterned region of the polymer slurry layer to form a nanomaterial structure, and transferring the nanomaterial structure to a substrate. Due to the limitations of screen printing techniques, this method still presents great technical difficulties for complex structures and high precision printing.
Chinese patent CN105159029A discloses a micro-nano patterning method and device combining plate nano-imprinting and roller nano-imprinting, which realizes micro-nano patterning of large-area and large-size rigid substrates through links such as pretreatment, imprinting and curing, demolding and post-treatment, the device adopts a soft mold to cooperate with roller imprinting and demolding processes, the preparation process is complex, and the risk of pattern deformation and dislocation generated in the middle manufacturing link is increased.
Chinese patent CN106115681A discloses a method for realizing two-dimensional material imaging, in which a one-dimensional or two-dimensional phase grating is placed on a sample, and the grating is irradiated by laser, and spatial distribution of laser energy is formed by coherence phenomenon, so as to realize an imaging structure. The method has the technical difficulties that the high-quality grating mask is manufactured, the requirements on preparation equipment and technical personnel are high, one set of die is only suitable for preparing a specific pattern structure, and the preparation cost is high.
A common technical bottleneck in the above conventional patterning techniques is that a mask or a mold is required. With the trend of continuous miniaturization and high-integration development of devices, the characteristic size of the devices is continuously reduced, the difficulty and cost of the preparation technology of the required mask are continuously increased, the maskless technology is widely concerned, and meanwhile, the high-precision nano printing and patterning technology is in urgent need of promotion and improvement.
Disclosure of Invention
The invention aims to provide a template-free nano material in-situ patterning method and equipment. The laser in-situ imaging can be realized at one time, and the current market demands of high efficiency, low cost, high precision and the like are met.
In order to solve the technical problems, the invention adopts the technical scheme that: a laser nanometer in-situ patterning method comprises the following steps:
step S1, establishing laser action, screen film scraping, substrate approaching and laser alignment system parameters, wherein the system parameters comprise laser spot size, laser power, laser scanning speed, blade coating angle and distance between the screen and the substrate; step S2, screen scraping: forming a high-quality uniform nano solution film on the wire mesh plate by adopting a blade coating method; step S3, the substrate approaches: the height of the substrate worktable is accurately adjusted, and the distance between the wire mesh plate and the substrate material is controlled; step S4, laser positioning and generating a printing graphic route: generating a laser action route at a position required to be patterned on a substrate according to a pattern path set by a computer; step S5, patterning and curing: the computer controls the laser to move along the set route on the X-Y plane and act on the X-Y plane, the nano material attached to the silk screen is transferred to the substrate where the laser acts on the silk screen, and the patterning process is completed by heating and curing the nano material on the substrate workbench
And step S3, controlling the distance between the wire mesh plate and the substrate material to be 0.05-0.2 mm.
And step S4, generating a laser action route, adjusting the laser power and the spot size through a power regulator, and focusing the laser action route on the screen film.
Another object of the present invention is to provide an apparatus for a laser nano in-situ patterning method, comprising: computer, laser action mechanism, silk screen film scraping mechanism, substrate approaching mechanism and laser alignment mechanism. The computer is respectively connected with the laser action mechanism, the silk screen film scraping mechanism, the substrate approaching mechanism and the laser alignment mechanism; the laser action mechanism comprises a laser, a laser adjusting component and an X-Y plane laser moving component, the laser is connected with a computer through the laser adjusting component and the X-Y plane laser moving component, and the computer controls the laser power and the light spot size of the laser, automatically focuses and adjusts and realizes the scanning movement of the silk screen film scraping mechanism on the X-Y plane.
The X-Y plane laser moving assembly comprises an X-direction precise screw rod, a Y-direction precise screw rod, an X-direction high-precision stepping motor and a Y-direction high-precision stepping motor, the X-direction precise screw rod is provided with the X-direction high-precision stepping motor, the Y-direction precise screw rod is provided with the Y-direction high-precision stepping motor, the X-direction precise screw rod and the Y-direction precise screw rod are connected in a crossed mode, and a laser is arranged on the X-direction precise screw rod.
The silk screen film scraping mechanism comprises a silk screen plate, a scraping knife, a return knife, a stepping motor G and a stepping motor H, wherein the silk screen plate and the scraping/return knife are arranged at an angle of 30-90 degrees, the scraping knife and the return knife are respectively provided with the stepping motor G and the stepping motor H, and the stepping motor G and the stepping motor H respectively control the scraping knife and the return knife to scrape printing materials on the silk screen plate in a reciprocating mode through a computer.
The scraping blade and the ink returning blade are double-sided scrapers, the scraping blade frame is a rectangular frame and is provided with slide rails on two side edges, two scrapers are arranged in the scraping blade frame up and down, the blade surfaces are opposite, the distance between the upper scraper and the lower scraper can be adjusted in a sliding mode along the slide rails, and the screen plate penetrates through the upper scraper and the lower scraper of the scraping blade/the ink returning blade.
The silk screen plate and the ink scraping/returning knife are arranged at an angle of 30-90 degrees.
The laser alignment mechanism comprises a low-magnification CCD camera and a high-magnification CCD camera, the low-magnification CCD camera and the high-magnification CCD camera are respectively arranged near the screen plate and connected with a computer, the low-magnification CCD camera is identified and initially positioned in a large view field, the high-magnification CCD camera is used for performing image local morphology fine display, and the distance between the substrate and the screen plate is accurately measured.
The substrate approaching mechanism comprises a substrate workbench, an electric lifting platform, a lifting platform controller, a temperature controller, a vacuum pipeline and a vacuum pumping pump, wherein the surface of the substrate workbench is provided with a plurality of adsorption holes which are connected with the vacuum pumping pump through the vacuum pipeline to adsorb and fix the substrate; the substrate working table is arranged on the electric lifting platform, the electric lifting platform is connected with a computer through a lifting platform controller, the laser alignment mechanism is used for accurately measuring the distance, and the lifting platform controller is used for accurately regulating and controlling the height of the substrate working table; the substrate workbench is connected with a computer through a temperature controller to realize the temperature control of the curing and heating of the substrate graph.
The invention has the beneficial effects that: the equipment and the method for realizing laser in-situ imaging at one time without a template and contact are provided, the technological process of the equipment is simple, the operation is easy, and the applicable material and substrate range is wide; compared with the traditional mask technology, the mask or die preparation process is omitted, random errors caused by the mask process are eliminated, and the processing precision is effectively improved; the method has the advantages of no need of a mask or a die, direct in-situ imaging, great reduction of process cost, product cycle compression, obvious advantages in the aspects of rapid development of new products, preparation of various products in small batches and satisfaction of various nonstandard device requirements, and wide application prospect.
Drawings
FIG. 1 is a schematic structural diagram of a template-free laser nano in-situ patterning device according to the present invention;
FIG. 2 is a schematic view of the doctor blade/ink return blade configuration of the present invention;
FIG. 3 is a flow chart of a template-free laser nano in-situ graphical preparation method of the present invention;
FIG. 4 is a schematic top view of a template-free laser nano in-situ patterning process according to an embodiment of the present invention;
FIG. 5 is a schematic side view of a template-free laser nano in-situ patterning process according to an embodiment of the present invention.
In the figure:
1. computer 2, laser
3. Laser adjusting component 4, X is to accurate lead screw
5. Y-direction precision lead screw 6 and X-direction precision stepping motor
7. Y-direction high-precision stepping motor 8 and wire mesh plate
9. Scraping blade 10, ink return blade
11. Step electricity G12, step electricity H
13. Low-power CCD camera 14 and high-power CCD camera
15. Substrate 16 and substrate table
17. Electric lifting platform 18 and lifting platform controller
19. Temperature control assembly 20 and adsorption hole
21. Vacuum pipeline 22 and vacuum pump
901. Scraper frame 902 and sliding rail
903. Upper blade 904, lower blade
Detailed Description
The invention is described in further detail below with reference to the following figures and detailed description:
as shown in fig. 1, the template-free laser nano in-situ patterning device of the present invention comprises: the laser action mechanism comprises a computer 1, a laser 2, a laser adjusting component 3 and an X-Y plane laser moving component, wherein the laser 2 is connected with the computer 1 through the laser adjusting component 3 and the X-Y plane laser moving component, and the computer controls and adjusts laser power, light spot size and automatic focusing and realizes that the laser 2 scans and moves on an X-Y plane. The X-Y plane laser moving assembly comprises an X-direction precision screw rod 4, a Y-direction precision screw rod 5, an X-direction high-precision stepping motor 6 and a Y-direction high-precision stepping motor 7, wherein the X-direction precision screw rod 4 is provided with the X-direction high-precision stepping motor 6, the Y-direction precision screw rod 5 is provided with the Y-direction high-precision stepping motor 7, the X-direction precision screw rod 4 and the Y-direction precision screw rod 5 are connected in a crossed mode, and a laser 2 is arranged on the X-direction precision screw rod 4.
The silk screen film scraping mechanism comprises a silk screen plate 8, a scraping blade 9, a return blade 10, a stepping motor G11 and a stepping motor H12. The screen plate 8, the ink scraping knife 9 and the ink returning knife 10 are perpendicular to each other, the ink scraping knife 9 and the ink returning knife 10 are both connected with stepping motors, and the stepping motors are connected to the computer 1 to control the ink scraping knife 9 and the ink returning knife 10 to reciprocate on the screen plate to scrape and coat printing materials.
The laser alignment mechanism comprises a low-magnification CCD camera 13 and a high-magnification CCD camera 14. The two cameras are oppositely arranged at two positions near the wire mesh plate 8 and connected with the computer 1, the pattern of the written pattern is locally and precisely displayed by the high-magnification camera 14 after being recognized and preliminarily positioned in a large view field through the low-magnification camera 13, and the distance between the substrate 15 and the wire mesh plate 8 is positioned and measured.
The substrate approaching mechanism comprises a substrate workbench 16, an electric lifting platform 17, a precision lifting controller 18, a temperature control assembly 19, a vacuum pipeline 21 and a vacuum pumping pump 22. The surface of the substrate worktable 16 is provided with a plurality of adsorption holes 20 which are connected with a vacuum-pumping pump 22 through a vacuum pipeline 21 to adsorb and fix the substrate 15. The substrate working table 16 is arranged on an electric lifting platform 17, the electric lifting platform 17 is connected with the computer 1 through a lifting platform controller 18, the laser alignment mechanism is used for accurately measuring distance, and the lifting platform controller 18 is used for accurately regulating and controlling the height of the substrate working table 16. The substrate worktable 16 is connected with the computer 1 through a temperature control assembly 19 to realize the temperature control of the substrate graph solidification heating, the temperature control assembly 19 comprises a heating device and a temperature measuring sensor, and the heating device is arranged below the substrate worktable 16.
Fig. 2 is a schematic structural diagram of the doctor blade or the ink recovery blade of the present invention, and the doctor blade 9 and the ink recovery blade 10 are both double-sided blades, and are composed of a blade frame 901, a slide rail 902, an upper blade 903, and a lower blade 904. The scraper frame 901 is a rectangular frame, two side edges are provided with slide rails 902, two scrapers are arranged in the scraper frame 901 up and down, the knife faces are opposite, and the distance between the upper scraper 903 and the lower scraper 904 can be adjusted by sliding along the slide rails 902. The screen plate 8 passes between the upper blade 903 and the lower blade 903 of the doctor blade or the ink return blade.
FIG. 3 is a flow chart of the laser nanometer in-situ patterning preparation method of the present invention, which comprises five main steps of establishing system parameters, scraping a screen, approaching a substrate, positioning by laser, generating a printing pattern route, forming a pattern and curing.
In the embodiment, the zinc oxide nanometer solution is used as a printing material, and the character 2020 is printed on a silicon dioxide substrate. The pulse energy is selected to be 8.3mJ-166mJ, the 300-mesh silk screen plate is selected, and the moving range of the laser in the X-Y plane is 200mm multiplied by 200 mm.
Fig. 4 and 5 are top and side views of a graphical preparation process of an embodiment of the invention, which comprises the following specific processes: preparing a zinc oxide nano solution, placing a silicon dioxide substrate on a substrate workbench 16, S1, starting a computer operating system, selecting and executing an AUTOCAD drawing by a windows system, and establishing system parameters of laser action, silk screen film scraping, substrate approaching and laser alignment: the scraping angle is 60 degrees, the distance between the screen printing plate and the substrate is 0.1mm, the focusing laser spot size is 10 microns, the laser power is set to be 30mW, and the scanning speed is 1 cm/s. S2, dripping the zinc oxide nano solution on the silk screen plate 8, and forming a uniform zinc oxide nano solution film on the silk screen plate 8 by the silk screen film scraping mechanism through the system control and the blade coating method. And S3, ranging by a laser positioning mechanism, controlling the lifting platform controller 18 by a computer to realize position adjustment of the electric lifting platform 17, and finally adjusting the distance between the wire mesh plate 8 and the silicon dioxide substrate placed on the substrate workbench 16 to be about 0.1 mm. S4, the control system positions the laser beam at the position of the substrate 15 to be patterned and generates a laser action route according to the figure 2020 set by the computer; s5, the computer 1 controls the laser to scan on the X-Y plane by a set '2020' route, and the zinc oxide solution on the wire mesh plate under the action of the laser is locally point-type transferred to the silicon dioxide substrate right below by taking the wire mesh as a unit to form a zinc oxide '2020' pattern. The substrate table 16 is heated and cured to complete the fabrication of the pattern structure.
The invention combines the screen printing technology, the high-precision laser technology and the computer control and data processing technology, has no template and no contact in the whole preparation process, realizes laser in-situ imaging at one time, meets the current market demands of high efficiency, low cost, high precision and the like, and has wide application prospect. It should be noted that the above-mentioned embodiments are only used for describing the specific embodiments of the present invention, but the scope of the present invention is not limited to the above-mentioned embodiments, and in addition, any other improvements or modifications made on the technical solutions of the present invention are still within the protection scope of the present invention.

Claims (10)

1. A template-free laser nanometer in-situ patterning method is characterized by comprising the following steps:
step S1, establishing laser action, silk screen film scraping, substrate approaching and laser alignment system parameters, wherein the system parameters comprise laser spot size, laser power, laser scanning speed, blade coating angle and distance between the silk screen and the substrate;
step S2, screen scraping: putting the nano solution on the wire mesh plate and strickling the nano solution by adopting a blade coating method to form a high-quality uniform nano solution film;
step S3, the substrate approaches: the height of a substrate worktable of the substrate approaching mechanism is accurately adjusted, and the distance between the wire mesh plate and the substrate material is controlled;
step S4, laser positioning and generating a printing graphic route: generating a laser action route at a position required to be patterned on a substrate according to a pattern path set by a computer;
step S5, patterning and curing: the computer controls the laser to move along a set route on the X-Y plane and act on the X-Y plane, the nano material attached to the silk screen is transferred to the substrate where the laser acts on the silk screen, and the patterning process is completed through heating and curing of the substrate workbench.
2. The template-free laser nano in-situ patterning method of claim 1, wherein the distance between the wire mesh plate and the substrate material in step S3 is 0.05-0.2 mm.
3. The template-free laser nano in-situ patterning method of claim 1, wherein the generating laser action route of step S4 is to focus a laser beam on the screen film by adjusting power and spot size of a laser.
4. An apparatus for the template-free laser nano in-situ patterning method of claim 1, comprising: the computer is characterized in that the computer is respectively connected with a laser action mechanism, a silk screen film scraping mechanism, a substrate approaching mechanism and a laser alignment mechanism, the laser action mechanism comprises a laser (2), a laser adjusting component (3) and an X-Y plane laser moving component, the laser (2) is connected with the computer (1) through the laser adjusting component (3) and the X-Y plane laser moving component, and the computer controls the laser power and the light spot size of the laser (2), automatically focuses and adjusts and realizes the scanning movement of the silk screen film scraping mechanism on an X-Y plane.
5. The template-free laser nano in-situ patterning device of claim 4, wherein: the X-Y plane laser moving assembly comprises an X-direction precise screw rod (4), a Y-direction precise screw rod (5), an X-direction high-precision stepping motor (6) and a Y-direction high-precision stepping motor (7), wherein the X-direction precise screw rod (4) is provided with the X-direction high-precision stepping motor (6), the Y-direction precise screw rod (5) is provided with the Y-direction high-precision stepping motor (7), the X-direction precise screw rod (4) and the Y-direction precise screw rod (5) are in cross connection, and a laser (2) is arranged on the X-direction precise screw rod (4).
6. The template-free laser nano in-situ patterning device of claim 4, wherein: the silk screen film scraping mechanism comprises a silk screen plate (8), a scraping knife (9), a return knife (10), a stepping motor G (11) and a stepping motor H (12), the silk screen plate (8) is arranged at an angle with the scraping knife (9) and the return knife (10), the scraping knife (9) and the return knife (10) are respectively provided with the stepping motor G (11) and the stepping motor H (12), and the stepping motor G (11) and the stepping motor H (12) respectively control the scraping knife (9) and the return knife (10) to scrape printing materials on the silk screen plate (8) in a reciprocating mode through a computer (1).
7. The template-free laser nano in-situ patterning device of claim 6, wherein: the utility model discloses a scraper, including scraper frame (901), slide rail (902), upper scraper (903), lower scraper (904), scraper frame (901) is the rectangle frame, both sides limit sets up slide rail (902), set up two scrapers from top to bottom in scraper frame (901), the knife face is relative, and the interval of upper scraper (903) and lower scraper (904) can be followed slide rail (902) slide adjusting, silk screen board (8) pass between upper scraper (903) and lower scraper (904) from scraper/ink return knife.
8. The template-free laser nano in-situ patterning device of claim 6, wherein: the silk screen plate and the ink scraping/returning knife are arranged at an angle of 30-90 degrees.
9. The template-free laser nano in-situ patterning device of claim 4, wherein: laser alignment mechanism is including low magnification CCD camera (13), high magnification CCD camera (14), low magnification CCD camera (13), high magnification CCD camera (14) set up respectively near silk screen board (8) and are connected with computer (1), discernment, preliminary positioning in the big visual field of low magnification CCD camera (13), high magnification CCD camera (14) carry out the local meticulous demonstration of figure appearance, fix a position the measurement to the interval of substrate (15) and silk screen board (8).
10. The template-free laser nano in-situ patterning device of claim 4, wherein: the substrate approaching mechanism comprises a substrate workbench (16), an electric lifting platform (17), a lifting platform controller (18), a temperature control assembly (19), a vacuum pipeline (21) and a vacuum pump (22), wherein the surface of the substrate workbench (16) is provided with a plurality of adsorption holes (20) which are connected with the vacuum pump (22) through the vacuum pipeline (21) to adsorb and fix the substrate (15); the substrate working table (16) is arranged on an electric lifting platform (17), the electric lifting platform (17) is connected with a computer (1) through a lifting platform controller (18), the laser alignment mechanism is used for accurately measuring the distance, and the lifting platform controller (18) is used for accurately regulating and controlling the height of the substrate working table (16); the substrate workbench (16) is connected with the computer (1) through a temperature control assembly (19) to realize the temperature control of substrate pattern curing and heating.
CN202010804585.8A 2020-08-12 2020-08-12 Template-free laser nano in-situ patterning method and device Pending CN111845140A (en)

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CN202010804585.8A CN111845140A (en) 2020-08-12 2020-08-12 Template-free laser nano in-situ patterning method and device

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114407513A (en) * 2022-01-06 2022-04-29 Tcl华星光电技术有限公司 Printing screen and method for producing the same
EP4086928A1 (en) * 2021-05-05 2022-11-09 Siemens Aktiengesellschaft Method for producing a planar structure and device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4086928A1 (en) * 2021-05-05 2022-11-09 Siemens Aktiengesellschaft Method for producing a planar structure and device
WO2022233480A1 (en) * 2021-05-05 2022-11-10 Siemens Aktiengesellschaft Method for producing a planar structure, and device
CN114407513A (en) * 2022-01-06 2022-04-29 Tcl华星光电技术有限公司 Printing screen and method for producing the same
CN114407513B (en) * 2022-01-06 2023-08-01 Tcl华星光电技术有限公司 Printing screen and method for producing the same

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