CN111825340A - Composite optical black film and preparation method thereof, and ultrathin glass and preparation method thereof - Google Patents
Composite optical black film and preparation method thereof, and ultrathin glass and preparation method thereof Download PDFInfo
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- CN111825340A CN111825340A CN202010879484.7A CN202010879484A CN111825340A CN 111825340 A CN111825340 A CN 111825340A CN 202010879484 A CN202010879484 A CN 202010879484A CN 111825340 A CN111825340 A CN 111825340A
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- 239000011521 glass Substances 0.000 title claims abstract description 46
- 230000003287 optical effect Effects 0.000 title claims abstract description 42
- 239000002131 composite material Substances 0.000 title claims abstract description 37
- 238000002360 preparation method Methods 0.000 title claims abstract description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 146
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 89
- 239000011651 chromium Substances 0.000 claims abstract description 86
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 83
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 73
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 70
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 14
- 238000005240 physical vapour deposition Methods 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 238000007747 plating Methods 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims abstract description 4
- 238000000576 coating method Methods 0.000 claims abstract description 4
- 238000002834 transmittance Methods 0.000 claims description 17
- 238000002310 reflectometry Methods 0.000 claims description 12
- 238000009826 distribution Methods 0.000 abstract description 8
- 239000010408 film Substances 0.000 description 150
- 230000003595 spectral effect Effects 0.000 description 11
- 238000001228 spectrum Methods 0.000 description 4
- 230000003667 anti-reflective effect Effects 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 229940090961 chromium dioxide Drugs 0.000 description 3
- AYTAKQFHWFYBMA-UHFFFAOYSA-N chromium(IV) oxide Inorganic materials O=[Cr]=O AYTAKQFHWFYBMA-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000411 transmission spectrum Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 238000000985 reflectance spectrum Methods 0.000 description 1
- 238000002235 transmission spectroscopy Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/361—Coatings of the type glass/metal/inorganic compound/metal/inorganic compound/other
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/3665—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties specially adapted for use as photomask
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
Abstract
The invention discloses a composite optical black film and a preparation method thereof, and ultrathin glass and a preparation method thereof, wherein the composite optical black film comprises a plurality of chromium film layers and a plurality of silicon dioxide film layers on a substrate; the multilayer chromium film layers and the multilayer silicon dioxide film layers are alternately stacked in sequence, and the chromium film layer positioned at the bottommost layer is attached to the base body. The ultrathin glass comprises an ultrathin glass body, a photoresist layer and a composite optical black film, wherein the stress balance layer of the composite optical black film is attached to the photoresist layer, and the photoresist layer is attached to one side of the ultrathin glass body. The preparation method of the ultrathin glass comprises the steps of coating a photoresist layer on an ultrathin glass body; and (3) plating a chromium film layer and a silicon dioxide film layer on the photoresist layer in turn by using a physical vapor deposition method until the chromium film layer and the silicon dioxide film layer have the same quantity and reach the required quantity. The force distribution on the chromium film layer is expressed as compressive stress, the force distribution on the silicon dioxide film layer is expressed as tensile stress, and stress balance is formed by alternately overlapping so as to achieve the purpose of reducing warping.
Description
Technical Field
The invention belongs to the field of manufacturing of ultrathin glass, and relates to a composite optical black film and a preparation method thereof, and ultrathin glass and a preparation method thereof.
Background
As wafer level imaging optical systems have been developed, a black film, i.e., a light shielding film, plays a crucial role in the optical system, and a partial region of the black film is a light passing hole, which functions as a diaphragm in a conventional optical system; the place where light transmission is not needed is intercepted by the black film. The design and preparation method of the black film are also issues to be paid attention to in view of the optical effect of the black film.
In the meantime, after one surface of the ultra-thin wafer is plated, the wafer is easily subjected to bending deformation due to unbalanced stress, and the deformation is called warpage. The stress causing the warpage is divided into "tensile stress" and "compressive stress" in the direction of the warpage of the wafer, and as shown in fig. 1, the relationship between the stress and the warpage direction is defined as tensile stress when bending upward, and compressive stress when bending downward. Generally, after an optical film layer is plated on one surface of an ultrathin wafer, the wafer is easy to form a large warpage, which causes great inconvenience and immeasurable influence on the operability and operation accuracy of the subsequent process, such as difficulty in leveling the wafer, easiness in breaking, process accuracy loss and other influences.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide a composite optical black film and a preparation method thereof, and ultrathin glass and a preparation method thereof, which can inhibit the warp formation of the ultrathin glass.
In order to achieve the purpose, the invention adopts the following technical scheme to realize the purpose:
a composite optical black film comprises a plurality of chromium film layers and a plurality of silicon dioxide film layers on a substrate;
the multilayer chromium film layers and the multilayer silicon dioxide film layers are alternately stacked in sequence, and the chromium film layer positioned at the bottommost layer is attached to the base body.
Preferably, the thickness ratio of the chromium film layer to the silicon dioxide film layer is 1: 1.8-2.4.
Preferably, the thickness of the multilayer chromium film layer and the multilayer silicon dioxide film layer close to the substrate is larger than that of the multilayer chromium film layer and the multilayer silicon dioxide film layer far away from the substrate, the larger part of the thickness is a stress balance layer, and the smaller part of the thickness is an antireflection layer.
Further, the anti-reflection layer comprises three chromium film layers and three silicon dioxide film layers, and the stress balance layer comprises two chromium film layers and two silicon dioxide film layers.
Preferably, when the total thickness of the multilayer chromium film layer and the multilayer silicon dioxide film layer is 380nm-1100nm, the transmittance is averagely less than 0.05%; when the total thickness is 380nm-780nm, the average reflectivity is less than 1%; when the total thickness is 780nm-1100nm, the average reflectivity is less than 5%.
A method for preparing composite optical black film, using physical meteorology deposition method to plate chrome film and silicon dioxide film on the base body in turn until the quantity of chrome film and silicon dioxide film is the same and reaches the needed quantity.
The ultrathin glass comprises an ultrathin glass body, a photoresist layer and the composite optical black film, wherein the stress balance layer of the composite optical black film is attached to the photoresist layer, and the photoresist layer is attached to one side of the ultrathin glass body.
Preferably, the ultra-thin glass body is ultra-thin wafer glass.
A preparation method of ultrathin glass comprises the following steps;
coating a photoresist layer on an ultrathin glass body;
and step two, plating a chromium film layer and a silicon dioxide film layer on the photoresist layer in turn by using a physical vapor deposition method until the chromium film layer and the silicon dioxide film layer have the same quantity and reach the required quantity.
Compared with the prior art, the invention has the following beneficial effects:
the composite optical black film is formed by sequentially and alternately stacking a plurality of chromium film layers and silicon dioxide film layers, wherein the force distribution on the chromium film layers is expressed as compressive stress, the force distribution on the silicon dioxide film layers is expressed as tensile stress, and stress balance is formed by alternately stacking so as to achieve the purpose of reducing warping.
Furthermore, the thickness ratio of the chromium film layer to the silicon dioxide film layer is 1: 1.8-2.4, so that the optimal stress balance can be achieved.
Further, the thicknesses of the chromium film layer and the silicon dioxide film layer of the antireflection layer are small, and the light transmittance of the antireflection layer is guaranteed to meet requirements.
Further, the light transmittance and the average reflectivity of the black film are limited, and the reflectivity of the film layer is reduced under the condition of intercepting unnecessary spectrum light, so that the influence of stray light on an optical system is weakened or eliminated.
The preparation method of the composite optical black film provided by the invention finishes the preparation of the composite optical black film by using the chrome film layer and the silicon dioxide film layer which are sequentially and alternately plated by using a physical vapor deposition method.
According to the ultrathin glass, the composite optical black film is arranged on one side of the ultrathin glass body, the force distribution on the chromium film layer is expressed as compressive stress, and the force distribution on the silicon dioxide film layer is expressed as tensile stress, so that the stress balance on the composite optical black film can be realized, and the purpose of reducing the warping of the ultrathin glass is achieved.
According to the preparation method of the ultrathin glass, the ultrathin glass body is coated with the photoresist layer, and then the chromium film layer and the silicon dioxide film layer are sequentially and alternately plated on the photoresist layer by using a physical vapor deposition method, so that the preparation of the single-side composite optical black film of the ultrathin glass body is completed.
Drawings
FIG. 1 is a schematic diagram showing the relationship between stress and warpage directions of wafer glass;
FIG. 2 is a schematic structural diagram of a composite optical black film according to the present invention;
FIG. 3 is a transmittance spectrum of 70nm thick antireflective chromium film of the present invention;
FIG. 4 is a reflectance spectrum of a reflection reducing layer of the present invention;
FIG. 5 is a transmittance spectrum of 120nm thick antireflective chromium film of the present invention;
FIG. 6 is a transmission spectroscopy spectrum of four layers of the stress balance layer and six layers of the antireflective layer of the present invention.
FIG. 7 is a diagram showing the relationship between the ultra-thin wafer glass and the black film according to the present invention;
wherein: 1-antireflection layer; 2-a stress-balancing layer; 3-a chromium film layer; 4-a silicon dioxide film layer; 5-an ultrathin glass body; 6-photoresist layer.
Detailed Description
The invention is described in further detail below with reference to the accompanying drawings:
the ultra-thin glass body 5 described in this embodiment is ultra-thin wafer glass. As shown in fig. 2, the composite optical black film of the present invention is composed of two structural layers, i.e., a stress balance layer 2 and an antireflection layer 1. The stress balance layer 2 and the antireflection layer 1 of the composite optical black film are both composed of a chromium film layer 3 and a silicon dioxide film layer 4, wherein the force distribution of the chromium film layer 3 plated on an ultrathin glass body 5 is expressed as compressive stress, and the force distribution of the silicon dioxide film layer 4 plated on the ultrathin glass body is expressed as tensile stress.
In the embodiment, as shown in fig. 2, the film system structure of the antireflection layer 1 from bottom to top is respectively composed of a chromium film layer 3, a silicon dioxide film layer 4, a chromium film layer 3 and a silicon dioxide film layer 4; in order to balance stress, the chromium film layer 3 at the bottommost layer of the anti-reflection layer 1 is closely adjacent to the silicon dioxide film layer 4 at the topmost layer of the stress balance layer 2; the chromium film layer 3 and the silicon dioxide film layer 4 of the antireflection layer 1 have the same layer number and are mutually circulated, and the structure of the chromium film layer 3 is designed to be prepared preferentially. According to the stress characteristics of chromium and silicon dioxide plated on the surface of the ultrathin glass body 5, the ratio of the thickness of the chromium film layer 3 to the thickness of the silicon dioxide film layer 4 for stress balance is 1: 1.8-2.4, so that stress can be balanced. The thicker the chromium layer thickness, the lower the transmittance.
The stress balance layer 2 of the composite optical black film comprises chromium film layers 3 and silicon dioxide film layers 4 which are the same in quantity, and in the embodiment, as shown in fig. 2, the film system structure of the stress balance layer 2 from bottom to top is respectively composed of the chromium film layers 3, the silicon dioxide film layers 4, the chromium film layers 3 and the silicon dioxide film layers 4; wherein the chromium film layer 3 and the silicon dioxide film layer 4 have the same layer number and are mutually circulated, at least one circulation is formed, and the chromium film layer 3 is designed to be prepared preferentially; the chromium film layer 3 is plated next to the photoresist. According to the stress characteristics of chromium and silicon dioxide plated on the surface of the ultrathin glass body 5, the ratio of the thickness of the chromium film layer 3 to the thickness of the silicon dioxide film layer 4 for stress balance is 1: 1.8-2.4, so that stress can be balanced. The thicker the chromium layer thickness, the lower the transmittance.
The thickness of the chromium film layer 3 in the antireflection layer 1 is less than that of the chromium film layer 3 in the stress balance layer 2; the thickness of the silicon dioxide film layer 4 in the antireflection layer 1 is smaller than that of the silicon dioxide film layer 4 in the stress balance layer 2.
The composite optical black film has the spectral characteristics that: when the thickness is 380nm-1100nm, the average transmittance is less than 0.05 percent; when the thickness is 380nm-780nm, the average reflectivity is less than 1 percent; the average reflectivity is less than 5% when the thickness is 780nm-1100 nm.
In the embodiment, the anti-reflection layer 1 is 6 layers, and the film system structure from bottom to top is composed of a chromium film layer 3, a silicon dioxide film layer 4, a chromium film layer 3 and a silicon dioxide film layer 4 respectively; and for example, the stress of chromium and silicon dioxide is matched, the thickness of the chromium film layer 3 at the bottommost layer of the anti-reflection layer 1 is 70nm, and the thickness ratio of the chromium film layer 3 to the silicon dioxide film layer 4 is 1: 1.92. the transmittance spectral characteristics of the antireflection layer 1 portion are shown in fig. 3; in FIG. 3, the average transmittance is only 0.5-0.6%, and does not satisfy the spectral characteristic specification.
The 16-layer reflectivity spectral characteristic spectrum of the antireflection layer is shown in FIG. 4, and the average reflectivity of the film system is required to be less than 1% from 380nm to 780 nm; the average reflectivity of 780nm-1100nm is less than 5%, and the average reflectivity in figure 4 meets the specification requirement of spectral characteristics.
As described above, the average transmittance shown by the partial spectrum of the antireflection layer 1 does not satisfy the spectral characteristics, but the reflectance satisfies the spectral characteristics.
In order to further satisfy the requirement of transmittance spectral characteristics, the thickness of the chromium film layer 3 at the bottom of the antireflection layer 1 was changed to 120 nm. Fig. 5 shows the spectral characteristic that the thickness of the bottom chromium film layer 3 of the anti-reflection layer 1 is changed to 120nm, and in fig. 5, the average transmittance is only 0.1-0.12%, the average transmittance requirement is not met, and the thickness ratio of the chromium film layer 3 and the silicon dioxide film layer 4 of the anti-reflection layer 1 is damaged, so that the stress imbalance is caused. Therefore, the thicknesses of the chromium film layer 3 and the silicon dioxide film layer 4 of the stress balance layer 2 need to be adjusted to balance the spectral characteristics of the stress and the transmittance of the antireflection layer 1.
When designing stress balance layer 2 for 4 layers, the film system structure of stress balance layer 2 from bottom to top comprises chromium rete 3, silica rete 4, chromium rete 3 and silica rete 4 respectively, and the thickness of two-layer chromium rete 3 all designs for 120nm, and chromium rete 3 and silica rete 4 thickness proportion are 1: 2.25, the overall average transmittance of the stress balance layer 2 and the antireflection layer 1 meets the requirement of the overall spectral characteristic specification; the ratio of the chromium film layer 3 and the silicon dioxide film layer 4 of the antireflection layer 16 is 1: and 2, finally designing the thickness ratio of the chromium film layer 3 to the silicon dioxide film layer 4 of the composite optical black film to be 1: 2.178.
the structural cycle of the stress balance layer 2, the chromium film layer 3 and the silicon dioxide film layer 4 can be increased according to the specification requirement and the transmittance requirement of the total film layer thickness of the composite optical black film.
Finally, the light splitting of the composite optical black film is shown in fig. 6, and the light splitting requirement that the transmittance of 380nm-1100nm is less than 0.1% on average is met.
The preparation method of the composite optical black film comprises the following steps:
step one, preparing a chromium film layer 3 on a substrate by using a physical vapor deposition method, and sequentially and alternately plating a silicon dioxide film layer 4 and the chromium film layer 3 on the chromium film layer 3 by using the physical vapor deposition method until the chromium film layer 3 and the silicon dioxide film layer 4 are the same in number and reach the required number, so as to form a stress balance layer 2.
And step two, sequentially and alternately plating a chromium film layer 3 and a silicon dioxide film layer 4 on the stress balance layer 2 by using a physical vapor deposition method until the chromium film layer 3 and the silicon dioxide film layer 4 are the same in quantity and reach the required quantity, and forming an antireflection layer 1 on the stress balance layer 2.
When the composite optical black film of the present embodiment is disposed on the ultra-thin glass, as shown in fig. 7, the structure is the ultra-thin glass body 5, the photoresist layer 6 and the composite optical black film stacked in sequence from one side to the other side, wherein the stress balance layer 2 is attached to the photoresist layer 6.
The preparation method of the ultrathin glass comprises the following steps:
step one, coating a photoresist layer 6 on the ultrathin glass body 5.
And step two, sequentially and alternately plating a chromium film layer 3 and a silicon dioxide film layer 4 on the photoresist layer 6 by using a physical vapor deposition method until the chromium film layer 3 and the silicon dioxide film layer 4 are the same in quantity and reach the required quantity, and forming a stress balance layer 2 on the photoresist layer 6.
And step three, sequentially and alternately plating a chromium film layer 3 and a silicon dioxide film layer 4 on the stress balance layer 2 by using a physical vapor deposition method until the chromium film layer 3 and the silicon dioxide film layer 4 are the same in quantity and reach the required quantity, and forming an antireflection layer 1 on the stress balance layer 2.
The above-mentioned contents are only for illustrating the technical idea of the present invention, and the protection scope of the present invention is not limited thereby, and any modification made on the basis of the technical idea of the present invention falls within the protection scope of the claims of the present invention.
Claims (9)
1. The composite optical black film is characterized by comprising a plurality of chromium film layers (3) and a plurality of silicon dioxide film layers (4) on a substrate;
the multilayer chromium film layers (3) and the multilayer silicon dioxide film layers (4) are alternately stacked in sequence, and the chromium film layer (3) positioned at the bottommost layer is attached to the base body.
2. The composite optical black film according to claim 1, wherein the thickness ratio of the chromium film layer (3) to the silicon dioxide film layer (4) is 1: 1.8-2.4.
3. The composite optical black film according to claim 1, wherein the thickness of the multilayer chromium film layer (3) and the multilayer silicon dioxide film layer (4) close to the substrate is larger than that of the multilayer chromium film layer (3) and the multilayer silicon dioxide film layer (4) far from the substrate, the larger thickness part is the stress balance layer (2), and the smaller thickness part is the antireflection layer (1).
4. The composite optical black film according to claim 3, wherein the antireflection layer (1) comprises three chromium film layers (3) and three silicon dioxide film layers (4), and the stress balance layer (2) comprises two chromium film layers (3) and two silicon dioxide film layers (4).
5. The composite optical black film according to claim 1, wherein the transmittance is less than 0.05% on average when the total stacked thickness of the multilayer chromium film layer (3) and the multilayer silicon dioxide film layer (4) is 380nm-1100 nm; when the total thickness is 380nm-780nm, the average reflectivity is less than 1%; when the total thickness is 780nm-1100nm, the average reflectivity is less than 5%.
6. A preparation method of a composite optical black film is characterized in that a physical vapor deposition method is used for alternately plating a chromium film layer (3) and a silicon dioxide film layer (4) on a substrate in sequence until the chromium film layer (3) and the silicon dioxide film layer (4) are the same in quantity and reach the required quantity.
7. An ultra-thin glass, comprising an ultra-thin glass body (5), a photoresist layer (6) and the composite optical black film of any one of claims 1-5, wherein the stress balance layer (2) of the composite optical black film is attached to the photoresist layer (6), and the photoresist layer (6) is attached to one side of the ultra-thin glass body (5).
8. The ultra-thin glass according to claim 7, characterized in that the ultra-thin glass body (5) is an ultra-thin wafer glass.
9. A preparation method of ultrathin glass is characterized by comprising the following steps;
coating a photoresist layer (6) on an ultrathin glass body (5);
and step two, alternately plating a chromium film layer (3) and a silicon dioxide film layer (4) on the photoresist layer (6) in sequence by using a physical vapor deposition method until the chromium film layer (3) and the silicon dioxide film layer (4) are the same in number and reach the required number.
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| CN202010879484.7A CN111825340A (en) | 2020-08-27 | 2020-08-27 | Composite optical black film and preparation method thereof, and ultrathin glass and preparation method thereof |
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| CN202010879484.7A CN111825340A (en) | 2020-08-27 | 2020-08-27 | Composite optical black film and preparation method thereof, and ultrathin glass and preparation method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113866860A (en) * | 2021-09-22 | 2021-12-31 | 华天慧创科技（西安）有限公司 | Ultrathin wafer optical narrowband filter and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113866860A (en) * | 2021-09-22 | 2021-12-31 | 华天慧创科技（西安）有限公司 | Ultrathin wafer optical narrowband filter and preparation method thereof |
| CN113866860B (en) * | 2021-09-22 | 2024-01-12 | 华天慧创科技（西安）有限公司 | Ultrathin wafer optical narrowband optical filter and preparation method thereof |
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Application publication date: 20201027 |